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JPH0977736A - Method for producing naphthoquinonediazide photosensitive agent - Google Patents

Method for producing naphthoquinonediazide photosensitive agent

Info

Publication number
JPH0977736A
JPH0977736A JP23377295A JP23377295A JPH0977736A JP H0977736 A JPH0977736 A JP H0977736A JP 23377295 A JP23377295 A JP 23377295A JP 23377295 A JP23377295 A JP 23377295A JP H0977736 A JPH0977736 A JP H0977736A
Authority
JP
Japan
Prior art keywords
naphthoquinonediazide
water
solution
reaction
organic solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23377295A
Other languages
Japanese (ja)
Other versions
JP3743030B2 (en
Inventor
Kunio Minami
國雄 皆見
Haruki Ozaki
晴喜 尾崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP23377295A priority Critical patent/JP3743030B2/en
Publication of JPH0977736A publication Critical patent/JPH0977736A/en
Application granted granted Critical
Publication of JP3743030B2 publication Critical patent/JP3743030B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To reduce both of loss and metallic content and obtain a naphthoquinonediazide used for positive type resist compositions in a form of a solution. SOLUTION: A phenolic compound of the formula (R<11> to R<18> are each H, OH, a 1-6C alkyl, a 1-6C alkoxy, etc.; R<19> and R<20> are each H, a 1-6C alkyl, a 1-6C cycloalkyl, phenyl, etc.) is subjected to condensation reaction with 1,2- naphthoquinonediazide-4- or -5-sulfonyl halide in an organic solvent having a property separable from water (e.g. methyl amyl ketone) in the presence of a base (e.g. triethylamine) at 10-40 deg.C for 0.5-8hr. Then, the reaction product is washed with water and separated from water layer to provide the objective product. The method is improved in yield and is good in safety, compared with a method for obtaining naphthoquinoneazide-based photosensitive agent as a solid.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、例えばポジ型レジ
スト組成物に用いられるナフトキノンジアジド系感光剤
の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a naphthoquinonediazide-based photosensitive agent used in, for example, a positive resist composition.

【0002】[0002]

【従来の技術】フェノール性水酸基を有する化合物をキ
ノンジアジドスルホン酸エステル化して、半導体微細加
工用のポジ型レジスト組成物における感光剤として用い
ることは公知である。キノンジアジドスルホン酸エステ
ル化にあたっては、通常1,2−ナフトキノンジアジド
−4−又は−5−スルホニルハライドが用いられ、これ
を、フェノール性水酸基を有する化合物と縮合させるこ
とにより、感光剤が製造されている。この反応は一般に
溶媒中で行われ、反応溶媒としては、1,4−ジオキサ
ン、アセトン、γ−ブチロラクトン、又はそれらの2種
以上の混合物を用いることが知られているが、特に1,
4−ジオキサンが多く使用されている。
2. Description of the Related Art It is known that a compound having a phenolic hydroxyl group is converted into a quinonediazide sulfonic acid ester and used as a photosensitive agent in a positive resist composition for semiconductor fine processing. In the quinonediazide sulfonic acid esterification, 1,2-naphthoquinonediazide-4- or -5-sulfonyl halide is usually used, and a photosensitizer is produced by condensing this with a compound having a phenolic hydroxyl group. . This reaction is generally carried out in a solvent, and as a reaction solvent, it is known to use 1,4-dioxane, acetone, γ-butyrolactone, or a mixture of two or more thereof.
4-dioxane is often used.

【0003】一方、半導体微細加工用のポジ型レジスト
組成物は、金属の存在を嫌うことから、ナフトキノンジ
アジド系感光剤についても金属の低減化が求められてい
る。ナフトキノンジアジド系感光剤の金属含量を低減さ
せるためには、水で洗浄する手段が有効であることが知
られている。そして、1,4−ジオキサンをはじめとし
て従来から一般に用いられている反応溶媒は、水とよく
溶け合うため、かかる溶媒中で得られたナフトキノンジ
アジド系感光剤は、水を加えて一旦晶析することにより
固形物として取り出し、その後純水で繰り返し洗浄する
操作が行われている。
On the other hand, since positive resist compositions for semiconductor fine processing do not like the presence of metals, there is also a demand for reduction of metals in naphthoquinonediazide type photosensitizers. It is known that washing with water is effective for reducing the metal content of the naphthoquinonediazide-based photosensitizer. Since the reaction solvents generally used in the past, including 1,4-dioxane, are well soluble in water, the naphthoquinonediazide-based photosensitizer obtained in such a solvent must be once crystallized by adding water. , And thereafter, an operation of repeatedly washing with pure water is performed.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、ナフト
キノンジアジド系感光剤を固形物として取り出す操作で
は、安全防災の面から取扱いに注意を要すること、感光
剤の種類によっては、晶析後の感光剤の粒径が小さくな
るために濾過時間が長くなること、固形物にする段階で
のロスがあり、収率が低下することなどの問題点があっ
た。
However, in the operation of taking out a naphthoquinonediazide-based photosensitizer as a solid substance, it is necessary to pay attention to handling from the viewpoint of safety and disaster prevention, and depending on the type of photosensitizer, the photosensitizer after crystallization may not be used. There were problems such as a longer filtration time due to a smaller particle size, a loss at the stage of solidification, and a lower yield.

【0005】本発明の目的は、フェノール性水酸基を有
する化合物とナフトキノンジアジドスルホニルハライド
との縮合反応によってナフトキノンジアジド系感光剤を
製造するにあたり、目的物であるナフトキノンジアジド
系感光剤のロスを少なくし、金属含量を低減させ、そし
て溶液の形で当該ナフトキノンジアジド系感光剤を得る
ことにある。
The object of the present invention is to produce a naphthoquinonediazide sensitizer by a condensation reaction of a compound having a phenolic hydroxyl group and a naphthoquinonediazide sulfonyl halide, and to reduce the loss of the naphthoquinonediazide sensitizer which is a target product. It is to reduce the metal content and obtain the naphthoquinonediazide sensitizer in the form of a solution.

【0006】[0006]

【課題を解決するための手段】本発明者らは、かかる目
的を達成すべく鋭意研究を行った結果、フェノール性水
酸基を有する化合物とナフトキノンジアジドスルホニル
ハライドとの縮合反応を、水と分液する性質を持つ有機
溶媒中で行うことにより、反応後に水を加えても、目的
物であるナフトキノンジアジド系感光剤が析出せず、し
たがって溶液の形で得られ、かつ溶液の形で水洗でき、
それによって金属の低減化が図られることを見出し、本
発明を完成するに至った。
Means for Solving the Problems As a result of intensive studies aimed at achieving such an object, the present inventors have separated a condensation reaction between a compound having a phenolic hydroxyl group and a naphthoquinonediazidesulfonyl halide with water. By carrying out in an organic solvent having a property, even if water is added after the reaction, the target naphthoquinonediazide-based photosensitizer does not precipitate, and thus is obtained in the form of a solution, and can be washed in the form of a solution,
As a result, they have found that the amount of metal can be reduced, and have completed the present invention.

【0007】すなわち本発明は、フェノール性水酸基を
有する化合物と1,2−ナフトキノンジアジド−4−又
は−5−スルホニルハライドとを、水と分液する性質を
持つ有機溶媒中で縮合させ、次に水洗して、ナフトキノ
ンジアジド系感光剤を前記有機溶媒の溶液の形で得る方
法を提供するものである。
That is, in the present invention, a compound having a phenolic hydroxyl group and 1,2-naphthoquinonediazide-4- or -5-sulfonyl halide are condensed in an organic solvent having a property of separating from water, and then condensed. The present invention provides a method of washing with water to obtain a naphthoquinonediazide-based photosensitizer in the form of a solution of the organic solvent.

【0008】[0008]

【発明の実施の形態】本発明でキノンジアジドスルホン
酸エステル化の対象となるフェノール性水酸基を有する
化合物は、レジスト分野で感光剤化のために用いられる
各種のものであることができる。すなわち、フェノール
性水酸基を分子内に少なくとも1個、好ましくは2個以
上、さらに好ましくは3〜6個有するフェノール系化合
物である。本発明に従ってキノンジアジドスルホン酸エ
ステル化するのに好ましいフェノール系化合物として
は、例えば、次の一般式(I)〜(IV)で示される化合
物などが挙げられる。
BEST MODE FOR CARRYING OUT THE INVENTION The compound having a phenolic hydroxyl group to be subjected to quinonediazide sulfonic acid esterification in the present invention can be various compounds used for photosensitizing in the field of resist. That is, it is a phenolic compound having at least one, preferably two or more, more preferably three to six phenolic hydroxyl groups in the molecule. Preferable phenolic compounds for quinonediazide sulfonic acid esterification according to the present invention include, for example, compounds represented by the following general formulas (I) to (IV).

【0009】 [0009]

【0010】式中、R11、R12、R13、R14、R15、R
16、R17及びR18は互いに独立に、水素、水酸基、炭素
数6以下のアルキル、炭素数6以下のシクロアルキル又
は炭素数6以下のアルコキシを表し、R19及びR20は互
いに独立に、水素、炭素数6以下のアルキル、炭素数6
以下のシクロアルキル、又は、水酸基、炭素数6以下の
アルキル、炭素数6以下のシクロアルキル及び炭素数6
以下のアルコキシからなる群より選ばれる置換基で置換
されていてもよいフェニルを表す;
In the formula, R 11 , R 12 , R 13 , R 14 , R 15 and R
16 , R 17 and R 18 each independently represent hydrogen, a hydroxyl group, alkyl having 6 or less carbon atoms, cycloalkyl having 6 or less carbon atoms or alkoxy having 6 or less carbon atoms, and R 19 and R 20 each independently, Hydrogen, alkyl having 6 or less carbon atoms, 6 carbon atoms
The following cycloalkyl, or hydroxyl group, alkyl having 6 or less carbon atoms, cycloalkyl having 6 or less carbon atoms and 6 carbon atoms
Represents phenyl optionally substituted with a substituent selected from the group consisting of the following alkoxy:

【0011】 [0011]

【0012】式中、R21及びR22は互いに独立に、水
素、水酸基又は炭素数6以下のアルキルを表し、R23
24、R25及びR26は互いに独立に、水素若しくは炭素
数6以下のアルキルを表すか、又はR23とR24が一緒に
なり、そしてR25とR26が一緒になって、それぞれが結
合する炭素原子とともに炭素数6以下のシクロアルカン
環を形成する;
[0012] In the formula, R 21 and R 22 are independently of each other, represent hydrogen, hydroxyl or alkyl having 6 or less carbon atoms, R 23,
R 24 , R 25 and R 26 independently represent hydrogen or alkyl having 6 or less carbons, or R 23 and R 24 together, and R 25 and R 26 together, each represents Forming a cycloalkane ring having 6 or less carbon atoms together with the carbon atom to be bonded;

【0013】 [0013]

【0014】式中、R31、R32、R33及びR34は互いに
独立に、水素又は炭素数6以下のアルキルを表し、 m
及びnは互いに独立に0〜3の整数を表すが、m+n≧
2であり、Yは−C(R35)(R36)−又は−C(R37)(R
38)−Ar−C(R39)(R40)−を表し、ここにR35
36、R37、R38、R39及びR40は互いに独立に、水
素、炭素数6以下のアルキル、炭素数6以下のシクロア
ルキル、又は、水酸基、炭素数6以下のアルキル、炭素
数6以下のシクロアルキル及び炭素数6以下のアルコキ
シからなる群より選ばれる置換基で置換されていてもよ
いフェニルを表し、Arは炭素数6以下のアルキル及び水
酸基からなる群より選ばれる置換基で置換されていても
よいフェニレンを表す;
In the formula, R 31 , R 32 , R 33 and R 34 each independently represent hydrogen or alkyl having 6 or less carbon atoms, and m
And n independently represent an integer of 0 to 3, but m + n ≧
2 and Y is -C ( R35 ) ( R36 )-or -C ( R37 ) (R
38 ) -Ar-C (R 39 ) (R 40 )-, wherein R 35 ,
R 36 , R 37 , R 38 , R 39 and R 40 are independently of each other hydrogen, alkyl having 6 or less carbon atoms, cycloalkyl having 6 or less carbon atoms, hydroxyl group, alkyl having 6 or less carbon atoms, and 6 carbon atoms. Represents a phenyl which may be substituted with a substituent selected from the group consisting of cycloalkyl and alkoxy having 6 or less carbon atoms, and Ar is substituted with a substituent selected from the group consisting of alkyl having 6 or less carbon atoms and hydroxyl group Represents optionally substituted phenylene;

【0015】 [0015]

【0016】式中、R41及びR42は互いに独立に、水
素、炭素数6以下のアルキル又は炭素数10以下のアリ
ールを表し、 q及びrは互いに独立に0〜3の整数を
表すが、q+r≧2である。
In the formula, R 41 and R 42 each independently represent hydrogen, alkyl having 6 or less carbon atoms or aryl having 10 or less carbon atoms, and q and r each independently represent an integer of 0 to 3, q + r ≧ 2.

【0017】フェノール性水酸基を有する化合物、例え
ば上記一般式(I)〜(IV)で示される化合物の、1,
2−ナフトキノンジアジド−4−又は−5−スルホン酸
エステルは、かかるフェノール性水酸基を有する化合物
を、1,2−ナフトキノンジアジド−4−又は−5−ス
ルホニルハライドと縮合させることにより得られる。こ
こで、スルホニルハライドとしては、特にスルホニルク
ロライドが好ましく用いられる。
Compounds having a phenolic hydroxyl group, such as compounds represented by the above general formulas (I) to (IV),
2-naphthoquinonediazide-4- or -5-sulfonic acid ester is obtained by condensing such a compound having a phenolic hydroxyl group with 1,2-naphthoquinonediazide-4- or -5-sulfonyl halide. Here, as the sulfonyl halide, sulfonyl chloride is particularly preferably used.

【0018】この反応は通常、塩基の存在下で行われ
る。ここで用いる塩基としては、トリメチルアミン、ト
リエチルアミン、トリエタノールアミン、N,N−ジメ
チルアニリン、N,N−ジエチルアニリン、ピリジンの
ようなアミン類、炭酸ナトリウム、炭酸水素ナトリウム
のような無機塩基などが挙げられる。塩基は、1,2−
ナフトキノンジアジド−4−又は−5−スルホニルハラ
イドに対して、通常1〜1.5のモル比、好ましくは1.0
5〜1.3のモル比で用いられる。
This reaction is usually performed in the presence of a base. Examples of the base used here include amines such as trimethylamine, triethylamine, triethanolamine, N, N-dimethylaniline, N, N-diethylaniline, pyridine, and inorganic bases such as sodium carbonate and sodium hydrogencarbonate. Can be The base is 1,2-
The molar ratio of naphthoquinonediazide-4- or -5-sulfonyl halide is usually 1 to 1.5, preferably 1.0.
Used in a molar ratio of 5 to 1.3.

【0019】本発明では、このエステル化反応の反応溶
媒として、水と分液する性質を持つ有機溶媒を用いる。
かかる有機溶媒としては、例えば、n−ヘキサン、n−
ヘプタンのような脂肪族炭化水素類、シクロヘキサン、
シクロペンタンのような脂環式炭化水素類、トルエン、
キシレンのような芳香族炭化水素類、ジエチルエーテル
のようなエーテル類、ジクロロメタン、クロロホルム、
四塩化炭素、エチレンジクロライドのようなハロゲン化
脂肪族炭化水素類、クロロベンゼン、ジクロロベンゼン
のようなハロゲン化芳香族炭化水素類、酢酸エチル、酢
酸ブチル、酢酸アミルのようなエステル類、メチルイソ
ブチルケトン、メチルアミルケトンのようなケトン類、
エチレングリコールモノメチルエーテルアセテート、エ
チレングリコールモノエチルエーテルアセテート、プロ
ピレングリコールモノメチルエーテルアセテート、プロ
ピレングリコールモノメチルエーテルプロピオネートの
ようなグリコールエーテルエステル類などが挙げられ
る。かかる有機溶媒は、溶媒という語から明らかな如
く、常温で液体のもの、また本発明の定義から明らかな
如く、水と分液する性質を持つものでなければならな
い。なかでも、ポジ型レジスト組成物の溶剤となりうる
ものを用いれば、溶液の形で得られるナフトキノンジア
ジド系感光剤を、そのままポジ型レジスト組成物の調製
に適用することができるので、好都合である。とりわ
け、水と分液する性質を持つケトン類又はグリコールエ
ーテルエステル類が好適に用いられる。
In the present invention, an organic solvent having a property of separating from water is used as a reaction solvent for the esterification reaction.
Examples of the organic solvent include n-hexane and n-hexane.
Aliphatic hydrocarbons such as heptane, cyclohexane,
Alicyclic hydrocarbons such as cyclopentane, toluene,
Aromatic hydrocarbons such as xylene, ethers such as diethyl ether, dichloromethane, chloroform,
Carbon tetrachloride, halogenated aliphatic hydrocarbons such as ethylene dichloride, chlorobenzene, halogenated aromatic hydrocarbons such as dichlorobenzene, ethyl acetate, butyl acetate, esters such as amyl acetate, methyl isobutyl ketone, Ketones such as methyl amyl ketone,
Examples thereof include glycol ether esters such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, and propylene glycol monomethyl ether propionate. Such an organic solvent must be one that is liquid at room temperature, as is clear from the term "solvent," and must have a property of separating from water, as is clear from the definition of the present invention. Of these, the use of a solvent that can serve as a solvent for the positive resist composition is advantageous because the naphthoquinonediazide-based photosensitive agent obtained in the form of a solution can be directly applied to the preparation of the positive resist composition. In particular, ketones or glycol ether esters having a property of separating from water are preferably used.

【0020】こうした水と分液する性質を持つ有機溶媒
を用いることにより、反応後の水洗分液によって精製が
可能となるため、感光剤の濾過が不要となり、収率向上
や安全性確保が図られるという効果が奏される。また本
発明によれば、用いる溶媒の種類によっても変動はある
が、1,4−ジオキサンを反応溶媒とする場合に比べて
反応時間が短縮される傾向にある。反応溶媒は、フェノ
ール性水酸基を有する化合物と1,2−ナフトキノンジ
アジド−4−又は−5−スルホニルハライドの合計量を
基準に、通常は2〜10重量倍の範囲で、好ましくは3
〜6重量倍の範囲で使用される。
By using such an organic solvent which has a property of separating from water, purification can be carried out by washing and separating the liquid after the reaction, thus eliminating the need for filtration of the photosensitizer, improving yield and ensuring safety. The effect of being played is exhibited. Further, according to the present invention, the reaction time tends to be shortened as compared with the case where 1,4-dioxane is used as the reaction solvent, although it varies depending on the kind of the solvent used. The reaction solvent is usually in the range of 2 to 10 times by weight, preferably 3 times, based on the total amount of the compound having a phenolic hydroxyl group and 1,2-naphthoquinonediazide-4- or -5-sulfonylhalide.
It is used in the range of up to 6 times by weight.

【0021】本発明においては、水と分液する性質を持
つ溶媒を単独で用いるのが好ましいが、本発明の目的を
阻害しない範囲で、水と分液する性質を持つ溶媒を2種
又はそれ以上組み合わせて用いること、また他の溶媒、
例えば、1,4−ジオキサンやテトラヒドロフランのよ
うな水溶性エーテル類、γ−ブチロラクトンのような水
溶性エステル類、N−メチルピロリドンのようなアミド
類などを併用することもできる。混合溶媒を用いる場合
でも、全溶媒量を基準に、水と分液する性質を持つ溶媒
が50重量%以上、さらには70重量%以上、あるいは
80重量%以上となるようにするのが好ましい。
In the present invention, it is preferable to use a solvent having a property of separating liquid from water alone, but two or more solvents having a property of separating liquid from water are used within a range not impairing the object of the present invention. Use in combination with the above, other solvent,
For example, water-soluble ethers such as 1,4-dioxane and tetrahydrofuran, water-soluble esters such as γ-butyrolactone, and amides such as N-methylpyrrolidone can be used in combination. Even when a mixed solvent is used, it is preferable that the amount of the solvent having a property of separating from water is 50% by weight or more, further 70% by weight or more, or 80% by weight or more, based on the total amount of the solvent.

【0022】エステル化反応は、常圧下、常温付近で進
行し、一般的には10〜40℃程度の範囲の温度が採用
される。反応時間は、フェノール性水酸基を有する化合
物及びナフトキノンジアジドスルホニルハライドの種類
によっても異なるが、通常は0.5〜8時間程度の範囲で
ある。
The esterification reaction proceeds at around room temperature under normal pressure, and a temperature in the range of 10 to 40 ° C. is generally adopted. The reaction time varies depending on the type of the compound having a phenolic hydroxyl group and the naphthoquinonediazidosulfonyl halide, but is usually in the range of about 0.5 to 8 hours.

【0023】反応終了後は、必要により酢酸のような酸
で中和したあと、反応により生成するハロゲン化水素を
中和するために用いた塩基の塩を濾過するか、または水
を加えて上記の塩を水層に移行させて除去し、さらに金
属除去のための水洗、分液を行って、ナフトキノンジア
ジド系感光剤を溶液の形で得ることができる。その後
は、溶媒中に含まれる水分を除去するため、及びポジ型
レジスト組成物を製造するのに必要な濃度とするため
に、一般には濃縮を行うのが好ましい。
After completion of the reaction, if necessary, after neutralization with an acid such as acetic acid, the salt of the base used for neutralizing the hydrogen halide produced by the reaction is filtered or water is added to the above-mentioned salt. The naphthoquinonediazide-based photosensitizer can be obtained in the form of a solution by transferring the salt of (1) to the aqueous layer to remove it, and further washing with water for metal removal and liquid separation. After that, it is generally preferable to carry out concentration in order to remove water contained in the solvent and to obtain a concentration necessary for producing a positive resist composition.

【0024】[0024]

【実施例】次に実施例を挙げて、本発明をさらに具体的
に説明するが、本発明はこれらの実施例によってなんら
限定されるものではない。
EXAMPLES Next, the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples.

【0025】実施例1 1リットルの四つ口フラスコに、4,4′−メチレンビ
ス〔2−(4−ヒドロキシベンジル)−3,6−ジメチ
ルフェノール〕(次式の構造を有する)
Example 1 In a 1 liter four-necked flask, 4,4'-methylenebis [2- (4-hydroxybenzyl) -3,6-dimethylphenol] (having the structure of the following formula)

【0026】 [0026]

【0027】を56.91g、 1,2−ナフトキノンジ
アジド−5−スルホニルクロライドを70.00g及びメ
チルアミルケトンを532.0g仕込んで完溶させた。そ
こへ、20〜30℃で攪拌しながら、トリエチルアミン
31.64gを2時間かけて滴下した。滴下終了後、同温
度で2時間攪拌し、次に酢酸7.84gを仕込み、30℃
でさらに1時間攪拌した。次いで反応混合物を濾過し、
濾過残をメチルアミルケトン70.0gで洗浄した。 濾
液及び洗液を合わせてイオン交換水716.0gで洗浄
し、分液した。このイオン交換水での洗浄及び分液を5
回繰り返したあと、得られた感光剤のメチルアミルケト
ン溶液を45℃で濃縮して、感光剤Aの溶液304.4g
を得た。
56.91 g of 1,2-naphthoquinonediazide-5-sulfonyl chloride and 702.0 g of methyl amyl ketone were charged to complete dissolution. While stirring at 20 to 30 ° C, 31.64 g of triethylamine was added dropwise thereto over 2 hours. After the completion of dropping, the mixture was stirred at the same temperature for 2 hours, then charged with 7.84 g of acetic acid, and heated at 30 ° C.
For 1 hour. The reaction mixture is then filtered,
The filter residue was washed with 70.0 g of methyl amyl ketone. The filtrate and the washing solution were combined, washed with 716.0 g of ion-exchanged water, and separated. Wash with this ion-exchanged water and separate the liquid 5
After repeated times, the resulting photosensitizer methyl amyl ketone solution was concentrated at 45 ° C. to obtain 304.4 g of a photosensitizer A solution.
I got

【0028】比較例1 1リットルの四つ口フラスコに、4,4′−メチレンビ
ス〔2−(4−ヒドロキシベンジル)−3,6−ジメチ
ルフェノール〕(実施例1に構造を示した化合物)を5
9.24g、1,2−ナフトキノンジアジド−5−スルホ
ニルクロライドを70.00g及び1,4−ジオキサンを
646.25g仕込んで懸濁させた。そこへ、20〜30
℃で攪拌しながら、トリエチルアミン31.63gを2時
間かけて滴下した。 滴下終了後、同温度で6時間攪拌
し、次に酢酸7.82gを仕込み、30℃でさらに1時間
攪拌した。次いで反応混合物を濾過し、濾過残を1,4
−ジオキサン70.0gで洗浄した。濾液及び洗液を酢酸
28.65g及びイオン交換水2865gの混合液中に注
入し、30分攪拌したあと30分静置し、結晶を沈降さ
せて、上澄み液を吸引除去した。得られた結晶をイオン
交換水3719gで攪拌洗浄し、30分静置して結晶を
沈降させ、上澄み液を吸引除去した。このイオン交換水
での洗浄及び上澄み液の吸引除去を2回繰り返したあと
濾過し、イオン交換水1508gで洗浄した。得られた
ウェットケーキ283.11gを40℃で乾燥して、11
3.24gの感光剤Bを得た。
Comparative Example 1 In a 1-liter four-necked flask, 4,4'-methylenebis [2- (4-hydroxybenzyl) -3,6-dimethylphenol] (compound having the structure shown in Example 1) was added. 5
9.24 g, 1,2-naphthoquinonediazide-5-sulfonyl chloride (70.0 g) and 1,4-dioxane (646.25 g) were charged and suspended. 20-30 there
31.63 g of triethylamine was added dropwise over 2 hours while stirring at ℃. After completion of dropping, the mixture was stirred at the same temperature for 6 hours, then 7.82 g of acetic acid was charged, and the mixture was further stirred at 30 ° C. for 1 hour. The reaction mixture is then filtered and the filtration residue is
-Washed with 70.0 g of dioxane. The filtrate and the washing solution were poured into a mixed solution of 28.65 g of acetic acid and 2865 g of ion-exchanged water, stirred for 30 minutes and allowed to stand for 30 minutes to precipitate crystals, and the supernatant was removed by suction. The obtained crystals were washed by stirring with 3719 g of ion-exchanged water, allowed to stand for 30 minutes to precipitate the crystals, and the supernatant was removed by suction. This washing with ion-exchanged water and suction removal of the supernatant liquid were repeated twice, followed by filtration and washing with 1508 g of ion-exchanged water. 283.1 g of the obtained wet cake was dried at 40 ° C.
3.24 g of Photosensitizer B was obtained.

【0029】実施例2 1リットルの四つ口フラスコに、 4−〔1′,2′,
3′,4′,4′a,9′a−ヘキサヒドロ−6′−ヒ
ドロキシ−5′−メチルスピロ[シクロヘキサン−1,
9′−キサンテン]−4′a−イル〕−2−メチルレゾ
ルシノール(次式の構造を有する)
Example 2 In a 1-liter four-necked flask, 4- [1 ', 2',
3 ', 4', 4'a, 9'a-hexahydro-6'-hydroxy-5'-methylspiro [cyclohexane-1,
9'-xanthene] -4'a-yl] -2-methylresorcinol (having a structure of the following formula)

【0030】 [0030]

【0031】を53.76g、 1,2−ナフトキノンジ
アジド−5−スルホニルクロライドを70.00g及びメ
チルアミルケトンを616.0g仕込んで溶解させた。そ
こへ、20〜30℃で攪拌しながら、トリエチルアミン
31.64gを2時間かけて滴下した。滴下終了後、同温
度で2時間攪拌し、次に酢酸10.64gを仕込み、30
℃でさらに1時間攪拌した。次いで反応混合物を濾過
し、濾過残をメチルアミルケトン70.0gで洗浄した。
濾液及び洗液を合わせてイオン交換水760.0gで洗浄
し、分液した。このイオン交換水での洗浄及び分液を5
回繰り返したあと、得られた感光剤のメチルアミルケト
ン溶液を45℃で濃縮して、感光剤Cの溶液327.19
gを得た。
53.76 g, 1,2-naphthoquinonediazide-5-sulfonyl chloride (70.0 g) and methyl amyl ketone (616.0 g) were charged and dissolved. While stirring at 20 to 30 ° C, 31.64 g of triethylamine was added dropwise thereto over 2 hours. After completion of the dropping, the mixture was stirred at the same temperature for 2 hours, and then 10.64 g of acetic acid was added, and
Stirred for an additional hour at ° C. The reaction mixture was then filtered and the filter residue was washed with 70.0 g of methyl amyl ketone.
The filtrate and the washing solution were combined, washed with 760.0 g of ion-exchanged water, and separated. Wash with this ion-exchanged water and separate the liquid 5
After repeated times, the resulting solution of photosensitizer in methyl amyl ketone was concentrated at 45 ° C. to give a solution of photosensitizer C in 327.1
g was obtained.

【0032】比較例2 1リットルの四つ口フラスコに、 4−〔1′,2′,
3′,4′,4′a,9′a−ヘキサヒドロ−6′−ヒ
ドロキシ−5′−メチルスピロ[シクロヘキサン−1,
9′−キサンテン]−4′a−イル〕−2−メチルレゾ
ルシノール(実施例2に構造を示した化合物)を53.7
4g、1,2−ナフトキノンジアジド−5−スルホニル
クロライドを70.00g及び1,4−ジオキサンを61
6.0g仕込んで懸濁させた。 そこへ、20〜30℃で
攪拌しながら、トリエチルアミン31.66gを2時間か
けて滴下した。滴下終了後、同温度で6時間攪拌し、次
に酢酸11.30gを仕込み、30℃でさらに1時間攪拌
した。次に反応混合物を濾過し、濾過残を1,4−ジオ
キサン70.0gで洗浄した。 濾液及び洗液を酢酸3
1.66g及びイオン交換水3197gの混合液中に注入
し、30分攪拌した。析出した結晶を濾過し、得られた
ケーキをイオン交換水3575gで洗浄した。このイオ
ン交換水での洗浄を3回繰り返した。得られたウェット
ケーキ281.5gを40℃で乾燥して、110.71gの
感光剤Dを得た。
Comparative Example 2 A 4-liter 1-liter four-necked flask was charged with 4- [1 ', 2',
3 ', 4', 4'a, 9'a-hexahydro-6'-hydroxy-5'-methylspiro [cyclohexane-1,
9'-xanthene] -4'a-yl] -2-methylresorcinol (the compound whose structure is shown in Example 2) was added to 53.7
4 g, 1,2-naphthoquinonediazide-5-sulfonyl chloride 70.0 g and 1,4-dioxane 61
6.0 g was charged and suspended. Thereto, 31.66 g of triethylamine was added dropwise over 2 hours while stirring at 20 to 30 ° C. After completion of dropping, the mixture was stirred at the same temperature for 6 hours, then 11.30 g of acetic acid was charged, and the mixture was further stirred at 30 ° C. for 1 hour. Next, the reaction mixture was filtered, and the filtration residue was washed with 70.0 g of 1,4-dioxane. The filtrate and washings were mixed with acetic acid 3
It was poured into a mixed solution of 1.66 g and ion-exchanged water 3197 g and stirred for 30 minutes. The precipitated crystals were filtered, and the obtained cake was washed with 3575 g of ion-exchanged water. This washing with ion-exchanged water was repeated 3 times. 281.5 g of the obtained wet cake was dried at 40 ° C. to obtain 110.71 g of Photosensitizer D.

【0033】以上の実施例及び比較例による収率を表1
に示す。
The yields of the above Examples and Comparative Examples are shown in Table 1.
Shown in

【0034】[0034]

【表1】 [Table 1]

【0035】[0035]

【発明の効果】本発明は、フェノール性水酸基を有する
化合物を1,2−ナフトキノンジアジド−4−又は−5
−スルホン酸エステル化するにあたり、水と分液する性
質を持つ有機溶媒を用いて、反応後の水洗分液による精
製を可能とし、ナフトキノンジアジド系感光剤を当該有
機溶媒の溶液の形で得るようにしたものである。そのた
め本発明は、ナフトキノンジアジド系感光剤を固体とし
て得る方法に比べ、収率向上及び安全性確保がはかられ
るという効果を奏する。特に、目的物である感光剤をポ
ジ型レジスト組成物の成分として使用する際の当該組成
物の溶剤ともなりうるものを反応溶媒として用いれば、
得られる感光剤溶液をそのままレジスト組成物の調製に
適用できるので、一層効果的である。したがって本発明
の方法は、ナフトキノンジアジド系感光剤の製造に極め
て有用である。
According to the present invention, a compound having a phenolic hydroxyl group is converted to 1,2-naphthoquinonediazide-4- or -5.
-When converting to a sulfonic acid ester, it is possible to use an organic solvent that has a property of separating liquid from water to allow purification by water separation after the reaction, and obtain a naphthoquinonediazide-based photosensitizer in the form of a solution of the organic solvent It is the one. Therefore, the present invention has an effect of improving yield and ensuring safety as compared with a method of obtaining a naphthoquinonediazide-based photosensitizer as a solid. In particular, if a reaction solvent that can also serve as a solvent for the desired photosensitizer as a component of a positive resist composition is used,
The resulting photosensitizer solution can be applied to the preparation of the resist composition as it is, which is more effective. Therefore, the method of the present invention is extremely useful for producing a naphthoquinonediazide-based photosensitizer.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】フェノール性水酸基を有する化合物と1,
2−ナフトキノンジアジド−4−又は−5−スルホニル
ハライドとを、水と分液する性質を持つ有機溶媒中で縮
合させ、次に水洗して、ナフトキノンジアジド系感光剤
を前記有機溶媒の溶液の形で得ることを特徴とする、ナ
フトキノンジアジド系感光剤の製造方法。
A compound having a phenolic hydroxyl group and 1,
2-naphthoquinonediazide-4- or -5-sulfonyl halide is condensed in an organic solvent having a property of separating from water, and then washed with water to form a naphthoquinonediazide-based photosensitizer in the form of a solution of the organic solvent. And a method for producing a naphthoquinonediazide-based photosensitizer.
【請求項2】1,2−ナフトキノンジアジド−4−又は
−5−スルホニルハライドが、1,2−ナフトキノンジ
アジド−4−又は−5−スルホニルクロライドである請
求項1記載の方法。
2. The method according to claim 1, wherein the 1,2-naphthoquinonediazide-4- or -5-sulfonyl halide is 1,2-naphthoquinonediazide-4- or -5-sulfonyl chloride.
【請求項3】該有機溶媒が、水と分液する性質を持つケ
トン類である請求項1又は2記載の方法。
3. The method according to claim 1, wherein the organic solvent is a ketone having a property of separating from water.
【請求項4】該有機溶媒が、グリコールエーテルエステ
ル類である請求項1又は2記載の方法。
4. The method according to claim 1, wherein the organic solvent is a glycol ether ester.
JP23377295A 1995-09-12 1995-09-12 Method for producing naphthoquinone diazide photosensitizer Expired - Lifetime JP3743030B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23377295A JP3743030B2 (en) 1995-09-12 1995-09-12 Method for producing naphthoquinone diazide photosensitizer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23377295A JP3743030B2 (en) 1995-09-12 1995-09-12 Method for producing naphthoquinone diazide photosensitizer

Publications (2)

Publication Number Publication Date
JPH0977736A true JPH0977736A (en) 1997-03-25
JP3743030B2 JP3743030B2 (en) 2006-02-08

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ID=16960339

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Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6713225B2 (en) 2002-03-15 2004-03-30 Toyo Gosei Kogyo Co., Ltd. 1,2-Naphthoquinone-2-diazidesulfonate ester photosensitive agent, method for producing the photosensitive agent, and photoresist composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6713225B2 (en) 2002-03-15 2004-03-30 Toyo Gosei Kogyo Co., Ltd. 1,2-Naphthoquinone-2-diazidesulfonate ester photosensitive agent, method for producing the photosensitive agent, and photoresist composition

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