JPH0364754A - Photosensitive resin composition and hardened material - Google Patents
Photosensitive resin composition and hardened materialInfo
- Publication number
- JPH0364754A JPH0364754A JP19947089A JP19947089A JPH0364754A JP H0364754 A JPH0364754 A JP H0364754A JP 19947089 A JP19947089 A JP 19947089A JP 19947089 A JP19947089 A JP 19947089A JP H0364754 A JPH0364754 A JP H0364754A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- groups
- parts
- polymer
- azido
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 12
- 239000000463 material Substances 0.000 title description 4
- -1 azido compound Chemical class 0.000 claims abstract description 48
- 150000001875 compounds Chemical class 0.000 claims abstract description 23
- 229920000642 polymer Polymers 0.000 claims abstract description 22
- 125000000129 anionic group Chemical group 0.000 claims abstract description 7
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims abstract description 6
- 239000000975 dye Substances 0.000 claims description 21
- 150000001540 azides Chemical class 0.000 claims description 7
- 238000000034 method Methods 0.000 abstract description 15
- 238000004132 cross linking Methods 0.000 abstract description 2
- LVTJOONKWUXEFR-FZRMHRINSA-N protoneodioscin Natural products O(C[C@@H](CC[C@]1(O)[C@H](C)[C@@H]2[C@]3(C)[C@H]([C@H]4[C@@H]([C@]5(C)C(=CC4)C[C@@H](O[C@@H]4[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@@H](O)[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@H](CO)O4)CC5)CC3)C[C@@H]2O1)C)[C@H]1[C@H](O)[C@H](O)[C@H](O)[C@@H](CO)O1 LVTJOONKWUXEFR-FZRMHRINSA-N 0.000 abstract 3
- 125000000852 azido group Chemical group *N=[N+]=[N-] 0.000 abstract 2
- 239000011521 glass Substances 0.000 description 25
- 239000000178 monomer Substances 0.000 description 17
- 238000004043 dyeing Methods 0.000 description 16
- 229920005989 resin Polymers 0.000 description 14
- 239000011347 resin Substances 0.000 description 14
- 239000007788 liquid Substances 0.000 description 11
- 239000000243 solution Substances 0.000 description 10
- 238000001035 drying Methods 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 5
- 108010010803 Gelatin Proteins 0.000 description 5
- 238000011161 development Methods 0.000 description 5
- 229920000159 gelatin Polymers 0.000 description 5
- 239000008273 gelatin Substances 0.000 description 5
- 235000019322 gelatine Nutrition 0.000 description 5
- 235000011852 gelatine desserts Nutrition 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- VGVHNLRUAMRIEW-UHFFFAOYSA-N 4-methylcyclohexan-1-one Chemical compound CC1CCC(=O)CC1 VGVHNLRUAMRIEW-UHFFFAOYSA-N 0.000 description 4
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 4
- 239000005018 casein Substances 0.000 description 4
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 4
- 235000021240 caseins Nutrition 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- RCJVRSBWZCNNQT-UHFFFAOYSA-N dichloridooxygen Chemical compound ClOCl RCJVRSBWZCNNQT-UHFFFAOYSA-N 0.000 description 4
- 230000002209 hydrophobic effect Effects 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 3
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 125000004386 diacrylate group Chemical group 0.000 description 3
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 3
- PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical group C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 3
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 2
- TUSDEZXZIZRFGC-UHFFFAOYSA-N 1-O-galloyl-3,6-(R)-HHDP-beta-D-glucose Natural products OC1C(O2)COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC1C(O)C2OC(=O)C1=CC(O)=C(O)C(O)=C1 TUSDEZXZIZRFGC-UHFFFAOYSA-N 0.000 description 2
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- XOJWAAUYNWGQAU-UHFFFAOYSA-N 4-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCOC(=O)C(C)=C XOJWAAUYNWGQAU-UHFFFAOYSA-N 0.000 description 2
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 239000001263 FEMA 3042 Substances 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 2
- LRBQNJMCXXYXIU-PPKXGCFTSA-N Penta-digallate-beta-D-glucose Natural products OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-PPKXGCFTSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229930016911 cinnamic acid Natural products 0.000 description 2
- 235000013985 cinnamic acid Nutrition 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 2
- DYUWTXWIYMHBQS-UHFFFAOYSA-N n-prop-2-enylprop-2-en-1-amine Chemical compound C=CCNCC=C DYUWTXWIYMHBQS-UHFFFAOYSA-N 0.000 description 2
- 229930014626 natural product Natural products 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 2
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229920001059 synthetic polymer Polymers 0.000 description 2
- 229920002258 tannic acid Polymers 0.000 description 2
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 2
- 229940033123 tannic acid Drugs 0.000 description 2
- 235000015523 tannic acid Nutrition 0.000 description 2
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- WOGITNXCNOTRLK-VOTSOKGWSA-N (e)-3-phenylprop-2-enoyl chloride Chemical compound ClC(=O)\C=C\C1=CC=CC=C1 WOGITNXCNOTRLK-VOTSOKGWSA-N 0.000 description 1
- RJUIDDKTATZJFE-NSCUHMNNSA-N (e)-but-2-enoyl chloride Chemical compound C\C=C\C(Cl)=O RJUIDDKTATZJFE-NSCUHMNNSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- OQZQDGSYKKFLTE-UHFFFAOYSA-N 1-(4-azidophenyl)-3-phenylprop-2-en-1-one Chemical compound C1=CC(N=[N+]=[N-])=CC=C1C(=O)C=CC1=CC=CC=C1 OQZQDGSYKKFLTE-UHFFFAOYSA-N 0.000 description 1
- HMDQPBSDHHTRNI-UHFFFAOYSA-N 1-(chloromethyl)-3-ethenylbenzene Chemical compound ClCC1=CC=CC(C=C)=C1 HMDQPBSDHHTRNI-UHFFFAOYSA-N 0.000 description 1
- YTKRILODNOEEPX-UHFFFAOYSA-N 1-chlorobut-2-ene Chemical compound CC=CCCl YTKRILODNOEEPX-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- JJBFVQSGPLGDNX-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)COC(=O)C(C)=C JJBFVQSGPLGDNX-UHFFFAOYSA-N 0.000 description 1
- UDWYGWMSVGVBCG-UHFFFAOYSA-N 2-(dimethylamino)prop-2-enoic acid Chemical compound CN(C)C(=C)C(O)=O UDWYGWMSVGVBCG-UHFFFAOYSA-N 0.000 description 1
- DMILUQNOFKRNFZ-UHFFFAOYSA-N 2-(methylamino)prop-2-enamide Chemical compound CNC(=C)C(N)=O DMILUQNOFKRNFZ-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- IAWIJHCUEPVIOO-UHFFFAOYSA-N 2-imidazol-1-yl-1-[4-(2-phenylethyl)phenyl]ethanol Chemical compound C=1C=C(CCC=2C=CC=CC=2)C=CC=1C(O)CN1C=CN=C1 IAWIJHCUEPVIOO-UHFFFAOYSA-N 0.000 description 1
- YICILWNDMQTUIY-UHFFFAOYSA-N 2-methylidenepentanamide Chemical compound CCCC(=C)C(N)=O YICILWNDMQTUIY-UHFFFAOYSA-N 0.000 description 1
- IMRILMSKMWAKCC-UHFFFAOYSA-N 3-(furan-2-yl)prop-2-enoyl chloride Chemical compound ClC(=O)C=CC1=CC=CO1 IMRILMSKMWAKCC-UHFFFAOYSA-N 0.000 description 1
- OHXAOPZTJOUYKM-UHFFFAOYSA-N 3-Chloro-2-methylpropene Chemical compound CC(=C)CCl OHXAOPZTJOUYKM-UHFFFAOYSA-N 0.000 description 1
- MCSXGCZMEPXKIW-UHFFFAOYSA-N 3-hydroxy-4-[(4-methyl-2-nitrophenyl)diazenyl]-N-(3-nitrophenyl)naphthalene-2-carboxamide Chemical compound Cc1ccc(N=Nc2c(O)c(cc3ccccc23)C(=O)Nc2cccc(c2)[N+]([O-])=O)c(c1)[N+]([O-])=O MCSXGCZMEPXKIW-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- DMAYBPBPEUFIHJ-UHFFFAOYSA-N 4-bromobut-1-ene Chemical compound BrCCC=C DMAYBPBPEUFIHJ-UHFFFAOYSA-N 0.000 description 1
- KFDVPJUYSDEJTH-UHFFFAOYSA-N 4-ethenylpyridine Chemical compound C=CC1=CC=NC=C1 KFDVPJUYSDEJTH-UHFFFAOYSA-N 0.000 description 1
- SBVKVAIECGDBTC-UHFFFAOYSA-N 4-hydroxy-2-methylidenebutanamide Chemical compound NC(=O)C(=C)CCO SBVKVAIECGDBTC-UHFFFAOYSA-N 0.000 description 1
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 description 1
- XZQWWHBLXRBQKI-UHFFFAOYSA-N 5-(dimethylamino)-2-methylidenepentanoic acid Chemical compound CN(C)CCCC(=C)C(O)=O XZQWWHBLXRBQKI-UHFFFAOYSA-N 0.000 description 1
- RNMDNPCBIKJCQP-UHFFFAOYSA-N 5-nonyl-7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-ol Chemical compound C(CCCCCCCC)C1=C2C(=C(C=C1)O)O2 RNMDNPCBIKJCQP-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- KYARBIJYVGJZLB-UHFFFAOYSA-N 7-amino-4-hydroxy-2-naphthalenesulfonic acid Chemical compound OC1=CC(S(O)(=O)=O)=CC2=CC(N)=CC=C21 KYARBIJYVGJZLB-UHFFFAOYSA-N 0.000 description 1
- GGZZISOUXJHYOY-UHFFFAOYSA-N 8-amino-4-hydroxynaphthalene-2-sulfonic acid Chemical compound C1=C(S(O)(=O)=O)C=C2C(N)=CC=CC2=C1O GGZZISOUXJHYOY-UHFFFAOYSA-N 0.000 description 1
- JRLTTZUODKEYDH-UHFFFAOYSA-N 8-methylquinoline Chemical group C1=CN=C2C(C)=CC=CC2=C1 JRLTTZUODKEYDH-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 241000526960 Amaranthus acanthochiton Species 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- DQFBYFPFKXHELB-UHFFFAOYSA-N Chalcone Natural products C=1C=CC=CC=1C(=O)C=CC1=CC=CC=C1 DQFBYFPFKXHELB-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- CQHKDHVZYZUZMJ-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-prop-2-enoyloxypropyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(CO)COC(=O)C=C CQHKDHVZYZUZMJ-UHFFFAOYSA-N 0.000 description 1
- ULQMPOIOSDXIGC-UHFFFAOYSA-N [2,2-dimethyl-3-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(C)(C)COC(=O)C(C)=C ULQMPOIOSDXIGC-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- LOPVAWVHGAWUPS-UHFFFAOYSA-M [2-hydroxy-3-(2-methylprop-2-enoyloxy)propyl]-trimethylazanium;chloride Chemical compound [Cl-].CC(=C)C(=O)OCC(O)C[N+](C)(C)C LOPVAWVHGAWUPS-UHFFFAOYSA-M 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- NYIYSWXWCJHVLR-UHFFFAOYSA-N [4-(2-phenylethenyl)phenyl] prop-2-enoate Chemical compound C1=CC(OC(=O)C=C)=CC=C1C=CC1=CC=CC=C1 NYIYSWXWCJHVLR-UHFFFAOYSA-N 0.000 description 1
- FHLPGTXWCFQMIU-UHFFFAOYSA-N [4-[2-(4-prop-2-enoyloxyphenyl)propan-2-yl]phenyl] prop-2-enoate Chemical compound C=1C=C(OC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OC(=O)C=C)C=C1 FHLPGTXWCFQMIU-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- BHELZAPQIKSEDF-UHFFFAOYSA-N allyl bromide Chemical compound BrCC=C BHELZAPQIKSEDF-UHFFFAOYSA-N 0.000 description 1
- 230000009435 amidation Effects 0.000 description 1
- 238000007112 amidation reaction Methods 0.000 description 1
- JOSWYUNQBRPBDN-UHFFFAOYSA-P ammonium dichromate Chemical compound [NH4+].[NH4+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O JOSWYUNQBRPBDN-UHFFFAOYSA-P 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 description 1
- JYLMUNQVGJUCNX-UHFFFAOYSA-N butane-1,4-diol prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCCCCO JYLMUNQVGJUCNX-UHFFFAOYSA-N 0.000 description 1
- 235000005513 chalcones Nutrition 0.000 description 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- OWMBTIRJFMGPAC-UHFFFAOYSA-N dimethylamino 2-methylprop-2-enoate Chemical compound CN(C)OC(=O)C(C)=C OWMBTIRJFMGPAC-UHFFFAOYSA-N 0.000 description 1
- 239000000982 direct dye Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- KBEBGUQPQBELIU-UHFFFAOYSA-N ethyl 3-phenylprop-2-enoate Chemical compound CCOC(=O)C=CC1=CC=CC=C1 KBEBGUQPQBELIU-UHFFFAOYSA-N 0.000 description 1
- JZMPIUODFXBXSC-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.CCOC(N)=O JZMPIUODFXBXSC-UHFFFAOYSA-N 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- MQWCXKGKQLNYQG-UHFFFAOYSA-N methyl cyclohexan-4-ol Natural products CC1CCC(O)CC1 MQWCXKGKQLNYQG-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- MVVMETRGWFSULN-UHFFFAOYSA-N n',n',2-trimethyl-n-propylprop-2-enehydrazide Chemical compound CCCN(N(C)C)C(=O)C(C)=C MVVMETRGWFSULN-UHFFFAOYSA-N 0.000 description 1
- IQCDTWQIGNEYMY-UHFFFAOYSA-N n',n'-dimethylprop-2-enehydrazide Chemical compound CN(C)NC(=O)C=C IQCDTWQIGNEYMY-UHFFFAOYSA-N 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- BSCJIBOZTKGXQP-UHFFFAOYSA-N n-(2-hydroxyethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCCO BSCJIBOZTKGXQP-UHFFFAOYSA-N 0.000 description 1
- CNPHCSFIDKZQAK-UHFFFAOYSA-N n-prop-2-enylprop-2-enamide Chemical compound C=CCNC(=O)C=C CNPHCSFIDKZQAK-UHFFFAOYSA-N 0.000 description 1
- 229920005615 natural polymer Polymers 0.000 description 1
- YCWSUKQGVSGXJO-NTUHNPAUSA-N nifuroxazide Chemical group C1=CC(O)=CC=C1C(=O)N\N=C\C1=CC=C([N+]([O-])=O)O1 YCWSUKQGVSGXJO-NTUHNPAUSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920005650 polypropylene glycol diacrylate Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- VMBJJCDVORDOCF-UHFFFAOYSA-N prop-2-enyl 2-chloroacetate Chemical compound ClCC(=O)OCC=C VMBJJCDVORDOCF-UHFFFAOYSA-N 0.000 description 1
- QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 235000018102 proteins Nutrition 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 238000005956 quaternization reaction Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- AFWAHDXCIBPFNW-UHFFFAOYSA-J sodium;antimony(3+);2,3-dihydroxybutanedioate Chemical compound [Na+].[Sb+3].[O-]C(=O)C(O)C(O)C([O-])=O.[O-]C(=O)C(O)C(O)C([O-])=O AFWAHDXCIBPFNW-UHFFFAOYSA-J 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229920001864 tannin Polymers 0.000 description 1
- 235000018553 tannin Nutrition 0.000 description 1
- 239000001648 tannin Substances 0.000 description 1
- DQFBYFPFKXHELB-VAWYXSNFSA-N trans-chalcone Chemical compound C=1C=CC=CC=1C(=O)\C=C\C1=CC=CC=C1 DQFBYFPFKXHELB-VAWYXSNFSA-N 0.000 description 1
- RRHXZLALVWBDKH-UHFFFAOYSA-M trimethyl-[2-(2-methylprop-2-enoyloxy)ethyl]azanium;chloride Chemical compound [Cl-].CC(=C)C(=O)OCC[N+](C)(C)C RRHXZLALVWBDKH-UHFFFAOYSA-M 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明はガラス、固体撮像素子等の基材をアニオン性染
料により任意な色調に容易に染色する為の感光性樹脂組
成物及びその硬化物に関するものである。Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a photosensitive resin composition and a cured product thereof for easily dyeing substrates such as glass and solid-state imaging devices into arbitrary colors with anionic dyes. It is related to.
近年ガラス等の基材を着色し名種デスプレー等に使用さ
れつつあるや特にガラス等の基材を着色し色分解用フィ
ルターとして液晶のカラーテレビジランに応用したり、
カラーテレビジョン用カメラのカラー化の為に固体撮像
素子の染色に益々需要が増大しつつある。本発明はかか
る需要を満たす為になされたガラス等の基材の染色の為
の感光性樹脂組成物及びその硬化物に関するものである
。In recent years, base materials such as glass have been colored and used in famous displays, and in particular, base materials such as glass have been colored and used as color separation filters for LCD color TV sets.
Demand for dyeing solid-state image sensors is increasing as colorization of color television cameras increases. The present invention relates to a photosensitive resin composition for dyeing substrates such as glass, and a cured product thereof, which has been made to meet such demands.
(従来の技術)
従来この分野に於いては主としてカゼイン、ゼラチン等
蛋白質系天然高分子物質が用いられているが、これらの
用いられ方はカゼイン、ゼラチン等を温水で溶解した液
に光硬化剤として重クロム酸カリウム又はアンモニウム
を添加してこれをガラス板にスピンコード法で塗布し、
次にマスクを介して活性光線を照射してガラス板上に可
染性層の潜像を形成させ、次に現像により可染性層を顕
在化させる。次にこれを染料により染色する等天然高分
子物質が用いられている。又最近に至り、合成高分子を
用いたものも実用に供されつつある。(Prior art) Conventionally, in this field, protein-based natural polymer substances such as casein and gelatin have been mainly used. Add potassium dichromate or ammonium as
Next, actinic light is irradiated through a mask to form a latent image of the dyeable layer on the glass plate, and then the dyeable layer is exposed by development. Next, a natural polymeric substance is used, such as dyeing this with a dye. Recently, products using synthetic polymers have also been put into practical use.
(発明が解決しようとする課題)
このカゼイン、ゼラチン等を用いる場合、これらが天然
物である為に腐敗し易いとか、品質が一定せず原料ソー
スによるバラツキが大きく色の再現性が極めて劣るとか
、熱水中で剥離し易く、又熱による物性劣化が大きく、
加工条件が制約される等の欠点かある。更に染色時の染
浴温度が制約される為濃色が得難い等の染色上の問題が
ある。(Problems to be Solved by the Invention) When using casein, gelatin, etc., it is easy to spoil because they are natural products, and the quality is not consistent and varies depending on the raw material source, resulting in extremely poor color reproducibility. , easy to peel off in hot water, and physical properties deteriorate significantly due to heat.
There are drawbacks such as limited processing conditions. Furthermore, there are dyeing problems such as difficulty in obtaining deep colors because the temperature of the dye bath during dyeing is restricted.
更に、これらカゼイン、ゼラチン等を使用する場合、光
硬化剤として重クロム酸アンモニウム又は重クロム酸カ
リウム等を用いるから、これらの作業工程及び廃棄の際
に公害の問題等を解決しなければならなく、更にゼラチ
ンに取り込まれたクロムが完全に除去できず、残存した
クロムが悪影響を与える等の問題もある。Furthermore, when using casein, gelatin, etc., ammonium dichromate or potassium dichromate is used as a photocuring agent, so problems of pollution must be solved during the working process and during disposal. Furthermore, there is a problem that chromium incorporated into gelatin cannot be completely removed, and the remaining chromium may have an adverse effect.
本発明者等はこれらの問題を解決すべく合成高分子の検
討を行った。その結果特願昭61−114681 。The present inventors investigated synthetic polymers in order to solve these problems. As a result, patent application No. 114681/1983 was filed.
特願昭63−88993の方法を発明し、実用に供しつ
つある。The method of patent application No. 63-88993 was invented and is now being put into practical use.
しかし最近に至り高解像度の品質、工程のスピードアッ
プ、省エネルギー等の要求の為に、感光性樹脂組成物の
硬化に用いる光量の一層の減少を求められていた。一般
に感光性樹脂組成物に対する光量が不足すると膜が弱く
染色時に膜荒れ現象を起し、染色膜は不透明となる。又
染色性も悪く、解倣性も劣る。更に又、画像の寸法安定
性も悪い等の問題がある。かかる要求を満たす為に感光
性樹脂M酸物中のアジド化合物の光反応速度を早める為
に従来公知の種々の方法を検討したが満足の得られるも
のはなかった。However, in recent years, there has been a demand for a further reduction in the amount of light used for curing photosensitive resin compositions due to demands for high-resolution quality, speeding up of processes, energy saving, etc. Generally, when the amount of light applied to a photosensitive resin composition is insufficient, the film becomes weak and roughness occurs during dyeing, and the dyed film becomes opaque. In addition, the dyeing properties are poor and the dispersion properties are also poor. Furthermore, there are other problems such as poor dimensional stability of the image. In order to meet this demand, various conventionally known methods have been investigated to accelerate the photoreaction rate of the azide compound in the photosensitive resin M acid, but none of them has been satisfactory.
(課題を解決する為の手段)
本発明者等はかかる問題を解決する為に更に検討を重ね
た結果、本発明を完成した。(Means for Solving the Problems) The present inventors have completed the present invention as a result of further studies to solve these problems.
即ち、本発明は、
1、(a)同一分子内にアニオン性染料と親和性を有す
る基(イ)及びアジド化合物と反応可能な不飽和基(ロ
)とも共に有するポリマー(A)
(b)アジド感光性化合物(B)及び
(c)同一分子内にアクリロイル基及び/又はメタクリ
ロイル基を2ヶ以上有する化合物(C)
を含む感光性樹脂組成物(D)、
2、上記感光性樹脂組成物(D)の硬化物、に関する。That is, the present invention provides the following features: 1. (a) a polymer (A) having both a group (a) having an affinity for anionic dyes and an unsaturated group (b) capable of reacting with an azide compound in the same molecule; A photosensitive resin composition (D) comprising an azide photosensitive compound (B) and (c) a compound (C) having two or more acryloyl groups and/or methacryloyl groups in the same molecule; 2. The above photosensitive resin composition It relates to the cured product of (D).
本発明の感光性樹脂組成物(D)は化合物(C)を用い
なかった場合に比して数分の1の光量で硬化反応を行い
目的が達成される。The photosensitive resin composition (D) of the present invention accomplishes the curing reaction with a fraction of the amount of light compared to the case where the compound (C) is not used.
一般に化合物(C)はこれ単独ではアジド感光性化合物
(B)の数倍も多く光量を必要とする。所が、アジド感
光性化合物(B)と化合物(C)を同時に用いる事によ
り、少量の光量で目的を連成出来る。これはポリマー(
A)中の不飽和基(ロ)、アジド感光性化合物(B)中
のアジド基及び化合物(c)中のアクリロイル基及び/
又はメタクリロイル基との間に架橋効率良く反応させる
好ましい相互作用が働く為に化合物(C)を加えなかっ
た場合に比して少量の光量で目的が達成されるものと推
定される。In general, compound (C) alone requires several times as much light as the azide photosensitive compound (B). However, by simultaneously using the azide photosensitive compound (B) and the compound (C), the objective can be achieved with a small amount of light. This is a polymer (
The unsaturated group (b) in A), the azide group in the azide-sensitive compound (B) and the acryloyl group in the compound (c) and/or
Alternatively, it is presumed that because a favorable interaction between the compound and the methacryloyl group that causes the crosslinking reaction to occur efficiently occurs, the objective can be achieved with a smaller amount of light than in the case where compound (C) is not added.
本発明で用いられるポリマー(A)は可染性モノマー(
ハ)、アジド化合物と反応可能な不飽和基を有するモノ
マー(ニ)、親水性モノマー(ホ)、疎水性モノマー(
へ)を構成成分としている事が好ましい、又、ポリマー
(A)は従来公知の重合方法を用いる事により作成出来
る。The polymer (A) used in the present invention is a dyeable monomer (
c), a monomer having an unsaturated group that can react with an azide compound (d), a hydrophilic monomer (e), a hydrophobic monomer (
It is preferable that the polymer (A) contains as a constituent component, and the polymer (A) can be produced by using a conventionally known polymerization method.
ここで可染性モノマー(ハ)としては次のものが挙げら
れる。Here, the dyeable monomer (c) includes the following.
(N、 N−ジメチルアよ))エチルアクリレート、
(N、 N−ジメチルアミ))エチルメタクリレート、
(N、 N−ジエチルア主))エチルアクリレート、
(N、 N−ジエチルアミノ)エチルメタクリレート、
(N、 N−ジメチルアミ))プロピルアクリルアミド
、
(N、 N−ジメチルアミノ)プロピルメタクリルアミ
ド、
(Ill、N−シメチルアら))ヱチルビニルエーテル
、
(N、 N−ジメチルア改))プロビルアクリレト、
(N、 N−ジメチルアミ))プロごルメタクリレート
、
4−ビニールピリジン、ジアリールア丞ン、2−ヒドロ
キシ−3−メタクリロイルオキシプロピルトリメチルア
ン量ニウムクロライド、メタクリロイルオキシエチルト
リメチルアンモニウムクロライド
又、アジド化合物と反応可能な不飽和基を有するモノマ
ー(ニ)占しては、
アリルアクリレート、アリルメタクリレート、アリルア
クリルア逅ド、アリルメタクリルアミド、
ジアリルア壽ン、
P−アリルスチレン、P−ビニルフ黒ニルシンナメート
、
1−アクリルオキシ 1−ヒドロキシ2−シンナモイル
オキシエタン、
4−アクリロイルオキシスチルベン
等が挙げられる。(N, N-dimethylamino)) ethyl acrylate, (N, N-dimethylami)) ethyl methacrylate, (N, N-diethylamino)) ethyl acrylate, (N, N-diethylamino) ethyl methacrylate, (N, N- dimethylamino)) propyl acrylamide, (N, N-dimethylamino) propyl methacrylamide, (Ill, N-dimethylamino)) ethyl vinyl ether, (N, N-dimethylamino)) propyl acrylate, (N, N- dimethylamino)) progyl methacrylate, 4-vinylpyridine, diaryl ane, 2-hydroxy-3-methacryloyloxypropyltrimethylammonium chloride, methacryloyloxyethyltrimethylammonium chloride, and unsaturated groups capable of reacting with azide compounds. The monomers (2) include: allyl acrylate, allyl methacrylate, allyl acrylamide, allyl methacrylamide, diallyl, P-allylstyrene, P-vinyl blackinnamate, 1-acryloxy 1-hydroxy 2- Examples include cinnamoyloxyethane and 4-acryloyloxystilbene.
ヌ、親水性モノマー(ホ)としては例えば次のものが挙
げられる。Examples of hydrophilic monomers (e) include the following.
ヒドロキシエチルアクリレート、
ヒドロキシエチルメタクリレ−1・、
ヒドロキシエチルアクリルアミド、
ヒドロキシエチルメタクリルア逅ド、
アクリルア穐ド、メタクリルアミド、
ビニールピロリドン、
ジメチルアミノアフリルア逅ド、
メチルア主ノアクリルアミド、
ジメチルアミノメタクリルア壽ド
ヌ、疎水性モノマー(へ)としては次のものが挙げられ
る。Hydroxyethyl acrylate, hydroxyethyl methacrylate-1, hydroxyethyl acrylamide, hydroxyethyl methacrylamide, acrylamide, methacrylamide, vinylpyrrolidone, dimethylamino acrylamide, methylaminoacrylamide, dimethylaminomethacrylate Examples of hydrophobic monomers include the following.
メチルアクリI/−ト、メチルメタクリレート、
エチルアクリレート、エチルメタクリレート、
スチレン、P−メチルスチレン、
ブチルアクリレート、ブチルメタクリレート、
2−エチルへキシルアクリレート、
2−エチルへキシルメタクリレート、
これら可染性モノマー(ハ)、反窓可能な不飽和基を有
するモノマー(ニ)、親木性モノマー(ホ)、
疎水性モノマー (へ)の配合割合は可染性モノマー(
ハ)10〜80重置%、不飽和基を有するモノマー(ニ
)1〜20重量%、親水性モノマー(ホ)2〜60重置
%、疎水性モノマー(へ)5〜・50重髪%である事が
好ましい。Methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, styrene, P-methylstyrene, butyl acrylate, butyl methacrylate, 2-ethylhexyl acrylate, 2-ethylhexyl methacrylate, these dyeable monomers (c) , the monomer having an anti-windowable unsaturated group (d), the wood-philic monomer (e), and the hydrophobic monomer (b) are mixed in the proportions of the dyeable monomer (d).
c) 10 to 80% by weight, monomers having unsaturated groups (d) 1 to 20% by weight, hydrophilic monomers (e) 2 to 60% by weight, hydrophobic monomers (f) 5 to 50% by weight It is preferable that
又、場合によっては予めアジド化合物と反応可能な不飽
和基を有するモノマー(ニ)を含まないポリマーを合成
して置を公知の方法例えばエステル化、アミド化、4級
化反応等により不飽和基を導入する方法もある。この場
合用いられる化合物として例えば次のようなものが挙げ
られる。In addition, in some cases, a polymer containing no monomer (d) having an unsaturated group capable of reacting with an azide compound is synthesized in advance, and the unsaturated group is removed by a known method such as esterification, amidation, quaternization reaction, etc. There is also a way to introduce . Examples of the compounds used in this case include the following.
アリルクロライド、アリルブロマイド、3−クロロ−2
−メチルプロペン、
3−クロロ−1−メチルプロペン、
4−ブロモ−1−ブテン、
クロロアセチックアシドアリルエステル、クロロアセチ
ックアシドビニルエステル、T−クロロ−イソブチン、
m−クロロメチルスチレン、
3−クロロ−2−ヒドロキシブロビルメタク リ
し − ト 、
β−クロロエチル桂皮酸エステル、
β−ブロモエチル桂皮酸エステル、
β−ブロモエチルシンナミリデン酢酸エステル、
β−ブロモエチルフリルアクリル酸エステル、
P−β−ブロモエチルオキシカルボニルベンザルアセト
フェノン、
β−クロロアセトキシスチルベン、
クロトン酸クロライド、
桂皮酸クロライド、
β−フリルアクリル酸クロライド、
N−(クロルカルボニルメチル)フェニルマレイミド、
又、このようにして作成されたポリマー(A)の分子量
は2,000〜200.000が好ましく、特にs、o
oo〜100,000である事が好ましい。Allyl chloride, allyl bromide, 3-chloro-2
-Methylpropene, 3-chloro-1-methylpropene, 4-bromo-1-butene, chloroacetic acid allyl ester, chloroacetic acid vinyl ester, T-chloro-isobutyne, m-chloromethylstyrene, 3-chloro -2-Hydroxybrobyl methacrylate
Shi-to, β-chloroethyl cinnamic acid ester, β-bromoethyl cinnamic acid ester, β-bromoethyl cinnamylidene acetate, β-bromoethyl furyl acrylate, P-β-bromoethyloxycarbonylbenzalacetophenone, β -chloroacetoxystilbene, crotonic acid chloride, cinnamic acid chloride, β-furylacrylic acid chloride, N-(chlorocarbonylmethyl)phenylmaleimide, and the molecular weight of the polymer (A) thus prepared is 2,000 to 200.000 is preferred, especially s, o
It is preferable that it is oo~100,000.
又本発明で用いられるアジド感光性化合物(B)として
は次のものが挙げられる。Moreover, the following can be mentioned as the azide photosensitive compound (B) used in the present invention.
414′−ジアジドカルコン、
2.6−ビス(4”−アジドベンザル)シクロヘキサノ
ン、
2.6−ビス(4’−アジドベンザル)4−メチルシク
ロヘキサノン、
1.3−ビス(4°−アジドベンザ、ル)−2−プロパ
ノン、
P−アジドベンザルアセトフェノン、
P−アジドベンザルアセトン、
1、3−ビス(4′−アジドベンザル)−2−プロパノ
ン−2°−スルホン酸、
4.4°−ジアジドスチルベン−2,2’−ジスルホン
酸、
4.4°−ジアジドスチルベン−2,2′−ジスルホン
酸ソーダ、
1.3−ビス(4°−アジド−2′−スルホン酸−ベン
ザル)−2−プロパノン、
1.3−ビス(4゛−アジド−2”−スルホン酸ソーダ
ーベンザル)−2−プロパノン、2.6−ビス(4’−
アジド−2°−スルホン酸−ベンザル)シクロヘキサノ
ン、
2、6−ビス(4’−アジド−2′−スルホン酸−ベン
ザル)メチルシクロヘキサノン、2.6−ビス(4゛−
アジド−2°−スルホン酸ソーダーベンザル)メチルシ
クロヘキサノン、
これらアジド感光性化合物(B)の使用量はポリ?−(
A)100部に対し70.1〜20部が好ましく、特に
0.5〜lO部が好ましい。414′-Diazidochalcone, 2.6-bis(4″-azidobenzal)cyclohexanone, 2.6-bis(4′-azidobenzal)4-methylcyclohexanone, 1.3-bis(4°-azidobenzal)- 2-propanone, P-azidobenzalacetophenone, P-azidobenzalacetone, 1,3-bis(4'-azidobenzal)-2-propanone-2°-sulfonic acid, 4.4°-diazidostilbene-2 ,2'-disulfonic acid, 4.4°-diazidostilbene-2,2'-disulfonic acid sodium, 1.3-bis(4°-azido-2'-sulfonic acid-benzal)-2-propanone, 1 .3-bis(4′-azido-2″-sulfonic acid benzal)-2-propanone, 2.6-bis(4′-
Azido-2°-sulfonic acid-benzal)cyclohexanone, 2,6-bis(4'-azido-2'-sulfonic acid-benzal)methylcyclohexanone, 2,6-bis(4'-
Azido-2°-sulfonic acid benzal) methylcyclohexanone, How much of these azide photosensitive compounds (B) should be used in poly? −(
A) Preferably 70.1 to 20 parts per 100 parts, particularly preferably 0.5 to 10 parts.
又本発明で用いられる化合物(C)としては例えば次の
ものが挙げられる。Examples of the compound (C) used in the present invention include the following.
スピログリコールジアクリレート〔3,9−ビス(2−
アクリロイルオキシ−1,1−ジメチル) −2,4,
8,10−テトラオキサスピロ(5,5)ウンデカン〕
、
シクロヘキサンジメチロールジアクリレート、
エチレングリコールジアクリレート、
ジエチレングリコールジアクリレート、トリエチレング
リコールジアクリレート、ポリエチレングリコールジア
クリレート、ポリプロピレングリコールジアクリレート
、ブチレングリコールジアクリレート、
ネオペンチルグリコールジアクリレート、1、4−ブタ
ンジオールジアクリレート、1.6−ヘキサンジオール
ジアクリレート、ペンタエリスリトールジアクリレート
、ペンタエリスリトールトリアクリレート、トリメチロ
ールプロパントリアクリレート、ノボラック系エポキシ
アクリレート、
ビスフェノールA系エポキシアクリレート、アルキレン
グリコールジェポキシアクリレート、
グリシジルエステルアクリレート、
ポリエステル系ジアクリレート、
ビスフェノールA系ジアクリレート、
ウレタン系ジアクリレート、
メチレンビスアクリルアミド、
エチレングリコールジメタクリレート、ジエチレングリ
コールジメタクリレート、トリエチレングリコールジメ
タクリレート、ポリエチレングリコールジメタクリレー
ト、プロピレングリコールジメタクリレート、ブチレン
グリコールジメタクリレート、ネオペンチルグリコール
ジメタクリレート、1.4−ブタンジオールジメタクリ
レート、1.6−ヘキサンジオールジアクリレート、ト
リメチロールブロバントリメタクリレート、
これら化合物(C)の使用型はポリマ
(A)100部に対して0.1−20部が好ましく、特
に0.5〜10部が好ましい。Spiroglycol diacrylate [3,9-bis(2-
acryloyloxy-1,1-dimethyl) -2,4,
8,10-tetraoxaspiro(5,5)undecane]
, cyclohexane dimethylol diacrylate, ethylene glycol diacrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, polyethylene glycol diacrylate, polypropylene glycol diacrylate, butylene glycol diacrylate, neopentyl glycol diacrylate, 1,4-butane diol diacrylate Acrylate, 1.6-hexanediol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, trimethylolpropane triacrylate, novolak epoxy acrylate, bisphenol A epoxy acrylate, alkylene glycol jepoxy acrylate, glycidyl ester acrylate, polyester Diacrylate, bisphenol A diacrylate, urethane diacrylate, methylene bisacrylamide, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, polyethylene glycol dimethacrylate, propylene glycol dimethacrylate, butylene glycol dimethacrylate, neopentyl Glycol dimethacrylate, 1,4-butanediol dimethacrylate, 1,6-hexanediol diacrylate, trimethylolbroban trimethacrylate, the usage type of these compounds (C) is 0.1- to 100 parts of polymer (A). 20 parts is preferred, particularly 0.5 to 10 parts.
以上の組成より戒る感光性樹脂組成物(j、通常有ll
溶剤等により希釈されて使用される。The photosensitive resin composition (j, usually has
It is used after being diluted with a solvent, etc.
有機溶剤としては例えば、メチルセロソルブ、エチルセ
ロソルブ、トルエン、キシレン、N−メチルピロリドン
、エチレングリコールモノエチルエーテルアセテ−1・
、
ジエチレングリコールジメチルエーテル、ジエチレング
リコールジエチルエーテル、メチルイソブチルケトン、
メチルエチルケトン等・が挙げられるが、これらは1種
又は2種以上の混合系でも良い。この感光性樹脂液中に
占める有Il溶剤の割合は、これら樹脂液中に占める組
成によって異なるので一概に規定出来ないが、樹脂液と
基材表面に塗布可能な粘度となるようにすることが好ま
しい。Examples of organic solvents include methyl cellosolve, ethyl cellosolve, toluene, xylene, N-methylpyrrolidone, ethylene glycol monoethyl ether acetate-1.
, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, methyl isobutyl ketone,
Examples include methyl ethyl ketone, but these may be used alone or as a mixture of two or more. The proportion of the Il-containing solvent in this photosensitive resin liquid varies depending on the composition of these resin liquids, so it cannot be unconditionally defined, but it is important to ensure that the viscosity is such that it can be applied to the resin liquid and the surface of the substrate. preferable.
この樹脂液を波布したガラス等の基材は通常マスクを介
して紫外線等により蕗光される。A base material such as glass coated with this resin liquid is usually exposed to ultraviolet rays or the like through a mask.
未露光部tj、水溶液により現像される。The unexposed area tj is developed with an aqueous solution.
現像は常温−・60°Cが好ましい。このように現像さ
れた樹脂の膜厚は例えば0.2〜10μの任意の厚さに
腹を作成出来る。現像された所定のパターンを有するガ
ラス、プラスチック等の基材はアニオン染料により染色
される。The development is preferably carried out at room temperature - 60°C. The film thickness of the resin developed in this manner can be set to any desired thickness, for example, from 0.2 to 10 μm. A substrate such as glass or plastic having a developed predetermined pattern is dyed with an anionic dye.
アニオン性染料としてはカラーインデック久(Soel
eiy of Dyer!1and Colouris
ts発行)にC,K Ac1dとして記載されている酸
性染料、同じ(C,I l1irectとして記載され
ている直接染料及び同じ< C,X Reactive
として記載されている反め性染料等が挙げられるが、特
に酸性染料が好ましい、酸性染料としてはC,1^ai
d Y@llow17 、同49、同67、同72、同
127同110、同135゜、同161 、 C,I
Ac1d Red 37、同50、同111、同114
、同257、同266、同317 、C,I Ac1d
B1ue41 、同83、同90、同113、同12
9、同182、同125 、C,I AcidOran
ge7 、同56、C,I ^cid Green25
、同41、C,I Ac1d Violet 97、同
27、同28、同48、等が挙げられる。Color Index Kyu (Soel) is an anionic dye.
eiy of Dyer! 1andColouris
Acidic dyes listed as C,K Ac1d (published by Ts), direct dyes listed as C,Ilirect and same < C,X Reactive
Among them, acidic dyes are particularly preferred. As acidic dyes, C, 1^ai
d Y@llow17, 49, 67, 72, 127 110, 135°, 161, C, I
Ac1d Red 37, 50, 111, 114
, 257, 266, 317, C, I Ac1d
B1ue41, 83, 90, 113, 12
9, 182, 125, C, I Acid Oran
ge7, same 56, C, I ^cid Green25
, 41, C,I Ac1d Violet 97, 27, 28, 48, etc.
これらを用いて染色する方法は染料0.01〜200重
量部は水1000重量部に溶解する。In the dyeing method using these, 0.01 to 200 parts by weight of the dye is dissolved in 1000 parts by weight of water.
この除液の+lHは弱アルカリ−酸性の範囲で良い、こ
の染料溶液にて室温〜100℃の温度範囲で染色するも
のであるが、高温で染色すると短時間で染色出来るので
高温で行うことが好ましい。このようにして染色を行っ
たのち染色物はタンニン酸等の染料固着剤により固着処
理を行い、従来公知の方法Cより赤、緑、青等のカラー
フィルターを作成することが出来る。The +lH of this liquid removal may be in the weak alkaline-acid range.This dye solution is used for dyeing at a temperature range of room temperature to 100°C, but it is not recommended to dye at a high temperature because the dyeing can be done in a short time. preferable. After dyeing in this manner, the dyed product is fixed with a dye fixing agent such as tannic acid, and color filters of red, green, blue, etc. can be produced by the conventionally known method C.
(実施例)
実施例1
ジメチルアミノプロピルアクリルア逅ド31部
2−ヒドロキシエチルメタクリレート 14部ビニルビ
Oリドン 15sメチルメタクリレ
ート 12 Iメチルアクリレート
13#ジメチルアミノアクリルア為ド
10−アリルメタクリレ−1−2,5#
ジアリルア漬ン 5 〃イソプ
ロピルアルコール 200部2.2°−ア
ゾビス(2,4−ジメチルバレロニトリル)
2部上記処方の液体を窃素雰囲気
中40”C18時間本合反応を行わせたのち、この重合
液を多量のイソプロピルエーテル中に役人しポリマー分
を沈澱させたのちポリマーを取出し乾燥を行う。(Example) Example 1 Dimethylaminopropylacrylic acid 31 parts 2-hydroxyethyl methacrylate 14 parts Vinyl bi-Olidone 15s methyl methacrylate 12 I methyl acrylate
13# dimethylaminoacrylic acid
10-allyl methacrylate-1-2,5 # diallyl methacrylate 5 Isopropyl alcohol 200 parts 2.2°-Azobis(2,4-dimethylvaleronitrile)
After carrying out the main polymerization reaction of 2 parts of the above-mentioned liquid in an atmosphere of 40" C for 18 hours, the polymerization solution was poured into a large amount of isopropyl ether to precipitate the polymer, and then the polymer was taken out and dried.
この乾燥ポリマー17部に4.4′−ジアジドカルコン
0.68部、シクロへキサンジメチロールジアクリレー
) 0.70部、エチルセロソルブ100部、ジエチレ
ングリコールジメチルエーテル34部、シランカフプリ
ング剤KBM603 (信絨化学工業■) 0.60
部を混合溶解させた溶液を感光性樹脂液とした。次にこ
れをスピンコード法によりガラス板にコートし、80°
Cl2O分乾燥後解像度テスト用パターンを有するマス
クを介して面照度13*W/cdのIIV照射を5秒間
行い、エマルアン913(花王石鹸■製、ポリオキシエ
チレンノニルフェノールエーテル型非イオン界面活性剤
)を水1000部に対して2部含有する40°Cの現像
液にて攪拌下、5分間現像を行うと照射部のみ可染膜を
有するガラス板が得られた。To 17 parts of this dry polymer, 0.68 part of 4.4'-diazide chalcone, 0.70 part of cyclohexane dimethylol diacrylate, 100 parts of ethyl cellosolve, 34 parts of diethylene glycol dimethyl ether, silane cuff pulling agent KBM603 ( Kei Kagaku Kogyo ■) 0.60
A solution obtained by mixing and dissolving the following parts was used as a photosensitive resin liquid. Next, this was coated on a glass plate using the spin code method, and
After drying for Cl2O, IIV irradiation with a surface illuminance of 13*W/cd was performed for 5 seconds through a mask with a resolution test pattern, and Emaluan 913 (manufactured by Kao Soap ■, a polyoxyethylene nonylphenol ether type nonionic surfactant) was applied. When development was carried out for 5 minutes with stirring in a developer solution at 40° C. containing 2 parts per 1000 parts of water, a glass plate having a dyeable film only in the irradiated area was obtained.
このガラス板を更に150℃、30分間ボストベーク後
の膜厚は0.6μであった。このガラス板をブルー43
p (日本化薬■製、カラーフィルター用色素)を0
.2%となるように水に溶解させ、60℃、10分間染
色を行うと濃厚青色のパターンに染色差せたガラス板が
得られた。このガラス板のパターンの解像度は3.5μ
で染色膜の透明性、画像の寸法安定性共に満足のいくも
のであった。After this glass plate was further post-baked at 150° C. for 30 minutes, the film thickness was 0.6 μm. This glass plate is blue 43
p (manufactured by Nippon Kayaku, color filter dye) 0
.. When it was dissolved in water to a concentration of 2% and dyed at 60°C for 10 minutes, a glass plate dyed in a deep blue pattern was obtained. The resolution of the pattern on this glass plate is 3.5μ
Both the transparency of the dyed film and the dimensional stability of the image were satisfactory.
実施例2
実施例1の処方に於いて、ジアリル7175部の代りに
10部用いた以外はすべて同様の操作を行った。この場
合最適照射時間は20秒で得られたポストベーク後の膜
厚は0.6μ、パターンの解像度は3.1μであった。Example 2 The same procedure as in Example 1 was repeated except that 10 parts of diallyl was used instead of 7,175 parts of diallyl. In this case, the optimum irradiation time was 20 seconds, the film thickness after post-baking was 0.6 μm, and the pattern resolution was 3.1 μm.
染色膜の透明性、画像の寸法安定性共に満足のいくもの
であった。Both the transparency of the dyed film and the dimensional stability of the image were satisfactory.
実施例3
実施例2に於いて4,4°−ジアジドカルコンの代りに
1.3−ビス(4°−アジドベンザル)−2−プロパノ
ンを用いて、光反応性樹脂液100部に更にトルエン2
0部を追加して同様の操作を行った。この場合の最適照
射時間は5秒でポストベーク後の膜厚は0.5μ、得ら
れたパターンの解像度は3.5μであった。染色膜の透
明性、画像の寸法安定性、共に満足のいくものであった
。Example 3 In Example 2, 1,3-bis(4°-azidobenzal)-2-propanone was used instead of 4,4°-diazidechalcone, and 2 parts of toluene was added to 100 parts of the photoreactive resin liquid.
The same operation was performed by adding 0 copies. In this case, the optimum irradiation time was 5 seconds, the film thickness after post-baking was 0.5μ, and the resolution of the resulting pattern was 3.5μ. Both the transparency of the dyed film and the dimensional stability of the image were satisfactory.
実施例4
実施例1の処方に於いてジアリルアミン5部の代りに1
5部として同様の操作を行った。Example 4 In the formulation of Example 1, instead of 5 parts of diallylamine, 1
The same operation was performed using 5 copies.
この場合最適照射時間は20秒で、ポストベーク後の膜
厚は0.6μ、パターンの解像度は2.5μであった。In this case, the optimum irradiation time was 20 seconds, the film thickness after post-baking was 0.6μ, and the pattern resolution was 2.5μ.
染色膜の透明性、Wi倣の寸法安定性、共に満足のいく
ものであった。Both the transparency of the dyed film and the dimensional stability of the Wi pattern were satisfactory.
実施例5
実施例1に於いてジアリルアミン5部の代りに2部とし
、シクロヘキサンジメチロールジアクリレートの代りに
カヤハードD−320(ジペンタエリスリトール テト
ラアクリレート、アルキロール変性品、日本化薬■製)
を用いて乾燥温度を80℃の代りに60°Cとした以外
は同様の操作を行った。Example 5 In Example 1, 5 parts of diallylamine was replaced with 2 parts, and cyclohexane dimethylol diacrylate was replaced with Kayahard D-320 (dipentaerythritol tetraacrylate, alkylol modified product, manufactured by Nippon Kayaku ■).
The same operation was performed except that the drying temperature was changed to 60°C instead of 80°C.
この場合最適照射時間は10秒でポストベーク後の膜厚
は0.5μ、パターンの解像度は2.0μであった。染
色膜の透明性、画像の寸法安定性、共に満足のいくもの
であった。In this case, the optimum irradiation time was 10 seconds, the film thickness after post-baking was 0.5μ, and the pattern resolution was 2.0μ. Both the transparency of the dyed film and the dimensional stability of the image were satisfactory.
実施例6
実施例5に於いてカヤハードD −320の代りにジペ
ンタエリスリトールへキサアクリレートを用いて同様の
操作を行った。この場合最適照射時間は10秒でポスト
ベーク後の膜厚は0.5μ、パターン解像度は2.0μ
であった。染色膜の透明性、画像の寸法安定性、共に満
足のいくものであった。Example 6 The same operation as in Example 5 was carried out using dipentaerythritol hexaacrylate instead of Kayahard D-320. In this case, the optimal irradiation time is 10 seconds, the film thickness after post-bake is 0.5μ, and the pattern resolution is 2.0μ.
Met. Both the transparency of the dyed film and the dimensional stability of the image were satisfactory.
実施例7
実施例4に於いてアリルメタクリレート2.5部の代り
に5.0部を用いて同様の操作を行った。Example 7 The same operation as in Example 4 was carried out using 5.0 parts of allyl methacrylate instead of 2.5 parts.
この場合最適照射時間は5秒でボネストベーク後の膜厚
は0,6μ、パターンの解像度は1.8μであった。染
色膜の透明性、画像の寸法安定性、共に満足のいくもの
であった。In this case, the optimum irradiation time was 5 seconds, the film thickness after Bonest baking was 0.6 μm, and the pattern resolution was 1.8 μm. Both the transparency of the dyed film and the dimensional stability of the image were satisfactory.
実施例8
メチルメタアクリレート 5部N、N’−
ジメチルアξノプロビルアクリルアミド30部
2−ヒドロキシエチルメタクリレートIO#ビニールピ
ロリドン 15〃ジメチルアミノアク
リルアξド 10〃ブチルアクリレート
301α、α°−アゾビス(イソブチロニ
トリル)2部
ジオキサン 250#上記処
方の液体を窒素雰囲気中、70”C18時間重合反応を
行ったのち、この重合溶液をイソプロピルエーテル中に
投入しポリマーを沈澱させた。Example 8 Methyl methacrylate 5 parts N, N'-
Dimethylaminoprobyl acrylamide 30 parts 2-Hydroxyethyl methacrylate IO # Vinyl pyrrolidone 15〃Dimethylaminoacrylamide ξde 10〃Butyl acrylate
301α,α°-azobis(isobutyronitrile) 2 parts dioxane 250# After polymerizing the liquid of the above formulation in a nitrogen atmosphere at 70"C for 18 hours, the polymerization solution was poured into isopropyl ether to precipitate the polymer. I let it happen.
ポリマーを取出し、乾燥後このポリマー30部に対して
エチルセロソルブ100部を添加溶解した溶液にアリル
クロライド32部を添加、常温にて48時間反応後、イ
ソプロピルエーテル中に投入しポリマーを沈澱させた。The polymer was taken out and dried, and 32 parts of allyl chloride was added to a solution prepared by adding and dissolving 100 parts of ethyl cellosolve to 30 parts of the polymer. After reacting at room temperature for 48 hours, the polymer was poured into isopropyl ether to precipitate the polymer.
このポリマーを乾燥後このボリマー15部、4.4”−
ジアドカル17006部、シクロヘキサンジメチロール
ジアクリレート0゜68部、KRM、0.5部、エチル
セロソルブ85部を含む光反応性#M詣液を作成した。After drying this polymer, 15 parts of this polymer, 4.4"-
A photoreactive #M sacrificial solution containing 17,006 parts of diadocal, 0.68 parts of cyclohexane dimethylol diacrylate, 0.5 parts of KRM, and 85 parts of ethyl cellosolve was prepared.
次にガラス板にスピンコード法により前記光反応性樹脂
液を塗布し、これを80℃、20分乾燥後、所定のパタ
ーンを有するマスクを介して面照度8mW/cfflの
UV照射を5秒間行い、水を現像液として常温で5分間
現像を行うC照射部のみ可染性膜を有するガラス板が得
られた。このガラス板を150℃、30分間乾燥後、グ
リーンIP(日本化薬■製カラーフィルター用色素)を
Ool %となるように水に溶解させ60℃、10分間
染色を行う、!:WA厚緑色のパターンに染色されたガ
ラス板が得られた。Next, the photoreactive resin liquid was applied to a glass plate by a spin code method, and after drying at 80°C for 20 minutes, UV irradiation was performed for 5 seconds at a surface illuminance of 8 mW/cffl through a mask with a predetermined pattern. A glass plate having a dyeable film only in the C irradiated area was obtained by performing development for 5 minutes at room temperature using water as a developer. After drying this glass plate at 150°C for 30 minutes, dissolve Green IP (a dye for color filters manufactured by Nippon Kayaku ■) in water to a concentration of OOL% and dye it at 60°C for 10 minutes! :WA A glass plate dyed in a thick green pattern was obtained.
パターンの膜厚はO08μであった。染色浴のpHは7
.5であった。グリーンIPの代りにレッド137p、
ブルー43p)いずれも日本化薬■製カラーフィルター
用色素)を使用して同様の操作を行うと各々濃淳赤色及
び青電に染色されたパターンを有するガラス板が得られ
た。このパターンの解像度は5μであった。The film thickness of the pattern was O08μ. The pH of the dye bath is 7
.. It was 5. Red 137p instead of green IP,
When the same operation was carried out using Blue 43p) (both dyes for color filters manufactured by Nippon Kayaku ■), glass plates having patterns dyed deep red and blue electric were obtained, respectively. The resolution of this pattern was 5μ.
実施例9
実施例7に於いてシフ0ヘキサンジメチ○−ルジアクリ
レー)0.70部の代りにエチレングリコールジメタク
リレート0.3部、シクロヘキサンジメチロールジアク
リレート0.4部を用いて同様の操作を行った。この場
合最適照射時間は10秒でボストベーク後の膜厚は0.
6μ、パターンの解像度は2.0μであった。染色膜の
透明性、画像の寸法安定性、共に満足のいくものであっ
た。Example 9 The same operation as in Example 7 was carried out using 0.3 parts of ethylene glycol dimethacrylate and 0.4 parts of cyclohexane dimethylol diacrylate instead of 0.70 parts of Schiff 0 hexane dimethylol diacrylate. Ta. In this case, the optimum irradiation time is 10 seconds, and the film thickness after boost baking is 0.
6μ, and the pattern resolution was 2.0μ. Both the transparency of the dyed film and the dimensional stability of the image were satisfactory.
実施例10
実施例1紀於いて用いた感光性樹脂液を用いてガラス板
にスピンコード法によりツー1−L、80”C720分
間乾燥後カラーフィルター作成用200μのストライブ
パターンを有するマスクを介して実施例1のUV照射装
Wで20秒照射を行い、実施例1と同様に乾燥、現像、
ポストベークを行ったのち、レフト137P (日本化
薬■製カラーフィルター用染t?4)を0゜1%含む浴
にて70″Cl2O分間染色を行い赤色ストライブパタ
ーンを有するガラス板が得られた。Example 10 Using the photosensitive resin liquid used in Example 1, a glass plate was dried for 20 minutes using a spin code method, and then coated through a mask having a 200μ stripe pattern for making a color filter. Then, irradiation was performed for 20 seconds using the UV irradiation device W of Example 1, followed by drying, development, and drying in the same manner as in Example 1.
After post-baking, dyeing was carried out for 70'' in a bath containing 0.1% of Left 137P (Nippon Kayaku Color Filter Dye T?4) for 70'' Cl2O to obtain a glass plate with a red stripe pattern. Ta.
次にこれをタンニン酸3 g/ j1、酢酸2g/lを
含ム浴に70℃、5分間処理し、更に二1−パワロン(
大日本製薬■製、酒石酸アンチモンナトリウム溶液)5
g/j!を含む浴に70℃、5分間処理後、このガラス
板を150℃、20分間処理することにより染料の固着
処理を行った。次にこのガラス板を先の感光性樹脂液を
用いて同様にコート、乾燥、先に染色されなかった部分
のUV照射、現像、ボストベークを行ったのち、CFG
−5113(日本化薬11!製カラーフィルター用染料
)0.1%を含む浴にて60℃、10分間染色後、前述
の処方に従ってタンニン、ニューパワロンによる固着処
理を行うと赤、緑のストライブパターンを有するガラス
板が得られた。Next, this was treated in a bath containing 3 g/l of tannic acid and 2 g/l of acetic acid at 70°C for 5 minutes, and further treated with 21-Pavalon (
Manufactured by Dainippon Pharmaceutical ■, antimony sodium tartrate solution) 5
g/j! After treatment in a bath containing 70° C. for 5 minutes, the glass plate was treated at 150° C. for 20 minutes to fix the dye. Next, this glass plate was similarly coated with the photosensitive resin solution, dried, UV irradiated on the parts that were not dyed first, developed, and post-baked, followed by CFG.
-5113 (Color filter dye made by Nippon Kayaku 11!) After dyeing in a bath containing 0.1% at 60℃ for 10 minutes, fixation treatment with tannin and New Poweron according to the above recipe results in red and green stripes. A glass plate with a pattern was obtained.
次にこのガラス板に先の感光性樹脂液を用いて同様にコ
ート、乾燥、先に染色されなかった部分のUV照射、現
像、ポストベークを行ったのち、ブルー43p(日本化
薬■製カラーフィルター用染$14)0.1%を含む浴
にて60℃、10分間染色を行うた赤、緑、青の3色の
ストライブパターンを有するカラーフィルター用ガラス
板が得られた。Next, this glass plate was coated in the same manner using the photosensitive resin solution, dried, UV irradiated on the parts that were not dyed first, developed, and post-baked. Dyeing for Filters $14) Dyeing was carried out at 60° C. for 10 minutes in a bath containing 0.1%, and a glass plate for color filters having a stripe pattern of three colors of red, green, and blue was obtained.
参考例1
実施例1に於いてシクロヘキサンジメチロールジアクリ
レート0.70部を添加しないで同様の操作を行った。Reference Example 1 The same operation as in Example 1 was carried out without adding 0.70 part of cyclohexane dimethylol diacrylate.
その結果画像の解像度は6.2μであり実施例1より画
像の寸法安定性も劣っていた。As a result, the resolution of the image was 6.2μ, and the dimensional stability of the image was also inferior to that of Example 1.
参考f!42
実施例2に於いてシクロヘキサンジメチロールジアクリ
レート0.70部を添加しないで同様の操作を行った。Reference f! 42 The same operation as in Example 2 was carried out without adding 0.70 part of cyclohexane dimethylol diacrylate.
その結果膜剥離があり画像を作成することは出来なかっ
た。As a result, the film peeled off and no image could be created.
参考例3
実施例3に於いてシクロヘキサンジメチロールジアクリ
レート0.70部を添加しないで同様の操作を行った。Reference Example 3 The same operation as in Example 3 was carried out without adding 0.70 part of cyclohexane dimethylol diacrylate.
その結果膜剥離があり画像を作成するこεは出来なかっ
た。As a result, the film peeled off and it was not possible to create an image.
参考例4
実施例4に於いてシクロヘキサンジメチロールジアクリ
レート0.70部を添加しないで同様の操作を行った。Reference Example 4 The same operation as in Example 4 was carried out without adding 0.70 part of cyclohexane dimethylol diacrylate.
その結果画像の解像度は6.2μであり、実施例4より
画像の寸法安定性も劣っていた。As a result, the resolution of the image was 6.2μ, and the dimensional stability of the image was also inferior to that of Example 4.
参考例5
実施例5に於いてカヤハードD−320,0,70部を
添加しないで同様の操作を行った。その結果画像の解像
度はlOμであり、実施例5より画像の寸法安定性も劣
っていた。Reference Example 5 The same operation as in Example 5 was carried out without adding 0.70 parts of Kayahard D-320. As a result, the resolution of the image was lOμ, and the dimensional stability of the image was also inferior to that of Example 5.
参考例6
実施例7に於いてシクロヘキサンジメチロールジアクリ
レート0.70部を添加しないで同様の操作を行った。Reference Example 6 The same operation as in Example 7 was performed without adding 0.70 part of cyclohexane dimethylol diacrylate.
この場合の最適照射時間は40秒であり、画像の解像度
は3.1μであった。The optimal irradiation time in this case was 40 seconds, and the image resolution was 3.1μ.
参考例7
実施例8に於いてシクロヘキサンジメチロールジアクリ
レート0.68部を用いないで同様の操作を行った。そ
の結果画像の解像度は15μであり、実施例8より画像
の寸法安定性も劣っていた。Reference Example 7 The same operation as in Example 8 was performed without using 0.68 part of cyclohexane dimethylol diacrylate. As a result, the resolution of the image was 15μ, and the dimensional stability of the image was also inferior to that of Example 8.
(発明の効果)
本発明は従来の天然物であるゼラチン、又はカゼイン重
クロム酸塩系感光性組威物に比べて腐敗し組成とか、原
料によるバラツキが大きいとかの問題がない、又腐敗に
よる6価クロム公害の問題もない。(Effects of the Invention) Compared to conventional gelatin, which is a natural product, or casein dichromate-based photosensitive compositions, the present invention does not have the problems of spoilage and large variations in composition and raw materials. There is no problem of hexavalent chromium pollution.
更に又本発明の感光性樹脂M酸物(D)は化合物(C)
を用いなかった場合に比して少量の光量で樹脂が硬化す
るので微細パターンの作成、省エネルギー、工程の合理
化、コストダウンに役立つ。Furthermore, the photosensitive resin M acid compound (D) of the present invention is a compound (C)
Since the resin is cured with a small amount of light compared to when it is not used, it is useful for creating fine patterns, saving energy, streamlining processes, and reducing costs.
Claims (1)
る基(イ)及びアジド化合物と反応可能な不飽和基(ロ
)とを共に有するポリマー(A) (b)アジド感光性化合物(B)及び (c)同一分子内にアクリロイル基及び/又はメタクリ
ロイル基を2ケ以上有する化 合物(c) を含む感光性樹脂組成物。 2、第1項記載の感光性樹脂組成物の硬化物。[Claims] 1. (a) A polymer (A) having both a group (a) having an affinity for anionic dyes and an unsaturated group (b) capable of reacting with an azide compound in the same molecule (b) ) A photosensitive resin composition comprising an azide photosensitive compound (B) and (c) a compound (c) having two or more acryloyl groups and/or methacryloyl groups in the same molecule. 2. A cured product of the photosensitive resin composition according to item 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19947089A JPH0364754A (en) | 1989-08-02 | 1989-08-02 | Photosensitive resin composition and hardened material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19947089A JPH0364754A (en) | 1989-08-02 | 1989-08-02 | Photosensitive resin composition and hardened material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0364754A true JPH0364754A (en) | 1991-03-20 |
Family
ID=16408339
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19947089A Pending JPH0364754A (en) | 1989-08-02 | 1989-08-02 | Photosensitive resin composition and hardened material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0364754A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7778569B2 (en) | 2006-07-27 | 2010-08-17 | Brother Kogyo Kabushiki Kaisha | Image forming apparatus |
-
1989
- 1989-08-02 JP JP19947089A patent/JPH0364754A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7778569B2 (en) | 2006-07-27 | 2010-08-17 | Brother Kogyo Kabushiki Kaisha | Image forming apparatus |
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