JPH0354287A - Abrasive composition for lithium tantalate - Google Patents
Abrasive composition for lithium tantalateInfo
- Publication number
- JPH0354287A JPH0354287A JP19020489A JP19020489A JPH0354287A JP H0354287 A JPH0354287 A JP H0354287A JP 19020489 A JP19020489 A JP 19020489A JP 19020489 A JP19020489 A JP 19020489A JP H0354287 A JPH0354287 A JP H0354287A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- calcined alumina
- average diameter
- abrasive powder
- alumina abrasive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 title claims abstract description 12
- 239000000203 mixture Substances 0.000 title claims description 18
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 57
- 239000000843 powder Substances 0.000 claims abstract description 49
- 238000005498 polishing Methods 0.000 claims description 64
- 239000003082 abrasive agent Substances 0.000 claims description 3
- 239000002245 particle Substances 0.000 abstract description 9
- 238000000034 method Methods 0.000 abstract description 3
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 239000002270 dispersing agent Substances 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 abstract description 2
- 239000004094 surface-active agent Substances 0.000 abstract description 2
- 238000003786 synthesis reaction Methods 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 2
- 229910018626 Al(OH) Inorganic materials 0.000 abstract 1
- 238000005299 abrasion Methods 0.000 abstract 1
- 239000011163 secondary particle Substances 0.000 description 29
- 239000011164 primary particle Substances 0.000 description 27
- 230000000052 comparative effect Effects 0.000 description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 239000008119 colloidal silica Substances 0.000 description 8
- 238000001354 calcination Methods 0.000 description 5
- 239000007791 liquid phase Substances 0.000 description 3
- 238000007665 sagging Methods 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 208000003251 Pruritus Diseases 0.000 description 1
- 238000005267 amalgamation Methods 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 238000010897 surface acoustic wave method Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、弾性表面波素子や電気光学素子などとして、
現在広く用いられているタンタル酸リチウムを迅速かつ
高精度鏡面に研磨する研磨組成物に関する。[Detailed Description of the Invention] Industrial Application Field The present invention is applicable to surface acoustic wave devices, electro-optical devices, etc.
This invention relates to a polishing composition that quickly polishes lithium tantalate, which is currently widely used, to a mirror finish with high precision.
従来の技術
タンタル酸リチウムに対し従来使用されている研磨組成
物は、コロイダルシリカまたは、コロイダルシリ力を水
に一定濃度になるように溶解させたものである。この研
磨組或物を研磨面に供給しながら研磨パッドによりタン
タル酸リチウムを研磨している。Prior Art Polishing compositions conventionally used for lithium tantalate are colloidal silica or colloidal silica dissolved in water to a certain concentration. The lithium tantalate is polished by a polishing pad while supplying this polishing composition to the polishing surface.
発明が解決しようとする課題
しかし、前記の研磨組成物は次のような問題点を有して
いる。0)研磨速度が低い。(ロ)研磨面の周辺部分の
形状が崩れる、いわゆるフチダレが発生し易い。Q9コ
ロイダルシリ力は、乾燥すると固く凝結しシリカゲルに
なりスクラッチ発生の原因になる。Problems to be Solved by the Invention However, the above polishing composition has the following problems. 0) The polishing rate is low. (b) The shape of the peripheral portion of the polished surface is likely to collapse, so-called edge sag. When Q9 colloidal silica dries, it solidifies into silica gel and causes scratches.
本発明の目的は、上記の問題を改善すること、すなわち
研磨速度が大であり、フチダレが発生しに<<、スクラ
ッチが発生しないタンタル酸リチウム用研磨組成物を提
供することにある。An object of the present invention is to improve the above-mentioned problems, that is, to provide a polishing composition for lithium tantalate that has a high polishing rate, does not cause fringing, and does not cause scratches.
課題を解決するための手段
本発明は、上記の目的のためタンタル酸リチウム用の研
磨組或物に用いる研磨材として仮焼アルミナ粉末含有の
研磨材を用いることを特徴とする。Means for Solving the Problems The present invention is characterized in that, for the above-mentioned purpose, an abrasive containing calcined alumina powder is used as an abrasive for use in a polishing assembly for lithium tantalate.
仮焼アルミナ研磨材粉末は、バイヤー法や液相合成法で
調製したアルミナ粉末であり、従来タンタル酸リチウム
の研磨に使用されているコロイダルシリ力に比較して、
1〉硬度が高い。2)仮焼条件を適当に設定することに
よりα化率を調整することができ任意の硬度を有するア
ルミナ研磨材粉末を得ることができる。3)仮焼したア
ルミナ粉末は粉砕、分級を施すことにより任意の粒度分
布を有する研磨材を得ることができるなどの特長を有し
ている。このため、高い研磨速度が安定して得られ、フ
チダレの発生も低く抑えられる。また、仮焼アルミナ研
磨材粉末は乾燥してもゲル化することはなくスクラッチ
の発生原因となることもないので良好な表面が得られる
。Calcined alumina abrasive powder is alumina powder prepared by the Bayer method or liquid phase synthesis method, and compared to the colloidal silica force conventionally used for polishing lithium tantalate,
1> High hardness. 2) By appropriately setting the calcination conditions, the gelatinization rate can be adjusted and an alumina abrasive powder having a desired hardness can be obtained. 3) The calcined alumina powder has the advantage that it is possible to obtain an abrasive material having an arbitrary particle size distribution by pulverizing and classifying it. Therefore, a high polishing rate can be stably obtained, and the occurrence of edge sagging can be suppressed to a low level. Further, the calcined alumina abrasive powder does not gel even when dried and does not cause scratches, so a good surface can be obtained.
本発明に用いられる仮焼アルミナ研磨材粉末は、バイヤ
ー法や液相合或などにより調製されたAN (OR)
3.1! O (OH)などの化学式で表されるアル
ミの水酸化物を仮焼しα−アルミナ化して調製したもの
である。仮焼温度は1100〜l300℃程度であり、
仮焼の原料は、アルミナの水酸化物であれば良くとくに
組成、化学成分を問うものではない。また、この仮焼し
たアルミナに必要に応じて粉砕、分級を施すことにより
任意の粒度分布を有する仮焼アルミナ研磨材粉末を得る
ことができる。The calcined alumina abrasive powder used in the present invention is AN (OR) prepared by Bayer method, liquid phase synthesis, etc.
3.1! It is prepared by calcining aluminum hydroxide represented by a chemical formula such as O (OH) to form α-alumina. The calcination temperature is about 1100-1300℃,
The raw material for calcining may be alumina hydroxide without any particular composition or chemical composition. Further, by subjecting this calcined alumina to pulverization and classification as necessary, a calcined alumina abrasive powder having an arbitrary particle size distribution can be obtained.
本発明に用いられる仮焼アルミナ研磨材粉末の一次粒子
平均径については、平均粒径0.01〜4一が好ましい
。粒子径が小さくなるほど加工面粗さは小さくなり、好
ましいが研磨速度も小さくなる。The average particle size of the primary particles of the calcined alumina abrasive powder used in the present invention is preferably 0.01 to 41. As the particle size becomes smaller, the roughness of the machined surface becomes smaller, which is preferable, but the polishing rate also becomes smaller.
そこで、加工面粗さと研磨速度を考慮するとアルミナ一
次粒子のより好ましい平均粒径は0.05〜1一の範囲
である。Therefore, in consideration of machined surface roughness and polishing rate, a more preferable average particle diameter of the alumina primary particles is in the range of 0.05 to 11.
また、本発明に用いられるアルミナ粉末の二次粒子平均
径については、平均粒子径0、1〜tOWが好ましい。Moreover, the average particle diameter of the secondary particles of the alumina powder used in the present invention is preferably 0.1 to tOW.
加工面粗さと研磨速度を考慮するとアルミナ二次粒子の
より好ましい平均粒径はO,l〜4−の範囲である。In consideration of machined surface roughness and polishing rate, a more preferable average particle size of the alumina secondary particles is in the range of 0,1 to 4-4.
本発明の研磨組成物中の仮焼アルミナ研磨材粉末の含有
量は任意に選定できる。通常、アルミナ含有量が3〜4
0重量%になるように水性スラリー化した研磨組成物を
研磨表面に供給して研磨に使用する。研磨組成物中のア
ルミナ含有量は高いほど研磨速度が高く加工面粗さが小
さくなり有利であるが経済性を考慮すると15〜25重
量%のものがより好ましい。また、上記の含有量は研磨
面に供給する際の濃度であり、アルミナ含有率が高い濃
厚な研磨組成物を用意して、使用に当たって上記アルミ
ナ含有量の範囲内の所望の濃度に希釈することも可能で
ある。The content of the calcined alumina abrasive powder in the polishing composition of the present invention can be arbitrarily selected. Usually the alumina content is 3-4
A polishing composition made into an aqueous slurry so as to have a concentration of 0% by weight is supplied to the polishing surface and used for polishing. The higher the alumina content in the polishing composition, the higher the polishing rate and the lower the roughness of the machined surface, which is advantageous, but in consideration of economic efficiency, 15 to 25% by weight is more preferable. In addition, the above content is the concentration when supplied to the polishing surface, and it is necessary to prepare a concentrated polishing composition with a high alumina content and dilute it to the desired concentration within the above alumina content range before use. is also possible.
なお、本発明は研磨材として仮焼アルミナ研磨材粉末を
用いることを特徴とするものであるので、研磨組成物に
他の成分、例えば仮焼アルミナの分散性を良くする分散
剤や界面活性剤を添加することは、一向差し支えないの
で、本件発明はこれら他の戒分を添加するものも含むも
のである。In addition, since the present invention is characterized by using calcined alumina abrasive powder as the abrasive, the polishing composition may contain other components such as a dispersant and a surfactant that improve the dispersibility of calcined alumina. Since there is no problem in adding these other precepts, the present invention also includes the addition of these other precepts.
実施例
次に実施例により、本発明をさらに詳しく説明する。下
記実施例および比較例における研磨特性は次のような研
磨テストで評価した。研磨は片面ボリシングマシン(定
盤径620φmm)を使用し、定盤にはベロアタイプパ
ッド(昭和ポリッシングシステム■製 S P D
NcL3211)を貼り付け、220φmmガラス製研
磨プレートにワックスで72φ關タンタル酸リチウムウ
ェハ5枚を貼り付け20分間研磨した。研磨の間、研磨
組成物を一定流量流した。研磨後ウエハの厚さを測定し
、厚さの減少から研磨速度を求めた。また、研磨表面を
観察して表面状態とフチダレを評価した。EXAMPLES Next, the present invention will be explained in more detail with reference to Examples. The polishing properties in the Examples and Comparative Examples below were evaluated by the following polishing test. For polishing, a single-sided borising machine (surface plate diameter 620φmm) was used, and the surface plate was equipped with a velor type pad (manufactured by Showa Polishing System ■ S P D
NcL3211) was attached, and five 72φmm lithium tantalate wafers were attached to a 220φmm glass polishing plate with wax and polished for 20 minutes. During polishing, a constant flow of polishing composition was applied. After polishing, the thickness of the wafer was measured, and the polishing rate was determined from the decrease in thickness. In addition, the polished surface was observed to evaluate the surface condition and edge sag.
実施例 1
液相合戊で得られたアルミの水酸化物を仮焼してα化し
た一次粒子平均径0.1−、二次粒子平均径2μの仮焼
アルミナ研磨材粉末を20重量%含有する水性スラリー
を研磨組或物として用いた。Example 1 20% by weight of calcined alumina abrasive powder with a primary particle average diameter of 0.1-μ and a secondary particle average diameter of 2μ, which was obtained by calcining and gelatinizing aluminum hydroxide obtained by liquid phase amalgamation. The aqueous slurry contained therein was used as a polishing composition.
研磨条件は下定盤回転数: 12Orpm、加工圧力;
350g / cj、スラリー供給量30ml/膳1n
である。試験の結果を第1表の実施例1の欄に示す。The polishing conditions are lower surface plate rotation speed: 12 Orpm, processing pressure;
350g/cj, slurry supply amount 30ml/1n
It is. The test results are shown in the Example 1 column of Table 1.
比較例 1
実施例1で使用した仮焼アルミナ研磨材粉末の代わりに
従来からタンタル酸リチウムの研磨に使用されてきたコ
ロイダルシリカ(一次粒子平均径0,07μs)を用い
て研磨を実施した。仮焼アルミナ研磨材粉末をコロイダ
ルシリ力に変更した以外は、実施例1と同様の研磨条件
で試験を行い、その結果を第1表の比較例1の欄に示す
。Comparative Example 1 Instead of the calcined alumina abrasive powder used in Example 1, colloidal silica (average primary particle diameter 0.07 μs), which has been conventionally used for polishing lithium tantalate, was used for polishing. A test was conducted under the same polishing conditions as in Example 1, except that the calcined alumina abrasive powder was changed to colloidal silica powder, and the results are shown in the Comparative Example 1 column of Table 1.
実施例 2
実施例1で使用した一次粒子平均径0.1血、二次粒子
平均径2郎の仮焼アルミナ研磨材粉末の代わりに一次粒
子平均径0.01m、二次粒子平均径2一の仮焼アルミ
ナ研磨材粉末を用いて研磨を実施した。仮焼アルミナ研
磨材粉末の一次粒子平均径を0.ltsから0.Ol一
に変更した以外は、実施例1と同様の研磨条件で試験を
行い、その結果を第1表の実施例2の欄に示す。Example 2 Instead of the calcined alumina abrasive powder with a primary particle average diameter of 0.1m and a secondary particle average diameter of 2m used in Example 1, a primary particle average diameter of 0.01m and a secondary particle average diameter of 21m were used. Polishing was carried out using calcined alumina abrasive powder. The average primary particle diameter of the calcined alumina abrasive powder is 0. lts to 0. A test was conducted under the same polishing conditions as in Example 1, except that the polishing conditions were changed to 1, and the results are shown in the column of Example 2 in Table 1.
実施例 3
実施例1で使用した一次粒子平均径0,1−、二次粒子
平均径2−の仮焼アルミナ研磨材粉末の代わりに一次粒
子平均径4−、二次粒子平均径4usの仮焼アルミナ研
磨材粉末を用いて研磨を実施した。仮焼アルミナ研磨材
粉末の一次粒子平均径を0.1−から4−に、二次粒子
平均径を2−から4−に変更した以外は、実施例1と同
様の研磨条件で試験を行い、その結果を第1表の実施例
3の欄に示す。Example 3 Instead of the calcined alumina abrasive powder with a primary particle average diameter of 0.1- and a secondary particle average diameter of 2-, which was used in Example 1, a temporary one with a primary particle average diameter of 4- and a secondary particle average diameter of 4 us was used. Polishing was performed using calcined alumina abrasive powder. The test was conducted under the same polishing conditions as in Example 1, except that the primary particle average diameter of the calcined alumina abrasive powder was changed from 0.1- to 4-, and the secondary particle average diameter was changed from 2- to 4-. The results are shown in the Example 3 column of Table 1.
比較例 2
実施例〕で使用した一次粒子平均径0,1−、二次粒子
平均径2−の仮焼アルミナ研磨材粉末の代わりに一次粒
子平均径10m、二次粒子平均径10mの仮焼アルミナ
研磨材粉末を用いて研磨を実施した。仮焼アルミナ研磨
材粉末の一次粒子平均径を0.1一からlQmに、二次
粒子平均径を2−から10−に変更した以外は、実施例
1と同様の研磨条件で試験を行い、その結果を第1表の
比較例2の欄に示す。Comparative Example 2 Instead of the calcined alumina abrasive powder with a primary particle average diameter of 0.1- and a secondary particle average diameter of 2- used in Example], calcined powder with a primary particle average diameter of 10 m and a secondary particle average diameter of 10 m was used. Polishing was performed using alumina abrasive powder. The test was conducted under the same polishing conditions as in Example 1, except that the average primary particle diameter of the calcined alumina abrasive powder was changed from 0.1 to 1Qm, and the average secondary particle diameter was changed from 2 to 10. The results are shown in the Comparative Example 2 column of Table 1.
実施例 4
実施例1で使用した一次粒子平均径0.1−、二次粒子
平均径2−の仮焼アルミナ研磨材粉末の代わりに一次粒
子平均径0.01血、二次粒子平均径0.1−の仮焼ア
ルミナ研磨材粉末を用いて研磨を実施した。仮焼アルミ
ナ研磨材粉末の一次粒子平均径を0.l一から0.01
tmに、二次粒子平均径を2−から0,1−に変更した
以外は、実施例1と同様の研磨条件で試験を行い、その
結果を第1表の実施例4の欄に示す。Example 4 Instead of the calcined alumina abrasive powder with a primary particle average diameter of 0.1- and a secondary particle average diameter of 2- used in Example 1, a primary particle average diameter of 0.01 and a secondary particle average diameter of 0 were used. Polishing was carried out using a calcined alumina abrasive powder of .1-. The average primary particle diameter of the calcined alumina abrasive powder is 0. l1 to 0.01
tm, the test was conducted under the same polishing conditions as in Example 1, except that the average diameter of the secondary particles was changed from 2- to 0,1-, and the results are shown in the column of Example 4 in Table 1.
比較例 3
実施例4で使用した一次粒子平均径0.01m、二次粒
子平均径0,1−の仮焼アルミナ研磨材粉末の代わりに
一次粒子平均径0,Olμ、二次粒子平均径0,05−
の仮焼アルミナ研磨材粉末を用いて研磨を実施した。仮
焼アルミナ研磨材粉末の二次粒子平均径を0.1mから
0.05−に変更した以外は、実施例4と同様の研磨条
件で試験を行い、その結果を第1.表の比較例3の欄に
示す。Comparative Example 3 Instead of the calcined alumina abrasive powder with a primary particle average diameter of 0.01 m and a secondary particle average diameter of 0.1-, which was used in Example 4, a primary particle average diameter of 0, Olμ and a secondary particle average diameter of 0 were used. ,05-
Polishing was carried out using calcined alumina abrasive powder. A test was conducted under the same polishing conditions as in Example 4, except that the average secondary particle diameter of the calcined alumina abrasive powder was changed from 0.1 m to 0.05 m, and the results were summarized in Example 1. It is shown in the column of Comparative Example 3 in the table.
実施例 5
実施例1で使用した一次粒子平均径0 . 1 m ,
二次粒子平均径2−の仮焼アルミナ研磨材粉末の代わり
に−・次粒子平均径4−、二次粒子平均径lowの仮焼
アルミナ研磨材粉末を用いて研磨を実施した。仮焼アル
ミナ研磨材粉末の一次粒子平均径を0.1−から4−に
、二次粒子平均径を2囲から10−に変更した以外は、
実施例1と同様の研磨条件で試験を行い、その結果を第
1表の実施例5の欄に示す。Example 5 The average diameter of the primary particles used in Example 1 was 0. 1 m,
Polishing was carried out using a calcined alumina abrasive powder with a secondary particle average diameter of 4- and a secondary particle average diameter low instead of a calcined alumina abrasive powder with a secondary particle average diameter of 2-. Except that the average primary particle diameter of the calcined alumina abrasive powder was changed from 0.1- to 4-, and the average secondary particle diameter was changed from 2- to 10-.
A test was conducted under the same polishing conditions as in Example 1, and the results are shown in the column of Example 5 in Table 1.
比較例 4
実施例5で使用した一次粒子平均径4郎、二次粒子平均
径lO−の仮焼アルミナ研磨材粉末の代わりに一次粒子
平均径4−、二次粒子平均径201B@の仮焼アルミナ
研磨材粉末を用いて研磨を実施した。Comparative Example 4 Instead of the calcined alumina abrasive powder with a primary particle average diameter of 4- and a secondary particle average diameter of 1O- used in Example 5, calcined with a primary particle average diameter of 4- and a secondary particle average diameter of 201B@ Polishing was performed using alumina abrasive powder.
仮焼アルミナ研磨材粉末の二次粒子平均径をJ.Omか
ら20mに変更した以外は、実施例5と同様の研磨条件
で試験を行い、その結果を第1表の比較例4の欄に示す
。The average secondary particle diameter of the calcined alumina abrasive powder was determined by J. A test was conducted under the same polishing conditions as in Example 5, except that the polishing distance was changed from Om to 20 m, and the results are shown in the Comparative Example 4 column of Table 1.
(以下余白)
第1表の実施例1、比較例1は、仮焼アルミナ研磨材粉
末とコロイダルシリ力をそれぞれ研磨材に使用して研磨
した結果である。仮焼アルミナ研磨材粉末を使用して研
磨した場合は、コロイダルシリカを研磨材に使用した場
合に比べて除去速度が高く、表面状態が良好でフチダレ
が発生しにくいことが認められた。(The following is a blank space) Example 1 and Comparative Example 1 in Table 1 are the results of polishing using calcined alumina abrasive powder and colloidal silica as abrasives, respectively. It was found that when calcined alumina abrasive powder was used for polishing, the removal rate was higher, the surface condition was better, and fringing was less likely to occur than when colloidal silica was used as the abrasive.
次に仮焼アルミナ研磨材粉末の一次粒子平均径と研磨性
能について比較する。第1表の実施例1、実施例2、実
施例3、比較例2は、0.OluNから10一の一次粒
子平均径を有する仮焼アルミナ研磨材粉末を用いて研磨
した結果である。この結果、一次粒子平均径が0.01
mから4−の範囲にある実施か11、実施例2、実施例
3の場合には、表面状態が良好でフチダレが発生しにく
いことが認められた。また、一次粒子平均径がLOmで
ある比較例2の場合には、スクラッチが発生した。Next, the average primary particle diameter and polishing performance of the calcined alumina abrasive powders will be compared. Example 1, Example 2, Example 3, and Comparative Example 2 in Table 1 are 0. These are the results of polishing using calcined alumina abrasive powder from OluN having an average primary particle diameter of 101. As a result, the primary particle average diameter was 0.01
In the cases of Example 11, Example 2, and Example 3 in which m was in the range of 4-, it was observed that the surface condition was good and sagging was less likely to occur. Furthermore, in the case of Comparative Example 2 in which the average primary particle diameter was LOm, scratches occurred.
次に仮焼アルミナ研磨材粉末の二次粒子平均径と研磨性
能について比較する。第1表の実施例1、実施例2、実
施例3、実施例4、実施例5、比較例3、比較例4は、
一次粒子平均径が0,旧坤から4−の範囲にあり、かつ
また0.1−から20一の二次粒子平均径を有する仮焼
アルミナ研磨材粉末を用いて研磨した結果である。この
結果、二次粒子平均径が0.1−からlO−の範囲にあ
る実施例1、実施例2、実施例3、実施例4、実施例5
の場合には、表面状態が良好でフチダレが発生しにくい
ことが認められた。また、二次粒子平均径が20一であ
る比較例4の場合には、スクラッチが発生し梨地状の表
面になった。また、二次粒子平均径が0.05ttmで
ある比較例3の場合には、表面状態が良好でフチダレが
発生しにくいことが認められたが、除去速度が低く実用
的でない。しかし、除去速度を必要とせず研磨面の表面
状態を重視する研磨の場合には有効である。Next, the average secondary particle diameter and polishing performance of the calcined alumina abrasive powders will be compared. Example 1, Example 2, Example 3, Example 4, Example 5, Comparative Example 3, and Comparative Example 4 in Table 1 are as follows:
This is the result of polishing using a calcined alumina abrasive powder having an average primary particle diameter in the range of 0 to 4, and a secondary particle average diameter of 0.1 to 20. As a result, Examples 1, 2, 3, 4, and 5 have secondary particle average diameters in the range of 0.1- to 1O-.
In the case of , it was observed that the surface condition was good and sagging was less likely to occur. In addition, in the case of Comparative Example 4 in which the average diameter of the secondary particles was 20-1, scratches occurred and the surface became satin-like. In addition, in the case of Comparative Example 3 in which the average secondary particle diameter was 0.05 ttm, it was observed that the surface condition was good and fringing was less likely to occur, but the removal rate was low and it was not practical. However, it is effective in polishing where the removal rate is not required and the surface condition of the polished surface is important.
発明の効果
本発明による仮焼アルミナ研磨材粉末を用いることを特
徴とするタンタル酸リチウム用研磨組成物は、従来の研
磨組成物に比べ
イ)研磨速度が大である
ロ)フチダレが発生しにくい
ハ)乾燥してもゲル化することがなく
チが発生しない
等の多くの効果がある。Effects of the Invention Compared to conventional polishing compositions, the polishing composition for lithium tantalate characterized by using the calcined alumina abrasive powder according to the present invention has the following characteristics: (1) It has a high polishing rate, and (2) It is difficult to cause fringing. c) It has many effects such as not gelling even when dried and not causing any itch.
スクラッScratch
Claims (1)
るタンタル酸リチウム用研磨組成物。A polishing composition for lithium tantalate characterized by using an abrasive material containing calcined alumina powder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19020489A JPH0354287A (en) | 1989-07-21 | 1989-07-21 | Abrasive composition for lithium tantalate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19020489A JPH0354287A (en) | 1989-07-21 | 1989-07-21 | Abrasive composition for lithium tantalate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0354287A true JPH0354287A (en) | 1991-03-08 |
Family
ID=16254194
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19020489A Pending JPH0354287A (en) | 1989-07-21 | 1989-07-21 | Abrasive composition for lithium tantalate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0354287A (en) |
-
1989
- 1989-07-21 JP JP19020489A patent/JPH0354287A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100429940B1 (en) | Improved ceria powder | |
| US6117220A (en) | Polishing composition and rinsing composition | |
| KR101488987B1 (en) | Polishing method of hard crystal substrate and oil-based polishing slurry | |
| US6007592A (en) | Polishing composition for aluminum disk and polishing process therewith | |
| US5114437A (en) | Polishing composition for metallic material | |
| JPH10152673A (en) | Cerium oxide abrasive and method for polishing substrate | |
| JP2000336344A (en) | Abrasive | |
| IE990498A1 (en) | Polishing composition | |
| JP2003082333A (en) | Cerium-based polishing material slurry and method for manufacturing the same | |
| US20020129559A1 (en) | Polishing particle and method for producing polishing particle | |
| JPH11268911A (en) | Alumina powder, its production, and composition for polishing | |
| JP2002329688A (en) | Polishing suspension containing moisture holding agent | |
| JP2000188270A (en) | Cerium oxide abrasive and method of grinding substrate | |
| JPH0354287A (en) | Abrasive composition for lithium tantalate | |
| JPH03277683A (en) | Precision polishing composition | |
| JP2001093866A (en) | Oxide single-crystal wafer processing/polishing composition and method of polishing the oxide single- crystal wafer | |
| JP2020029472A (en) | Slurry composition for polishing polycrystalline YAG | |
| JP2850254B2 (en) | Abrasive composition | |
| JP3160820B2 (en) | Abrasive composition | |
| US7578862B2 (en) | Abrasive compound for glass hard disk platter | |
| JPH01205973A (en) | Abradant composition | |
| JP2725192B2 (en) | Abrasive composition | |
| JP4099615B2 (en) | Polishing composition | |
| JP4114018B2 (en) | Polishing composition for aluminum disk and polishing method using the polishing composition | |
| CN115651544B (en) | Mixed abrasive polishing fluid and preparation method thereof |