JPS5778206A - Surface acoustic wave element and its production - Google Patents
Surface acoustic wave element and its productionInfo
- Publication number
- JPS5778206A JPS5778206A JP15378980A JP15378980A JPS5778206A JP S5778206 A JPS5778206 A JP S5778206A JP 15378980 A JP15378980 A JP 15378980A JP 15378980 A JP15378980 A JP 15378980A JP S5778206 A JPS5778206 A JP S5778206A
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- electrode
- substrate
- film
- acoustic wave
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010897 surface acoustic wave method Methods 0.000 title abstract 3
- 239000013078 crystal Substances 0.000 abstract 6
- 239000000758 substrate Substances 0.000 abstract 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 3
- 229910052710 silicon Inorganic materials 0.000 abstract 3
- 239000010703 silicon Substances 0.000 abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 abstract 1
- 230000005684 electric field Effects 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 150000004767 nitrides Chemical class 0.000 abstract 1
- -1 nitrogenous compound Chemical class 0.000 abstract 1
- 230000000644 propagated effect Effects 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02574—Characteristics of substrate, e.g. cutting angles of combined substrates, multilayered substrates, piezoelectrical layers on not-piezoelectrical substrate
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
PURPOSE:To reduce the propagation loss in a high frequency, by using an elastic substance substrate where an aluminum nitride single crystal film is formed on a silicon single crystal layer by the epitaxial method. CONSTITUTION:A silicon single crystal layer of one of crystal faces (111), (110), and (100) is formed on a silicon single crystal substrate 2 and is subjected to the heat treatment in an atmosphere containing an Al compound and a nitrogenous compound to grow epitaxially an Al nitride single crystal film 15 on the surface of the substrate 2. A pair of comb-shaped input electrodes 18 and 19 and an output electrode 20 between them are provided on this film 15, and input termials 18A and 19A and an output terminal 20A are provided on respective electrodes. Then, a substrate electrode 17 is provided to constitute a surface acoustic wave element. An input signal is applied to terminals 18A and 19A and is converted to a surface acoustic wave by electrodes 18 and 19 and is propagated to the electrode 20. In this case, two signal waves are mixed by the piezoelectric characteristics of the film 15 to generate an electric field, and only uniform components, which are not changed dependently upon positions, out of field components are outputted from the terminal 20A through the electrode 20.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15378980A JPS5778206A (en) | 1980-11-04 | 1980-11-04 | Surface acoustic wave element and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15378980A JPS5778206A (en) | 1980-11-04 | 1980-11-04 | Surface acoustic wave element and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5778206A true JPS5778206A (en) | 1982-05-15 |
Family
ID=15570165
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15378980A Pending JPS5778206A (en) | 1980-11-04 | 1980-11-04 | Surface acoustic wave element and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5778206A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5859618A (en) * | 1981-10-05 | 1983-04-08 | Nobuo Mikoshiba | Surface acoustic wave element |
| JPH02248110A (en) * | 1989-03-20 | 1990-10-03 | Sanyo Electric Co Ltd | Surface acoustic wave device |
| US9369105B1 (en) * | 2007-08-31 | 2016-06-14 | Rf Micro Devices, Inc. | Method for manufacturing a vibrating MEMS circuit |
| US9385685B2 (en) | 2007-08-31 | 2016-07-05 | Rf Micro Devices, Inc. | MEMS vibrating structure using an orientation dependent single-crystal piezoelectric thin film layer |
| US9391588B2 (en) | 2007-08-31 | 2016-07-12 | Rf Micro Devices, Inc. | MEMS vibrating structure using an orientation dependent single-crystal piezoelectric thin film layer |
| US9466430B2 (en) | 2012-11-02 | 2016-10-11 | Qorvo Us, Inc. | Variable capacitor and switch structures in single crystal piezoelectric MEMS devices using bimorphs |
| US9991872B2 (en) | 2014-04-04 | 2018-06-05 | Qorvo Us, Inc. | MEMS resonator with functional layers |
| US9998088B2 (en) | 2014-05-02 | 2018-06-12 | Qorvo Us, Inc. | Enhanced MEMS vibrating device |
-
1980
- 1980-11-04 JP JP15378980A patent/JPS5778206A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5859618A (en) * | 1981-10-05 | 1983-04-08 | Nobuo Mikoshiba | Surface acoustic wave element |
| JPH02248110A (en) * | 1989-03-20 | 1990-10-03 | Sanyo Electric Co Ltd | Surface acoustic wave device |
| US9369105B1 (en) * | 2007-08-31 | 2016-06-14 | Rf Micro Devices, Inc. | Method for manufacturing a vibrating MEMS circuit |
| US9385685B2 (en) | 2007-08-31 | 2016-07-05 | Rf Micro Devices, Inc. | MEMS vibrating structure using an orientation dependent single-crystal piezoelectric thin film layer |
| US9391588B2 (en) | 2007-08-31 | 2016-07-12 | Rf Micro Devices, Inc. | MEMS vibrating structure using an orientation dependent single-crystal piezoelectric thin film layer |
| US9466430B2 (en) | 2012-11-02 | 2016-10-11 | Qorvo Us, Inc. | Variable capacitor and switch structures in single crystal piezoelectric MEMS devices using bimorphs |
| US9991872B2 (en) | 2014-04-04 | 2018-06-05 | Qorvo Us, Inc. | MEMS resonator with functional layers |
| US9998088B2 (en) | 2014-05-02 | 2018-06-12 | Qorvo Us, Inc. | Enhanced MEMS vibrating device |
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