JPH01174918A - Pyroelectric type infrared detection element - Google Patents
Pyroelectric type infrared detection elementInfo
- Publication number
- JPH01174918A JPH01174918A JP62334359A JP33435987A JPH01174918A JP H01174918 A JPH01174918 A JP H01174918A JP 62334359 A JP62334359 A JP 62334359A JP 33435987 A JP33435987 A JP 33435987A JP H01174918 A JPH01174918 A JP H01174918A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- pyroelectric
- substrate
- semiconductor substrate
- detection element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/34—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using capacitors, e.g. pyroelectric capacitors
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Light Receiving Elements (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Radiation Pyrometers (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は特に温度計測、地球資源観測、気象観測、公害
監視、防災、防犯監視、交通機関の運転管理、工場での
熱管理工程などにおける赤外計測に使用されるアレイ状
の焦電型赤外検出素子に関するものである。[Detailed Description of the Invention] Industrial Application Fields The present invention is particularly applicable to infrared rays used in temperature measurement, earth resource observation, weather observation, pollution monitoring, disaster prevention, crime prevention monitoring, operation management of transportation facilities, heat management processes in factories, etc. This invention relates to an array of pyroelectric infrared detection elements used for measurement.
従来の技術
物体からその温度に応じて放射される赤外線を計測して
、物体の赤外像を得る熱型赤外検出素子として、焦電型
赤外撮像板が開発されつつある。BACKGROUND OF THE INVENTION Pyroelectric infrared imaging plates are being developed as thermal infrared detection elements that measure infrared rays emitted from an object according to its temperature to obtain an infrared image of the object.
例えば、インフラレッド・フィジックス 第22巻 2
59頁(Infrared Physics Vo
l、 22、P−269,1982) に記載された
構成が知られている。For example, InfraRed Physics Volume 22 2
Page 59 (Infrared Physics Vo.
1, 22, P-269, 1982) is known.
以下第3図で従来の焦電型赤外撮像板について説明する
。半導体基板14は、CODあるいはシフトレジスタで
、信号読み出し電極としてインジーラム突起部13が形
成され、焦電型素子板11の分離電極2に形成されたイ
ンジーラム突起部13′と電気的、機械的に一対一に対
応して接続してい焦電型素子板11には、分離電極12
が形成されている反対側に共通電極兼赤外吸収層16が
形成されており、赤外線が入射すると、熱吸収し素子温
度がわずかあがる。この温度変化により、焦電効果で、
昇温の程度に応じて表面電荷が発生し、その信号をCO
D、又はシフトレジスタで、時間順次に読み出すことが
できる。このような方法で、被写体の赤外画像信号を得
ることができる。A conventional pyroelectric infrared imaging plate will be explained below with reference to FIG. The semiconductor substrate 14 is a COD or a shift register, and has an injiram protrusion 13 formed as a signal readout electrode, and is electrically and mechanically paired with an injiram protrusion 13' formed on the separation electrode 2 of the pyroelectric element plate 11. A separation electrode 12 is connected to the pyroelectric element plate 11 corresponding to one
A common electrode/infrared absorbing layer 16 is formed on the opposite side where the common electrode and infrared absorbing layer 16 is formed, and when infrared rays are incident, heat is absorbed and the element temperature rises slightly. Due to this temperature change, the pyroelectric effect causes
Surface charge is generated depending on the degree of temperature rise, and the signal is converted to CO
D or a shift register can be used to read out the data sequentially in time. In this way, an infrared image signal of the object can be obtained.
発明が解決しようとする問題点
このような従来の焦電型赤外撮像板では、一対一のイン
ジュウム突起部13.13′のみで熱圧着により電気的
、機械的に接続しているので機械的結合力が弱く、耐振
動・衝撃特性などの機械的強度が劣る問題がある。Problems to be Solved by the Invention In such a conventional pyroelectric infrared imaging plate, electrical and mechanical connections are made only by one-to-one indium protrusions 13 and 13' by thermocompression bonding, so mechanical There are problems with weak bonding strength and poor mechanical strength such as vibration resistance and shock resistance.
また、半導体基板14及び焦電型素子板11の平面度は
通常は±2〜3μmであり、一対一の接合において部分
的に数μmのスキ間がおいて、接続しない部分ができる
。Further, the flatness of the semiconductor substrate 14 and the pyroelectric element plate 11 is usually ±2 to 3 μm, and in one-to-one bonding, there is a gap of several μm in some parts, resulting in unconnected portions.
この場合、平板治具で両側からはさんで、サンドイッチ
状にして、圧縮接着しても、一対一の接合全てを接続す
ることは不可能である。インジーラム突起部13.13
′の高さは片側だけで2μm程度であり、変形率50%
として、両側で約2μmの接近が可能であるが、単に全
面を均一に圧縮するだけでは±3μmのスキ間を完全に
補うことは不可能である。In this case, it is impossible to connect all the one-to-one joints even if they are sandwiched from both sides with a flat plate jig and compressed and bonded. Injiram protrusion 13.13
The height of ' is about 2 μm on one side only, and the deformation rate is 50%.
As a result, it is possible to approach the gap by approximately 2 μm on both sides, but it is impossible to completely compensate for the gap of ±3 μm by simply compressing the entire surface uniformly.
本発明は上記問題点を解決するもので、機械的強度が大
きく、かつ耐振性、耐音響性のすぐれた焦電型赤外検出
素子を得ることを目的とするものである。The present invention solves the above-mentioned problems, and aims to provide a pyroelectric infrared detection element that has high mechanical strength and excellent vibration resistance and sound resistance.
問題点を解決するための手段
上記目的を達成するために、本発明においては、機械的
強度の弱い焦電素子板を比較的強度の優れた半導体基板
と赤外入射窓板とで両側からはさむようにして貼り合わ
せ、かつ半導体基板と焦電素子板の間に収縮硬化型の接
着剤を介在させたものである。Means for Solving the Problems In order to achieve the above object, in the present invention, a pyroelectric element plate having a weak mechanical strength is connected to a semiconductor substrate having a relatively high strength and an infrared incident window plate from both sides. The semiconductor substrate and the pyroelectric element plate are sandwiched together and a shrink-hardening adhesive is interposed between the semiconductor substrate and the pyroelectric element plate.
作用
上記の構成によれば、比較的機械強度の優れた半導体基
板と赤外入射窓板を焦電素子板の両面に貼り合わせるこ
とで、機械的強度を高めることになり、更に、半導体基
板と焦電素子板との接合について、複数の接合点の周辺
を収縮硬化型の接着剤で充填しであるので、硬化時に両
板を引きつけ、接着強度を著しく大きくするだけでなく
、半導体基板の信号読み出し電極と焦電型素子板の分離
電極の電気的接続ひとつひとつを接着層の収縮力で強め
ることになる。Effects According to the above structure, the mechanical strength is increased by bonding the semiconductor substrate, which has relatively excellent mechanical strength, and the infrared incidence window plate to both sides of the pyroelectric element plate. For bonding to the pyroelectric element plate, the periphery of multiple bonding points is filled with a shrink-hardening adhesive, which attracts both plates when cured, significantly increasing the adhesive strength, as well as improving the signal strength of the semiconductor substrate. Each electrical connection between the readout electrode and the separate electrode of the pyroelectric element plate is strengthened by the contractile force of the adhesive layer.
実施例
以下本発明の実施例について図面とともに詳細に説明す
る。EXAMPLES Hereinafter, examples of the present invention will be described in detail with reference to the drawings.
第1図は本発明によるアレイ状焦電型赤外検出素子の構
成を示す断面図である。1は焦電素子薄膜で、チタン酸
鉛(PTO)系スパッタ蒸着(ool)配向膜である。FIG. 1 is a sectional view showing the structure of an arrayed pyroelectric infrared detection element according to the present invention. 1 is a pyroelectric element thin film, which is a lead titanate (PTO)-based sputter-deposited (ool) alignment film.
2は結晶の格子定数が焦電素子薄膜1とはゾ同じである
(100)配向膜の白金電極で信号取り出しの分離電極
の役割をもっている。Reference numeral 2 denotes a platinum electrode of a (100) alignment film whose crystal lattice constant is the same as that of the pyroelectric element thin film 1, and serves as a separation electrode for signal extraction.
これに重ねて電極引出し電極7が蒸着されその他端は枠
状に加工された蒸着基板6の下頂部まで蒸着されている
。蒸着基板5は酸化マグネシウム単結晶で、電極引出し
電極7はアルミニウム蒸着膜とした。この引出し電極7
は、第2図に示すように1素子の寸法100μm平方に
対して、巾15μmとした。第2図、は、第1図の枠状
蒸着基板上の焦電素子膜を上から見た平面図で、窓板1
0が接着される前の状態を示す。また、第1図は、第2
図のA−A’断面図に相当し、窓板10及び半導体基板
4を重ね完成した状態を示す。An electrode extraction electrode 7 is deposited on top of this, and the other end is deposited up to the lower top of a frame-shaped deposition substrate 6. The vapor deposition substrate 5 was made of magnesium oxide single crystal, and the electrode extraction electrode 7 was made of an aluminum vapor deposition film. This extraction electrode 7
As shown in FIG. 2, the width of each element was 15 μm with respect to the dimension of 100 μm square. FIG. 2 is a top plan view of the pyroelectric element film on the frame-shaped vapor deposition substrate of FIG.
0 shows the state before being glued. Also, Figure 1 shows the
This corresponds to the AA' cross-sectional view in the figure, and shows a state in which the window plate 10 and the semiconductor substrate 4 are stacked and completed.
窓板10はゲルマニウムとし、半導体基板4は電荷転送
形デバイスを採用した。The window plate 10 was made of germanium, and the semiconductor substrate 4 was a charge transfer type device.
蒸着基板5の酸化マグネシウム単結晶は厚さ60μmと
し、100μm平方ピッチで、76μm平方の有感部に
相当する部分を128X128の2次元アレイ状に26
μmの深さで凹状に蝕刻し、この部分の有感部のみ、あ
るいは、有感部より若干広い部分のみに、裏面電極とし
ての白金電極2をスパッタ蒸着する。そして、その上に
全面にわたって焦電素子薄膜1としてPTOをスパッタ
蒸着する。更にその上に、赤外受光電極θとしてニクロ
ムを全面蒸着する。次に、蒸着基板6を中央部76μm
平方の部分のみ、即ちアレイ配置の有感部に相当する位
置を裏面から完全に除去する。次に、第2図に示すよう
に、信号引出し電極7であるアルミニウム蒸着膜を蝕刻
によって現われた白金電極2に重ねて蒸着し、枠状の酸
化マグネシウム単結晶蒸着基板6の上類部から信号を取
出せるようにする。The magnesium oxide single crystal of the vapor deposition substrate 5 has a thickness of 60 μm, and is arranged in a 128×128 two-dimensional array of 26 parts corresponding to a 76 μm square sensitive area with a 100 μm square pitch.
It is etched into a concave shape with a depth of μm, and a platinum electrode 2 as a back electrode is sputter-deposited only on the sensitive part of this part or only on a part slightly wider than the sensitive part. Then, PTO is sputter-deposited as a pyroelectric element thin film 1 over the entire surface. Furthermore, nichrome is deposited on the entire surface as an infrared receiving electrode θ. Next, the vapor deposition substrate 6 was
Only the square part, ie, the position corresponding to the sensitive part of the array arrangement, is completely removed from the back surface. Next, as shown in FIG. 2, an aluminum vapor-deposited film, which is the signal extraction electrode 7, is vapor-deposited over the platinum electrode 2 exposed by etching, and a signal is transmitted from the upper part of the frame-shaped magnesium oxide single crystal vapor-deposited substrate 6. Make it possible to take out.
このアルミニウム蒸着膜の信号引出し電極7と半導体基
板4の信号読み出し部8を電気的に接着させるためにイ
ンジウム3を両方にそれぞれ2μmの厚さに蒸着し、1
70’Cで熱圧着する。その時、収縮硬化型接着剤9で
、機械的接着の補強を行う。In order to electrically bond the signal extraction electrode 7 of this aluminum vapor-deposited film to the signal readout part 8 of the semiconductor substrate 4, indium 3 was vapor-deposited on both to a thickness of 2 μm, and 1
Heat and press at 70'C. At this time, mechanical adhesion is reinforced using shrinkage hardening adhesive 9.
第1図では、アルミニウム蒸着膜7があるため、右側の
み接着剤9が盛られているが、第2図に示すようにアル
ミニウム蒸着膜7は、中央部16μm部分のみであるか
ら、それ以外の部分は、右側のみでなく、左側及び上類
部にも接着剤9が充填されている。In FIG. 1, the adhesive 9 is applied only on the right side due to the presence of the aluminum vapor deposition film 7, but as shown in FIG. The adhesive 9 is filled not only on the right side but also on the left side and the upper part.
一方、受光側も、接着剤9′で、ゲルマニウム窓板1o
とニクロム蒸着された酸化マグネシウム蒸着基板6の上
類部とを接着する。この窓板10は、必要であれば赤外
フィルタとしての機能を持たせろことができる。On the other hand, on the light receiving side, glue the germanium window plate 1o with adhesive 9'.
and the upper part of the magnesium oxide vapor-deposited substrate 6 on which nichrome was vapor-deposited are bonded. This window plate 10 can be provided with a function as an infrared filter, if necessary.
接着剤9.9′は半導体基板4の信号読み出し電極8、
白金電極2、信号引出し電極7と濡れず、インジウム3
に付着しない材料が使用され、たとえば収縮硬化型のア
クリル樹脂とエポキシ樹脂の混合物を用いた。この接着
剤は硬化時に体積が収縮し、かつ半導体基板と焦電型素
子”板との接着力が収縮力より大きい。The adhesive 9.9' is attached to the signal readout electrode 8 of the semiconductor substrate 4,
Platinum electrode 2, signal extraction electrode 7 do not get wet, indium 3
A material that does not adhere to the material was used, such as a mixture of shrink-curing acrylic resin and epoxy resin. This adhesive shrinks in volume when cured, and the adhesive force between the semiconductor substrate and the pyroelectric element plate is greater than the shrinkage force.
また、両面とも空気抜きの孔を任意の場所に形成し、真
空封入を可能とした。Additionally, air vent holes were formed at arbitrary locations on both sides, making vacuum sealing possible.
以上で、機械的強度が大で、耐振性の高い焦電型赤外検
出素子を完成することができた。As described above, a pyroelectric infrared detection element with high mechanical strength and high vibration resistance was completed.
発明の効果
以上のように本発明は、基板の有感部の受光側を凹状に
し、電極及び焦電膜を蒸着後、基板裏面の有感部を完全
除去し、赤外入射側は窓板を、裏面信号取出し電極側は
半導体基板を、収縮硬化型接着を用いて、貼り合わせる
ことにより、感度特性を損わず、機械強度を大巾に増大
し、耐振性を従来の4倍、耐音響性については100倍
向上でき、かつ電気的接合部の歩留を欠陥率で1%から
、その1/1゜に低減することができた。Effects of the Invention As described above, the present invention makes the light-receiving side of the sensitive part of the substrate concave, and after depositing the electrode and pyroelectric film, completely removes the sensitive part on the back surface of the substrate, and the infrared incident side is provided with a window plate. By bonding the semiconductor substrate on the backside signal extraction electrode side using shrink-curing adhesive, the mechanical strength is greatly increased without impairing the sensitivity characteristics, and the vibration resistance is four times that of the conventional one. Acoustic properties could be improved 100 times, and the defect rate of electrical joints could be reduced from 1% to 1/1 degree.
第1図は本発明による焦電型赤外検出素子の構造を示す
断面図、第2図は同素子の製作途中の平面図、第3図は
従来の焦電型赤外検出素子の構造を示す断面図である。
1・・・焦電素子薄膜、2・・・白金電極、3・・・イ
ンジウム、4・・・半導体基板、6・・・蒸着基板、6
・・・赤外受光電極、7・・・信号引出し電極、8・・
・半導体基板の信号読み出し電極、9.9′・・・接着
剤、1o・・・窓板。
代理人の氏名 弁理士 中 尾 敏 男 ほか1名ji
lt!iff
第2図Fig. 1 is a cross-sectional view showing the structure of a pyroelectric infrared detection element according to the present invention, Fig. 2 is a plan view of the same element during manufacture, and Fig. 3 shows the structure of a conventional pyroelectric infrared detection element. FIG. DESCRIPTION OF SYMBOLS 1... Pyroelectric element thin film, 2... Platinum electrode, 3... Indium, 4... Semiconductor substrate, 6... Evaporation substrate, 6
...Infrared receiving electrode, 7...Signal extraction electrode, 8...
- Signal readout electrode of semiconductor substrate, 9.9'...adhesive, 1o...window plate. Name of agent: Patent attorney Toshio Nakao and one other person
lt! if Figure 2
Claims (7)
基板と、前記基板上に形成された焦電型薄膜と、前記焦
電型薄膜の受光側に設けられた第1の電極と、前記焦電
型薄膜の他方の面にアレイ状に分離配列された第2の電
極と、前記第1の電極面側に配された赤外入射窓板と、
前記第2の電極面側に配され、時間順次で複数の信号を
読み出す半導体基板とを具備し、前記半導体基板の信号
読み出し部と第2の電極とは電気的に接続され、少なく
とも前記焦電型薄膜と半導体基板とが収縮硬化型の接着
剤で接着されていることを特徴とする焦電型赤外検出素
子。(1) a substrate in which a recess is formed at least in a portion of an effective light-receiving surface; a pyroelectric thin film formed on the substrate; a first electrode provided on the light-receiving side of the pyroelectric thin film; a second electrode separated and arranged in an array on the other surface of the pyroelectric thin film; an infrared incidence window plate disposed on the first electrode surface side;
a semiconductor substrate disposed on the second electrode surface side from which a plurality of signals are read out in time sequence, the signal readout section of the semiconductor substrate and the second electrode are electrically connected, and at least the pyroelectric A pyroelectric infrared detection element characterized in that a mold thin film and a semiconductor substrate are bonded together with a shrink-hardening adhesive.
の各々は赤外入射窓板および半導体基板と離間している
ことを特徴とする特許請求の範囲第1項記載の焦電型赤
外検出素子。(2) The pyroelectric device according to claim 1, wherein each of the first electrode and the second electrode in the effective light-receiving surface portion is spaced apart from the infrared incidence window plate and the semiconductor substrate. type infrared detection element.
膜であることを特徴とする特許請求の範囲第1項記載の
焦電型赤外検出素子。(3) The pyroelectric infrared detection element according to claim 1, wherein the substrate is a single crystal substrate, and the pyroelectric thin film is a vapor-deposited alignment film.
タン酸鉛系の(001)配向膜、第2の電極が白金蒸着
膜で(100)の配向膜であることを特徴とする特許請
求の範囲第1項記載の焦電型赤外検出素子。(4) A patent claim characterized in that the substrate is a magnesium oxide single crystal, the pyroelectric thin film is a lead titanate-based (001) oriented film, and the second electrode is a platinum vapor-deposited film and is a (100) oriented film. The pyroelectric infrared detection element according to the range 1 above.
する特許請求の範囲第1項記載の焦電型赤外検出素子。(5) The pyroelectric infrared detection element according to claim 1, wherein the infrared incidence window plate is an infrared filter.
の電極と濡れず、その周辺部に接着剤が偏在しているこ
とを特徴とする特許請求の範囲第1項記載の焦電型赤外
検出素子。(6) The adhesive is applied to the signal readout electrode of the semiconductor substrate, the second
The pyroelectric infrared detection element according to claim 1, characterized in that the adhesive does not get wet with the electrode and is unevenly distributed around the electrode.
板と焦電型素子板との接着力が収縮力より大きいことを
特徴とする特許請求の範囲第1項記載の焦電型赤外検出
素子。(7) The pyroelectric red resin according to claim 1, wherein the adhesive shrinks in volume upon curing, and the adhesive force between the semiconductor substrate and the pyroelectric element plate is greater than the shrinkage force. Outside detection element.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62334359A JPH01174918A (en) | 1987-12-29 | 1987-12-29 | Pyroelectric type infrared detection element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62334359A JPH01174918A (en) | 1987-12-29 | 1987-12-29 | Pyroelectric type infrared detection element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01174918A true JPH01174918A (en) | 1989-07-11 |
Family
ID=18276489
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62334359A Pending JPH01174918A (en) | 1987-12-29 | 1987-12-29 | Pyroelectric type infrared detection element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01174918A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5397897A (en) * | 1992-04-17 | 1995-03-14 | Terumo Kabushiki Kaisha | Infrared sensor and method for production thereof |
| JPWO2011039798A1 (en) * | 2009-09-29 | 2013-02-21 | パイオニア株式会社 | MEMS sensor and sensor array including the same |
-
1987
- 1987-12-29 JP JP62334359A patent/JPH01174918A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5397897A (en) * | 1992-04-17 | 1995-03-14 | Terumo Kabushiki Kaisha | Infrared sensor and method for production thereof |
| US5521123A (en) * | 1992-04-17 | 1996-05-28 | Terumo Kabushiki Kaisha | Infrared sensor and method for production thereof |
| JPWO2011039798A1 (en) * | 2009-09-29 | 2013-02-21 | パイオニア株式会社 | MEMS sensor and sensor array including the same |
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