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JPS5539630A - Vapor phase growth device - Google Patents

Vapor phase growth device

Info

Publication number
JPS5539630A
JPS5539630A JP11249478A JP11249478A JPS5539630A JP S5539630 A JPS5539630 A JP S5539630A JP 11249478 A JP11249478 A JP 11249478A JP 11249478 A JP11249478 A JP 11249478A JP S5539630 A JPS5539630 A JP S5539630A
Authority
JP
Japan
Prior art keywords
liner pipes
pipes
liner
reactor pipe
vapor phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11249478A
Other languages
Japanese (ja)
Other versions
JPS6136372B2 (en
Inventor
Masaharu Nogami
Tanji Okawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11249478A priority Critical patent/JPS5539630A/en
Publication of JPS5539630A publication Critical patent/JPS5539630A/en
Publication of JPS6136372B2 publication Critical patent/JPS6136372B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE: To make vapor phase growth without replacing the different diameter liner pipes provided in a reactor pipe while removing said liner pipes one by one starting with the innermost one thereof on the completion of each process.
CONSTITUTION: Liner pipes 61W64 are provided on the inner side of a reactor pipe 10 at a distance of about 1mm from each other. Said liner pipes 61W64 hardly pass reaction gas and can be readily slid close to each other. Said liner pipes 61W64 are easy to take out one by one if larger lengths are given to inner liner pipes. Said liner pipes 61W64 are easy to handle if a stoper 61' is attached at the upper course end thereof or a stopper 10' inside said reactor pipe 10. Thereby, operation can be easily made in a short period simply by drawing out said liner pipes 61W64 on the completion of each process since no replacement is required with new liner pipes. Therefore, said reactor pipe and liner pipes 61W64 can be considerably prevented from failure and the contamination due to air admixture.
COPYRIGHT: (C)1980,JPO&Japio
JP11249478A 1978-09-13 1978-09-13 Vapor phase growth device Granted JPS5539630A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11249478A JPS5539630A (en) 1978-09-13 1978-09-13 Vapor phase growth device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11249478A JPS5539630A (en) 1978-09-13 1978-09-13 Vapor phase growth device

Publications (2)

Publication Number Publication Date
JPS5539630A true JPS5539630A (en) 1980-03-19
JPS6136372B2 JPS6136372B2 (en) 1986-08-18

Family

ID=14588043

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11249478A Granted JPS5539630A (en) 1978-09-13 1978-09-13 Vapor phase growth device

Country Status (1)

Country Link
JP (1) JPS5539630A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57104524U (en) * 1980-12-19 1982-06-28
JPS58181796A (en) * 1982-04-19 1983-10-24 Matsushita Electric Ind Co Ltd Crystal growth method
JPS6167915A (en) * 1984-09-12 1986-04-08 Hitachi Tokyo Electronics Co Ltd Plasma CVD equipment
JPH04180619A (en) * 1990-11-15 1992-06-26 Nec Yamagata Ltd Horizontal type reactor for semiconductor manufacturing
JP2006228973A (en) * 2005-02-17 2006-08-31 Denso Corp Heat treatment apparatus
US8164868B2 (en) 2006-02-23 2012-04-24 Siemens Aktiengesellschaft Device for short-circuiting power semiconductor modules

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106824935B (en) * 2016-12-08 2019-03-05 尚涛 A kind of cleaning method of gas-chromatography glass bushing pipe

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57104524U (en) * 1980-12-19 1982-06-28
JPS58181796A (en) * 1982-04-19 1983-10-24 Matsushita Electric Ind Co Ltd Crystal growth method
JPS6167915A (en) * 1984-09-12 1986-04-08 Hitachi Tokyo Electronics Co Ltd Plasma CVD equipment
JPH04180619A (en) * 1990-11-15 1992-06-26 Nec Yamagata Ltd Horizontal type reactor for semiconductor manufacturing
JP2006228973A (en) * 2005-02-17 2006-08-31 Denso Corp Heat treatment apparatus
US8164868B2 (en) 2006-02-23 2012-04-24 Siemens Aktiengesellschaft Device for short-circuiting power semiconductor modules

Also Published As

Publication number Publication date
JPS6136372B2 (en) 1986-08-18

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