JPH0324547A - Pellicle for protecting mask - Google Patents

Abstract

PURPOSE:To simplify stages and to improve workability by providing hooks which engage freely insertably and removably into through-holes provided on a mask and a sealing material which comes into elastic contact with the mask at the time of engaging the hooks fixed over the entire periphery at the bottom end of a pellicle frame with the through-holes. CONSTITUTION:The hooks 14 of the pellicle frame 12 are pushed into the through-holes 19 of the mask 18. The hooks 14 having elasticity are bent inward by as much as pawls 15 projecting to the outer side. The hooks 14 restore the original shape and the pawls 15 are detained and locked to the under side of a glass plate 20 when the pawls 15 arrive completely at the rear surface of the glass plate 20. The sealing material 16 having the elasticity is pressed in this state by the pellicle frame 12 and the mask 18 and is thereby brought into tight contact with the mask 18. The sure protection of the pellicle against dust, etc., is, therefore, attained and the need for separately preparing fixtures is eliminated. The complication of stages is prevented and the workability is improved as well.

Description

DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention is a mask protection river cruiser for protecting a hole/mask used for pattern transfer from dust etc. in the manufacturing process of semiconductor devices such as ICs and LSIs. It is related to.

(Prior art) Conventionally, as a technology in this field, for example,
There was one described in Publication No. 3-23704. The configuration will be explained below using figures.

FIGS. 2(a) and 2(b) show the conventional mask protection pellicle described in the above-mentioned document, and FIG. 2(a) is a plan view thereof, and FIG. 2(b) is a plan view thereof. It is a sectional view taken along the line A-A of FIG.

In FIG. 2, a projection 2 is provided on each side of the lower outer surface of a quadrilateral pellicle frame 1. As shown in FIG. The protrusion 2 is for fixing the pellicle frame 1 to a mask 4, which will be described later, using a fixture 3. A groove-shaped recess 5 is provided at the lower end of the pellicle frame (2) over its entire circumference, and a sealing material 6 is buried in the recess 5. The sealing material 6 is set so that its bottom surface slightly protrudes from the lower surface of the pellicle frame 1. Furthermore, a translucent pellicle M7 is stretched over the upper end of the pellicle frame 1 with an adhesive or the like.

Attaching the pellicle configured in this way to the mask 4 is as follows:
It is done as follows.

First, a pellicle is placed on the mask 4 on which a transfer pattern is formed. Next, while holding the protrusion 2 of the pellicle frame l and the mask 4 with fingers, the fixture 3 is pushed into them from the side and fixed.

At this time, the elastic sealing material 6 is pressed by the fixture 3, and the space between the veliicle frame (2) and the mask 4 is sealed. Furthermore, when the pellicle is to be removed, it can be easily removed by sliding the fixture 3 in the lateral direction.

The second pellicle is for protecting the mask 4 used in the manufacture of semiconductor devices from dust and the like. That is, I
When a pattern is transferred onto a wafer using the mask 4 in the process of manufacturing C, etc., dust generated by the operator, the exposure device, the indoor environment, etc. may adhere to the transparent portion of the mask 4. Since the attached dust acts as a light shield, the pattern transferred to the wafer may be different from the desired one, causing short circuits or disconnections in the integrated circuit. Therefore, a pellicle is used to prevent dust and the like from adhering to the mask 4. Since the inside of the mask 4 is isolated from the outside world by wearing the mask 4, dust and the like can be prevented from adhering to the mask 4.

Problem to be Solved by the Invention B) However, in the mask protection belt with the above structure, there is a problem in that it takes time and effort to attach and detach the mask 4, and it has been difficult to solve this problem.

That is, once the pellicle is attached to the mask 4, if the pellicle membrane 7 is torn, if large dust or foreign matter adheres to the pellicle membrane 7 and cannot be removed, or if the pellicle is attached to the transparent part of the mask 4. If dust or the like is found, the pellicle must be removed from the mask 4. However, in the method for attaching and detaching the pellicle, the fixture 3
Due to the use of , there were the following problems.

(1> When attaching the pellicle to the mask 4, please separately
Fixture 3 must be prepared. Therefore, the number of parts increases and the manufacturing process becomes complicated.

(2) When attaching and detaching the pellicle from the mask 4, for example, four fixtures 3 must be attached or removed. Therefore, it takes effort and time to attach and detach, resulting in poor workability.

The present invention provides a mask protection pellicle that solves the problems of the prior art, such as the complexity of the manufacturing process due to the use of fixtures and the poor workability.

(Means for Solving the Problems) In order to solve the above problems, the present invention provides a pellicle frame having a frame shape and having a lower end attached to a mask for manufacturing semiconductor devices, and a pellicle frame for covering the mask. In a mask protection pellicle including a velicle membrane stretched over the upper end of the pellicle frame, the pellicle is provided at the lower end of the pellicle frame to protrude downward and is removably fitted into a through hole drilled in the mask. The present invention is provided with a matching hook, and a sealing material that is fixed to the entire circumference of the lower end of the helical frame and elastically contacts the mask when the hook is engaged with the through hole.

(Function) According to the present invention, since the mask protection pellicle is configured as described above, the hook provided on the pellicle frame has the function of pressing and fixing the pellicle to the mask by being pushed into the through hole and locked. do. Furthermore, the pellicle can be easily removed from the mask by releasing the hook. Further, the elastic sealing material is pressed between the mask and the pellicle frame to come into close contact with the mask, and serves to seal the mask inside the pellicle from the outside.

Due to these functions, without using conventional fixing devices,
The pellicle can be detachably fixed to the mask.

Therefore, the above problem can be solved.

(Example) Figures 1(a) and 1(b) show a mask protection pellicle according to the Yth embodiment of the present invention, in which figure (a) is a perspective view and figure 1(b) is a perspective view thereof. 3(a) is a sectional view taken along the line B-B in FIG. 3(a). FIGS.
is a perspective view thereof, and figure (b) is a sectional view taken along line CC in figure (a).

In FIG. 1 (a>, (b)), this veliicle 1l is
For example, it has a pellicle frame 12 in the shape of a quadrilateral frame. The pellicle frame 12 is made of aluminum, plastic, etc., and has a pellicle membrane 1 at its upper end.
3 is installed. The pellicle membrane 13 is a translucent thin film whose main component is nitrocellulose or the like.

At the lower end of the pellicle frame 12, two hooks 14 protruding outward and downward are provided at opposing positions, and a claw 15 is formed at the lower end of each hook l4. The hook 4 is made of a resilient material such as plastic, and is integrally molded with the pellicle frame 12 if the material of the pellicle frame 12 is plastic. Further, when the pellicle frame 12 is made of aluminum or the like, the hook 14 may be fixed to the pellicle frame 2 with an adhesive or the like.

Further, at the lower end of the pellicle frame 12, as shown in FIG.
), a sealing material 16 made of an elastic material such as rubber is provided along the entire circumference of the frame. This sealing material 16 is attached to the four parts 1 formed on the pellicle frame 12.
The pellicle frame 12 is provided within the pellicle frame 12, and is buried so that, for example, about one-third of the pellicle frame 12 protrudes from the lower end surface of the pellicle frame 12.

Here, the protrusion amount α of the sealing material 16 in a pressed state is, for example, about 0.05 mm, and the protrusion amount L of the hook l4 from the lower end surface of the pellicle frame 12 is given by the thickness of the mask described later, t. , L-t 10α.

For the pellicle 11 configured as described above, FIG.
a). As shown in (b), the mask 18 has a hook l4.
A through hole 19 corresponding to the shape is formed.

In FIGS. 3(a) and 3(b), the mask 18 is usually formed by forming a device pattern 21 and a frame pattern 22 made of a thin film of chromium or the like on a glass plate 20 or the like.

The device pattern 21 is transferred onto the wafer to define the shape of the IC circuit, and the frame pattern 22 is a backlit portion for defining the area of the device pattern 21 transferred onto the wafer.

A through hole 19 is formed on the outside of the frame pattern 22 or on the outside of the frame pattern 22 to correspond to the hook 14 of the pellicle frame 12. These through holes 19 pass through the glass plate 20 and are used to lock the hooks 14.

Next, the method of attaching the pellicle 1 to the mask 18 is shown in FIG. 4(a). This will be explained using (b). Figure 4(a), (
Figure b) shows a view of the pellicle installed, figure (a) is a perspective view thereof, and figure (b) is a sectional view taken along the line DD in figure (a).

First, insert the pellicle frame l2 into the through hole ■9 of the mask 18.
Push in the hook 14. At this time, the elastic hook 14 is bent inward by the amount of the claw 15 protruding outward. When the claw 15 completely reaches the bottom side of the glass plate 20, the hook 14 returns to its original shape, and the claw 15 touches the glass plate 20.
It is latched and locked on the bottom surface. In this state, the elastic sealing material 16 is pressed by the pellicle frame 12 and the mask 18 and comes into close contact with the mask l8.

As a result, the mask l8 inside the pellicle 11 is sealed,
Reliably protected from dust, etc.

Next, when removing the pellicle 1 from the mask 18, by pushing the claw 15 upward while pushing it inward, the claw 15 is unlocked and the pellicle 11 is easily removed.

As described above, in the pellicle 1■ of this embodiment, the hook 14 removably engages with the through hole ↓9 of the mask 18, making it possible to attach and detach the pellicle 1l to and from the mask 18 extremely easily. . Therefore, there is no need to separately prepare a fixture as in the past, and it is possible to prevent the manufacturing process of ICs and the like from becoming complicated, and also to improve workability.

FIG. 5 is a sectional view of a mask protecting pellicle showing a second embodiment of the present invention.

This solid color example differs from the first embodiment in that a hook 31 is provided vertically and continuously below the pellicle frame l2, and a presser member 32 and a sealing material 33 are provided that protrude inward from the lower end of the pellicle frame 12. This is because we have established the following. The outer surface of the claw 34 is shaped like a curved surface. The hook 31 and the pressing member 32 may have an integral structure with the pellicle frame 12, or may have an assembled structure. Also,
If a relatively hard material with elasticity is used for the sealing material 33, the pressing member 32 may not be provided.

Even with such a configuration, substantially the same functions and effects as in the first embodiment can be obtained, and the hook 31 and the sealing material 3
3 can be simplified.

Note that the present invention is not limited to the illustrated embodiment, and can be modified in various ways, such as the following modifications.

(i) In Figures 1 and 5, the frame 12 is
Although the shape of the pellicle frame is a quadrilateral frame shape, the present invention can also be applied to a pellicle frame having a circular frame shape or other shapes.

(ii) Although the hooks 14.31 are provided at two locations, they may be provided at more locations, for example, four locations. Further, the shape of the hook 14.31 may also be a shape other than that shown in FIGS. 2 and 5, for example, a hook having a circular cross section.

(iii> The claws 15.34 are attached to the pellicle frame 12.
It may be made to protrude inside, or its shape may be changed.

(1) The cross-sectional shape of the sealing material 16.33 is not limited to a circle or a quadrilateral, but various shapes such as a semicircle or a polygon can be used. Moreover, the fourth part 17 shown in FIG. 1 does not necessarily need to be provided.

(Effects of the Invention) As described in detail above, according to the present invention, the mask protective pellicle includes a hook that removably engages with the through hole of the mask, and a sealing material that elastically contacts the mask. Because of this provision, the pellicle can be attached to and removed from the mask extremely easily, and the inside of the pellicle can be reliably sealed.

Therefore, it is possible to simplify the manufacturing process of ICs and the like and improve workability.

[Brief explanation of drawings]

Figures (a) and (b) show a mask protection pellicle according to the first embodiment of the present invention, in which figure (a) is a perspective view and figure (b) is a B of figure (a). -B cross-sectional view, Figure 2 (a>, (b) shows a conventional mask protection pellicle,
Figure (a) is a plan view, figure (b) is a sectional view taken along line A-A in figure (a), and Figures 3 (a) and (b) are Figure 1 (a).
, (a) shows the mask corresponding to the pellicle in (b).
) is a perspective view thereof, FIG. 4(b) is a sectional view taken along line CC in FIG. 4(a), and FIGS. (a) is its perspective view and the same figure (
b) is a sectional view taken along the line DD in FIG. 5(a), and FIG. 5 is a sectional view of a mask protection flap showing a second embodiment of the present invention. ■1... Pellicle, 12... Pellicle frame, l3... Pellicle membrane, 14.31.
...Hook, 15,34...Claw, 16.
33... Seal material, 18... Mask,
19...Through hole.

Claims (1)

[Scope of Claims] A pellicle frame having a frame shape and having a lower end attached to a mask for manufacturing semiconductor devices, and a pellicle membrane stretched over the upper end of the pellicle frame to cover the mask. A mask protection pellicle comprising: a hook provided at the lower end of the pellicle frame to protrude downward and removably engages with a through hole drilled in the mask; A pellicle for protecting a mask, comprising: a sealing material that is fixed and elastically contacts the mask when the hook is engaged with the through hole.