JPS5942622A - Thin film magnetic head - Google Patents
Thin film magnetic headInfo
- Publication number
- JPS5942622A JPS5942622A JP15208982A JP15208982A JPS5942622A JP S5942622 A JPS5942622 A JP S5942622A JP 15208982 A JP15208982 A JP 15208982A JP 15208982 A JP15208982 A JP 15208982A JP S5942622 A JPS5942622 A JP S5942622A
- Authority
- JP
- Japan
- Prior art keywords
- soft magnetic
- film
- thin film
- gap portion
- magnetic head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 34
- 239000010408 film Substances 0.000 claims abstract description 53
- 239000010410 layer Substances 0.000 claims abstract description 28
- 239000002356 single layer Substances 0.000 claims abstract description 16
- 239000000696 magnetic material Substances 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 10
- 239000004020 conductor Substances 0.000 claims abstract description 6
- 239000007779 soft material Substances 0.000 claims 1
- 230000001681 protective effect Effects 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 2
- 229910052593 corundum Inorganic materials 0.000 abstract 2
- 239000005416 organic matter Substances 0.000 abstract 2
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 abstract 1
- 230000008719 thickening Effects 0.000 abstract 1
- 230000004907 flux Effects 0.000 description 12
- 239000011368 organic material Substances 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000005381 magnetic domain Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/313—Disposition of layers
- G11B5/3143—Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding
- G11B5/3146—Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding magnetic layers
- G11B5/3153—Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding magnetic layers including at least one magnetic thin film coupled by interfacing to the basic magnetic thin film structure
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/3116—Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
本発明に磁気記録装置に用いられる薄膜磁気ヘッドに関
する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a thin film magnetic head used in a magnetic recording device.
第１図は近年に実用化されつつおる薄膜磁気ヘッドの概
略断面図である。FIG. 1 is a schematic cross-sectional view of a thin film magnetic head that has been put into practical use in recent years.
図において、基板１１上にＭ２Ｏ３等の絶縁層１２が形
成され１次いで軟磁性体からなる下部ボール１３がメッ
キ法、蒸着法あるいにスパッタ法により形成される０こ
のめと、ギャップとなるＡｌｔ Ｏｓ等の絶縁層１４が
成膜される。次いで、フォトレジスト等の有機物からな
る絶縁層１５が形成され、さらに、導体材料からなるコ
イル１６が形成され、コイル１６を埋込むように再度フ
ォトレジスト等の有機物からなる絶縁層１７が形成され
、そのおと、軟磁性体からなる上部ボール１８が下部ボ
ール１３と同様にして形成され、最後に−Ａ−１２０ｓ
等の絶縁物からなる保護膜１９が形成され、薄膜磁気ヘ
ッドのトランスデ瓢−サーが構成されている。In the figure, an insulating layer 12 such as M2O3 is formed on a substrate 11, and then a lower ball 13 made of a soft magnetic material is formed by plating, vapor deposition, or sputtering. An insulating layer 14 such as Os is formed. Next, an insulating layer 15 made of an organic material such as photoresist is formed, a coil 16 made of a conductive material is further formed, and an insulating layer 17 made of an organic material such as photoresist is again formed so as to bury the coil 16. After that, the upper ball 18 made of soft magnetic material is formed in the same manner as the lower ball 13, and finally -A-120s
A protective film 19 made of an insulator such as the above is formed to constitute a transducer of the thin film magnetic head.
このような構造を有する薄膜磁気ヘッドにおいて、高ビ
ツト密度記録２例えば、 ２５０００Ｂ Ｐ Ｉ （Ｂ
ｉｔ Ｐｅｒ Ｔｎｃｈ）以上の密度で記録を行なう場
合は、上部ボール１８および下部ボール１３の膜厚はｂ
血以下とせざるをえず、この場合、上部ボール１８．下
部ボール１３を構成する軟磁性体のμ厚が薄いため、磁
気抵抗が増大し、上部ボール１８および下部ボール１３
が磁気的に飽和してしまい薄膜磁気ヘッドの記録再生（
以下＋Ｖと略称）効率、特に書込み効率が低下し、薄膜
磁気ヘッドの書込み特性が劣化するという欠点がある。In a thin film magnetic head having such a structure, high bit density recording 2, for example, 25000B P I (B
When recording at a density higher than (it per Tnch), the film thickness of the upper ball 18 and the lower ball 13 is b.
In this case, the upper ball 18. Since the soft magnetic material constituting the lower ball 13 has a small μ thickness, the magnetic resistance increases, and the upper ball 18 and the lower ball 13
becomes magnetically saturated and the recording/reproduction of the thin-film magnetic head (
(hereinafter abbreviated as +V) efficiency, particularly writing efficiency, decreases, and the writing characteristics of the thin film magnetic head deteriorate.
このような欠点を解決するため、従来、第２図に示すよ
うな断面構造を有する薄膜磁気ヘッドが提案されている
〇
図において、軟磁性体からなる下部ボール２３および上
部ボール２８のインナーギャップ部Ｂおよびリアギャッ
プ部ＣＫおける膜厚がフロントギャップ部人の膜厚に比
較して大きくなるような構造を有しており、上部ボール
２８．および下部ボール２３の磁気抵抗を下げ１両ボー
ルの磁気的な飽和を抑制した構造となっている。In order to solve these drawbacks, a thin film magnetic head having a cross-sectional structure as shown in FIG. 2 has been proposed. It has a structure in which the film thickness at the upper ball 28. Also, the structure is such that the magnetic resistance of the lower ball 23 is lowered and magnetic saturation of one ball is suppressed.
しかしながら、このような構造を有する薄膜磁気ヘッド
に、以下のような欠点を有している０すなわち、下部ボ
ール２３の膜厚が基板２１と反対側つまり上部ボール２
８側に厚くしたステップ構造となっているため、以後の
プロセスで下部ボール２３上に積層される６膜の形成、
およびこれらの膜ヲパターン化するための７オトレジス
トノ（ターンの形成が、このステップ構造による段差の
ために困難とな）、薄膜磁気ヘッドの生産性が低下する
という製造プロセス上の問題点がある。しかモ、前述の
ステップ構造のため、上部ボール２８の経験する段差は
第１図のような断面構造を有する薄膜磁気ヘッドの上部
ボール（第１図の１８）に比較して大きなものとなるた
め、フロントギャップ部Ａとインナーギャップ部Ｂとの
間の勾配部およびインナー・ギャップ部Ｂとリア・ギャ
ップ部Ｃとの間の勾配部において上部ボール２８の磁気
特性の劣化を招くという欠点もある。更に、第２図のよ
うな断面構造を有する薄膜磁気ヘッドにおいては％書込
みおよび読出し時の磁束の流れに問題がありルＷ特性が
劣化するという欠点がある。However, the thin film magnetic head having such a structure has the following drawbacks. Namely, the film thickness of the lower ball 23 is on the side opposite to the substrate 21, that is, the upper ball 2
Since the step structure is thickened on the 8 side, the formation of 6 films that will be laminated on the lower ball 23 in the subsequent process,
Furthermore, there is a problem in the manufacturing process that the productivity of the thin film magnetic head is reduced due to the need for a seven-layer resist for patterning these films (formation of turns is difficult due to the step structure). However, because of the step structure mentioned above, the step experienced by the upper ball 28 is larger than that of the upper ball (18 in FIG. 1) of a thin film magnetic head having a cross-sectional structure as shown in FIG. Another drawback is that the magnetic properties of the upper ball 28 are deteriorated in the slope between the front gap part A and the inner gap part B and the slope part between the inner gap part B and the rear gap part C. Furthermore, a thin film magnetic head having a cross-sectional structure as shown in FIG. 2 has a problem in the flow of magnetic flux during writing and reading, resulting in a deterioration of the W characteristics.
以下、この点につき、第２図のＤ部拡大図である第３図
を参照しながら説明する。This point will be explained below with reference to FIG. 3, which is an enlarged view of section D in FIG. 2.
第３図において、参照数字３３は下部ボール。In Figure 3, reference numeral 33 indicates the lower ball.
同数字３４′はギャップとなる絶縁層、同数字３５゜３
７は有機物からなる絶縁層、同数字３８は上部ボール、
又、同数字３９は保護膜である０尚１図の煩雑さを避け
るために、上部ボール３８．下部ボール３３のハツチン
グは省略して示しである。The same number 34' is the insulating layer that becomes the gap, the same number 35°3
7 is an insulating layer made of organic material, the same number 38 is an upper ball,
Also, the same number 39 is a protective film, and in order to avoid complication in Figure 1, the upper ball 38. The hatching of the lower ball 33 is omitted from illustration.
先ず、書込み時においては、各コイル（図示てれていな
い）Ｋ通電された電流によって生じた磁束（図中、実線
の矢印で示す。以下矢印りと呼ぶ）に、例えば、下部ボ
ール３３のインナー・キャップ部を流れ１次いで、フロ
ントギャップ部を通り。First, at the time of writing, the magnetic flux (indicated by solid arrows in the diagram, hereinafter referred to as arrows) generated by the current applied to each coil (not shown) is applied to the inner part of the lower ball 33, for example.・Flows through the cap part, then passes through the front gap part.
磁気記録媒体に入シ所定の情報を書込んだあと。After writing predetermined information into a magnetic recording medium.
上部ボール３８のフロントギャップ部を通り１次いでイ
ンナー・ギャップ部、リア・ギャップ部を通過して、下
部ボール３３に流れ込むこととなる。It flows into the lower ball 33 through the front gap of the upper ball 38, then through the inner gap and rear gap.
しかしながら、下部ボール３３に前述のようなステップ
構造がある場合には、第３図の矢印りの流れのように、
その大半が、このステップ部から。However, if the lower ball 33 has a step structure as described above, as shown in the flow shown by the arrow in FIG.
Most of it comes from this step part.
直接上部ボール３８に漏洩して流れ込むこととなり、結
果として、フロント・ギャップ部に達する磁束量が減少
してしまめ、十分な書込み動作が行なわれないことにな
る。The magnetic flux directly leaks and flows into the upper ball 38, and as a result, the amount of magnetic flux reaching the front gap portion is reduced, and a sufficient write operation cannot be performed.
一方、読出し時においては、既に記録媒体上に書込まれ
た情報からの漏洩磁束（図中、破線の矢印で示す。以下
矢印Ｅと呼ぶ）ニ、例えば、上部ボール３８のフロント
・ギャップ部に入ったあと。On the other hand, during reading, leakage magnetic flux from information already written on the recording medium (indicated by a broken line arrow in the figure, hereinafter referred to as arrow E) is caused, for example, to the front gap part of the upper ball 38. After entering.
第３図の矢印Ｅの流れのよう［、インナー・ギャップ部
側に向うよりもむしろ、下部ボール３３のステップ部に
漏洩してしまい、下部ボール３３のフロント・ギャップ
部を通過して、再び記録媒体面に戻ってしまうこととな
る。このため、上部ボール３８のインナー・ギャップ部
を通シ、リアギャップ部を通過して、下部ボール３３の
インナーギャップ部を通って下部ボール３３のフロント
ギャップ部から記録媒体面に戻る磁束量、すなわち、コ
イルと交叉する磁束量が減少し、再生出力が低下するこ
ととなる。As shown by arrow E in FIG. 3, the leakage leaks to the step part of the lower ball 33, passes through the front gap part of the lower ball 33, and is recorded again, rather than toward the inner gap part. This brings us back to the media aspect. Therefore, the amount of magnetic flux that passes through the inner gap of the upper ball 38, passes through the rear gap, passes through the inner gap of the lower ball 33, and returns from the front gap of the lower ball 33 to the recording medium surface, i.e. , the amount of magnetic flux crossing the coil decreases, resulting in a decrease in reproduction output.
以上、述べてきたように、第２図のような断面構造を有
する薄膜磁気ヘッドにおいてに書込みおよび読出し時に
おいて、磁束が有効に上部および下部ボールの中を通ら
ず８ｙＷ特性が低下するという欠点がある。As mentioned above, when writing and reading in a thin film magnetic head having a cross-sectional structure as shown in Fig. 2, the drawback is that the magnetic flux does not effectively pass through the upper and lower balls, resulting in a deterioration of the 8yW characteristics. be.
本発明の目的は以上述べてきた従来の薄膜磁気ヘッドの
諸欠点を解決した生産性が高くかつルＷ特性の優れた薄
膜磁気ヘッドを提供することにあるＯ
本発明によれば、軟磁性体材料からなる上部および下部
ボールの間に導体材料を挾んだ薄膜磁気ヘッドにおいて
、下部ボールの下地層ないしは基板に対して前記下部ボ
ールのインナー・ギャップ部およびリア・ギャップ部に
相当する部分に予め形成された所定形状の窪みに対して
、前記窪みを埋めるよう定形酸された第１の軟磁性体単
層膜とフロント・ギャップ部、インナー・ギャップ部お
よびリア・ギャップ部にわたって前記第１の軟磁性体単
層膜上に形成された所定ポール形状を有する第１の軟磁
性体多層膜との積層体を下部ボールとなし、ギャップ層
コイル等を形成後、フロント・ギャップ部、インナー・
ギャップ部およびリア・ギャップ部にわたって形成され
た所定ポール形状を有する第２の軟磁性体多層膜と、前
記第２の軟磁性体多層膜上でかつインナー・ギャップ部
およびリアギャップ部に相当する部分に形成される第２
の軟磁性体単層膜との積層体を上部ボールと成すことを
特徴とする薄膜礎気ヘッドが得られる。An object of the present invention is to provide a thin-film magnetic head that solves the various drawbacks of the conventional thin-film magnetic head described above, has high productivity, and has excellent LeW characteristics.According to the present invention, a soft magnetic In a thin film magnetic head in which a conductive material is sandwiched between upper and lower balls made of a material, a conductive material is preliminarily applied to the base layer or substrate of the lower ball at a portion corresponding to the inner gap portion and rear gap portion of the lower ball. A first soft magnetic single layer film formed with a shaped acid is applied to the formed depression in a predetermined shape so as to fill the depression, and the first soft magnetic material is applied over the front gap, inner gap, and rear gap. A laminated body of a first soft magnetic multilayer film having a predetermined pole shape formed on a magnetic single layer film is used as a lower ball, and after forming gap layer coils, etc., the front gap portion, the inner
a second soft magnetic multilayer film having a predetermined pole shape formed across the gap portion and the rear gap portion; and a portion on the second soft magnetic multilayer film corresponding to the inner gap portion and the rear gap portion. the second formed in
A thin film core head is obtained, characterized in that the upper ball is a laminate with a single layer of soft magnetic material.
次に本発明について図面を参照して詳細に説明する。Next, the present invention will be explained in detail with reference to the drawings.
第４図において、基板４１上にＡｌ２Ｏ５等の絶縁層４
２が形成され１次いで、前記絶縁層４２のうち下部ボー
ルのインナー・ギャップ部およびリア・ギャップ部に相
当する領域を所定の深さＬだけエツチングにて除去して
所定形状の窪み全形成する０このあと、パーマロイ等か
らなる。厚みＬなる第１の軟磁性体単層膜４３を前記窪
みを埋めるように形成する。尚、この第１の軟磁性体単
層膜４３の形成は１例えば、前記窪み以外の領域を７オ
トレジストで被覆したあと、スルー・ホールメッキを施
こすことにより行なわれる。In FIG. 4, an insulating layer 4 of Al2O5 etc. is formed on a substrate 41.
2 is formed, 1. Next, regions of the insulating layer 42 corresponding to the inner gap portion and rear gap portion of the lower ball are removed by etching by a predetermined depth L to completely form a recess of a predetermined shape. After this, it consists of permalloy, etc. A first soft magnetic single layer film 43 having a thickness L is formed to fill the depression. The first soft magnetic single-layer film 43 is formed by, for example, coating the area other than the depression with photoresist, and then performing through-hole plating.
次いで、所定のボール形状を有する第１の軟磁性体多層
膜４４が積層して形成され、前記第１の軟磁性体多層膜
４３とこの第１の軟磁性体多層膜４４の積層体が下部ボ
ールとなる。このあと、ギャップとなるＡｌｚＯｓ等の
絶縁層４５が成膜され。Next, a first soft magnetic multilayer film 44 having a predetermined ball shape is laminated, and the laminated body of the first soft magnetic multilayer film 43 and the first soft magnetic multilayer film 44 is formed on the bottom. It becomes a ball. After this, an insulating layer 45 of AlzOs or the like is formed to form a gap.
次いで、有機物からなる絶縁層４６が形成され。Next, an insulating layer 46 made of organic material is formed.
さらに、導体材料からなるコイル４７が形成され。Furthermore, a coil 47 made of a conductive material is formed.
コイル４７を埋込むように再度有機物からなる絶縁層４
８が形成される。このあと、所定ポール形状を有するＮ
ｉＦｅ等からなる第２の軟磁性体多層膜４９が成膜され
１次いで、前記第２の軟磁性体多層膜４９上のインナー
・ギャップ部およびリア・ギャップ部に第２の軟磁性体
４Ｉ層膜５０が形成され、最後に、 ＡｌｚＯａ等から
なる保護膜５１が形成されて薄膜磁気ヘッドのトランス
デユーサ−が構成される。The insulating layer 4 made of an organic substance is again applied so as to embed the coil 47.
8 is formed. After this, N having a predetermined pole shape is
A second soft magnetic material multilayer film 49 made of iFe or the like is formed, and then a second soft magnetic material 4I layer is formed on the inner gap portion and rear gap portion on the second soft magnetic material multilayer film 49. A film 50 is formed, and finally a protective film 51 made of AlzOa or the like is formed to constitute a transducer of a thin film magnetic head.
このような構造を有する薄膜磁気ヘッドにおいては、第
１図に示したような従来タイプの薄膜磁気ヘッドとに異
なり、下部ボール（第１の軟磁性体単層膜４３と第１の
軟磁性体多層膜４４の積層体）および上部ボール（第２
の軟磁性体多層膜４９と第２の軟磁性体単層膜５０の積
層体）の膜厚がインナー・ギャップ部およびリア・ギャ
ップ部において厚くなっているため、下部ボールあるい
に上部ボールの磁気的な飽和が軽減されることとなる〇
一方、第２図に示したような従来タイプの改良ヘッドと
に異なり、下部ボール（第１の軟磁性体単層膜４３と第
１の軟磁性体多層膜４４との積層体）の膜厚がインナー
・ギャップ部、リア・ギャップ部において基板側に厚く
なるような逆ステッグ構造となっており、しかも前述し
たように予め絶縁層４２に形成された深さＬの所定形状
の窪みを埋めるように厚みＬの第１の軟磁性体単層膜４
３が形成されて平担化されているため、下部ボールすな
わち、第１の軟磁性体単層膜４３と第１の軟磁性体多層
膜４４の積層体による段差は軽減されている。In a thin film magnetic head having such a structure, unlike the conventional type thin film magnetic head shown in FIG. multilayer film 44) and the upper ball (second
The thickness of the laminated body of the soft magnetic multilayer film 49 and the second soft magnetic single layer film 50 is thicker in the inner gap portion and the rear gap portion. Magnetic saturation is reduced. On the other hand, unlike the conventional improved head shown in FIG. It has an inverted steg structure in which the film thickness of the multilayer structure (laminated with the magnetic multilayer film 44) becomes thicker toward the substrate at the inner gap and rear gap, and as described above, it is formed in advance on the insulating layer 42. A first soft magnetic single layer film 4 having a thickness L is filled in a predetermined shaped depression having a depth L.
3 is formed and flattened, the difference in level caused by the lower ball, that is, the stack of the first soft magnetic single layer film 43 and the first soft magnetic multilayer film 44 is reduced.
従って、以後のプロセスで下部ボール上に積層される６
膜の形成、およびこれらの膜をパターン化するための７
オトレジスト・パターンの形成が容易となり大幅に生産
性が向上すること−となる０又、上部ボール、すなわち
、第２の軟磁性体多層膜４９と第２の軟磁性体単層膜５
０との積層体の経験する段差に第２図のような構造を有
する薄膜磁気ヘッドに比して小さく、フロント・ギャッ
プ部とインナー・ギャップ部との間の勾配部およびイン
ナー・ギャップ部とリア・ギャップ部との間の勾配部に
おける上部ボールの磁気特性の劣化が抑制され、高いル
Ｗ特性を有する薄膜磁気ヘッドが実現されることとなる
。さらに、磁気回路を成す上部ボールおよび下部ボール
を通過する磁束の流れについても、第２図のような構造
を有する薄膜磁気ヘッドとに異なり、下部ボールがコイ
ル４７側に対して平担に形成されるため、ステップ部を
介しての磁束の漏洩が抑制されるため％曹込みおよび読
出し時において上部ボールおよび下部ボール中を流れ、
この点からも高い１１／ｖｖ特性を有する薄膜８気ヘッ
ドが実現されることとなる。又、上部ボールあるいは下
部ボールの一部が軟磁性体多層膜によって構成はれてい
るので、前記多層膜においては単磁区ないしにこれに近
い状態が実現され、上部ボールあるいは下部ボール中の
磁区の不規則な動きによるルＷ波形のゆらぎ、いわゆる
゛ウィグル（Ｗｉ ｇｇ ｌ ｅ ）”の発生が抑制さ
れ良好なＲ／Ｗ特性が得られるという利点もある。Therefore, in the subsequent process, the 6
7 for forming films and patterning these films.
Also, the upper ball, that is, the second soft magnetic multilayer film 49 and the second soft magnetic single layer film 5, facilitates the formation of the photoresist pattern and greatly improves productivity.
Compared to a thin film magnetic head having a structure as shown in FIG. 2, the level difference experienced by the stacked body with 0 is smaller than that of a thin film magnetic head having a structure as shown in FIG. - Deterioration of the magnetic properties of the upper ball at the slope portion between the ball and the gap portion is suppressed, and a thin film magnetic head having high LuW characteristics is realized. Furthermore, regarding the flow of magnetic flux passing through the upper ball and lower ball forming the magnetic circuit, unlike the thin film magnetic head having the structure shown in FIG. 2, the lower ball is formed flat with respect to the coil 47 side. Therefore, leakage of magnetic flux through the step part is suppressed, so that magnetic flux flows through the upper and lower balls during addition and reading.
From this point of view as well, a thin film 8-chip head having high 11/vv characteristics can be realized. In addition, since a part of the upper ball or the lower ball is made of a soft magnetic multilayer film, a single magnetic domain or a state close to this is achieved in the multilayer film, and the magnetic domains in the upper ball or the lower ball are Another advantage is that the occurrence of so-called "wiggle", which is the fluctuation of the RW waveform due to irregular movements, is suppressed and good R/W characteristics can be obtained.
以上、述べてきたように、本発明によれば生産性が高く
、かつ優れたルＷ特性を肩する薄膜磁気ヘッドが実現さ
れることとなり、特に高ビツト密度記録用ヘッドとして
本発明は極めて有効な薄膜磁気ヘッドを提供することが
できる〇
尚、以上の説明においてに基板上の絶縁層の膜厚方向に
深さＬの窪みを有する例のみについて説明を加えたが、
例えば、第５図および第６図に示したように、前記絶Ｒ
層と同じ膜厚の窪み、あるいに基板の一部まで到る深さ
を有する窪みを形成してもよい。As described above, according to the present invention, a thin film magnetic head with high productivity and excellent W characteristics can be realized, and the present invention is extremely effective especially as a head for high bit density recording. It is possible to provide a thin-film magnetic head that provides a thin film magnetic head. In the above explanation, only an example in which the insulating layer on the substrate has a recess with a depth L in the film thickness direction has been explained.
For example, as shown in FIG. 5 and FIG.
A depression having the same thickness as the layer, or a depression having a depth that reaches part of the substrate may be formed.
第１図および第２図は従来の薄膜磁気ヘッドを示す概略
断面図、第３図は従来の薄膜磁気ヘッドにおける磁束の
流れを示す図、ならびに第４図。
第５図および第６図は本発明による薄膜磁気ヘッドを示
す概略断面図である。
図において、１１，２１，４１，６１，８１・・・基板
、 １２． １４． １５． １７． ２２． ２４
，２５゜２７．３４，３５，３７，４２，４５，４６，
４８゜６２．６５，６６．６８，８２．８５・・・絶縁
層。
１３．２３．３３・・・下部ボール、 １８． ２８．
３８・・・上部ボール、１６，２６．４７，６７．８７
・・・コイル、４３，６３．８３・・・第１の軟磁性体
単層膜、４４，６４．８４・・・第１の軟磁性体多層膜
。
４９．６９．８９・・・第２の軟磁性体多層膜、５０゜
７０．９０・・・第２の軟磁性体単層膜。
第 １ 区
８３図
第４因
躬５図
第乙閃1 and 2 are schematic cross-sectional views showing a conventional thin film magnetic head, FIG. 3 is a diagram showing the flow of magnetic flux in the conventional thin film magnetic head, and FIG. 5 and 6 are schematic cross-sectional views showing a thin film magnetic head according to the present invention. In the figure, 11, 21, 41, 61, 81...substrates, 12. 14. 15. 17. 22. 24
,25°27.34,35,37,42,45,46,
48°62.65, 66.68, 82.85...Insulating layer. 13.23.33...Lower ball, 18. 28.
38... Upper ball, 16, 26.47, 67.87
...Coil, 43,63.83...First soft magnetic single layer film, 44,64.84...First soft magnetic multilayer film. 49.69.89...Second soft magnetic multilayer film, 50°70.90...Second soft magnetic single layer film. Section 1, Figure 83, Figure 4, Figure 5, Figure 2
Claims (1)
材料からなるコイルを挾んだ薄膜磁気ヘッドにおいて、
下部ボールの下地層ないしは基板に対して前記下部ボー
ルのインナー・ギャップ部およびリア・ギャップ部に相
嶋する部分に予め形成された窪みに対して、前記窪みを
埋めるように形成された第１の軟磁性体単層膜とフロン
ト・ギヤツブ部インナー・ギャップ部およびリア・ギャ
ップ部にわたって前記第１の軟磁性体単層膜上に形成さ
れた所定ボール形状を有する第１の軟磁性体多層膜との
積層体を下部ボールと成し、ギャップ層およびコイル等
を形成後、フロント・ギャップ部、インナー・ギャップ
部およびリア・ギャップ部にわたって形成された所定ボ
ール形状を有する第２の軟磁性体多層膜と、前記第２の
軟磁性体多層膜上で、かつインナー・ギャップ部および
リア・ギャッ部に相当する部分に形成される第２の軟磁
性体単層膜との積層体を上部ボールと成すことを特徴と
する薄膜磁気ヘッド０In a thin film magnetic head in which a coil made of a conductive material is sandwiched between upper and lower balls made of a soft magnetic material,
A first soft material is formed to fill the depressions that are pre-formed in the base layer or substrate of the lower ball in a portion that is adjacent to the inner gap portion and the rear gap portion of the lower ball. a first soft magnetic multilayer film having a predetermined ball shape formed on the first soft magnetic single layer film over the inner gap portion and the rear gap portion of the front gear portion; The laminate is formed into a lower ball, and after forming a gap layer, a coil, etc., a second soft magnetic multilayer film having a predetermined ball shape is formed over a front gap portion, an inner gap portion, and a rear gap portion. , forming an upper ball as a laminate with a second soft magnetic single layer film formed on the second soft magnetic multilayer film and in a portion corresponding to the inner gap portion and the rear gap portion; Thin film magnetic head 0 featuring
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15208982A JPS5942622A (en) | 1982-09-01 | 1982-09-01 | Thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15208982A JPS5942622A (en) | 1982-09-01 | 1982-09-01 | Thin film magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5942622A true JPS5942622A (en) | 1984-03-09 |
Family
ID=15532802
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15208982A Pending JPS5942622A (en) | 1982-09-01 | 1982-09-01 | Thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5942622A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7100268B2 (en) * | 1997-05-14 | 2006-09-05 | Hitachi Global Storage Technologies Netherlands B.V. | Method of making a magnetic head |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5284722A (en) * | 1975-12-31 | 1977-07-14 | Fujitsu Ltd | Thin film magnetic head and its production |
-
1982
- 1982-09-01 JP JP15208982A patent/JPS5942622A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5284722A (en) * | 1975-12-31 | 1977-07-14 | Fujitsu Ltd | Thin film magnetic head and its production |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7100268B2 (en) * | 1997-05-14 | 2006-09-05 | Hitachi Global Storage Technologies Netherlands B.V. | Method of making a magnetic head |
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