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JPS56123379A - Shadow mask - Google Patents

Shadow mask

Info

Publication number
JPS56123379A
JPS56123379A JP2650180A JP2650180A JPS56123379A JP S56123379 A JPS56123379 A JP S56123379A JP 2650180 A JP2650180 A JP 2650180A JP 2650180 A JP2650180 A JP 2650180A JP S56123379 A JPS56123379 A JP S56123379A
Authority
JP
Japan
Prior art keywords
shadow mask
mask
lowered
nitrogen
carbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2650180A
Other languages
Japanese (ja)
Inventor
Masaharu Kanto
Hisato Kihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP2650180A priority Critical patent/JPS56123379A/en
Publication of JPS56123379A publication Critical patent/JPS56123379A/en
Pending legal-status Critical Current

Links

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  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE: To enhance formability of a mild steel sheet and improve the quality of a resultant shadow mask by regulating the contents of carbon and nitrogen in the mild steel sheet for shadow mask.
CONSTITUTION: Electron beam through-holes of a predetermined shape and size and removing line are formed to a sheet steel for shadow mask of 20W70% final reduction ratios by an etching method, after which a flat mask is formed. This flat mask is annealed and decarbonized at 700W900°C in wet hydrogen gas flow, whereby the content of carbon is lowered to ≤0.004wt% and the content of nitrogen to ≤0.001wt%. Therefore, yield point of the flat mask is lowered, and the elongation of the yield point is decreased. Hence, the formability improves and this improves spherical surface accuracy and virtually eliminates uneven elongation owing to stretcher strain, thus the quality of the resultant shadow mask is excellent.
COPYRIGHT: (C)1981,JPO&Japio
JP2650180A 1980-03-05 1980-03-05 Shadow mask Pending JPS56123379A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2650180A JPS56123379A (en) 1980-03-05 1980-03-05 Shadow mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2650180A JPS56123379A (en) 1980-03-05 1980-03-05 Shadow mask

Publications (1)

Publication Number Publication Date
JPS56123379A true JPS56123379A (en) 1981-09-28

Family

ID=12195228

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2650180A Pending JPS56123379A (en) 1980-03-05 1980-03-05 Shadow mask

Country Status (1)

Country Link
JP (1) JPS56123379A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008024643A3 (en) * 2006-08-11 2008-09-04 Battelle Memorial Institute Patterning non-planar surfaces

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008024643A3 (en) * 2006-08-11 2008-09-04 Battelle Memorial Institute Patterning non-planar surfaces
US8017308B2 (en) 2006-08-11 2011-09-13 Battelle Memorial Institute Patterning non-planar surfaces
US8891065B2 (en) 2006-08-11 2014-11-18 Battelle Memorial Institute Patterning non-planar surfaces

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