JPH01143123U - - Google Patents
Info
- Publication number
- JPH01143123U JPH01143123U JP3939888U JP3939888U JPH01143123U JP H01143123 U JPH01143123 U JP H01143123U JP 3939888 U JP3939888 U JP 3939888U JP 3939888 U JP3939888 U JP 3939888U JP H01143123 U JPH01143123 U JP H01143123U
- Authority
- JP
- Japan
- Prior art keywords
- etching
- electrode
- voltmeter
- digital multimeter
- computer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 claims description 9
- 230000000903 blocking effect Effects 0.000 claims description 2
- 239000003990 capacitor Substances 0.000 claims description 2
- 238000001020 plasma etching Methods 0.000 claims description 2
- 238000012806 monitoring device Methods 0.000 claims 1
- 238000012544 monitoring process Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 5
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図は本考案の第１の実施例によるエツチン
グシステムのブロツクダイヤグラム、第２図は第
２の実施例によるエツチングシステムのブロツク
ダイヤグラム、第３図は従来技術によるエツチン
グシステムのブロツクダイヤグラム、第４図ａは
リアクテイブイオンエツチング装置の等価回路図
、第４図ｂは電圧波形図である。
１…エツチング電極、２…高周波電源、３…ブ
ロツキングコンデンサ、４…電圧計、５…真空配
管、６…ブースターポンプ、７…メカニカルポン
プ、８…バリアブルオリフイス、９…ガス配管、
１０…マスフローコントローラ、１１…エツチン
グコントローラ、１２…電力設定信号、１３…ガ
ス圧力設定信号、１４…ガス流量設定信号、１５
…デジタルマルチメータ（Ｄ．Ｍ．Ｍ．）、１６
…コンピユータ、１７…電極電圧許容設定信号、
１８…補正信号、１９…平行平板電極。
FIG. 1 is a block diagram of an etching system according to a first embodiment of the present invention, FIG. 2 is a block diagram of an etching system according to a second embodiment, FIG. 3 is a block diagram of an etching system according to the prior art, and FIG. FIG. 4a is an equivalent circuit diagram of the reactive ion etching apparatus, and FIG. 4b is a voltage waveform diagram. 1... Etching electrode, 2... High frequency power supply, 3... Blocking capacitor, 4... Voltmeter, 5... Vacuum piping, 6... Booster pump, 7... Mechanical pump, 8... Variable orifice, 9... Gas piping,
10... Mass flow controller, 11... Etching controller, 12... Power setting signal, 13... Gas pressure setting signal, 14... Gas flow rate setting signal, 15
...Digital multimeter (DM.M.), 16
...computer, 17...electrode voltage tolerance setting signal,
18... Correction signal, 19... Parallel plate electrode.
Claims (1)
グ物を搭載する側の電極板にブロツキングコンデ
ンサを介して高周波電源を接続する構造を有する
カソードカツプル型エツチング装置において、電
極電圧をモニターする電圧計と、電圧計に接続し
たデジタルマルチメータと、Ｄ．Ｍ．Ｍ．のデジ
タルマルチメータに接続したコンピユータとを有
し、エツチング装置のコントローラとコンピユー
タとの間でデータ等を通信可能としたことを特徴
とするカソードカツプル型リアクテイブイオンエ
ツチング装置の電極電圧監視装置。 In a cathode couple type etching apparatus having a structure in which a high frequency power source is connected to the electrode plate on the side of the parallel plate type etching electrode on which the object to be etched is mounted via a blocking capacitor, a voltmeter for monitoring electrode voltage; A digital multimeter connected to a voltmeter, and D. M. M. 1. An electrode voltage monitoring device for a cathode couple type reactive ion etching device, characterized in that the device has a computer connected to a digital multimeter of the etching device, and is capable of communicating data, etc. between the controller of the etching device and the computer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3939888U JPH01143123U (en) | 1988-03-25 | 1988-03-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3939888U JPH01143123U (en) | 1988-03-25 | 1988-03-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01143123U true JPH01143123U (en) | 1989-10-02 |
Family
ID=31265903
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3939888U Pending JPH01143123U (en) | 1988-03-25 | 1988-03-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01143123U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006054148A (en) * | 2004-08-16 | 2006-02-23 | Hitachi High-Technologies Corp | Plasma processing equipment |
-
1988
- 1988-03-25 JP JP3939888U patent/JPH01143123U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006054148A (en) * | 2004-08-16 | 2006-02-23 | Hitachi High-Technologies Corp | Plasma processing equipment |
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