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JPH07120850A - Shutter device for light source of exposure device - Google Patents

Shutter device for light source of exposure device

Info

Publication number
JPH07120850A
JPH07120850A JP5288854A JP28885493A JPH07120850A JP H07120850 A JPH07120850 A JP H07120850A JP 5288854 A JP5288854 A JP 5288854A JP 28885493 A JP28885493 A JP 28885493A JP H07120850 A JPH07120850 A JP H07120850A
Authority
JP
Japan
Prior art keywords
pinhole
light source
pinholes
lenses
diameter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5288854A
Other languages
Japanese (ja)
Inventor
Minoru Tanaka
中 稔 田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adtec Engineering Co Ltd
Canon Components Inc
Original Assignee
Adtec Engineering Co Ltd
Canon Components Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adtec Engineering Co Ltd, Canon Components Inc filed Critical Adtec Engineering Co Ltd
Priority to JP5288854A priority Critical patent/JPH07120850A/en
Publication of JPH07120850A publication Critical patent/JPH07120850A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/7015Details of optical elements
    • G03F7/70166Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Projection-Type Copiers In General (AREA)
  • Control Of Exposure In Printing And Copying (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To obviate the generation of a deviation in illuminance distribution and illuminance angle by providing a shutter device with pinholes which are larger than the condensing spots of plural lenses and exist at the condensing spots and opening/closing means for the pinholes. CONSTITUTION:A flyeye lens 1 consists of the plural lenses 10 smaller in diameter than the luminous flux diameter of vertically and horizontally disposed light sources and the individual lenses 10 are so set as to cross orthogonally the optical axes from the light sources and form the respectively discrete condensing spots 11. The shutter is composed of a pair of pinhole plates 20, 21. The respective pinhole plate 20, 21 form the plural pinholes 23 in the same position. These pinholes 23 are slightly larger in diameter than the condensing spots 11. The condensing spots 11 are so formed as to exist between the pinhole plates 20 and 21 within the spots. The pinhole plate 20 is stationary and the pinhole plate 21 is moved back and forth laterally by operation of an actuator 22. Namely, the light passing the pinholes 23 is opened and closed by the short- distant movement of the pinhole plate 21.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明はプリント基板に回路パ
ターン等を焼き付けるための露光装置の光源用のシャッ
タ装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a shutter device for a light source of an exposure device for printing a circuit pattern or the like on a printed circuit board.

【0002】[0002]

【従来の技術】露光装置においては、光源からの照射を
シャッタ装置により開閉してプリント基板等の対象物に
焼き付けを行うようになっている。このシャッタ装置は
従来は、光源からの光束全体を遮閉可能な一枚のシャッ
タ板を出し入れして、照射光の開閉を行うように構成さ
れていた。
2. Description of the Related Art In an exposure apparatus, irradiation from a light source is opened and closed by a shutter device to print an object such as a printed circuit board. Conventionally, this shutter device is configured to open and close the irradiation light by inserting and removing a single shutter plate capable of blocking the entire light flux from the light source.

【0003】[0003]

【発明が解決しようとする課題】しかし、光源からの光
束は通常最小でも100mm程度あり、このような光束
全体を一枚板を移動させて遮光するには0.5秒程度の
時間が必要であった。また従来のシャッタ装置では開閉
動作が往復動作であったため光束の場所による遮光時間
の差が生じ照度分布のかたよりや照射角度のかたより等
が生ずる問題があった。本発明は上記した従来技術の問
題点を解決することを目的とする。
However, the luminous flux from the light source is usually about 100 mm at the minimum, and it takes about 0.5 seconds to move the entire luminous flux by moving one plate. there were. Further, in the conventional shutter device, since the opening / closing operation is a reciprocating operation, there is a problem in that a difference in light-shielding time occurs depending on the location of the light beam, which causes a deviation in the illuminance distribution and a deviation in the irradiation angle. The present invention aims to solve the above-mentioned problems of the prior art.

【0004】[0004]

【課題を解決するための手段】上記目的を達成するため
に本発明の露光装置光源用シャッタ装置は、光源の光軸
に直交するように配設され、該光源の光束径よりも径小
な複数のレンズと、該複数のレンズの集光スポットより
も径大で、且つ該集光スポットに位置するピンホール
と、該ピンホールを開閉する手段とを備えたことを基本
的な特徴とする。
In order to achieve the above object, the exposure apparatus light source shutter apparatus of the present invention is arranged so as to be orthogonal to the optical axis of the light source and has a diameter smaller than the luminous flux diameter of the light source. It is basically characterized in that it is provided with a plurality of lenses, a pinhole having a diameter larger than the focused spots of the plurality of lenses and located at the focused spot, and means for opening and closing the pinhole. .

【0005】[0005]

【作用】光源の光軸に直交するように配設され、該光源
の光束径よりも径小な複数のレンズを介して光源からの
光が該集光スポットに位置するピンホールに集光する。
このピンホールが開閉する手段により開閉される。
The light from the light source is focused on the pinhole located at the focusing spot through a plurality of lenses arranged so as to be orthogonal to the optical axis of the light source and having a diameter smaller than the light beam diameter of the light source. .
The pinhole is opened and closed by means of opening and closing.

【0006】[0006]

【実施例】以下本発明をプリント基板の露光装置におけ
るシャッタ装置に適用した実施例を図面に基づいて説明
する。図1において、点光源5から発した露光光(紫外
線)を楕円ミラー6で集光して、平面ミラー7と平面ミ
ラー8で反射させて、コリメータミラー9で平行光束に
変換してフィルムマスクF及びプリント基板Pに至る光
学系が形成されている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment in which the present invention is applied to a shutter device in an exposure apparatus for a printed circuit board will be described below with reference to the drawings. In FIG. 1, the exposure light (ultraviolet light) emitted from the point light source 5 is condensed by the elliptical mirror 6, reflected by the plane mirror 7 and the plane mirror 8, and converted into a parallel light flux by the collimator mirror 9 to be converted into a film mask F. And an optical system reaching the printed circuit board P is formed.

【0007】平面ミラー7と平面ミラー8の途中にフラ
イアイレンズ1とシャッタ2から成るシャッタ装置が設
けられている。フライアイレンズ1は図2に示すよう
に、縦横に配設された複数のレンズ10からなり、個々
のレンズ10は、光源からの光軸に直交するように設定
され、それぞれ別個の集光スポット11を形成して、2
次光源面を形成するようになっている。
A shutter device including a fly-eye lens 1 and a shutter 2 is provided in the middle of the plane mirror 7 and the plane mirror 8. As shown in FIG. 2, the fly-eye lens 1 is composed of a plurality of lenses 10 arranged vertically and horizontally. The individual lenses 10 are set so as to be orthogonal to the optical axis from the light source, and each of them has its own focused spot. Forming 11 and 2
A secondary light source surface is formed.

【0008】シャッタ2は一対のピンホール板20、2
1から構成されている。各ピンホール板20、21は同
一の位置に複数のピンホール23を形成してあり、この
ピンホール23は集光スポット11よりも若干径大にな
っている。ピンホール23は図3に示すように集光スポ
ット11をその内部に位置させるようになっている。ま
た、この実施例では図2に示すように厚さ方向ピンホー
ル板20とピンホール板21の中間の位置に集光スポッ
ト11を位置させるようになっている。
The shutter 2 comprises a pair of pinhole plates 20, 2
It is composed of 1. Each of the pinhole plates 20 and 21 has a plurality of pinholes 23 formed at the same position, and the pinholes 23 are slightly larger in diameter than the focused spot 11. As shown in FIG. 3, the pinhole 23 locates the focused spot 11 therein. Further, in this embodiment, as shown in FIG. 2, the focused spot 11 is located at an intermediate position between the pinhole plate 20 and the pinhole plate 21 in the thickness direction.

【0009】この実施例ではピンホール板20は固定さ
れており、ピンホール板21は左右方向に移動可能で、
アクチュエータ22の稼働により左右方向に往復動する
ようになっている。図3はピンホール板20とピンホー
ル板21のピンホール23が重なりあって、集光スポッ
ト11を露出して光束を通過させる状態を示している。
図4はピンホール板21を図面上右方向に移動させて、
ピンホール23を重ね合わせずに、ピンホール23を遮
閉する状態を示している。
In this embodiment, the pinhole plate 20 is fixed, and the pinhole plate 21 is movable in the left and right directions.
The actuator 22 is operated to reciprocate in the left-right direction. FIG. 3 shows a state in which the pinhole plate 20 and the pinhole 23 of the pinhole plate 21 are overlapped with each other to expose the focused spot 11 and allow the light flux to pass therethrough.
In FIG. 4, the pinhole plate 21 is moved to the right in the drawing,
It shows a state in which the pinhole 23 is shielded without overlapping the pinhole 23.

【0010】この際のピンホール板21の移動はピンホ
ール23の径と同じかまたは若干を大きい距離の移動で
よいから、短い時間で光の通過/遮閉を完了できる。ま
た、複数の集光スポットを同時に通過/遮閉できるため
照度分布や照射角度のかたよりが生じない。
The movement of the pinhole plate 21 at this time may be the same as or slightly larger than the diameter of the pinhole 23, so that the passage / blocking of light can be completed in a short time. Further, since a plurality of converging spots can be passed / blocked at the same time, the illuminance distribution and the irradiation angle are not affected.

【0011】また、集光スポット11にピンホール23
が位置するため、該ピンホール23を通過する際に迷光
がカットされ、質の高い平行光を得ることができる。
Further, a pinhole 23 is formed on the focused spot 11.
Is located, stray light is cut when passing through the pinhole 23, and high-quality parallel light can be obtained.

【0012】シャッタ2を通過した光は前記したように
平面ミラー8で反射して、コリメータミラー9で平行光
束に変換されてフィルムマスクF上に照射し、フィルム
マスクF上の回路パターンをプリント基板Pに焼き付け
るように構成されている。
The light passing through the shutter 2 is reflected by the plane mirror 8 as described above, converted into a parallel light flux by the collimator mirror 9 and irradiated on the film mask F, and the circuit pattern on the film mask F is printed on the printed circuit board. It is configured to be baked on P.

【0013】以上説明した実施例によれば、ピンホール
板21の短い距離の移動でピンホール23を通過する光
の開閉ができる。例えば、従来の一枚シャッタの場合シ
ャッタ範囲が中心より200mmとすると、上記実施例
では約20mmのシャッタ範囲とすることができ、約1
0倍のシャッタスピードを得ることができる。そのため
高速遮光が可能となり、更に複数の集光スポットの同時
遮光により照度分布や照射角度のかたよりが生じない。
また、ピンホール23により迷光をカットでき、高質な
平行光を得ることができる。
According to the embodiment described above, the light passing through the pinhole 23 can be opened and closed by moving the pinhole plate 21 a short distance. For example, in the case of a conventional single shutter, if the shutter range is 200 mm from the center, the shutter range can be about 20 mm in the above embodiment, and the shutter range is about 1 mm.
A shutter speed of 0 times can be obtained. Therefore, high-speed light shielding can be performed, and further, simultaneous light shielding of a plurality of focused spots does not cause irradiance distribution or irradiation angle deviation.
Further, stray light can be cut by the pinhole 23, and high-quality parallel light can be obtained.

【0014】[0014]

【発明の効果】以上説明したように本発明の露光装置光
源用シャッタ装置は、光源の光軸に直交するように配設
され、該光源の光束径よりも径小な複数のレンズと、該
複数のレンズの集光スポットよりも径大で、且つ該集光
スポットに位置するピンホールと、該ピンホールを開閉
する手段とを備えているため、短い距離の移動で光の高
速開閉ができ、更に複数の集光スポットの同時遮光によ
り照度分布や照射角度のかたよりが生じない。また、ピ
ンホールにより迷光をカットでき、高質な平行光を得る
ことができる等の効果がある。
As described above, the exposure device light source shutter device of the present invention is provided so as to be orthogonal to the optical axis of the light source, and has a plurality of lenses each having a diameter smaller than the light beam diameter of the light source. Since a pinhole having a diameter larger than the condensing spots of a plurality of lenses and located at the condensing spots and a means for opening / closing the pinholes are provided, high-speed opening / closing of light can be performed with a short distance movement. Further, the simultaneous shading of a plurality of converging spots does not cause the illuminance distribution or the irradiation angle bias. Further, there is an effect that stray light can be cut by the pinhole, and high quality parallel light can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例を示す概略正面図。FIG. 1 is a schematic front view showing an embodiment of the present invention.

【図2】本発明の一実施例を示す拡大図。FIG. 2 is an enlarged view showing an embodiment of the present invention.

【図3】本発明の一実施例を示す平面図。FIG. 3 is a plan view showing an embodiment of the present invention.

【図4】本発明の一実施例の動作を示す平面図。FIG. 4 is a plan view showing the operation of the embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1:フライアイレンズ、2:シャッタ、5:点光源、
6:楕円ミラー、7:平面ミラー、8:平面ミラー、
9:コリメータミラー、10:レンズ、11:集光スポ
ット、20:ピンホール板、21:ピンホール板、2
2:アクチュエータ、23:ピンホール。
1: Fly-eye lens, 2: Shutter, 5: Point light source,
6: elliptical mirror, 7: plane mirror, 8: plane mirror,
9: Collimator mirror, 10: Lens, 11: Focus spot, 20: Pinhole plate, 21: Pinhole plate, 2
2: Actuator, 23: Pinhole.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 光源の光軸に直交するように配設され、
該光源の光束径よりも径小な複数のレンズと、 該複数のレンズの集光スポットよりも径大で、且つ該集
光スポットに位置するピンホールと、 該ピンホールを開閉する手段と、 を備えたことを特徴とする露光装置光源用シャッタ装
置。
1. Arranged so as to be orthogonal to the optical axis of the light source,
A plurality of lenses each having a diameter smaller than a light beam diameter of the light source, a pinhole having a diameter larger than a condensing spot of the plurality of lenses and located at the condensing spot, and means for opening and closing the pinhole, A shutter device for an exposure device light source, comprising:
【請求項2】 光源の光軸に直交するように配設され、
該光源の光束径よりも径小な複数のレンズと、 該複数のレンズの集光スポットよりも径大で、且つ該集
光スポットに位置するピンホールを備えた一対のピンホ
ール板と、 該ピンホール板の一方を移動させることにより前記ピン
ホールを開閉する手段と、 を備えたことを特徴とする露光装置光源用シャッタ装
置。
2. Arranged so as to be orthogonal to the optical axis of the light source,
A plurality of lenses each having a diameter smaller than a light beam diameter of the light source, and a pair of pinhole plates each having a diameter larger than a condensing spot of the plurality of lenses and having a pinhole located at the condensing spot; A shutter device for a light source of an exposure apparatus, comprising: means for opening and closing the pinhole by moving one of the pinhole plates.
【請求項3】 前記複数のレンズが単一のフライアイレ
ンズである、請求項1又は請求項2に記載の露光装置光
源用シャッタ装置。
3. The shutter device for an exposure apparatus light source according to claim 1, wherein the plurality of lenses are a single fly-eye lens.
JP5288854A 1993-10-26 1993-10-26 Shutter device for light source of exposure device Pending JPH07120850A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5288854A JPH07120850A (en) 1993-10-26 1993-10-26 Shutter device for light source of exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5288854A JPH07120850A (en) 1993-10-26 1993-10-26 Shutter device for light source of exposure device

Publications (1)

Publication Number Publication Date
JPH07120850A true JPH07120850A (en) 1995-05-12

Family

ID=17735613

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5288854A Pending JPH07120850A (en) 1993-10-26 1993-10-26 Shutter device for light source of exposure device

Country Status (1)

Country Link
JP (1) JPH07120850A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2890461A1 (en) * 2005-09-05 2007-03-09 Sagem Defense Securite SHUTTER AND ILLUMINATOR OF A PHOTOLITHOGRAPHY DEVICE
JP2011044480A (en) * 2009-08-19 2011-03-03 Nikon Corp Illumination optical system, exposure apparatus, and manufacturing method for device
CN112285526A (en) * 2019-07-25 2021-01-29 北大方正集团有限公司 PCB layer deviation detector

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2890461A1 (en) * 2005-09-05 2007-03-09 Sagem Defense Securite SHUTTER AND ILLUMINATOR OF A PHOTOLITHOGRAPHY DEVICE
WO2007028793A1 (en) * 2005-09-05 2007-03-15 Sagem Defense Securite Illuminator for a photolithography device
JP2009507387A (en) * 2005-09-05 2009-02-19 サジャン・デファンス・セキュリテ Illumination apparatus for photolithography device
US7982855B2 (en) 2005-09-05 2011-07-19 Miguel Boutonne Illuminator for a photolithography device
JP2011044480A (en) * 2009-08-19 2011-03-03 Nikon Corp Illumination optical system, exposure apparatus, and manufacturing method for device
CN112285526A (en) * 2019-07-25 2021-01-29 北大方正集团有限公司 PCB layer deviation detector

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