JPH01145351A - infrared blocking glass - Google Patents
infrared blocking glassInfo
- Publication number
- JPH01145351A JPH01145351A JP87301584A JP30158487A JPH01145351A JP H01145351 A JPH01145351 A JP H01145351A JP 87301584 A JP87301584 A JP 87301584A JP 30158487 A JP30158487 A JP 30158487A JP H01145351 A JPH01145351 A JP H01145351A
- Authority
- JP
- Japan
- Prior art keywords
- film
- glass
- layer
- nitride
- infrared
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Surface Treatment Of Glass (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、赤外線遮断ガラス、特に自動車用、建築用な
どに単板でも使用可能な耐擦傷性と化学的安定性に優れ
た赤外線遮断ガラスに関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention provides an infrared-shielding glass, particularly an infrared-shielding glass with excellent scratch resistance and chemical stability that can be used as a single sheet for automobiles, architecture, etc. It is related to.
［従来の技術］
従来から窓ガラスを通して建物の室内に流入する太陽光
を遮断して室内の温度上昇を抑え、また冷房負荷を軽減
する目的で赤外線遮断ガラスの採用が検討されてきた。[Prior Art] Consideration has been given to the use of infrared-shielding glass for the purpose of blocking sunlight flowing into the interior of a building through window glass, suppressing the rise in indoor temperature, and reducing the cooling load.
このために、ガラス基板の上に透明誘電体膜／ＡｇＡｇ
膜用透明誘電体膜るいはＡｇ膜の代わりに窒化チタン、
窒化ジルコニウム、窒化ハフニウムなどの窒化物膜を用
いた多層膜構成の赤外線遮断ガラスが考案されている。For this purpose, a transparent dielectric film/AgAg
Titanium nitride instead of transparent dielectric film or Ag film for film,
Infrared-shielding glass having a multilayer structure using nitride films such as zirconium nitride and hafnium nitride has been devised.
透明誘電体膜としては酸化亜鉛、酸化チタン、ｍ化上、
酸化インジウムなどが用いられる。これらの膜は、イオ
ンブレーティング法やスパッタリング法などで形成され
る。As the transparent dielectric film, zinc oxide, titanium oxide,
Indium oxide or the like is used. These films are formed by an ion blasting method, a sputtering method, or the like.
［発明の解決しようとする問題点］
Ａｇ膜を用いた系の赤外線遮断ガラスは、耐擦傷性や化
学的安定性に劣るため、膜面が外部に露出しないように
複層ガラスまたは合わせガラスにして用いられる。この
ため製造コストが高く、また用途によっては使用できな
いなどの問題がある。一方、窒化チタンなどの窒化物膜
を用いた系の赤外線遮断ガラスは、Ａｇ系に較べれば安
定であるので、一部単板の赤外線遮断ガラス、即ち、複
層ガラス化、あるいは合わせガラス化することのない１
枚板の赤外線遮断ガラス、として実用化されている。し
かし、自動車のサイドガラス、リヤーガラスなどのよう
な高い信頼性と耐久性が要求される用途に使用するには
、透明誘電体膜の耐擦傷性や化学的安定性がまだ充分と
は言えない、透明誘電体膜として酸化チタンを用いた系
は、化学的安定性に優れるが、耐擦傷性に問題があり、
又酸化亜鉛、酸化錫、酸化インジウムを用いた系は、耐
酸性などに問題があり、いまだ充分に耐久性の優れた赤
外線遮断ガラスが得られていないというのが現状である
。[Problems to be solved by the invention] Infrared shielding glass using an Ag film has poor scratch resistance and chemical stability, so it is necessary to use double-layered or laminated glass to prevent the film surface from being exposed to the outside. It is used as For this reason, there are problems such as high manufacturing costs and unusability depending on the application. On the other hand, infrared-shielding glass based on a nitride film such as titanium nitride is more stable than Ag-based glass, so some infrared-shielding glasses are made into single-pane infrared-shielding glass, that is, double-glazed or laminated glass. Never 1
It has been put into practical use as a single sheet of infrared-blocking glass. However, the scratch resistance and chemical stability of transparent dielectric films are not yet sufficient for use in applications that require high reliability and durability, such as automobile side and rear windows. Systems using titanium oxide as a transparent dielectric film have excellent chemical stability, but have problems with scratch resistance.
Furthermore, systems using zinc oxide, tin oxide, and indium oxide have problems with acid resistance, and the current situation is that infrared-shielding glasses with sufficiently excellent durability have not yet been obtained.
［問題点を解決するための手段］
本発明は、前述の問題点を解決すべくなされたものであ
り、ガラス基板上に該基板側から順に透明誘電体膜、窒
化物膜、及び透明誘電体膜の少なくとも３層構成膜が形
成されてなる赤外線遮断ガラスに於いて、少なくともガ
ラス基板側からみて一番外側の透明誘電体膜が酸化タン
タルよりなることを特徴とする赤外線遮断ガラスを提供
するものである。[Means for Solving the Problems] The present invention has been made to solve the above-mentioned problems, and includes forming a transparent dielectric film, a nitride film, and a transparent dielectric film on a glass substrate in order from the substrate side. To provide an infrared shielding glass formed with at least three layers of films, characterized in that at least the outermost transparent dielectric film when viewed from the glass substrate side is made of tantalum oxide. It is.
以下、本発明を更に詳細に説明する０図１は、本発明に
係わる赤外線遮断ガラスの断面図を示したものであり、
ｌはソーダーライムシリケートガラス、ボロシリケート
ガラス、アルミノシリケートガラス、各種色調の熱線吸
収ガラスなどから選ばれるガラス基板、２はガラス基板
側に第１層として形成された透明誘電体膜。Hereinafter, the present invention will be explained in more detail. Figure 1 shows a cross-sectional view of an infrared shielding glass according to the present invention.
1 is a glass substrate selected from soda lime silicate glass, borosilicate glass, aluminosilicate glass, heat ray absorbing glass of various colors, etc., and 2 is a transparent dielectric film formed as a first layer on the glass substrate side.
３は第１層の該透明誘電体膜上に形成された第２層とし
ての窒化物膜である。この窒化物膜３としては、具体的
には窒化チタン、窒化ジルコニウム、窒化ハフニウム、
窒化タンタル、及び窒化クロムのうち少なくとも１種か
らなる窒化物、あるいはこれらを主成分とする窒化物か
らなるものが使用される。４は第２層の窒化物膜３上に
第３層として形成された酸化タンタル膜を示す。3 is a nitride film as a second layer formed on the first transparent dielectric film. Specifically, the nitride film 3 includes titanium nitride, zirconium nitride, hafnium nitride,
A nitride made of at least one of tantalum nitride and chromium nitride, or a nitride made of these as main components, is used. 4 indicates a tantalum oxide film formed as a third layer on the second layer nitride film 3.
第１層の透明誘電体膜は、酸化チタン、ｍ化上、酸化ジ
ルコニウム、＃化タンタル、又はこれらを主成分とする
ものなどの透明誘電体膜からなるものが選ばれるが、第
２層の窒化物膜との付着力やスパッタリングでの生産性
を考えると、第２層の窒化物膜と同様な元素を含む透明
誘電体膜が好ましい、同様に、第２層の窒化物膜と第３
層の酸化タンタル膜の構成も考慮すると、ｍ３Ｊ＃がタ
ンタルを含むので、ｆ５１層、第２層は、それぞれ酸化
タンタル、窒化タンタルの組み合わせが特に好ましい、
しかし、特にこ・れだけに限定されるものではなく、第
１層／第２層の組み合わせは、酸化タンタル！ＩＱ／窒
化チタン膜、酸化チタン膜／窒化チタン膜、あるいは酸
化ジルコニウム膜／窒化ジルコニウム膜などその他種々
の組み合わせがとりうる。しかし、生産効率を重視すれ
ば第１層として成膜速度の速い酸化タンタルが好ましい
。The transparent dielectric film of the first layer is selected from a transparent dielectric film made of titanium oxide, m-oxide, zirconium oxide, tantalum, or those containing these as main components. Considering the adhesion with the nitride film and the productivity in sputtering, a transparent dielectric film containing the same elements as the second layer nitride film is preferable.
Considering the structure of the tantalum oxide film of the layer, since m3J# contains tantalum, it is particularly preferable that the f51 layer and the second layer are a combination of tantalum oxide and tantalum nitride, respectively.
However, it is not limited to this, and the combination of the first layer/second layer is tantalum oxide! Various other combinations such as IQ/titanium nitride film, titanium oxide film/titanium nitride film, or zirconium oxide film/zirconium nitride film can be used. However, if production efficiency is important, tantalum oxide, which has a fast film formation rate, is preferable as the first layer.
本発明は上記したような少なくとも３層構成よりなるが
、場合によってはガラス基板と第１層との間、第１層と
第２層との間、又は第２層と第３層との間に１層、又は
複数の層の付着力向上や光学特性の調整などの機能を持
つ層を形成しても良い０本発明における最も大きな特徴
は、ガラス基板から見て一番外側、すなわち空気側に酸
化タンタルを形成することであり、これによって耐擦傷
性と化学的安定性に優れた赤外線遮断ガラスを可能にし
ている。The present invention has at least a three-layer structure as described above, but in some cases, between the glass substrate and the first layer, between the first layer and the second layer, or between the second layer and the third layer. A layer having functions such as improving the adhesion of one or more layers or adjusting optical properties may be formed on the glass substrate. This is to form tantalum oxide into the glass, making it possible to create infrared-shielding glass with excellent scratch resistance and chemical stability.
第３層の酸化タンタル膜のＩＩ！厚は特に限定はされな
いが、透過色や反射色を考慮して通常４００〜８００人
に調節され、特に可視域での高透過、低反射を目的とす
る場合には、 ５５０〜７５０人の範囲が選択される。II of the third layer tantalum oxide film! The thickness is not particularly limited, but it is usually adjusted to 400 to 800 thickness in consideration of transmitted color and reflected color, and is in the range of 550 to 750 thickness, especially when the purpose is high transmission and low reflection in the visible range. is selected.
第１層の透明誘電体膜の膜厚も特に限定はないが、可視
域での高透過、低反射を目的とする場合には、光学的膜
厚で１０００〜１８００Ａの範囲で調節される。第２層
の窒化物膜の膜厚は透過率の面から通常５０〜５００人
の範囲で選ばれる。The thickness of the first transparent dielectric film is also not particularly limited, but when the objective is high transmission and low reflection in the visible range, the optical thickness is adjusted in the range of 1000 to 1800 A. The thickness of the second layer nitride film is usually selected in the range of 50 to 500 layers from the viewpoint of transmittance.
本発明の成膜法としては特に限定されるものではないが
、赤外線遮断ガラスの主要な用途が大面積コーティング
の必要な自動車や建築用などのため、均一性に優れる反
応性スパッタリング法が好ましい。The film forming method of the present invention is not particularly limited, but since the main uses of infrared-shielding glass are automobiles and buildings that require large-area coating, a reactive sputtering method is preferred since it has excellent uniformity.
［作用］
図１で示される様な本発明の透明誘電体膜／窒化膜／透
明誘電体膜の３層構成膜を持つ赤外線遮断ガラスに於い
ては、第２層の窒化物膜が赤外線反射機能を受は持つも
のである。第１層及び第３層の透明誘電体膜は、窒化物
膜の可視域での反射防止機能を受は持つ、必要とされる
屈折率は、通常２．０〜２．５の範囲で選択されるが、
この範囲外でも使用可能である。[Function] In the infrared-shielding glass having a three-layer structure of transparent dielectric film/nitride film/transparent dielectric film of the present invention as shown in FIG. 1, the second layer nitride film reflects infrared rays. Uke has a function. The transparent dielectric films of the first and third layers have the antireflection function in the visible range of the nitride film, and the required refractive index is usually selected in the range of 2.0 to 2.5. However,
It can also be used outside this range.
光学性能の他に、各層は硬く、相互の付着力が強く、熱
、紫外線などに安定でなければならず、又第１層は更に
ガラス基板との付着力が大きいこと、第３Ｍは滑らかな
表面を持ち、ｌ！ｉ１１、アルカリなどに安定であるこ
とが必要であることなどの点から前述した様な膜材料が
使用される。In addition to optical performance, each layer must be hard, have strong mutual adhesion, and be stable against heat and ultraviolet rays, and the first layer must also have strong adhesion to the glass substrate, and the third layer must be smooth. Hold the surface and l! The above-mentioned membrane materials are used because they need to be stable to i11, alkalis, and the like.
酸化タンタルは屈折率が約２．１であり、且つ滑らかな
表面と、高い化学的安定性を示す材料であることから第
１層及び第３Ｍの透明誘電体膜の膜材料として最適であ
る。Tantalum oxide has a refractive index of about 2.1, has a smooth surface, and is a material exhibiting high chemical stability, so it is optimal as a film material for the first layer and the 3M transparent dielectric film.
［実施例］
実施例１
ガラス基板をスパッタリング装置の真空槽にセットし、
１×１叶６Ｔｏｒｒまで排気した。アルゴンと酸素の
混合ガスを導入して圧力を２Ｘ １Ｏ−３Ｔｏｒｒとし
た後、タンタルターゲットを高周波マグネトロンスパッ
タリングして酸化タンタル膜（第１層）を約６００人形
成した６次にアルゴンと窒素の混合ガスに切り替え圧力
を２Ｘ １Ｏ−３Ｔａｒｔにしてチタンターゲットを高
周波マグネトロンスパッタリングして窒化チタン膜（第
２層）を約 １２０人形成した。その後、再び第１層と
同じ条件で酸化タンタル膜（第３層）を約８００人形成
した。[Example] Example 1 A glass substrate was set in a vacuum chamber of a sputtering device,
Exhausted to 1×1 6 Torr. After introducing a mixed gas of argon and oxygen and setting the pressure to 2X 1O-3 Torr, a tantalum target was subjected to high-frequency magnetron sputtering to form a tantalum oxide film (first layer) of approximately 600 layers. About 120 titanium nitride films (second layer) were formed by switching to gas and applying high-frequency magnetron sputtering to a titanium target at a pressure of 2×1O-3Tart. Thereafter, about 800 people formed a tantalum oxide film (third layer) again under the same conditions as the first layer.
こうして得られた試料の可視光透過率、太陽光透過率は
それぞれ約７９％、８１％であった。膜の耐久性を調べ
るために１規定のｔｌ！酸、水酸化ナトリウム中に６時
間、または、沸騰水中に２時間浸漬したが、いずれも透
過率、反射率の変化は０．３％以内であった。テーパー
摩耗１０００回転後のヘーズ変化も３％以内であった。The visible light transmittance and sunlight transmittance of the sample thus obtained were approximately 79% and 81%, respectively. 1 normal tl! to check the durability of the membrane. When immersed in acid or sodium hydroxide for 6 hours or in boiling water for 2 hours, the change in transmittance and reflectance was within 0.3%. The change in haze after 1000 revolutions of taper wear was also within 3%.
実施例２
実施例１と同様にガラス基板上に酸化タンタル膜（第１
層）を約６００人形成した０次に、アルゴンと窒素の混
合ガスに切り替え圧力を２×１０−”Ｔａｒｒにしてジ
ルコニウムターゲットを高周波マグネトロンスパッタリ
ングして窒化ジルコニウム（第２層）を約２００人形成
した。その後、再びｉ１層と同じ条件で酸化タンタル膜
（第３層）を約８０ＯＡ形成した。Example 2 Similar to Example 1, a tantalum oxide film (first
Approximately 600 layers of zirconium nitride (second layer) were formed Next, the pressure was changed to a mixed gas of argon and nitrogen to 2 x 10-'' Tarr, and a zirconium target was subjected to high-frequency magnetron sputtering to form approximately 200 layers of zirconium nitride (second layer). Thereafter, a tantalum oxide film (third layer) of about 80 OA was formed again under the same conditions as the i1 layer.
こうして得られた試料の可視光透過率、太陽光透過率は
、それぞれ約８７％、５４％であった。The visible light transmittance and sunlight transmittance of the sample thus obtained were approximately 87% and 54%, respectively.
膜の耐久性、耐摩耗性は実施例１と同様に優れていた。The durability and abrasion resistance of the film were excellent as in Example 1.
実施例３
実施例１と同様にガラス基板上に酸化タンタル膜（第１
層）を８００人形成した０次に、アルゴンと窒素の混合
ガスに切り替え圧力を２×１０１Ｔｏｒｒにしてタンク
ルターゲットを高周波マグネトロンスパッタリングして
窒化タンタル ゛（第２層）を約１００人形成した。Example 3 Similar to Example 1, a tantalum oxide film (the first
Next, about 100 tantalum nitride layers (second layer) were formed by switching to a mixed gas of argon and nitrogen and setting the pressure to 2 x 101 Torr and performing high-frequency magnetron sputtering on a tank target.
その後、再び第１層と同じ条件で酸化タンタル膜（第３
層）を約６ｏｏ人形成した。After that, the tantalum oxide film (third layer) is again under the same conditions as the first layer.
About 600 layers were formed.
こうして得られた試料の可視光透過率、太陽光透過率は
、それぞれ約８４％、６８％であった。The visible light transmittance and sunlight transmittance of the sample thus obtained were approximately 84% and 68%, respectively.
■りの耐久性、耐摩耗性は実施例１と同様に優れていた
。(2) Durability and abrasion resistance were excellent as in Example 1.
［発明の効果］
実施例１〜３に記載しであるように１本発明によれば、
ガラス基板からみて一番外側の透明誘電体膜として酸化
タンタル膜が用いられているので、化学的安定性と耐擦
傷性を飛躍的に向上させた優れた赤外線遮断ガラスが得
られる。[Effect of the invention] As described in Examples 1 to 3, according to the present invention,
Since a tantalum oxide film is used as the outermost transparent dielectric film when viewed from the glass substrate, an excellent infrared-shielding glass with dramatically improved chemical stability and scratch resistance can be obtained.
これによって、従来は使用出来なかった苛酷な用途にも
単板の赤外線反射ガラスを応用することが出来、例えば
、自動車の窓用の赤外線遮断ガラスとして期待される。This makes it possible to apply single-pane infrared-reflecting glass to harsh applications that could not be used in the past, such as infrared-blocking glass for automobile windows.
図１は、本発明に係わる赤外線遮断ガラスの一部断面図
を示す。
１、ガラス基板
２、透明誘電体膜 （第１層）
３、窒化物膜 （第２層）
４、酸化タンタル膜（第３層）
四 １FIG. 1 shows a partial cross-sectional view of an infrared shielding glass according to the present invention. 1. Glass substrate 2. Transparent dielectric film (first layer) 3. Nitride film (second layer) 4. Tantalum oxide film (third layer) 4 1
Claims (4)
、窒化物膜、及び透明誘電体膜の少なくとも３層構成膜
が形成されてなる赤外線遮断ガラスに於いて、少なくと
もガラス基板側からみて一番外側の透明誘電体膜が酸化
タンタルよりなることを特徴とする赤外線遮断ガラス。(1) In an infrared shielding glass in which at least three layers of a transparent dielectric film, a nitride film, and a transparent dielectric film are formed on a glass substrate in order from the substrate side, at least from the glass substrate side An infrared-shielding glass characterized in that the outermost transparent dielectric film is made of tantalum oxide.
ハフニウム、窒化タンタル、及び窒化クロムのうち少な
くとも１種からなることを特徴とする特許請求の範囲第
１項記載の赤外線遮断ガラス。(2) The infrared shielding glass according to claim 1, wherein the nitride film is made of at least one of titanium nitride, zirconium nitride, hafnium nitride, tantalum nitride, and chromium nitride.
ることを特徴とする特許請求の範囲第１項記載の赤外線
遮断ガラス。(3) The infrared shielding glass according to claim 1, wherein the transparent dielectric film on the glass substrate side is tantalum oxide.
により形成されたことを特徴とする特許請求の範囲第１
項記載の赤外線遮断ガラ ス。(4) Claim 1, characterized in that the transparent dielectric film and the nitride film are formed by reactive sputtering.
Infrared-shielding glass as described in section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62301584A JPH0764598B2 (en) | 1987-12-01 | 1987-12-01 | Infrared blocking glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62301584A JPH0764598B2 (en) | 1987-12-01 | 1987-12-01 | Infrared blocking glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01145351A true JPH01145351A (en) | 1989-06-07 |
| JPH0764598B2 JPH0764598B2 (en) | 1995-07-12 |
Family
ID=17898707
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62301584A Expired - Fee Related JPH0764598B2 (en) | 1987-12-01 | 1987-12-01 | Infrared blocking glass |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0764598B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2676047A1 (en) * | 1991-04-30 | 1992-11-06 | Saint Gobain Vitrage Int | Glass substrate covered with thin metal multilayers for solar protection |
| FR2676046A1 (en) * | 1991-04-30 | 1992-11-06 | Saint Gobain Vitrage Int | Glass substrate coated with thin multilayers for solar protection |
| FR2676048A1 (en) * | 1991-04-30 | 1992-11-06 | Saint Gobain Vitrage Int | Glass substrate coated with thin metal multilayers for solar protection |
| JPH0558680A (en) * | 1991-08-29 | 1993-03-09 | Nippon Sheet Glass Co Ltd | Heat-ray shielding glass |
| EP0678483A3 (en) * | 1991-04-30 | 1995-12-27 | Saint Gobain Vitrage | Glass substrate with a thin multilayer coating for solar protection. |
| US5543229A (en) * | 1991-10-30 | 1996-08-06 | Asahi Glass Company Ltd. | Method of making a heat treated coated glass |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57174240A (en) * | 1981-04-22 | 1982-10-26 | Teijin Ltd | Selective beam transmitting laminate |
| JPS6036355A (en) * | 1983-03-31 | 1985-02-25 | ライボルト・アクチェンゲゼルシャフト | Manufacture of plate with permeability of 5-40 percents in visible spectrum zone and reflectivity against heat ray |
| JPS62216943A (en) * | 1986-03-10 | 1987-09-24 | ロイ ジエラルド ゴ−ドン | Protective coating for solar shielding film |
| JPS62216944A (en) * | 1985-12-06 | 1987-09-24 | ライボルト−ヘレ−ウス・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | Manufacture of window glass with high permeability characteristics within visible spectrum scope and high reflective characteristics against heat ray |
| JPS6455022U (en) * | 1987-10-02 | 1989-04-05 |
-
1987
- 1987-12-01 JP JP62301584A patent/JPH0764598B2/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57174240A (en) * | 1981-04-22 | 1982-10-26 | Teijin Ltd | Selective beam transmitting laminate |
| JPS6036355A (en) * | 1983-03-31 | 1985-02-25 | ライボルト・アクチェンゲゼルシャフト | Manufacture of plate with permeability of 5-40 percents in visible spectrum zone and reflectivity against heat ray |
| JPS62216944A (en) * | 1985-12-06 | 1987-09-24 | ライボルト−ヘレ−ウス・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | Manufacture of window glass with high permeability characteristics within visible spectrum scope and high reflective characteristics against heat ray |
| JPS62216943A (en) * | 1986-03-10 | 1987-09-24 | ロイ ジエラルド ゴ−ドン | Protective coating for solar shielding film |
| JPS6455022U (en) * | 1987-10-02 | 1989-04-05 |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2676047A1 (en) * | 1991-04-30 | 1992-11-06 | Saint Gobain Vitrage Int | Glass substrate covered with thin metal multilayers for solar protection |
| FR2676046A1 (en) * | 1991-04-30 | 1992-11-06 | Saint Gobain Vitrage Int | Glass substrate coated with thin multilayers for solar protection |
| FR2676048A1 (en) * | 1991-04-30 | 1992-11-06 | Saint Gobain Vitrage Int | Glass substrate coated with thin metal multilayers for solar protection |
| EP0678483A3 (en) * | 1991-04-30 | 1995-12-27 | Saint Gobain Vitrage | Glass substrate with a thin multilayer coating for solar protection. |
| JPH0558680A (en) * | 1991-08-29 | 1993-03-09 | Nippon Sheet Glass Co Ltd | Heat-ray shielding glass |
| US5543229A (en) * | 1991-10-30 | 1996-08-06 | Asahi Glass Company Ltd. | Method of making a heat treated coated glass |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0764598B2 (en) | 1995-07-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |