JPH01312873A - Organic thin film EL device - Google Patents
Organic thin film EL deviceInfo
- Publication number
- JPH01312873A JPH01312873A JP63142986A JP14298688A JPH01312873A JP H01312873 A JPH01312873 A JP H01312873A JP 63142986 A JP63142986 A JP 63142986A JP 14298688 A JP14298688 A JP 14298688A JP H01312873 A JPH01312873 A JP H01312873A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- organic
- organic thin
- hole
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
- H10H20/832—Electrodes characterised by their material
- H10H20/833—Transparent materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electroluminescent Light Sources (AREA)
- Led Devices (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は平面光源やデイスプレィに用いる有機薄膜EL
(電界発光)素子に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to organic thin film EL used for flat light sources and displays.
(Electroluminescent) device.
有機物質を原料としたEL素子は、安価な大面積フルカ
ラー表示素子を実現するものとして研究されてきた。し
かし、従来の有R物質を原料としたEL素子はZnS:
Mn系の無機薄膜El−素子に比べて輝度が低く、特性
劣化も潰しかったため実用に至らなかった。ところが、
最近有機薄膜を2層構造にした有機薄膜EL素子が報告
され、この素子に強い関心が集められている(参考文献
アプライド・フィジイックス・レタースフ51巻。EL devices made from organic materials have been studied as a means of realizing inexpensive, large-area, full-color display devices. However, conventional EL elements made from R-containing materials are ZnS:
Compared to Mn-based inorganic thin film El-elements, the luminance was lower and the characteristics deteriorated significantly, so it could not be put into practical use. However,
Recently, an organic thin film EL device with a two-layer organic thin film structure has been reported, and this device has attracted strong interest (Reference Applied Physics Letters, Vol. 51).
913ページ、 1987年)、この文献によれば、螢
光性金属キレート錯体を有機螢光体薄膜層に、アミン系
材料を正孔伝導層に用いて、明るい緑色発光の素子が得
られ、6〜7Vの直流電圧印加で数1QOcd/ rd
の輝度を有し、壺大発光効率は1.5Qn/Wと、実用
レベルに近い性能をもっていることが報告されている。According to this document, a bright green light-emitting device is obtained by using a fluorescent metal chelate complex as an organic phosphor thin film layer and an amine-based material as a hole-conducting layer. Several 1 QOcd/rd when applying a DC voltage of ~7V
It has been reported that it has a luminance of 1.5 Qn/W, and a pot luminous efficiency of 1.5 Qn/W, which is close to a practical level of performance.
上記有機薄膜EL素子の構造は第3図に示すように、ガ
ラス基板21に形成した透明量′!E!22と、背面電
極25との間に、アミン系など正孔伝導性を示す低分子
有機半導体材料からなる正孔注入層23と、電子伝導性
を示しかつ強い螢光を発する金属キレート錯体からなる
有機螢光体薄膜層24をそれぞれ500人前後積層した
構造である。The structure of the organic thin film EL device is as shown in FIG. E! 22 and the back electrode 25, there is a hole injection layer 23 made of a low-molecular organic semiconductor material exhibiting hole conductivity, such as an amine type, and a metal chelate complex exhibiting electron conductivity and emitting strong fluorescence. It has a structure in which approximately 500 organic phosphor thin film layers 24 are laminated.
ところで、前記有機薄11!BL素子は、前述したよう
に初期特性としては優れている。しかし発光特性の非常
に速い劣化が問題である0例えば乾燥アルゴン中で51
^/dの一定電流で駆動したところ、初期50Cd/
dであった輝度が100時間後15〜20cd/ rd
に低下した。こめ間、印加電圧は5.5Vより14Vに
上昇している。また、素子製造過程に注意を払い、さら
にシールを充分に繕しても、この特性劣化速度を低くす
ることは囲器であった。By the way, the organic thin 11! As mentioned above, the BL element has excellent initial characteristics. However, a very fast deterioration of the luminescent properties is a problem. For example, 51 in dry argon.
When driven with a constant current of ^/d, the initial value was 50Cd/
After 100 hours, the brightness that was d is 15-20 cd/rd.
It declined to . During the test, the applied voltage increased from 5.5V to 14V. Moreover, even if careful attention is paid to the device manufacturing process and the seal is sufficiently repaired, it is difficult to reduce the rate of deterioration of the characteristics.
EL素子として実用化のためには、例えば一定電圧印加
のもとて輝度半減時間が1000時間以上であることが
必要である。For practical use as an EL element, it is necessary that the luminance half-life time be 1000 hours or more when a constant voltage is applied, for example.
本発明の目的は上記課題を解決した有機薄+1QEL素
子を提供することにある。An object of the present invention is to provide an organic thin +1QEL element that solves the above problems.
上記目的を達成するため、本発明の有機薄膜EL素子に
おいては、少なくとも一方が透明である一対の電極間に
、有機螢光体薄膜層と正孔伝導性を示す無機半導体薄膜
層との積層構造を有するものである。In order to achieve the above object, the organic thin film EL device of the present invention has a laminated structure of an organic phosphor thin film layer and an inorganic semiconductor thin film layer exhibiting hole conductivity between a pair of electrodes, at least one of which is transparent. It has the following.
第3図に示す従来の二層型有機薄11!EL素子を充分
にシールし、その素子を乾燥アルゴン中でニージンク試
験をしたところ、先に述べたように輝度低下、発光電圧
の上昇という劣化が数10時間以上で生じた。この劣化
原因を調査した結果、主に正孔注入層からの正孔注入効
率が低下しているためと判断された。Conventional two-layer organic thin film 11 shown in Fig. 3! When the EL element was sufficiently sealed and the element was subjected to a knee zinc test in dry argon, deterioration in the form of a decrease in brightness and an increase in emission voltage occurred over several tens of hours as described above. As a result of investigating the cause of this deterioration, it was determined that it was mainly due to a decrease in hole injection efficiency from the hole injection layer.
正孔注入効率の低下は、■素子駆動時に発生ずる0、
2W / d前後のジュール熱で、一般に耐熱性が劣る
正孔注入層材の変質と、■通電自体による正孔注入層の
高抵抗化により生じている。The decrease in hole injection efficiency is caused by:
This is caused by deterioration of the hole injection layer material, which generally has poor heat resistance, due to Joule heat of around 2 W/d, and (2) an increase in the resistance of the hole injection layer due to the energization itself.
実用レベルの発光輝度を得るためには10n+A/i程
度の電流が必須であるが、有機正孔注入層材料を使用す
るかぎり、従来型有機薄膜EL素子の劣化防止は困難で
あった。Although a current of about 10n+A/i is essential to obtain a practical level of luminance, it has been difficult to prevent deterioration of conventional organic thin film EL devices as long as organic hole injection layer materials are used.
そこで、従来の前記有機正孔注入層材料に比べ格段に安
定性が優れているとともに、高い正孔濃度・移動度を有
している正孔伝導型9!#、機半導体材料に注目した。Therefore, the hole-conducting type 9! has much better stability than the conventional organic hole-injection layer materials and has high hole concentration and mobility. #, we focused on mechanical semiconductor materials.
本発明は、従来の有機正孔注入層材料の代りに、正孔伝
導性の無機半導体を正孔注入層として使用した結果、安
定な発光特性を有する素子が得られなことに因っている
。正孔伝導性の無機半導体薄膜としてS1+−xCx(
0≦X≦1)が実用的に優れていた。非晶質あるいは微
結晶のS i +−x c8薄膜は大面積成膜も容易で
あり、ドーピングにより正孔伝導性を付与することも簡
単である。また通電や温度による電気的特性変化ら少な
く、電極材料との電気化学的反応もない、更に透光性も
優れている。5it−xCx以外にCul、CuSやG
aAs、Zn’r’e等III−V、I[−Vl族化合
物を始めとして、各種P型(正孔伝導性)半導体薄膜を
使用することができる。The present invention is based on the fact that an element with stable light-emitting properties can be obtained as a result of using a hole-conducting inorganic semiconductor as a hole-injection layer instead of a conventional organic hole-injection layer material. . S1+-xCx (
0≦X≦1) was practically excellent. An amorphous or microcrystalline S i +-x c8 thin film can be easily formed over a large area, and it is also easy to impart hole conductivity through doping. In addition, there is little change in electrical properties due to current flow or temperature, there is no electrochemical reaction with electrode materials, and furthermore, it has excellent translucency. In addition to 5it-xCx, Cul, CuS and G
Various P-type (hole conductive) semiconductor thin films can be used, including III-V, I[-Vl group compounds such as aAs and Zn'r'e.
本発明の構造により、P型!!l!:fi半導体薄膜よ
り安定に有機螢光体薄膜層へ正孔が注入されるようにな
った。したがって、低電圧駆動である有機薄膜EL素子
の特徴を生かしたまま、従来より大幅に信頼性を高めた
素子を提供できる。Due to the structure of the present invention, P type! ! l! Holes are now injected into the organic phosphor thin film layer more stably than with the fi semiconductor thin film. Therefore, it is possible to provide an element with significantly higher reliability than the conventional one while taking advantage of the characteristics of an organic thin film EL element that is driven at a low voltage.
以下実施例に従って本発明の有機薄膜EL素子を詳細に
説明する。The organic thin film EL device of the present invention will be described in detail below according to Examples.
第1図において、まず、適当な形にバターニングされた
約2000人のITO(酸化インジウム・スズ)透明な
極2が形成されているガラス基板1を用意した。このガ
ラス基板1をクリーンルーム内で、アセトンおよび純水
で充分洗浄しておく9次にECRプラズマCVD法でs
i+−xcx(o≦X≦1)薄膜層3を形成した。この
薄膜層3は電気伝導率が10−’10’ S −ci−
’程度のP型半導体薄膜である。膜厚は100〜100
0人でありほとんど透明であった0次にその表面に有機
螢光体薄膜層4を50〜1000人形成した。ここに使
用した材料は螢光性金属キノリン・キレート錯体である
。その化学式を第2図に示す。In FIG. 1, first, a glass substrate 1 was prepared, on which approximately 2000 ITO (indium tin oxide) transparent electrodes 2, which were patterned into a suitable shape, were formed. This glass substrate 1 is thoroughly cleaned with acetone and pure water in a clean room.
A thin film layer 3 of i+-xcx (o≦X≦1) was formed. This thin film layer 3 has an electrical conductivity of 10-'10' S -ci-
It is a P-type semiconductor thin film of about . Film thickness is 100-100
An organic phosphor thin film layer 4 of 50 to 1,000 layers was formed on the surface of the zero layer, which was almost transparent. The material used here is a fluorescent metal quinoline chelate complex. Its chemical formula is shown in Figure 2.
M後に、背面電極5として銀・マグネシウム合金を電子
ビーム蒸着で約2000人形成し、表面をシール用カバ
ー6で覆って素子を完成した。After M, about 2000 silver/magnesium alloys were formed as the back electrode 5 by electron beam evaporation, and the surface was covered with a sealing cover 6 to complete the device.
この素子に透明電極(ITO)2側を正、銀・マグネシ
ウムによる背面電極5側を負として約10Vの直流電圧
を印加することにより、約500cd/dの明るい緑色
発光を得ることができた。また定電圧印加の状態で10
0時間エージングをおこなったところ、輝度低下は10
%程度であり、格段に安定性か向上した。By applying a DC voltage of about 10 V to this device with the transparent electrode (ITO) 2 side being positive and the silver/magnesium back electrode 5 side being negative, bright green light emission of about 500 cd/d could be obtained. In addition, when a constant voltage is applied, 10
After aging for 0 hours, the brightness decreased by 10
The stability was significantly improved.
また、周囲温度か70″Cであっても劣化は非常に少な
かった。Further, even at ambient temperature of 70''C, there was very little deterioration.
尚、発光層を形成する材料は強い螢光を示す有機化合物
を使用することができる。例えば実施例に示したアルミ
ニウムのキノリンキレート錯体を始め、銅、亜j()、
カドニウム、マグネシウム等のキノリン錯体や金属フタ
ロシアニンl1ii体等や、アントラセン、ナフタセン
、テトラセン等縮合多環化合物全般とその誘導体か使用
できる9本発明は使用される有機螢光体材料を限定する
ものでない。Incidentally, as the material forming the light-emitting layer, an organic compound exhibiting strong fluorescence can be used. For example, the quinoline chelate complex of aluminum shown in the example, copper, zinc (),
Quinoline complexes such as cadmium and magnesium, metal phthalocyanine lllii derivatives, etc., general condensed polycyclic compounds such as anthracene, naphthacene, and tetracene, and their derivatives can be used.9 The present invention does not limit the organic phosphor material used.
また、無機正孔注入層材は5in−xC工に限定するも
のでなく、他にCuI、CuS、あるいはP型1v族、
m−v族あるいはI[−Vl族半導体薄膜による正孔伝
導性を示す無機半導体による薄膜層を使用できる。In addition, the inorganic hole injection layer material is not limited to 5in-xC, but may also include CuI, CuS, P type 1v group,
A thin film layer made of an inorganic semiconductor exhibiting hole conductivity due to an m-v group or I[-Vl group semiconductor thin film can be used.
電極は銀・マグネシウム合金の他、マグネシウム、イン
ジウム、アルミニウム、スズ、金、銀等が使用できた。In addition to silver-magnesium alloys, magnesium, indium, aluminum, tin, gold, and silver could be used for the electrodes.
ただし、金電極の場合にはEL発光が弱くなった。However, in the case of gold electrodes, EL emission became weaker.
以上説明したように、本発明の有機薄膜El−素子によ
れば次のような効果がある。すなわち、1)従来の有機
薄膜EL素子に比べ、輝度低下がほとんどなくなった。As explained above, the organic thin film El-element of the present invention has the following effects. That is, 1) There is almost no reduction in brightness compared to conventional organic thin film EL elements.
2)従来の有機薄1[IEL素子に比べ、周囲温度によ
る特性変化が少なくなった。2) Compared to conventional organic thin 1[IEL elements, characteristics change due to ambient temperature are reduced.
3)駆動電圧がより低くすることかできた。これは、低
電圧で有効に正孔を注入できるようになったためである
。例えばDC6Vでも実用レベルの輝度が得られた。3) The driving voltage could be lowered. This is because holes can now be effectively injected at low voltage. For example, a practical level of brightness was obtained even at DC6V.
このように本発明により有機薄膜EL素子を実用レベル
まで引き上げることかでき、その工業的価値は大きい。As described above, the present invention makes it possible to improve organic thin film EL devices to a practical level, and has great industrial value.
第1図は本発明の実施例に係る有機薄膜EL素子の断面
構造を示す図、第2図は本発明に用いた螢光性金属キノ
リンキレート錯体の化学式を示す図、第3図は従来の有
機薄膜EL素子の断面構造を示す図である。
1・・・ガラス基板 2・・・透明電極3 =
−P型S i + −x Cx薄膜層(正孔伝導性を示
す無機の半導体薄膜層)4・・・有機螢光体薄膜層
5・・・背面電極特許出願人 日本電気株式会社
代 理 人 弁理士 内 原
昔\、 /
第3図FIG. 1 is a diagram showing a cross-sectional structure of an organic thin film EL device according to an example of the present invention, FIG. 2 is a diagram showing a chemical formula of a fluorescent metal quinoline chelate complex used in the present invention, and FIG. 3 is a diagram showing a conventional 1 is a diagram showing a cross-sectional structure of an organic thin film EL element. 1... Glass substrate 2... Transparent electrode 3 =
-P type S i + -x Cx thin film layer (inorganic semiconductor thin film layer exhibiting hole conductivity) 4...organic phosphor thin film layer
5... Back electrode patent applicant NEC Corporation Representative Patent attorney Uchihara Muka\, / Figure 3
Claims (1)
機螢光体薄膜層と正孔伝導性を示す無機半導体薄膜層と
の積層構造を有することを特徴とする有機薄膜EL素子
。(1) An organic thin film EL device characterized by having a laminated structure of an organic phosphor thin film layer and an inorganic semiconductor thin film layer exhibiting hole conductivity between a pair of electrodes, at least one of which is transparent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14298688A JP2636341B2 (en) | 1988-06-09 | 1988-06-09 | Organic thin film EL device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14298688A JP2636341B2 (en) | 1988-06-09 | 1988-06-09 | Organic thin film EL device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01312873A true JPH01312873A (en) | 1989-12-18 |
| JP2636341B2 JP2636341B2 (en) | 1997-07-30 |
Family
ID=15328275
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14298688A Expired - Lifetime JP2636341B2 (en) | 1988-06-09 | 1988-06-09 | Organic thin film EL device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2636341B2 (en) |
Cited By (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5105233A (en) * | 1990-03-13 | 1992-04-14 | Kabushiki Kaisha Toshiba | Semiconductor luminescent device having organic/inorganic junction |
| EP0741419A3 (en) * | 1995-05-02 | 1997-09-03 | Motorola Inc | Passivation of organic devices |
| US6200695B1 (en) | 1998-06-26 | 2001-03-13 | Tdk Corporation | Organic electroluminescent device |
| US6222314B1 (en) | 1998-07-24 | 2001-04-24 | Tdk Corporation | Organic electoluminescent device with inorganic insulating hole injecting layer |
| US6338908B1 (en) | 1998-06-26 | 2002-01-15 | Tdk Corporation | Organic electroluminescent device |
| WO2007032175A1 (en) | 2005-09-12 | 2007-03-22 | Idemitsu Kosan Co., Ltd. | Conductive laminate and organic el device |
| US7387904B2 (en) | 2003-10-03 | 2008-06-17 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting element and manufacturing method thereof, and light emitting device using the light emitting element |
| WO2008075615A1 (en) * | 2006-12-21 | 2008-06-26 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting element and light-emitting device |
| US7732808B2 (en) | 2003-09-26 | 2010-06-08 | Semiconductor Energy Laboratory Co., Ltd | Light-emitting device and method for manufacturing the same |
| US7745989B2 (en) | 2005-06-30 | 2010-06-29 | Semiconductor Energy Laboratory Co., Ltd | Light emitting element, light emitting device, and electronic apparatus |
| US7790296B2 (en) | 2005-05-20 | 2010-09-07 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting element, light emitting device, and electronic device |
| US7851989B2 (en) | 2005-03-25 | 2010-12-14 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device |
| US7893427B2 (en) | 2004-07-23 | 2011-02-22 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting element and light emitting device using the same |
| US7990049B2 (en) | 2007-09-03 | 2011-08-02 | Canon Kabushiki Kaisha | Organic electroluminescent device and production method of the device, and display apparatus |
| US8334057B2 (en) | 2005-06-08 | 2012-12-18 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting element, light-emitting device, and electronic device |
| US8404500B2 (en) | 2009-11-02 | 2013-03-26 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing light-emitting element, light-emitting element, light-emitting device, lighting device, and electronic appliance |
| US8420227B2 (en) | 2005-03-23 | 2013-04-16 | Semiconductor Energy Laboratory Co., Ltd. | Composite material, light emitting element and light emitting device |
| US9224976B2 (en) | 2008-11-19 | 2015-12-29 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting element, light-emitting device, electronic device, and lighting device |
| US9564609B2 (en) | 2011-02-11 | 2017-02-07 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting element including electrode of three layers |
| US9570697B2 (en) | 2003-12-26 | 2017-02-14 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting element |
| US10134996B2 (en) | 2004-10-29 | 2018-11-20 | Semicondcutor Energy Laboratory Co., Ltd. | Composite material, light-emitting element, light-emitting device, and manufacturing method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6276576A (en) * | 1985-09-30 | 1987-04-08 | Toshiba Corp | Injection type light emitting device |
-
1988
- 1988-06-09 JP JP14298688A patent/JP2636341B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6276576A (en) * | 1985-09-30 | 1987-04-08 | Toshiba Corp | Injection type light emitting device |
Cited By (47)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5105233A (en) * | 1990-03-13 | 1992-04-14 | Kabushiki Kaisha Toshiba | Semiconductor luminescent device having organic/inorganic junction |
| EP0448268A3 (en) * | 1990-03-13 | 1992-12-02 | Kabushiki Kaisha Toshiba | Semiconductor luminescent device having organic/inorganic junction |
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