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JPS5772326A - Insulation composition of electron beam exposing equipment - Google Patents

Insulation composition of electron beam exposing equipment

Info

Publication number
JPS5772326A
JPS5772326A JP14894380A JP14894380A JPS5772326A JP S5772326 A JPS5772326 A JP S5772326A JP 14894380 A JP14894380 A JP 14894380A JP 14894380 A JP14894380 A JP 14894380A JP S5772326 A JPS5772326 A JP S5772326A
Authority
JP
Japan
Prior art keywords
electron beam
insulator
little
insulation composition
electric charge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14894380A
Other languages
Japanese (ja)
Inventor
Mamoru Nakasuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP14894380A priority Critical patent/JPS5772326A/en
Publication of JPS5772326A publication Critical patent/JPS5772326A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To improve the stability of an equipment by a method wherein electric charge by an electron beam is avoided by sealing an insulator supporting a conducting member. CONSTITUTION:Deflecting plates 3 are supported by insulators 4 which are coated with metallic films 5 except convex parts or an inner wall 1 of an electronic optical mirror cylinder. A gap made between the circumference of the insulator 4 and the deflecting plate 3 is designed in such a manner that the ratio L/d is not less than 4 where d is the width and L is the depth of the gap. With above configuration the quantity of a scattered electron beam 2 which reaches and charges the insulator 4 is very little and even if the insulator 4 is charged a little the electric charge is discharged through the metallic film 5, so that a mischievous influence of the charge upon the electron beam 2 is eliminated.
JP14894380A 1980-10-24 1980-10-24 Insulation composition of electron beam exposing equipment Pending JPS5772326A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14894380A JPS5772326A (en) 1980-10-24 1980-10-24 Insulation composition of electron beam exposing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14894380A JPS5772326A (en) 1980-10-24 1980-10-24 Insulation composition of electron beam exposing equipment

Publications (1)

Publication Number Publication Date
JPS5772326A true JPS5772326A (en) 1982-05-06

Family

ID=15464122

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14894380A Pending JPS5772326A (en) 1980-10-24 1980-10-24 Insulation composition of electron beam exposing equipment

Country Status (1)

Country Link
JP (1) JPS5772326A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7109484B2 (en) 2000-07-27 2006-09-19 Ebara Corporation Sheet beam-type inspection apparatus
US7135676B2 (en) 2000-06-27 2006-11-14 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7241993B2 (en) 2000-06-27 2007-07-10 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4967558A (en) * 1972-11-01 1974-07-01

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4967558A (en) * 1972-11-01 1974-07-01

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7135676B2 (en) 2000-06-27 2006-11-14 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7241993B2 (en) 2000-06-27 2007-07-10 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7297949B2 (en) 2000-06-27 2007-11-20 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7411191B2 (en) 2000-06-27 2008-08-12 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7601972B2 (en) 2000-06-27 2009-10-13 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8053726B2 (en) 2000-06-27 2011-11-08 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8368031B2 (en) 2000-06-27 2013-02-05 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8803103B2 (en) 2000-06-27 2014-08-12 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US9368314B2 (en) 2000-06-27 2016-06-14 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7109484B2 (en) 2000-07-27 2006-09-19 Ebara Corporation Sheet beam-type inspection apparatus
US7417236B2 (en) 2000-07-27 2008-08-26 Ebara Corporation Sheet beam-type testing apparatus
US7829871B2 (en) 2000-07-27 2010-11-09 Ebara Corporation Sheet beam-type testing apparatus

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