JPH08239799A - Spinning equipment for small items - Google Patents

Abstract

(57) [Summary] [Purpose] The objective is to be able to obtain a sufficient and uniform plating layer in a short time. [Composition] A contact ring for pressing an object to be plated between the outer peripheral lower surface of a lower open bowl-shaped resin dome with an open upper end, and an outer peripheral upper surface of a resin bottom plate, and a porous ring through which processing liquid flows and scatters. The cells are joined together to form a cell, the upper end of a conductive drive shaft that is perpendicular to the lower surface of the central portion of the conductive rotary plate that supports the cell in a non-rotatable manner and that carries electricity with the contact ring is fixed, and a contact brush is attached to the shaft. A rotary plating apparatus for small articles, which is characterized in that it is pressed and connected to a negative electrode, an anode basket is arranged in the dome, and a cover for covering the cell is provided.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION The present invention relates to, for example, powder (5 to 10).
0 μm), chip capacitors, diodes, connectors, reed switches, nails, bolts, nuts, washers, etc.

[0002]

2. Description of the Related Art Conventionally, on a revolution disk fixed to the upper end of a vertical drive shaft, two rotation containers which are driven in opposite directions about the vertical shaft are provided at two locations on the same circumference. There is proposed a device (product name: ROTARY-CHROMER) for plating the small object (processing object) and the plating solution by centrifugal force against the inner surface of the revolving outer side of the container. However, in that device, the amount of the plating solution in the container is limited (it is a small amount), and the concentration of the plating solution changes with the passage of time. It is not possible to continuously perform multiple steps including steps with one device.

Further, an automatic chrome plating apparatus shown in FIG. 11 (Japanese Patent Publication No. 41-20684, US Pat. No. 3,359,919).
No. 5) is proposed. Its structure is as shown in FIG.
111 is a rotating body, 112 is a delivery path, 113 is a mortar-shaped inner surface, 114 is a cathode net, 115 and 115 'are anode plates, 11
6 is an anode electrode, 117 is an operating rod, 118 is a valve, 119 is a bearing, 120 is a pulley, 121 is an inlet, 122 is a locking piece, 123 is an insulator, and 124 is a screw as an example of an object to be plated, 126 is provided with a conductive wire, 127 is provided with a conductive plate and the like, and by rotating the rotating body 111 intermittently and raising and lowering it 3 to 4 times until the object to be plated is finished, and changing the body position in close contact with the cathode net 114, it is made uniform. It is a product that can be obtained with high quality chrome plating. However, in that device, the amount of plating solution in the container is limited (it does not circulate with the circulation tank,
(It is a small amount once put in the container), and since the concentration of the plating solution changes with the passage of time, it is not possible to obtain a sufficient plating layer thickness and it is not possible to perform a plating treatment with a high current density. Further, when the valve 118 is raised to drain the plating solution, the objects to be treated are simultaneously withdrawn, so that it is not possible to continuously perform multiple steps including the plating step.

Conventionally, a barrel made of a perforated plate having a hexagonal tubular shape is gently rotated (for example, at 20 rpm) in a treatment liquid in a treatment tank in a posture in which the hexagonal cylinder is horizontal, and an object to be treated is placed in the barrel. A barrel method is also well known in which a cable having a negative electrode (dangular) is inserted into the tip so as to come into contact with, and the anode is arranged outside the barrel. However, in that case, a large amount of dummy (for example, an iron ball having a diameter of 2 mm) must be mixed in order to increase the chances of contact between the object to be processed and the dangular, and it is still difficult to obtain a uniform and sufficient current density. Since the treatment solution is stationary, the concentration of the plating solution changes with the passage of time as in the previous example, it is not possible to obtain a sufficient plating layer thickness, and multiple steps including the plating step must be performed continuously. I can't. In order to solve these drawbacks, the applicant of the present invention has proposed Japanese Patent Application No. 6-65999 "Plating apparatus and plating method for small articles".

[0005]

It is an object of the first invention to obtain a sufficient and uniform plating layer in a short time. A second object of the present invention is to allow only a cell, which is a combination of a dome and a bottom plate, to be attached to another device unit independently. A third aspect of the present invention has an object of facilitating centering when mounting a cell on another device unit. A fourth aspect of the present invention is intended to facilitate attachment / detachment of a cell to / from another device unit. A fifth aspect of the present invention aims to improve the distribution of plating on small items. A sixth aspect of the present invention aims to expand the application of one device unit. A seventh aspect of the present invention aims to easily cope with an increase in the number of processing steps.

[0006]

According to a first aspect of the present invention, there is provided a contact ring for pressing an object to be plated during rotation between a lower surface of an outer peripheral portion of a lower opening bowl-shaped resin dome having an open upper end and an upper surface of an outer peripheral portion of a resin bottom plate. A porous ring through which the liquid flows and scatters is integrally connected to form a cell, and the upper end of a vertical conductive drive shaft is fixed to the lower surface of the central portion of the conductive rotary plate that supports the cell in a relatively non-rotatable manner and energizes with the contact ring. ,
A rotary plating apparatus for small articles, characterized in that a contact brush is pressed against the shaft to connect to a negative electrode, an anode basket is arranged in the dome, and a cover for covering the cell is provided.

According to a second aspect of the present invention, the conductive rotary plate has a diameter smaller than that of the resin bottom plate, and a plurality of protrusions each having a hole into which a contact shoe connected to the contact ring is fitted, on the outer peripheral surface, and a pair of protrusions on each side. The rotary plating apparatus for small articles according to claim 1, wherein a lifting hand that supports the lower surface of the resin bottom plate is inserted between the protrusions.

A third aspect of the present invention is the rotary plating of small articles according to claim 1, wherein a tapered projection is provided at the center of the bottom surface of the bottom plate, the taper projection being tapered downward, and tapered holes corresponding to the conductive rotary plate and the upper end surface of the shaft. It is a device.

According to a fourth aspect of the present invention, the cover includes a lower opening bowl-shaped shroud having a hole through which an anode basket passes, and a bottom plate which receives the lower end of the shroud and whose bottom surface is inclined downward toward the drain nozzle. 2. The rotary plating apparatus for small articles according to claim 1, wherein the shroud is supported by an outer lateral hinge pin thereof and can be opened to a position where the cell can be pulled upward.

A fifth aspect of the present invention is the rotary plating apparatus for a small item according to claim 1, wherein the inner peripheral surface of the contact ring is tapered so that its diameter becomes smaller as it goes downward.

A sixth aspect of the present invention is the rotary plating apparatus for a small item according to the first aspect, wherein a traversing mechanism for alternately inserting another anode basket from one side and the opposite side is provided in the cell.

A seventh aspect of the present invention is the rotary plating apparatus for a small item according to claim 1, wherein a plurality of apparatus units each including the cell and the cover are laterally arranged so that the cells can be moved to the lateral unit.

[0013]

1 shows the middle of a plating process, a resin dome 1 is made of, for example, PVC having corrosion resistance against a plating solution, and has an opening 3 at its upper end for allowing the anode basket 2 and the like to be taken in and out. , A downward-opening bowl shape (including the illustrated taper shape), and has an outward flange 4 at the lower end.
The object to be plated 6 is pressed by centrifugal force during rotation between the flange 4 and a portion on the upper surface of the outer peripheral portion of the circular resin bottom plate 5 (made of PVC) having the same diameter as the flange 4 and having the same radial width as the flange 4. A contact ring 7 (made of Ti) and a porous ring 8 (made of ceramic having a fine ventilation hole having a fine diameter, etc.) through which the processing liquid flows and scatter are held, and for example, six countersunk bolts 9 (FIGS. 1 and 2) Nut type contact shoe 10
Tighten with 24 more common bolts 11 (Fig. 3,
4) is screwed into a screw hole provided in the bottom plate 5 and tightened to form an integral cell 12. Reference numeral 13 is a dome flange (ring) that also serves as a washer. The contact ring 7 and the porous ring 8 may be arranged upside down, and in this case as well, the dish-shaped head of the countersunk bolt 9 bites into the upper surface of the contact ring 7.

The conductive rotary plate 15 (SU
(S disk) is fixed to the conductive flange 18 fixed by the key 17 (Fig. 4) on the large diameter portion of the upper end of the stepped vertical conductive drive shaft 16 with, for example, eight countersunk screws 19, and its diameter is resin. Although it is smaller than the bottom plate 5 by D (Figs. 1, 2, 3, 4),
The periphery is provided with six chevron-shaped projections 20, and the projections 20 are provided with holes 21 into which the nut-shaped contact shoes 10 are fitted. Therefore, when the conductive rotary plate 15 is driven to one side in the state of FIGS. 1 and 2, the inner surface of the hole 21 is pressed against the nut-shaped contact shoe 10, and the contact ring 7 and the shaft 16 are electrically connected via the countersunk bolt 9. Connect to.
The cell 12 of FIG. 4 is set so that the protrusion 20 always comes to the position of FIG. 4 when stopped, and the resin bottom plate 5 between the two protrusions 20 on the right side of FIG. A lifting hand 22 for lifting the cell 12 from the rotary plate 15 is configured to enter the lower side and the lower side of the resin bottom plate 5 between the two protrusions 20 on the left side. As another proposal, a bolt insertion hole which is concentric with the hole 21 is provided in the protrusion 20, and a conductive bolt (not shown) having a head at the lower end is used as the protrusion 2.
0, the bottom plate 5, and the porous ring 8 may be screwed from below into the screw holes opened in the contact ring 7 through the bolt insertion holes.

Reference numeral 24 in FIG. 5 showing the VV cross section in FIG. 1 is a copper ring (contact collar) fixed to the shaft 16.
25 is a contact brush made of metallic carbon,
26 is a backup plate, 27 is a compression coil spring,
28 is a pin, 29 is a support plate, 30 is a negative pole of a rectifier, and 31 is a cable. As a result, the shaft 16 is always connected to the negative pole 30.

The resin bottom plate 5 shown in FIG. 1 is provided with a tapered protrusion 33 at the center of the lower surface, which becomes thinner as it goes downward, and a corresponding tapered hole 34 is provided at the center of the upper end surface of the rotary plate 15, the flange 18, and the shaft 16. is there. Protrusion 33
The upper half has a cylindrical shape and the lower half has a truncated cone shape, and the cylindrical portion of the protrusion 33 passes through the center of the hole of the rotary plate 15. When the cell 12 is lowered while the cover 35 described later is opened to the position 35 ′ in FIG. 6, the protrusion 33 fits into the tapered hole 34 and is automatically centered, and the contact shoe 10 in FIG. It smoothly enters the hole 21 of the protrusion 20.

The cover 35 shown in FIG. 1 has a lower opening bowl-shaped shroud 3 having a hole 37 through which the anode basket 2 and the like pass.
8 and a bottom plate 41 having an outer peripheral wall 40 on which the seal ring 39 attached to the lower end edge of the shroud 38 fits on the inner peripheral surface. The bottom plate 41 inclines so as to descend toward the drain nozzle 42 and An inner peripheral wall 44 surrounding the conductive flange 18 and the upper bearing 43 is integrally provided. The shroud 38 is connected to an air cylinder 47 via a lever 46 supported by a hinge pin 45 (horizontally oriented) that is perpendicular to the paper surface of FIG. 1, and the cover 35 is closed by the automatic operation of the air cylinder 47 in FIG. Can be switched to the open position 35 'shown in FIG.

U in FIG. 1 is an apparatus unit, 48 is a lower bearing, 49 is a V pulley, and this V pulley 49 is connected to a geared motor (variable speed, reversible ... Not shown) via a V belt (not shown). Connected.

The carrier 51 of FIG. 6 has a cover 35 '.
The cell 12 has a function of pulling up the cell 12 to the position of 12 ', conveying it in the lateral direction at right angles to the paper surface, and supplying it to another device unit in the state of being opened to the position of. Also, the traverse mechanism 52 is the cover 3
5 is closed at the position indicated by the chain double-dashed line, the anode basket 2
6 is immersed in the cell 12 as shown in FIG. 6, and the anode basket 2 is pulled upward through the hole 37 at the upper end of the cover 35, and the cell 12 ′ is moved to one side (for example, the back surface side) perpendicular to the paper surface. The carrier bar 53 is placed on a receiving member (not shown) in such a manner that the carrier bar 53 is traversed to a position where it does not interfere with lifting and lowering, and the other side (for example, the front surface side) is traversed to support another anode basket or the like waiting there. Hole 3 with carrier bar
It has the function of moving to the top of 7, and then descending. The power feeding core rod 54 having the lower end fixed to the center of the bottom surface of the illustrated anode basket 2 has the upper end fixed to the carrier bar 53 and is connected to the positive electrode (both not shown) of the rectifier. A level meter 55, a hose 56 for supplying cleaning water, a hose 57 for supplying a treatment liquid, etc. are fixed to the carrier bar 53. A pair of hooks 59 for holding the carrier bar 53 are attached to the right end of the cantilever arm 58. 60
Is an air cylinder for raising and lowering the arm 58, and 61, 62 are air cylinders for traversing the arm 58 to one side or the other side.

The apparatus unit U of FIG. 6 is provided with a plurality of circulation tanks 64 at the lower end so as to overlap in the lateral direction (the direction perpendicular to the paper surface), and the bottom of the circulation tank 64 is connected to the suction port of the pump 65. , The discharge port of the pump 65 is a hose 57, 5
7a. The hose 57 communicates with the hose 57, and the hose 57a communicates with the hose hidden by the hose 57 on the upper right. Reference numeral 66 is a replenishing pipe, and 67 is a level meter, and a replenishing liquid such as a thermometer and a densitometer (not shown) is supplied from the replenishing pipe 66 to a predetermined level so that the tank has an optimum temperature and an optimum concentration. That is, complete liquid management is performed in the circulation tank 64.

The upper end of the flexible hose 69 is fitted to the drain nozzle 42 of the cover 35 shown in FIG.
Enter the upper half of the gutter 71 (extending in the direction perpendicular to the paper surface) attached to the upper end of the gutter 71, and the lower half of the gutter 71 is divided into a plurality of rooms by the partition 72, and each room is the same as the drain pipe 70. It is connected to another circulation tank similar to the circulation tank 64 through another drain pipe. A fork 75 fixed to a rotary output shaft 74 of a switching actuator 73 is engaged with a flexible hose 69 slightly above the gutter 71. The circulation tank 64 is selected depending on which room the lower end of the flexible hose 69 is connected to by the fork 75. The partition 72 has a chamber that does not communicate with any of the circulation tanks 64 but communicates with a drain pipe (not shown) extending right below. That is, in the washing process, the waste water is collected in another drain tank through the drain pipe.

FIG. 7 is a layout diagram in which the device units U are arranged side by side (in the left-right direction in the drawing) to complete one type of product, and U1: No. One unit shows a loading and unloading stage, and a reversal unloader mechanism for taking out the product of the plating treatment in the cell 12, a shower spraying mechanism, and an untreated object (small object) are loaded in the cell 12. A road shooter mechanism (both not shown) is attached.

The cell 12 in which the object to be plated is loaded is provided with a carrier 51 which is movable laterally (left and right) on the carrier frame 77, and U2: No. Sent to 2 units. At this time, the cover 35 is opened like U5 and 35 'in FIG. 6, and the cell at the position 12' in FIG. 6 is lowered to the position 12 and the cover 35 'is closed to the position 35 to start the device. . Rotational force to the cell 12 is transmitted from the rotary plate 15 in FIG. 1 through the hole 21, the nut-shaped contact shoe 10 and the conductive countersunk bolt 9 in FIG. Figure 7
In U2, the air cylinder 62 of the traverse mechanism 52 contracts and the anode basket waiting at the position 2a ′ is traversed to the position 2a, and then lowered into the cell 12 and, for example, at 60 ° C. ○ Immersion cleaning for 5 minutes ( For example, when the inner diameter of the contact ring 7 in FIG. 1 is 560 mm, the cycle is repeated at 200 rpm for 10 seconds for 10 seconds to stop for 0.5 seconds, and then at the same number of revolutions for 10 seconds in the opposite direction and stop for 0.5 seconds. (Circle) means having a tank corresponding to the circulation tank 64 of FIG. 6), performing normal temperature water washing for 1 minute, and then air cylinder 62.
To extend the basket 2a back to the position 2a ', then contract the air cylinder 61 to traverse the anode basket waiting at the position 2b to the position 2b' and then lower it into the cell 12, for example 60 ○ (-) electrolytic cleaning 2 minutes at room temperature, room temperature water cleaning 1 minute, and then at 60 ° C ○ (+) electrolytic cleaning 2
For 1 minute at room temperature. Pull up the basket at position 2b 'and return to position 2b. In U2, it is difficult to mix the liquids, so three tanks are required.

In U3, the anode basket waiting at the position 2c 'in the air cylinder 62 is traversed to the position 2c and then lowered into the cell 12, for example, at 60 ° C. ○ Etching 1
Min, wash with water at room temperature for 1 min, then at 60 ℃
For 1 minute at room temperature. Pull up the basket 2c 2
Return to the position of c '.

In U4, the anode basket waiting at the position 2d 'in the air cylinder 62 is moved to the position 2d and then lowered into the cell 12, for example, at RT (normal temperature), ○ nickel strike plating 5 minutes, water washing 1 minute After that, the basket 2d is pulled up and returned to 2d ', the waiting basket 2e is lowered to the position 2e', and ◯ nickel plating is performed at 55 ° C. for 25 minutes, followed by washing at room temperature with ◯ recovery water 1
Minutes, wash with normal temperature water for 1 minute, pull up and return the basket to the position 2e.

In U5, the basket waiting at 2f 'is lowered to the position of 2f, and for example, at RT (normal temperature), 1 minute of ○ acid activity and 1 minute of normal temperature water washing are carried out, and the basket is returned to the position of 2f' and 2g '. 2g of basket waiting in position
To a position of ‘′, for example, ◯ tin (solder) plating is performed at 20 ° C. for 35 minutes, ◯ recovery water washing is performed for 1 minute, and room temperature water washing is performed for 1 minute, and is pulled up to return the basket to a position of 2 g.

At U6, the basket that had been waiting for 2h 'was lowered to the position of 2h, for example, at 60 ° C for ○ neutralization for 1 minute, at room temperature for 1 minute, at room temperature for pure water for 1 minute, for example at 70 ° C for ○ at pure water warming for 1 After a minute, the basket is returned to the position 2h 'and the cell 12 is sent to U1.

The inner peripheral surface of the contact ring 7 in FIG. 8 is a tapered surface 79 whose diameter becomes smaller as it goes downward.
By doing so, the area of the tapered surface 79 against which the object to be plated 6 is pressed by the centrifugal force with the plating solution due to the rotation of the cell 12 during the plating step becomes larger than that in the case of FIG. At the time of shifting from normal rotation to reverse rotation, the object 6 to be plated flows down to the center side along the tapered surface 79 due to the effect of gravity, and then goes up the tapered surface 79 again, and the moving distance increases, so that the object 6 is well mixed and the taper of the object 6 is tapered. The chance of contacting the surface 79 is increased, so that the plating is uniformly applied.

As shown in FIG. 9A, the inner diameter of the contact ring 7 is smaller than that of the lower surface corner portion 80 between the resin dome 1 and the outward flange 4, and a gap 81 having a wedge-shaped cross section is formed between the contact ring 7 and the corner portion 80. If this happens, the object 6 to be plated may remain or get caught in the gap 81, which adversely affects the plating. Therefore, the inner diameter of the contact ring 7 should be aligned with the corner portion 80 so as to eliminate the gap 81.
As shown in (b), the inner diameter of the contact ring 7 is slightly increased to open a gap L (for example, 1 to 5 mm). Figure 9
As shown in (c), the inner diameters of the contact ring 7 and the porous ring 8 are made uniform so that the contact portion 82 has a cylindrical surface without unevenness, or as shown in FIG. 9D, a chamfered portion having an opening angle α of 90 ° or more. If 83 is provided or the R portion 84 is provided as shown in FIG. 9 (e), there will be no residue or catching of the object to be plated.

FIG. 10 shows the relationship between the amount of liquid passing through the porous ring 8 (porous ring) and the peripheral speed (ion-exchanged water, water temperature 20 ° C.). The porous ring 8, the object 6 to be plated, and the pump. Regarding the flow rate of 65 (FIG. 6), first, the porous ring 8 and the rotation speed are appropriately selected depending on the size of the object 6 to be plated. The size of the porous ring 8 may be any size as long as it can maintain the liquid level with reference to FIG.
Regarding the flow rate of the pump 65, it is sufficient if the flow rate is equal to or less than the outflow amount.

Regarding the relationship between the object to be plated and the peripheral speed: (Example 1) Object to be plated: 1005 type chip component, pore size; 70 μm, plating solution; nickel watt bath ... The peripheral speed in this case is 150 m / min or more, It is preferably 200 / min or more. (Example 2) Object to be plated: powder tens of μm, pore size: 5 μ
m, plating solution; nickel watt bath ... In this case, the peripheral speed is 250 m / min or more, preferably 410 m / min or more. These peripheral velocities are appropriately selected depending on the size, shape, etc. of the object to be plated. However, when the peripheral speed is equal to or lower than the peripheral speed described in the contents of Examples 1 and 2 above, the object to be plated is placed on the cathode (contact ring 7) side. It was confirmed that it was difficult to get close and the plating did not reach.

[0032]

According to the first aspect of the present invention, the object to be plated 6 is forcibly pressed against the contact ring 7 having a larger area due to the action of centrifugal force, and the rotation and the stop or the deceleration are repeated, so that the material 6 is uniformly mixed and the conductivity is increased. Improved, current density increased,
Since the renewal of the plating solution becomes active, the adhesion of the plating is improved. Moreover, since the plating solution in the dome 1 is always replaced with the fresh plating solution supplied from the hose 57, it is possible to carry out the plating process with a high current density and to easily secure a uniform plating thickness in a short time. Become. Plating solution is dome 1
Since it is discharged from the inner processing chamber through the porous ring 8 to the outside, enters the circulation tank 64, and is circulated by the pump 65,
The plating solution can be easily managed outside the processing chamber, and an optimum plating layer can be obtained. Since the contact ring 7 is energized via the electroconductive drive shaft 16 and the electroconductive rotary plate 15, the contact brush 25 of FIG. 5 does not come into contact with the plating solution, and the energization is ensured.

According to the second invention, each cell 12 has a carrier 5 having a pair of left and right lifting hands 22 (FIGS. 4 and 6).
1 (FIG. 6) can be lifted and supplied to the horizontal device unit U, which facilitates the production of products that require multiple steps.

According to the third invention, the cell 12 is replaced by the cell 12 of FIG.
When the taper-shaped projection 33 is lowered from the position of ‘
4, the centering can be automatically performed, and the nut type contact shoe 10 of FIG. That is, the cell 12 can be easily carried in.

According to the fourth aspect of the present invention, it becomes easy to open and close the cover 35, especially the shroud 38, and the cell 12 is accordingly opened.
It is easy to carry in and out.

According to the fifth aspect of the present invention, the tapered surface 79 of FIG. 8 facilitates replacement of the object 6 to be plated when the rotating direction of the cell 12 changes, and the tapered surface 79 has the cylindrical shape of FIG. Since it is increased compared to
Opportunities of contact with the taper surface 79 of No. 1 increase, and the spread of plating is improved.

According to the sixth invention, the traverse mechanism 52 (FIG. 6).
Since one device unit U is provided with one cell 12
Two anode baskets 2 can be sequentially inserted into the work, and the device unit U can be effectively used, and the entire device can be compactly assembled.

According to the seventh aspect of the present invention, a product requiring a large number of man-hours can be processed and completed in a proper manner.

[Brief description of drawings]

1 is a schematic vertical cross-sectional view taken along the line I-I of FIG.

FIG. 2 is a partially enlarged view of FIG.

FIG. 3 is an enlarged cross-sectional view taken along line III-III in FIG.

4 is a schematic cross-sectional view taken along the line IV-IV of FIG.

5 is an enlarged view of a part of VV cross section of FIG. 1. FIG.

FIG. 6 is a schematic vertical sectional view of an apparatus unit.

FIG. 7 is a schematic plan view of the entire apparatus in which a plurality of apparatus units are arranged side by side.

8 is a partially enlarged view showing the modified structure of FIG.

9 is a schematic view corresponding to a section taken along line IX-IX in FIG.

FIG. 10 is a graph showing the relationship between the amount of liquid passing through the porous ring and the peripheral speed.

FIG. 11 is a vertical sectional view showing a conventional example.

[Explanation of symbols]

 1 Resin Dome 2 Anode Basket 5 Resin Bottom Plate 6 Plated Object 7 Contact Ring 8 Porous Ring 10 Contact Shoe 15 Conductive Rotary Plate 16 Conductive Drive Shaft 20 Protrusion 21 Hole 22 Lifting Hand 25 Contact Brush 30 Minus Electrode 33 Tapered Protrusion 34 Taper Hole 37 Hole 38 Shroud 41 Bottom plate 42 Drain nozzle 45 Hinge pin 52 Traverse mechanism 79 Tapered surface U Device unit

Claims (7)

[Claims] 1. A contact ring for pressing an object to be plated during rotation between a lower surface of an outer peripheral portion of a lower open bowl-shaped resin dome having an open upper end and an upper surface of an outer peripheral portion of a resin bottom plate; A porous ring is integrally connected to form a cell, and the upper end of a conductive drive shaft perpendicular to the lower surface of the central portion of a conductive rotary plate that supports the cell in a relatively non-rotatable manner and energizes with the contact ring is fixed, and the cell is contacted with the shaft. A rotary plating apparatus for small articles, characterized in that a brush is pressed to connect to a negative electrode, an anode basket is arranged in the dome, and a cover for covering the cell is provided. 2. The conductive rotary plate has a diameter smaller than that of the resin bottom plate, and a plurality of protrusions having holes for fitting contact shoes connected to the contact ring are provided on the outer peripheral surface of each pair of protrusions on both sides. The lifting hand for supporting the lower surface of the resin bottom plate is inserted between them.
Rotation plating equipment for small items described in. 3. The rotary plating apparatus for small articles according to claim 1, wherein a tapered projection is provided at the center of the bottom surface of the bottom plate, the tapered projection being tapered downward, and tapered holes are provided corresponding to the conductive rotary plate and the upper end surface of the shaft. 4. The cover includes a lower opening bowl-shaped shroud having a hole through which an anode basket passes at an upper end thereof, and a bottom plate which receives a lower end of the shroud and has a bottom surface inclined downward toward a drain nozzle. The rotary plating apparatus for small articles according to claim 1, wherein the cell is supported by an outer lateral hinge pin and can be opened to a position where the cell can be pulled upward. 5. The inner peripheral surface of the contact ring is tapered so that its diameter becomes smaller as it goes downward.
Rotating plating equipment for small items described. 6. The rotary plating apparatus for small articles according to claim 1, further comprising a traverse mechanism for alternately inserting another anode basket from one side and the opposite side in the cell. 7. A rotary plating apparatus for small articles according to claim 1, wherein a plurality of apparatus units including the cell and the cover are arranged laterally to enable movement of the cells to the lateral unit.