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JPS5848487B2 - Method for producing high purity silicon carbide powder - Google Patents

Method for producing high purity silicon carbide powder

Info

Publication number
JPS5848487B2
JPS5848487B2 JP51035472A JP3547276A JPS5848487B2 JP S5848487 B2 JPS5848487 B2 JP S5848487B2 JP 51035472 A JP51035472 A JP 51035472A JP 3547276 A JP3547276 A JP 3547276A JP S5848487 B2 JPS5848487 B2 JP S5848487B2
Authority
JP
Japan
Prior art keywords
powder
silicon carbide
purity
container
carbide powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51035472A
Other languages
Japanese (ja)
Other versions
JPS52117899A (en
Inventor
伊佐男 坂下
信夫 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coorstek KK
Original Assignee
Toshiba Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Ceramics Co Ltd filed Critical Toshiba Ceramics Co Ltd
Priority to JP51035472A priority Critical patent/JPS5848487B2/en
Publication of JPS52117899A publication Critical patent/JPS52117899A/en
Publication of JPS5848487B2 publication Critical patent/JPS5848487B2/en
Expired legal-status Critical Current

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Description

【発明の詳細な説明】 本発明は半導体製造用治具或いは均熱管の原料として適
した高純度炭化珪素粉末の製造方法に関するものである
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing high-purity silicon carbide powder suitable as a raw material for semiconductor manufacturing jigs or soaking tubes.

従来、炭化珪素を大量に製造するには、珪石粉と炭素粉
にオガ屑食塩等を添加し、電気炉に充填した後、該炉内
のコアの抵抗発熱により珪石粉と炭素粉を反応させてい
る。
Conventionally, in order to produce silicon carbide in large quantities, silica powder and carbon powder were added with sawdust salt, etc., filled into an electric furnace, and then the silica powder and carbon powder were reacted by resistance heat generation in the core in the furnace. ing.

しかし、この方法にあってはコア周辺が最高温度となり
外側の炉壁に向かって次第に温度が低下するため、外周
部に未反応層が残ったり、原料中の不純物が凝縮し易い
温度範囲が生じ、生或した炭化珪素中の不純物の量に不
均一な分布が発生したり、その炭化珪素がインコットと
呼ばれる多結晶集合体となったりする虞れがあった。
However, in this method, the temperature is highest around the core and gradually decreases toward the outer furnace wall, resulting in an unreacted layer remaining on the outer periphery and a temperature range in which impurities in the raw materials tend to condense. There is a risk that the amount of impurities in the formed silicon carbide may be unevenly distributed, or that the silicon carbide may form a polycrystalline aggregate called an incott.

したがって、一旦これを粉砕したり、攪拌混合してC
, Fe等の不純物の均一分布化を計る必要があるため
、該粉砕工程、攪拌工程時に不可避的に不純物が混入し
、純度の低い炭化珪素粉となる欠点があった。
Therefore, by pulverizing it or stirring and mixing it, C.
Since it is necessary to ensure uniform distribution of impurities such as .

本発明は上記事情に鑑みなされたもので、粉末状で、二
次汚染を起こす粉砕工程、攪拌工程を一切行わずにその
まま各種の原料として使用できる高純度の炭化珪素粉を
得ようとするものである。
The present invention was made in view of the above circumstances, and aims to obtain highly pure silicon carbide powder that is in powder form and can be used as a variety of raw materials without any grinding or stirring processes that cause secondary contamination. It is.

以下、本発明を詳細に説明する。The present invention will be explained in detail below.

まず5CIfL以下の粒径の高純度珪石粉と5wIl以
下の粒径の高純度炭素粉とをたとえば円筒状の黒鉛質容
器に充填して密封する。
First, high-purity silica powder with a particle size of 5 CIfL or less and high-purity carbon powder with a particle size of 5 wIl or less are filled into, for example, a cylindrical graphite container and sealed.

次いで、この容器を黒鉛管状炉に連続的に移動させ、炉
内に窒素ガス等の非酸化性ガスを流通させつつ、炉内温
度を著しい粒成長を起こすことなしに炭化珪素化できる
温度範囲すなわち1800〜2200℃に保持し珪石と
炭素とを反応せしめて炭化珪素粉を造る。
Next, this container is continuously moved to a graphite tube furnace, and while flowing a non-oxidizing gas such as nitrogen gas into the furnace, the temperature inside the furnace is adjusted to a temperature range that can convert silicon carbide without causing significant grain growth. The temperature is maintained at 1800 to 2200°C to react silica stone and carbon to produce silicon carbide powder.

本発明に使用する高純度珪石粉としては、たとえば石英
ガラス用珪石を粉砕、篩別した後、塩酸で煮沸し脱水、
乾燥して純化処理したもの等である。
As the high-purity silica powder used in the present invention, for example, silica stone for quartz glass is crushed and sieved, then boiled in hydrochloric acid and dehydrated.
These include those that have been dried and purified.

また、本発明に使用する高純度炭素粉としては、たとえ
ば石油コークスを粉砕、篩別した後2600〜2200
℃の温度下で塩ガスを吹きつけて純化処理したもの等で
ある。
In addition, as the high-purity carbon powder used in the present invention, for example, after crushing and sieving petroleum coke,
It is purified by spraying salt gas at a temperature of ℃.

さらに、本発明における高純度珪石粉と高純度炭素粉と
のね径を571gI1以下に限定した理由はこれらの粒
径が51mlを越えると、粉末状の炭化珪素が収率よく
得られないからである。
Furthermore, the reason why the particle diameters of the high-purity silica stone powder and high-purity carbon powder in the present invention are limited to 571 gI1 or less is that if these particle diameters exceed 51 ml, powdered silicon carbide cannot be obtained in good yield. be.

なお、上記珪石粉と炭素粉との配合割合は、通常珪石粉
:炭素粉とのモル比が1:3となるようにすればよい。
The mixing ratio of the silica powder and carbon powder is usually such that the molar ratio of silica powder to carbon powder is 1:3.

また、珪石粉、炭素粉を充填した黒鉛質容器の炉内にお
ける移動速度は充填量、炉内温度等により適宜選定すれ
ばよい。
Further, the moving speed of the graphite container filled with silica powder and carbon powder in the furnace may be appropriately selected depending on the amount of filling, the temperature inside the furnace, etc.

しかして、本発明によれば高純度珪石粉と高純度炭素粉
とを黒鉛容器内に密封し、これを管状炉内に移動させる
ことにより、該珪石粉と炭素粉とを均一に加熱して反応
できるとともに著しい粒成長を起こすことのない温度に
よって処理するため生威した炭化珪素が二次汚染を誘引
する粉砕工程、攪拌工程を一切行わずにそのまま各種の
原料として使用できる高純度炭化珪素粉として得ること
ができる。
According to the present invention, high-purity silica powder and high-purity carbon powder are sealed in a graphite container and moved into a tubular furnace, thereby uniformly heating the silica powder and carbon powder. High-purity silicon carbide powder that can be used as a raw material for various raw materials without any grinding or stirring processes that can cause secondary contamination due to processing at a temperature that allows reaction and does not cause significant grain growth. can be obtained as

嘴骨 次に
本発明の実施例を説明する。
Beak Bone Next, embodiments of the present invention will be described.

実施例 1 石英ガラス用珪石を粉砕、篩別した後、これを塩酸溶液
に1時間浸漬煮沸し水洗脱水、乾燥して下記第1表に示
す粒度分布、不純物含有量の珪石粉を造った。
Example 1 After crushing and sieving silica stone for quartz glass, it was immersed in a hydrochloric acid solution for 1 hour, boiled, washed with water, dehydrated, and dried to produce silica powder having a particle size distribution and impurity content shown in Table 1 below.

一方、石油コークスを粉砕、篩別した後、これを220
0’Cに加熱しつつ塩素ガスを2時間吹き付けて同第1
表に示すね度分布、不純物含有量の炭素粉を造った。
On the other hand, after crushing and sieving the petroleum coke, it was
While heating to 0'C, chlorine gas was sprayed for 2 hours.
Carbon powder with the hardness distribution and impurity content shown in the table was produced.

次いで、上記珪石粉と炭素粉とを1:3のモル比で混合
し、この混合粉を円筒状黒鉛容器(外径160m,内径
1357EJ長さ1000m)に充填して密封した後、
この容器を内径17071lIIl,発熱部の長さ20
0071gIlの黒鉛管状炉に入れ、該容器をプランジ
ャにより5 0 0 11m/ Hrの速度で移※慟さ
せ、炉内に窒素ガスを供給しつつ炉内温度を1900℃
±20℃にして容器内の珪石と炭素とを反応せしめ炭化
珪素粉を得た。
Next, the silica powder and carbon powder were mixed at a molar ratio of 1:3, and this mixed powder was filled into a cylindrical graphite container (outer diameter 160 m, inner diameter 1357EJ length 1000 m) and sealed.
This container has an inner diameter of 17071lIIl and a length of the heating part of 20
The container was placed in a graphite tubular furnace of 0.0071gIl, and the container was moved by a plunger at a speed of 500.11m/Hr, and the temperature inside the furnace was raised to 1900°C while supplying nitrogen gas into the furnace.
The silica stone and carbon in the container were reacted at ±20°C to obtain silicon carbide powder.

得られた炭化珪素粉の収率は91多で、その粒度分布お
よび不純物含有率を調べたところ、下記第2表の結果を
得た。
The yield of the obtained silicon carbide powder was 91%, and when its particle size distribution and impurity content were examined, the results shown in Table 2 below were obtained.

上表より明らかな如く、本発明方法により得られた炭化
珪素は粉末状でかつ純度が高くそのまま各種の原料とし
て使用できることがわかる。
As is clear from the above table, the silicon carbide obtained by the method of the present invention is in powder form and has high purity, and can be used as it is as various raw materials.

実施例 2 前記第1表に示す珪石粉、炭素粉を充填した円*水筒状
黒鉛容器の移動速度を400m/Hrとし、かつ炉内温
度を2100℃に設定した以外、前記実施例1と同様な
方法にて炭化珪素粉を得た。
Example 2 Same as Example 1 above, except that the moving speed of the circle*water cylindrical graphite container filled with the silica powder and carbon powder shown in Table 1 above was set at 400 m/Hr, and the temperature inside the furnace was set at 2100°C. Silicon carbide powder was obtained using this method.

得られた炭化珪素粉のね度分布および不純物含有量を調
べた。
The hardness distribution and impurity content of the obtained silicon carbide powder were investigated.

その結果を下記第3表に示す。以上詳述した如く、本発
明によれば粉末状でかつ不純物混入分布が均一な高純度
の炭化珪素を簡単かつ収率よく得ることができ、二次汚
染を起こす粉砕工程、攪拌混合工程を一切行うことなく
、そのまま半導体製造用治具、半導体製造用均熱管など
不純物の揮散を極端にきらう部材の原料として好適に利
用できる等顕著な効果を有する。
The results are shown in Table 3 below. As described in detail above, according to the present invention, it is possible to easily obtain high-purity silicon carbide in powder form and with a uniform distribution of impurities, and there is no need for a grinding process or stirring/mixing process that causes secondary contamination. It has remarkable effects such as being able to be suitably used as a raw material for components such as jigs for semiconductor manufacturing and soaking tubes for semiconductor manufacturing, which require extremely low volatilization of impurities.

Claims (1)

【特許請求の範囲】[Claims] 1 5m以下の粒径の高純度珪石粉と同粒径の高純度
炭素粉とを混合し、これを黒鉛製密封容器に充填した後
、この容器を管状炉に連続的に移動させ、炉内温度を1
800〜2200℃に保持して該容器内の珪石と炭素と
を反応せしめることを特徴とする高純度炭化珪素粉末の
製造方法。
1. Mix high-purity silica powder with a particle size of 5 m or less and high-purity carbon powder with the same particle size, and fill it into a sealed graphite container.The container is then continuously moved to a tube furnace. Temperature 1
A method for producing high-purity silicon carbide powder, which comprises maintaining the temperature at 800 to 2200°C to react the silica stone and carbon in the container.
JP51035472A 1976-03-31 1976-03-31 Method for producing high purity silicon carbide powder Expired JPS5848487B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51035472A JPS5848487B2 (en) 1976-03-31 1976-03-31 Method for producing high purity silicon carbide powder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51035472A JPS5848487B2 (en) 1976-03-31 1976-03-31 Method for producing high purity silicon carbide powder

Publications (2)

Publication Number Publication Date
JPS52117899A JPS52117899A (en) 1977-10-03
JPS5848487B2 true JPS5848487B2 (en) 1983-10-28

Family

ID=12442708

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51035472A Expired JPS5848487B2 (en) 1976-03-31 1976-03-31 Method for producing high purity silicon carbide powder

Country Status (1)

Country Link
JP (1) JPS5848487B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6060285U (en) * 1983-09-30 1985-04-26 ぺんてる株式会社 Automatic lead feeding type sharp pencil
WO2013027790A1 (en) * 2011-08-24 2013-02-28 太平洋セメント株式会社 Silicon carbide powder and method for producing same

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3338755A1 (en) * 1982-10-28 1984-05-03 Toshiba Ceramics Co., Ltd., Tokio/Topkyo SHAPED BODY BASED ON SILICON CARBIDE FOR USE IN SEMICONDUCTOR PRODUCTION
FI82231C (en) * 1988-11-30 1991-02-11 Kemira Oy FOERFARANDE FOER FRAMSTAELLNING AV KERAMRAOMATERIAL.
JP2660650B2 (en) * 1993-04-08 1997-10-08 大平洋ランダム株式会社 Manufacturing method of α-type silicon carbide

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6060285U (en) * 1983-09-30 1985-04-26 ぺんてる株式会社 Automatic lead feeding type sharp pencil
WO2013027790A1 (en) * 2011-08-24 2013-02-28 太平洋セメント株式会社 Silicon carbide powder and method for producing same
JPWO2013027790A1 (en) * 2011-08-24 2015-03-19 太平洋セメント株式会社 Silicon carbide powder and method for producing the same
US9382121B2 (en) 2011-08-24 2016-07-05 Taiheiyo Cement Corporation Silicon carbide powder and method for producing same

Also Published As

Publication number Publication date
JPS52117899A (en) 1977-10-03

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