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JPH0922802A - Resistor - Google Patents

Resistor

Info

Publication number
JPH0922802A
JPH0922802A JP7168483A JP16848395A JPH0922802A JP H0922802 A JPH0922802 A JP H0922802A JP 7168483 A JP7168483 A JP 7168483A JP 16848395 A JP16848395 A JP 16848395A JP H0922802 A JPH0922802 A JP H0922802A
Authority
JP
Japan
Prior art keywords
melting point
resistance film
resistor
film
resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7168483A
Other languages
Japanese (ja)
Inventor
Masaaki Ito
政昭 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP7168483A priority Critical patent/JPH0922802A/en
Publication of JPH0922802A publication Critical patent/JPH0922802A/en
Pending legal-status Critical Current

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  • Details Of Resistors (AREA)
  • Non-Adjustable Resistors (AREA)
  • Thermistors And Varistors (AREA)
  • Fuses (AREA)

Abstract

(57)【要約】 【目的】 低抵抗値領域においても速時溶断性に優れた
ヒューズ抵抗器を提供することを目的とする。 【構成】 絶縁基体1の表面に、低融点物質3の微粉末
を分散させた金属抵抗皮膜を生成した抵抗皮膜2を形成
し、絶縁基体1の両端にキャップ4を圧入後リード線5
を溶接し、抵抗体周囲に絶縁塗装6を施した構成によ
り、低抵抗値領域においても速時溶断性に優れた抵抗器
を提供するものである。
(57) [Summary] [Objective] An object of the present invention is to provide a fuse resistor excellent in fast-melting property even in a low resistance value region. [Structure] A resistance film 2 having a metal resistance film in which a fine powder of a low melting point substance 3 is dispersed is formed on the surface of an insulating substrate 1, and a cap 4 is press-fitted into both ends of the insulating substrate 1 and lead wires 5 are formed.
The present invention provides a resistor which is excellent in fusing property at high speed even in a low resistance value region by welding the above and applying the insulating coating 6 around the resistor.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、各種電子機器の安全性
が要求される電子回路の保護対策において、特に速時溶
断性を必要とする抵抗器に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resistor which requires a fast fusing property as a measure for protecting electronic circuits which require safety of various electronic devices.

【0002】[0002]

【従来の技術】近年、テレビやVTRに代表される各種
電子機器の電子回路の異常時における安全性確保の問題
から一般の電流ヒューズを使用し対策を講じたものがあ
るが、電子機器の小型化や低価格化が進行している中
で、信頼性に優れた固定抵抗器と電流ヒューズ機能を合
わせ持った高付加価値の抵抗器の需要が高まっている。
また、電子機器の省電力化の中で、一般の固定抵抗器に
おいても省電力化傾向が進行し、低電力品で電気抵抗の
少ない低抵抗値品の要望が増大し、この傾向はヒューズ
抵抗器においても同様であり、特に低抵抗値化に対する
要望が強くなってきている。
2. Description of the Related Art In recent years, a general current fuse is used to take measures against the problem of ensuring safety when an electronic circuit of various electronic devices typified by a television and a VTR is abnormal. Along with the progress of cost reduction and price reduction, there is an increasing demand for high-value-added resistors that have both highly reliable fixed resistors and current fuse functions.
In addition, with the power saving of electronic devices, the power saving trend of general fixed resistors is also progressing, and the demand for low resistance products with low electric resistance and low electrical resistance is increasing. The same is true of the container, and there is a strong demand for a low resistance value.

【0003】従来、この種の抵抗器は、特開昭53−1
5556号に、皮膜抵抗器の抵抗値修正用に行う螺旋状
の溝切において、溝切の一部の間隔を接近させること
で、その部分の抵抗皮膜幅を狭くした構成であり、抵抗
器に異常過電流が印加された場合、抵抗皮膜の異常発熱
が特に抵抗皮膜幅を狭くした部分に集中し溶断特性を高
めたものが開示されている。
Conventionally, this type of resistor has been disclosed in Japanese Patent Laid-Open No. 53-1.
No. 5556 is a spiral groove cutting for correcting the resistance value of a film resistor, and the resistance film width of the part is narrowed by making a part of the groove cutting closer to each other. It is disclosed that when an abnormal overcurrent is applied, the abnormal heat generation of the resistance film is concentrated especially on the portion where the width of the resistance film is narrowed to improve the fusing property.

【0004】[0004]

【発明が解決しようとする課題】しかしながら上記の従
来の抵抗器の構成は、抵抗皮膜の溝切を行った場合、抵
抗値は溝切に比例し高くなっていくが、特に低抵抗値領
域においては目標抵抗値がもともと低いため溝切自体不
要となる場合が多いので、溝切方法に工夫を凝らして抵
抗皮膜幅の一部を狭くすること自体が困難であり溝切方
法を工夫した低抵抗値領域対応は難しく、高抵抗値領域
でのみ有効となることが多く、また、溶断特性を考慮し
抵抗皮膜幅を狭くした溝切を行った場合、定格負荷内で
使用した際でも定格電力に相当する電流は抵抗皮膜幅の
狭い部分に絶えず集中しており、抵抗値変化しやすい場
合があった。また瞬時的に印加される過渡電流(パルス
電流)においても、抵抗皮膜幅を狭くした部分のダメー
ジが大きく、一般に過渡電流には弱くなる特性があると
いう課題を有していた。
However, in the conventional resistor structure described above, when the resistance film is grooved, the resistance value increases in proportion to the grooving, especially in the low resistance value region. Since the target resistance value is originally low, it is often unnecessary to cut the groove itself. Therefore, it is difficult to narrow down a part of the resistance film width by devising the groove cutting method itself. It is difficult to deal with the value range, and it is often effective only in the high resistance value range.In addition, when flute cutting with a narrow resistance film width is performed in consideration of the fusing characteristics, the rated power is reduced even when used within the rated load. The corresponding current was constantly concentrated in the narrow portion of the resistance film, and the resistance value was likely to change. Further, even with a transient current (pulse current) that is instantaneously applied, there is a problem that the portion where the width of the resistance film is narrowed is large and the transient current generally has a characteristic of weakening.

【0005】本発明は、上記従来の課題を解決するもの
で、定常状態では一般の固定抵抗器と同様に優れた信頼
性を有し、逆に異常過電流印加時には低抵抗値領域にお
いても抵抗皮膜を瞬時に溶断できる優れた抵抗器を提供
することを目的とするものである。
The present invention solves the above-mentioned conventional problems and has excellent reliability in the steady state as in a general fixed resistor, and conversely, when an abnormal overcurrent is applied, the resistance is reduced even in a low resistance value region. It is an object of the present invention to provide an excellent resistor capable of instantaneously fusing a film.

【0006】[0006]

【課題を解決するための手段】本発明は上記目的を達成
するために、抵抗皮膜は金属皮膜に少なくともPbOと
23からなる低融点物質の微粉末を分散させたもので
ある。
According to the present invention, in order to achieve the above object, the resistance film is a metal film in which a fine powder of a low melting point substance containing at least PbO and B 2 O 3 is dispersed.

【0007】[0007]

【作用】したがって本発明は、抵抗皮膜中に、低融点物
質の微粉末を直接抵抗皮膜中に均一に分散させ、抵抗皮
膜を形成することで、定常状態時には低融点物質の融点
に到達していないため金属皮膜に悪影響を及ぼすことは
なく、抵抗器と同様に寿命特性に優れた信頼性を確保で
きる。
Therefore, according to the present invention, the fine powder of the low melting point substance is directly and uniformly dispersed in the resistance film to form the resistance film, so that the melting point of the low melting point substance is reached in the steady state. Since it does not have any adverse effect on the metal film, it can ensure reliability with excellent life characteristics as with resistors.

【0008】また従来、高い過負荷でしか溶断しなかっ
た低抵抗値の抵抗皮膜の厚い領域についても、溶断に必
要な充分な量の低融点物質を抵抗皮膜中に取り込んでい
るため、高抵抗値領域と同様に速断性に優れたものにで
きるほか、低融点物質の分散状態が均一に保たれた状態
で抵抗皮膜中の全域に存在しているため、異常過電流印
加時には瞬時に低融点物質が溶融し、抵抗皮膜を絶縁化
し溶断に至りやすい。
Further, even in the thick region of the resistance film having a low resistance value, which has conventionally been melted only by a high overload, a sufficient amount of the low melting point substance necessary for melting is taken into the resistance film, so that a high resistance is obtained. As well as the value range, it can be made to have excellent fast-acting properties.Because the low-melting-point substance is present in the entire resistance film in a uniformly dispersed state, the melting point is instantly low when an abnormal overcurrent is applied. The substance melts and insulates the resistance film, which easily leads to fusing.

【0009】[0009]

【実施例】以下に、本発明の一実施例について図面を参
照しながら説明する。
An embodiment of the present invention will be described below with reference to the drawings.

【0010】図1は、本発明の一実施例における抵抗器
の断面図である。図において、1は円筒状のセラミック
からなる絶縁基体である。2は絶縁基体1の表面に設け
られた抵抗皮膜で、Ni−P,Ni−B,Ni−P−
W,Cu−Ni,Ni−Cr等の少なくともいずれか一
つを含む金属皮膜にPbOとB23からなる低融点物質
3のうち好ましくは平均粒径20μm以下の微粉末を含
有してなるものである。この抵抗皮膜2は、めっき生成
は、めっき液中に低融点物質3の微粉末を分散させなが
らめっきすることで、めっき作業中に析出される金属皮
膜の金属イオンと一緒に絶縁基体1の表面に析出し、均
一に分散して抵抗皮膜中に取り込まれるため、めっき作
業中は低融点物質3の微粉末が抵抗皮膜中に均一に分散
しながら析出するように、めっき液のエアー撹拌や液循
環を行い、めっき液と低融点物質の微粉末が絶えず撹拌
したものを絶縁基体1の表面に無電解メッキや下地処理
後に電気めっきにて形成する。4は抵抗皮膜2に電気的
に接続するように絶縁基体1の両端に設けた金属製のキ
ャップである。5はキャップ4に電気的に接続するよう
に設けられたリード線である。6は少なくとも抵抗皮膜
2とキャップ4の一部を覆うように設けられたシリコン
系の塗料からなる絶縁塗装である。
FIG. 1 is a sectional view of a resistor according to an embodiment of the present invention. In the figure, 1 is an insulating substrate made of a cylindrical ceramic. Reference numeral 2 denotes a resistance film provided on the surface of the insulating substrate 1, which is Ni-P, Ni-B, Ni-P-.
A metal film containing at least one of W, Cu-Ni, Ni-Cr, etc., containing fine powder having an average particle size of 20 μm or less among low melting point substances 3 made of PbO and B 2 O 3. It is a thing. The resistance film 2 is formed by plating while dispersing a fine powder of the low melting point substance 3 in the plating solution, so that the surface of the insulating substrate 1 together with the metal ions of the metal film deposited during the plating operation. Since the fine powder of the low melting point substance 3 is uniformly dispersed and deposited in the resistance film during the plating operation, it is agitated by air or the liquid so that the fine powder of the low melting point substance 3 is uniformly dispersed in the resistance film. By circulating, the plating solution and the fine powder of the low melting point substance are constantly stirred to form electroless plating on the surface of the insulating substrate 1 or electroplating after the base treatment. Reference numerals 4 are metal caps provided at both ends of the insulating substrate 1 so as to be electrically connected to the resistance film 2. Reference numeral 5 is a lead wire provided so as to be electrically connected to the cap 4. Reference numeral 6 is an insulating coating made of silicon-based coating material which is provided so as to cover at least the resistance film 2 and a part of the cap 4.

【0011】以上の様に構成された抵抗器について、以
下にその動作について説明する。まず、抵抗器に異常過
電流が印加された場合、従来の抵抗器と同様に抵抗皮膜
2が過負荷の状態に応じた発熱を伴い抵抗皮膜の温度が
上昇し高温となる。次に、抵抗皮膜2の発熱に伴い抵抗
皮膜2中に均一に分散して取り込まれている低融点物質
3の微粉末が抵抗皮膜2と同温度まで加熱される。次
に、加熱された低融点物質3の微粉末はその融点である
400〜500℃に達すると、低融点物質3は溶融し始
め金属皮膜の構造変化を促し導電化傾向となり、抵抗皮
膜2の抵抗値を著しく低下させる。最後に、抵抗値の低
下により異常過電流が比例的に増加し、過負荷電力が瞬
時的に10〜300%高くなることで、皮膜溶融が促進
され加速的に溶断に至り安全に回路を遮断する。
The operation of the resistor configured as described above will be described below. First, when an abnormal overcurrent is applied to the resistor, the temperature of the resistor film 2 rises to a high temperature with heat generation according to the overload state of the resistor film 2 as in the conventional resistor. Then, the fine powder of the low melting point substance 3 which is uniformly dispersed and taken into the resistance coating 2 is heated to the same temperature as the resistance coating 2 as the resistance coating 2 is heated. Next, when the fine powder of the heated low-melting point substance 3 reaches its melting point of 400 to 500 ° C., the low-melting point substance 3 begins to melt and promotes the structural change of the metal film to become conductive, and the resistance film 2 The resistance value is significantly reduced. Lastly, the abnormal overcurrent increases proportionally due to the decrease in the resistance value, and the overload power instantaneously rises by 10 to 300%, which accelerates the melting of the film and accelerates the fusing to cut the circuit safely. To do.

【0012】図2は、低融点物質3の微粉末を分散させ
た抵抗器の溶断特性を示すものであり、試料は0.5W
タイプで電気めっきによる金属皮膜中に、平均粒径20
μm以下のPbOとB23からなる低融点物質の微粉末
を、抵抗皮膜組成に対して20wt%の割合で分散させな
がら着膜させ金属複合抵抗皮膜を形成したものである。
なお、めっき済みの初抵抗値は50mΩとし抵抗値修正
用の溝切は行っていない。図2より明らかなように、定
格電力の16倍でも10秒前後で溶断しており50mΩ
の低抵抗値品でも、充分な速断性を有していることが確
認された。
FIG. 2 shows the fusing characteristics of a resistor in which fine powder of the low melting point substance 3 is dispersed.
The average particle size of 20
A fine powder of a low melting point substance composed of PbO and B 2 O 3 having a particle size of μm or less is dispersed and dispersed at a ratio of 20 wt% with respect to the resistance film composition to form a metal composite resistance film.
The plated initial resistance value was 50 mΩ, and no groove was cut for resistance value correction. As is clear from Fig. 2, even at 16 times the rated power, it melted down in about 10 seconds and was 50 mΩ.
It was confirmed that even the low resistance product of No. 1 had sufficient quick-breaking property.

【0013】図3は抵抗皮膜への低融点物質微粉末の配
合割合と溶断特性の関係を示すものであり、抵抗皮膜中
の低融点物質の割合が0.5wt%の組成比率から溶断特
性に影響しており、極わずかな組成比率でも速断性を高
める効果を確認できた。また、低融点物質の割合が増加
することで溶断時間がより短縮して速断性を高めていく
が、その割合が80wt%を越えた場合は抵抗皮膜中の金
属組成の比率が少ないため、金属皮膜よりむしろ低融点
物質の特性に依存してしまい溶断時間が極端に短くなる
ことと、寿命特性等の抵抗器の一般特性を悪化させるた
め、溶断特性と一般の寿命特性を両立させた設計の抵抗
器には向かない。したがって抵抗器としての金属複合抵
抗皮膜中の低融点物質組成比は0.5〜80wt%が望ま
しい。
FIG. 3 shows the relationship between the blending ratio of the fine powder of the low melting point substance to the resistance film and the fusing property. The composition ratio of the low melting point substance in the resistance film is 0.5 wt% to the fusing property. As a result, it was confirmed that the effect of enhancing the quick-acting property was achieved even with an extremely small composition ratio. Further, as the proportion of the low melting point substance increases, the fusing time is further shortened to improve the fast-breaking property, but when the proportion exceeds 80 wt%, the ratio of the metal composition in the resistance film is small, and therefore the metal composition of the metal is low. Since the fusing time becomes extremely short because it depends on the characteristics of the low melting point material rather than the film, and the general characteristics of the resistor such as the life characteristics are deteriorated, a design that achieves both fusing characteristics and general life characteristics Not suitable for resistors. Therefore, the composition ratio of the low melting point substance in the metal composite resistance film as the resistor is preferably 0.5 to 80 wt%.

【0014】図4は、本発明の金属複合抵抗皮膜と、従
来品として抵抗皮膜表面に低融点ガラス塗布した抵抗器
との溶断特性差を示すものであり、試料は0.5Wタイ
プを用いている。抵抗値については、従来品の製造可能
な最低抵抗値(0.22Ω)一定とし溶断特性を比較し
た。図4より明らかなように、抵抗皮膜表面への低融点
ガラス塗布品は定格電力の20倍以上で60秒近くで溶
断するのに対して、本発明の金属複合抵抗皮膜品は定格
電力の16倍でも10秒前後で溶断しており、また溶断
時間のばらつきもほとんどなく、本発明品が速断性に優
れていることが確認された。
FIG. 4 shows the difference in fusing characteristics between the metal composite resistance film of the present invention and a conventional resistor having a low melting point glass coated on the surface of the resistance film. A 0.5 W type sample was used. There is. Regarding the resistance value, the fusing characteristics were compared with the minimum resistance value (0.22Ω) of the conventional product that can be manufactured being constant. As is clear from FIG. 4, the low melting point glass-coated product on the surface of the resistance film melts at 60 times or more at 20 times or more of the rated power, whereas the metal composite resistance film product of the present invention has a rated power of 16 times. It was confirmed that the product of the present invention was excellent in quick-cutting property, because the material melted in about 10 seconds even when doubled, and there was almost no variation in the melting time.

【0015】なお、本実施例では円筒状のセラミック製
絶縁基体を用いた抵抗器にて説明したが、低抵抗値領域
での速断性を生かして、近年要望が強くなっているプリ
ント基板面実装用のチップ状の抵抗器の抵抗皮膜への展
開も可能である。
In this embodiment, a resistor using a cylindrical ceramic insulating substrate has been described. However, by taking advantage of quick disconnection in a low resistance value area, a printed circuit board surface mounting, which has been strongly demanded in recent years, is used. It is also possible to develop a chip-shaped resistor for use as a resistance film.

【0016】また、金属抵抗皮膜中への低融点物質微粉
末の分散は抵抗皮膜母材を選ばないため、抵抗皮膜と低
融点物質微粉末が同時に析出可能であれば、他の金属複
合抵抗皮膜、酸化金属複合抵抗皮膜等に展開できること
は言うまでもない。
Further, since the low-melting-point substance fine powder is dispersed in the metal resistance film regardless of the resistance-film base material, if the resistance film and the low-melting substance fine powder can be simultaneously deposited, another metal composite resistance film Needless to say, it can be applied to a metal oxide composite resistance film or the like.

【0017】さらに、本実施例では、PbOとB23
らなる低融点物質を抵抗皮膜中に分散させ、金属複合抵
抗皮膜を作製する例で説明したが、前記低融点物質中に
PbF2,ZnO,SiO2を添加することで溶断特性を
調整することも可能であり必要に応じて添加させても同
様な効果が得られる。
Further, in the present embodiment, the low melting point substance composed of PbO and B 2 O 3 is dispersed in the resistance film to form the metal composite resistance film. However, PbF 2 is contained in the low melting point substance. , ZnO, and SiO 2 can be added to adjust the fusing characteristics, and similar effects can be obtained by adding them as needed.

【0018】また本実施例では、抵抗体としてセラミッ
ク製絶縁基体表面に低融点物質微粉末を分散させた後、
必要に応じて溝切を行い、最後に絶縁塗装を施した構成
であるが、抵抗皮膜中への低融点物質含有量が増加した
場合、金属複合抵抗皮膜表面においても低融点物質微粉
末が存在することになるため、皮膜表面の粗度が大きく
なり荒れた状態になる。そのため金属複合抵抗皮膜表面
保護用にシリコン系ワニス等の保護膜の塗布を行った
り、数μm程度の金属膜を上記金属複合抵抗皮膜上面に
着膜させ保護に用いても良い。
Further, in this embodiment, after the low melting point substance fine powder is dispersed as a resistor on the surface of the ceramic insulating substrate,
If necessary, the groove is cut, and the insulation coating is applied at the end.If the low melting point substance content in the resistance film increases, the low melting point substance fine powder also exists on the surface of the metal composite resistance film. As a result, the roughness of the surface of the film increases and the surface becomes rough. Therefore, a protective film such as a silicon-based varnish may be applied to protect the surface of the metal composite resistance film, or a metal film of about several μm may be deposited on the upper surface of the metal composite resistance film for protection.

【0019】また、低融点物質は抵抗皮膜全域に均一に
分散させるとしたが、速断性調整のため抵抗体中央部の
一部分のみの部分処理や、金属皮膜と金属複合抵抗皮膜
を層状に複数回着膜させて、部分的に金属複合抵抗皮膜
を形成した構成でも良い。
Although the low melting point substance is uniformly dispersed in the entire resistance film, only a part of the central portion of the resistor is treated for the purpose of adjusting the quick disconnection property, or the metal film and the metal composite resistance film are layered a plurality of times. A structure in which the metal composite resistance film is partially formed by depositing the film may be used.

【0020】[0020]

【発明の効果】以上より、本発明は低融点物質の微粉末
を抵抗器の抵抗皮膜中に均一に取り込むことで、以下に
示す効果が得られる。
As described above, according to the present invention, the following effects can be obtained by uniformly incorporating the fine powder of the low melting point substance into the resistance film of the resistor.

【0021】(1)溶断に至る過程である抵抗皮膜発熱
〜低融点物質の溶融〜抵抗皮膜の構造変化〜皮膜断線に
要する時間が瞬間的であり、溶断時間の短縮が可能であ
ると同時に溶断時間のばらつき低減も可能である。
(1) Heat generation of resistance film in the process leading to fusing-Melting of low melting point substance-Structural change of resistance film-Time required for wire breakage is instantaneous and fusing time can be shortened and fusing at the same time. It is also possible to reduce time variations.

【0022】(2)特に従来、抵抗皮膜が厚いため速断
性に課題のあった低抵抗値領域においても、めっき液中
への低融点物質投入量を増加することで、抵抗皮膜中に
取り込まれる低融点物質量を任意に微調整することが可
能であり、速断性に優れ、かつ容易に目標の溶断特性に
合致する抵抗器を製造することが可能である。
(2) In particular, even in a low resistance value region in which the resistance film is thick in the past and has a problem of quick disconnection, it is taken into the resistance film by increasing the amount of the low melting point substance added to the plating solution. It is possible to finely adjust the amount of the low melting point substance arbitrarily, and it is possible to manufacture a resistor which is excellent in quick-acting property and easily meets the target fusing property.

【0023】(3)従来の抵抗器では抵抗皮膜着膜、抵
抗値修正用溝切、低融点ガラス塗布、低融点ガラス乾燥
硬化の処理で4工程以上有していたが、本発明では抵抗
皮膜生成と低融点物質配合が一度に処理でき工程短縮や
材料を含めたコストダウンが可能である。
(3) In the conventional resistor, there are four or more steps of the resistance film deposition film, the groove cutting for resistance value correction, the low melting point glass coating, and the low melting point glass dry curing, but in the present invention, the resistance film is formed. Production and compounding of low-melting point substances can be processed at the same time, and the process can be shortened and the cost including materials can be reduced.

【0024】(4)低融点物質が微粉末の状態であるた
め、従来のように樹脂分で加工してペースト化したもの
を塗布することがなくなり、低融点物質の品質維持確保
が容易である。また、樹脂を含んだペースト状の場合、
その品質管理は周囲温度や湿度および樹脂品質、溶剤量
に影響されやすく、保管や品質管理が容易ではない場合
がある。さらに、長期保存に関しても、ペースト化した
低融点ガラスと比べ、粉体の状態であるため保存による
品質劣化が少なく安定である。
(4) Since the low-melting point substance is in the form of fine powder, there is no longer the need to apply a paste that has been processed with a resin component as in the prior art, and it is easy to maintain the quality of the low-melting point substance. . In the case of a paste containing resin,
The quality control is easily affected by ambient temperature, humidity, resin quality, and solvent amount, and storage and quality control may not be easy. Further, even in the case of long-term storage, since it is in a powder state, it is stable with less quality deterioration due to storage, as compared with pasted low melting glass.

【0025】(5)抵抗皮膜全域に分散して低融点物質
の微粉末が存在しているため、抵抗値修正のための溝切
加工に影響されることなく速断性を確保できる。
(5) Since the fine powder of the low melting point substance is dispersed over the entire resistance film, quick disconnection can be secured without being affected by the grooving process for correcting the resistance value.

【0026】(6)異常過電流印加時のみ、抵抗皮膜中
の低融点物質の融点に達し抵抗皮膜を溶融、断線させる
構成であり、基本的に特性が安定した金属皮膜を母材と
していることから、一般負荷条件内で使用される場合は
安定した寿命特性を示す。
(6) The structure is such that only when an abnormal overcurrent is applied, the melting point of the low melting point substance in the resistance film is reached and the resistance film is melted and broken. Basically, a metal film having stable characteristics is used as the base material. Therefore, it shows stable life characteristics when used under general load conditions.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例における抵抗器の断面図FIG. 1 is a sectional view of a resistor according to an embodiment of the present invention.

【図2】同溶断特性を示す図FIG. 2 is a diagram showing the same fusing characteristics.

【図3】同低融点物質組成比と溶断特性の関係図[Fig. 3] Relationship between composition ratio of low melting point substance and fusing property

【図4】本発明と従来のヒューズ抵抗器溶断特性比較し
た図
FIG. 4 is a diagram comparing the present invention and a conventional fuse resistor fusing characteristic.

【符号の説明】[Explanation of symbols]

1 絶縁基体 2 抵抗皮膜 3 低融点物質 4 キャップ 5 リード線 6 絶縁塗装 1 Insulating substrate 2 Resistive film 3 Low melting point substance 4 Cap 5 Lead wire 6 Insulation coating

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 絶縁基体の表面に抵抗皮膜を設けてなる
抵抗器において、前記抵抗皮膜は金属皮膜に少なくとも
PbOとB23からなる低融点物質の微粉末を含有して
なる抵抗器。
1. A resistor having a resistance coating on the surface of an insulating substrate, wherein the resistance coating is a metal coating containing fine powder of a low melting point substance containing at least PbO and B 2 O 3 .
【請求項2】 絶縁基体と、この絶縁基体の表面に設け
た金属皮膜と少なくともPbOとB23とからなる低融
点物質の微粉末とを含有してなる抵抗皮膜と、前記抵抗
皮膜に電気的に接続するように前記絶縁基体の両端に設
けたキャップとからなる抵抗器。
2. A resistance film containing an insulating substrate, a metal film formed on the surface of the insulating substrate, and a fine powder of a low melting point substance containing at least PbO and B 2 O 3, and the resistance film. A resistor comprising caps provided at both ends of the insulating base so as to be electrically connected.
【請求項3】 金属皮膜は少なくともNi−P,Ni−
B,Ni−P−W,Cu−Ni,Ni−Crのいずれか
を1つ含む請求項1または2記載の抵抗器。
3. The metal coating is at least Ni-P, Ni-
The resistor according to claim 1 or 2, containing one of B, Ni-P-W, Cu-Ni, and Ni-Cr.
【請求項4】 抵抗皮膜中に分散させるPbOとB23
からなる低融点物質の組成比が、抵抗皮膜の組成に対し
て0.5〜80wt%である請求項1または2記載の抵抗
器。
4. PbO and B 2 O 3 dispersed in the resistance film
3. The resistor according to claim 1, wherein the composition ratio of the low melting point substance is 0.5 to 80 wt% with respect to the composition of the resistance film.
JP7168483A 1995-07-04 1995-07-04 Resistor Pending JPH0922802A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7168483A JPH0922802A (en) 1995-07-04 1995-07-04 Resistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7168483A JPH0922802A (en) 1995-07-04 1995-07-04 Resistor

Publications (1)

Publication Number Publication Date
JPH0922802A true JPH0922802A (en) 1997-01-21

Family

ID=15868937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7168483A Pending JPH0922802A (en) 1995-07-04 1995-07-04 Resistor

Country Status (1)

Country Link
JP (1) JPH0922802A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101483117A (en) * 2007-10-09 2009-07-15 保险丝公司 Fuse providing overcurrent and thermal protection
KR101365385B1 (en) * 2012-11-09 2014-02-20 스마트전자 주식회사 Fuse resistor and manufacturing method thereor
WO2014073883A1 (en) * 2012-11-09 2014-05-15 스마트전자 주식회사 Resistor and method for manufacturing same
JP2021061738A (en) * 2019-10-07 2021-04-15 スマート エレクトロニクス インク Circuit protection device

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101483117A (en) * 2007-10-09 2009-07-15 保险丝公司 Fuse providing overcurrent and thermal protection
US9443688B2 (en) 2007-10-09 2016-09-13 Littelfuse, Inc. Fuse providing overcurrent and thermal protection
KR101365385B1 (en) * 2012-11-09 2014-02-20 스마트전자 주식회사 Fuse resistor and manufacturing method thereor
WO2014073861A1 (en) * 2012-11-09 2014-05-15 스마트전자 주식회사 Fuse resistor and method for manufacturing same
WO2014073883A1 (en) * 2012-11-09 2014-05-15 스마트전자 주식회사 Resistor and method for manufacturing same
US9589711B2 (en) 2012-11-09 2017-03-07 Smart Electronics Inc. Resistor and manufacturing method thereof
JP2021061738A (en) * 2019-10-07 2021-04-15 スマート エレクトロニクス インク Circuit protection device

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