JPH08274060A - Substrate rotating device - Google Patents

Abstract

(57) [Abstract] [PROBLEMS] To provide a substrate rotating device capable of reliably and easily rotating a circular substrate and properly cleaning not only the front surface of the substrate but also the back surface of the substrate as necessary. . [Structure] An annular rotary disk 2 is rotationally driven by a pinion 3 meshing with an inner peripheral gear 2c thereof. On the turntable 2, a plurality of fixed claws 4 for engaging and holding the board peripheral portion 8a,
A plurality of movable claws 5 that are movable between a substrate holding position where the peripheral edge 8a of the substrate can be engaged and held and a substrate holding release position where the peripheral edge 8a is separated from the substrate peripheral edge 8a are provided. Each movable claw 5 is biased and held at the substrate holding position, and the cylinder 2
By extending 0, it is moved to the substrate holding release position. The fixed claw group and the movable claw group are the diameter line XX of the turntable 2.
They are arranged opposite to each other.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION A circular substrate such as a silicon wafer is cleaned by, for example, rotating the substrate and spraying a cleaning fluid such as ultrapure water toward the substrate. The present invention relates to a substrate rotating device for horizontally rotating a substrate in a cleaning process.

[0002]

2. Description of the Related Art As a conventional substrate rotating device of this type,
As shown in FIGS. 8 and 9, a circular rotary disc 32 is concentrically provided on the upper end of a rotary shaft 33 that is driven to rotate.
A suction groove 34a is formed on the upper surface of the substrate, a suction passage 34b is formed in the rotary shaft 33, the suction passage 34b opening to the suction groove 34a and communicating with a suction portion (not shown) of the vacuum pump, and the substrate 8 such as a silicon wafer is It is well known that the back surface 8c is sucked and held on the upper surface of the turntable 32 and is horizontally rotated in a concentric state (hereinafter referred to as "conventional apparatus"). In the cleaning process, as shown in FIG.
The substrate 8 is suction-held on the turntable 32, and then the turntable 32
While rotating the rotating shaft 33 at a predetermined speed,
A cleaning fluid (for example, ultrapure water or a mixed slurry of fine frozen particles obtained by freezing the same) 24 is jetted from a nozzle 23 arranged above the turntable 32 toward the substrate surface 8b, and the jet fluid causes the substrate surface to be jetted. 8b is entirely cleaned.

[0003]

However, in the conventional apparatus, since the back surface 8c of the substrate is directly attracted to the upper surface of the turntable 32, the back surface 8c of the substrate is contaminated or scratched by the contact with the turntable 32. There is a risk that Moreover, part of the cleaning fluid 24 ejected from the nozzle 23 may be sucked into the suction groove 34a after cleaning the substrate surface 8b, and may enter the vacuum pump side from the suction passage 34b. Depending on the operating state, the suction and holding of the substrate 8 may become unstable. Further, unless the substrate 8 is held on the turntable 32 in a state where the center of gravity thereof coincides with the center of rotation of the turntable 32 (hereinafter referred to as “appropriate state”), the substrate 8 is removed from the turntable 32 by centrifugal force. It may come off, fall, and be damaged. On the other hand, the substrate 8 is set so as to be in such an appropriate state.
Is extremely difficult to set on the turntable 32 and requires a considerable degree of skill. Although it may be necessary to clean the substrate back surface 8c also on the substrate back surface 8c, the conventional apparatus has a structure in which the substrate back surface 8c is entirely adsorbed and held on the turntable 32, and therefore the substrate back surface 8c is cleaned. Can't do this.

The present invention has been made in view of the above points, and a circular substrate can be reliably and easily rotated without causing the above-mentioned problems. Another object of the present invention is to provide a substrate rotating device that can be satisfactorily cleaned as needed.

[0005]

A substrate rotating apparatus according to the present invention, which has solved the above-mentioned problems, particularly comprises an annular turntable supported so as to be horizontally rotatable, and a drive mechanism for rotationally driving the turntable.
A plurality of fixed claws that are held at a fixed position on the turntable and that engage and hold the peripheral edge of the substrate to hold the circular substrate in a horizontal state concentric with the turntable, and a fixed claw on the turntable. A plurality of movable claws horizontally swingably provided between a substrate holding position capable of engaging and holding the peripheral edge of the substrate engaged and held with the substrate and a substrate holding release position spaced from the peripheral edge of the substrate by a predetermined amount. When,
And a movable claw operating mechanism that is interposed between each movable claw and the turntable and that operates the movable claw across both positions. Thus, the fixed claw group and the movable claw group are arranged so as to face each other with the diameter line of the turntable interposed therebetween.

[0006]

In starting the cleaning process, first, the substrate is set on the turntable in a horizontal state concentric with it, that is, in an appropriate state. That is, each movable claw is positioned at the substrate holding release position, the substrate is inserted between the fixed claw group and the movable claw group, and the board peripheral portion is engaged with and held by each fixed claw. At this time, since the fixed claw group and the movable claw group are arranged so as to face each other with the diameter line of the turntable interposed therebetween, the peripheral edge of the substrate is engaged and held by the fixed claw group to position the substrate in an appropriate state. And it can be held. After that, each movable claw is moved to the substrate holding position to be engaged with the peripheral portion of the substrate. This ensures that the substrate is held in an appropriate state by the fixed claw group and the movable claw group.

After the substrate is set on the turntable in this way, the cleaning process is started. That is, the rotating disk is driven to rotate and the cleaning fluid is ejected toward the substrate.

At this time, since the rotating disk is annular, there is a space for ejecting the cleaning fluid on the back surface side of the substrate, so that the substrate is engaged and held only by the fixed pawl and the movable pawl. In addition to the above, the back surface of the substrate can be cleaned by jetting the cleaning fluid. That is, not only the front surface of the substrate but also the back surface of the substrate can be simultaneously cleaned as needed.

Further, since the substrate is engaged and held only at its peripheral portion, the back surface of the substrate is not contaminated or scratched as in the conventional apparatus. Moreover, since the substrate is held concentrically with the turntable in a state where its peripheral portion is prevented from moving in the radial direction by the fixed claw group and the movable claw group, even when centrifugal force due to rotation acts, It never separates from the turntable or falls.

Further, in general, the center of gravity of the substrate is at the center position, so that if the substrate is held concentrically with the turntable as described above, the center of gravity of the substrate will coincide with the center of rotation of the turntable. Therefore, there is no fear that the substrate is radially displaced due to the centrifugal force. That is, the substrate does not vibrate with the rotation, and the fixed claw group and the movable claw group reliably hold the substrate.

When the cleaning of the substrate surface or both surfaces of the substrate is completed as described above, each movable claw is brought to the substrate holding release position to be separated from the peripheral edge of the substrate, and then the substrate is moved to be separated from the fixed claw group. By removing it from the turntable. At this time, since the movable claws can be moved to the substrate holding release position, and the fixed claw group and the movable claw group are arranged to face each other with the diameter line of the turntable interposed therebetween, the movable claws are moved to the substrate holding release position. The substrate can be easily removed from the turntable by operating the.

[0012]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The construction of the present invention will be specifically described below with reference to the embodiments shown in FIGS.

As shown in FIGS. 1 to 4, the substrate rotating apparatus 1 of this embodiment has a rotating disk 2, a drive mechanism 3 for rotating the rotating disk 2, and a plurality of fixed claws 4 provided on the rotating disk 2. .. and movable claws 5 and movable claw operation mechanisms 6 for operating the movable claws 5, and are mounted on a movable base 7 arranged in the cleaning tank.

As shown in FIGS. 1 and 4, the turntable 2 has an annular main body 2a having an inner diameter larger than that of a circular substrate 8 such as a silicon wafer, and a support base 2b detachably attached to the upper surface thereof. The bearing 10 is interposed between the main body 2a and the annular support 9 fixed to the movable base 7, and is supported on the movable base 7 so as to be horizontally rotatable. Between the main body 2a and the support 9, labyrinths 11a and 11b having annular irregularities are formed, and are devised so as to prevent invasion of cleaning liquid or the like into the bearing 10.

The drive mechanism 3 is, as shown in FIGS. 1 and 4,
A large-diameter internal tooth gear 2c formed on the inner diameter portion of the main body 2a of the turntable 2, a drive motor 12 attached to the moving base 7, and a pinion gear 12a attached to the motor drive shaft and meshing with the gear 2c. Drive motor 12
Thus, the turntable 2 is rotationally driven in a fixed direction at a predetermined speed.

As shown in FIG. 1, the fixed claw group 4 and the movable claw group 5 are arranged so as to face each other on the rotary table 2 with the diameter line XX interposed therebetween, and each has the following structure. Has been done. In this embodiment, four fixed claws 4 ... And two movable claws 5 ... Are provided.

Each fixed claw 4 is shown in FIGS. 1 to 4, 6 and 7.
As shown in FIG. 2, it is of a rectangular block shape in which a substantially V-shaped engaging concave portion 4a that can be engaged with the peripheral edge portion 8a of the substrate 8 is formed, and a pair of horizontal support shafts 13, 1
Via 3 and the coil springs 14 and 14, the turntable 2 is urged and held so as to be able to advance and retract in the radial direction. That is, as shown in FIG. 6, a pair of horizontal support shafts 13 and 13 fixed to the fixed claw 4 is provided.
Is supported by a support member 15 provided upright on the support base 2b so as to be movable back and forth in the radial direction of the turntable 2, and each horizontal support shaft 13 is arranged between the fixed claw 4 and the support member 15 to have a coil spring 14 attached thereto. The fixed claw 4 is inserted into the fixed claw 4 in the direction of the center of the turntable 2 by the coil springs 14, 14 and the displacement of the fixed claw 4 is regulated by the stopper 13a attached to the end of each horizontal support shaft 13. Is urged and held at a fixed position where it can be engaged and held concentrically with the turntable 2 (see FIG. 1). That is, as shown in FIG. 7, each fixed claw 4 has a coil spring 14,
14 and the stopper 13a, the engaging concave portion 4a is located at the positioning position (position shown in FIG. 7A) which is the fixed position where the engaging concave portion 4a can engage and hold the substrate peripheral portion 8a.
It is urged and held so as to be movable in a direction away from a. A cover 16 is attached to each of the fixed claws 4 to cover the upper surface side of the supporting means (horizontal support shaft 13 or the like), and the horizontal support shafts 13 and 13 are fixed to the cover 16.

As shown in FIGS. 1 to 4 and 5, each movable claw 5 has a rectangular block shape similar to the fixed claw 4 having a substantially V-shaped engaging recess 5a which can be engaged with the substrate peripheral edge 8a. And a vertical support shaft 17 which is erected on the support base 2b of the turntable 2.
Is attached to an oscillating body 18 which is horizontally swingably supported by, and when the substrate 8 is horizontally held concentrically with the turntable 2 by the fixing claws 4, the substrate peripheral portion 8a can be engaged and held. A substrate holding position (the position shown in FIGS. 1 and 5),
It is horizontally swingable over a substrate holding release position (a position shown in FIG. 3) that is separated from the substrate peripheral portion 8a by a predetermined amount.

As shown in FIGS. 1 to 5, each movable claw operating mechanism 6 has a linear spring 19 interposed between a support base 2b of the rotary disc 2 and an oscillating body 18, and a main body 2a of the rotary disc 2. And a pneumatic cylinder 20 which is a movable claw operating body attached to the. Spring 1
As shown in FIGS. 4 and 5, reference numeral 9 denotes a coil in which a central portion is wound in a coil shape. The coiled portion is inserted into and supported by the vertical support shaft 17, and one end is engaged with the pin 21 on the support base 2b side. By stopping and stopping the other end with the pin 22 on the side of the rocking body 18, the rocking body 18, that is, the movable claw 5 is urged toward the substrate holding position. Further, the pneumatic cylinder 20 has a piston rod 20a capable of oscillating the oscillating body 18 and pushes the movable pawl 5 attached to the oscillating body 18 into the spring 1.
The operating position (the position shown in FIGS. 2 and 3) which is the most extended position for moving the substrate holding release position against 9 and the non-operating position which is the most contracted position where the movable claw 5 cannot be operated (see FIG. 1). (The position shown), the piston rod 20a is expanded and contracted in the radial direction of the turntable 2. Piston rod 2
0a from the operating position to the non-operating position, the movable claw 5
Is automatically returned from the substrate holding release position to the substrate holding position by the spring 19 and is held at that position, but the piston rod 20a located at the operating position is separated from the oscillating body 18 by a predetermined amount and is movable. Displacement of the claw 5 to the substrate holding release position (swing displacement against the spring 19) is not hindered. That is, when the piston rod 20a is in the non-actuated position, the movable claw 5 is urged and held in the substrate holding position by the spring 19, but a load of a certain amount or more in the direction of the substrate holding release position (the spring 19 is urged). When a load exceeding the force acts, the engaging recess 5a can be displaced against the spring 19 from the peripheral portion 8a of the substrate 8 in a proper state.

The biasing forces of the springs 14 and 19 are balanced so that the substrate 8 is located at the concentric position with the turntable 2 when the substrate 8 is held by the fixed claws 4 and the movable claws 5. Moreover, it is desirable to set the substrate 8 as small as possible on the condition that the substrate 8 is maintained in an appropriate state by the rotating force of the turntable 2.

By the way, the movable pedestal 7 is adapted to reciprocate linearly between a cleaning start position and a cleaning end position separated from the position by a distance substantially corresponding to the radius of the substrate 8. Then, on the moving path of this moving base 7,
A pair of upper and lower nozzles 23a, 23b for ejecting the cleaning fluid 24 toward the substrate 8 held on the turntable 2 are fixedly arranged. Both of the nozzles 23a and 23b eject the cleaning fluid 24 toward the same positions on the front and back surfaces 8b and 8c of the substrate 8, and when the movable platform 7 is located at the cleaning start position, the cleaning fluid 24 is ejected. Of the cleaning fluid 24 is ejected toward the center of the substrate 8 (see the chain line in FIG. 1), and the cleaning fluid 24 is ejected toward the peripheral edge 8a of the substrate 8 in the state where the movable gantry 7 is positioned at the cleaning end position (FIGS. 1 and 4). (See the solid line illustration)
It has become. That is, as the movable base 7 moves from the cleaning start position to the cleaning end position, each nozzle 23
Substrate surface 8b of cleaning fluid 24 jetted from a and 23b
Further, the collision position on the back surface 8c of the substrate is relatively linearly moved from the central position of the substrate 8 to the peripheral position. The lower nozzle 23b is arranged so as to face the inner diameter portion of the turntable 2 so as not to interfere with the turntable 2 due to the movement of the movable mount 7.

By using the substrate rotating device 1 configured as described above, the substrate 8 can be easily and satisfactorily cleaned without causing the problems as in the case of using the conventional device.

At the start of the cleaning process, the substrate 8 is set on the turntable 2 in an appropriate state concentric with it.
Such setting work can be performed extremely easily without requiring any skill. That is, first, each pneumatic cylinder 20 is fully extended to position each movable claw 5 at the substrate holding release position, and then the substrate 8 is inserted between the fixed claws 4 and the movable claws 5 (see FIG. 3). ). Then, the board peripheral portion 8a is engaged with the engagement concave portion 4a of each fixing claw 4 (see FIG. 2).
At this time, since the fixed claw group 4 and the movable claw group 5 are arranged so as to face each other with the diameter line XX of the turntable 2 interposed therebetween, the board peripheral edge portion 8a is engaged with the fixed claw group 4. The substrate 8 can be positioned and held in an appropriate state by engaging and holding the substrates 4a. After that, when the pneumatic cylinders 20 are reduced to the maximum size, the movable claws 5 move to the springs 19.
Thus, the movable claw 5 is automatically returned to the substrate holding position, and the engaging concave portions 5a of the movable claws 5 are engaged with the substrate peripheral edge portion 8a. This ensures that the substrate 8 is held in a proper state concentric with the turntable 2 (see FIGS. 1 and 4). Therefore,
It is possible to easily and surely set the substrate 8 in a horizontal state concentric with the turntable 2 without requiring any skill. Also, setting by a robot is possible.

After the substrate 8 is set in the proper state in this way, the motor 12 is started to rotate the turntable 2 and the cleaning fluid 24 is ejected from each of the nozzles 23a and 23b, so that the front and back surfaces of the substrate 8 are ejected. 8b and 8c are washed at the same time.
Then, the cleaning portion on the substrate 8, that is, the collision portion of the cleaning fluid, is relatively displaced from the central portion of the substrate to the peripheral portion of the substrate as the moving platform 7 is moved from the cleaning start position to the cleaning end position. In addition to the fact that the substrate 8 is rotated, the substrate front surface 8b and the substrate back surface 8c are entirely cleaned.

At this time, since the substrate 8 is held only on the peripheral portion 8a, the back surface 8c of the substrate is not contaminated or scratched as in the conventional apparatus. Further, the substrate 8 is held concentrically with the turntable 2 in a state where the peripheral edge portion 8a thereof is prevented from moving in the radial direction by the fixed claws 4 and the movable claws 5, so that centrifugal force due to rotation acts. Even if it is done, there is no possibility that it will fall out of the turntable 2 or fall. Moreover, in general, the center of gravity of the substrate 8 is at the center position thereof, so that if the substrate 8 is held concentrically with the turntable 2 as described above, the center of gravity of the substrate 8 and the rotation center of the turntable 2 coincide. Therefore, there is no possibility that the substrate 8 will be displaced in the radial direction due to the centrifugal force. In other words, the substrate 8 does not vibrate with the rotation, and the fixed claws 4 and the movable claws 5 reliably hold the substrate.

By the way, the cleaning residue is centrifugal force and the nozzle 23.
The fluid 24 ejected from a and 23b flows on the substrate 8 in the direction of the peripheral edge thereof and is scattered outside the substrate.
... and the movable claws 5 are engaged and held, the cleaning residue enters and accumulates in the engaging recesses 4a, 5a, so that the cleaning residue adheres to and remains on the substrate 8 even after cleaning. There is a risk that the cleaning will be insufficient. However, such fear is completely eliminated by the following actions.

That is, when the fixed claw 4 or the movable claw 5 is brought to a position directly opposite to the nozzles 23a, 23b as the turntable 2 rotates, the nozzles 23a, 23b.
The cleaning fluids 24, 24 ejected from b collide with each other, and a pressing force in the direction against the springs 14, 19 acts. Thus, at the initial stage of the cleaning process, that is, at the stage where the movable pedestal 4 is located at or near the cleaning start position, the cleaning fluids 24, 24 are jetted from the nozzles 23a, 23b to a position away from the substrate peripheral edge 8a. Therefore, the pressing force is smaller than the urging force of the springs 14 and 19, and the fixed claw 4 or the movable claw 5 is supported by the springs 14 and 19 on the substrate peripheral edge portion 8.
It is not displaced from the position where a can be engaged and held (see FIG. 7A). However, when approaching the end stage of the cleaning process, that is, the stage in which the movable base 4 is located at the cleaning start position,
Since the injection points of 4, 24 approach the fixed claw 4 or the movable claw 5, the pressing force increases and tends to overcome the urging force of the springs 14, 19 to bring them to positions directly opposite the nozzles 23a, 23b. The fixed claws 4 or the movable claws 5 thus displaced are displaced against the springs 14 and 19 and separated from the substrate peripheral portion 8a (see FIG. 7B). As a result, the cleaning residue that has entered and accumulated in the engaging recesses 4a and 5a of the fixed claw 4 or the movable claw 5 that has separated from the substrate peripheral edge 8a is the cleaning fluid 2
It is washed away by Nos. 4 and 24 and does not remain on the substrate peripheral edge 8a. Therefore, the front and back surfaces 8b, 8c of the substrate 8
Can be completely and completely cleaned including the part held by the fixed claws 4 ... and the movable claws 5. In addition,
Even when one fixed claw 4 or the movable claw 5 is detached from the substrate peripheral edge portion 8a, the substrate 8 is held by the other fixed claws 4 ... and the movable claws 5 ...
Set the number and installation location of the
1), the function of holding the substrate 8 in a proper state as a whole is not impaired.

After the substrate cleaning is completed, each movable claw 5 is brought to the substrate holding release position by the pneumatic cylinder 20 to be removed from the substrate peripheral portion 8a (see FIG. 2), and the substrate 8 is removed from the fixed claws 4 ... It is removed from the turntable 2 by moving it (see FIG. 3). At this time, since the movable claws 5 can be moved to the substrate holding release position, and the fixed claw group 4 and the movable claw group 5 are arranged to face each other with the diameter line XX of the turntable 2 interposed therebetween, After moving the movable claws 5 to the substrate holding release position, the substrate 8 is moved to the orthogonal line X-.
The substrate 8 can be easily removed from the turntable 2 only by horizontally moving in the direction orthogonal to X. The fixed claw 4
, And the movable claws 5 are supported on the main body 2a of the turntable 2 so that the fixed claws 4 and the movable claws 5 have different arrangements. By preparing the substrate rotating device 1, it is possible to apply the substrate rotating device 1 to substrates 8 having different diameters, which is convenient.

The present invention is not limited to the above-mentioned embodiments, but can be appropriately changed and improved without departing from the basic principle of the present invention.

For example, the numbers and shapes of the fixed claws 4 and the movable claws 5 are arbitrary and can be appropriately set according to the shape of the substrate 8. Further, each fixing claw 4 may be fixed at a fixed position without being biased and held as in the above embodiment. Further, the configuration of the drive mechanism 3 is arbitrary, and for example, an internal gear may be used instead of the external gear 10. Further, the structure of the movable claw operating mechanism 6 is also arbitrary, and for example, it is not urgingly held to the substrate holding position as in the above-mentioned embodiment, but is selectively moved to the substrate holding position and the substrate holding releasing position by a cylinder or the like. It may be configured as follows.
Furthermore, in the above-described embodiment, the present invention is applied to the case of cleaning not only the substrate front surface 8b but also the substrate back surface 8c, but it is naturally applicable to the case of cleaning only the substrate front surface 8b.

[0031]

As can be easily understood from the above description, according to the first aspect of the invention, the substrate can be securely placed at the proper position on the turntable without contaminating or scratching the back surface of the substrate. It can be stably rotated while being held. In addition, the substrate can be easily and efficiently attached to and removed from the turntable. In addition, since the rotating disk has an annular shape and a jetting region of the cleaning fluid can be secured below the back surface of the substrate, not only the front surface of the substrate but also the back surface of the substrate can be cleaned. Therefore, if the substrate rotating device of the present invention is used, the substrate can be cleaned extremely favorably and efficiently without causing the problems described at the beginning.

Further, according to the second aspect of the present invention, it is possible to surely prevent the cleaning residue from adhering to the engaging portion by the fixed claw and the movable claw on the peripheral edge of the substrate, and to perform the cleaning by cleaning the substrate quite completely. it can.

[Brief description of drawings]

FIG. 1 shows an embodiment of a substrate rotating device according to the present invention, and is a plan view showing a state where a peripheral edge portion of a substrate is engaged and held by a fixed claw group and a movable claw group.

FIG. 2 is a plan view corresponding to FIG. 1, showing a state in which the peripheral edge of the substrate is engaged and held only by a fixed claw group.

FIG. 3 is a plan view corresponding to FIG. 1 showing a state where the peripheral edge of the substrate is not engaged with either the fixed claw group or the movable claw group.

FIG. 4 is a sectional view taken along line IV-IV in FIG.

5 is a partially cutaway plan view showing an enlarged V portion (movable claw) of FIG. 1. FIG.

FIG. 6 is a partially cutaway plan view showing a VI portion (fixed claw) of FIG. 1 in an enlarged manner.

7 is a sectional view taken along line VII-VII of FIG.

FIG. 8 is a vertical sectional side view showing a conventional device.

9 is a cross-sectional plan view taken along the line IX-IX in FIG.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Substrate rotating device, 2 ... Rotating plate, 3 ... Driving mechanism, 4 ... Fixed claw, 4a, 5a ... Engagement recessed part, 5 ... Movable claw, 6 ... Movable claw operating mechanism, 7 ... Moving stand, 8 ... Board, Reference numeral 8a ... Substrate peripheral portion, 8b ... Substrate front surface, 8c ... Substrate rear surface, 9 ... Bearing, 14 ... Coil spring, 19 ... Linear spring, 20 ... Pneumatic cylinder (movable pawl operating body).

Claims (2)

[Claims] 1. An annular turntable supported rotatably horizontally, a drive mechanism for driving the turntable to rotate, and a circular substrate concentric with the turntable that is held at a fixed position on the turntable. A plurality of fixed claws that engage and hold the peripheral edge of the substrate to hold the substrate in a horizontal state, a substrate holding position that can engage and hold the peripheral edge of the substrate engaged and held by the fixed claw on the turntable, and the substrate. A plurality of movable claws movably provided to a substrate holding release position spaced apart from the peripheral edge of the movable claw by a predetermined amount, and the movable claws are interposed between the movable claws and the turntable. And a movable claw operating mechanism that moves the movable claw across a position, and the fixed claw group and the movable claw group are arranged to face each other with the diameter line of the turntable interposed therebetween. A substrate rotating device characterized by: 2. The fixed claw and the movable claw have engaging recesses capable of engaging and holding the peripheral edge of the substrate, and the fixed recesses of the fixed claw engage and hold the peripheral edge of the substrate. The movable claw operating mechanism holds the movable claw at the substrate holding position in such a manner that the engaging concave portion is biased and held in a movable position in a direction away from the peripheral edge of the substrate. A spring for biasing and holding the movable claw to a non-actuated position for moving the movable claw against the spring in a direction in which the engaging concave portion of the movable claw separates from the peripheral edge of the substrate, and the movable claw to the substrate holding release position. The substrate rotating device according to claim 1, further comprising a movable claw operating body that is operable over an operating position to be operated.