JPH07180092A - Continuous surface treating device - Google Patents
Continuous surface treating deviceInfo
- Publication number
- JPH07180092A JPH07180092A JP34627293A JP34627293A JPH07180092A JP H07180092 A JPH07180092 A JP H07180092A JP 34627293 A JP34627293 A JP 34627293A JP 34627293 A JP34627293 A JP 34627293A JP H07180092 A JPH07180092 A JP H07180092A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- arc
- treated
- material layer
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims abstract description 75
- 238000007747 plating Methods 0.000 claims abstract description 67
- 239000007788 liquid Substances 0.000 claims abstract description 39
- 238000010521 absorption reaction Methods 0.000 claims description 20
- 238000004381 surface treatment Methods 0.000 claims description 17
- 239000010405 anode material Substances 0.000 claims description 10
- 239000010406 cathode material Substances 0.000 claims description 5
- 238000005498 polishing Methods 0.000 claims description 5
- 238000009713 electroplating Methods 0.000 abstract description 11
- 239000002985 plastic film Substances 0.000 abstract description 7
- 229920006255 plastic film Polymers 0.000 abstract description 7
- 238000003825 pressing Methods 0.000 abstract description 7
- 239000011347 resin Substances 0.000 abstract description 6
- 229920005989 resin Polymers 0.000 abstract description 6
- 238000003860 storage Methods 0.000 abstract description 6
- 238000004140 cleaning Methods 0.000 abstract description 3
- 229920002635 polyurethane Polymers 0.000 abstract description 3
- 239000004814 polyurethane Substances 0.000 abstract description 3
- 150000002500 ions Chemical class 0.000 abstract description 2
- 229910052751 metal Inorganic materials 0.000 description 36
- 239000002184 metal Substances 0.000 description 36
- 239000000126 substance Substances 0.000 description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 239000010949 copper Substances 0.000 description 5
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 239000011135 tin Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910001369 Brass Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229920000742 Cotton Polymers 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- -1 polyethylene Polymers 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910000978 Pb alloy Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229920005830 Polyurethane Foam Polymers 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- XMNVMZIXNKZAJB-UHFFFAOYSA-N iron(3+);lead(2+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Fe+3].[Fe+3].[Pb+2].[Pb+2] XMNVMZIXNKZAJB-UHFFFAOYSA-N 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920006327 polystyrene foam Polymers 0.000 description 1
- 239000011496 polyurethane foam Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- WWNBZGLDODTKEM-UHFFFAOYSA-N sulfanylidenenickel Chemical compound [Ni]=S WWNBZGLDODTKEM-UHFFFAOYSA-N 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】この発明は、金属板または線材及
び化学めっき等で導体化したプラスチックフィルム材の
片面に、電気めっきにより金属層及び合金層を形成する
連続めっき処理、あるいは連続電解研磨する連続表面処
理装置に係り、回転ドラムに円弧状に接触する被処理材
に浴液を含んだ円弧状の吸液構造物質層を押圧摺動させ
ながら陰極材となる被処理材と吸液構造物質層を支持す
る陽極材間に通電させることにより、大容量のめっき浴
槽が不要でかつ均一厚みのめっきが可能な連続表面処理
装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a continuous plating treatment for forming a metal layer and an alloy layer by electroplating on one side of a metal plate or a wire material and a plastic film material made conductive by chemical plating or continuous electrolytic polishing. Related to the continuous surface treatment apparatus, the material to be treated and the material to be absorbed which become the cathode material while pressing and sliding the arc-shaped liquid-absorbing structure material layer containing the bath liquid on the material to be processed that contacts the rotating drum in an arc-shape. The present invention relates to a continuous surface treatment apparatus that does not require a large-capacity plating bath and can perform plating with a uniform thickness by applying an electric current between anode materials that support layers.
【0002】[0002]
【従来の技術】従来、走行中の陰極となる金属帯と陽極
板の間にめっき液を供給しながら、電気めっきする連続
めっき装置においては、陰極となる金属帯の被めっき面
全面に亘って均一膜厚のめっき層を形成するために、金
属帯と陽極材間に均一にめっき液を供給する必要があ
り、そのためには金属帯の進行方向に向かってその両側
部にめっき液の流出(漏液)を完全に防止するためのシ
ール装置が必要であり、装置が複雑化し、また均一な厚
みのめっき層を得ることが困難であった。2. Description of the Related Art Conventionally, in a continuous plating apparatus for electroplating while supplying a plating solution between a running metal strip serving as a cathode and an anode plate, a uniform film is formed over the entire surface to be plated of the metal strip serving as a cathode. In order to form a thick plating layer, it is necessary to uniformly supply the plating solution between the metal strip and the anode material. For that purpose, the plating solution flows out (leakage liquid) to both sides of the metal strip in the traveling direction. ) Is required, a device is complicated, and it is difficult to obtain a plating layer having a uniform thickness.
【0003】[0003]
【発明が解決しようとする課題】最近、導体化した被め
っき品を陰極とし、陽極治具に接続した筆先に脱脂綿を
固着させ、前記脱脂綿にめっき液を染みこませ、導体化
した被めっき品の所要箇所にめっき層を形成する筆めっ
き法が提案されているが、導体化した被めっき品は小物
品に限定され、部分的めっきには有効であるが、走行中
の広巾の金属板、金属線あるいは化学めっき等で導体化
したプラスチックフィルムに適用することは不可能であ
った。Recently, an object to be plated, which has been made into a conductor, is used as a cathode, and absorbent cotton has been fixed to a brush tip connected to an anode jig. Although a brush plating method for forming a plating layer at a required place of is proposed, the object to be plated which is made conductive is limited to a small article and is effective for partial plating, but a wide metal plate during running, It was not possible to apply it to a metal film or a plastic film made into a conductor by chemical plating or the like.
【0004】この発明は、広幅の金属板、金属線のめっ
きや電解研磨あるいは導体化したプラスチックフィルム
にめっきを連続して行うことができる連続表面処理装置
を目的とし、大容量のめっき浴槽が不要でかつ均一厚み
のめっきが可能な連続表面処理装置の提供を目的として
いる。The object of the present invention is to provide a continuous surface treatment apparatus capable of continuously plating a wide metal plate, a metal wire, electrolytic polishing or a conductive plastic film, and does not require a large-capacity plating bath. It is an object of the present invention to provide a continuous surface treatment apparatus capable of performing uniform thickness plating.
【0005】[0005]
【課題を解決するための手段】発明者らは、走行中の広
巾の金属板、金属線あるいは化学めっきなどで導体化し
たプラスチックフィルムに、従来装置のようにシール装
置を配設することなく均一に電気めっきできる装置につ
いて種々検討した結果、巻戻しされ清浄化処理した走行
中の被処理材に、樹脂で絶縁した回転ドラム表面を被処
理材のパスラインより突出させて円弧状に面接触させ、
めっき液貯蔵槽に連結したバルブ付配管を介してめっき
液を連続流出可能にしたポリウレタン製スポンジなどの
円弧状吸液構造物質層を円弧状陽極板に固着して、陰極
となる前記被処理材の円弧面に押圧摺動させる際、吸液
構造物質の毛細管現象により、めっき液が流出しイオン
が供給され電気めっきが行われることを知見し、この発
明を完成した。SUMMARY OF THE INVENTION The inventors of the present invention have made it possible to uniformly dispose on a wide metal plate, a metal wire or a plastic film which has been made conductive by chemical plating or the like, while the vehicle is running, without disposing a sealing device unlike the conventional device. As a result of various studies on equipment capable of electroplating, the rotating drum surface insulated with resin was made to protrude from the pass line of the treated material to the treated material that had been rewound and cleaned, and then contacted in an arc shape. ,
The material to be treated, which becomes a cathode by fixing an arc-shaped liquid absorption structure material layer such as a polyurethane sponge capable of continuously flowing out the plating solution through a pipe with a valve connected to a plating solution storage tank to the arc-shaped anode plate The present invention has been completed by finding that the plating solution flows out and ions are supplied to perform electroplating due to the capillary phenomenon of the liquid absorption structure substance when the material is pressed and slid on the circular arc surface.
【0006】この発明は、被処理材と同等以上の幅を有
し電気的に絶縁された回転ドラムに、陰極材となる被処
理材を走行中に円弧状に接触可能となし、回転ドラムに
円弧状に接触する前記被処理材に対向配置した円弧状陽
極材に、めっき液または電解研磨液の浴槽より供給され
た浴液を含んだ円弧状の吸液構造物質層を配設し、円弧
状陽極材にて前記吸液構造物質層を被処理材に押圧摺動
させながら陰極材と陽極材間に通電可能となしたことを
特徴とする連続表面処理装置である。また、この発明
は、吸液構造物質層に超音波を作用させる超音波発振装
置を有する連続表面処理装置を併せて提案する。According to the present invention, a rotating drum, which has a width equal to or larger than that of a material to be treated and is electrically insulated, can contact a material to be treated as a cathode material in an arc shape during traveling. A circular arc-shaped liquid absorption structure substance layer containing a bath liquid supplied from a bath of a plating solution or an electropolishing solution is disposed on the arc-shaped anode material arranged to face the material to be processed in contact with the arc shape, The continuous surface treatment apparatus is characterized in that an electric current can be applied between the cathode material and the anode material while pressing and sliding the liquid absorbing structure substance layer on the material to be treated with the arc-shaped anode material. In addition, the present invention also proposes a continuous surface treatment apparatus having an ultrasonic wave oscillating device that applies ultrasonic waves to the liquid absorption structure material layer.
【0007】この発明において、被処理材としては、種
々の金属板または線材及び化学めっき等で導体化した各
種プラスチックフィルム材などが適用でき、これらに円
弧状に接触させるための回転ドラムは電気的に絶縁され
ればいずれの材質でもよいが、例えば、ステンレス鋼製
ドラムの外周面に、硬くて滑り性が良好かつ耐薬品性の
すぐれたフッ素樹脂、4フッ化エチレン等の樹脂が被覆
された構造が採用できる。回転ドラムの幅は被処理材の
幅より広くすることにより、被処理材全幅に電気めっき
でき、また、幅の狭い複数の被処理材を同時に電気めっ
きすることもできる。In the present invention, as the material to be treated, various metal plates or wires and various plastic film materials which are made conductive by chemical plating or the like can be applied, and the rotary drum for contacting these in an arc shape is electrically. Although any material may be used as long as it is insulated to, for example, the outer peripheral surface of the stainless steel drum is coated with a resin such as fluororesin, tetrafluoroethylene or the like which is hard and has good slipperiness and excellent chemical resistance. The structure can be adopted. By making the width of the rotary drum wider than the width of the material to be processed, the entire width of the material to be processed can be electroplated, and a plurality of materials having a narrow width can be electroplated at the same time.
【0008】この発明において、吸液構造物質層は、め
っき液または電解研磨液の浴槽より供給された浴液を含
み、連続して流出させることができれば、公知のいずれ
の材質も利用でき、例えば、ポリウレタンフォーム、ポ
リエチレンフォーム、ポリスチレンフォーム、カーボ
ン、脱脂綿、フェルト、ガラス繊維発泡アルミ等の有機
物、無機物からなるものが適用でき、その性状としては
比重が0.02%/cm3〜0.05%/cm3、気孔率
が60%〜90%、気孔径が0.05mm〜1.0m
m、引張強さ4kg/mm2〜6kg/mm2のものが好
ましく、厚みは10mm〜100mmが好ましい。ま
た、厚みは同一厚でもよいが、被処理材の入口側の厚み
を厚くし、出口側の厚みを薄くして、厚みを不同にする
ことにより、電流密度を変化させて、合金比率を変化さ
せることもでき、さらに、一体物でもよいが、被処理材
の進行方向に分割にして、各分割ごとに浴液温度、濃
度、電圧を変えることにより、各分割部における電流密
度をそれぞれの条件を変化させて合金比率を変えること
ができる。In the present invention, the liquid-absorbing structure material layer contains any bath liquid supplied from the bath of the plating liquid or the electropolishing liquid, and any known material can be used as long as it can be continuously discharged. Polyurethane foam, polyethylene foam, polystyrene foam, carbon, absorbent cotton, felt, glass fiber foamed aluminum, and other organic and inorganic materials can be applied, and their specific gravity is 0.02% / cm 3 to 0.05%. / Cm 3 , porosity 60% to 90%, pore diameter 0.05 mm to 1.0 m
m, preferably has a tensile strength of 4kg / mm 2 ~6kg / mm 2 , thickness 10mm~100mm is preferred. Although the thicknesses may be the same, the thickness of the material to be treated on the inlet side is increased and the thickness on the outlet side is decreased to make the thicknesses unequal to change the current density and change the alloy ratio. In addition, although it may be an integral body, it is divided in the traveling direction of the material to be treated, and the bath liquid temperature, concentration, and voltage are changed for each division, so that the current density in each divided portion can be adjusted under different conditions. Can be changed to change the alloy ratio.
【0009】この発明において、前記吸液構造物質層の
円弧状の角度は吸液構造物質層の入口側、出口側の両端
部と前記回転ドラムの中心点を結ぶ角度は60度〜12
0度が好ましい。また、吸液構造物質層を被処理材へ押
圧する方法としては、吸液構造物質層を配設する円弧状
陽極材自体あるいは円弧状陽極材を別の円弧状押圧部材
にて、ねじ式、ばね式、エアシリンダー等を介して、種
々の押圧力に調整することができ、押圧力は100g/
cm2〜200g/cm2が好ましく、100g/cm2
未満では得られるめっきの光沢性が乏しく、200g/
cm2を越えると光沢性、平滑性が悪くなり、キズ等の
発生の問題があるので好ましくない。In the present invention, the arc-shaped angle of the liquid-absorbent structure material layer is between the inlet and outlet sides of the liquid-absorbent structure material layer and the center point of the rotary drum, and the angle is 60 to 12 degrees.
0 degree is preferable. Further, as a method of pressing the liquid-absorbing structure material layer to the material to be treated, a circular arc-shaped anode material itself for disposing the liquid-absorbing structure material layer or the arc-shaped anode material with another arc-shaped pressing member is screwed, It can be adjusted to various pressing forces via a spring type, air cylinder, etc., and the pressing force is 100 g /
Preferably cm 2 ~200g / cm 2, 100g / cm 2
If it is less than 200 g / g
If it exceeds cm 2 , glossiness and smoothness are deteriorated, and there is a problem of generation of scratches, which is not preferable.
【0010】この発明において、陰極板は前述のごとく
被処理材であり、各種の金属板や金属線の外にプラスチ
ックフィルム材の表面に導電性コーティングや化学めっ
き等で導体化したものも使用でき、前処理として、表面
の脱脂、化学研削、洗浄等の清浄化処理を施すことが好
ましい。また、陽極板としては溶解電極、未溶解電極の
いずれも使用することができ、溶解電極として、電解気
銅、無酸素銅、含燐銅、電解気ニッケル、高硫黄ニッケ
ル、カーボナイズドニッケル、亜鉛、錫、半田、黄銅を
用いることができ、不溶解電極としては鉛合金、純鉛フ
ェライト、白金被覆チタン、炭素、純鉛、白金等を用い
ることができる。さらに、電解研磨にはステンレス、白
金被覆チタン、電気ニッケル等を用いることができる。In the present invention, the cathode plate is a material to be treated as described above, and various metal plates and metal wires, as well as plastic film material whose surface is made conductive by conductive coating or chemical plating, can be used. As the pretreatment, cleaning treatment such as degreasing of the surface, chemical grinding, and washing is preferably performed. Further, as the anode plate, either a melting electrode or a non-melting electrode can be used, and as the melting electrode, electrolytic gas copper, oxygen-free copper, phosphorus-containing copper, electrolytic gas nickel, high sulfur nickel, carbonized nickel, zinc , Tin, solder and brass can be used, and as the insoluble electrode, lead alloy, pure lead ferrite, platinum-coated titanium, carbon, pure lead, platinum and the like can be used. Further, stainless steel, platinum-coated titanium, electric nickel or the like can be used for electrolytic polishing.
【0011】この発明による連続表面処理装置を用いて
めっきあるいは研磨速度を向上させるためには、吸液構
造物質層の金属帯出口側に超音波発振装置を配設するこ
とが好ましく、超音波発振装置の設置により被処理材に
発生するH2ガス、O2ガスなどを速やかに除去すること
ができる。超音波発振装置の発振周波数は20kHz〜
47kHz、出力は30W〜300Wが好ましい。ま
た、吸液構造物質層の幅は、被処理材の全面に電気めっ
きする場合は、少なくとも被処理材と同等以上にする
が、吸液構造物質層と陽極板の幅を被処理材の幅より狭
くすることにより、被処理材の所要位置に部分ストライ
プめっきすることができ、さらに被処理材の所要位置に
マスキングを施しておけば、飛び飛びで部分めっきする
ことができる。なお、吸液構造物質層及び回転ドラムの
幅は陽極板、被処理材幅より広くする必要があるが、前
記吸液構造物質層が陰極板の被処理材に押圧摺動する場
合は陰極板の幅と同一になるようにしなければならな
い。In order to improve the plating or polishing rate using the continuous surface treatment apparatus according to the present invention, it is preferable to dispose an ultrasonic oscillating device on the metal band outlet side of the liquid absorbing structure material layer. By installing the apparatus, H 2 gas, O 2 gas, etc. generated in the material to be processed can be quickly removed. The oscillation frequency of the ultrasonic oscillator is 20 kHz
47 kHz, and the output is preferably 30 W to 300 W. When electroplating the entire surface of the material to be treated, the width of the liquid-absorbing structure material layer should be at least equal to or greater than that of the material to be treated. By making it narrower, it is possible to carry out partial stripe plating at a required position on the material to be treated, and if masking is performed at a required position on the material to be treated, it is possible to carry out partial plating in a scattered manner. The width of the liquid absorption structure material layer and the rotary drum must be wider than the width of the anode plate and the material to be processed.If the liquid absorption structure material layer is pressed and slid on the material to be processed of the cathode plate, the cathode plate Must be the same as the width of.
【0012】この発明においては、めっき被膜は接触摺
動中にコロイド状に除去されると同時に新しいめっき液
の供給により、平滑な光沢あるめっき被膜が得られ、そ
の後水洗処理する。めっき被膜厚は0.1μm〜10μ
mであり、被処理材の走行速度は0.03m/分〜0.
3m/分が好ましい。また、めっき被膜厚は、被処理材
の走行速度と電流密度を適宜選定することにより制御で
きる。In the present invention, the plating film is removed in a colloidal form during sliding contact, and at the same time, a new plating solution is supplied to obtain a smooth and glossy plating film, which is then washed with water. Plating film thickness is 0.1 μm to 10 μm
and the traveling speed of the material to be treated is 0.03 m / min to 0.
3 m / min is preferred. The plating film thickness can be controlled by appropriately selecting the traveling speed and current density of the material to be processed.
【0013】[0013]
【作用】この発明の作用を図面に基づいて詳述する。こ
こでは、被処理材が金属板の場合について説明する。図
1はこの発明による連続表面処理装置の構成を示す説明
図である。図2は図1の連続表面処理装置の要部の構成
を示す縦断説明図である。巻戻しドラム1から巻戻しさ
れた被めっき金属帯2は金属の清浄化処理のために連続
処理装置3を通過後、ドライブローラー4、テンション
ローラー5を介して、入口側給電ガイドローラー6に送
られる。表面に絶縁樹脂を被覆した回転ドラム7の上表
面は前記給電ガイドローラー6の位置より高位置に配設
され、金属帯2は陰極として、前記回転ドラム7の上表
面に円弧状に面接触しながら、出口側給電ガイドローラ
ー8、ドライブローラー9を介して水洗乾燥連続装置1
0に送られて、巻取りドラム17にて巻き取られる。前
記回転ドラム7に円弧状に面接触された陰極の金属帯2
の上面には、円弧状陽極板13に固着された円弧状吸液
構造物質層14が当接し、めっき液貯蔵槽11よりバブ
ル付パイプ12を介して吸液構造物質層14にめっき液
が供給され、また、円弧状陽極板13の支持具15がエ
アーシリンダ16にて押圧可能に構成され、めっき液は
前記エアーシリンダ16にて吸液構造物質層14が金属
帯2に押圧摺動する際に毛細管現象により流出されると
共に電気めっきが行われ、前記吸液構造物質層側の金属
帯2面に電気めっき層が形成される。なお、吸液構造物
質層14及び円弧状陽極板13の上部に超音波発振装置
18を設置して金属帯2に発生するH2ガス、O2ガスな
どの除去を行い、めっき液貯蔵槽11では、ヒーターと
撹拌機を備え、温度計で液温を所定温度に保持し、ま
た、回転ドラム7下方には水槽を設けて、出口側で回転
ドラム7を水洗するとともに、入口側ではエアーブロー
で水切りを行っている。The operation of the present invention will be described in detail with reference to the drawings. Here, the case where the material to be processed is a metal plate will be described. FIG. 1 is an explanatory view showing the structure of a continuous surface treatment apparatus according to the present invention. FIG. 2 is a vertical cross-sectional explanatory view showing a configuration of a main part of the continuous surface treatment apparatus of FIG. The metal strip 2 to be plated that has been unwound from the rewinding drum 1 passes through the continuous processing device 3 for cleaning the metal, and then is sent to the inlet-side power feeding guide roller 6 via the drive roller 4 and the tension roller 5. To be The upper surface of the rotating drum 7 whose surface is coated with an insulating resin is disposed at a position higher than the position of the power feeding guide roller 6, and the metal strip 2 serves as a cathode and makes an arc-shaped surface contact with the upper surface of the rotating drum 7. Meanwhile, the continuous washing and drying device 1 through the outlet side power feeding guide roller 8 and the drive roller 9
It is sent to 0 and wound up by the winding drum 17. Metal strip 2 of the cathode which is in surface contact with the rotating drum 7 in an arc shape.
The arc-shaped liquid absorption structure material layer 14 fixed to the arc-shaped anode plate 13 is in contact with the upper surface of the plate, and the plating solution is supplied from the plating solution storage tank 11 to the liquid absorption structure material layer 14 via the pipe 12 with bubbles. In addition, the support member 15 of the arc-shaped anode plate 13 is configured to be pressed by the air cylinder 16, and the plating solution is used when the liquid absorption structure material layer 14 is pressed and slid on the metal strip 2 by the air cylinder 16. And is electroplated while flowing out by a capillary phenomenon, and an electroplating layer is formed on the surface of the metal strip 2 on the liquid absorption structure material layer side. An ultrasonic oscillator 18 is installed on the liquid absorption structure material layer 14 and the arc-shaped anode plate 13 to remove H 2 gas, O 2 gas, etc. generated in the metal strip 2, and the plating solution storage tank 11 is removed. Is equipped with a heater and a stirrer, the liquid temperature is kept at a predetermined temperature with a thermometer, and a water tank is provided below the rotary drum 7 to wash the rotary drum 7 with water on the outlet side and air blow on the inlet side. I'm draining.
【0014】図1及び図2では、走行する金属帯2の上
面側を回転ドラム7にて円弧状に突出させて、吸液構造
物質層14を当接させる例を示したが、図3のA,Bに
示すごとく、逆の配置とすることもできる。すなわち、
図3のAに示す例では、走行する金属帯2の下面側を回
転ドラム7にて円弧状に突出させて、吸液構造物質層2
4を当接させるもので、支持具21を上下動可能に保持
する圧力調整装置22を用い、内面に円弧状吸液構造物
質層24を固着した円弧状陽極板23を円弧状の支持具
21に載置して、金属帯2の円弧面に所定の圧力で押圧
し、めっき液貯蔵槽25から配管で供給されるめっき液
が金属帯2に押圧摺動する際に毛細管現象により流出さ
れると共に電気めっきが行われる。図3のBに示す例で
は、めっき液浴槽30内に配置する円弧状支持台31
に、内面に円弧状吸液構造物質層32を固着した円弧状
陽極板33を載置して、走行する金属帯2の下面側を回
転ドラム7にて所定の圧力で押圧して円弧状に突出させ
ることにより、浴槽30内のめっき液を吸い上げている
吸液構造物質層32に金属帯2が押圧摺動する際に毛細
管現象により流出されると共に電気めっきが行われる。1 and 2 show an example in which the upper surface side of the running metal band 2 is projected in an arc shape by the rotating drum 7 and the liquid absorbing structure material layer 14 is brought into contact with it. As shown in A and B, the arrangement may be reversed. That is,
In the example shown in FIG. 3A, the lower surface side of the running metal band 2 is projected in an arc shape by the rotating drum 7 to allow the liquid absorption structure material layer 2
4, a pressure adjusting device 22 for holding the support 21 so that it can move up and down is used, and an arc-shaped anode plate 23 having an arc-shaped liquid absorbing structure material layer 24 fixed to the inner surface thereof is used as the arc-shaped support 21. Placed on the metal strip 2 and pressed against the arc surface of the metal strip 2 with a predetermined pressure, and when the plating solution supplied from the plating solution storage tank 25 through the pipe slides against the metal strip 2 by pressure, it flows out by a capillary phenomenon. At the same time, electroplating is performed. In the example shown in B of FIG. 3, an arcuate support base 31 arranged in the plating solution bath 30.
The arc-shaped anode plate 33 having the arc-shaped liquid absorbing structure material layer 32 adhered to the inner surface thereof is placed on the lower surface of the running metal strip 2 by the rotating drum 7 with a predetermined pressure to form an arc shape. When the metal strip 2 is pressed and slid on the liquid absorption structure material layer 32 sucking up the plating solution in the bath 30, the metal layer 2 is caused to flow out by a capillary phenomenon and electroplating is performed.
【0015】また、図3のCに示す例は、めっきの合金
比率を変化させるための装置例であり、前述した図1及
び図2の構成において、円弧状陽極板13及び吸液構造
物質層14を走行方向に所要数に分割し、分割した吸液
構造物質層141,142,143にそれぞれ供給するめ
っき液の浴液温度、濃度を変えることにより、また、分
割した陽極板131,132,133にそれぞれ供給する
電圧を変えることにより、各分割部における電流密度を
それぞれの条件を変化させて合金比率を変えることがで
きる。The example shown in C of FIG. 3 is an example of an apparatus for changing the alloy ratio of plating. In the configuration of FIGS. 1 and 2 described above, the arc-shaped anode plate 13 and the liquid absorption structure material layer are provided. 14 is divided into a required number in the running direction and the bath liquid temperature and concentration of the plating solution supplied to the divided liquid absorption structure material layers 14 1 , 14 2 and 14 3 are changed, respectively. By changing the voltage supplied to each of 1 , 13 2 and 13 3 , the alloy density can be changed by changing each condition of the current density in each divided portion.
【0016】[0016]
実施例 図1に示す連続表面処理装置の陽極板として幅28mm
×厚み0.2mmの表1に示す円弧状の金属板を用い、
また絶縁樹脂回転ドラムとしては直径998mmのステ
ンレス製ドラム外周面に厚み2mmのフッ素樹脂コーテ
ィングした直径1mのものを用いた。前記回転ドラムを
回転数0.3rpmにて回転させながら、幅26mm×
厚み0.2m寸法は表2に示す各種の金属板を陰極板と
して、表3に示す送り速度で移送し、また前記陽極板に
固着し、前記回転ドラムの中心点より60°の開度を有
する幅48mm×厚み70mmの円弧状ポリウレタン製
スポンジ層を前記陰極板に接触圧150g/cm2にて
押圧摺動させながら、上方のめっき液貯蔵層よりパイプ
を介して、前記陽極板を貫通して、前記スポンジ層に充
満しためっき液は前記スポンジ層の押圧摺動の間、前記
スポンジ層よりめっき液は毛細管現象により流出し、表
3に示すめっき条件にて電気めっきした。Example 28 mm wide as an anode plate of the continuous surface treatment apparatus shown in FIG.
× Using an arc-shaped metal plate shown in Table 1 having a thickness of 0.2 mm,
As the insulating resin rotating drum, a drum having a diameter of 998 mm and a fluorine resin coating of 2 mm in thickness on the outer peripheral surface of a stainless steel drum having a diameter of 1 m was used. While rotating the rotary drum at a rotation speed of 0.3 rpm, a width of 26 mm ×
A thickness of 0.2 m is obtained by transferring various metal plates shown in Table 2 as cathode plates at the feed rates shown in Table 3 and fixing the plates to the anode plate at an opening of 60 ° from the center of the rotary drum. An arc-shaped polyurethane sponge layer having a width of 48 mm and a thickness of 70 mm is slid on the cathode plate at a contact pressure of 150 g / cm 2 while penetrating the anode plate from the upper plating solution storage layer through a pipe. The plating solution filled in the sponge layer flowed out of the sponge layer due to a capillary phenomenon during the pressure sliding of the sponge layer, and electroplating was performed under the plating conditions shown in Table 3.
【0017】陰極板の金属帯に被覆されためっき性状を
表4に示す。密着性はめっき面に設けた1mm角の碁盤
目に粘着テープを張り、剥離した目の数で評価した。光
沢は目視検査により、良好が○、一部に変色が見られる
場合は△で評価した。また、被膜欠陥は400倍の光学
顕微鏡似て目視検査し、良好が○、一部に欠陥が見られ
る場合は△で評価した。さらに、ウイスカーは400倍
の光学顕微鏡似て目視検査し、0.1mm以上の本数で
評価した。Table 4 shows the plating properties of the metal strip of the cathode plate. Adhesiveness was evaluated by sticking an adhesive tape on a 1 mm square board provided on the plated surface and measuring the number of peeled eyes. The gloss was evaluated by visual inspection as good, and as a part of discoloration was evaluated as fair. Further, the film defects were visually inspected with a 400 × optical microscope, and evaluated as “good”, and “fair” when some defects were observed. Further, the whiskers were visually inspected with a 400 times optical microscope, and evaluated with a number of 0.1 mm or more.
【0018】比較例 めっき液槽の表1に示しためっき液内に浸漬された寸法
長さ100mm×幅50mm×厚さ0.3mmのCu板
(比較例1)及び同寸法のCu/ステンレス/Niの3
層クラッド板(比較例2)を陰極板とし、陽極板として
寸法長さ180mm×巾90mm厚み2mmの黄銅板
(比較例1)、Sn板(比較例2)を用い、表1に示す
めっき条件にて、電気めっきを行い、陰極板に被覆され
た黄色めっき槽(比較例1)及び錫めっき層(比較例
2)の性状を実施例と同一方法で評価し、表4に示す。Comparative Example Cu plate having dimensions of 100 mm length × 50 mm width × 0.3 mm thickness immersed in the plating solution shown in Table 1 of the plating solution tank (Comparative Example 1) and Cu / stainless steel of the same size / Ni 3
The layer clad plate (Comparative Example 2) was used as a cathode plate, and the anode plate was a brass plate (Comparative Example 1) having a length of 180 mm × width of 90 mm and thickness of 2 mm, and Sn plate (Comparative Example 2). The properties of the yellow plating tank (Comparative Example 1) and the tin plating layer (Comparative Example 2) coated on the cathode plate by electroplating were evaluated in the same manner as in Examples, and shown in Table 4.
【0019】[0019]
【表1】 [Table 1]
【0020】[0020]
【表2】 [Table 2]
【0021】[0021]
【表3】 [Table 3]
【0022】[0022]
【表4】 [Table 4]
【0023】[0023]
【発明の効果】この発明による連続表面処理装置は、従
来のごとき大容量のめっき槽が不要で装置を小型化で
き、かつ作業環境を良好にすることができる。また、電
極間距離が一定となることから、めっき膜厚みのばらつ
きを少なくでき、さらに、吸液構造物質層厚みを被処理
材の入口側を厚く、出口側を薄くと相違させることによ
り、合金めっきの場合、合金比率を変えることができ
る。また、連続表面処理装置の回転ドラム幅を広くし、
陽極板、被処理材の幅を狭くすることにより、同時に数
条の被処理材にめっき処理することができ、めっき被膜
欠陥が少なく、光沢平滑性が向上し、さらに、高速度め
っき処理を実施することができる。As described above, the continuous surface treatment apparatus according to the present invention does not require a large-capacity plating tank as in the prior art, can downsize the apparatus, and can improve the working environment. Further, since the distance between the electrodes is constant, it is possible to reduce the variation in the thickness of the plating film, and further, by making the liquid absorption structure material layer thickness thick on the inlet side of the material to be treated and thin on the outlet side, the alloy In the case of plating, the alloy ratio can be changed. Also, widen the rotating drum width of the continuous surface treatment device,
By narrowing the width of the anode plate and the material to be treated, it is possible to perform plating treatment on several treatment materials at the same time, there are few plating film defects, gloss smoothness is improved, and high-speed plating treatment is performed. can do.
【図1】この発明による連続表面処理装置の構成を示す
説明図である。FIG. 1 is an explanatory diagram showing a configuration of a continuous surface treatment apparatus according to the present invention.
【図2】図1のこの発明による連続表面処理装置の要部
の構成を示す縦断説明図である。FIG. 2 is a vertical cross-sectional explanatory view showing a configuration of a main part of the continuous surface treatment apparatus according to the present invention in FIG.
【図3】A,B,Cはそれぞれこの発明による連続表面
処理装置の要部の他の構成を示す縦断説明図である。3A, 3B and 3C are longitudinal explanatory views showing another configuration of the main part of the continuous surface treatment apparatus according to the present invention.
1 巻戻しドラム 2 金属帯 3 連続処理装置 4 ドライブローラー 5 テンションローラー 6 入口側給電ガイドローラー 7 回転ドラム 8 出口側給電ガイドローラー 9 ドライブローラー 10 水洗乾燥連続装置 11,25 めっき液貯蔵槽 12 バブル付パイプ 13,131,132,133,23,33 陽極板 14,141,142,143,24,32 吸液構造物
質層 15 支持具 16 エアーシリンダ 17 巻取りドラム 18 超音波発振装置 21 支持具 22 圧力調整装置 30 めっき液浴槽1 Rewinding Drum 2 Metal Band 3 Continuous Processing Device 4 Drive Roller 5 Tension Roller 6 Inlet-side Power Supply Guide Roller 7 Rotating Drum 8 Outlet-side Power Supply Guide Roller 9 Drive Roller 10 Rinsing / Drying Continuous Device 11, 25 Plating Solution Storage Tank 12 With Bubble Pipes 13, 13 1 , 13 2 , 13 3 , 23, 33 Anode plates 14, 14 1 , 14 2 , 14 3 , 24, 32 Liquid absorption structure material layer 15 Support 16 Air cylinder 17 Winding drum 18 Ultrasonic oscillation Device 21 Support 22 Pressure regulator 30 Plating bath
Claims (2)
絶縁された回転ドラムに、陰極材となる被処理材を走行
中に円弧状に接触可能となし、回転ドラムに円弧状に接
触する前記被処理材に対向配置した円弧状陽極材に、め
っき液または電解研磨液の浴槽より供給された浴液を含
んだ円弧状の吸液構造物質層を配設し、円弧状陽極材に
て前記吸液構造物質層を被処理材に押圧摺動させながら
陰極材と陽極材間に通電可能となしたことを特徴とする
連続表面処理装置。1. A rotating drum, which has a width equal to or larger than that of a material to be treated and is electrically insulated, allows a material to be treated, which is a cathode material, to be in an arcuate shape while running, and the rotating drum has an arcuate shape. The arc-shaped anode material disposed in opposition to the material to be treated, which is in contact with the arc-shaped anode material, is provided with an arc-shaped liquid absorption structure material layer containing a bath solution supplied from a bath of a plating solution or an electrolytic polishing solution. A continuous surface treatment apparatus characterized in that a current can be applied between a cathode material and an anode material while the liquid absorption structure material layer is pressed and slid on the material to be treated by the material.
音波発振装置を有することを特徴とする請求項1に記載
の連続表面処理装置。2. The continuous surface treatment apparatus according to claim 1, further comprising an ultrasonic wave oscillating device that applies ultrasonic waves to the liquid absorption structure material layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34627293A JP3291103B2 (en) | 1993-12-22 | 1993-12-22 | Continuous surface treatment equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34627293A JP3291103B2 (en) | 1993-12-22 | 1993-12-22 | Continuous surface treatment equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07180092A true JPH07180092A (en) | 1995-07-18 |
| JP3291103B2 JP3291103B2 (en) | 2002-06-10 |
Family
ID=18382284
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP34627293A Expired - Lifetime JP3291103B2 (en) | 1993-12-22 | 1993-12-22 | Continuous surface treatment equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3291103B2 (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006033315A1 (en) * | 2004-09-24 | 2006-03-30 | Ibiden Co., Ltd. | Plating method and plating apparatus |
| JP2010225360A (en) * | 2009-03-23 | 2010-10-07 | Honda Motor Co Ltd | Manufacturing method of fuel cell separator |
| US8128790B2 (en) | 2006-01-30 | 2012-03-06 | Ibiden Co., Ltd. | Plating apparatus and plating method |
| US8679576B2 (en) | 2006-02-22 | 2014-03-25 | Ibiden Co., Ltd. | Plating apparatus and method of plating |
| US20160108534A1 (en) * | 2014-10-17 | 2016-04-21 | Ut-Battelle, Llc | Aluminum deposition devices and their use in spot electroplating of aluminum |
| JP2016196700A (en) * | 2015-04-03 | 2016-11-24 | 株式会社ケミカル山本 | Antibacterial treatment method for stainless steel surface |
| US10208391B2 (en) | 2014-10-17 | 2019-02-19 | Ut-Battelle, Llc | Aluminum trihalide-neutral ligand ionic liquids and their use in aluminum deposition |
| CN110117805A (en) * | 2019-05-16 | 2019-08-13 | 浙江宝利特新能源股份有限公司 | A kind of single side shielding electroplanting device and its production method for being segmented welding |
| CN112941604A (en) * | 2021-01-25 | 2021-06-11 | 沛县卓凡科技服务中心 | Electroplating method for precision instrument |
| WO2022014316A1 (en) * | 2020-07-14 | 2022-01-20 | 三菱電機株式会社 | Plating electrode, plating device, and plating method |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2025106911A (en) * | 2024-01-05 | 2025-07-17 | 株式会社日立製作所 | Plating apparatus and plating method |
-
1993
- 1993-12-22 JP JP34627293A patent/JP3291103B2/en not_active Expired - Lifetime
Cited By (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006033315A1 (en) * | 2004-09-24 | 2006-03-30 | Ibiden Co., Ltd. | Plating method and plating apparatus |
| US7481909B2 (en) * | 2004-09-24 | 2009-01-27 | Ibiden Co., Ltd. | Plating apparatus, plating method and multilayer printed circuit board |
| US7897027B2 (en) | 2004-09-24 | 2011-03-01 | Ibiden Co., Ltd. | Plating apparatus, plating method and multilayer printed circuit board |
| US8197659B2 (en) | 2004-09-24 | 2012-06-12 | Ibiden Co., Ltd. | Plating apparatus, plating method and multilayer printed circuit board |
| JP4992428B2 (en) * | 2004-09-24 | 2012-08-08 | イビデン株式会社 | Plating method and plating apparatus |
| US8383956B2 (en) | 2004-09-24 | 2013-02-26 | Ibiden Co., Ltd. | Plating apparatus, plating method and multilayer printed circuit board |
| US8721863B2 (en) | 2006-01-30 | 2014-05-13 | Ibiden Co., Ltd. | Plating apparatus and plating method |
| US8128790B2 (en) | 2006-01-30 | 2012-03-06 | Ibiden Co., Ltd. | Plating apparatus and plating method |
| US8679576B2 (en) | 2006-02-22 | 2014-03-25 | Ibiden Co., Ltd. | Plating apparatus and method of plating |
| JP2010225360A (en) * | 2009-03-23 | 2010-10-07 | Honda Motor Co Ltd | Manufacturing method of fuel cell separator |
| US20160108534A1 (en) * | 2014-10-17 | 2016-04-21 | Ut-Battelle, Llc | Aluminum deposition devices and their use in spot electroplating of aluminum |
| US10208391B2 (en) | 2014-10-17 | 2019-02-19 | Ut-Battelle, Llc | Aluminum trihalide-neutral ligand ionic liquids and their use in aluminum deposition |
| US10781525B2 (en) | 2014-10-17 | 2020-09-22 | Ut-Battelle, Llc | Aluminum trihalide-neutral ligand ionic liquids and their use in aluminum deposition |
| JP2016196700A (en) * | 2015-04-03 | 2016-11-24 | 株式会社ケミカル山本 | Antibacterial treatment method for stainless steel surface |
| CN110117805A (en) * | 2019-05-16 | 2019-08-13 | 浙江宝利特新能源股份有限公司 | A kind of single side shielding electroplanting device and its production method for being segmented welding |
| WO2022014316A1 (en) * | 2020-07-14 | 2022-01-20 | 三菱電機株式会社 | Plating electrode, plating device, and plating method |
| CN112941604A (en) * | 2021-01-25 | 2021-06-11 | 沛县卓凡科技服务中心 | Electroplating method for precision instrument |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3291103B2 (en) | 2002-06-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US2540602A (en) | Method and apparatus for the surface treatment of metals | |
| JP3291103B2 (en) | Continuous surface treatment equipment | |
| US5277785A (en) | Method and apparatus for depositing hard chrome coatings by brush plating | |
| US5837120A (en) | Method and apparatus for electrochemical processing | |
| US3799848A (en) | Method for electrolytically coating anodized aluminum with polymers | |
| US2750332A (en) | Method and apparatus for electrodeposition of a layer of uniform thickness on a conductive surface | |
| JP4681789B2 (en) | Elastic contact elements | |
| KR101018838B1 (en) | Apparatus and method for electropolishing of metal tapes | |
| JPH04263090A (en) | Device for electrocoating metal and anode assembly and anode for use in said device | |
| JP4212905B2 (en) | Plating method and plating apparatus used therefor | |
| US2494954A (en) | Apparatus for continuous anodizing of sheet metal | |
| JPH0338352B2 (en) | ||
| US3527678A (en) | Method of continuously treating the surfaces of the edge portions of metal sheets | |
| KR20160058557A (en) | Belt-type Electroforming Apparatus | |
| JP5849941B2 (en) | Metal film forming apparatus and film forming method | |
| US4948487A (en) | Electrolytic processing apparatus for metallic members | |
| US3261771A (en) | Method and apparatus for electroplating on a plastic web having a high resistance cobalt alloy coating | |
| US3259556A (en) | Ribbon electroplating method | |
| JP2004027283A (en) | Plating equipment and wire tools | |
| JPH06235089A (en) | Anodic oxidation treatment device for base for lithographic printing plate | |
| JP2003147582A (en) | Continuous wet treatment method and apparatus and liquid sealing method and device | |
| US4010083A (en) | Method of local electroplating of strip material | |
| KR20100038734A (en) | Apparatus and method for electro polishing a metal tape surface | |
| JPH06117970A (en) | Structure of liquid supply pipe | |
| JPH01234590A (en) | Partial plating device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313115 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 6 Free format text: PAYMENT UNTIL: 20080322 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090322 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 8 Free format text: PAYMENT UNTIL: 20100322 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100322 Year of fee payment: 8 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110322 Year of fee payment: 9 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 10 Free format text: PAYMENT UNTIL: 20120322 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130322 Year of fee payment: 11 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 12 Free format text: PAYMENT UNTIL: 20140322 |
|
| EXPY | Cancellation because of completion of term |