JPS5531129A - Target material for physical vacuum deposition - Google Patents
Target material for physical vacuum depositionInfo
- Publication number
- JPS5531129A JPS5531129A JP10340778A JP10340778A JPS5531129A JP S5531129 A JPS5531129 A JP S5531129A JP 10340778 A JP10340778 A JP 10340778A JP 10340778 A JP10340778 A JP 10340778A JP S5531129 A JPS5531129 A JP S5531129A
- Authority
- JP
- Japan
- Prior art keywords
- target material
- vacuum deposition
- physical vacuum
- fixing
- corrosion resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000013077 target material Substances 0.000 title abstract 4
- 238000001771 vacuum deposition Methods 0.000 title abstract 2
- 229910052799 carbon Inorganic materials 0.000 abstract 2
- 238000005260 corrosion Methods 0.000 abstract 2
- 230000007797 corrosion Effects 0.000 abstract 2
- 229910052760 oxygen Inorganic materials 0.000 abstract 2
- 229910000599 Cr alloy Inorganic materials 0.000 abstract 1
- 238000005266 casting Methods 0.000 abstract 1
- 229910052735 hafnium Inorganic materials 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 238000007733 ion plating Methods 0.000 abstract 1
- 229910052742 iron Inorganic materials 0.000 abstract 1
- 229910052748 manganese Inorganic materials 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 229910052758 niobium Inorganic materials 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 229910052698 phosphorus Inorganic materials 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 abstract 1
- 229910052717 sulfur Inorganic materials 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 229910052720 vanadium Inorganic materials 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE: To provide a target material emitting little gas, having superior toughness and corrosion resistance, and suitable for an ion gun, etc. by adding a specified amt. of Fe to Cr together with a small amt. of an element for fixing N, O, C, etc.
CONSTITUTION: As a target material for an ion gun or a sputter gun used in a physical vacuum deposition process such as ion plating or sputtering a Cr alloy of the following compsn. is used: Cr 65W88%, Fe 10W35% and impurities C<0.03%, Si<0.2%, Mn<0.05%, S<0.015%, P<0.015%, N<0.07% and 0<0.08%. In order to prevent emission of gas during use, 0.3W3% of one or more out of Ti, Zr, V, Nb, Ta and Hf is added as elements for fixing N, O and C. This target material has a m.p. below that of Cr and easily undergoes cutting and grinding as well as casting. In addn., it exhibits superior corrosion resistance.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10340778A JPS5531129A (en) | 1978-08-25 | 1978-08-25 | Target material for physical vacuum deposition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10340778A JPS5531129A (en) | 1978-08-25 | 1978-08-25 | Target material for physical vacuum deposition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5531129A true JPS5531129A (en) | 1980-03-05 |
| JPS5614739B2 JPS5614739B2 (en) | 1981-04-06 |
Family
ID=14353188
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10340778A Granted JPS5531129A (en) | 1978-08-25 | 1978-08-25 | Target material for physical vacuum deposition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5531129A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58147559A (en) * | 1982-02-26 | 1983-09-02 | Hitachi Condenser Co Ltd | Sputtering device |
| US5288228A (en) * | 1989-11-17 | 1994-02-22 | Kubota Corporation | Heat-resistant materials |
| US5718778A (en) * | 1995-03-31 | 1998-02-17 | Hitachi Metals, Ltd. | Chromium target and process for producing the same |
| US5781000A (en) * | 1995-06-16 | 1998-07-14 | Fujitsu Limited | Power control unit loading test method |
| WO2003046249A1 (en) * | 2001-11-30 | 2003-06-05 | Mitsubishi Materials Corporation | MgO VAPOR DEPOSITION MATERIAL AND METHOD FOR PREPARATION THEREOF |
-
1978
- 1978-08-25 JP JP10340778A patent/JPS5531129A/en active Granted
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58147559A (en) * | 1982-02-26 | 1983-09-02 | Hitachi Condenser Co Ltd | Sputtering device |
| US5288228A (en) * | 1989-11-17 | 1994-02-22 | Kubota Corporation | Heat-resistant materials |
| US5718778A (en) * | 1995-03-31 | 1998-02-17 | Hitachi Metals, Ltd. | Chromium target and process for producing the same |
| US5781000A (en) * | 1995-06-16 | 1998-07-14 | Fujitsu Limited | Power control unit loading test method |
| WO2003046249A1 (en) * | 2001-11-30 | 2003-06-05 | Mitsubishi Materials Corporation | MgO VAPOR DEPOSITION MATERIAL AND METHOD FOR PREPARATION THEREOF |
| US7138350B2 (en) | 2001-11-30 | 2006-11-21 | Mitsubishi Materials Corporation | MgO vapor deposition material and method for preparation thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5614739B2 (en) | 1981-04-06 |
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