JPH0635198A - Photopolymerizable composition - Google Patents
Photopolymerizable compositionInfo
- Publication number
- JPH0635198A JPH0635198A JP19395592A JP19395592A JPH0635198A JP H0635198 A JPH0635198 A JP H0635198A JP 19395592 A JP19395592 A JP 19395592A JP 19395592 A JP19395592 A JP 19395592A JP H0635198 A JPH0635198 A JP H0635198A
- Authority
- JP
- Japan
- Prior art keywords
- photopolymerizable composition
- sensitizer
- light
- group
- examples
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title abstract description 36
- 150000001875 compounds Chemical class 0.000 claims abstract description 25
- 239000012190 activator Substances 0.000 claims abstract description 12
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 125000003545 alkoxy group Chemical group 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 125000004414 alkyl thio group Chemical group 0.000 claims description 3
- 230000035945 sensitivity Effects 0.000 abstract description 9
- 230000000694 effects Effects 0.000 abstract description 5
- QNXSIUBBGPHDDE-UHFFFAOYSA-N indan-1-one Chemical group C1=CC=C2C(=O)CCC2=C1 QNXSIUBBGPHDDE-UHFFFAOYSA-N 0.000 abstract description 5
- 125000000147 tetrahydroquinolinyl group Chemical group N1(CCCC2=CC=CC=C12)* 0.000 abstract description 4
- -1 benzoin alkyl ether Chemical class 0.000 description 44
- 239000000463 material Substances 0.000 description 14
- 239000000126 substance Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 10
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 229920001577 copolymer Polymers 0.000 description 8
- DZFWNZJKBJOGFQ-UHFFFAOYSA-N julolidine Chemical group C1CCC2=CC=CC3=C2N1CCC3 DZFWNZJKBJOGFQ-UHFFFAOYSA-N 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 8
- 150000002148 esters Chemical class 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 5
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- 150000003254 radicals Chemical class 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- LBUJPTNKIBCYBY-UHFFFAOYSA-N 1,2,3,4-tetrahydroquinoline Chemical compound C1=CC=C2CCCNC2=C1 LBUJPTNKIBCYBY-UHFFFAOYSA-N 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerol Natural products OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 150000001735 carboxylic acids Chemical class 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000003086 colorant Substances 0.000 description 4
- 239000003112 inhibitor Substances 0.000 description 4
- 230000000977 initiatory effect Effects 0.000 description 4
- LVHBHZANLOWSRM-UHFFFAOYSA-N itaconic acid Chemical class OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
- 238000012719 thermal polymerization Methods 0.000 description 4
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 description 3
- FLFWJIBUZQARMD-UHFFFAOYSA-N 2-mercapto-1,3-benzoxazole Chemical compound C1=CC=C2OC(S)=NC2=C1 FLFWJIBUZQARMD-UHFFFAOYSA-N 0.000 description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical group C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 238000006068 polycondensation reaction Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 2
- RICRAVHJCLFPFF-UHFFFAOYSA-N 2,4,6-tris(chloromethyl)-1,3,5-triazine Chemical compound ClCC1=NC(CCl)=NC(CCl)=N1 RICRAVHJCLFPFF-UHFFFAOYSA-N 0.000 description 2
- YAHSNRBCASARBD-UHFFFAOYSA-N 2-(2,4,5-trimethoxyphenyl)propanoic acid Chemical compound COC1=CC(OC)=C(C(C)C(O)=O)C=C1OC YAHSNRBCASARBD-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000012644 addition polymerization Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000002775 capsule Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 125000005520 diaryliodonium group Chemical group 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- 150000002440 hydroxy compounds Chemical class 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical group OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 2
- 229940117841 methacrylic acid copolymer Drugs 0.000 description 2
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000003094 microcapsule Substances 0.000 description 2
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 150000001451 organic peroxides Chemical class 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 2
- 238000000016 photochemical curing Methods 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 229940079877 pyrogallol Drugs 0.000 description 2
- 229960001755 resorcinol Drugs 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 238000004809 thin layer chromatography Methods 0.000 description 2
- 150000003918 triazines Chemical class 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- SKCKRZWCOYHBEC-UHFFFAOYSA-N (3-oxobutan-2-ylideneamino) benzoate Chemical compound CC(=O)C(C)=NOC(=O)C1=CC=CC=C1 SKCKRZWCOYHBEC-UHFFFAOYSA-N 0.000 description 1
- JMMVHMOAIMOMOF-UHFFFAOYSA-N (4-prop-2-enoyloxyphenyl) prop-2-enoate Chemical compound C=CC(=O)OC1=CC=C(OC(=O)C=C)C=C1 JMMVHMOAIMOMOF-UHFFFAOYSA-N 0.000 description 1
- XBKVBPZGRMBIEB-UHFFFAOYSA-N (diphenyl-lambda3-iodanyl) 4-methylbenzenesulfonate Chemical compound Cc1ccc(cc1)S(=O)(=O)O[I](c1ccccc1)c1ccccc1 XBKVBPZGRMBIEB-UHFFFAOYSA-N 0.000 description 1
- XCEGAEUDHJEYRY-SNAWJCMRSA-N (e)-3-(2,4,5-trimethoxyphenyl)prop-2-enoic acid Chemical compound COC1=CC(OC)=C(\C=C\C(O)=O)C=C1OC XCEGAEUDHJEYRY-SNAWJCMRSA-N 0.000 description 1
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- XCEGAEUDHJEYRY-UHFFFAOYSA-N 2,4,5-trimethoxy-cinnamic acid Natural products COC1=CC(OC)=C(C=CC(O)=O)C=C1OC XCEGAEUDHJEYRY-UHFFFAOYSA-N 0.000 description 1
- IAJBQAYHSQIQRE-UHFFFAOYSA-N 2,4,5-trimethoxybenzaldehyde Chemical compound COC1=CC(OC)=C(C=O)C=C1OC IAJBQAYHSQIQRE-UHFFFAOYSA-N 0.000 description 1
- URJAUSYMVIZTHC-UHFFFAOYSA-N 2,4,6-tris(tribromomethyl)-1,3,5-triazine Chemical compound BrC(Br)(Br)C1=NC(C(Br)(Br)Br)=NC(C(Br)(Br)Br)=N1 URJAUSYMVIZTHC-UHFFFAOYSA-N 0.000 description 1
- DXUMYHZTYVPBEZ-UHFFFAOYSA-N 2,4,6-tris(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 DXUMYHZTYVPBEZ-UHFFFAOYSA-N 0.000 description 1
- BQDBORJXHYJUIV-UHFFFAOYSA-N 2-(2-bromophenyl)-2-[2-(2-bromophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound BrC1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Br)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 BQDBORJXHYJUIV-UHFFFAOYSA-N 0.000 description 1
- GBOJZXLCJZDBKO-UHFFFAOYSA-N 2-(2-chlorophenyl)-2-[2-(2-chlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Cl)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 GBOJZXLCJZDBKO-UHFFFAOYSA-N 0.000 description 1
- FNHQLSVILKHZNI-UHFFFAOYSA-N 2-(2-nitrophenyl)-2-[2-(2-nitrophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound [O-][N+](=O)C1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)[N+]([O-])=O)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 FNHQLSVILKHZNI-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- QRHHZFRCJDAUNA-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 QRHHZFRCJDAUNA-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- RFCQDOVPMUSZMN-UHFFFAOYSA-N 2-Naphthalenethiol Chemical compound C1=CC=CC2=CC(S)=CC=C21 RFCQDOVPMUSZMN-UHFFFAOYSA-N 0.000 description 1
- YJGHMLJGPSVSLF-UHFFFAOYSA-N 2-[2-(2-octanoyloxyethoxy)ethoxy]ethyl octanoate Chemical compound CCCCCCCC(=O)OCCOCCOCCOC(=O)CCCCCCC YJGHMLJGPSVSLF-UHFFFAOYSA-N 0.000 description 1
- JIKJXWFVPDDJNU-UHFFFAOYSA-N 2-[2-(4-methoxyphenyl)ethenyl]-5-(trichloromethyl)-1,3,4-oxadiazole Chemical compound C1=CC(OC)=CC=C1C=CC1=NN=C(C(Cl)(Cl)Cl)O1 JIKJXWFVPDDJNU-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- QAGHEHQMRFEQMB-UHFFFAOYSA-N 2-ethylidenepropanedioic acid Chemical compound CC=C(C(O)=O)C(O)=O QAGHEHQMRFEQMB-UHFFFAOYSA-N 0.000 description 1
- LETDRANQSOEVCX-UHFFFAOYSA-N 2-methyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 LETDRANQSOEVCX-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- VRBUPQGTJAXZAE-UHFFFAOYSA-N 2-propylidenebutanedioic acid Chemical compound CCC=C(C(O)=O)CC(O)=O VRBUPQGTJAXZAE-UHFFFAOYSA-N 0.000 description 1
- PUPFOFVEHDNUJU-UHFFFAOYSA-N 2-sulfanylidene-1h-quinazolin-4-one Chemical compound C1=CC=C2C(=O)NC(S)=NC2=C1 PUPFOFVEHDNUJU-UHFFFAOYSA-N 0.000 description 1
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Landscapes
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Abstract
(57)【要約】
【構成】 エチレン性不飽和二重結合を少なくとも1個
有する付加重合可能な化合物、分子内に特定のテトラヒ
ドロキノリン骨格と1−インダノン骨格を有する増感剤
および該増感剤との共存下光照射時に活性ラジカルを発
生し得る活性剤とを含有することを特徴とする光重合性
組成物。
【効果】 本発明の光重合性組成物は、可視光線、特に
長波長光線において極めて高感度である。(57) [Summary] [Structure] Addition-polymerizable compound having at least one ethylenically unsaturated double bond, sensitizer having specific tetrahydroquinoline skeleton and 1-indanone skeleton in molecule, and sensitizer A photopolymerizable composition containing an activator capable of generating an active radical upon irradiation with light under the coexistence with. [Effect] The photopolymerizable composition of the present invention has extremely high sensitivity to visible light, particularly long-wavelength light.
Description
【0001】[0001]
【産業上の利用分野】本発明は光重合性組成物に関する
ものである。特に可視領域の光線に対して極めて高感度
を示す光重合性組成物に関するものである。FIELD OF THE INVENTION The present invention relates to a photopolymerizable composition. In particular, the present invention relates to a photopolymerizable composition having extremely high sensitivity to light rays in the visible region.
【0002】[0002]
【従来の技術】従来、光重合系を利用した画像形成法は
多数知られている。例えば、付加重合可能なエチレン性
二重結合を含む化合物と光重合開始剤、さらに所望によ
り用いられる有機高分子結合剤等からなる光重合性組成
物を調製し、この光重合性組成物を支持体上に塗布して
光重合性組成物の層を設けた感光材料を作成し、所望画
像を像露光して露光部分を重合硬化させ、未露光部分を
溶解除去することにより硬化レリーフ画像を形成する方
法、上述感光材料の少なくとも一方が透明である2枚の
支持体間に光重合性組成物の層を設けたものであり、透
明支持体側より像露光し光による接着強度の変化を惹起
させた後、支持体を剥離することにより画像を形成する
方法、光重合性組成物及びロイコ色素等の色材料を内容
物に有するマイクロカプセルを支持体に塗布してマイク
ロカプセル層を設けた感光材料を作成し、該感光材料を
画像露光して露光部分のカプセルを光硬化させ、未露光
部分のカプセルを加圧処理、あるいは加熱処理により破
壊し、色材料顕色剤と接触させることにより発色させ、
着色画像を形成する方法、その他光重合性組成物層の光
によるトナー付着性の変化を利用した画像作成方法等が
ある。2. Description of the Related Art Conventionally, many image forming methods utilizing a photopolymerization system are known. For example, a photopolymerizable composition comprising a compound containing an addition-polymerizable ethylenic double bond, a photopolymerization initiator, and an organic polymer binder optionally used is prepared, and the photopolymerizable composition is supported. A photosensitive material having a layer of the photopolymerizable composition applied on the body is prepared, and the desired image is imagewise exposed to polymerize and cure the exposed portion, and the unexposed portion is dissolved and removed to form a cured relief image. And a layer of a photopolymerizable composition is provided between two supports in which at least one of the above-mentioned light-sensitive materials is transparent, and the transparent support side is imagewise exposed to cause a change in adhesive strength due to light. After that, a method of forming an image by peeling the support, a photosensitive material in which a microcapsule layer is provided by coating the support with microcapsules having a photopolymerizable composition and a color material such as a leuco dye in the contents Create The photosensitive material imagewise exposed to photocuring capsules exposed portion, the capsule in the unexposed portion was destroyed by pressure treatment, or heat treatment, and developed by contact with the color material developer,
There are a method for forming a colored image, and an image forming method utilizing a change in toner adhesion of the photopolymerizable composition layer due to light.
【0003】これらの方法に応用される光重合性組成物
の光重合開始剤としては従来、ベンゾイル、ベンゾイン
アルキルエーテル、ベンジルケタール、ベンゾフェノ
ン、アントラキノン、ベンジル、あるいはミヒラーケト
ンなどが用いられてきた。しかしながら、これらの光重
合開始剤は400nm以下の紫外線領域の光線に対する
光重合開始能力に比較し、400nm以上の可視光線領
域の光線に対するそれは顕著に低く、従ってそれらを含
む光重合性組成物の応用範囲を限定してきた。Conventionally, benzoyl, benzoin alkyl ether, benzyl ketal, benzophenone, anthraquinone, benzyl, Michler's ketone, etc. have been used as the photopolymerization initiator of the photopolymerizable composition applied to these methods. However, these photopolymerization initiators are significantly lower in light in the visible light region of 400 nm or more as compared with the photopolymerization initiating ability in the ultraviolet light region of 400 nm or less, and therefore the application of the photopolymerizable composition containing them is The range has been limited.
【0004】近年、画像形成技術の発展に伴ない可視領
域の光線に対し高度な感応性を有するフォトポリマーが
強く要請される様になってきた。それは、例えば、非接
触型の投影露光製版や可視光レーザーによるレーザー製
版等に適合した感光材料である。これら技術の中で、特
にアルゴンイオンレーザーの488nmの発振ビームを
用いた製版方式は最も将来有望視された技法の一つと考
えられている。In recent years, with the development of image forming technology, there has been a strong demand for photopolymers having a high sensitivity to light rays in the visible region. For example, it is a light-sensitive material suitable for non-contact type projection exposure plate making, laser plate making by visible light laser, and the like. Among these techniques, the plate making method using an 488 nm oscillation beam of an argon ion laser is considered to be one of the most promising techniques in the future.
【0005】可視光領域の光線に感応し得る光重合開始
系を含有する光重合感材に関しては、従来、いくつかの
提案がなされていきた。例えば、ヘキサアリールビイミ
ダゾールとラジカル発生剤および染料の系(特公昭45
−37377号公報)、ヘキサアリールビイミダゾール
と(p−ジアルキルアミノベンジリデン)ケトンの系
(特開昭47−2528号公報、特開昭54−1552
92号公報)、環状シスーα−ジカルボニル化合物と染
料の系(特開昭48−84183号公報)、置換トリア
ジンとメロシアニン色素の系(特開昭54−15102
4号公報)、ケトクマリンと活性剤の系(特開昭52−
112681号公報、特開昭58−15503号公報、
特開昭60−88005号公報)、置換トリアジンと増
感剤の系(特開昭58−29803号公報、同4030
2号公報)、ビイミダゾール、スチレン誘導体、チオー
ルの系(特開昭59−56403号公報)、有機過酸化
物と色素の系(特開昭59−140203号公報、同1
89340号公報)等が挙げられる。Several proposals have hitherto been made for a photopolymerizable photosensitive material containing a photopolymerization initiation system capable of being sensitive to light rays in the visible light region. For example, a system of hexaarylbiimidazole, a radical generator and a dye (Japanese Patent Publication No.
-37377), a system of hexaarylbiimidazole and (p-dialkylaminobenzylidene) ketone (JP-A-47-2528, JP-A-54-1552).
92), systems of cyclic cis-α-dicarbonyl compounds and dyes (JP-A-48-84183), systems of substituted triazines and merocyanine dyes (JP-A-54-15102).
No. 4), a system of ketocoumarin and an activator (JP-A-52-
112681, JP-A-58-15503,
JP-A-60-88005), systems of substituted triazines and sensitizers (JP-A-58-29803, 4030).
No. 2), biimidazole, styrene derivative, thiol system (JP-A-59-56403), organic peroxide and dye system (JP-A-59-140203, JP-A-59-140203).
89340).
【0006】[0006]
【発明が解決しようとする課題】しかしながら、これら
の従来の技術は確かに可視光線に対し有効であるが、感
度があまり高くなく実用的見地からはなお不充分である
という従来技術の難点があった。However, although these prior arts are certainly effective for visible light, they have the drawback that they are not very sensitive and still inadequate from a practical point of view. It was
【0007】[0007]
【課題を解決するための手段】本発明者らは、かかる難
点を克服して、優れた光重合性組成物を得るべく鋭意検
討の結果、エチレン性二重結合を少なくとも1個有する
付加重合可能な化合物、分子内に特定のテトラヒドロキ
ノリン骨格と1−インダノン骨格を有する増感剤および
該増感剤との共存下で光照射時に活性ラジカルを発生し
得る活性剤を少なくとも一種含有することにより、高感
度で実用性が高くなることを見出し、本発明に到達し
た。Means for Solving the Problems As a result of intensive investigations by the present inventors to overcome such difficulties and obtain an excellent photopolymerizable composition, the inventors have found that addition polymerization having at least one ethylenic double bond is possible. By containing at least one compound, a sensitizer having a specific tetrahydroquinoline skeleton and a 1-indanone skeleton in the molecule and an activator capable of generating an active radical upon light irradiation in the coexistence of the sensitizer, The inventors have found that the sensitivity is high and the practicality is high, and have arrived at the present invention.
【0008】則ち、本発明の目的は可視光線、とりわけ
488nmのような長波長光線に対し、より高感度な光
重合性組成物を提供することにある。本発明の他の目的
は、例えばアルゴンイオンレーザーによるレーザー製版
の場合、より低出力なレーザー、例えば空冷アルゴンレ
ーザーを用いて、より高速度な製版作業を可能にする光
重合性組成物を提供することにある。In other words, an object of the present invention is to provide a photopolymerizable composition which is more sensitive to visible light, especially long wavelength light such as 488 nm. Another object of the present invention is to provide a photopolymerizable composition which enables a higher speed plate making work by using a laser having a lower output, for example, an air-cooled argon laser in the case of laser plate making with an argon ion laser. Especially.
【0009】本発明の別の目的は、コスト的、時間的に
極めて有利な製版作業を可能にする光重合性組成物を提
供することにある。しかして、かかる本発明の目的は、
(a)エチレン性不飽和二重結合を少なくとも1個有す
る付加重合可能な化合物、(b)下記一般式[I]で表
わされる増感剤Another object of the present invention is to provide a photopolymerizable composition which enables a plate making operation which is extremely advantageous in terms of cost and time. Therefore, the object of the present invention is to
(A) an addition-polymerizable compound having at least one ethylenically unsaturated double bond, (b) a sensitizer represented by the following general formula [I]
【0010】[0010]
【化2】 [Chemical 2]
【0011】(式中、R1 は水素原子またはアルキル基
を表わし、R2 およびR3 はそれぞれ水素原子、アルキ
ル基、アルコキシ基またはアルキルチオ基を表わすか、
R1とR2 がそれぞれ相互に結合して環構造を形成して
いてもよく、R4 〜R6 はそれぞれアルコキシ基を表わ
し、mは0または1を表わす。)および(c)該増感剤
との共存下で光照射時にラジカルを発生する活動剤を少
なくとも1種を含有することを特徴とする光重合性組成
物によって容易に達成される。(Wherein R 1 represents a hydrogen atom or an alkyl group, R 2 and R 3 represent a hydrogen atom, an alkyl group, an alkoxy group or an alkylthio group, respectively,
R 1 and R 2 may be bonded to each other to form a ring structure, R 4 to R 6 each represent an alkoxy group, and m represents 0 or 1. And (c) at least one activator that generates a radical upon irradiation with light in the coexistence with the sensitizer is easily achieved by the photopolymerizable composition.
【0012】以下本発明について詳細に説明する。本発
明の光重合性組成物において(a)として表されるエチ
レン性不飽和二重結合を少なくとも1個有する付加重合
可能な化合物(以下、「エチレン性化合物」と略す)と
は、光重合性組成物が活性光線の照射を受けた場合、第
二の必須成分である光重合開始系の作用により付加重合
し、硬化するようなエチレン性不飽和二重結合を有する
化合物であって、例えば前記の二重結合を有する単量
体、または、側鎖もしくは主鎖にエチレン性不飽和二重
結合を有する重合体である。なお、本発明における単量
体の意味するところは、所謂高分子物質に相対する概念
であって、従って、狭義の単量体以外に二量体、三量
体、オリゴマーをも包含するものである。The present invention will be described in detail below. In the photopolymerizable composition of the present invention, the addition-polymerizable compound having at least one ethylenically unsaturated double bond represented by (a) (hereinafter, abbreviated as “ethylenic compound”) means photopolymerizable When the composition is irradiated with actinic rays, it is a compound having an ethylenically unsaturated double bond that undergoes addition polymerization by the action of a photopolymerization initiation system which is a second essential component, and is cured, for example, Is a monomer having a double bond or a polymer having an ethylenically unsaturated double bond in the side chain or main chain. Incidentally, the meaning of the monomer in the present invention is a concept facing a so-called polymer substance, and therefore includes not only a narrowly defined monomer but also a dimer, a trimer and an oligomer. is there.
【0013】エチレン性不飽和結合を有する単量体とし
ては例えば不飽和カルボン酸、脂肪族ポリヒドロキシ化
合物と不飽和カルボン酸とのエステル;芳香族ポリヒド
ロキシ化合物と不飽和カルボン酸とのエステル;不飽和
カルボン酸と多価カルボン酸および前述の脂肪族ポリヒ
ドロキシ化合物、芳香族ポリヒドロキシ化合物等の多価
ヒドロキシ化合物とのエステル化反応により得られるエ
ステル等が挙げられる。Examples of the monomer having an ethylenically unsaturated bond include unsaturated carboxylic acids, esters of aliphatic polyhydroxy compounds with unsaturated carboxylic acids; esters of aromatic polyhydroxy compounds with unsaturated carboxylic acids; Examples thereof include esters obtained by an esterification reaction of a saturated carboxylic acid with a polyvalent carboxylic acid and the above-mentioned aliphatic polyhydroxy compound, polyvalent hydroxy compound such as aromatic polyhydroxy compound, and the like.
【0014】前記脂肪族ポリヒドロキシ化合物と不飽和
カルボン酸とのエステルは限定はされないが、具体例と
しては、エチレングリコールジアクリレート、トリエチ
レングリコールジアクリレート、トリメチロールプロパ
ントリアクリレート、トリメチロールエタントリアクリ
レート、ペンタエリスリトールジアクリレート、ペンタ
エリスリトールトリアクリレート、ペンタエリストリト
ールテトラアクリレート、ジペンタエリスリトールテト
ラアクリレート、ジペンタエリスリトールペンタアクリ
レート、ジペンタエリスリトールヘキサアクリレート、
グリセロールアクリレール等のアクリル酸エステル、こ
れら例示化合物のアクリレートをメタクリレートに代え
たメタクリル酸エステル、同様にイタコネートに代えた
イタコン酸エステル、クロトネートに代えたクロトン酸
エステルもしくはマレエートに代えたマレイン酸エステ
ル等がある。The ester of the aliphatic polyhydroxy compound and the unsaturated carboxylic acid is not limited, but specific examples thereof include ethylene glycol diacrylate, triethylene glycol diacrylate, trimethylolpropane triacrylate and trimethylolethane triacrylate. , Pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate,
Acrylic esters such as glycerol acrylyl, methacrylic acid esters obtained by replacing acrylates of these exemplified compounds with methacrylates, itaconic acid esters similarly replaced with itaconate, crotonic acid esters replaced with crotonate or maleic acid esters replaced with maleate, etc. is there.
【0015】芳香族ポリヒドロキシ化合物と不飽和カル
ボン酸とのエステルとしては、ハイドロキノンジアクリ
レート、ハイドロキノンジメタクリレート、レゾルシン
ジアクリレート、レゾルシンジメタクリレート、ピロガ
ロールトリアクリレート等が挙げられる。不飽和カルボ
ン酸と多価カルボン酸及び多価ヒドロキシ化合物とのエ
ステル化反応により得られるエステルとしては必ずしも
単一物では無いが代表的な具体例を挙げれば、アクリル
酸、フタル酸およびエチレングリコールの縮合物、アク
リル酸、マレイン酸およびジエチレングリコールの縮合
物、メタクリル酸、テレフタル酸およびペンタエリスリ
トールの縮合物、アクリル酸、アジビン酸、ブタンジオ
ールおよびグリセリンの縮合物等がある。Examples of the ester of an aromatic polyhydroxy compound and an unsaturated carboxylic acid include hydroquinone diacrylate, hydroquinone dimethacrylate, resorcin diacrylate, resorcin dimethacrylate and pyrogallol triacrylate. The ester obtained by the esterification reaction of an unsaturated carboxylic acid with a polyvalent carboxylic acid or a polyvalent hydroxy compound is not necessarily a single substance, but representative specific examples include acrylic acid, phthalic acid and ethylene glycol. Examples thereof include condensates, condensates of acrylic acid, maleic acid and diethylene glycol, condensates of methacrylic acid, terephthalic acid and pentaerythritol, condensates of acrylic acid, adibic acid, butanediol and glycerin.
【0016】その他本発明に用いられるエチレン性化合
物の例としてはエチレンビスアクリルアミド等のアクリ
ルアミド類;フタル酸ジアリル等のアリルエステル類;
ジビニルフタレート等のビニル基含有化合物などが有用
である。前記した主鎖にエチレン性不飽和結合を有する
重合体は、例えば、不飽和二価カルボン酸とジヒドロキ
シ化合物との重縮合反応により得られるポリエステル、
不飽和二価カルボン酸とジアミンとの重縮合反応により
得られるポリアミド等がある。Other examples of the ethylenic compound used in the present invention include acrylamides such as ethylenebisacrylamide; allyl esters such as diallyl phthalate;
Vinyl group-containing compounds such as divinyl phthalate are useful. The polymer having an ethylenically unsaturated bond in the main chain described above is, for example, a polyester obtained by a polycondensation reaction of an unsaturated divalent carboxylic acid and a dihydroxy compound,
There are polyamides and the like obtained by polycondensation reaction of unsaturated divalent carboxylic acid and diamine.
【0017】側鎖にエチレン性不飽和結合を有する重合
体は側鎖に不飽和結合をもつ二価カルボン酸例えばイタ
コン酸、プロピリデンコハク酸、エチリデンマロン酸等
とジヒドロキシまたはジアミン化合物との縮合重合体が
ある。また側鎖にヒドロキシ基やハロゲン化メチル基の
如き反応活性を有する官能基をもつ重合体、例えばポリ
ビニルアルコール、ポリ(2−ヒドロキシエチルメタク
リレート)、ポリエピクロルヒドリン等とアクリル酸、
メタクリル酸、クロトン酸等の不飽和カルボン酸との高
分子反応により得られるポリマーも好適に使用し得る。The polymer having an ethylenically unsaturated bond in the side chain is a condensation polycondensation product of a divalent carboxylic acid having an unsaturated bond in the side chain, such as itaconic acid, propylidene succinic acid, ethylidene malonic acid, and a dihydroxy or diamine compound. There is coalescence. Further, a polymer having a functional group having a reactive activity such as a hydroxy group or a methyl halide group in its side chain, for example, polyvinyl alcohol, poly (2-hydroxyethyl methacrylate), polyepichlorohydrin, etc. and acrylic acid,
Polymers obtained by polymer reaction with unsaturated carboxylic acids such as methacrylic acid and crotonic acid can also be suitably used.
【0018】以上記載したエチレン性化合物の内、アク
リル酸エステルまたはメタクリル酸エステルの単量体が
特に好適に使用できる。次に、本願発明において(b)
として表わされる前記した一般式[I]の構造式で示さ
れる増感剤について説明する。これらの増感剤はいずれ
も分子内にテトラヒドロキノリン構造を有するものであ
り、それにより可視光線に対する感応性は顕著に増大す
ることが見い出された。この効果は、前記した一般式
[I]で示される化合物に関して特に著しく、実施例お
よび比較例で後述するように分子内のN,N−ジアルキ
ルアニリン構造をテトラヒドロキノリン構造の誘導体に
代えることにより488nmの光線に対して大巾な感度
増加が観測された。この効果の有用性は、アルゴンイオ
ンレーザー走査による画像形成手法において低出力な空
冷アルゴンレーザーへの適用が可能であることを示して
いる。Of the above-mentioned ethylenic compounds, acrylic acid ester or methacrylic acid ester monomers are particularly preferably used. Next, in the present invention (b)
The sensitizer represented by the structural formula [I] described above will be described. It has been found that all of these sensitizers have a tetrahydroquinoline structure in the molecule, which significantly increases the sensitivity to visible light. This effect is particularly remarkable for the compound represented by the general formula [I] described above, and as will be described later in Examples and Comparative Examples, by replacing the N, N-dialkylaniline structure in the molecule with a derivative having a tetrahydroquinoline structure, 488 nm A significant increase in sensitivity was observed with respect to the light rays. The usefulness of this effect indicates that it can be applied to an air-cooled argon laser having a low output in the image forming method by the argon ion laser scanning.
【0019】前記一般式[I]において、R1 〜R3 が
それぞれアルキル基を表わす場合、もしくはR2 および
R3 がそれぞれアルコキシ基またはアルキルチオ基を表
わす場合、R4 〜R6 がそれぞれアルコキシ基を表わす
場合、炭素数1〜10であることが好ましく、炭素数1
〜5であることが特に好ましく、直鎖であっても側鎖を
有していてもよい。In the above general formula [I], when R 1 to R 3 each represent an alkyl group, or when R 2 and R 3 each represent an alkoxy group or an alkylthio group, R 4 to R 6 each represent an alkoxy group. When representing, the number of carbon atoms is preferably 1 to 10, and the number of carbon atoms is 1
It is particularly preferable that it is from 5 to 5, and it may have a straight chain or a side chain.
【0020】以下に一般式[I]で表わされるテトラヒ
ドロキノリン系増感剤についてその代表例をあげるが、
本発明に用いるテトラヒドロキノリン系増感剤はこれら
具体例に限定されるものではない。なお、下記例示にお
いて記載のない限り、m=0、R1 〜R3 はいずれも水
素原子を表わすものとする。又、R1 およびR2 が下記
の環構造を形成する場合Typical examples of the tetrahydroquinoline sensitizer represented by the general formula [I] are shown below.
The tetrahydroquinoline sensitizer used in the present invention is not limited to these specific examples. Unless stated otherwise in the following examples, m = 0 and R 1 to R 3 all represent hydrogen atoms. When R 1 and R 2 form the following ring structure
【0021】[0021]
【化3】 [Chemical 3]
【0022】R1 〜R2 ;ジュロリジン環と表わす。R 1 to R 2 ; represented by julolidine ring.
【0023】化合物例Examples of compounds
【表1】 [I−1] R1 〜R2 ;ジュロリジン環,R4 〜R
6 ;メトキシ基 [I−2] R1 〜R2 ;ジュロリジン環,R4 〜R
6 ;エトキシ基 [I−3] R1 ;エチル基、R3 ;エトキシ基,R
4 〜R6 ;メトキシ基 [I−4] R1 ;エチル基、R3 ;エトキシ基,R
4 〜R6 ;エトキシ基 [I−5] R1 −R2 ;ジュロリジン環,R3 ;エ
トキシ基,R4 〜R6;メトキシ基 [I−6] m=1,R1 〜R2 ;ジュロリジン環,
R4 〜R6 ;メトキシ基 [I−7] m=1,R1 〜R2 ;ジュロリジン環,
R4 〜R6 ;エトキシ基 [I−8] m=1,R1 ;エチル基,R3 ;エトキ
シ基,R4 〜R6 ;メトキシ基 [I−9] m=1,R1 ;エチル基,R3 ;エトキ
シ基,R4 〜R6 ;エトキシ基 [I−10] m=1,R1 〜R2 ;ジュロリジン環,
R3 ;エトキシ基,R 4 〜R6 ;メトキシ基 [I−11][Table 1] [I-1] R1~ R2A julolidine ring, RFour~ R
6Methoxy group [I-2] R1~ R2A julolidine ring, RFour~ R
6Ethoxy group [I-3] R1Ethyl group, R3Ethoxy group, R
Four~ R6Methoxy group [I-4] R1Ethyl group, R3Ethoxy group, R
Four~ R6Ethoxy group [I-5] R1-R2A julolidine ring, R3; D
Toxy group, RFour~ R6Methoxy group [I-6] m = 1, R1~ R2A julolidine ring,
RFour~ R6Methoxy group [I-7] m = 1, R1~ R2A julolidine ring,
RFour~ R6Ethoxy group [I-8] m = 1, R1; Ethyl group, R3; Etoki
Shi group, RFour~ R6Methoxy group [I-9] m = 1, R1; Ethyl group, R3; Etoki
Shi group, RFour~ R6Ethoxy group [I-10] m = 1, R1~ R2A julolidine ring,
R3Ethoxy group, R Four~ R6Methoxy group [I-11]
【0024】[0024]
【化4】 [Chemical 4]
【0025】以上例示した本発明の増感剤は、限定はさ
れないが、例えば、後で合成例1〜2に例示するように
相当するインダノン誘導体とテトラヒドロキノリン誘導
体のアルデヒドを酸または塩基触媒下で脱水縮合させる
ことにより合成することができる。The sensitizers of the present invention exemplified above are not limited, but for example, the corresponding aldehydes of indanone derivatives and tetrahydroquinoline derivatives are subjected to acid or base catalysis as exemplified later in Synthesis Examples 1 and 2. It can be synthesized by dehydration condensation.
【0026】本発明の光重合性組成物に用いられる増感
剤は、単独でまたは2種以上を併用して好適に使用する
ことができる。本願発明において(c)として表わされ
る、前記した増感剤との共存下で光照射した場合活性ラ
ジカルを発生し得る活性剤は、光励起された増感剤と何
らかの作用を惹起することにより活性ラジカルを生成す
る特性を有するものであればいずれも使用できる。好ま
しい活性剤としては、例えば、ヘキサアリールビイミダ
ゾール、ハロゲン化炭化水素誘導体、有機チオール化合
物、ジアリールヨードニウム塩等を挙げることができ
る。特にヘキサアリールビイミダゾールと有機チオール
化合物とを併用すると感度は極めて増大する。The sensitizer used in the photopolymerizable composition of the present invention can be preferably used alone or in combination of two or more kinds. The activator represented by (c) in the present invention, which is capable of generating an active radical when irradiated with light in the presence of the above-mentioned sensitizer, is an active radical which induces some action with the photoexcited sensitizer. Any material can be used as long as it has the property of generating Preferred activators include, for example, hexaarylbiimidazole, halogenated hydrocarbon derivatives, organic thiol compounds, diaryliodonium salts and the like. In particular, the combined use of hexaarylbiimidazole and an organic thiol compound significantly increases the sensitivity.
【0027】ヘキサアリールビイミダゾールの具体例と
しては、2,2’−ビス(o−クロロフェニル)−4,
4’,5,5’−テトラフェニルビイミダゾール、2,
2’−ビス(o−クロロフェニル)−4,4’,5,
5’−テトラ(p−カルボエトキシフェニル)ビイミダ
ゾール、2,2’−ビス(o−クロロフェニル)−4,
4’,5,5’−テトラ(p−ブロモフェニル)ビイミ
ダゾール、2,2’−ビス(o−クロロフェニル)−
4,4’,5,5’−テトラ(o,p−ジクロロフェニ
ル)ビイミダゾール、2,2’−ビス(o−ブロモフェ
ニル)−4,4’,5,5’−テトラフェニルビイミダ
ゾール、2,2’−ビス(o,p−ジクロロフェニル)
−4,4’,5,5’−テトラフェニルビイミダゾー
ル、2,2’−ビス(o−クロロフェニル)−4,
4’,5,5’−テトラ(m−メトキシフェニル)ビイ
ミダゾール、2,2’−ビス(o,o’−ジクロロフェ
ニル)−4,4’,5,5’−テトラフェニルビイミダ
ゾール、2,2’−ビス(o−ニトロフェニル)−4,
4’,5,5’−テトラフェニルビイミダゾール、2,
2’−ビス(o−メチルフェニル)−4,4’,5,
5’−テトラフェニルビイミダゾール等が挙げられる。Specific examples of hexaarylbiimidazole include 2,2'-bis (o-chlorophenyl) -4,
4 ', 5,5'-tetraphenylbiimidazole, 2,
2'-bis (o-chlorophenyl) -4,4 ', 5
5'-tetra (p-carboethoxyphenyl) biimidazole, 2,2'-bis (o-chlorophenyl) -4,
4 ', 5,5'-tetra (p-bromophenyl) biimidazole, 2,2'-bis (o-chlorophenyl)-
4,4 ', 5,5'-tetra (o, p-dichlorophenyl) biimidazole, 2,2'-bis (o-bromophenyl) -4,4', 5,5'-tetraphenylbiimidazole, 2 , 2'-bis (o, p-dichlorophenyl)
-4,4 ', 5,5'-Tetraphenylbiimidazole, 2,2'-bis (o-chlorophenyl) -4,
4 ', 5,5'-tetra (m-methoxyphenyl) biimidazole, 2,2'-bis (o, o'-dichlorophenyl) -4,4', 5,5'-tetraphenylbiimidazole, 2, 2'-bis (o-nitrophenyl) -4,
4 ', 5,5'-tetraphenylbiimidazole, 2,
2'-bis (o-methylphenyl) -4,4 ', 5
5'-tetraphenyl biimidazole etc. are mentioned.
【0028】前記ハロゲン化炭化水素誘導体の具体例と
しては、例えば、2,4,6−トリス(トリクロロメチ
ル)−s−トリアジン、2,4,6−トリス(トリブロ
モメチル)−s−トリアジン、2−メチル−4,6−ジ
(トリクロロメチル)−s−トリアジン、2−(p−メ
トキシフェニル)−4,6−ジ(トリクロロメチル)−
s−トリアジン、2,2,2−トリクロロメチルアセト
フェノン、トリブロモメチルフェニルスルホン、2−ト
リクロロメチル−5−(p−メトキシスチリル)−1,
3,4−オキサジアゾール等が挙げられる。Specific examples of the halogenated hydrocarbon derivative include 2,4,6-tris (trichloromethyl) -s-triazine, 2,4,6-tris (tribromomethyl) -s-triazine, and the like. 2-Methyl-4,6-di (trichloromethyl) -s-triazine, 2- (p-methoxyphenyl) -4,6-di (trichloromethyl)-
s-triazine, 2,2,2-trichloromethylacetophenone, tribromomethylphenyl sulfone, 2-trichloromethyl-5- (p-methoxystyryl) -1,
3,4-oxadiazole and the like can be mentioned.
【0029】有機チオール化合物としては、例えば、2
−メルカプトベンズチアゾール、2−メルカプトベンズ
オキサゾール、2−メルカプトベンズイミダゾール、2
−メルカプト−4(3H)−キナゾリノン、β−メルカ
プトナフタリン等が挙げられる。ジアリールヨードニウ
ム塩としては、例えばジフェニルヨードニウムヘキサフ
ルオロホスフェート、ジフェニルヨードニウムトシレー
ト、ジフェニルヨードニウムフルオロボレート、ジフェ
ニルヨードニウムヘキサフルオロアルセネート、ジフェ
ニルヨードニウムクロリド、ジトリルヨードニウムヘキ
サフルオロホスフェート、フェニル(p−アニシル)ヨ
ードニウムヘキサフルオロホスフェート、ビス(m−ニ
トロフェニル)ヨードニウムヘキサフルオロホスフェー
ト等が挙げられる。Examples of the organic thiol compound include 2
-Mercaptobenzthiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, 2
-Mercapto-4 (3H) -quinazolinone, β-mercaptonaphthalene and the like can be mentioned. Examples of the diaryliodonium salt include diphenyliodonium hexafluorophosphate, diphenyliodonium tosylate, diphenyliodonium fluoroborate, diphenyliodonium hexafluoroarsenate, diphenyliodonium chloride, ditolyliodonium hexafluorophosphate, phenyl (p-anisyl) iodonium hexafluoro. Examples thereof include phosphate and bis (m-nitrophenyl) iodonium hexafluorophosphate.
【0030】本発明における活性剤としては、これら以
外に公知のもの、例えば、3−ベンゾイロキシイミノブ
タン−2−オン等のケトオキシムエステル、3,3’,
4,4’−テトラ(t−ブチルパーオキシカルボニル)
ベンゾフェノン等の有機過酸化物、N−フェニルグリシ
ン、ジメドン等も使用し得る。本発明の光重合性組成物
に用いられる活性剤は、単独でまたは2種以上を併用し
て好適に使用することができる。Other than these, the activator in the present invention is known, for example, ketoxime esters such as 3-benzoyloxyiminobutan-2-one, 3,3 ',
4,4'-Tetra (t-butylperoxycarbonyl)
Organic peroxides such as benzophenone, N-phenylglycine, dimedone and the like can also be used. The activator used in the photopolymerizable composition of the present invention can be preferably used alone or in combination of two or more kinds.
【0031】以上述べた本発明の光重合性組成物に用い
られる光重合開始系を構成する増感剤および活性剤の好
適な使用量は特に限定されないが、(a)エチレン性化
合物100重量部に対し、(b)増感剤が好ましくは
0.05〜20重量部、より好ましくは0.2〜10重
量部、(c)活性剤が好ましくは0.5〜100重量
部、より好ましくは1〜50重量部の割合で用いるのが
適している。The suitable amount of the sensitizer and the activator constituting the photopolymerization initiation system used in the photopolymerizable composition of the present invention described above is not particularly limited, but 100 parts by weight of the (a) ethylenic compound is used. On the other hand, the (b) sensitizer is preferably 0.05 to 20 parts by weight, more preferably 0.2 to 10 parts by weight, and the (c) activator is preferably 0.5 to 100 parts by weight, more preferably It is suitable to use in a proportion of 1 to 50 parts by weight.
【0032】本発明の光重合性組成物は前記の各構成成
分の他に本組成物の改質、光硬化後の物性改善の為に結
合剤として有機高分子物質を更に添加することが好まし
い。結合剤は相溶性、皮膜形成性、現像性、接着性等改
善目的に応じて適宜選択すればよい。具体的には例えば
水系現像性改善にはアクリル酸共重合体、メタクリル酸
共重合体、イタコン酸共重合体、部分エステル化マレイ
ン酸共重合体、側鎖にカルボキシル基を有する酸性セル
ロース変性物、ポリエチレンオキシド、ポリビニルピロ
リドン等がある。In the photopolymerizable composition of the present invention, in addition to the above-mentioned constituents, it is preferable to further add an organic polymer substance as a binder in order to modify the composition and improve the physical properties after photocuring. . The binder may be appropriately selected depending on the improvement purpose such as compatibility, film forming property, developability, and adhesiveness. Specifically, for example, to improve the water-based developability, acrylic acid copolymer, methacrylic acid copolymer, itaconic acid copolymer, partially esterified maleic acid copolymer, acidic cellulose modified product having a carboxyl group in the side chain, Examples include polyethylene oxide and polyvinylpyrrolidone.
【0033】皮膜強度、接着性の改善にはエピクロロヒ
ドリンとビスフェノールAとのポリエーテル;可溶性ナ
イロン;ポリメチルメタクリレート等のポリメタクリル
酸アルキルやポリアクリル酸アルキル;メタクリル酸ア
ルキルとアクリロニトリル、アクリル酸、メタクリル
酸、塩化ビニル、塩化ビニリデン、スチレン等との共重
合体;アクリロニトリルと塩化ビニル、塩化ビニリデン
との共重合体;塩化ビニリデン、塩素化ポリオレフィ
ン、塩化ビニルと酢酸ビニルとの共重合体;ポリ酢酸ビ
ニル;アクリロニトリルとスチレンとの共重合体;アク
リロニトルとブタジエン、スチレンとの共重合体;ポリ
ビニルアルキルエーテル;ポリビニルアルキルケトン;
ポリスチレン;ポリアミド;ポリウレタン;ポリエチレ
ンテレフタレートイソフタレート;アセチルセルロース
およびポリビニルブチラール等を挙げることができる。
これらの結合剤は前記エチレン性化合物に対し重量比率
で好ましくは500%以下、より好ましくは200%以
下の範囲で添加混合することができる。To improve the film strength and adhesiveness, a polyether of epichlorohydrin and bisphenol A; soluble nylon; alkyl polymethacrylate such as polymethylmethacrylate or alkyl polyacrylate; alkyl methacrylate and acrylonitrile, acrylic acid , Copolymers with methacrylic acid, vinyl chloride, vinylidene chloride, styrene, etc .; copolymers of acrylonitrile with vinyl chloride, vinylidene chloride; vinylidene chloride, chlorinated polyolefins, copolymers of vinyl chloride with vinyl acetate; poly Vinyl acetate; Acrylonitrile / styrene copolymer; Acrylonitol / butadiene / styrene copolymer; Polyvinyl alkyl ether; Polyvinyl alkyl ketone;
Polystyrene; polyamide; polyurethane; polyethylene terephthalate isophthalate; acetyl cellulose, polyvinyl butyral and the like.
These binders can be added and mixed in a weight ratio of preferably 500% or less, more preferably 200% or less, based on the ethylenic compound.
【0034】本発明の光重合性組成物は必要に応じ更に
熱重合防止剤、着色剤、可塑剤、表面保護剤、平滑剤、
塗布助剤その他の添加剤を添加することができる。熱重
合防止剤としては例えばハイドロキノン、p−メトキシ
フェノール、ピロガロール、カテコール、2,6−ジ−
t−ブチル−p−クレゾール、β−ナフトールなどがあ
り、着色剤としては例えばフタロシアニン系顔料、アゾ
系顔料、カーボンブラック、酸化チタンなどの顔料、エ
チルバイオレット、クリスタルバイオレット、アゾ系染
料、アントラキノン系染料、シアニン系染料がある。こ
れら熱重合防止剤や着色剤の添加量は前記結合剤を使用
した場合、エチレン性化合物と結合剤との合計重量に対
し熱重合防止剤が0.01%ないし3%、着色剤が0.
1%ないし20%が好ましい。The photopolymerizable composition of the present invention may further contain a thermal polymerization inhibitor, a coloring agent, a plasticizer, a surface protective agent, a smoothing agent, if necessary.
Coating aids and other additives can be added. Examples of the thermal polymerization inhibitor include hydroquinone, p-methoxyphenol, pyrogallol, catechol, 2,6-di-
There are t-butyl-p-cresol, β-naphthol, and the like. Examples of the colorant include phthalocyanine pigments, azo pigments, carbon black, pigments such as titanium oxide, ethyl violet, crystal violet, azo dyes, anthraquinone dyes. , There are cyanine dyes. When the binder is used, the thermal polymerization inhibitor and the colorant are added in an amount of 0.01% to 3% of the thermal polymerization inhibitor and 0.1% of the colorant with respect to the total weight of the ethylenic compound and the binder.
1% to 20% is preferred.
【0035】また、前記可塑剤としては例えばジオクチ
ルフタレート、ジドデシルフタレート、トリエチレング
リコールジカプリレート、ジメチルグリコールフタレー
ト、トリクレジルホスフェート、ジオクチルアジペー
ト、ジブチルセバケート、トリアセチルグリセリン等が
あり、結合剤を使用した場合、エチレン性化合物と結合
剤との合計重量に対し10%以下添加することができ
る。Examples of the plasticizer include dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, tricresyl phosphate, dioctyl adipate, dibutyl sebacate, triacetyl glycerin, and the like. When used, 10% or less of the total weight of the ethylenic compound and the binder can be added.
【0036】本発明の光重合性組成物を使用する際は、
無溶剤にて感光材料を形成するかまたは適当な溶剤に溶
解して溶液となしこれを支持体上に塗布、乾燥して感光
材料を調製することができる。溶剤としては例えばメチ
ルエチルケトン、シクロヘキサノン、酢酸ブチル、酢酸
アミル、プロピオン酸エチル、トルエン、キシレン、モ
ノクロロベンゼン、四塩化炭素、トリクロロエチレン、
トリクロロエタン、ジメチルホルムアミド、メチルセロ
ソルブ、エチルセロソルブ、テトラヒドロフラン、ベン
トキソン等があり、一種または二種以上を併用して用い
ることができる。When using the photopolymerizable composition of the present invention,
The light-sensitive material can be prepared by forming the light-sensitive material without a solvent or dissolving it in a suitable solvent to form a solution, which is applied on a support and dried. Examples of the solvent include methyl ethyl ketone, cyclohexanone, butyl acetate, amyl acetate, ethyl propionate, toluene, xylene, monochlorobenzene, carbon tetrachloride, trichloroethylene,
There are trichloroethane, dimethylformamide, methyl cellosolve, ethyl cellosolve, tetrahydrofuran, bentoxone and the like, and one kind or a combination of two or more kinds can be used.
【0037】本発明の光重合性組成物を用いて感光材料
を調製する際に適用される支持体は通常用いられるもの
はいずれでも良い。例えばアルミニウム、マグネシウ
ム、銅、亜鉛、クロム、ニッケル、鉄等の金属またはそ
れらを主成分とした合金のシート;上質紙、アート紙、
剥離紙等の紙類;ガラス、セラミックス等の無機シー
ト;ポリエチレンテレフタレート、ポリエチレン、ポリ
メチルメタクリレート、ポリ塩化ビニル、塩化ビニル−
塩化ビニリデン共重合体、ポリスチレン、6−ナイロ
ン、セルローストリアセテート、セルロースアセテート
ブチレート等のポリマーシート等がある。The support applied when preparing a light-sensitive material using the photopolymerizable composition of the present invention may be any of those usually used. For example, a sheet of metal such as aluminum, magnesium, copper, zinc, chromium, nickel, iron or an alloy containing them as a main component; high-quality paper, art paper,
Papers such as release paper; inorganic sheets such as glass and ceramics; polyethylene terephthalate, polyethylene, polymethylmethacrylate, polyvinyl chloride, vinyl chloride-
Polymer sheets such as vinylidene chloride copolymer, polystyrene, 6-nylon, cellulose triacetate, and cellulose acetate butyrate are available.
【0038】また本発明の光重合性組成物はさらに酸素
による感度低下や保存安定性の劣化等の悪影響を防止す
る為の公知技術、例えば、感光層上に剥離可能な透明カ
バーシートを設けたり酸素透過性の小さいロウ状物質、
水溶性ポリマー等による被履層を設けることもできる。
本発明の組成物に適用し得る露光光源としては特に限定
されないがカーボンアーク、高圧水銀燈、キセノンラン
プ、メタルハライドランプ、蛍光ランプ、タングステン
ランプ、ヘリウムカドミニウムレーザー、アルゴンイオ
ンレーザー等400nm以上の可視光線を含む汎用の光
源がより好適に使用し得る。Further, the photopolymerizable composition of the present invention is further provided with a known technique for preventing adverse effects such as sensitivity deterioration and storage stability deterioration due to oxygen, for example, providing a peelable transparent cover sheet on the photosensitive layer. Wax-like substance with low oxygen permeability,
An undercoat layer made of a water-soluble polymer or the like can be provided.
The exposure light source that can be applied to the composition of the present invention is not particularly limited, but includes carbon arc, high pressure mercury lamp, xenon lamp, metal halide lamp, fluorescent lamp, tungsten lamp, helium cadmium laser, argon ion laser, etc. visible light of 400 nm or more. A general-purpose light source can be used more suitably.
【0039】[0039]
【実施例】以下、本発明を合成例、実施例、および比較
例により更に具体的に説明するが、本発明は、その要旨
を越えない限りこれらの実施例に限定されるものではな
い。EXAMPLES The present invention will be described in more detail below with reference to synthesis examples, examples and comparative examples, but the present invention is not limited to these examples unless it exceeds the gist.
【0040】合成例1 (4,6,7−トリメトキシ−
1−インダノンの調製) 2,4,5−トリメトキシベンズアルデヒド20gとマ
ロン酸20gをピリジン100ml溶媒下、ピペリジン
を触媒に用いて80℃、5時間反応させた。反応液に5
00mlの水を加え、析出してくる2,4,5−トリメ
トキシけい皮酸19gをろ過抽出した。得られた2,
4,5−トリメトキシけい皮酸10gをパラジウム−カ
ーボン触媒を用いて水素還元し、2,4,5−トリメト
キシフェニルプロピオン酸9gを得た。Synthesis Example 1 (4,6,7-trimethoxy-
Preparation of 1-indanone) 20 g of 2,4,5-trimethoxybenzaldehyde and 20 g of malonic acid were reacted in a solvent of 100 ml of pyridine using piperidine as a catalyst at 80 ° C. for 5 hours. 5 in the reaction solution
00 ml of water was added, and the precipitated 2,4,5-trimethoxycinnamic acid (19 g) was filtered and extracted. Obtained 2,
10 g of 4,5-trimethoxycinnamic acid was reduced with hydrogen using a palladium-carbon catalyst to obtain 9 g of 2,4,5-trimethoxyphenylpropionic acid.
【0041】この2,4,5−トリメトキシフェニルプ
ロピオン酸5gをポリリン酸100g中で80℃4時間
反応させ、反応後、500mlの水を添加し、さらに、
水酸化ナトリウム水溶液で中和し、析出する4,6,7
−トリメトキシ−1−インダノン3gをろ過抽出した。
得られた生成物を、薄層クロマトグラフィー、核磁気共
鳴スペクトル、赤外吸収スペクトルにより同定した。5 g of this 2,4,5-trimethoxyphenylpropionic acid was reacted in 100 g of polyphosphoric acid at 80 ° C. for 4 hours, after the reaction, 500 ml of water was added, and further,
Neutralize with sodium hydroxide aqueous solution and precipitate 4,6,7
3 g of -trimethoxy-1-indanone was extracted by filtration.
The obtained product was identified by thin layer chromatography, nuclear magnetic resonance spectrum and infrared absorption spectrum.
【0042】合成例2 (増感剤[I−1]の調製) ジュロリジンを原料とし常法に従って、ジメチルホルム
アミドとオキシ塩化リンを用いて合成したジュロリジン
−9−カルバルデヒド4.1g、4,6,7−トリメト
キシ−1−インダノン5g、水酸化カリウム0.5gを
エタノール溶媒中窒素雰囲気下80℃で10時間反応さ
せた。反応物を酢酸エチルとヘキサン(1:9)混合溶
媒を用いたシリカゲルカラム(ワコーゲルC−200,
和光純薬工業(株)製)により分離精製し、[I−1]
1gを得た。[I−1]は薄層クロマトグラフィー、核
磁気共鳴スペクトル、赤外吸収スペクトルにより同定さ
れた。Synthetic Example 2 (Preparation of sensitizer [I-1]) Julolidine-9-carbaldehyde, 4.1 g, 4, 6 synthesized by using dimethylformamide and phosphorus oxychloride according to a conventional method using julolidine as a raw material. , 7-trimethoxy-1-indanone (5 g) and potassium hydroxide (0.5 g) were reacted in an ethanol solvent at 80 ° C. for 10 hours under a nitrogen atmosphere. The reaction product was a silica gel column (Wakogel C-200, using a mixed solvent of ethyl acetate and hexane (1: 9)).
Separated and purified by Wako Pure Chemical Industries, Ltd. [I-1]
1 g was obtained. [I-1] was identified by thin layer chromatography, nuclear magnetic resonance spectrum, and infrared absorption spectrum.
【0043】実施例1〜9および比較例1〜6 砂目立てかつ陽極酸化を施したアルミニウムシート上
に、ホワラーを用い、下記組成の感光性組成物塗布液を
乾燥膜厚2μmになるように塗布し、更にその表面にポ
リビニルアルコール水溶液を、乾燥膜厚が3μmになる
ように塗布して感光材試料を作成した。Examples 1 to 9 and Comparative Examples 1 to 6 On a grained and anodized aluminum sheet, using a whirler, a photosensitive composition coating solution having the following composition was applied to a dry film thickness of 2 μm. Then, a polyvinyl alcohol aqueous solution was applied on the surface so that the dry film thickness was 3 μm to prepare a photosensitive material sample.
【0044】次に、この感光材試料上に、1段増す毎に
光量が1/√2づつ減衰するステップタブレット(コダ
ック社製)を密着させ、その上1mから1kwキセノン
ランプ(ウシオ電機(株)製OSB−1001A/2)
ガラスフィルター(東芝ガラス(株)製、Y−47とK
L−49)を通して得られる480〜490nmの光を
10秒間照射した。露光試料は、ブチルセロソルブ2重
量%、ケイ酸ナトリウム1重量%を含む水溶液により現
像を行ない、得られたステップ硬化画像の、ステップ段
数より、画像形成に必要な最も少ない露光量を算出し、
その感光組成の感度とした。その結果を表−1に示す。Next, a step tablet (manufactured by Kodak Co., Ltd.) in which the light amount is attenuated by 1 / √2 each time it is increased by one step is brought into close contact with this photosensitive material sample, and 1 m to 1 kW xenon lamp (USHIO INC. ) OSB-1001A / 2)
Glass filter (Toshiba Glass Co., Ltd., Y-47 and K)
The light of 480 to 490 nm obtained through L-49) was irradiated for 10 seconds. The exposed sample was developed with an aqueous solution containing 2% by weight of butyl cellosolve and 1% by weight of sodium silicate, and the minimum exposure amount necessary for image formation was calculated from the step number of the obtained step-cured image,
The sensitivity of the photosensitive composition was used. The results are shown in Table-1.
【0045】[感光性組成物塗布液][Photosensitive composition coating liquid]
【表2】 メタクリル酸メチル/メタクリル酸共重合体 50部 (重量平均分子量45,000、共重合比85/15) トリメチロールプロパントリアクリレート 50部 ビクトリアピュアブルーBOH 0.1部 メチルセコソルブ 800部 テトラハイドロフラン 50部 増感剤 (表−1に記載) 活性剤 (表−1に記載)Table 2 Methyl methacrylate / methacrylic acid copolymer 50 parts (weight average molecular weight 45,000, copolymerization ratio 85/15) trimethylolpropane triacrylate 50 parts Victoria Pure Blue BOH 0.1 part Methyl Secosolve 800 parts Tetrahydrofuran 50 parts Sensitizer (listed in Table-1) Activator (listed in Table-1)
【0046】[0046]
【表3】 [Table 3]
【0047】表−1中、増感剤[S−1]〜[S−3]
はそれぞれIn Table 1, sensitizers [S-1] to [S-3].
Are each
【0048】[0048]
【化5】 [Chemical 5]
【0049】を表わす。また、表−1中、活性剤[B−
1]〜[B−7]はそれぞれ [B−1]Represents In addition, in Table 1, the active agent [B-
1] to [B-7] are respectively [B-1]
【0050】[0050]
【化6】 [Chemical 6]
【0051】[B−2][B-2]
【0052】[0052]
【化7】 [Chemical 7]
【0053】[0053]
【表4】 [B−3] 2,4,6−トリクロロメチル−s−トリ
アジン [B−4] ジフェニルヨードニウムヘキサフルオロホ
スフェート [B−5] 2−メルカプトベンズチアゾール [B−6] 2−メルカプトベンズオキサゾール [B−7] 2−メルカプトベンズイミダゾール を表わす。[B-3] 2,4,6-Trichloromethyl-s-triazine [B-4] Diphenyliodonium hexafluorophosphate [B-5] 2-Mercaptobenzthiazole [B-6] 2-Mercaptobenz Oxazole [B-7] Represents 2-mercaptobenzimidazole.
【0054】[0054]
【発明の効果】本発明の光重合性組成物は、可視光線、
特に長波長光線に対して極めて高感度なものである。従
って、該組成物は広範囲な応用分野に有用であって例え
ば平板、凹版、凸版等印刷版の作成、プリント配線やI
Cの作成の為のフォトレジスト、ドライフィルム、レリ
ーフ像や画像複製などの画像形成、光硬化性のインク、
塗料、接着剤等に利用できるので工業的に極めて有用で
ある。The photopolymerizable composition of the present invention is
In particular, it is extremely sensitive to long-wavelength light. Therefore, the composition is useful in a wide range of application fields, for example, for producing a printing plate such as a flat plate, an intaglio, a letterpress, a printed wiring and
Photoresist for making C, dry film, image formation such as relief image and image duplication, photocurable ink,
Since it can be used for paints, adhesives, etc., it is extremely useful industrially.
Claims (1)
る付加重合可能な化合物、(b)下記一般式[I]で表
わされる増感剤 【化1】 (式中、R1 は水素原子またはアルキル基を表わし、R
2 およびR3 はそれぞれ水素原子、アルキル基、アルコ
キシ基またはアルキルチオ基を表わすか、R1とR2 が
それぞれ相互に結合して環構造を形成していてもよく、
R4 〜R6 はそれぞれアルコキシ基を表わし、mは0ま
たは1を表わす。)および(c)該増感剤との共存下で
光照射時に活性ラジカルを発生する活性剤を少なくとも
1種を含有することを特徴とする光重合性組成物。1. At least (a) an addition-polymerizable compound having at least one ethylenically unsaturated double bond, (b) a sensitizer represented by the following general formula [I]: (In the formula, R 1 represents a hydrogen atom or an alkyl group, and R 1
2 and R 3 each represent a hydrogen atom, an alkyl group, an alkoxy group or an alkylthio group, or R 1 and R 2 may be bonded to each other to form a ring structure,
R 4 to R 6 each represent an alkoxy group, and m represents 0 or 1. And (c) at least one activator which generates an active radical upon irradiation with light in the coexistence with the sensitizer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19395592A JPH0635198A (en) | 1992-07-21 | 1992-07-21 | Photopolymerizable composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19395592A JPH0635198A (en) | 1992-07-21 | 1992-07-21 | Photopolymerizable composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0635198A true JPH0635198A (en) | 1994-02-10 |
Family
ID=16316543
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19395592A Pending JPH0635198A (en) | 1992-07-21 | 1992-07-21 | Photopolymerizable composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0635198A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006259535A (en) * | 2005-03-18 | 2006-09-28 | Fuji Photo Film Co Ltd | Photosensitive composition, image recording material and image recording method |
| WO2011104127A1 (en) | 2010-02-24 | 2011-09-01 | Basf Se | Latent acids and their use |
| WO2016124493A1 (en) | 2015-02-02 | 2016-08-11 | Basf Se | Latent acids and their use |
| DE10015255B4 (en) | 1999-03-31 | 2020-06-04 | Ciba Holding Inc. | Process for the preparation of oxime derivatives and their use as latent acids in chemically amplified photoresist compositions, and process for the production of a photoresist |
-
1992
- 1992-07-21 JP JP19395592A patent/JPH0635198A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10015255B4 (en) | 1999-03-31 | 2020-06-04 | Ciba Holding Inc. | Process for the preparation of oxime derivatives and their use as latent acids in chemically amplified photoresist compositions, and process for the production of a photoresist |
| JP2006259535A (en) * | 2005-03-18 | 2006-09-28 | Fuji Photo Film Co Ltd | Photosensitive composition, image recording material and image recording method |
| WO2011104127A1 (en) | 2010-02-24 | 2011-09-01 | Basf Se | Latent acids and their use |
| WO2016124493A1 (en) | 2015-02-02 | 2016-08-11 | Basf Se | Latent acids and their use |
| US9994538B2 (en) | 2015-02-02 | 2018-06-12 | Basf Se | Latent acids and their use |
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