JPS5911603B2 - Method for producing polycarbazole derivatives - Google Patents
Method for producing polycarbazole derivativesInfo
- Publication number
- JPS5911603B2 JPS5911603B2 JP48131421A JP13142173A JPS5911603B2 JP S5911603 B2 JPS5911603 B2 JP S5911603B2 JP 48131421 A JP48131421 A JP 48131421A JP 13142173 A JP13142173 A JP 13142173A JP S5911603 B2 JPS5911603 B2 JP S5911603B2
- Authority
- JP
- Japan
- Prior art keywords
- formula
- carbazole
- producing
- toluenesulfonic acid
- represented
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Indole Compounds (AREA)
Description
【発明の詳細な説明】
本発明は電子写真感光材料の光導電体として有用な新規
なカルバゾール誘導体およびそのポリマーの製造法に関
する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a novel carbazole derivative useful as a photoconductor for electrophotographic light-sensitive materials and a method for producing a polymer thereof.
5 ポリビニルカルバゾールおよびその誘導体は電子写
真の光導電体として広く知られ、すでに一部で実用化さ
れている。5 Polyvinylcarbazole and its derivatives are widely known as photoconductors for electrophotography, and have already been put into practical use in some areas.
しかし、従来のポリビニルカルバゾールあるいはその誘
導体は単独では十分な皮膜形成能を有せず、可塑剤等を
併用して皮膜10形成能を持たせていた。また支持体上
に光導電層として形成せしめる場合も支持体との接着性
が不良であり、そのため支持体と光導電層との間に接着
剤層を設けるなどの手段を講じていた。しかし、このよ
うに可塑剤を併用したり支持体15と接着剤層を介した
りして光導電層を形成せしめるために、これまでポリビ
ニルカルバゾール本来の優れた光導電特性が十分活され
なかつたのが実情である。However, conventional polyvinylcarbazole or its derivatives do not have sufficient film-forming ability when used alone, and have been made to have the film-forming ability by using a plasticizer or the like in combination. Furthermore, when the photoconductive layer is formed on a support, the adhesion to the support is poor, and therefore measures such as providing an adhesive layer between the support and the photoconductive layer have been taken. However, because the photoconductive layer is formed by using a plasticizer or by using an adhesive layer with the support 15, the excellent photoconductive properties inherent to polyvinylcarbazole have not been fully utilized until now. is the reality.
本発明はこのような欠点を除去することを目的20とし
、生成ポリマーが十分な皮膜形成能を有し、さらに接着
剤層を介在せしめずに十分に支持体との接着性を示し、
従つて光導電体の諸特性が活された新規なポリカルバゾ
ール誘導体(光導電性材料)の製造方法を提供するもの
である。The purpose of the present invention is to eliminate such drawbacks20, and the produced polymer has sufficient film-forming ability and also exhibits sufficient adhesion to the support without intervening an adhesive layer.
Therefore, the present invention provides a method for producing a novel polycarbazole derivative (photoconductive material) that takes advantage of the various properties of a photoconductor.
25すなわち、本発明の新規ポリカルバゾール誘導体の
製造法の特徴は、式Iで示されるカルバゾールと、式■
で示されるN−ヒドロキシメチルアク’゜□ ・・・・
・・・・・。25 That is, the characteristics of the method for producing the novel polycarbazole derivative of the present invention are that the carbazole represented by formula I and the formula
N-hydroxymethylac'゜□ ・・・・
・・・・・・.
、)CH2=CHC0NHCH20H・・・・・・・・
(■)35リルアミドとを、溶媒中でp−トルエンスル
ホン酸の触媒存在で縮合反応せしめることにより、式■
で示されるN−アクリルアミドメチルカルバゾ、C一ー
ルを得、続いて、このN−アクリルアミドメチルカルバ
ゾールをラジカル重合させることである3この製造法の
実施において、出発原料であるカルバゾール(式1)と
N−ヒドロキシメチルアクリルアミド(式)の配合割合
は、カルバゾール1モルに対し、N−ヒドロキシメチル
アクリルアミド1〜2モル程度が適当である。,)CH2=CHC0NHCH20H・・・・・・・・・
By carrying out a condensation reaction with (■) 35lylamide in a solvent in the presence of a catalyst of p-toluenesulfonic acid, the formula ■
3. In carrying out this production method, the starting material carbazole (Formula 1) The appropriate blending ratio of N-hydroxymethylacrylamide (formula) is about 1 to 2 moles of N-hydroxymethylacrylamide per 1 mole of carbazole.
触媒にはp一トルエンスルホン酸が使用されるが、これ
以外の触媒では反応を促進することが困難である。触媒
の量はカルバゾール(式1)の1モルに対して0.01
〜2.0モル程度である。また、使用される溶媒として
はクロロホルム、塩化メチレンなどの塩素化炭化水素、
1,4−ジオキサン、アセトニトリル、テトラヒドロフ
ラン等が好適である。上述のごとく触媒としてはp−ト
ルエンスルホン酸が使用され、これは反応の促進に極め
て有効であるが、副反応を防ぎ反応をより効率的に進め
るためには、p−トルエンスルホン酸にN,N′−ジシ
クロヘキシルカルボジイミドを併用することが好ましい
。このN,N′−ジシクロヘキシルカルボジイミドの添
加量は、カルバゾール1モルに対して、p−トルエンス
ルホン酸とN,N5−ジシクロヘキシルカルボジイミド
のモル数の和が0.1〜2.0モル程度が適当である。
この反応は発熱反応であり、しかも反応生成物(式で示
されるN−アクリルアミドメチルカルバゾーノリは、そ
の有する二重結合のために重合を起し易いので、反応操
作は加熱することなく室温で行なうのが望ましい。Although p-toluenesulfonic acid is used as a catalyst, it is difficult to promote the reaction with other catalysts. The amount of catalyst is 0.01 per mole of carbazole (formula 1)
~2.0 moles. In addition, the solvents used are chloroform, chlorinated hydrocarbons such as methylene chloride,
1,4-dioxane, acetonitrile, tetrahydrofuran and the like are preferred. As mentioned above, p-toluenesulfonic acid is used as a catalyst and is extremely effective in promoting the reaction. However, in order to prevent side reactions and advance the reaction more efficiently, it is necessary to add N, It is preferable to use N'-dicyclohexylcarbodiimide in combination. The appropriate amount of N,N'-dicyclohexylcarbodiimide to be added is such that the sum of the moles of p-toluenesulfonic acid and N,N5-dicyclohexylcarbodiimide is approximately 0.1 to 2.0 moles per mole of carbazole. be.
This reaction is an exothermic reaction, and since the reaction product (N-acrylamidomethylcarbazonol represented by the formula) tends to polymerize due to its double bonds, the reaction operation is carried out at room temperature without heating. It is desirable to do so.
また必要によりハロドロキノンなどの重合防止剤が少量
添加されてもよいO出発原料であるカルバゾール(式1
)およびN一ヒドロキシメチルアクリルアミド(式11
)は容易に入手できるものであるが、得られたN−アク
リルアミドメチルカルバゾール(式)は光導電性を有す
る新規化合物である。In addition, if necessary, a small amount of polymerization inhibitor such as halodroquinone may be added. Carbazole (formula 1
) and N-hydroxymethylacrylamide (formula 11
) is easily available, but the obtained N-acrylamidomethylcarbazole (formula) is a novel compound with photoconductivity.
この新規化合物は、前述のとおり、容易にラジカル重合
を起し高分子量のポリマー(式)を生成する。従つて、
実際の重合操作では、N−アタリルアミドメチルカルバ
ゾールを例えばN,N′−ジメチルホルムアミドに溶解
し、これにα,α′−アゾビスイソブチロニトリル(重
合開始剤)を加えて、乾燥窒素を吹き込みながら50〜
150℃好ましくは80℃に10時間程度保持した後、
多量のメタノール、水などの中へ投じ、生じる沈澱を戸
別し、乾燥すればよい。As mentioned above, this new compound easily undergoes radical polymerization to produce a high molecular weight polymer (formula). Therefore,
In the actual polymerization operation, N-atarylamide methylcarbazole is dissolved in, for example, N,N'-dimethylformamide, α,α'-azobisisobutyronitrile (polymerization initiator) is added thereto, and then 50~ while blowing
After maintaining the temperature at 150°C, preferably 80°C, for about 10 hours,
Simply pour it into a large amount of methanol or water, separate the resulting precipitate, and dry it.
上記式で表わされたポリマーは、光導電性を有すると共
にそれ自体皮膜形成能を有している。The polymer represented by the above formula has photoconductivity and itself has film-forming ability.
従つて、このポリマーの使用によれば可塑剤などの併用
は考慮する必要はなく、また支持体との接着性も良好な
ので接着性の使用も不要である。次に、実施例及びモノ
マーの合成例を示す。モノマーの合成例 1カルバゾー
ル(16.771.0X10−1m0t)、N−ヒドロ
キシメチルアクリルアミド(12.1f1.2×10−
1m0t)をテトラヒドロフラン(250d)に溶解し
、約10℃に保つた。Therefore, when this polymer is used, there is no need to consider the use of plasticizers, etc., and since the adhesion to the support is good, there is no need to use adhesives. Next, examples and monomer synthesis examples will be shown. Monomer synthesis example 1 Carbazole (16.771.0X10-1m0t), N-hydroxymethylacrylamide (12.1f1.2x10-
1m0t) was dissolved in tetrahydrofuran (250d) and kept at about 10°C.
この溶液にp−トルエンスルホン酸(1Z2f1.0X
10−1m0t)をテトラヒドロフラン(30d)に溶
解した溶液を温度を約15℃以下に保ちながら滴下した
。その後、徐々に室温に温度を上昇させ、室温で2日間
反応させた後に多量の水へ反応液を投じ生じる沈澱をP
別し、水洗後、乾燥した。得られた沈澱をメタノールで
再結晶を繰り返えし、無色柱状晶(3.3r収率13%
)を得た。融点 193〜195℃(融点測定後は重合
していた)元素分析
Cl6Hl4N2Oとして
赤外吸収スペクトルは第2級アミドに基づく吸収(32
40?−1,1660(:!n−1,1560?−1)
を示し、また1640儂−1,990C:RfL−1に
末端ビニルの吸収を示した。Add p-toluenesulfonic acid (1Z2f1.0X
A solution of 10-1m0t) dissolved in tetrahydrofuran (30d) was added dropwise while keeping the temperature below about 15°C. After that, the temperature was gradually raised to room temperature, and after reacting at room temperature for 2 days, the reaction solution was poured into a large amount of water to remove the resulting precipitate.
It was separated, washed with water, and then dried. The obtained precipitate was repeatedly recrystallized with methanol to obtain colorless columnar crystals (3.3r yield 13%).
) was obtained. Melting point: 193-195°C (polymerized after melting point measurement) Elemental analysis: Cl6Hl4N2O, infrared absorption spectrum shows absorption based on secondary amide (32
40? -1,1660 (:!n-1,1560?-1)
1640F-1,990C:RfL-1 showed absorption of vinyl terminals.
以上の結果より所期の単量体式[)が得られた事が判る
。From the above results, it can be seen that the desired monomer formula [) was obtained.
モノマーの合成例 2
カルバゾール(16.7t1.0×10−1m0t)、
N−ヒドロキシメチルアクリルアミド(11.1f11
.1×10−1m0t)、N,N′−ジシクロヘキシル
カルボジイミド(18.5t0.9×10−1m0t)
をテトラヒドロフラン(250m1)に溶解させ約10
℃に保つた。Monomer synthesis example 2 Carbazole (16.7t1.0×10-1m0t),
N-hydroxymethylacrylamide (11.1f11
.. 1 x 10-1 m0t), N,N'-dicyclohexylcarbodiimide (18.5t0.9 x 10-1m0t)
Dissolve in tetrahydrofuran (250ml) for about 10
It was kept at ℃.
一方、p−トルエンスルホン酸(3.4V0.2×10
−1m0t)を、テトラヒドロフラン(20mi)に溶
解させ、この溶液を先の溶液に滴下した。その後、徐々
に室温にもどし1日間室温で反応させた後に、反応液中
に生じている白沈を沢別し、得られる戸液を多量の水へ
投じ生じる沈澱を戸別、水洗後、乾燥した。この沈澱を
メタノールで再結晶を繰り返えし、無色柱状晶(8.3
V収率33%)を得た。これを合成例1で得た単量体と
混融しても融点降下は示さず所期の単量体式が得られた
事が判る。実施例(ポリマーの合成例)
合成例1あるいは2で得られた単量体(1.37)、α
,α′−アゾビスイソブチロニトリル(3.0W9)を
精留したN,N′−ジメチルホルムアミド(10m1)
に溶解し、乾燥した窒素ガスを吹込みながら80℃に1
0時間保つた。On the other hand, p-toluenesulfonic acid (3.4V0.2×10
-1m0t) was dissolved in tetrahydrofuran (20mi), and this solution was added dropwise to the previous solution. After that, the temperature was gradually returned to room temperature and the reaction was allowed to proceed at room temperature for one day, after which the white precipitate formed in the reaction solution was separated, and the resulting solution was poured into a large amount of water.The resulting precipitate was washed with water and dried. . This precipitate was repeatedly recrystallized with methanol to give colorless columnar crystals (8.3
A V yield of 33% was obtained. It can be seen that even when this was mixed with the monomer obtained in Synthesis Example 1, the melting point did not decrease, and the desired monomer formula was obtained. Example (polymer synthesis example) Monomer (1.37) obtained in Synthesis Example 1 or 2, α
, N,N'-dimethylformamide (10ml) obtained by rectifying α'-azobisisobutyronitrile (3.0W9)
and heated to 80°C for 1 hour while blowing dry nitrogen gas.
I kept it for 0 hours.
Claims (1)
N−ヒドロキシメチルアクリルアミド▲数式、化学式、
表等があります▼・・・( I )CH_2=CHCON
HCH_2OH・・・(II)とを、溶媒中でp−トルエ
ンスルホン酸又はp−トルエンスルホン酸およびN,N
′−ジシクロヘキシルカルボジイミドの触媒存在下で縮
合反応せしめることにより、式IIIで示されるN−アク
リルアミドメチルカルバゾールを▲数式、化学式、表等
があります▼・・・(III)得、次いでこのN−アクリ
ルアミドメチルカルバゾールをラジカル重合させること
を特徴とするポリカルバゾール誘導体の製造法。1 Carbazole represented by formula I and N-hydroxymethylacrylamide represented by formula II▲Mathematical formula, chemical formula,
There are tables, etc.▼・・・(I)CH_2=CHCON
HCH_2OH...(II) in a solvent with p-toluenesulfonic acid or p-toluenesulfonic acid and N,N
By carrying out a condensation reaction in the presence of a catalyst of '-dicyclohexylcarbodiimide, N-acrylamidomethylcarbazole represented by formula III is obtained (III), and then this N-acrylamidomethylcarbazole is obtained. A method for producing a polycarbazole derivative, which comprises radically polymerizing carbazole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48131421A JPS5911603B2 (en) | 1973-11-22 | 1973-11-22 | Method for producing polycarbazole derivatives |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48131421A JPS5911603B2 (en) | 1973-11-22 | 1973-11-22 | Method for producing polycarbazole derivatives |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5082056A JPS5082056A (en) | 1975-07-03 |
| JPS5911603B2 true JPS5911603B2 (en) | 1984-03-16 |
Family
ID=15057558
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP48131421A Expired JPS5911603B2 (en) | 1973-11-22 | 1973-11-22 | Method for producing polycarbazole derivatives |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5911603B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7181156B2 (en) | 2003-07-25 | 2007-02-20 | Ricoh Company, Ltd. | Image forming apparatus using a cleaning member for preventing noises and process cartridge therefor |
| JP4796433B2 (en) | 2006-04-27 | 2011-10-19 | 株式会社リコー | Electrostatic latent image carrier, image forming apparatus using the same, process cartridge, and image forming method |
| JP4283854B2 (en) | 2007-01-29 | 2009-06-24 | シャープ株式会社 | Aromatic polycarbonate, electrophotographic photoreceptor and image forming apparatus |
| US8173343B2 (en) | 2008-07-15 | 2012-05-08 | Ricoh Company, Ltd. | Electrophotographic photoconductor, image forming apparatus using the same, and process cartridge |
| JP5614651B2 (en) | 2011-01-21 | 2014-10-29 | 株式会社リコー | Electrophotographic photosensitive member, image forming method using the same, image forming apparatus, and process cartridge for image forming apparatus |
-
1973
- 1973-11-22 JP JP48131421A patent/JPS5911603B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5082056A (en) | 1975-07-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4546156A (en) | Water-soluble sulfonated polymers | |
| US4490308A (en) | New water-soluble sulfonated monomers | |
| TW505667B (en) | New compounds having an element of group 11, 12 or 14 and a tridentate ligand, their preparation process and their use in particular as polymerization catalysts | |
| EP0837844B1 (en) | Acrylamide derivatives as chromophoric photocrosslinking compound | |
| Watanabe et al. | Preparation and properties of photocrosslinkable poly (2‐vinyloxyethyl cinnamate) | |
| JPS5911603B2 (en) | Method for producing polycarbazole derivatives | |
| US3615384A (en) | Electrophotographic process employing vinyl bithiophene polymeric photoconductors | |
| Blout et al. | Polypeptides. IX. The kinetics of strong-base initiated polymerizations of amino acid-n-carboxyanhydrides | |
| JPS59199649A (en) | 4-hydroxy-4'-vinylbiphenyl derivative and its preparation | |
| US4159383A (en) | N,N-Disubstituted acryl- and methacrylamides | |
| US3340233A (en) | Bis-vinylketo aromatic compounds and polymerization products thereof | |
| JPS6227082B2 (en) | ||
| Fehervari et al. | Photoluminescence and excimer emission of functional groups in light‐emitting polymers | |
| US7750084B2 (en) | Photoresponsive polymer, built-up type diacetylene polymer, crystal of ammonium carboxylate, and method for manufacturing them | |
| US2508249A (en) | Allyl polyesters of amino alkyl carboxylic acids | |
| JP2691300B2 (en) | Organic boron-containing polymer | |
| JPH01115929A (en) | Polyamide containing diacetylene group | |
| SU444411A1 (en) | The method of obtaining carbochain polymers | |
| Matsumoto et al. | Synthesis and Radical Polymerization of Adamantyl-Containing Maleic and Fumaric Esters Leading to Formation of Thermally Stable Poly (substituted methylene) s with a Rigid Chain Structure. | |
| US5182320A (en) | Material for light-heat energy accumlation and conversion | |
| JPS6063208A (en) | 4-hydroxy-4'-vinylbiphenyl polymer and its production | |
| JPH06306040A (en) | Photopolymerizable diacetylene compound | |
| Sato et al. | Synthesis and Polymerization of (S)-4-Methyl-2-N, N-dimethylaminopentyl Methacrylate | |
| Ueda et al. | Radical polymerization of 4‐methylene‐4H‐1, 3‐benzodioxin‐2‐ones: Cyclic α‐substituted styrenes | |
| SU994468A1 (en) | Polyvinyl perimidines as photosensitive materials and process for producing the same |