JPH09265086A - Color filter for liquid crystal display device and its production - Google Patents

Abstract

PROBLEM TO BE SOLVED: To flatten the surface of a color filter without producing steps on the overlapped part of a light-shielding body and a color filter which causes decrease in the display characteristics. SOLUTION: This color filter consists of a red filter 37, a green filter 38 and a blue filter 39 formed on a glass substrate and a light-shielding body 36 which cuts light in the border part of the color filters. In this case, the area where the light-shielding body is formed on the glass substrate surface, a groove 35 having the same depth as that of the film thickness of the light-shielding body is formed. The groove is filled with a black photosensitive resin which forms as the light-shielding body 36 having low reflectance and high light- shielding property.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter for a liquid crystal display device used in a liquid crystal display device and a manufacturing method thereof.

[0002]

2. Description of the Related Art A liquid crystal display device has a liquid crystal and a color display for controlling the amount of light transmission between two glass substrates forming a transparent electrode made of indium tin oxide (hereinafter referred to as ITO). It has a structure that includes a color filter that enables it and a backlight that includes a fluorescent tube and a diffusion plate.

On one of the glass substrates, signal electrodes made of ITO are patterned in order to apply a voltage to the liquid crystal. Further, in order to enable color display on the other glass substrate, a color filter including a red filter, a green filter and a blue filter, which are the three primary colors, is formed.

In order to further improve the display quality, a protective film is formed on the color filter for the purpose of flattening the surface irregularities. On the protective film, a scanning electrode made of ITO is also patterned and provided to apply a voltage to the liquid crystal layer.

The signal electrodes and the scanning electrodes are regularly arranged in a direction perpendicular to each other so as to form intersecting portions (pixels) with the liquid crystal sandwiched therebetween. On the signal electrode and the scanning electrode, an alignment film that has been subjected to a treatment for regularly aligning the liquid crystal molecules is formed.

The color filter is a red color of a liquid crystal display device,
Corresponding to the green and blue pixels, red, green, and blue color filters are arranged in a stripe pattern or a mosaic pattern at regular intervals.

Further, in order to prevent the color mixture between adjacent pixels and the light emitted from the backlight from leaking without passing through the color filter and deteriorating the image quality,
A light shield is formed in the boundary area of each color filter.

Printing means and photolithography means are generally used as means for producing such color filters.

In a method of manufacturing a color filter using a printing means or a general photolithography means, a light shielding film formed on a photomask by using a photolithography means after forming a metal light shielding film of chromium or the like on a glass substrate. The body pattern is transferred as a resist image onto the metal light-shielding film.

After this, the openings corresponding to the pixels of the liquid crystal display device are removed by chrome etching to form a light shield on the glass substrate.

In the printing means, a red filter is printed with red ink by using a printing plate in which a color filter pattern is formed on the opening of the light shield with unevenness of resin or metal. In the same way, print the green filter with green ink,
Print the blue filter with blue ink.

Further, in the photolithography means, a photosensitive resin in which red, green and blue pigments or dyes are dispersed in a photosensitive resin is formed on a glass substrate, which corresponds to a light shield formed on the glass substrate. The color filter pattern formed on the photomask is aligned with the area of the opening where the color filter is formed, and exposure processing and development processing are performed.

In this processing step, a color filter pattern is formed on the exposed photosensitive resin portion which is not dissolved in the developing solution by utilizing the difference in solubility between the exposed portion and the unexposed portion in the developing solution. When forming red, green, and blue color filters in the openings of the light shield, after forming the light shield, the same steps as above are repeated three times for each of red, green, and blue.

[0014]

However, when a metal light-shielding film such as chrome is used for the light-shielding body, the reflectance of the metal surface is high, so that the reflection of external light radiated on the screen of the liquid crystal display device is suppressed. Display quality is significantly impaired due to the influence.

As a means for solving the problem that the display quality is deteriorated due to the influence of such external light reflection, there has been attempted a method of forming a light shield with a material whose surface has a low reflectance.

For example, a method of forming an oxide film having a low reflectance at an interface between a glass substrate on the display screen side and a light shield formed of a metal light shielding film, or a photosensitive resin obtained by adding carbon or a black coloring material to a resin Is a method of forming using a photolithography means.

However, among these, the method of forming an oxide film leads to an increase in manufacturing steps and an increase in cost. In addition,
In the method of forming with the black photosensitive resin, since the light shielding property is lower than that of metal, in order to sufficiently shield the light from the light source, the black photosensitive resin is formed to have a large thickness in the light transmitting direction. There is a need.

Red, green, which constitute the color filter,
The blue color filter is formed by a photolithography method using a photosensitive resin in which red, green and blue pigments are respectively dispersed as described above, or by using a red, green and blue ink material. It is formed by printing means.

At this time, in order to obtain a predetermined spectral characteristic,
The thickness of the color filter is usually 1.0μ depending on the content of the red, green or blue photosensitive resin or the pigment of the ink material.
m to 2.0 μm is required.

Even when a light-shielding body is formed by using a black photosensitive resin or an ink material, a film thickness of 1.0 μm to 2.0 μm is required to secure a sufficient light-shielding property.

On the other hand, in the photolithography means or the printing means, the red, green, and blue color filters and the light shield are displaced from each other due to the misalignment between the formation positions of the color filters and the light shield. Occurs.

Light from the light source does not pass through the color filter in the gap between the color filter and the light shield. Therefore, a gap portion is displayed on the screen of the liquid crystal display device, resulting in display unevenness.

For the purpose of preventing such display unevenness and widening the alignment accuracy in the manufacturing process, the color filters are formed so that the end portions of the color filters overlap.

FIG. 17 is a plan view showing a conventional color filter using a metal light-shielding film as a light-shielding body.
FIG. 18 is a sectional view showing a section taken along the line I-I. 19 is a plan view of a color filter in which a light shield is formed by using a black photosensitive resin having a low reflectance, and FIG. 20 is a sectional view showing a section taken along line JJ of FIG.

The conventional color filters shown in FIGS. 17 and 18 are a light shield 11 formed of a metal light shield film on a glass substrate 10 and a light shield corresponding to red, green and blue pixels of a liquid crystal display device. Red filter 12 in each opening
And a green filter 13 and a blue filter 14 are provided.

Further, the respective color filters of the red filter 12, the green filter 13 and the blue filter 14 are formed so that the end portions thereof overlap the light shielding body 11.

The light shield 11 is formed of a metal light shielding film,
A sufficient light-shielding property can be obtained with a film thickness of about 100 nm. Therefore, almost no step is formed at the overlapping portion of the light shield 11 with the end portions of the red filter 12, the green filter 13, and the blue filter 14.

However, like the color filters shown in FIGS. 19 and 20, when the light shield 15 is formed by using a black photosensitive resin or ink material having a low reflectance, the light shield 1
5 and the red filter 16, the green filter 17, and the end portion of the blue filter 18 at the overlapping portion 19,
The film thickness of 5 and the film thickness of the color filter overlap.

The thickness of the light shield 15 is from 1 μm to 2 μm.
Since the thickness is m, a step is generated between the film thickness of the light shield 15 and the overlapping portion of the color filter and the color filter formed in the pixel portion. Such a step disturbs the alignment of the liquid crystal layer and impairs the display characteristics of the liquid crystal display device.

The object of the present invention is to solve the above-mentioned problems,
It is an object of the present invention to provide a structure of a color filter having a light shield having a low reflectance and having a flat surface shape, and a manufacturing method thereof.

[0031]

In order to achieve the above object, the color filter for a liquid crystal display device and the manufacturing method thereof according to the present invention employ the following means.

The color filter for a liquid crystal display device of the present invention comprises a groove provided on a glass substrate, a light shield provided so as to be embedded in the groove, a red filter, a green filter and a blue filter provided so that a peripheral portion thereof overlaps the light shield. And a filter.

The color filter for a liquid crystal display device of the present invention comprises a groove provided in a glass substrate, a light-shielding body made of a photosensitive resin in which a black coloring material is dispersed and embedded in the groove, and a light-shielding body in the peripheral portion. It has a red filter, a green filter and a blue filter which are provided so as to overlap with each other.

The color filter for a liquid crystal display device of the present invention comprises a groove provided in a glass substrate, a light shielding body made of a dyeable photosensitive resin dyed with a black dye provided so as to be embedded in the groove, and a peripheral portion. Has a red filter, a green filter and a blue filter provided so as to overlap with the light shield.

A method of manufacturing a color filter for a liquid crystal display device according to the present invention comprises a step of forming a metal light-shielding film on a glass substrate, a step of removing the metal light-shielding film in a region of a light-shielding body formed on the glass substrate, and a metal light-shielding film. A step of forming a groove on the glass surface in the region where the film is removed, a step of forming a photosensitive resin in which a black coloring material is dispersed on the entire surface of the glass substrate, and irradiating light from the back surface to the black coloring material in the groove. And a red filter, a blue filter, and a green filter so that the peripheral portions of the photosensitive resin in which the red, blue, and green coloring materials are dispersed are overlapped with the light shielding body. And a step of forming.

The method of manufacturing a color filter for a liquid crystal display device of the present invention comprises a step of forming a metal light-shielding film on a glass substrate, a step of removing the metal light-shielding film in the region of the light-shielding body formed on the glass substrate, and a metal light-shielding film. A step of forming a groove on the glass surface in the region where the film is removed, a step of forming a dyeable photosensitive resin on the entire surface of the glass substrate, and a step of irradiating light from the back surface to form a dyeable photosensitive resin in the groove And a step of dyeing the dyeable photosensitive resin with a black dye to form a light shield, and a portion of the dyeable photosensitive resin forming a red filter so that the peripheral portion overlaps the light shield, a blue filter and a green filter. It is formed on the part that forms the filter, and the part where this dyeable photosensitive resin is formed is dyed with red dye, blue dye, and green dye respectively to form the red filter, blue filter, and green filter. And having a that step.

In the color filter for a liquid crystal display device and the method of manufacturing the same according to the present invention, a groove having the same thickness as the film thickness of the light shield is formed on the glass surface where the light shield is formed. Then, the light shield is filled in this groove portion.

By forming the light shield in the groove portion, it is possible to eliminate the step portion between the glass surface and the light shield surface where the groove is not formed.

By forming a color filter on this surface, it is possible in the present invention to form a flat color filter surface without causing a step even in the overlapping portion of the color filter and the light shield.

By using the structure and manufacturing method of such a color filter, the present invention does not impair the display characteristics and uses a photosensitive resin in which a black colorant is dispersed to have a sufficient light-shielding property and a low light-shielding property. It is possible to form a light shield having a high reflectance.

[0041]

BEST MODE FOR CARRYING OUT THE INVENTION The best mode for carrying out the color filter for liquid crystal display and the manufacturing method thereof according to the present invention will be described below with reference to the drawings.

First, the structure of a liquid crystal display device capable of color display will be described with reference to FIG. 21, and the liquid crystal display color filter of the present invention, which is a constituent member thereof, and a manufacturing method thereof will be described.

FIG. 21 is a back view composed of a liquid crystal for controlling the amount of light transmission between two glass substrates having transparent electrodes formed of ITO, a color filter for enabling color display, a fluorescent tube and a diffusion plate. 3 is a cross-sectional view of a liquid crystal display device having a structure including a light.

A signal electrode 22 made of ITO is formed on the glass substrate 20 by patterning in order to apply a voltage to the liquid crystal 21. Further, in order to enable color display on the glass substrate 23, the red filter 2 which is the three primary colors
4, a green filter 25 and a blue filter 26 constitute a Karai filter.

Further, in order to make the thickness of the liquid crystal layer and the orientation of the liquid crystal uniform and improve the display quality, a protective film 28 is formed on the color filter for the purpose of flattening the surface irregularities. On this protective film 28, a scanning electrode 27 made of ITO is patterned in order to apply a voltage to the liquid crystal layer.

The scanning electrodes 27 and the signal electrodes 22 are regularly arranged in a direction perpendicular to each other so as to form intersecting portions (pixels) with the liquid crystal 21 sandwiched therebetween. Further, an alignment film 40 is formed in order to align the liquid crystal 21 regularly.

The color filter is red in the liquid crystal display device,
Corresponding to the green and blue pixels, red, green and blue color filters are arranged at regular intervals.

Further, a light shield 30 is formed in order to prevent the color mixture between adjacent pixels and the light emitted from the backlight 29 from leaking without passing through the color filter and deteriorating the image quality. ing. Here, the light shield 30 is shown to use a metal light shielding film.

Next, the structure of the color filter in the embodiment of the present invention will be described with reference to FIGS. 1 and 2, and then the method for manufacturing the color filter of the present invention will be referred to by alternately referring to FIGS. 3 to 13. explain.

FIG. 1 is a plan view showing a color filter of the present invention, and FIG. 2 is a sectional view showing a section taken along line AA in the plan view of FIG.

A light shield 36 is formed on the transparent glass substrate 31, and a groove 35 having the same depth as the thickness of the light shield is formed on the surface of the glass substrate in the region where the light shield is formed. There is. Further, a red filter 37, a green filter 38, and a blue filter 39, which form a color filter, are formed at predetermined positions on the glass substrate corresponding to the pixels of the liquid crystal display device.

Next, a manufacturing method for forming the color filter structure according to the embodiment of the present invention will be specifically described.

In FIG. 3, the resist pattern 32 and the metal light-shielding film 3 are formed by photolithography on the portion where the light-shielding body is to be formed.
3 is a plan view showing a glass substrate 31 forming No. 3,
FIG. 4 is a sectional view showing a section taken along line BB in FIG.

OA-2 glass manufactured by Nippon Electric Glass Co., Ltd. was used as the transparent glass substrate 31, and chromium was used as the metal light-shielding film 33 on the glass substrate 31 by sputtering to 100 n.
It is formed to have a film thickness of m.

A positive photoresist OFPR-800 manufactured by Tokyo Ohka Co., Ltd. is applied on the metal light-shielding film 33 by a spin coating method so as to have a film thickness of 1.0 μm.

After that, using a photomask on which the pattern of the light shield is formed, only a portion of the glass substrate where the light shield is formed is exposed to an h-line, i 8 including ultraviolet rays converted to i-rays
Exposure processing is performed with an exposure amount of 0 mJ / cm ² .

Thereafter, this glass substrate was immersed in a resist developer NMD-W manufactured by Tokyo Ohka Co., Ltd. at a liquid temperature of 23 ° C. for 1 minute for development processing, and the resist pattern 32 in which the chrome surface of the portion forming the light shield was exposed. To form.

After that, the glass substrate 31 is baked at 120 ° C. for 40 minutes to improve the adhesiveness of the resist,
Inktech MPM-E as a chrome etchant
Dip in 30 chrome etchant at 23 ° C for 2 minutes to remove the chrome not covered by the resist by etching.
A glass substrate 31 shown in FIGS. 3 and 4 is formed. In this step, the glass surface 34 of the portion forming the light shield is exposed.

FIG. 5 is a plan view showing the glass substrate 31 in which the groove 35 is formed in the portion where the light shield is formed with the same depth as the thickness of the light shield, and FIG. 6 is taken along the line CC of FIG. It is sectional drawing which shows a cross section.

The glass substrate 31 shown in FIGS. 3 and 4 was placed in a resist stripping solution, for example, N-320 manufactured by Nagase & Co. at 50 ° C.
The resist is removed by immersing for 10 minutes at the liquid temperature of.

Thereafter, an aqueous solution of 13.4 w% ammonium monohydrogen difluoride was used as an etching solution for the glass.
This glass substrate is immersed at a liquid temperature of 23 ° C. for 18 minutes,
A portion of the glass surface 34 where the light shield is not covered with the metal light shielding film is etched to form a groove 35 in the surface of the glass substrate 31 shown in FIGS. 5 and 6. Here, since the etching rate in the depth direction of OA-2 glass when this etching solution was used was 110 nm / min, the groove depth of the etched glass was 2.0 μm.

FIG. 7 shows the glass substrate 3 shown in FIGS.
FIG. 9 is a plan view showing a glass substrate 31 in which a light shielding body 36 is formed of a black photosensitive resin in the groove 35 of No. 1, and FIG. In addition, FIG.
Is the light shield 36 of the glass substrate 31 shown in FIGS. 7 and 8.
Glass substrate 3 shown in FIGS. 5 and 6 in the process of forming
FIG. 10 is a plan view showing a process in which a black photosensitive resin is applied to 1 and the metal light-shielding film 33 formed of chromium is used as a photomask to expose from the back surface of the glass.
It is sectional drawing which shows the cross section in a -D line.

As shown in FIGS. 9 and 10, a black color resist CK-S171 manufactured by Fuji Hunt Electronics Technology Co., Ltd., which is a negative photosensitive coloring material in which a black pigment is dispersed, is formed by a spin coating method. It is applied to the glass surface of the glass substrate 31 on which the chromium film 33 is formed so as to have a thickness of 2.1 μm.

Next, as shown in FIG. 10, the glass substrate 31
From the back surface side of the substrate on which the chrome film 33 is not formed, ultraviolet light including h-line and i-line is exposed with an exposure amount of 400 mJ / cm ^{2 in} terms of i-line using a general exposure apparatus. Here, the black color resist on the chrome film is not exposed because the chrome film blocks light. Only the black color resist in the groove 35 is exposed to light and exposed. The exposed black photosensitive resin becomes insoluble in the developer due to the radical polymerization reaction.

Next, the glass substrate 31 is used as a resist developing solution CD manufactured by Fuji Hunt Electronics Technology Co., Ltd.
The black color resist which has not been exposed to light is dissolved by immersing it for 2 minutes and developed.

After the development processing, the glass substrate 31 is set to 200
The black color resist is thermally cured by heating at a temperature of ° C for 30 minutes. Here, the film thickness of the black color resist becomes 2.0 μm due to the curing shrinkage after the thermal curing.

Next, the glass substrate 31 is dipped in a chromium etching solution to remove the chromium film 33, whereby a black resist is formed in the groove 35 formed in the glass substrate 31 as shown in FIGS. 7 and 8. The light shield 36 made of is formed with almost no step difference from the glass surface.

FIG. 11 is a plan view showing the glass substrate 31 having the red filter 37 formed on the glass substrate 31 having the light shield 36 shown in FIGS. 7 and 8, and FIG. It is sectional drawing which shows the cross section in a -E line.

Color made by Fuji Hunt Electronics Technology Co., Ltd., which is a negative photosensitive resin in which a red pigment is dispersed on the glass surface side of the glass substrate 31 forming the light shield 36 shown in FIGS. 7 and 8. Resist CR-2000
Is applied by a spin coating method so as to have a film thickness of 1.5 μm. Then, this glass substrate is heated on a hot plate at a temperature of 80 ° C. to 90 ° C. for 5 minutes.

Next, using a general projection exposure apparatus or contact exposure apparatus, ultraviolet light containing h-line and i-line is placed at a predetermined position on the glass substrate 31 through a photomask forming a color filter pattern. Is converted to i-line of 300mJ
Exposure processing is performed with an energy amount of / cm ² .

This glass substrate 31 was immersed in a resist developing solution CD manufactured by Fuji Hunt Electronics Technology Co., Ltd. for 1 minute to be developed, and then heat treated at a temperature of 200 ° C. for 30 minutes, as shown in FIGS. 11 and 12. The red filter 37 is formed.

FIG. 13 shows a glass substrate 31 on which a green filter 38 is formed, similar to the method of forming the red filter 37 on the glass substrate 31 shown in FIGS. 11 and 12.
14 is a plan view showing a cross section, and FIG. 14 is a cross-sectional view showing a cross section taken along line FF of FIG. 13.

A color resist CG-5000 manufactured by Fuji Hunt Electronics Technology Co., Ltd., which is a negative photosensitive resin in which a green pigment is dispersed, is used to form a red filter 37 of a glass substrate 31 shown in FIGS. 11 and 12. It is coated on the existing glass surface side by a spin coating method so as to have a film thickness of 1.5 μm.

Then, using a general projection exposure apparatus or contact exposure apparatus, ultraviolet light containing h-line and i-line is passed through a photomask having a color filter pattern formed at a predetermined position on the glass substrate 31. Is 400mJ converted to i-line
Exposure processing is performed with an energy amount of / cm ² .

Next, similar to the red filter forming step, the developing process and the heating process are performed to form the green filter 38 as shown in FIGS. 13 and 14.

FIG. 15 is a plan view showing a glass substrate 31 having a blue filter 39 formed on a glass substrate having the green filter 38 shown in FIGS. 13 and 14, and FIG. It is sectional drawing which shows the cross section in the -G line.

A color resist CB-2000 manufactured by Fuji Hunt Electronics Technology Co., Ltd., which is a negative type photosensitive resin in which a blue pigment is dispersed, is used as a red filter 37 and a green filter 38 of a glass substrate 31 shown in FIGS. It is applied to the glass surface side forming the film by a spin coating method so as to have a film thickness of 1.5 μm.

Red filter 37 and green filter 38
Similar to the forming step, using a general projection exposure apparatus or contact exposure apparatus, h-line and i-line are included at a predetermined position on the glass substrate 31 through a photomask forming a color filter pattern. 300 mJ of ultraviolet light converted to i-line
Exposure processing is performed with an energy amount of / cm ² .

Then, similar to the red and green filter forming step, the developing process and the heating process are performed to form the blue filter 39 as shown in FIGS. 15 and 16.

Next, as in the structure of the liquid crystal display device shown in FIG. 21, a protective film is formed on the red filter, the green filter and the blue filter formed in the above steps, and then ITO is formed on the protective film. Form electrodes.

Next, a method of manufacturing a color filter in an embodiment different from the above description will be described below.

The groove 35 is formed on the surface of the glass substrate 31 as shown in FIGS. 5 and 6 by the same method as in the first embodiment.

Next, the glass substrate 31 shown in FIG. 5 and FIG.
On the side where the metal light-shielding film 33 is formed, a photosensitive dyeing resin, which is an aqueous solution of gelatin manufactured by Fuji Chemical Co., in which ammonium dichromate is added so as to have a concentration of 2 w%, is formed to a film thickness of 1 using a spin coating method. Apply so as to have a thickness of 0.9 μm.

Next, this glass substrate is heated on a hot plate at a temperature of 70 ° C. to 80 ° C. for 5 minutes. After that, from the back surface side of the metal light-shielding film 33 of the glass substrate 31, using a general exposure apparatus, an exposure process is performed so that the ultraviolet light including the h-line and the i-line has an exposure amount of 400 mJ / cm ^{2 in} terms of the i-line. To do.

The photosensitive dyeing resin on the metal light-shielding film 33 is not exposed because the metal light-shielding film 33 blocks light. Groove 35
Only the photosensitive dyeable resin inside is exposed to light to be exposed. After that, the glass substrate is immersed in an aqueous acetic acid solution adjusted to pH (pH) 3 at a temperature of 50 ° C. for 2 minutes to perform a developing treatment.

Next, a black dye BK-RE manufactured by Nippon Kayaku Co., Ltd.
Dyeing treatment is performed by immersing 181P in a black dyeing solution prepared to have a concentration of 0.5 w% at a temperature of 70 ° C. for 10 minutes.

Then, the dyed glass substrate was immersed in a 0.5 w% tannic acid aqueous solution at 60 ° C. for 5 minutes and then in a 0.5 w% tartar tar aqueous solution at 60 ° C. for 5 minutes. , Dye-proof hardening treatment is performed. Here, the film thickness of the black photosensitive resin that had been dyed and dye-hardened was 2.1 μm because the film swelled due to dyeing.

Thereafter, this glass substrate is heated at a temperature of 180 ° C. for 60 minutes to dehydrate and heat cure the photosensitive dyeable resin dyed with a black dye. Here, the film thickness of the black photosensitive resin becomes 2.0 μm due to contraction after dehydration and heat curing.

After that, the glass substrate is immersed in a chromium etching solution to remove the chromium film, so that the glass substrate 3 shown in FIGS. 5 and 6 is formed as shown in FIGS. 7 and 8.
A light shield 36 made of a photosensitive dyeing resin dyed with a black dye is formed in the groove 35 of No. 1 with almost no step on the glass surface of the glass substrate 31.

Next, on the glass surface side of the glass substrate 31 on which the light shield 36 is formed, 2 w of ammonium dichromate was added as a photosensitive dyeing resin to an aqueous gelatin solution manufactured by Fuji Chemical.
The composition added so as to have a concentration of 10% is coated by a spin coating method so as to have a film thickness of 1.0 μm.

This glass substrate is heat-treated on a hot plate at a temperature of 70 ° C. to 80 ° C. for 5 minutes. After that, using a general projection exposure apparatus or a contact exposure apparatus, ultraviolet light containing h-line and i-line is passed through a photomask in which a color filter pattern is formed on a photosensitive dyeing resin coated on a glass substrate. Is irradiated at an exposure dose of 400 mJ / cm ^{2 in} terms of i-line.

Thereafter, the glass substrate is immersed in an aqueous acetic acid solution adjusted to pH (pH) 3 at a temperature of 50 ° C. for 2 minutes to perform a developing treatment.

Next, a red dye PC-RE manufactured by Nippon Kayaku Co., Ltd.
D-R136P is immersed in a red dyeing solution prepared to have a concentration of 1 w% at a temperature of 60 ° C. for 10 minutes to perform a dyeing treatment.

Then, the dyed glass substrate was dipped in a 0.5 w% tannic acid aqueous solution at 60 ° C. for 5 minutes and then dipped in a 0.5 w% tartarite aqueous solution at 60 ° C. for 5 minutes. , A dye-resist hardening treatment for preventing dyeing with other dyes is performed during the dyeing process for the second color and the third color.
As shown in FIG. 1 and FIG. 12, a red filter 37 is formed on the glass substrate 31.

Next, as in the red filter forming step, the glass surface of the glass substrate 31 on which the red filter 37 is formed is coated by a spin coating method to a film thickness of 1.0 μm.

This glass substrate is heat-treated on a hot plate at a temperature of 70 ° C. to 80 ° C. for 5 minutes. After that, using a general projection exposure apparatus or contact exposure apparatus, the ultraviolet light including the h-line and the i-line is converted into the i-line through a photomask on which a color filter pattern is formed at a predetermined position on the glass substrate. in irradiated so that the exposure amount of 400 mJ / cm ^2.

After that, the glass substrate is immersed in an aqueous acetic acid solution adjusted to pH (pH) 3 at a temperature of 50 ° C. for 2 minutes to perform a developing process.

Next, a green dye PC-GRE manufactured by Nippon Kayaku Co., Ltd.
A dyeing treatment is carried out by immersing the green dyeing solution prepared by mixing EN-FOP in a concentration of 1 w% at a temperature of 60 ° C. for 10 minutes.

Next, the dyed glass substrate was immersed in a 0.5 w% aqueous solution of tannic acid at a temperature of 60 ° C. for 5 minutes, and then immersed in a 0.5 w% aqueous tartar solution at a temperature of 60 ° C. for 5 minutes. Then, during the dyeing process of the blue filter to be formed next, a dye-proof hard film treatment for preventing dyeing with a blue dye is performed to form a green filter 38 on the glass substrate 31 as shown in FIGS. 13 and 14.

Similar to the method of forming the red and green filters, a photosensitive dyeing resin is spin-coated on the glass surface of the glass substrate 31 on which the color filters are formed so that the film thickness becomes 1.0 μm. Apply to.

This substrate was placed on a hot plate at a temperature of 70 ° C.
To 80 ° C. for 5 minutes. After that, using a general projection exposure apparatus or contact exposure apparatus, ultraviolet light including h-line and i-line is irradiated at a predetermined position on the glass substrate through a photomask on which a color filter pattern is formed. Irradiation is performed so that the exposure amount is 400 mJ / cm ^{2 in} terms of conversion.

Thereafter, this glass substrate is immersed in an aqueous acetic acid solution adjusted to pH (pH) 3 at a temperature of 50 ° C. for 2 minutes to perform a developing treatment.

Blue dye PC-BLUE-B manufactured by Nippon Kayaku
To a blue dyeing solution prepared by adding 45P to a concentration of 1w%. The glass substrate after the above-mentioned development treatment is performed at a temperature of 60 ° C. for 10 minutes.
Dip for a minute and perform blue dyeing treatment.

Next, the glass substrate after the dyeing treatment is 0.5 w
% Tannic acid aqueous solution at a temperature of 60 ° C. for 5 minutes and then a 0.5 w% tartarite aqueous solution at a temperature of 60 ° C. for 5 minutes to carry out a dye-proof hardening treatment, as shown in FIGS. 15 and 16. Then, a blue filter 39 is formed on the glass substrate 31.

Next, as in the structure of the liquid crystal display device shown in FIG. 21, a protective film is formed on the red filter, the green filter and the blue filter formed in the above process, and then ITO is formed on the protective film. Form electrodes.

[0106]

As is apparent from the above description, in the color filter of the present invention, a light-shielding body is formed with a film thickness that provides sufficient light-shielding property with a photosensitive resin in which a black coloring material or dye is dispersed. There is. Therefore, it is possible to reduce the reflectance without losing the light-shielding property as compared with a light-shielding body using a metal light-shielding film such as chromium.

Further, in the color filter of the present invention, a groove having the same depth as the film thickness of the light shield is formed on the surface of the glass substrate forming the light shield at the overlapping portion of the color filter and the light shield. As a result, the surface of the color filter can be flattened without generating a step in the overlapping portion of the light shield and the color filter. By using such a color filter structure and manufacturing method, it is possible to obtain a color filter including a light shield having a low reflectance and a high light blocking property without impairing display characteristics.

[Brief description of drawings]

FIG. 1 is a plan view showing a structure of a color filter and a manufacturing method according to an embodiment of the present invention.

FIG. 2 is a cross-sectional view showing the structure and manufacturing method of the color filter according to the embodiment of the present invention.

FIG. 3 is a plan view showing the structure and manufacturing method of the color filter according to the embodiment of the present invention.

FIG. 4 is a cross-sectional view showing the structure and manufacturing method of the color filter according to the embodiment of the present invention.

FIG. 5 is a plan view showing the structure and manufacturing method of the color filter according to the embodiment of the present invention.

FIG. 6 is a cross-sectional view showing the structure and manufacturing method of the color filter according to the embodiment of the present invention.

FIG. 7 is a plan view showing the structure and manufacturing method of the color filter according to the embodiment of the present invention.

FIG. 8 is a cross-sectional view showing the structure and manufacturing method of the color filter according to the embodiment of the present invention.

FIG. 9 is a plan view showing the structure and manufacturing method of the color filter according to the embodiment of the present invention.

FIG. 10 is a cross-sectional view showing the structure and manufacturing method of the color filter according to the embodiment of the present invention.

FIG. 11 is a plan view showing the structure and manufacturing method of the color filter according to the embodiment of the present invention.

FIG. 12 is a cross-sectional view showing the structure and manufacturing method of the color filter according to the embodiment of the present invention.

FIG. 13 is a plan view showing the structure and manufacturing method of the color filter according to the embodiment of the present invention.

FIG. 14 is a cross-sectional view showing the structure and manufacturing method of the color filter according to the embodiment of the present invention.

FIG. 15 is a plan view showing the structure and manufacturing method of the color filter according to the embodiment of the present invention.

FIG. 16 is a cross-sectional view showing the structure and manufacturing method of the color filter according to the embodiment of the present invention.

FIG. 17 is a plan view showing a structure and a manufacturing method of a color filter according to a conventional technique.

FIG. 18 is a cross-sectional view showing a structure and a manufacturing method of a color filter in the related art.

FIG. 19 is a plan view showing a structure and a manufacturing method of a color filter in the related art.

FIG. 20 is a cross-sectional view showing the structure and manufacturing method of a color filter in the prior art.

FIG. 21 is a cross-sectional view showing the structure and the manufacturing method of the liquid crystal display device.

[Explanation of symbols]

 31 glass substrate 35 groove 36 light shield 37 red filter 38 green filter 39 blue filter

Claims (5)

[Claims] 1. A glass substrate having a groove, a light shield provided so as to be embedded in the groove, and a red filter, a green filter, and a blue filter provided so that a peripheral portion thereof overlaps with the light shield. Color filter for liquid crystal display devices. 2. A groove provided in a glass substrate, a light shield made of a photosensitive resin in which a black coloring material is dispersed, which is embedded in the groove, a red filter and a green which are provided so that a peripheral portion overlaps with the light shield. A color filter for a liquid crystal display device, which has a filter and a blue filter. 3. A groove provided in a glass substrate, a light-shielding body made of a dyeable photosensitive resin dyed with a black dye provided so as to be embedded in the groove, and a red provided so that a peripheral portion overlaps with the light-shielding body. A color filter for a liquid crystal display device, which has a filter, a green filter and a blue filter. 4. A step of forming a metal light-shielding film on a glass substrate, a step of removing the metal light-shielding film in a region of a light-shielding body formed on the glass substrate, and a groove formed on the glass surface in the region where the metal light-shielding film is removed. And a step of forming a photosensitive resin in which the black coloring material is dispersed on the entire surface of the glass substrate, and irradiating light from the back surface of the photosensitive resin to form a light-shielding body with the photosensitive resin in which the black coloring material is dispersed in the groove. And a step of forming a red filter, a blue filter, and a green filter so that a peripheral portion of the photosensitive resin in which red, blue, and green coloring materials are respectively dispersed is overlapped with the light shield. A method for manufacturing a color filter for a liquid crystal display device. 5. A step of forming a metal light-shielding film on a glass substrate, a step of removing the metal light-shielding film in a region of a light-shielding body formed on the glass substrate, and a groove on the glass surface in the region where the metal light-shielding film is removed. The step of forming, the step of forming the dyeable photosensitive resin on the entire surface of the glass substrate, the step of irradiating light from the back surface to form the dyeable photosensitive resin in the groove, and the dyeable photosensitive resin of black color The step of dyeing with a dye to form a light-shielding body, and the dyeing photosensitive resin is formed in a portion where a red filter is formed and a portion where a blue filter and a green filter are formed so that the peripheral portion overlaps with the light-shielding body. For a liquid crystal display device, which comprises a step of forming a red filter, a blue filter and a green filter by respectively dyeing a portion where a photosensitive resin is formed with a red dye, a blue dye and a green dye. Method for producing a large filter.