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JPS5919912A - Immersion distance holding device - Google Patents

Immersion distance holding device

Info

Publication number
JPS5919912A
JPS5919912A JP57129065A JP12906582A JPS5919912A JP S5919912 A JPS5919912 A JP S5919912A JP 57129065 A JP57129065 A JP 57129065A JP 12906582 A JP12906582 A JP 12906582A JP S5919912 A JPS5919912 A JP S5919912A
Authority
JP
Japan
Prior art keywords
detector
sample
pressure
liquid
suction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57129065A
Other languages
Japanese (ja)
Inventor
Yoshio Kawamura
河村 喜雄
Akihiro Takanashi
高梨 明紘
Toshishige Kurosaki
利栄 黒崎
Shinji Kuniyoshi
伸治 国吉
Sumio Hosaka
純男 保坂
Tsuneo Terasawa
恒男 寺澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57129065A priority Critical patent/JPS5919912A/en
Publication of JPS5919912A publication Critical patent/JPS5919912A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70341Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/33Immersion oils, or microscope systems or objectives for use with immersion fluids

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Microscoopes, Condenser (AREA)
  • Automatic Focus Adjustment (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To prevent the resolving power of an optical system from decreasing by equipping a control system with a reference device which has flow rate resistance similar to that of the opening part of a detector and a suction path with flow rate resistance similar to that of a suction path for liquid from the detector. CONSTITUTION:An amplification control circuit 10 drives a sample table 8 so that the output of a piezoelectric transducer 9, i.e. pressure in the detector 3 is constant. When the suction pressure of a suction source 11 fluctuates, the detected pressure in the detector 3 also varies to cause malfunction apparently as if an interval (h) were varied. For this purpose, the reference device which has a restrictor 14 with flow rate resistance similar to flow rate resistance depending upon the interval between the detector opening part 19 and a sample 17 and a restrictor 13 similar to a restrictor 12 is coupled with the suction source 11. Consequently, the variation with the pressure difference between the detected pressure and reference pressure is eliminated and the piezoelectric transducer 9 transduces this pressure difference into an electric signal; and the amplification control circuit 10 drives the sample table so that its output value is constant. Therefore, the malfunction of the control system is eliminated and a decrease in the resolving power of the optical system is prevented.

Description

【発明の詳細な説明】 本発明は、液浸型光学装置における試料の位置決め・保
持を行なうための液浸距離保持装置に関するもので、特
に液中の試料にパターンを投影する露光装置の自動焦点
合わせに好適な距離保持装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an immersion distance maintaining device for positioning and holding a sample in an immersion type optical device, and in particular to an automatic focusing device for an exposure device that projects a pattern onto a sample submerged in liquid. The present invention relates to a distance keeping device suitable for use in conjunction with the present invention.

光学レンズを用いてパターンを観察したり、投影したり
する光学装置において、対物レンズの解像力を向上させ
る手法として、開口数NAを高めることは公知である。
In an optical device that uses an optical lens to observe or project a pattern, increasing the numerical aperture NA is a known method for improving the resolving power of an objective lens.

その手法として対物レンズと試料との間の媒体物の屈折
率を高めるだめ、液体を介在させることが知られている
。乙の手法を用いた光学装置としては液浸型顕微鏡が製
品化されている。液浸型顕微鏡の試料に対する焦点合わ
せは、目視による調整が行彦われているにすぎず自動的
に合焦点する手段は確立されていない。
As a method for this purpose, it is known to interpose a liquid between the objective lens and the sample in order to increase the refractive index of the medium. An immersion microscope has been commercialized as an optical device using the method described above. Focusing of an immersion microscope on a sample is performed only by visual adjustment, and no means for automatically focusing has been established.

顕微鏡の場合は、目視により調整することで支障をきた
さ々いが、露光装置、特に半導体集積回路等の製造工程
で用いられる露光装置(以下単に露光装置という。)で
は高速高精度に自動的に焦点合わせを行なうことが要求
されてくる。
In the case of a microscope, it is difficult to make adjustments visually, but exposure equipment, especially exposure equipment used in the manufacturing process of semiconductor integrated circuits (hereinafter simply referred to as exposure equipment), can automatically adjust the adjustment at high speed and with high precision. Focusing is required.

また既存の液浸型顕微鏡では、対物レンズの先端に付着
した気l(シな容易に除去することが難しく、光学系の
解像力な低下させてしまう欠点があった。
In addition, existing immersion microscopes have the disadvantage that it is difficult to easily remove the particles attached to the tip of the objective lens, which reduces the resolution of the optical system.

本発明の目的シ1゛、液中にある試料を観察したり、試
料にパターンを膜形したりする光学装置において、その
焦点位置に試料を高精度に自動的に位置決め保持すると
ともに、対物レンズに付着した気泡を容易に除去するこ
とを可能ならしめた装置を提供することにある。
The object of the present invention is to automatically position and hold the sample at its focal position with high precision in an optical device for observing a sample in a liquid or forming a pattern on the sample, and to use an objective lens. It is an object of the present invention to provide a device which makes it possible to easily remove air bubbles attached to the surface of the object.

本願の発明者らは、露光装置において、解像力をあげる
ため試料を液浸にする手段を開発しており、既に特許出
願(特願昭56−37977号)さねている。また、試
料上のパターンを検出する上での解像力を向上させる手
段が開発され、特許出願(特願昭57−84784号)
されている。これらの液浸型の露光装置に用いられてい
る大口径レンズ(対物レンズ)の焦点を自動的に合わせ
る装置が必要となっており、本発明はそれを解決するだ
めになされたものである。
The inventors of the present application have developed a means for immersing a sample in liquid in order to improve resolution in an exposure apparatus, and have already filed a patent application (Japanese Patent Application No. 56-37977). In addition, a means to improve resolution in detecting patterns on a sample was developed, and a patent application was filed (Japanese Patent Application No. 84784/1984).
has been done. There is a need for a device that automatically focuses the large diameter lens (objective lens) used in these immersion type exposure devices, and the present invention was made to solve this problem.

以下、本発明を実施例によって詳細に説明する。Hereinafter, the present invention will be explained in detail with reference to Examples.

第1図は本発明の装置の一実施例の構成説明図である。FIG. 1 is an explanatory diagram of the configuration of an embodiment of the apparatus of the present invention.

図において、1は光学装置(露光装置)の光学部材(対
物レンズ)、2はレンズ鏡筒、乙はレンズ鏡筒2の下端
に設けられた検出器、4は液体の吸引孔、5は検出器6
に設けられた圧力検出孔、6は液浸用の液体、7は試料
、8は駆動装置を含む試料台、9は検出した圧力を電気
信号に変換して出力する圧電変換器、10は増幅制御回
路、11は液体の吸引源、12. 13. 14は液体
の流量を調整する絞り、15は液溜器、16はフィルタ
、17は液体乙の供給用吸引源、18はフィルタ、19
は検出器6の開口部である。
In the figure, 1 is the optical member (objective lens) of the optical device (exposure device), 2 is the lens barrel, B is the detector provided at the lower end of the lens barrel 2, 4 is the liquid suction hole, and 5 is the detection Vessel 6
6 is a liquid for immersion, 7 is a sample, 8 is a sample stage including a driving device, 9 is a piezoelectric transducer that converts the detected pressure into an electrical signal and outputs it, 10 is an amplification control circuit; 11 is a liquid suction source; 12. 13. 14 is a throttle that adjusts the flow rate of the liquid, 15 is a liquid reservoir, 16 is a filter, 17 is a suction source for supplying liquid B, 18 is a filter, 19
is the aperture of the detector 6.

検出器5は露光装置の対物レンズあるいは光学部材1と
試料7との間の光路で形成される空間とほぼ同一形状に
作られ、し/ズ鏡筒2の下端に連結されている。なお、
検出器3の構造を光学系の光路とほぼ同一としている理
由は、試料台の位置を制御する際の応答特性を良くする
ためである。
The detector 5 is made to have substantially the same shape as the space formed by the optical path between the objective lens of the exposure apparatus or the optical member 1 and the sample 7, and is connected to the lower end of the lens barrel 2. In addition,
The reason why the structure of the detector 3 is made almost the same as the optical path of the optical system is to improve the response characteristics when controlling the position of the sample stage.

通常の露光装置に用いられる対物レンズは、開口径が3
[]mmφ以上、結像面積が15mmφ以上と大きく、
この2つの径で形作られる円錐台状の空間が光路となり
、かなりの容積を占める。この容積を必要最小限とする
ことで応答特性が向上する。
The objective lens used in normal exposure equipment has an aperture diameter of 3
[ ] mmφ or more, the imaging area is large, 15 mmφ or more,
The truncated cone-shaped space formed by these two diameters becomes the optical path and occupies a considerable volume. By minimizing this volume, response characteristics are improved.

試料7は光学系の光軸方向に可動な試料台8の上に固定
され、感光材の塗布された試料7の表面は液浸用の液体
6で被われている。
The sample 7 is fixed on a sample stage 8 that is movable in the direction of the optical axis of the optical system, and the surface of the sample 7 coated with a photosensitive material is covered with an immersion liquid 6.

試料台8の構造は光軸方向に可動である公知の移動手段
を使用できる。
For the structure of the sample stage 8, a known moving means movable in the optical axis direction can be used.

検出器3の上方隅には吸引孔4が設けられ、管により流
量抵抗要素である絞り12を経て、吸引源11に接続し
ている。ここで吸引源11を作動すると検出器乙の内部
が負の圧力となり、液体6が検出器の開口部19より流
入する。流入した液体は、吸引源11 とフィルタ16
を経て液溜器15に送られる。一定の圧力で吸引源11
を作動させると、検出器乙の内部の圧力は、検出器6と
試料7との間隔1]の大きさに応じて変化する。例えば
間隔11が小さくなると、検出器5内の負の圧力値の絶
対値が大きくなる。反対に間隔11が大きくなると負の
圧力値の絶対値は小さくなる。このように検出器6の内
部の圧力は間隔1〕に見合ったものとなる。検出器6に
は圧力検出孔5が設けられ、管により圧電変換器9に接
続している。圧電変換器9は圧力を電気信号に変換して
増幅制御回路10を経て、試料台8に付設されている駆
動系に接続されている。増幅制御回路10は圧電変換器
9の出力が一定、すなわち検出器3内の圧力(すなわち
間隙h)が一定値となるように試料台8を駆動させる。
A suction hole 4 is provided in the upper corner of the detector 3 and is connected by a tube to a suction source 11 via a flow resistance element 12 . When the suction source 11 is activated here, a negative pressure is created inside the detector B, and the liquid 6 flows in through the opening 19 of the detector. The inflowing liquid is passed through the suction source 11 and the filter 16.
The liquid is sent to the liquid reservoir 15 through the. Suction source 11 with constant pressure
When activated, the pressure inside the detector B changes depending on the size of the distance 1] between the detector 6 and the sample 7. For example, the smaller the distance 11, the larger the absolute value of the negative pressure value within the detector 5. Conversely, as the distance 11 increases, the absolute value of the negative pressure value decreases. In this way, the pressure inside the detector 6 is commensurate with the interval 1]. The detector 6 is provided with a pressure detection hole 5 and is connected to a piezoelectric transducer 9 via a tube. The piezoelectric transducer 9 converts pressure into an electrical signal and is connected to a drive system attached to the sample stage 8 via an amplification control circuit 10. The amplification control circuit 10 drives the sample stage 8 so that the output of the piezoelectric transducer 9 is constant, that is, the pressure within the detector 3 (that is, the gap h) is constant.

一方、吸引源11の吸引圧力が変動すると検出器6内の
検出圧力も変動し、見かけ上間隔りが変わったかのよう
に誤動作してしまう。このような吸引源の圧力変動を除
去するため、本実施例の制御系では参照器を設けである
。参照器は、検出器開口部19と試料7との間隔で形成
される流量抵抗と同等の流量抵抗を有する絞り14およ
び絞り12と同等の絞り16を備えて構成され、吸引源
11に継がっている。絞り14の一端は液溜器15の液
中にその開11部を浸しており、絞り14の他端と絞り
16との間の圧力は管により参照圧として圧電変換器9
につながっている。絞り13の他端は吸引源11に継が
っている。参照器と検出器は吸引源を同一とするため、
吸引源11の圧力変動が同等に伝わるため、検出圧と参
照圧の圧力差に対する変動がなくなる。この場合圧電変
換器9はこの検出圧と参照圧の圧力差を電気変換するこ
とになる。また増幅制御回路10は圧電変換器9からの
出力値す々わち上記圧力差が一定になるように試料台8
を駆動制御する。
On the other hand, if the suction pressure of the suction source 11 fluctuates, the detected pressure within the detector 6 also fluctuates, resulting in malfunction as if the apparent interval has changed. In order to eliminate such pressure fluctuations of the suction source, a reference device is provided in the control system of this embodiment. The reference device includes a diaphragm 14 and a diaphragm 16 that have a flow resistance equivalent to that formed by the distance between the detector opening 19 and the sample 7 and a diaphragm 16 that is equivalent to the diaphragm 12, and is connected to the suction source 11. ing. One end of the throttle 14 has its aperture 11 immersed in the liquid in the liquid reservoir 15, and the pressure between the other end of the throttle 14 and the throttle 16 is measured by a pipe as a reference pressure by a piezoelectric transducer 9.
connected to. The other end of the diaphragm 13 is connected to the suction source 11. Since the reference device and detector have the same suction source,
Since the pressure fluctuations of the suction source 11 are equally transmitted, there is no fluctuation due to the pressure difference between the detection pressure and the reference pressure. In this case, the piezoelectric transducer 9 electrically converts the pressure difference between the detected pressure and the reference pressure. Further, the amplification control circuit 10 controls the sample stage 8 so that the output value from the piezoelectric transducer 9, that is, the above-mentioned pressure difference, is constant.
to drive and control.

検出圧と参照圧の一定の圧力差を零にするように制御さ
せる方式をとると、増幅制御回路10のドリフトを補正
することが容易となる。すなわち吸引源11を動作させ
ない状態で増幅制御回路10の出力が零となるように回
路を補正すれば良いことになる。
If a method is adopted in which the pressure difference between the detected pressure and the reference pressure is controlled to be zero, it becomes easy to correct the drift of the amplification control circuit 10. That is, it is sufficient to correct the circuit so that the output of the amplification control circuit 10 becomes zero when the suction source 11 is not operated.

壕だ増幅制御回路10に一定の電圧を外部回路によって
付加できるようにしておくと、試料台の位置に任意のオ
フセットを与えることもできる。
If a constant voltage can be applied to the trench amplification control circuit 10 by an external circuit, an arbitrary offset can be given to the position of the sample stage.

上記の2通りの回路の詳細については、例えば本願の発
明者らが出願している実願昭56−181162号に述
べられており、本発明にも同様に適用することができる
Details of the above two types of circuits are described in, for example, U.S. Pat.

試料7上の液体6は液溜器15から適当な吸引源17と
フィルタ18を経て適量だけ供給され、検出器乙の先端
が浸る状態になされている。
An appropriate amount of the liquid 6 on the sample 7 is supplied from the liquid reservoir 15 through a suitable suction source 17 and filter 18, so that the tip of the detector 2 is immersed therein.

以上述べたように構成され動作する本発明の装置では、
液浸型露光装置の光学系の合焦点位置に試料面が来るよ
うに、一度だけ間隔りを設定することで、自動焦点合わ
せが可能となる。
In the apparatus of the present invention configured and operated as described above,
Automatic focusing is possible by setting the interval only once so that the sample surface is at the focal point position of the optical system of the immersion exposure apparatus.

本発明の実施にあたり、液体は検出器乙の開口部19よ
り吸引することを特徴としている。これは、検出器6内
や光学部材1の下部に付着した気泡を除去するのに極め
て有効なだめである。吸引源11を供給源と置きかえ、
検出器より液体を噴出する方法でも、間隙1]に見合っ
た圧力は検出できるが、検出器に生じた気泡を除去する
ためには吸引源を用いることが望ましい。従って光学部
材が実施例のように上方にある場合等、すなわち液中に
生じた気泡が閉じこめられてしまう構造の場合には気泡
による光路の乱れを除くため吸引することが必要となる
In carrying out the present invention, the liquid is sucked through the opening 19 of the detector B. This is an extremely effective measure for removing air bubbles adhering to the inside of the detector 6 and the lower part of the optical member 1. Replace the suction source 11 with a supply source,
Although the method of ejecting liquid from the detector can also detect a pressure commensurate with the gap 1], it is preferable to use a suction source to remove air bubbles generated in the detector. Therefore, when the optical member is located above as in the embodiment, ie, when the structure is such that bubbles generated in the liquid are trapped, suction is required to remove the disturbance of the optical path caused by the bubbles.

本実施例において、検出器の開口部19の径6mmφ9
間隙h250μmの場合に、液体としてH2Oを用いて
、検出圧−1200mm Aq (ゲージ圧)、流量0
.6 e/min  で、試料の位置の検出感度として
2.5 mm Aq 7μmが得られている。この検出
感度がある場合には±0.1μm程度の精度で試料の位
置決め保持が自動的にできることが認められている。
In this embodiment, the diameter of the opening 19 of the detector is 6 mmφ9.
When the gap h is 250 μm, using H2O as the liquid, the detection pressure is -1200 mm Aq (gauge pressure), and the flow rate is 0.
.. At 6 e/min, a sample position detection sensitivity of 2.5 mm Aq 7 μm was obtained. It is recognized that when this detection sensitivity is present, it is possible to automatically position and hold the sample with an accuracy of approximately ±0.1 μm.

なお、上記実施例に示したデータ値は一例にすぎず、液
体の粘度、対物レンズの光路寸法等に応じて適宜変わり
うろことは容易に考えられる。
It should be noted that the data values shown in the above embodiments are merely examples, and can easily be changed as appropriate depending on the viscosity of the liquid, the optical path dimension of the objective lens, etc.

また、本発明の装置は、液浸用液体を循環させることが
できるため、液浸用液体のフィルタリングや温度調整さ
らには2種類以上の液体を切り換えて供給することも可
能である。
Furthermore, since the device of the present invention can circulate the immersion liquid, it is also possible to filter the immersion liquid, adjust the temperature, and switch between two or more types of liquids.

また、本発明の装置は単に露光装置の・みならず9、液
中で距離を高精度に位置決め・保持することを必要とす
る装置に広く応用できることは言うまでもないことであ
る。
It goes without saying that the apparatus of the present invention can be widely applied not only to exposure apparatuses, but also to apparatuses that require highly accurate positioning and maintenance in liquid.

以上説明したように、本発明の装置によれば、液浸型の
光学装置において、試料の位置を光学系の所定の合焦点
位置に自動的に高精度に位置決め・保持することが可能
に々す、しかも対物レンズに付着する気泡を容易に除去
することができるので、光学系の解像力低下を防止する
ことが可能になる。
As explained above, according to the apparatus of the present invention, in an immersion type optical apparatus, it is possible to automatically position and hold the sample at a predetermined focal point position of the optical system with high precision. Furthermore, since air bubbles adhering to the objective lens can be easily removed, it is possible to prevent a decrease in the resolution of the optical system.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の装置の一実施例の構成説明図である。 1・・光学部拐(交]物レンズ) 2・・レンズ鏡筒    3・・検出器4・液体の吸引
孔   5・・・圧力検出孔6・・・液浸用の液体  
 7・試料 8・・試料台      9・・・圧電変換器10・増
幅制御回路  11・・吸引源12.13.14・・絞
り 15・・・液溜器16・・・フィルタ     1
7・・・液体供給用吸引源18・・・フィルタ    
 19・・・検出器の開口部代理人弁理士 中村純之助 第1 図 国分寺市東恋ケ窪−丁目280番 地株式会社日立製作所中央研究 所内 0発 明 者 寺澤恒男 国分寺市東恋ケ窪−丁目280番 地株式会社日立製作所中央研究 所内
FIG. 1 is an explanatory diagram of the configuration of an embodiment of the apparatus of the present invention. 1. Optical ablation (interchangeable) lens 2. Lens barrel 3. Detector 4. Liquid suction hole 5. Pressure detection hole 6. Immersion liquid
7.Sample 8..Sample stage 9..Piezoelectric transducer 10.Amplification control circuit 11..Suction source 12.13.14..Aperture 15..Liquid reservoir 16..Filter 1
7...Liquid supply suction source 18...Filter
19...Detector opening Patent attorney Junnosuke Nakamura No. 1 Figure 280 Higashi-Koigakubo-chome, Kokubunji City, Hitachi, Ltd. Central Research Laboratory 0 Inventor: Tsuneo Terasawa, 280 Higashi-Koigakubo-chome, Kokubunji City, Hitachi, Ltd. Chuo Inside the research institute

Claims (2)

【特許請求の範囲】[Claims] (1)液体中の試才1を観察したりあるいは液体中の試
料に像を投影−1−る光学装置における光学系の合焦点
位置に」二記試旧を位置決め・保持するための液浸距離
保持装置であって、上記光学系のレンズ鏡筒下端部に該
光学系の部材と試料の間の光学光路とほぼ同一形状を有
する検出器と、該検出器の開口部より吸引源甘だは供給
源によって液体を吸引せたは供給する吸引系路捷たは供
給系路を備えた検出系を設け、がっ、上記検出器と試料
の間の距離に対応した検出器内の圧力を検出し電気信号
を出力する圧電変換器と、該圧電変換器の出方を用いて
試料を合焦点位置に位置決め・保持せしめる移動制御機
構を設けて構成したことを特徴とする液浸距離保持装置
(1) Liquid immersion for positioning and holding the sample at the focal point of the optical system in an optical device for observing the sample in liquid or projecting an image onto a sample in liquid. The distance maintaining device includes a detector having approximately the same shape as the optical path between the optical system member and the sample at the lower end of the lens barrel of the optical system, and a suction source located closer to the opening of the detector. A detection system is provided with a suction system route or a supply route for sucking or supplying liquid by a supply source, and the pressure inside the detector is adjusted according to the distance between the detector and the sample. A liquid immersion distance holding device comprising a piezoelectric transducer that detects and outputs an electric signal, and a movement control mechanism that positions and holds a sample at a focused position using the direction of the piezoelectric transducer. .
(2)前記検出系は、前記検出器の開口部と同等の流量
抵抗を有しかつ該検出器からの液体の吸引系路捷だは供
給系路と同等の流量抵抗の吸引、系路捷たは供給系路を
有する参照器を具備し、前記移動制御機構は、前記圧力
変換器の出力を入力する増幅制御回路を備え、」−記参
照器と検出器とを同一の吸引源に接続し、該参照器内の
参照圧力と該検出器内の検出圧力との圧力差が一定の値
と々るように上記移動制御機構を駆動制御するものであ
る特許請求の範囲第1項記載の液浸距離保持装置(ロ)
  ^11記増幅利御回路は、所定の電圧を外部回路か
ら付加することが可能な構成とし、該付加電圧により前
記移動制御機構を駆動せしめ試料を所望の位置に設定可
能ならしめたものである特許請求の範囲第2項記載の液
浸距離保持装置。
(2) The detection system has a flow resistance equivalent to that of the opening of the detector, and has a suction system path for liquid from the detector or a flow resistance similar to that of the supply system path. The movement control mechanism includes an amplification control circuit that inputs the output of the pressure transducer, and the reference device and the detector are connected to the same suction source. and the movement control mechanism is driven and controlled so that the pressure difference between the reference pressure in the reference device and the detected pressure in the detector remains at a constant value. Liquid immersion distance maintaining device (b)
^11 The amplification control circuit has a configuration in which a predetermined voltage can be applied from an external circuit, and the added voltage drives the movement control mechanism so that the sample can be set at a desired position. A liquid immersion distance maintaining device according to claim 2.
JP57129065A 1982-07-26 1982-07-26 Immersion distance holding device Pending JPS5919912A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57129065A JPS5919912A (en) 1982-07-26 1982-07-26 Immersion distance holding device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57129065A JPS5919912A (en) 1982-07-26 1982-07-26 Immersion distance holding device

Publications (1)

Publication Number Publication Date
JPS5919912A true JPS5919912A (en) 1984-02-01

Family

ID=15000212

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57129065A Pending JPS5919912A (en) 1982-07-26 1982-07-26 Immersion distance holding device

Country Status (1)

Country Link
JP (1) JPS5919912A (en)

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