JPH08334572A - Watch dial plate and its production - Google Patents

Abstract

PURPOSE: To reduce the reflection of light on base surface, increase the transmissivity of coating part, increase the light intensity reaching a solar cell and make the electromotive force of the solar battery large by providing a reflection prevention layer on the light reception side of a base. CONSTITUTION: The watch dial plate is provided with a case 25 having a wind shield glass 23, a movement 27 for driving hands 29, a solar battery arranged in the wind shield side of the movement 27, and coating part 17 arranged on the light reception side of the solar cell 19. On the coating part 17, a base 11 and a reflection prevention layer 15 placed on the base are provided.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure of a dial which is a time display means of a timepiece having a solar cell and a manufacturing method thereof, and particularly to a structure of a covering member provided on the light receiving surface side of the solar cell and a manufacturing method thereof. It is about.

[0002]

2. Description of the Related Art Conventionally, a solar cell of a timepiece dial having a solar cell is used for a dial on the lower surface of a windshield in a structure that can be seen from the outside because it absorbs light to generate electricity. Is the general configuration.

In such a structure, since the solar cell has a unique deep purple color, the color and design of the dial will be greatly restricted if the appearance of the timepiece is to be harmonized.

Therefore, it has been proposed to arrange a covering member on the light receiving surface side of the solar cell to make the solar cell invisible.
This covering member is made of a light-transmitting material such as a ceramic material.

Then, the covering member transmits 1/2 to 2/3 of the light emitted to the covering member and irradiates the solar cell, and an electromotive force for driving the timepiece is generated.

[0006]

In such a means, the light transmitted through the covering member and reaching the solar cell contributes to the electromotive force, so that the electromotive force of the solar cell becomes as large as possible. However, a large covering member is required.

An object of the present invention is to solve the above problems and provide a structure of a timepiece dial having a dial provided with a covering member having a large transmittance, and a manufacturing method for forming this construction. Is.

[0008]

In order to achieve the above object, the timepiece dial and its manufacturing method of the present invention employ the means described below.

The timepiece dial of the present invention comprises a case having a windshield, a movement for driving a pointer, a solar cell arranged on the windshield side of the movement, and a covering member arranged on the light receiving surface side of the solar cell. And the coating member has a substrate and an antireflection layer provided on the substrate.

The timepiece dial of the present invention comprises a case having a windshield, a movement for driving a pointer, a solar cell arranged on the windshield side of the movement, and a covering member arranged on the light-receiving surface side of the solar cell. And the coating member has a substrate made of ceramics and an antireflection layer provided on the substrate.

The timepiece dial of the present invention comprises a case having a windshield, a movement for driving a pointer, a solar cell arranged on the windshield side of the movement, and a covering member arranged on the light receiving surface side of the solar cell. And the coating member has a substrate made of ceramics and an antireflection layer made of an organic film provided on the substrate.

The timepiece dial of the present invention includes a case having a windshield, a movement for driving a pointer, a solar cell arranged on the windshield side of the movement, and a covering member arranged on the light receiving surface side of the solar cell. And the coating member has a substrate made of ceramics and an antireflection layer made of an inorganic film provided on the substrate.

The timepiece dial of the present invention includes a case having a windshield, a movement for driving a pointer, a solar cell arranged on the windshield side of the movement, and a covering member arranged on the light-receiving surface side of the solar cell. And the coating member has a substrate made of ceramics and an antireflection layer made of an organic film made of a resin film provided on the substrate.

The timepiece dial of the present invention comprises a case having a windshield, a movement for driving a pointer, a solar cell arranged on the windshield side of the movement, and a covering member arranged on the light-receiving surface side of the solar cell. The coating member has a substrate made of ceramics and an inorganic antireflection layer made of a silicon oxide film, a silicon nitride film, an aluminum oxide film, or a tantalum oxide film provided on the substrate.

The method of manufacturing a timepiece dial of the present invention comprises the steps of placing a ceramic material containing a binder in a mold and subjecting it to a pressure treatment and a firing treatment to form a substrate constituting a covering member, and a step of forming a substrate on the substrate. A step of forming an organic film and performing a baking treatment to form an antireflection layer.

The timepiece dial manufacturing method of the present invention comprises the steps of pressing a green sheet and baking it to form a substrate constituting a covering member, and forming an organic film on the substrate and baking it. And a step of forming an antireflection layer.

The method of manufacturing a timepiece dial of the present invention comprises a step of performing powder injection molding and a firing treatment to form a substrate constituting a covering member, and an organic film is formed on the substrate to perform a firing treatment to prevent reflection. And a step of forming a layer.

The method of manufacturing a timepiece dial of the present invention comprises the steps of placing a ceramic material containing a binder in a mold and subjecting it to a pressure treatment and a firing treatment to form a substrate constituting a covering member, and a step of forming the substrate on the substrate. A step of forming an organic film made of a resin film and performing a baking treatment to form an antireflection layer.

The timepiece dial manufacturing method of the present invention comprises the steps of pressing a green sheet and baking it to form a substrate constituting a covering member, and forming an organic film made of a resin film on the substrate, And a step of forming an antireflection layer by baking treatment.

The timepiece dial manufacturing method of the present invention comprises the steps of powder injection molding and firing to form a substrate constituting a covering member, and forming an organic film made of a resin film on the substrate and firing. And a step of forming an antireflection layer.

The method of manufacturing a timepiece dial of the present invention comprises the steps of placing a ceramic material containing a binder in a mold and subjecting it to a pressure treatment and a firing treatment to form a substrate constituting a covering member, and a step of forming a substrate on the substrate. And a step of forming an antireflection layer made of an inorganic film by a physical vapor deposition method.

The timepiece dial manufacturing method of the present invention comprises the steps of press working a green sheet and baking it to form a substrate constituting a covering member, and physical vapor deposition of an antireflection layer made of an inorganic film on the substrate. And a step of forming by a method.

The timepiece dial manufacturing method of the present invention comprises the steps of powder injection molding and firing to form a substrate constituting a covering member, and an antireflection layer comprising an inorganic film formed on the substrate by physical vapor deposition. And a forming step.

The method of manufacturing a timepiece dial of the present invention comprises the steps of placing a ceramic material containing a binder in a mold and subjecting it to a pressure treatment and a firing treatment to form a substrate constituting a covering member, and a step of forming a substrate on the substrate. And a step of forming an antireflection layer made of an inorganic film by a chemical vapor deposition method.

The timepiece dial manufacturing method of the present invention comprises the steps of pressing a green sheet and baking it to form a substrate forming a covering member, and chemically forming an antireflection layer made of an inorganic film on the substrate. And a step of forming by a vapor phase growth method.

The method of manufacturing a timepiece dial of the present invention comprises a step of forming a substrate constituting a covering member by powder injection molding and a firing treatment, and an antireflection layer made of an inorganic film on the substrate in a chemical vapor phase. And a step of forming by a growth method.

The method of manufacturing a timepiece dial of the present invention comprises the steps of placing a ceramic material containing a binder in a mold and subjecting it to a pressure treatment and a firing treatment to form a substrate constituting a covering member, and a step of forming a substrate on the substrate. Forming a coated glass film and performing a baking treatment to form an antireflection layer.

The timepiece dial manufacturing method of the present invention comprises the steps of press working a green sheet and baking it to form a substrate constituting a covering member, and forming a coated glass film on the substrate and baking it. And a step of forming an antireflection layer.

The timepiece dial manufacturing method of the present invention comprises the steps of powder injection molding and firing to form a substrate constituting a covering member, and forming a coated glass film on the substrate and firing to perform reflection. And a step of forming a prevention layer.

The timepiece dial manufacturing method of the present invention comprises the steps of placing a ceramic material containing a binder in a mold and subjecting it to a pressure treatment and a firing treatment to form a substrate constituting a covering member, and a step of forming the substrate on the substrate. The method is characterized by including a step of forming an organic film and further performing a baking treatment to form an antireflection layer, and a step of forming a time scale, characters and marks on the light receiving surface side.

The timepiece dial manufacturing method of the present invention comprises the steps of pressing a green sheet and subjecting it to firing to form a substrate constituting a covering member, and forming an organic film on the substrate and performing firing. The method is characterized by including a step of forming an antireflection layer and a step of forming a time scale, characters and marks on the light receiving surface side.

The timepiece dial manufacturing method of the present invention comprises the steps of powder injection molding and firing to form a substrate constituting a covering member, and an organic film formed on the substrate to perform firing to prevent reflection. The method is characterized by including a step of forming a layer and a step of forming a time scale, characters and marks on the light receiving surface side.

The method of manufacturing a timepiece dial of the present invention comprises the steps of placing a ceramic material containing a binder in a mold and subjecting it to a pressure treatment and a firing treatment to form a substrate constituting a covering member, and a step of forming a substrate on the substrate. The method is characterized by including a step of forming an organic film made of a resin film and performing a baking treatment to form an antireflection layer, and a step of forming a time scale, characters and marks on the light receiving surface side.

The timepiece dial manufacturing method of the present invention comprises the steps of pressing a green sheet and firing it to form a substrate constituting a covering member, and forming an organic film made of a resin film on the substrate, The method is characterized by including a step of performing a baking treatment to form an antireflection layer, and a step of forming a time scale, characters and marks on the light receiving surface side.

The timepiece dial manufacturing method of the present invention comprises the steps of powder injection molding and firing to form a substrate constituting a covering member, and forming an organic film made of a resin film on the substrate and firing. And a step of forming an antireflection layer, and a step of forming a time scale, a character and a mark on the light receiving surface side.

The method of manufacturing a timepiece dial according to the present invention comprises the steps of placing a ceramic material containing a binder in a mold and performing a pressure treatment and a firing treatment to form a substrate constituting a covering member, and a step of forming a substrate on the substrate. The method is characterized by including a step of forming an antireflection layer made of an inorganic film by a physical vapor deposition method, and a step of forming a time scale, characters and marks on the light receiving surface side.

The timepiece dial manufacturing method of the present invention comprises the steps of pressing a green sheet and baking it to form a substrate constituting a covering member, and physically vapor-depositing an antireflection layer made of an inorganic film on the substrate. The method is characterized by having a step of forming by a method and a step of forming a time scale, characters and marks on the light receiving surface side.

The timepiece dial manufacturing method of the present invention comprises the steps of powder injection molding and baking to form a substrate constituting a covering member, and an antireflection layer made of an inorganic film on the substrate by physical vapor deposition. The method is characterized by including a step of forming and a step of forming a time scale, characters and marks on the light receiving surface side.

The method of manufacturing a timepiece dial of the present invention comprises the steps of placing a ceramic material containing a binder in a mold and subjecting it to a pressure treatment and a firing treatment to form a substrate constituting a covering member, and a step of forming a substrate on the substrate. The method is characterized by including a step of forming an antireflection layer made of an inorganic film by a chemical vapor deposition method, and a step of forming a time scale, characters and marks on the light receiving surface side.

The timepiece dial manufacturing method of the present invention comprises the steps of pressing a green sheet and baking it to form a substrate constituting a covering member, and chemically forming an antireflection layer made of an inorganic film on the substrate. A step of forming by a vapor phase growth method,
The method is characterized by including a time scale, a step of forming characters and marks on the light receiving surface side.

The method for producing a timepiece dial of the present invention comprises a step of forming a substrate constituting a covering member by performing powder injection molding and a firing treatment, and an antireflection layer made of an inorganic film on the substrate in a chemical vapor phase. The method is characterized by including a step of forming by a growth method and a step of forming a time scale, characters and marks on the light receiving surface side.

In the method of manufacturing a timepiece dial of the present invention, a step of placing a ceramic material containing a binder in a mold to perform a pressure treatment and a firing treatment to form a substrate constituting a covering member, and a step of forming the substrate on the substrate. The method is characterized by including a step of forming a coated glass film and performing a baking treatment to form an antireflection layer, and a step of forming a time scale, characters and marks on the light receiving surface side.

The timepiece dial manufacturing method of the present invention comprises the steps of pressing a green sheet and baking it to form a substrate constituting a covering member, and forming a coated glass film on the substrate and baking it. And a step of forming an antireflection layer,
The method is characterized by including a time scale, a step of forming characters and marks on the light receiving surface side.

The timepiece dial manufacturing method of the present invention comprises the steps of powder injection molding and firing to form a substrate constituting a covering member, and forming a coated glass film on the substrate and firing to perform reflection. The method is characterized by including a step of forming the prevention layer and a step of forming a time scale, characters and marks on the light receiving surface side.

[0045]

In the covering member which constitutes the dial of the present invention and is arranged on the light receiving surface side of the solar cell, the structure in which the antireflection layer is provided on the substrate is adopted.

A ceramic material is applied as the substrate, and an organic film or an inorganic film made of a translucent film is applied as the material of the antireflection layer.

By thus providing the antireflection layer on the light-receiving surface side of the substrate, the reflection of light on the substrate surface is reduced,
The transmittance of the covering member increases, the amount of light reaching the solar cell increases, and the electromotive force of the solar cell increases.

[0048]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The construction of a timepiece dial in an embodiment of the present invention and a manufacturing method for forming this construction will be described below with reference to the drawings.

First, the construction of the timepiece dial in the embodiment of the present invention will be described with reference to FIGS. 1, 2 and 3. FIG. 1 is a cross-sectional view showing a covering member constituting a timepiece dial according to an embodiment of the present invention, and FIG. 2 is a cross-sectional view showing a state in which the dial according to the embodiment of the present invention is incorporated into a timepiece. FIG. 3 is a plan view showing a timepiece dial in the embodiment of the invention. Hereinafter, the structure of the timepiece dial will be described with reference to FIGS. 1, 2, and 3 alternately.

As shown in FIG. 2, a case 25 for attaching a windshield 23 made of transparent glass or sapphire.
A movement 27 is provided inside. This movement 2
7 drives the pointer 29.

Although not shown in FIG. 2, an electric double layer capacitor for storing the electromotive force of the solar cell 19, a crystal oscillator as a time reference source, and an oscillation frequency of the crystal oscillator are provided in the movement 27. A semiconductor integrated circuit for generating a drive pulse for driving the timepiece, a step motor for receiving the drive pulse and driving the hands 29 for the wheel train mechanism every one second, and a wheel train mechanism are provided.

The windshield 23 is attached to the case 25 via a second packing 39 made of a resin material,
The watch has an airtight structure that prevents dust, dirt, and water from entering the watch.

Further, a groove is provided on the surface of the case 25 opposite to the windshield 23, and a first packing 37 made of a rubber material is provided in the groove. And the back cover 35 and the case 25
The first packing 37 arranged between the and has a hermetic structure that prevents dust, dust, and water from entering the timepiece.

The dial 2 is used as the time display means of the clock.
1 comprises a solar cell 19 and a covering member 17, and is arranged on the lower surface side of the windshield 23. Then, on the light receiving surface side of the dial 21, the movement 27 is provided via the covering member 17.
The solar cell 19 for generating electromotive force for driving

The solar cell 19 has a function of converting light energy into electric energy. And solar cell 19
Selectively introduces a p-type impurity and an n-type impurity into the non-single-crystal silicon thin film, and further reduces the impurity concentration between the p-type non-single-crystal silicon thin film and the n-type non-single-crystal silicon thin film. It has a pin structure having a low i-type non-single-crystal silicon thin film.

In this solar cell 19, four solar cells are connected in series to obtain an electromotive force of 2.1V to 2.3V.

Further, a covering member 17 is provided on the light receiving surface side of the solar cell 19 so that the solar cell 19 cannot be seen from the windshield 23 side. As shown in the plan view of FIG. 3, the front surface of the covering member 17 is provided with time scales, characters, and marks every 5 minutes or every 1 minute.

Further, the covering member 17 has a 12 o'clock position and a 6 o'clock position.
Protrusions 47 are provided at the respective hour positions. Furthermore, a concave portion corresponding to the protruding portion 47 of the covering member 17 is formed in the inner frame 33
(See FIG. 2), and further, the inner frame 33 is provided with a step corresponding to the covering member 17.

Then, the protrusion 47 of the covering member 17 and the inner frame 3
The position of the dial 21 with respect to the movement 27 is regulated by aligning with the concave portion of No. 3.

Further, the covering member 17 is provided with a central hole 41 for projecting the hour wheel for driving the hour hand, the cylindrical pinion for driving the minute hand, and the second hand wheel for driving the second hand.

Furthermore, the covering member 17 is provided with a window portion 43 through which the date plate for displaying the date and the day board for displaying the day of the week can be seen from the covering member 17.

The middle frame 33 includes the movement 27 and the covering member 1.
7 and the solar cell 19 are held in the case 25, and the inner frame 33 is made of a resin material. And case 25
The covering member 17, the solar cell 19, and the movement 27 are housed in the opening of the casing via the middle frame 33.

As described above, the covering member 17 is provided on the middle frame 33.
A step having the same size as the plate thickness is provided, and the covering member 17 is housed so as to be dropped into the step of the inner frame 33. For this reason, the surface side that comes into contact with the case 25 and the parting 31 has the middle frame 3
3 and the covering member 17 have the same height, and are substantially flush with each other.

Further, in the middle frame 33, an opening for accommodating the solar cell 19 is provided below the step for accommodating the covering member 17, and the solar cell 19 is arranged on the lower surface of the covering member 17.

Then, the end face region of the middle frame 33 holding the covering member 17, the solar cell 19 and the movement 27 on the side opposite to the windshield 23 is pressed by the back cover 35, so that the covering 31 and the case 25 are covered with the covering member 17. Are touching as if pressing.

The parting wall 31 covers the outer peripheral region of the covering member 19 and has a role as a decorative plate of a timepiece. The partition 31 is made of a material different from that of the case 25, or the surface of the partition 31 is ground with a diamond tool to make the surface mirror-finished.

This covering member 17 is, as shown in FIG.
It is composed of a substrate 11 and an antireflection layer 13 provided on the substrate 11 and on the light receiving surface side of the covering member 17.

The covering member 17 is the covering member 17
Half to two-thirds of the light applied to the solar cell 19 is transmitted and is applied to the solar cell 19 to generate electromotive force.

The substrate 11 of the present invention is made of a ceramic material having a thickness of about 0.1 mm to 0.5 mm. Here, the limit of the thickness of the substrate 11 is limited by the strength of the material of the substrate 11, and the limit of the thickness is limited by the transmittance of the substrate 11 and the thickness of the timepiece, and is in the above-mentioned thickness range.

Alumina or zirconia material is used as the material of the substrate 11 made of ceramics.

Antireflection layer 1 provided on the light receiving surface side of the substrate 11.
5 is composed of an organic film or an inorganic film. For the antireflection layer 15, a resin film is applied as the organic film, and as the inorganic film, a silicon oxide film (SiO2), a silicon nitride film (Si3 N4), an aluminum oxide (Al2 O3) or a tantalum oxide film (Ta2 O5). Apply.

The antireflection layer 15 made of the organic film or the inorganic film has a light transmittance of 98% to 100% of the antireflection layer 15 and has a small surface roughness and a smooth surface. Therefore, irregular reflection of light on the surface of the antireflection layer 15 can be reduced.

Comparing the transmittance between the case where the antireflection layer 15 is provided on the substrate 11 and the case where the antireflection layer 15 is not provided on the substrate 11, the covering member is provided when the antireflection layer 15 is provided. The transmittance at 17 is 3.5% to 5.0
% Had improved.

It is considered that this is because diffuse reflection of light on the surface of the covering member 11 can be reduced by providing the antireflection layer 15 and the transmittance can be increased. As a result, the amount of light that passes through the covering member 17 and is applied to the solar cell 19 increases, and the electromotive force of the solar cell 19 increases.

Next, a method of manufacturing the timepiece dial according to the embodiment of the present invention will be described. First, a manufacturing method for forming the solar cell 19 will be described.

First, as a supporting substrate for the solar cell 19, Kovar, which is an alloy of iron, nickel, and cobalt, is pressed to form the outer shape of the solar cell 19, the center hole 41, and, if necessary, the display window. And 43.

Kovar used as a supporting substrate of the solar cell 19 has a coefficient of linear expansion substantially equal to that of the glass layer which is an insulating film formed on the supporting substrate. Therefore, it is possible to prevent the glass layer from being damaged by the temperature change.

After that, 2 is formed on the back surface of Kovar which is a supporting substrate.
Two dial feet (not shown) are formed by means of spot welding or gluing.

In this dial foot, the movement 27 and the dial 21 are positioned relative to each other, and the dial foot is pushed into the hole of the movement 27 or the side of the dial foot is screwed. By doing so, the dial 21 is fixed to the movement 27.

This dial foot does not have to be formed on the solar cell 19, and the thin plate on which the dial foot is formed and the Kovar support substrate on which the solar cell is formed are joined together with an adhesive to form the dial. It may be 21.

Thereafter, a liquid coating glass film (SOG) is formed on the entire surface opposite to the surface on which the dial is formed by spin coating.

After that, a baking treatment is performed at a temperature of 300 ° C. to 400 ° C. to evaporate the solvent contained in the coated glass film to form a glass layer (not shown).

This glass layer is formed with a film thickness of 1 μm to 2 μm, and the film thickness can be controlled by adjusting the number of rotations in the spin coating method and the viscosity of the solvent contained in the coated glass film.

The coated glass film can be formed by a printing method, a dipping method in which a substrate is immersed in a coated glass liquid to form it, or a method using a roll, in addition to the spin coating method. .

Next, a lower electrode (not shown) is formed by using a sputtering device. The lower electrode is made of aluminum containing about 1% by weight of silicon. This lower electrode is selectively formed on the glass layer and has a film thickness of 1 μm.

When selectively forming the lower electrode, a metal mask is used. This metal mask is made of a thin metal material, and an opening is provided in the region where the lower electrode is formed. Then, the metal mask having the opening is formed on the supporting substrate of Kovar and placed in the sputtering apparatus to form the lower electrode in the opening.

Further, using the same sputtering apparatus,
A diffusion prevention layer (not shown) made of chromium (Cr) is formed on the upper surface of the lower electrode to have a film thickness of 100 nm. The diffusion prevention layer has a role of preventing mutual diffusion between the lower electrode and the semiconductor layer.

When a refractory metal or an alloy film of refractory metal and silicon is used as the lower electrode, this diffusion prevention layer can suppress mutual diffusion between the lower electrode and the semiconductor layer, and therefore this diffusion is prevented. The formation of the prevention layer can be omitted.

Next, on the upper surface of the diffusion prevention layer, a semiconductor layer made of a thin non-single crystal silicon film and serving as a solar cell,
It is selectively formed using a metal mask.

The semiconductor layer is composed of an amorphous silicon film as a non-single crystal silicon film, and has a conductivity type of nip structure from the diffusion prevention layer side.

The formation of this semiconductor layer is performed by using a plasma chemical vapor deposition apparatus. Silane gas (SiH4) is used as a reaction gas, amorphous silicon having a conductivity type of n-type is formed by adding diborane gas (B2 H6) as an impurity, and amorphous silicon having a conductivity type of p-type is formed as a phosphine gas (impurity). It is formed by adding PH3). Note that i-type amorphous silicon may be formed without adding impurities.

The p-layer and the n-layer have film thicknesses of 5 and 5, respectively.
The thickness of the i layer is 50 to 300 nm.

The semiconductor layer made of amorphous silicon having the pin structure is continuously formed in the plasma chemical vapor deposition apparatus.

At this time, the space between the lower electrodes to be patterned is increased, or the sheet resistance of the n-type semiconductor layer, which is the lowermost semiconductor layer, is set to 10 ⁸ Ω to 10 ^10.
When Ω is set, the leak current between the adjacent semiconductor layers 19 can be suppressed to be low, and the semiconductor layer can be formed on the entire surface.

Next, indium tin oxide (ITO) is selectively formed as a transparent electrode film on the upper surface of the semiconductor layer by using a sputtering device to form an upper electrode (not shown).

This upper electrode is selectively formed so as to connect to the upper surface of the semiconductor layer and the diffusion prevention layer. Then, the upper electrode is formed with a film thickness of 100 nm.

When selectively forming the upper electrode, a metal mask is used as in the method of forming the lower electrode and the semiconductor layer. The metal mask is made of a thin metal material, and an opening is provided in a region where the transparent electrode film is formed. Then, a metal mask having an opening is overlaid on the semiconductor layer and placed in a sputtering apparatus to form indium tin oxide in the opening.

Thereafter, an acrylic resin or an epoxy resin having a transmittance of about 99% is formed on the entire surface by a spin coating method,
A baking process is performed at a temperature of 200 ° C. to form a protective film (not shown), whereby the solar cell 19 can be formed.

This protective film is formed with a film thickness of 2 μm. If the inside of the case 25 is airtight, moisture does not enter, and the change in humidity is small, the formation of the protective film can be omitted.

Next, a method of forming the covering member 17 will be described. First, a method of forming the substrate 11 will be described. A mixture of ceramic material such as alumina or zirconia and a binder is put into a mold.

Here, alumina or zirconia having a particle diameter of 0.3 μm is used, and 3.0% of a binder is added.

Here, the purity of alumina or zirconia is 9
9.9% or more is used, and polyvinyl alcohol (PVA) is used as the binder.

After that, the mold containing the ceramic material and the binder is subjected to a pressure treatment using a pressing device. The pressure during this pressure treatment is 1 ton / cm ² .

At this time, the substrate 11 has not only the outer shape but also the protrusion 47 for restricting the position, the window portion 43 for displaying the date and the day of the week, the protrusion for the hour wheel, the pinion and the second hand shaft. The central hole 41 is formed at the same time.

Then, a first firing process is performed to remove the binder made of polyvinyl alcohol added to the ceramics. This first firing process is 1200 ° C.
To about 1400 ° C., the firing time is 120 minutes, and the firing atmosphere is in the air. By the first baking treatment for removing the binder, the outer dimensions are slightly reduced, but the thickness is hardly changed.

After that, the second baking treatment is performed at a temperature higher than that of the first baking treatment. The second firing process is performed at a temperature of 1500 ° C. to 1900 ° C., which is a temperature at which the ceramic is melted, and a firing time of 300 minutes. The firing atmosphere is hydrogen.

Since the second firing process is performed at a temperature at which the ceramic material melts as described above, the grain size thereof becomes larger than 0.3 μm.

The light transmittance of the substrate 11 can be increased by increasing the grain size of the ceramics.
The cause of the improvement in transmittance due to this grain size enlargement treatment is the substrate 1
This is because the reflected light on one surface can be reduced.

After that, the waviness generated on the surface of the substrate 11 is removed by using a grinding device, and the surface is flattened.
This grinding process may be performed on both sides simultaneously, or may be performed on one side by attaching ceramics to a processing jig using wax. The grinding process is performed using diamond abrasive grains or a diamond grindstone.

The size of the grinding process is about 0.3 mm. That is, at the end of the pressing process by the mold, the dimension is set to be 0.3 mm thicker than the final finished dimension of the substrate 11.

After that, the ceramic is subjected to a third firing treatment at a temperature lower than that in the second firing treatment, that is, from 1200 ° C. to 1400 ° C., under the condition that the firing time is 120 minutes. This third baking treatment is performed in hydrogen to remove the dirt attached to the surface of the substrate 11.

After that, the substrate 11 is barrel-processed by using a barrel device. The barrel processing is performed using copper (Cu) balls.

By this barrel processing, the surface roughness of the substrate 11 is reduced and the light transmittance of the substrate 11 is improved. Further, barrel processing can remove burrs generated at the outer edge portion and the corner portion of the substrate 11, and can further form roundness at the corner portion.

After that, the substrate 11 can be formed by performing the fourth baking treatment on the substrate 11 at a temperature lower than that of the second baking treatment, that is, 1200 ° C. to 1400 ° C., under the condition that the baking time is 120 minutes. . The fourth baking treatment is carried out in hydrogen to remove the dirt adhering to the surface and clean the surface.

In the manufacturing process of the substrate 11 described above, the surface flatness and the thickness variation should be reduced in the pressure treatment of the ceramic material and the first and second firing treatments performed using the mold. If this is possible, the grinding process for controlling the thickness and the surface flatness and the third firing process after this grinding process can be omitted.

Next, the antireflection layer 1 is formed on the light receiving surface side of the substrate 11.
A manufacturing method for forming No. 5 will be described. First, a method for forming the antireflection layer 15 made of an organic film will be described.

In the embodiment of the present invention, an epoxy resin material is used as the resin film made of the organic film which is the antireflection layer 15. Using a spin coating method, JSS-715 (trade name) of Japan Synthetic Rubber is formed on the substrate 11 on the light receiving surface side of the substrate 11 to have a film thickness of 5 μm.

After that, baking treatment is carried out at a temperature of 200 ° C. to 250 ° C. in a heating furnace to evaporate the solvent in the organic film and form the antireflection layer 15.

The antireflection layer 15 made of this epoxy resin material has a light transmittance of 98% to 99%, and the surface of the coating film has a small surface roughness and a smooth surface. Diffuse reflection is reduced, and the light transmittance of the covering member 17 is increased. As a result, the electromotive force of the solar cell 19 increases.

Next, a method of forming the antireflection layer 15 made of an inorganic film will be described. An example in which a coated glass film is used as the material of the antireflection layer 15 made of an inorganic film will be described first.

The coated glass film is a mixture of a glass material and a solvent such as alcohol and is formed on the substrate 11 by the spin coating method. At this time, the formed film thickness can be controlled by adjusting the number of revolutions of the spin coater and the viscosity of the coated glass film. The thickness of the antireflection layer 15 to be formed is 3 μm.

After that, a baking treatment is performed at a temperature of 300 ° C. to 400 ° C. in a heating furnace to evaporate the solvent contained in the coated glass film to obtain the antireflection layer 15 made of the coated glass film.

Antireflection layer 15 comprising this coated glass film
, The light transmittance is 98% to 99%, and since the coating surface has a smooth surface with a small surface roughness, diffuse reflection of light on the surface is reduced, and the light transmission through the coating member 17 is reduced. The rate is increased and the electromotive force in the solar cell 19 is increased.

Next, in the method of forming the antireflection layer 15 made of an inorganic film, a method of forming the antireflection layer 15 by applying physical vapor deposition as the film forming method will be described.

As the physical vapor deposition method, there are a vacuum vapor deposition method, a sputtering method and an ion beam vapor deposition method. The physical vapor deposition method is a method in which neutral or ionized particles are made incident on a substrate in a vacuum to form a film. With this physical vapor deposition method, a silicon oxide film, an aluminum oxide film, or a tantalum oxide film can be formed.

Antireflection layer 1 formed by this physical vapor deposition method
In No. 5, since the light transmittance is 98% to 100%, and the coating surface has a small surface roughness and a smooth surface, diffuse reflection of light on the surface is reduced and the light in the coating member 17 is reduced. The transmittance increases and the electromotive force in the solar cell 19 increases.

Next, in the method of forming the antireflection layer 15 made of an inorganic film, a method of forming the antireflection layer 15 by applying the chemical vapor deposition method as the film forming method will be described.

This chemical vapor deposition method is to transport the gas of the compound of the coating film to be formed onto the substrate heated to a high temperature, and cause thermal decomposition or reaction with other gas or vapor to produce reaction on the substrate. It is a method of forming a film to deposit a substance. By this chemical vapor deposition method, a silicon oxide film or a silicon nitride film can be formed.

When forming this silicon oxide film, monosilane (SiH4) and oxygen (O2) are used as the compound gas of the film. Further, when forming a silicon nitride film, the compound gas of the film is monosilane (SiH
4) and ammonia (NH3) are used.

In the antireflection layer 15 formed by this chemical vapor deposition method, the light transmittance is 98% to 100%.
In addition, since the coating surface has a small surface roughness and a smooth surface, diffuse reflection of light on the surface is reduced, the light transmittance of the coating member 17 is increased, and the electromotive force of the solar cell 19 is increased. Become.

On the substrate 11 having the antireflection layer 15 formed on the light-receiving surface side of the covering member 17 in this manner, thereafter, a time scale, a character or a mark is formed every 5 minutes or 1 minute of the time. The time scale or the like may be formed on the parting line 31 without being formed on the covering member 17.

Next, the structure of the covering member having a structure different from that described above will be described with reference to FIG. FIG. 4 is a sectional view showing a timepiece that houses the covering member according to the embodiment of the present invention. In FIG. 4, the same parts as those in FIG. 2 are designated by the same reference numerals. The following description will be focused on the differences from the previous embodiment, and the description of the same configuration as the previous embodiment will be omitted.

The structure of the covering member 17 shown in FIG. 4 is the same as that of the previous embodiment. The difference is that two through holes are provided in the covering member 17 in the area covered by the parting 31, and the dial feet 45 are provided in these through holes. The position of the dial 21 with respect to the movement 27 is regulated by using the dial 45.

Further, the solar cell 19 has the dial plate 4
An opening corresponding to 5 is provided. The cover member 17 and the solar cell 19 are fixed to the movement 27 by screwing from the side surface of the dial plate 45 or by pushing the dial plate 45 into the hole provided in the movement 27.

In the above description of the embodiments, the substrate 11 made of ceramics is formed by pressure treatment using a die, but it is formed by press working using a green sheet and then firing treatment, or powder injection. The substrate 11 may be formed by molding and then firing treatment.

Further, by lapping the surface of the substrate 11 on which the antireflection layer 15 is formed to reduce the surface roughness, the light transmittance of the covering member 17 can be further improved.

[0137]

As is apparent from the above description, in the cover member of the dial according to the present invention, the antireflection layer is provided on the light receiving surface side of the substrate. Ceramic is applied to this substrate. Therefore, by providing an antireflection layer on the light-receiving surface side of the substrate, the reflection of light on the substrate surface is reduced,
The transmittance of the coating member increases, the amount of light reaching the solar cell increases, and the electromotive force of the solar cell increases.

[Brief description of drawings]

FIG. 1 is a cross-sectional view showing a structure of a timepiece dial and a manufacturing method thereof according to an embodiment of the present invention.

FIG. 2 is a sectional view showing a timepiece to which the timepiece dial according to the embodiment of the invention is applied.

FIG. 3 is a plan view showing a configuration of a timepiece dial and a method of manufacturing the same according to an embodiment of the present invention.

FIG. 4 is a sectional view showing a timepiece to which the timepiece dial according to the embodiment of the invention is applied.

[Explanation of symbols]

 11 Substrate 15 Antireflection Layer 17 Covering Member 19 Solar Cell 21 Dial 27 Movement 47 Projection

Claims (36)

[Claims] 1. A case having a windshield, a movement for driving a pointer, a solar cell arranged on the windshield side of the movement, and a covering member arranged on the light receiving surface side of the solar cell, wherein the covering member is a substrate. And a dial for a timepiece, which has an antireflection layer provided on the substrate. 2. A case having a windshield, a movement for driving a pointer, a solar cell arranged on the windshield side of the movement, and a covering member arranged on the light receiving surface side of the solar cell, wherein the covering member is a ceramic. A timepiece dial having a substrate made of and an antireflection layer provided on the substrate. 3. A case having a windshield, a movement for driving a pointer, a solar cell arranged on the windshield side of the movement, and a covering member arranged on the light receiving surface side of the solar cell, wherein the covering member is ceramics. A timepiece dial having a substrate made of and an antireflection layer made of an organic film provided on the substrate. 4. A case having a windshield, a movement for driving a pointer, a solar cell arranged on the windshield side of the movement, and a covering member arranged on the light receiving surface side of the solar cell, wherein the covering member is ceramics. A timepiece dial having a substrate made of and an antireflection layer made of an inorganic film provided on the substrate. 5. A case having a windshield, a movement for driving a pointer, a solar cell arranged on the windshield side of the movement, and a covering member arranged on the light receiving surface side of the solar cell, wherein the covering member is ceramics. A dial for a timepiece, which has a substrate made of and an antireflection layer of an organic film made of a resin film provided on the substrate. 6. A case having a windshield, a movement for driving a pointer, a solar cell arranged on the windshield side of the movement, and a covering member arranged on the light receiving surface side of the solar cell, wherein the covering member is ceramics. A timepiece dial having a substrate made of and an inorganic antireflection layer made of a silicon oxide film, a silicon nitride film, an aluminum oxide film, or a tantalum oxide film provided on the substrate. 7. A step of placing a ceramic material containing a binder in a mold and performing a pressure treatment and a firing treatment to form a substrate constituting a covering member, and forming an organic film on the substrate and performing a firing treatment to cause reflection. And a step of forming a preventive layer. 8. The method comprises the steps of pressing a green sheet and subjecting it to firing to form a substrate that constitutes a covering member, and forming an organic film on the substrate and performing firing to form an antireflection layer. A method for manufacturing a timepiece dial, which is characterized by the above. 9. A method comprising: a step of performing powder injection molding and a baking treatment to form a substrate constituting a covering member; and a step of forming an organic film on the substrate and performing a baking treatment to form an antireflection layer. A method of manufacturing a timepiece dial having a characteristic feature. 10. A step of placing a ceramic material containing a binder in a mold to perform a pressure treatment and a firing treatment to form a substrate constituting a covering member, and forming an organic film made of a resin film on the substrate and firing the substrate. And a step of forming an antireflection layer by a treatment, the method for producing a timepiece dial. 11. A step of pressing a green sheet and baking it to form a substrate that constitutes a covering member, and forming an organic film made of a resin film on the substrate and baking it to form an antireflection layer. A method of manufacturing a timepiece dial, which comprises the steps of: 12. A step of forming a substrate that constitutes a covering member by performing powder injection molding and a baking treatment, and a step of forming an organic film made of a resin film on the substrate and performing a baking treatment to form an antireflection layer. A method for manufacturing a timepiece dial, comprising: 13. A step of placing a ceramic material containing a binder in a mold to perform a pressure treatment and a firing treatment to form a substrate constituting a covering member, and a physical vapor deposition method for forming an antireflection layer made of an inorganic film on the substrate. And a step of forming the dial according to the present invention. 14. The method comprises the steps of pressing a green sheet and baking it to form a substrate constituting a covering member, and forming an antireflection layer made of an inorganic film on the substrate by a physical vapor deposition method. A method of manufacturing a timepiece dial having a characteristic feature. 15. A method comprising: a step of forming a substrate that constitutes a covering member by performing powder injection molding and a baking treatment; and a step of forming an antireflection layer made of an inorganic film on the substrate by a physical vapor deposition method. Manufacturing method for timepiece dials. 16. A step of forming a substrate constituting a covering member by placing a ceramic material containing a binder in a mold and performing a pressure treatment and a firing treatment, and an antireflection layer made of an inorganic film on the substrate by chemical vapor deposition. And a step of forming it by a phase growth method. 17. A step of forming a substrate constituting a covering member by pressing a green sheet and baking the green sheet, and a step of forming an antireflection layer made of an inorganic film on the substrate by a chemical vapor deposition method. A method for manufacturing a timepiece dial, which comprises: 18. A step of forming a substrate constituting a covering member by performing powder injection molding and a firing process, and a step of forming an antireflection layer made of an inorganic film on the substrate by a chemical vapor deposition method. A method for manufacturing a dial for a watch characterized by. 19. A step of placing a ceramic material containing a binder in a mold and performing a pressure treatment and a firing treatment to form a substrate constituting a covering member, and forming a coated glass film on the substrate and performing a firing treatment. And a step of forming an antireflection layer. 20. A step of pressing a green sheet and baking it to form a substrate constituting a covering member, and a step of forming a coated glass film on the substrate and baking it to form an antireflection layer. A method for manufacturing a timepiece dial, which comprises: 21. A step of forming a substrate constituting a covering member by performing powder injection molding and a firing treatment, and a step of forming a coated glass film on the substrate and performing a firing treatment to form an antireflection layer. A method for manufacturing a dial for a watch characterized by. 22. A step of placing a ceramic material containing a binder in a mold and performing a pressure treatment and a firing treatment to form a substrate constituting a covering member; and forming an organic film on the substrate,
A method of manufacturing a timepiece dial, comprising: a step of performing a baking treatment to form an antireflection layer; and a step of forming a time scale, letters and marks on the light receiving surface side. 23. A step of pressing a green sheet to perform a baking treatment to form a substrate forming a covering member; a step of forming an organic film on the substrate and performing a baking treatment to form an antireflection layer; A method for manufacturing a timepiece dial, comprising: a time scale, a step of forming characters and marks on the surface side. 24. A step of forming a substrate that constitutes a covering member by performing powder injection molding and a baking treatment; a step of forming an organic film on the substrate and performing a baking treatment to form an antireflection layer;
A method of manufacturing a timepiece dial, comprising: a time scale, a step of forming characters and marks on the light receiving surface side. 25. A step of placing a ceramic material containing a binder in a mold and performing a pressure treatment and a firing treatment to form a substrate constituting a covering member; and forming an organic film made of a resin film on the substrate and firing the substrate. A method of manufacturing a timepiece dial, comprising: a step of performing a treatment to form an antireflection layer; and a step of forming a time scale, characters and marks on the light receiving surface side. 26. A step of forming a substrate constituting a covering member by pressing a green sheet and baking it, and forming an organic film made of a resin film on the substrate and baking it to form an antireflection layer. A method of manufacturing a timepiece dial, comprising: a step; and a step of forming a time scale, characters, and marks on the light-receiving surface side. 27. A step of forming a substrate that constitutes a covering member by performing powder injection molding and a baking treatment, and a step of forming an organic film made of a resin film on the substrate and performing a baking treatment to form an antireflection layer. A method of manufacturing a timepiece dial, comprising: a time scale, a step of forming characters and marks on the light receiving surface side. 28. A step of placing a ceramic material containing a binder in a mold to perform a pressure treatment and a firing treatment to form a substrate constituting a covering member, and a physical vapor deposition method for forming an antireflection layer made of an inorganic film on the substrate. And a step of forming a time scale, characters, and marks on the light-receiving surface side, the method of manufacturing a timepiece dial. 29. A step of pressing a green sheet and baking it to form a substrate constituting a covering member, a step of forming an antireflection layer made of an inorganic film on the substrate by a physical vapor deposition method, and a light receiving surface side. A method of manufacturing a timepiece dial, comprising: a time scale, a step of forming characters and marks. 30. A step of forming a substrate constituting a covering member by performing powder injection molding and a baking treatment, and a step of forming an antireflection layer made of an inorganic film on the substrate by a physical vapor deposition method,
A method of manufacturing a timepiece dial, comprising: a time scale, a step of forming characters and marks on the light receiving surface side. 31. A step of forming a substrate constituting a coating member by placing a ceramic material containing a binder in a mold and performing a pressure treatment and a firing treatment, and an antireflection layer made of an inorganic film on the substrate by chemical vapor deposition. A method of manufacturing a timepiece dial, comprising: a step of forming by a phase growth method; and a step of forming a time scale, characters and marks on the light receiving surface side. 32. A step of pressing a green sheet and baking it to form a substrate constituting a covering member, and a step of forming an antireflection layer made of an inorganic film on the substrate by a chemical vapor deposition method. A method of manufacturing a timepiece dial, comprising: a time scale, a step of forming characters and marks on the light receiving surface side. 33. A step of forming a substrate constituting a covering member by performing powder injection molding and a baking treatment, a step of forming an antireflection layer made of an inorganic film on the substrate by a chemical vapor deposition method, and a light receiving surface. A method of manufacturing a timepiece dial, comprising: a time scale, a step of forming characters and marks on the side. 34. A step of forming a substrate constituting a covering member by placing a ceramic material containing a binder in a mold and performing a pressure treatment and a firing treatment, and forming a coated glass film on the substrate and performing a firing treatment. A method of manufacturing a timepiece dial, comprising: a step of forming an antireflection layer; and a step of forming a time scale, characters and marks on the light receiving surface side. 35. A step of pressing a green sheet and subjecting it to firing to form a substrate constituting a covering member, and a step bb of forming a coated glass film on the substrate and performing firing to form an antireflection layer. A method of manufacturing a timepiece dial, comprising: a time scale, a step of forming characters and marks on the light receiving surface side. 36. A step of performing a powder injection molding and a baking treatment to form a substrate constituting a covering member, a step of forming a coated glass film on the substrate and performing a baking treatment to form an antireflection layer, and a light receiving surface. A method of manufacturing a timepiece dial, comprising: a time scale, a step of forming characters and marks on the side.