JPH07121381B2 - Spin coating device - Google Patents
Spin coating deviceInfo
- Publication number
- JPH07121381B2 JPH07121381B2 JP61230571A JP23057186A JPH07121381B2 JP H07121381 B2 JPH07121381 B2 JP H07121381B2 JP 61230571 A JP61230571 A JP 61230571A JP 23057186 A JP23057186 A JP 23057186A JP H07121381 B2 JPH07121381 B2 JP H07121381B2
- Authority
- JP
- Japan
- Prior art keywords
- jig
- chemical solution
- optical recording
- work
- held
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004528 spin coating Methods 0.000 title claims description 9
- 239000000126 substance Substances 0.000 claims description 29
- 239000007789 gas Substances 0.000 claims description 11
- 230000003028 elevating effect Effects 0.000 claims description 8
- 239000011261 inert gas Substances 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 6
- 238000007599 discharging Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 description 31
- 230000003287 optical effect Effects 0.000 description 23
- 239000010408 film Substances 0.000 description 16
- 239000010410 layer Substances 0.000 description 15
- 230000001681 protective effect Effects 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229920004943 Delrin® Polymers 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は回転塗布装置に関し、詳しくは円板状ワークの
表面上に薄膜層を形成する装置に関するものである。TECHNICAL FIELD The present invention relates to a spin coating apparatus, and more particularly to an apparatus for forming a thin film layer on the surface of a disk-shaped work.
従来の技術 例えば、レーザ技術、サーボ技術や各種金属等の薄膜技
術の著しい進歩に伴い、光記録媒体は光ディスクとして
各種構造のものが多方面に実用化されている。この光記
録媒体は基本的には円形基板上に光記録層を形成したも
ので、記録方式の最も一般的で実用性の高いものは光記
録層にレーザビームを照射して光記録層を選択的に溶融
或は昇華させて穴〔ピット〕を形成する方式で、この方
式で記録した光記録媒体は記録再生可能で追加型光記録
媒体と称されている。2. Description of the Related Art For example, with the remarkable progress of laser technology, servo technology, and thin film technology of various metals, optical recording media having various structures have been put to practical use in various fields. This optical recording medium basically has an optical recording layer formed on a circular substrate. The most general and practical recording method is to select the optical recording layer by irradiating the optical recording layer with a laser beam. The optical recording medium recorded by this method is referred to as an add-on type optical recording medium in which recording and reproduction are possible.
上記追記型光記録媒体の光記録層は金属単体層或は金属
単体層と昇華性有機物層を積層した多層構造のものが一
般的である。例えば前者の光ディスク（１）は第４図及
び第５図に示すようにポリカーボネイト等の円形基板
（２）上に低融点で且つ低熱伝動性の金属テルルや金属
ビスマス等の金属単体からなる光記録媒体材料を薄膜状
〔約1000Åの厚さ〕に被着して光記録層（３）を形成し
た構造で、この光記録層（３）にレーザビーム（４）を
選択的に照射すると照射されたところが溶融、蒸発など
によりピット（５）が形成される。The optical recording layer of the write-once type optical recording medium generally has a multi-layer structure of a metal single layer or a metal single layer and a sublimable organic compound layer. For example, the former optical disk (1) is an optical recording made of a metal simple substance such as metal tellurium or metal bismuth having a low melting point and a low thermal conductivity on a circular substrate (2) such as polycarbonate as shown in FIGS. 4 and 5. The optical recording layer (3) is formed by depositing a medium material in a thin film [thickness of about 1000 Å]. This optical recording layer (3) is irradiated by selectively irradiating it with a laser beam (4). Here and there, pits (5) are formed by melting, evaporation and the like.
ところで、上記光記録層（３）は金属単体ゆえに酸化し
易く、例えば温度40℃、湿度90％の雰囲気中に放置して
おくと約７日間で全表面が内眼で確認される程凹凸激し
く酸化され、耐候性が極めて悪かった。また、上記ピッ
ト（５）に塵等が侵入するのは好ましくなかった。そこ
で、従来は光記録層（３）上に保護膜（６）を被着形成
して光記録層（３）の酸化を防止すると共に、ピット
（５）への塵等の侵入を防止している。By the way, the optical recording layer (3) is easy to oxidize because it is a simple substance of metal. For example, if it is left in an atmosphere of a temperature of 40 ° C. and a humidity of 90%, the entire surface is so uneven that it can be confirmed with the inner eye in about 7 days. It was oxidized and had extremely poor weather resistance. Further, it was not preferable that dust or the like entered the pit (5). Therefore, conventionally, a protective film (6) is deposited on the optical recording layer (3) to prevent oxidation of the optical recording layer (3) and prevent dust and the like from entering the pits (5). There is.
上記光記録層（３）上に保護膜（６）を形成する装置
（７）の従来例を第６図を参照しながら説明する。同図
に示すように、回転自在に配設された回転テーブル
（８）上に円形基板（２）を真空吸着等で位置決め載置
し、この状態で円形基板（２）の略中央部に薬液
（６′）を滴下供給した後、所定の回転数で回転テーブ
ル（８）を回転させてその遠心力により上記薬液
（６′）を円形基板（２）上の表面上に拡げて所望の膜
厚の保護膜（６）を光記録層（３）上に被着形成すると
共に余分な薬液（６′）は遠心力により振り切られる。A conventional example of the device (7) for forming the protective film (6) on the optical recording layer (3) will be described with reference to FIG. As shown in the figure, the circular substrate (2) is positioned and mounted on the rotary table (8) which is rotatably arranged by vacuum suction or the like, and in this state, the chemical solution is placed substantially in the center of the circular substrate (2). After (6 ') is dropped and supplied, the rotary table (8) is rotated at a predetermined number of revolutions, and the chemical solution (6') is spread on the surface of the circular substrate (2) by its centrifugal force to form a desired film. A thick protective film (6) is deposited on the optical recording layer (3) and the excess chemical solution (6 ') is shaken off by centrifugal force.
発明が解決しようとする問題点 ところで、上述するような保護膜（６）の形成に於い
て、上記装置（７）では円形基板（２）への保護膜
（６）の形成は片面ずつ行われるため、１枚の円形基板
（２）の表裏面に保護膜（６）を形成するためには少な
くとも２工程が必要であって、作業性が著しく低かっ
た。また、表裏面の保護膜（６）は別々の工程で形成さ
れるので膜厚を均等に形成するのが困難であった。しか
も、多数枚まとめて一括処理するには装置自体が大形化
して設備的に不利である等の理由から現状の装置による
量産化は難しいといった問題点があった。DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention In the formation of the protective film (6) as described above, the protective film (6) is formed on the circular substrate (2) one by one in the above device (7). Therefore, at least two steps were required to form the protective film (6) on the front and back surfaces of one circular substrate (2), and the workability was extremely low. Further, since the protective films (6) on the front and back surfaces are formed in separate steps, it is difficult to form the film with a uniform thickness. In addition, there is a problem in that it is difficult to mass-produce the current apparatus because the apparatus itself becomes large and it is disadvantageous in terms of equipment to collectively process a large number of sheets.
問題点を解決するための手段 本発明は複数の円板状ワークが定ピッチで直立状態に整
列保持された治具と、該治具の回転軸を中心に上記ワー
クを、その整列方向と直交する平面内で速度調整可能に
回転させる駆動機構と、昇降機構を介して上記ワークの
下方に上下動自在に配設され、且つ、ワーク処理用の薬
液が貯溜された薬液槽と、給気管に内設したエアーヒー
タにより加熱可能とした不活性ガスを上記治具に保持さ
れたワーク及び薬液槽が収容された処理室に給排するガ
ス供給手段とを具備した回転塗布装置を提供することに
より上記問題点を解決するものである。Means for Solving the Problems The present invention provides a jig in which a plurality of disk-shaped works are aligned and held in an upright state at a constant pitch, and the above-mentioned works centering on the rotation axis of the jig and orthogonal to the alignment direction. A drive mechanism for rotating the workpiece in a plane capable of adjusting the speed, a chemical tank for storing the chemical liquid for processing the workpiece, which is vertically movably arranged below the workpiece through an elevating mechanism, and an air supply pipe. To provide a spin coater equipped with a gas supply means for supplying and discharging an inert gas, which can be heated by an internal air heater, to and from a processing chamber containing a work held by the jig and a chemical solution tank. The above problems are solved.
作用 本発明に係る回転塗布装置では、駆動機構に連結された
治具に定ピッチで保持された複数枚の直立状態の円板状
ワークの下部を、昇降機構を介して上昇させた薬液層の
薬液中に浸漬させる。この状態で上記円板状ワークを、
その整列方向と直交する平面内で低速回転させてワーク
の表裏面に薬液を塗布する。その後、薬液槽を降下させ
てから、ワークを高速回転させて不要な薬液を遠心力に
より振り切ることにより所望の厚みの保護膜を形成す
る。上述するような作用を呈する回転塗布装置によれ
ば、複数枚のワークの表裏面に同時にしかも、一括して
均一な膜厚の保護膜を形成することが実現可能となる。Effect In the spin coating apparatus according to the present invention, the lower part of a plurality of upright disk-shaped workpieces held at a constant pitch by a jig connected to a drive mechanism is used to lift a chemical liquid layer raised by an elevating mechanism. Immerse in chemical solution. In this state, the disk-shaped work,
The chemical solution is applied to the front and back surfaces of the work by rotating at low speed in a plane orthogonal to the alignment direction. After that, the chemical solution tank is lowered, and the work is rotated at a high speed to shake off unnecessary chemical solution by centrifugal force to form a protective film having a desired thickness. According to the spin coating device having the above-described operation, it is possible to form the protective films having a uniform film thickness on the front and back surfaces of a plurality of works simultaneously and collectively.
実施例 本発明に係る回転塗布装置の一実施例を第１図乃至第３
図を参照しながら説明する。但し、第４図及び第５図と
同一部分には同一参照符号を付して説明は省略する。同
図に於いて、（11）は複数の円板状ワーク、例えば光デ
ィスク（１）の円形基板（２）（２）…が定ピッチで直
立状態に整列保持された治具で、該治具（11）は第３図
に示すように、上記基板（２）の貫通穴（2a）に挿通す
る円柱状の本体部（11a）と、凹部（11c）が形成された
取付部（11b）とで構成される。尚、材質はデルリンが
好ましい。上記本体部（11a）の先端には押え部材（1
2）が螺着され、上記取付部（11b）に刻設された雌ネジ
部（11d）にはセットネジ（13）が螺合する。上記構成
の治具（11）の本体部（11a）には複数の基板（２）
（２）…と複数のスペーサ（14）（14）…とが交互に嵌
入されて保持される。保持された基板（１）（１）…は
先端に螺着される押え部材（12）により軸方向に若干押
圧されることにより回り止めされる。（15）は上記治具
（11）の回転軸を中心に基板（２）（２）…を、その整
列方向と直交する平面内で回転させる駆動機構で、両端
から回転軸（16a）（16b）が突出するハウジング（16）
と、該ハウジング（16）の一方の回転軸（16a）に取り
付けられた第１のタイミングプーリー（17）と、出力軸
（18a）に第２のタイミングプーリー（19）が取り付け
られた速度調整可能なモータ（18）と、上記第１のプー
リー（17）と第２のプーリー（19）間に纒い掛けられた
タイミングベルト（20）とで構成される。上記構成の駆
動機構（15）のハウジング（16）の他方の回転軸（16
b）に上記治具（11）の取付部（11b）の凹部（11c）を
嵌入し回り止め用のセットネジ（13）を螺合して固定す
る。（21）は昇降機構（22）を介して上記基板（２）の
下方に上下動自在に配設され、且つ、基板（２）に塗布
される薬液（６）が貯溜された薬液槽である。ここで、
上記昇降機構（22）は例えば、上記薬液槽（21）が着脱
自在に位置決め載置される昇降台（22a）と、該昇降台
（22a）の下面に直立状態で取り付けられたラック（22
b）と、該ラック（22b）と噛み合うピニオン（22c）が
出力軸に取り付けられた減速機付モータ（22d）と、上
記ラック（22b）の下端に取り付けられたドック（22e）
と、該ドック（22e）の位置を検出する近接センサ、例
えば複数の磁気センサ（22f）（22f）…とで構成され
る。（23）は治具（11）に保持された基板（２）及び上
下動自在の薬液槽（21）が収容された処理室、（24）は
該処理室（23）に不活性ガスを給排するガス供給手段
で、上記処理室（23）の一側方に配設され、不活性ガス
を供給する給気管（24a）と、給気管（24a）中を通過す
る不活性ガスを加熱するエアーヒータ（24b）と、上記
給気管（24a）と対向させて処理室（23）の他側方に配
設された排気ファン（24c）を有する排気管（24d）とで
構成される。上記ガス供給手段（24）では、給気口（24
e）から供給された、例えばN2ガスはエアーヒータ（24
b）により加熱されて、または常温のまま処理室（23）
内に送出される。ここで、上記処理室（23）をN2ガスで
充満させるのは基板（２）表面の酸化を防止すること
と、処理室（23）内を超清浄雰囲気に保つことを目的と
している。一方、処理室（23）に充満されたN2ガスは排
気ファン（24c）を作動させて排気管（24d）から外部へ
排気される。（25）は上記（11）〜（23）を収納する本
体ケースで、前面に開閉自在のヒラキ扉（25a）を有
し、上方に制御ボックス（26）が配設される。上記制御
ボックス（26）の前面の操作パネル（27）には種々のス
イッチが装備される。例えば（27a）は電源スイッチ、
（27b）は排気ファンスイッチ、（27c）は昇降スピード
用モータ、（27d）はディスク〔円形基板〕回転数用メ
ータ、（27e）は乾燥温度調節用メータ、（27f）は上昇
・下降ボタン、（27g）は高速・低速ボタン、（27h）は
塗布時間表示用メータ、（27i）は乾燥時間表示用メー
タ、（27j）は運転モード〔自動・手動〕切換ボタン、
（27k）はディスクサイズ切換スイッチ、（27l）はスタ
ートボタン、（27m）はストップボタン、（27n）は非常
停止ボタンである。Embodiment An embodiment of the spin coating apparatus according to the present invention is shown in FIGS.
Description will be given with reference to the drawings. However, the same parts as those in FIGS. 4 and 5 are designated by the same reference numerals, and the description thereof will be omitted. In the figure, (11) is a jig in which a plurality of disk-shaped works, for example, circular substrates (2) (2) ... Of an optical disc (1) are aligned and held in an upright state at a constant pitch. As shown in FIG. 3, (11) is a cylindrical main body (11a) which is inserted into the through hole (2a) of the substrate (2), and an attachment portion (11b) having a recess (11c) formed therein. Composed of. The material is preferably Delrin. At the tip of the main body (11a), a pressing member (1
2) is screwed, and the set screw (13) is screwed into the female screw portion (11d) engraved on the mounting portion (11b). A plurality of substrates (2) are provided on the main body (11a) of the jig (11) having the above configuration.
(2) ... And a plurality of spacers (14) (14) ... are alternately inserted and held. The held substrates (1) (1) ... Are prevented from rotating by being slightly pressed in the axial direction by a pressing member (12) screwed to the tip. (15) is a drive mechanism for rotating the substrates (2), (2) ... In a plane orthogonal to the alignment direction about the rotation axis of the jig (11). ) Protruding housing (16)
And a first timing pulley (17) attached to one rotating shaft (16a) of the housing (16) and a second timing pulley (19) attached to the output shaft (18a), the speed of which is adjustable. A motor (18) and a timing belt (20) wound around the first pulley (17) and the second pulley (19). The other rotating shaft (16) of the housing (16) of the drive mechanism (15) configured as described above.
The concave portion (11c) of the attachment portion (11b) of the jig (11) is fitted in b) and the set screw (13) for rotation prevention is screwed and fixed. Reference numeral (21) is a chemical solution tank which is vertically movable below the substrate (2) through an elevating mechanism (22) and stores a chemical solution (6) applied to the substrate (2). . here,
The elevating mechanism (22) is, for example, an elevating table (22a) on which the chemical solution tank (21) is removably positioned and mounted, and a rack (22) installed upright on the lower surface of the elevating table (22a).
b), a reduction gear motor (22d) having a pinion (22c) that meshes with the rack (22b) attached to the output shaft, and a dock (22e) attached to the lower end of the rack (22b).
And a proximity sensor that detects the position of the dock (22e), for example, a plurality of magnetic sensors (22f) (22f). (23) is a processing chamber containing the substrate (2) held by a jig (11) and a vertically movable chemical solution tank (21), and (24) supplies an inert gas to the processing chamber (23). A gas supply means for discharging the gas, which is arranged on one side of the processing chamber (23) and supplies an inert gas to supply an inert gas, and heats the inert gas passing through the air supply pipe (24a). An air heater (24b) and an exhaust pipe (24d) having an exhaust fan (24c) arranged on the other side of the processing chamber (23) facing the air supply pipe (24a). In the gas supply means (24), the air supply port (24
supplied from e), for example, N 2 gas is air heater (24
Process chamber (23) heated by b) or at room temperature
Sent in. Here, the purpose of filling the processing chamber (23) with N 2 gas is to prevent the surface of the substrate (2) from being oxidized and to maintain the inside of the processing chamber (23) in an ultra-clean atmosphere. On the other hand, the N 2 gas filled in the processing chamber (23) is exhausted to the outside from the exhaust pipe (24d) by operating the exhaust fan (24c). (25) is a main body case for accommodating the above (11) to (23), which has an openable and openable door (25a) on the front and a control box (26) arranged above. The control panel (26) on the front of the control box (26) is equipped with various switches. For example (27a) is the power switch,
(27b) is an exhaust fan switch, (27c) is a vertical speed motor, (27d) is a disk (circular substrate) rotation speed meter, (27e) is a drying temperature adjustment meter, (27f) is an up / down button, (27g) is a high speed / low speed button, (27h) is a coating time display meter, (27i) is a drying time display meter, (27j) is an operation mode [automatic / manual] switch button,
(27k) is a disk size selector switch, (27l) is a start button, (27m) is a stop button, and (27n) is an emergency stop button.
上記構成の回転塗布装置（28）に於いて、先ず基板
（２）（２）…が整列保持された治具（11）をハウジン
グ（16）を介して駆動機構（15）に連結して、処理室
（23）内に直立状態の基板（２）（２）…を収容する。
次いで、二点鎖線で示すように薬液槽（21）を上昇させ
て基板（２）（２）…の下部を槽内の薬液（６′）内に
浸漬する。この状態から基板（２）（２）…を低速回転
させて、基板（２）の表裏面全周に亘って処理液
（６′）を被着させる。そして、薬液槽（21）を降下さ
せてから、次いで基板（２）を高速回転させて、基板
（２）の表裏面の余分な薬液を遠心力により振り切る。
薬液が振り切られた基板（２）には所定の量の薬液が表
裏面に保持され、均一な膜厚の薄膜が基板（２）の表裏
面全周に亘って形成される。その後、高温のN2ガスを供
給して上記薄膜を硬化させることにより保護膜（６）が
形成される。更に、加熱された処理室（23）に常温のN2
ガスを供給して冷却した後、処理室（23）内から治具
（11）ごと基板（２）（２）…を取り出して後工程に搬
送する。In the spin coater (28) having the above structure, first, the jig (11) on which the substrates (2) (2) are aligned and held is connected to the drive mechanism (15) through the housing (16). The upright substrates (2) (2) ... Are accommodated in the processing chamber (23).
Next, as shown by the chain double-dashed line, the chemical solution tank (21) is raised to immerse the lower portions of the substrates (2) (2) ... Into the chemical solution (6 ') in the tank. From this state, the substrates (2), (2) ... Are rotated at a low speed to apply the treatment liquid (6 ′) over the entire front and back surfaces of the substrate (2). Then, the chemical solution tank (21) is lowered, and then the substrate (2) is rotated at a high speed to shake off excess chemical solution on the front and back surfaces of the substrate (2) by centrifugal force.
A predetermined amount of the chemical liquid is held on the front and back surfaces of the substrate (2) from which the chemical liquid has been shaken off, and a thin film having a uniform film thickness is formed over the entire front and back surfaces of the substrate (2). After that, a high temperature N 2 gas is supplied to cure the thin film to form the protective film (6). Furthermore, N 2 at room temperature is placed in the heated processing chamber (23).
After supplying gas and cooling, the substrates (2), (2) ... Together with the jig (11) are taken out from the inside of the processing chamber (23) and transported to the subsequent step.
尚、上記実施例での基板（２）のサイズは数種類あり、
各サイズの基板に対して治具と薬液槽が用意される。ま
た、上記実施例に於ける各構成部品の材質、形状、個数
及び相対配置等は特定的な記載がない限りは本発明の範
囲をそれらのみに限定する趣旨のものではなく、例え
ば、治具に於いては、その本体部を伸長することにより
更に多数枚の基板を保持して一括処理することが可能で
あり、円板状ワークとしては上記光記録媒体である光デ
ィスク（１）に限定されず磁気記録媒体である磁気ディ
スク等にも適用可能である。There are several sizes of the substrate (2) in the above embodiment,
A jig and a chemical bath are prepared for each size substrate. Further, the material, shape, number, relative arrangement and the like of each component in the above embodiments are not intended to limit the scope of the present invention only to them unless otherwise specified. In this case, it is possible to hold a larger number of substrates and perform batch processing by extending the main body, and the disk-shaped work is limited to the optical disc (1) which is the optical recording medium. Instead, it is also applicable to a magnetic recording medium such as a magnetic disk.
発明の効果 本発明に係る回転塗布装置によれば、複数枚の円板状ワ
ークの表裏面に均一な膜厚の薄膜を一括して形成するこ
とができるので、作業性が大幅に向上すると共に設備的
に有利で、且つ、量産性に優れた装置を提供することが
できる。また、上記薄膜は複数枚のワークの表裏面に均
等な膜厚で形成されるので品質が大幅に向上する。EFFECTS OF THE INVENTION According to the spin coating apparatus of the present invention, it is possible to collectively form a thin film having a uniform film thickness on the front and back surfaces of a plurality of disc-shaped works, so that workability is greatly improved. It is possible to provide an apparatus that is advantageous in terms of equipment and excellent in mass productivity. Further, since the thin film is formed with a uniform film thickness on the front and back surfaces of a plurality of works, the quality is greatly improved.
第１図は本発明に係る回転塗布装置の一部断面部分を含
む正面図、第２図は第１図の側面図、第３図は治具の分
解斜視図、第４図は光記録媒体を示す一部拡大図を含む
平面図、第５図は光記録媒体の断面図、第６図は従来の
回転塗布装置を示す正面図である。 （２）……円形基板〔円板状ワーク〕、（６′）……薬
液、（11）……治具、（15）……駆動機構、（21）……
薬液槽、（22）……昇降機構、（23）……処理室、（2
4）……ガス供給手段、（28）……回転塗布装置。1 is a front view including a partial cross section of a spin coating apparatus according to the present invention, FIG. 2 is a side view of FIG. 1, FIG. 3 is an exploded perspective view of a jig, and FIG. 4 is an optical recording medium. FIG. 5 is a plan view including a partially enlarged view of FIG. 5, FIG. 5 is a cross-sectional view of an optical recording medium, and FIG. 6 is a front view showing a conventional spin coating apparatus. (2) ... Circular substrate [disc-shaped work], (6 ') ... Chemical solution, (11) ... Jig, (15) ... Drive mechanism, (21) ...
Chemical tank, (22) …… elevating mechanism, (23) …… processing chamber, (2
4) …… Gas supply means, (28) …… Rotary coating device.
Claims (1)
立状態に整列保持された治具（11）と、該治具（11）の
回転軸を中心に上記ワーク（２）を、その整列方向と直
交する平面内で速度調整可能に回転させる駆動機構（1
5）と、昇降機構（22）を介して、上記ワーク（２）の
下方に上下動自在に配設され、且つ、ワーク処理用の薬
液（６′）が貯溜された薬液槽（21）と、給気管（24
a）に内設したエアーヒータ（24b）により加熱可能とし
た不活性ガスを上記治具（11）に保持されたワーク
（２）及び薬液槽（21）が収容された処理室（23）に給
排するガス供給手段（24）とを具備したことを特徴とす
る回転塗布装置（28）。1. A jig (11) in which a plurality of disk-shaped works (2) are aligned and held in an upright state at a constant pitch, and the work (2) is centered around the rotation axis of the jig (11). , A drive mechanism that rotates in a plane orthogonal to the alignment direction so that the speed can be adjusted (1
5), and a chemical solution tank (21) which is vertically movable below the work (2) via an elevating mechanism (22) and stores a chemical solution (6 ′) for processing the work. , Air supply pipe (24
The inert gas, which can be heated by the air heater (24b) provided in a), is stored in the processing chamber (23) containing the workpiece (2) held in the jig (11) and the chemical liquid tank (21). A spin coating device (28) comprising a gas supply means (24) for supplying and discharging.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61230571A JPH07121381B2 (en) | 1986-09-29 | 1986-09-29 | Spin coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61230571A JPH07121381B2 (en) | 1986-09-29 | 1986-09-29 | Spin coating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6384666A JPS6384666A (en) | 1988-04-15 |
| JPH07121381B2 true JPH07121381B2 (en) | 1995-12-25 |
Family
ID=16909839
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61230571A Expired - Lifetime JPH07121381B2 (en) | 1986-09-29 | 1986-09-29 | Spin coating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07121381B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102211074A (en) * | 2010-04-07 | 2011-10-12 | 鸿富锦精密工业（深圳）有限公司 | Film coating rotary device and film coating equipment |
| CN116397304A (en) * | 2023-03-27 | 2023-07-07 | 益阳市明正宏电子有限公司 | PCB circuit board electroplating equipment |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5958631A (en) * | 1982-09-28 | 1984-04-04 | Fujitsu Ltd | Magnetic disc application method |
| JPS607957A (en) * | 1983-06-24 | 1985-01-16 | Matsushita Electric Ind Co Ltd | Both-faces coating device |
| JPS613545A (en) * | 1984-06-18 | 1986-01-09 | Victor Co Of Japan Ltd | Sampling circuit |
-
1986
- 1986-09-29 JP JP61230571A patent/JPH07121381B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6384666A (en) | 1988-04-15 |
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