JPS5986609A - Methacrylic resin composition and its manufacturing method - Google Patents
Methacrylic resin composition and its manufacturing methodInfo
- Publication number
- JPS5986609A JPS5986609A JP19580082A JP19580082A JPS5986609A JP S5986609 A JPS5986609 A JP S5986609A JP 19580082 A JP19580082 A JP 19580082A JP 19580082 A JP19580082 A JP 19580082A JP S5986609 A JPS5986609 A JP S5986609A
- Authority
- JP
- Japan
- Prior art keywords
- gadolinium
- methacrylic resin
- resin composition
- methacrylate
- polymerization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims description 68
- 239000000113 methacrylic resin Substances 0.000 title claims description 47
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 claims description 43
- 238000006116 polymerization reaction Methods 0.000 claims description 42
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims description 41
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 39
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 32
- 239000011347 resin Substances 0.000 claims description 28
- 229920005989 resin Polymers 0.000 claims description 28
- 150000002251 gadolinium compounds Chemical class 0.000 claims description 26
- 125000004432 carbon atom Chemical group C* 0.000 claims description 23
- 239000000178 monomer Substances 0.000 claims description 19
- 229920006395 saturated elastomer Polymers 0.000 claims description 19
- 239000002904 solvent Substances 0.000 claims description 19
- 229930195734 saturated hydrocarbon Natural products 0.000 claims description 17
- 229930195735 unsaturated hydrocarbon Natural products 0.000 claims description 17
- 229920000642 polymer Polymers 0.000 claims description 16
- 239000002994 raw material Substances 0.000 claims description 16
- 239000007983 Tris buffer Substances 0.000 claims description 13
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 11
- 229910052799 carbon Inorganic materials 0.000 claims description 11
- 239000001257 hydrogen Substances 0.000 claims description 11
- 229910052739 hydrogen Inorganic materials 0.000 claims description 11
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical group CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 claims description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- ZLWIERXFKXYFIT-UHFFFAOYSA-K gadolinium(3+) 2-methylprop-2-enoate Chemical compound C(C(=C)C)(=O)[O-].[Gd+3].C(C(=C)C)(=O)[O-].C(C(=C)C)(=O)[O-] ZLWIERXFKXYFIT-UHFFFAOYSA-K 0.000 claims description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 8
- 230000000379 polymerizing effect Effects 0.000 claims description 8
- JEUDBARJOQFTCD-UHFFFAOYSA-K C(C=C)(=O)[O-].[Gd+3].C(C=C)(=O)[O-].C(C=C)(=O)[O-] Chemical compound C(C=C)(=O)[O-].[Gd+3].C(C=C)(=O)[O-].C(C=C)(=O)[O-] JEUDBARJOQFTCD-UHFFFAOYSA-K 0.000 claims description 7
- 239000003505 polymerization initiator Substances 0.000 claims description 7
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 claims description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 241000567769 Isurus oxyrinchus Species 0.000 claims 1
- 150000002430 hydrocarbons Chemical group 0.000 description 14
- 238000000034 method Methods 0.000 description 14
- 230000003287 optical effect Effects 0.000 description 13
- 230000005855 radiation Effects 0.000 description 13
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- 238000010521 absorption reaction Methods 0.000 description 12
- 239000000463 material Substances 0.000 description 12
- 239000000243 solution Substances 0.000 description 12
- 229910001938 gadolinium oxide Chemical class 0.000 description 11
- MWFSXYMZCVAQCC-UHFFFAOYSA-N gadolinium(iii) nitrate Chemical compound [Gd+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O MWFSXYMZCVAQCC-UHFFFAOYSA-N 0.000 description 11
- CMIHHWBVHJVIGI-UHFFFAOYSA-N gadolinium(iii) oxide Chemical class [O-2].[O-2].[O-2].[Gd+3].[Gd+3] CMIHHWBVHJVIGI-UHFFFAOYSA-N 0.000 description 11
- 239000011342 resin composition Substances 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 9
- 229940075613 gadolinium oxide Drugs 0.000 description 9
- 239000006082 mold release agent Substances 0.000 description 9
- -1 polyethylene Polymers 0.000 description 9
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 8
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- 150000007524 organic acids Chemical class 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 150000007522 mineralic acids Chemical class 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 239000002685 polymerization catalyst Substances 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- 150000000921 Gadolinium Chemical class 0.000 description 5
- 125000002947 alkylene group Chemical group 0.000 description 5
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 4
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 4
- 238000005452 bending Methods 0.000 description 4
- 150000001639 boron compounds Chemical class 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- RQXZRSYWGRRGCD-UHFFFAOYSA-H gadolinium(3+);tricarbonate Chemical compound [Gd+3].[Gd+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O RQXZRSYWGRRGCD-UHFFFAOYSA-H 0.000 description 4
- ILCLBMDYDXDUJO-UHFFFAOYSA-K gadolinium(3+);trihydroxide Chemical compound [OH-].[OH-].[OH-].[Gd+3] ILCLBMDYDXDUJO-UHFFFAOYSA-K 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 150000002611 lead compounds Chemical class 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 125000005395 methacrylic acid group Chemical group 0.000 description 4
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- 229920000297 Rayon Polymers 0.000 description 3
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- APSBXTVYXVQYAB-UHFFFAOYSA-M sodium docusate Chemical compound [Na+].CCCCC(CC)COC(=O)CC(S([O-])(=O)=O)C(=O)OCC(CC)CCCC APSBXTVYXVQYAB-UHFFFAOYSA-M 0.000 description 3
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 3
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 2
- CVBUKMMMRLOKQR-UHFFFAOYSA-N 1-phenylbutane-1,3-dione Chemical compound CC(=O)CC(=O)C1=CC=CC=C1 CVBUKMMMRLOKQR-UHFFFAOYSA-N 0.000 description 2
- QUASZQPLPKGIJY-UHFFFAOYSA-N 2-[2-[2-(2-hydroxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound OCCOCCOCCOCCOC(=O)C=C QUASZQPLPKGIJY-UHFFFAOYSA-N 0.000 description 2
- LTHJXDSHSVNJKG-UHFFFAOYSA-N 2-[2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOCCOC(=O)C(C)=C LTHJXDSHSVNJKG-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- OIUWEEPWAUVTRR-UHFFFAOYSA-K 2-methylprop-2-enoate samarium(3+) Chemical compound C(C(=C)C)(=O)[O-].[Sm+3].C(C(=C)C)(=O)[O-].C(C(=C)C)(=O)[O-] OIUWEEPWAUVTRR-UHFFFAOYSA-K 0.000 description 2
- QXFADXLALKKHIZ-UHFFFAOYSA-N 2-octylbenzoic acid Chemical compound CCCCCCCCC1=CC=CC=C1C(O)=O QXFADXLALKKHIZ-UHFFFAOYSA-N 0.000 description 2
- HNNQYHFROJDYHQ-UHFFFAOYSA-N 3-(4-ethylcyclohexyl)propanoic acid 3-(3-ethylcyclopentyl)propanoic acid Chemical compound CCC1CCC(CCC(O)=O)C1.CCC1CCC(CCC(O)=O)CC1 HNNQYHFROJDYHQ-UHFFFAOYSA-N 0.000 description 2
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 229910018487 Ni—Cr Inorganic materials 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 235000021355 Stearic acid Nutrition 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000005250 alkyl acrylate group Chemical group 0.000 description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 description 2
- GONOPSZTUGRENK-UHFFFAOYSA-N benzyl(trichloro)silane Chemical compound Cl[Si](Cl)(Cl)CC1=CC=CC=C1 GONOPSZTUGRENK-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 239000006184 cosolvent Substances 0.000 description 2
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 2
- 235000019329 dioctyl sodium sulphosuccinate Nutrition 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 2
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 2
- 150000002334 glycols Chemical class 0.000 description 2
- 239000012760 heat stabilizer Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 2
- CDOSHBSSFJOMGT-UHFFFAOYSA-N linalool Chemical compound CC(C)=CCCC(C)(O)C=C CDOSHBSSFJOMGT-UHFFFAOYSA-N 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N n-hexanoic acid Natural products CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 2
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 2
- QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000008117 stearic acid Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 1
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2,2'-azo-bis-isobutyronitrile Substances N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 1
- FEWFXBUNENSNBQ-UHFFFAOYSA-N 2-hydroxyacrylic acid Chemical group OC(=C)C(O)=O FEWFXBUNENSNBQ-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- CSEUSVYSDPXJAP-UHFFFAOYSA-N 2-methyloxirane-2-carboxylic acid Chemical compound OC(=O)C1(C)CO1 CSEUSVYSDPXJAP-UHFFFAOYSA-N 0.000 description 1
- RWHRFHQRVDUPIK-UHFFFAOYSA-N 50867-57-7 Chemical compound CC(=C)C(O)=O.CC(=C)C(O)=O RWHRFHQRVDUPIK-UHFFFAOYSA-N 0.000 description 1
- 229910014033 C-OH Inorganic materials 0.000 description 1
- 241000218645 Cedrus Species 0.000 description 1
- 229910014570 C—OH Inorganic materials 0.000 description 1
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 1
- 235000021314 Palmitic acid Nutrition 0.000 description 1
- RFFFKMOABOFIDF-UHFFFAOYSA-N Pentanenitrile Chemical compound CCCCC#N RFFFKMOABOFIDF-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 229960000878 docusate sodium Drugs 0.000 description 1
- ANGAQLKDLXTZNG-UHFFFAOYSA-K europium(3+);2-methylprop-2-enoate Chemical compound [Eu+3].CC(=C)C([O-])=O.CC(=C)C([O-])=O.CC(=C)C([O-])=O ANGAQLKDLXTZNG-UHFFFAOYSA-K 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 235000003441 saturated fatty acids Nutrition 0.000 description 1
- 150000004671 saturated fatty acids Chemical class 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 1
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
本発明は、ガドリニウムを含有する光学的透明で機械的
性質に優れたメタクリル樹脂組成物およびその製造法に
関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a methacrylic resin composition containing gadolinium that is optically transparent and has excellent mechanical properties, and a method for producing the same.
メタクリル樹脂は、透明性、耐候性および機械的性質等
にすぐれているため種々の分野に使用されているが・メ
タクリル樹脂は放射線遮蔽能を有さないために、その用
途への使用が出来なかった。Methacrylic resin is used in a variety of fields due to its excellent transparency, weather resistance, and mechanical properties, but it cannot be used for these purposes because it does not have radiation shielding ability. Ta.
そこで近年、メタクリル樹脂に鉛を含有せしめた放射線
遮蔽材料が開発されている(特公昭3jf−23AO号
、特開昭33−99941号、同jj−9993号、同
&J−999A号、及び同!!、3−AJ310号等)
。Therefore, in recent years, radiation shielding materials containing lead in methacrylic resin have been developed (Japanese Patent Publications No. 3JF-23AO, 99941/1989, JJ-9993, &J-999A, and JP-A-1999-1). !, 3-AJ310, etc.)
.
しかしながら、上記の鉛含有の放射線遮蔽材料は、放射
線のうち、X腺、r線の如き電磁波およびα線、β線の
如き荷電粒子に対しては有効に遮蔽するものの、中性子
線に対しては不十分である。However, although the lead-containing radiation shielding materials described above effectively shield radiation from electromagnetic waves such as X-rays and R-rays and charged particles such as α-rays and β-rays, they do not shield against neutron radiation. Not enough.
一方、中性子線遮蔽の高分子材料として、ポリエチレン
またはメタクリル樹脂に硼素化合物を添加することも知
られている(特開昭SS−71741597号)。しか
しこの方法も中性子線吸収能は大きいも(1)(1)、
中性子吸収反応に伴ない生成するヘリウム、リチウムは
中性子吸収能かはとんどないため、中性子の吸収量の増
加に伴ないその能力は減少して行く傾向をもつと共に、
透明性、機械的性質について満足すべきところまで至っ
ていない。On the other hand, it is also known to add a boron compound to polyethylene or methacrylic resin as a polymeric material for shielding neutron beams (Japanese Patent Application Laid-Open No. 71741597). However, although this method also has a large neutron beam absorption capacity (1) (1),
Since the helium and lithium produced as a result of neutron absorption reactions have very little neutron absorption capacity, their capacity tends to decrease as the amount of neutron absorption increases.
Transparency and mechanical properties have not yet reached a satisfactory level.
中性子線を吸収する物質として上記の硼素化合物以外に
、原子番号AIIの希土類元累であるガドリニウムが熱
中性子線の吸収能が硼素よりもさらに大きいことが知ら
れている。しかしガドリニウムは金属固体であるため、
メタクリル糸重合体との相溶性が悪く、いまだに透明性
でかつ機械的性質にすぐれたメタクリル樹脂は製造さn
ていない。In addition to the above-mentioned boron compounds as substances that absorb neutron beams, it is known that gadolinium, which is a rare earth element with an atomic number AII, has an even greater ability to absorb thermal neutron beams than boron. However, since gadolinium is a metallic solid,
Due to its poor compatibility with methacrylic thread polymers, methacrylic resins that are transparent and have excellent mechanical properties have not yet been produced.
Not yet.
本発明者は、このような状況に鑑み新々検討した結果、
ガドリニウム化合物を、特定組成のメタクリル酸メチル
を主成分とする単量体中に含有せしめて重合せしめるこ
とにより、光学的透明性、機械的強度、ならびに加工性
の優れたメタクリル樹脂組成物が得られることを見出し
本発明を完成した〇
すなわち、本発明の要旨とするところは、メタクリル酸
メチルを主成分とするメタクリル樹脂中に、ガドリニウ
ムを含有させたメタクリル樹脂組成物および
ta) メタクリル酸メチル単量体あるいはメタクリ
ル酸メチルご主席分とする単量体混合物またはそれらの
部分重合物から選ばれる樹脂原料
(b) ガドリニウム化合物
(0) 前記成分talおよび(111に対して溶解
性を示す下記の一般式
R,−C−OHl/)
(式中、R1は炭素数7−−〇の飽和あるいは不飽和の
炭化水素残基である〕
(式中、R2は水素または炭素数l〜9の炭化水素残基
、R1は炭素数/ −!の飽和あるいは不飽和の炭化水
素残基である)
CH,=C−C−0(−A、 0へH(、?〕(式中、
R4は水素またはメチル基、AIは炭素数コ〜A O)
アルキル基、n Get Oまたは/〜/θの整数であ
る〕
(式中、R1は水素またはメチル基、R6は炭素数コ〜
Aのアルキレン基である)
R,−OH[勾 または
(式中、R?は炭素数3〜〕0の飽和あるいは不飽和の
炭化水素残基である)
R,(−A、−〇榴H(R1
(式中、RBは水酸基または炭素数l〜10の飽和ある
いは不飽和の炭化水素残基、A2は要素数−〜ダのアル
キレン基、mはa〜/θの整数である)
から選ばれる少なくとも1種の溶媒および(d) 重
合開始剤
よりなる重合混合物を特型中で重合することを特徴とす
るメタクリル樹脂組成物の製造法にある。As a result of new consideration in view of this situation, the inventor of the present invention found that
A methacrylic resin composition with excellent optical transparency, mechanical strength, and processability can be obtained by incorporating a gadolinium compound into a monomer whose main component is methyl methacrylate of a specific composition and polymerizing it. The present invention was completed after discovering the following. In other words, the gist of the present invention is to provide a methacrylic resin composition containing gadolinium in a methacrylic resin containing methyl methacrylate as a main component, and ta) methyl methacrylate monomer. Resin raw material (b) selected from a monomer mixture containing methyl methacrylate as the main component, or a partial polymer thereof Gadolinium compound (0) The following general formula showing solubility in the components tal and (111) R, -C-OHl/) (In the formula, R1 is a saturated or unsaturated hydrocarbon residue having 7 to 0 carbon atoms.) (In the formula, R2 is hydrogen or a hydrocarbon residue having 1 to 9 carbon atoms. group, R1 is a saturated or unsaturated hydrocarbon residue with carbon number/-!) CH,=C-C-0(-A, 0 to H(,?) (in the formula,
R4 is hydrogen or a methyl group, AI is the number of carbon atoms ~ A O)
an alkyl group, n Get O or an integer of /~/θ] (wherein, R1 is hydrogen or a methyl group, R6 is a carbon number of ~
A is an alkylene group) R, -OH or (in the formula, R? is a saturated or unsaturated hydrocarbon residue having 3 to 0 carbon atoms) (R1 (wherein, RB is a hydroxyl group or a saturated or unsaturated hydrocarbon residue having 1 to 10 carbon atoms, A2 is an alkylene group with an element number of 1 to 10, and m is an integer of a to /θ) A method for producing a methacrylic resin composition, which comprises polymerizing a polymerization mixture comprising at least one solvent and (d) a polymerization initiator in a special mold.
本発明ノメタクリル樹脂組成物は、メタクリル酸メチル
を主成分とするメタクリル樹脂中にガドリニウムを含有
せしめたものよりなる。本発明のメタクリル樹脂組成物
を得るための方法は特に限定されないが注型重合法が好
ましい方法として挙げられる。The methacrylic resin composition of the present invention contains gadolinium in a methacrylic resin whose main component is methyl methacrylate. The method for obtaining the methacrylic resin composition of the present invention is not particularly limited, but a preferred method is a cast polymerization method.
本発明の樹脂組成物を構成するに使用されるm脂原料と
しては、メタクリル酸メチル単量体あるいはメタクリル
酸メチルを主成分とする単量体混合物またはそれらの部
分重合物である。The m-fat raw material used to constitute the resin composition of the present invention is a methyl methacrylate monomer, a monomer mixture containing methyl methacrylate as a main component, or a partial polymer thereof.
メタクリル酸メチルを主成分とする単量体混合物はメタ
クリル酸メチルおよびメタクリル酸メチルと共重合性の
他のビニル系単量体との混合物である。メタクリル酸メ
チルと共重合性の他のビニル単量体は特に限定されない
が例えば炭Xi/−ダのアルキルアクリレート、炭ii
2〜亭のアルキルメタクリレート、スチレン、α−メチ
ルスチレン、エチレングリコールジメタクリレート、エ
チレングリコールジアクリレート、ジエチレングリコー
ルジメタクリレート、ジエチレングリコールジアクリレ
ート、テトラエチレングリコールジメタアクリレート、
テトラエチレングリコールアクリレート、ペンタエリス
リトールテトラメタクリレート、ペンタエリスリトール
テトラアクリレート、アクリル酸アリル1メタアクリル
酸アリル等があげられる。The monomer mixture containing methyl methacrylate as a main component is a mixture of methyl methacrylate and another vinyl monomer copolymerizable with the methyl methacrylate. Other vinyl monomers copolymerizable with methyl methacrylate are not particularly limited, but include, for example, alkyl acrylates of carbon Xi/-da, carbon ii
2~Tei alkyl methacrylate, styrene, α-methylstyrene, ethylene glycol dimethacrylate, ethylene glycol diacrylate, diethylene glycol dimethacrylate, diethylene glycol diacrylate, tetraethylene glycol dimethacrylate,
Examples include tetraethylene glycol acrylate, pentaerythritol tetramethacrylate, pentaerythritol tetraacrylate, allyl acrylate, allyl methacrylate, and the like.
これらの使用量は、単塩体温合物中SO重量%以下であ
る。また使用する梅脂原料の部分重合物中の重合体含有
量は、最終的に得られる重合(9)
体の光学的性質を損なわぬためできる限り少ない方が望
ましい。The amount used is less than or equal to the weight percent of SO in the monochloride composition. Furthermore, it is desirable that the polymer content in the partial polymer of plum oil raw material used be as low as possible so as not to impair the optical properties of the polymer (9) finally obtained.
本発明の組成物を構成するのに使用されるガドリニウム
は、ガドリニウム化合物、例えば、ガドリニウムの酸化
物と無機酸または有機酸とを反応することにより得られ
る硝酸ガドリニウム、メタクリル酸ガドリニウム、アク
リル酸ガドリニウム等の無機または有機酸のガドリニウ
ム塩、またはガドリニウムの酸化物とアセチルアセトン
、またはベンゾイルアセトン等とを反応して得られるト
リス(アセチルアセトナト)ガドリニウム、またはトリ
ス(ベンゾイルアセトナト)ガドリニウム等のガドリニ
ウム錯化合物があげられる。これらガドリニウム化合物
の使用量はガドリニウム原子の重量濃度が樹脂組成物全
重量に対して00/〜IO爪量%、好ましくは7〜3重
量%が望ましい。0.0 /重量%未滴の場合には、得
られる樹脂組成物の中性子線遮蔽効果が少なく、ま7F
:10重撤%を越えると光学的透明性または機械的強度
の低下をきた///)1
す。Gadolinium used to constitute the composition of the present invention is a gadolinium compound such as gadolinium nitrate, gadolinium methacrylate, gadolinium acrylate, etc. obtained by reacting an oxide of gadolinium with an inorganic or organic acid. Gadolinium complex compounds such as tris(acetylacetonato)gadolinium or tris(benzoylacetonato)gadolinium obtained by reacting gadolinium salts of inorganic or organic acids, or gadolinium oxides with acetylacetone, benzoylacetone, etc. can give. The amount of these gadolinium compounds to be used is such that the weight concentration of gadolinium atoms is 00% to 10% by weight, preferably 7 to 3% by weight, based on the total weight of the resin composition. If the amount is 0.0/wt%, the resulting resin composition has little neutron beam shielding effect, and
: Exceeding 10% reduction will result in a decrease in optical transparency or mechanical strength///)1.
また本発明の組成物を形成するのに使用される前記一般
式1/) l (−2) 、 1.?) t (ダ)
f (−j)および(旬で示される溶媒は、ガドリニウ
ム化合物を樹脂原料に均一に溶解させるための共溶媒で
あって、例えばメタクリル酸、アクリル酸等の不飽和カ
ルボン酸、プロピオン酸、オクチル酸、イソ酪酸、ヘキ
サン酸、オクチル安息香酸、ステアリン酸、パルミチン
酸、ナフテン酸等の飽和または不飽和側1f/j酸、−
2−ヒト四キシエチルアクリレート、コーヒドロキシエ
チルメタクリレート等の不飽和アルコール、プルピルア
ルコール、シクロヘキシルアルコール等の飽和脂肪族ア
ルコール、エチレングリコール、ジエチレングリコール
、プロピレングリフール等のグリコールがあげられる。Also, the general formula 1/) l (-2), 1. used to form the composition of the present invention. ? ) t (da)
The solvents indicated by f (-j) and (shun) are cosolvents for uniformly dissolving the gadolinium compound in the resin raw material, and include, for example, unsaturated carboxylic acids such as methacrylic acid and acrylic acid, propionic acid, and octylic acid. , saturated or unsaturated acids such as isobutyric acid, hexanoic acid, octylbenzoic acid, stearic acid, palmitic acid, naphthenic acid, -
Examples include unsaturated alcohols such as 2-human tetraxyethyl acrylate and co-hydroxyethyl methacrylate, saturated aliphatic alcohols such as propyl alcohol and cyclohexyl alcohol, and glycols such as ethylene glycol, diethylene glycol and propylene glycol.
これらの溶媒のうち、メタクリル酸、アクリル酸、コー
ヒドロキシエチルメタクリレート、−一ヒドロキシエチ
ルアクリレート等のメタクリル酸メチルと共重合性のあ
る単量体が好ましい。これらの溶媒は単独でまたは一種
以上を組み合わせて用いることができる。本発明におけ
る溶媒の使用量は、使用するガドリニウム化合物の種類
、鼠により一概に決めることが出来ないが、ダO重量%
以下、好ましくはio重量%である゛。使用量がダO重
置%を越える場合には得られる樹脂板の機械的、熱的性
質を低下させるので好ましくない。Among these solvents, monomers copolymerizable with methyl methacrylate, such as methacrylic acid, acrylic acid, co-hydroxyethyl methacrylate, and -monohydroxyethyl acrylate, are preferred. These solvents can be used alone or in combination. The amount of the solvent used in the present invention cannot be determined unconditionally depending on the type of gadolinium compound used and the amount of the solvent used, but it may be
The following is preferably io% by weight. If the amount used exceeds the weight percent of DaO, it is not preferable because the mechanical and thermal properties of the resulting resin plate will deteriorate.
本発明において使用する重合開始剤としては例えばベン
ゾイルパーオキサイド、ラウロイルパーオキサイド等の
過酸化物系、λ、−′−アゾビスイソブチロニトリル、
21λ′−アゾビス−(コ。Examples of the polymerization initiator used in the present invention include peroxides such as benzoyl peroxide and lauroyl peroxide, λ,-'-azobisisobutyronitrile,
21λ'-azobis-(co.
ダージメチルバレpニトリル)、λ1:1′−アゾビス
−(コ、ダージメチルーグーメトキシーバレ四ニトリル
)等のアゾビス糸のような公知のラジカル開始剤が使用
できる。これらの重合開始剤は単独のみならび一種以上
を混合して使用でき、その使用量は樹脂原料ioo重量
部に対して0、007 NO/重量部である。Known radical initiators can be used, such as azobis threads such as dirdimethylvale p-nitrile), λ1:1'-azobis-(co, dirdimethyl-gmethoxyvale tetranitrile), and the like. These polymerization initiators can be used alone or in combination of one or more, and the amount used is 0.007 NO/part by weight based on ioo parts by weight of the resin raw material.
本発明における重合混合物の鋳型重合は、前記成分ta
J r lb) + (o)および(d)からなる重合
混合物を、例えば無機ガラス板、ステンレス・スチール
板、ニッケルクロム板またはアルミニウム板等と軟質の
塩化ビニル製のガスケットとで構成された鋳型内に注入
して重合させる。鋳型重合における重合i度はlj〜9
3C1重合時間は03〜lS時間で、引続き100 N
/4t!rCの重合温度で、重合を完結させる。In the template polymerization of the polymerization mixture in the present invention, the components ta
J r lb) + The polymerization mixture consisting of (o) and (d) is placed in a mold made of, for example, an inorganic glass plate, a stainless steel plate, a nickel chromium plate, or an aluminum plate, and a soft vinyl chloride gasket. and polymerize. The degree of polymerization in template polymerization is lj ~ 9
3C1 polymerization time was 03-1S hours, followed by 100 N
/4t! Polymerization is completed at a polymerization temperature of rC.
本発明においては必要に応じて紫外線吸収剤、離型剤、
熱安定剤、着色剤を、また更に他の中性子遮蔽用化合物
および鉛化合物等を添加することもできる。In the present invention, ultraviolet absorbers, mold release agents,
Heat stabilizers, colorants, and other neutron shielding compounds, lead compounds, etc. can also be added.
以上述べたような構成からなる本発明の光学的透明性お
よび機械的性質に優れたガドリニウム含有メタクリル樹
脂組成物は、一般のアクリル樹脂と同じ製造工程で容易
に製造でき、中性子線を主体とする放射線の遮蔽材料と
して利用できる。また本発明の組成物中に鉛化合物を併
用するとX線、γ線、中性子線のいずれとも遮蔽するこ
とが可能となる0本発明のメタクリル樹脂組成物は中性
子遮蔽材料にとりわけ有用で(13)
あるが、他の用途、例えば光学フィルターなどの用途に
も使用できる。The gadolinium-containing methacrylic resin composition of the present invention having the above-mentioned structure and having excellent optical transparency and mechanical properties can be easily manufactured using the same manufacturing process as general acrylic resins, and can be produced mainly using neutron beams. It can be used as a radiation shielding material. Furthermore, when a lead compound is used in combination with the composition of the present invention, it becomes possible to shield against X-rays, γ-rays, and neutron beams. The methacrylic resin composition of the present invention is particularly useful as a neutron shielding material (13). However, it can also be used in other applications, such as optical filters.
次に実施例によって本発明を更に詳しく説明するが、本
発明を限定するものではない。EXAMPLES Next, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited thereto.
参考例1 メタクリル酸ガドリニウムの合成メタクリル
酸λgθgおよびトルエン10θOりの混合物に重合禁
止剤としてハイドルキノンモノメチルエーテルθ3gを
均一に溶解し、これをAθCに加湿した後、この溶液に
酸化ガドリニウム粉末/AA9を20分かけて添加して
ゆき、7時間攪拌を続ける。Reference Example 1 Synthesis of gadolinium methacrylate 3 g of hydroquinone monomethyl ether θ as a polymerization inhibitor was uniformly dissolved in a mixture of λgθg methacrylic acid and 10θO of toluene, and after humidifying this to AθC, gadolinium oxide powder/AA9 was added to the solution. was added over 20 minutes and stirring continued for 7 hours.
次いで該反応液を1日放置した後、濾過し、P液を除去
してメタクリル酸化ドリニウムヲ得る。収量は33クク
であった。Next, the reaction solution was allowed to stand for one day, and then filtered to remove the P solution to obtain dolinium methacrylate oxide. The yield was 33 kuku.
参考例−硝酸ガドリニウムの合成
濃硝酸に少過剰の酸化ガドリニウムを加熱溶解し反応さ
せる。7時間後・f液を冷却し硝酸ガドリニウムの結晶
を析出させた。収率は6コ1in )
%であった。Reference Example - Synthesis of Gadolinium Nitrate A slight excess of gadolinium oxide is heated and dissolved in concentrated nitric acid and reacted. After 7 hours, the f solution was cooled to precipitate gadolinium nitrate crystals. The yield was 6 cm)%.
参考例3 トリス(アセチルアセトナト)カドリニウム
の合成
アセチルアセトン100ccと酸化ガドリニウムtgo
9を無水ジエチルエーテル、yoooccに懸濁させコ
時間還流を行ない、引き続きジエチルエーテルを油出除
去してトリス(アセチルアセトナト)ガドリニウムの結
晶を得た。収率は41%であった。Reference Example 3 Synthesis of tris(acetylacetonato)cadrinium 100cc of acetylacetone and gadolinium oxide TGO
9 was suspended in anhydrous diethyl ether, yooocc, and refluxed for several hours, followed by removing the diethyl ether as an oil to obtain crystals of tris(acetylacetonato)gadolinium. The yield was 41%.
実施例1
参考例コで合成した硝酸ガドリニウム3gを一一ヒド四
キシエチルメタクリレート/79t6よびプロピレング
リコールコクの混合液に溶解させ、この溶液にメタクリ
ル酸メチル7Sりを添加、攪拌し混合する。この混合液
は透明液であった。Example 1 3 g of gadolinium nitrate synthesized in Reference Example 2 is dissolved in a mixture of 1-1hydro-4xyethyl methacrylate/79t6 and propylene glycol, and methyl methacrylate 7S is added to this solution and mixed by stirring. This liquid mixture was a transparent liquid.
次にこの混合液に重合触媒としてθot、tgのコ、コ
′−アゾビス−(,2,!−ジメチルバレロニトリル)
および離型剤としてθoosgのジオクチルスルホサク
シネートナトリウム塩を添加して溶解させた後、脱気し
、予め板厚が3絹となるよう設定された常法の無機ガラ
スの鋳型中に注入し、この鋳型をA3Cの温水にigo
分浸漬し1次いで//θCの空気浴に120分滞在させ
て重合を完結させた。鋳型から取り出した樹脂板は透明
であった。Next, θot, tg of co,co′-azobis-(,2,!-dimethylvaleronitrile) was added to this mixture as a polymerization catalyst.
And dioctyl sulfosuccinate sodium salt of θoosg as a mold release agent is added and dissolved, then degassed and poured into a conventional inorganic glass mold whose thickness is set in advance to 3 silk. Place this mold in A3C warm water.
The polymerization was completed by dipping for 1 minute and then staying in an air bath at //θC for 120 minutes. The resin plate taken out from the mold was transparent.
実施例コ
参考例コで合成した硝酸ガドリニウム119を、−一ヒ
ドpキシエチルメタクリレートg3りに溶解させ、更に
これをメタクリル酸メチルqo9に添加して攪拌混合す
る。この混合液は透明であった。この混合液に実施例1
で使用したのと同じ種類および置の重合触媒と離型剤を
添加して実施例ノと同じ条件で鋳込重合を行なった0得
られた樹脂板は透明であった。Gadolinium nitrate 119 synthesized in Examples and Reference Examples is dissolved in -monohydropoxyethyl methacrylate g3, and this is added to methyl methacrylate qo9 and mixed with stirring. This mixture was clear. Example 1
Cast polymerization was carried out under the same conditions as in Example No. with the addition of the same type and location of polymerization catalyst and mold release agent as used in Example No. 0. The resin plate obtained was transparent.
実施例3
参考例3で合成したトリス(アセチルアセトナト)ガド
リニウムlSgを、メタクリル酸gjgに溶解させ、こ
の液をメタクリル酸メチhtiogに添加、攪拌して混
合する。Example 3 Tris(acetylacetonato)gadolinium 1Sg synthesized in Reference Example 3 is dissolved in methacrylic acid gjg, and this solution is added to methacrylic acid methacrylic acid htiog and stirred to mix.
この混合液に実施例1と同じ重合触媒、離型剤を添加し
、実施例1と同じ鋳込重合を行なった0重合完結後−鋳
型から剥離した樹脂板は透明であった◇
実施例ダ
参考例!で合成したメタクリル酸ガドリニウムtt9と
、n−オクチル酸コq1プロピレングリコール1g、コ
ーヒドロキシエチルメタクリL/−)/g、Xチレン3
gおよびメタクリル酸メチル1139を混合し、実施例
1と同じ重合条件で鋳込重合を繰返した。得られた樹脂
板は透明であった〇
(lり)
実施例S
アクリル酸ガドリニウム3り、メタクリル酸サマリウム
3g、メタクリル酸ニーpピウムlり、n−オクチル酸
317.プロピレングリコールlりをメタクリル酸メチ
ル1199に混合し、実施例1と同じ重合条件で鋳込重
合を繰返した。The same polymerization catalyst and mold release agent as in Example 1 were added to this mixture, and the same cast polymerization as in Example 1 was carried out. After completion of polymerization - the resin plate peeled off from the mold was transparent ◇ Example D Reference example! Gadolinium methacrylate tt9 synthesized in
g and methyl methacrylate 1139 were mixed, and cast polymerization was repeated under the same polymerization conditions as in Example 1. The obtained resin plate was transparent. Example S: 3 gadolinium acrylate, 3 g samarium methacrylate, 3 g pium methacrylate, 317 g n-octylic acid. One liter of propylene glycol was mixed with methyl methacrylate 1199, and cast polymerization was repeated under the same polymerization conditions as in Example 1.
得られた樹脂板は透明であった。The obtained resin plate was transparent.
実施例を
参考例Iで得られたメタクリル酸ガドリー1ムダク、メ
タクリル酸鉛4’ g% n−オクチル酸3g、プロピ
レングリコールコ9.!−ヒドロキシおよびエチルメタ
クリレート/9を、メタクリル酸メチルIAqに混合し
、実施例1と同じ条件で鋳込重合f:tia返した。得
られた樹脂板は透明であった。Examples are as follows: Gadry methacrylate obtained in Reference Example I: 1 mudak, lead methacrylate: 4'g%, n-octylic acid: 3g, propylene glycol copolymer: 9. ! -Hydroxy and ethyl methacrylate/9 were mixed with methyl methacrylate IAq and subjected to cast polymerization f:tia under the same conditions as in Example 1. The obtained resin plate was transparent.
実施例/−4で得られたメタクリル樹脂tの全光線透過
率(%)、曇価じ)、曲げ破壊強度(119/j)の測
定結果を表1に示す。Table 1 shows the measurement results of the total light transmittance (%), haze value, and bending fracture strength (119/j) of the methacrylic resin t obtained in Example/-4.
なお、全光線透過率、および曇価はASTM−D−10
03−1/に準じて、また曲げ破壊強度はASTM−D
−490法に準じて測定した。In addition, the total light transmittance and haze value are ASTM-D-10.
03-1/, and the bending fracture strength is ASTM-D.
It was measured according to the -490 method.
表 7
(19)
手続補正書(自発)
昭和58年9月q日
特願昭57−195800号
2、発明の名称
メタクリル樹脂組成物およびその製造法3、補正をする
者
事件との関係 特許出願人
東京都中央区京橋二丁目3番19号
(603)三菱レイヨン株式会社
4、代理人 取締役社長 河 崎 晃 夫東
京都中央区京橋二丁目3番19号
三菱レイヨン株式会社 内
(6949)弁理士告澤敏夫
5、補正命令の日付
自発補正
全文訂正明細書
1、発明の名称
メタクリル樹脂組成物8よびその製造法2、特許請求の
範囲
1、 メタクリル酸メチルを主成分とするメタクリル樹
脂中にガドリニウムを含有せしめたメタクリル樹脂組成
物0
2、 ガドリニウム原子の重量濃度が全組成物に対して
0.01〜10重量係であることを特徴とする特許請求
の範囲第1項記載のメタクリル樹脂組成物。Table 7 (19) Procedural amendment (spontaneous) September q, 1980, Japanese Patent Application No. 195800 2, Title of invention: methacrylic resin composition and its manufacturing method 3, Relationship with the case of the person making the amendment Patent application Person: Mitsubishi Rayon Co., Ltd. 4, 3-19 Kyobashi 2-chome, Chuo-ku, Tokyo (603), Agent: Akira Kawasaki, Patent attorney, Mitsubishi Rayon Co., Ltd., 3-19 Kyobashi 2-chome, Chuo-ku, Tokyo (6949) Toshio Fukuzawa 5, date of amendment order voluntary amendment full text corrected specification 1, name of invention methacrylic resin composition 8 and method for producing the same 2, claim 1, gadolinium in methacrylic resin containing methyl methacrylate as the main component A methacrylic resin composition according to claim 1, characterized in that the weight concentration of gadolinium atoms is 0.01 to 10% by weight relative to the entire composition. .
3、 (a) メタクリル酸メチル単量体あるいはメ
タクリル酸メチルを主成分とする単量体混合物、または
それらの部分重合物から選ばれた樹脂形成原料
(b) ガドリニウム化合物 および(c) 重合
開始剤
かうなる重合混合物を重合することを特徴とするメタク
リル樹脂組成物?4 ’l ’−A”!!!L杉。3. (a) Resin-forming raw material selected from methyl methacrylate monomers, monomer mixtures containing methyl methacrylate as a main component, or partial polymers thereof, (b) gadolinium compound, and (c) polymerization initiator. A methacrylic resin composition characterized by polymerizing a polymerization mixture as follows? 4 'l'-A''!!!L cedar.
(1〕 4、ガドリニウム化合物が酸化ガドリニウム。(1) 4. The gadolinium compound is gadolinium oxide.
炭酸ガドリニウム、水酸化ガドリニウムおよびガドリニ
ウムの錯化合物から選ばれたものであることを特徴とす
る特許請求の範囲第3項記載のメタクリル樹脂組成物の
製造法。4. The method for producing a methacrylic resin composition according to claim 3, wherein the methacrylic resin composition is selected from gadolinium carbonate, gadolinium hydroxide, and a complex compound of gadolinium.
5、樹脂形成原料およびガドリニウム化合物に対して溶
解性を示す下記の一般式
%式%(1)
(式中、RIは炭素数1〜20の飽和あるいは不飽和の
炭化水素残基である)
(式中、R2は水素または炭素数1〜9の飽和または不
飽和の炭化水素残基、R8は炭素数1〜4の飽和あるい
は不飽和の炭化水素残基である)
(式中、R4は水素またはメチル基、A、は炭素(2)
数2〜6のアルキル基、nは0または1〜10の整数で
ある)
(式中、R6は水素またはメチル基、R6は炭素数2〜
6のアルキレン基である)
R,−OH(5) または
(式中、R1は炭素数3〜10の飽和あるいは不飽和の
炭化水素残基である)
R8%−A、−0乱H(6)
(式中、R8は水酸基または炭素数1−10の飽和ある
いは不飽和の炭化水素残基、A2は炭素数2〜4のアル
キレン基、mは2〜1゜の整数である)
かう選ばれる少な(とも1雅の溶媒を添加して重合する
ことを特徴とする特許請求の範囲第3項記載のメタクリ
ル樹脂組成物の製造法。5. The following general formula % formula (1) showing solubility in resin forming raw materials and gadolinium compounds (wherein, RI is a saturated or unsaturated hydrocarbon residue having 1 to 20 carbon atoms) ( In the formula, R2 is hydrogen or a saturated or unsaturated hydrocarbon residue having 1 to 9 carbon atoms, and R8 is a saturated or unsaturated hydrocarbon residue having 1 to 4 carbon atoms. or a methyl group, A is an alkyl group having 2 to 6 carbon atoms, n is 0 or an integer of 1 to 10) (wherein, R6 is hydrogen or a methyl group, R6 is a carbon number 2 to 6)
6 alkylene group) R, -OH (5) or (in the formula, R1 is a saturated or unsaturated hydrocarbon residue having 3 to 10 carbon atoms) R8% -A, -0 random H (6 ) (wherein R8 is a hydroxyl group or a saturated or unsaturated hydrocarbon residue having 1 to 10 carbon atoms, A2 is an alkylene group having 2 to 4 carbon atoms, and m is an integer of 2 to 1°) 4. The method for producing a methacrylic resin composition according to claim 3, wherein the polymerization is carried out by adding a small amount of a solvent.
6、カドリニウム化合物が、硝酸ガドリニウム。6. The gadolinium compound is gadolinium nitrate.
有機酸のガドリニウム塩、またはガドリニウムの錯化合
物から選ばれたものであることを特徴とする特許請求の
範囲第5項記載のメタクリル樹脂組成物の製造法。6. The method for producing a methacrylic resin composition according to claim 5, wherein the methacrylic resin composition is selected from a gadolinium salt of an organic acid or a complex compound of gadolinium.
7、 ガドリニウム化合物がメタクリル酸ガドリニウム
、アクリル酸ガドリニウムまたはトリス(アセチルアセ
トナト)ガドリニウムから選ばれたものであり、また溶
媒がオクチル酸だよびプロピレングリコールおよび/ま
たは2−ヒドロキシエチルメタクリレートまたは2−ヒ
ドロキシエチルアクリレートであることを特徴とする特
許請求の範囲第5項記載のメタクリル樹脂組成物の製造
法。7. The gadolinium compound is selected from gadolinium methacrylate, gadolinium acrylate or tris(acetylacetonato)gadolinium, and the solvent is octylic acid and propylene glycol and/or 2-hydroxyethyl methacrylate or 2-hydroxyethyl. 6. The method for producing a methacrylic resin composition according to claim 5, wherein the methacrylic resin composition is an acrylate.
3、発明の詳細な説明
本発明は、ガドIJ ニウムを含有する光学的および機
械的性質に優れたメタクリル樹脂組成物およびその製造
法に関する。3. Detailed Description of the Invention The present invention relates to a methacrylic resin composition containing GadIJnium and having excellent optical and mechanical properties, and a method for producing the same.
メタクリル樹脂は、透明性、耐候性および機械的性質等
にすぐれているため種々の分野に使用されているが、メ
タクリル樹脂は放射線遮蔽能を有さないために、その用
途への使用が出来なかった。Methacrylic resin is used in a variety of fields due to its excellent transparency, weather resistance, and mechanical properties, but it cannot be used for these purposes because it does not have radiation shielding ability. Ta.
そこで近年、メタクリル樹脂に鉛を含有せしめた放射線
遮蔽材料が開発されている(特公昭35−2360号、
特開昭53−9994号。Therefore, in recent years, radiation shielding materials containing lead in methacrylic resin have been developed (Special Publication No. 35-2360,
Japanese Patent Publication No. 53-9994.
同53−9995号、同53−9996号、及び同53
−63310号等)。No. 53-9995, No. 53-9996, and No. 53
-63310 etc.).
しかしながら、上記の鉛含有の放射線遮蔽材料は、放射
線のうち、X線、r線の如き電磁波およびα線、β線の
如き荷電粒子に対しては有効に遮蔽するものの、中性子
線に対しては不十分である。However, although the lead-containing radiation shielding materials described above effectively shield radiation from electromagnetic waves such as X-rays and R-rays and charged particles such as α-rays and β-rays, they do not shield against neutron radiation. Not enough.
一方、中性子線遮蔽の高分子材料として、ポリエチレン
またはメタクリル樹脂に硼素化合物を添加することも知
られている(特開昭55−144597号)。しかしこ
の方法も中性子線吸収能は大きいものの、中性子吸収反
応に伴ない生成するヘリウム、リチウムは中性子吸収能
がほとんどないため、中性子の吸収量の増加に伴ないそ
の能力は減少して行(傾向をもつと共に、光学的および
機械的性質について満足すべきところまで至っていない
。On the other hand, it is also known to add a boron compound to polyethylene or methacrylic resin as a polymeric material for shielding neutron beams (Japanese Patent Laid-Open No. 144597/1983). However, although this method has a large neutron beam absorption capacity, the helium and lithium produced in the neutron absorption reaction have almost no neutron absorption capacity, so their capacity decreases as the amount of neutron absorption increases (tendency). However, the optical and mechanical properties have not yet reached a satisfactory level.
(5)
中性子線を吸収する物質とし又上記の硼素化合物以外に
、原子番号64の希土類元素であるガドリニウムが熱中
性子線の吸収能が硼素よりもさらに大きいことが知られ
ている。しかしガドリニウムは金属固体であるため、メ
タクリル系重合体との相溶性が悪(、いまだに光学的お
よび機械的性質にすぐれたメタクリル樹脂は製造されて
いない。(5) In addition to the above-mentioned boron compounds, gadolinium, which is a rare earth element with an atomic number of 64, is known to have a greater ability to absorb thermal neutron beams than boron. However, since gadolinium is a metallic solid, it has poor compatibility with methacrylic polymers (methacrylic resins with excellent optical and mechanical properties have not yet been produced).
本発明者は、このような状況に鑑み種々検討した結果本
発明に到達したもので9本発明の要旨とするところは、
メタクリル酸メチルを主成分とするメタクリル樹脂中に
、ガドリニウムを含有させたメタクリル樹脂組成物にあ
る。The present inventor has arrived at the present invention as a result of various studies in view of the above circumstances, and the gist of the present invention is as follows:
A methacrylic resin composition containing gadolinium in a methacrylic resin whose main component is methyl methacrylate.
本発明の樹脂組成物は、ガドリニウム化合物をメタクリ
ル酸メチルを主成分とするメタクリル樹脂中に含有せし
めることにより達成される。The resin composition of the present invention is achieved by incorporating a gadolinium compound into a methacrylic resin containing methyl methacrylate as a main component.
したがって本発明の組成物を得る方法としては特に限定
されず種々の製造法が適用できる。Therefore, the method for obtaining the composition of the present invention is not particularly limited, and various manufacturing methods can be applied.
例えばガドリニウム化合物とメタクリル樹脂トをブレン
ドする方法、ガドリニウム化合物とメ(6)
タクリル酸メチルを主成分とする単量体もしくはその部
分重合体と混合し重合する方法あるいはガドリニウム化
合物をメタクリル酸メチルを主成分とする単量体はその
部分重合物および溶媒と混合して重合する方法等があげ
られる。For example, a method of blending a gadolinium compound and a methacrylic resin, a method of mixing and polymerizing a gadolinium compound with a monomer or a partial polymer thereof whose main component is methyl methacrylate, or a method of mixing and polymerizing a gadolinium compound with a monomer or a partial polymer thereof whose main component is methyl methacrylate. Examples include a method in which the monomer as a component is mixed with a partial polymer thereof and a solvent and then polymerized.
本発明の樹脂組成物を構成するに使用される樹脂形成原
料としては、メタクリル酸メチル単量体あるいはメタク
リル酸メチルを主成分とする単量体混合物またはそれら
の部分重合物である。メタクリル酸メチルを主成分とす
る単量体混合物はメタクリル酸メチルおよびメタクリル
酸メチルと共重合性の他のビニル系単量体とからなるも
のである。メタクリル酸メチルと共重合性の他のビニル
単量体は特に限定されないが例えば炭素数1〜4のアル
キルアクリレート。The resin forming raw material used to constitute the resin composition of the present invention is a methyl methacrylate monomer, a monomer mixture containing methyl methacrylate as a main component, or a partial polymer thereof. The monomer mixture containing methyl methacrylate as a main component consists of methyl methacrylate and another vinyl monomer copolymerizable with methyl methacrylate. Other vinyl monomers copolymerizable with methyl methacrylate are not particularly limited, but include, for example, alkyl acrylates having 1 to 4 carbon atoms.
炭素数2〜4のアルキルメタクリレート、スチレン、α
−メチルスチレン、エチレングリコールジメタクリレー
ト、エチレングリコールジアクリレート、ジエチレング
リコールジメタクリレート、ジエチレングリコールジア
クリレート。Alkyl methacrylate having 2 to 4 carbon atoms, styrene, α
- Methylstyrene, ethylene glycol dimethacrylate, ethylene glycol diacrylate, diethylene glycol dimethacrylate, diethylene glycol diacrylate.
テトラエチレングリコールジメタアクリレート。Tetraethylene glycol dimethacrylate.
テトラエチレングリコールアクリレート、ペンタエリス
リトールテトラメタクリレート、ペンタエリスリトール
テトラアクリレート、アクリル酸アリル、メタアクリル
酸アリル等があげられる。これらの使用量は、単量体混
合物中50重量%以下である。また使用する樹脂原料の
部分重合物中の重合体含有量は、最終的に得られる重合
体の光学的性質を損なわぬためできる限り少ない方が望
ましい。Examples include tetraethylene glycol acrylate, pentaerythritol tetramethacrylate, pentaerythritol tetraacrylate, allyl acrylate, allyl methacrylate, and the like. The amount of these used is 50% by weight or less in the monomer mixture. Further, it is desirable that the polymer content in the partially polymerized resin raw material used be as small as possible so as not to impair the optical properties of the finally obtained polymer.
本発明の組成物を構成するのに使用されるガドリニウム
は、ガドリニウム化合物9例えばガドリニウムの酸化物
、炭酸ガドリニウム、水酸化ガドリニウム、あるいはガ
ドリニウムの酸化物と無機酸または有機酸とを反応する
ことにより得られる硝酸ガドリニウム、メタクリル酸ガ
ドリニウム、アクリル酸ガドリニウム等の無機または有
機酸のガドリニウム塩、またはガドリニウムの酸化物と
アセチルアセト/、またはベンゾイルアセト7等とを反
応して得られるトリス(アセチルアセトナト)ガドリニ
ウム、またはトリス(ベンゾイルアセトナト)ガドリニ
ウム等のガドリニウム錯化合物があげられる。これらガ
ドリニウム化合物の使用量はガドリニウム原子の重量濃
度が樹脂組成物全重量に対して0.01〜10重量%、
好ましくは1〜5重量%が望ましい。0.01重量係未
満の場合には、得られる樹脂組成物の中性子線遮蔽効果
が少な(。The gadolinium used to constitute the composition of the present invention can be obtained by reacting a gadolinium compound 9 such as an oxide of gadolinium, gadolinium carbonate, gadolinium hydroxide, or an oxide of gadolinium with an inorganic or organic acid. Tris(acetylacetonato)gadolinium obtained by reacting a gadolinium salt of an inorganic or organic acid such as gadolinium nitrate, gadolinium methacrylate, or gadolinium acrylate, or an oxide of gadolinium with acetylaceto/or benzoylaceto7, etc. , or gadolinium complex compounds such as tris(benzoylacetonato)gadolinium. The amount of these gadolinium compounds used is such that the weight concentration of gadolinium atoms is 0.01 to 10% by weight based on the total weight of the resin composition.
Preferably 1 to 5% by weight is desirable. If the weight ratio is less than 0.01, the resulting resin composition will have little neutron beam shielding effect (.
また10重重量上越えると光学的性質または機械的強度
の低下をきたす。Moreover, if the weight exceeds 10 weight, the optical properties or mechanical strength will deteriorate.
これらのガドリニウム化合物は、用途により一概に決め
られないが、メタクリル樹脂にブレンドするか、樹脂形
成原料と混合して重合するか、または樹脂形成原料およ
び溶媒と混合して重合する方法等によりメタクリル樹脂
中に含有せしめることができる。特に後者の溶媒を使用
する方法は散乱のない透明な樹脂製品を得るのに適して
いる。Although these gadolinium compounds cannot be determined unconditionally depending on the application, methacrylic resin can be produced by blending them with methacrylic resin, mixing them with resin-forming raw materials and polymerizing them, or mixing them with resin-forming raw materials and solvents and polymerizing them. It can be contained inside. Particularly, the method using the latter solvent is suitable for obtaining transparent resin products without scattering.
ガドリニウム化合物とブレンド、または樹脂形成原料に
添加する場合には、酸化ガドリニウ(9)
ム、炭酸ガドリニウムおよび水酸化ガドリニウム化合物
、ガドリニウムの錯化合物から選ばれたものが好ましい
例としてあげられる。またガドリニウム化合物を樹脂形
成原料および溶媒との混合物と混合して使用する場合に
は、ガドリニウムの酸化物と無機酸または有機酸とを反
応することにより得られる硝酸ガドリニウム、メタクリ
ル酸ガドリニウム、アクリル酸ガドリニウム等の無機ま
たは有機酸のガドリニウム塩およびそれらの複塩、また
はガドリニウムの酸化物とアセチルアセトン、またはベ
ンゾイルアセトン等とを反応して得られるトリス(アセ
チルアセトナト)ガドリニウム、またはトリス(べ/ジ
イルアセトナト)ガドリニウム等のガドリニウム錯化合
物が好ましい例としてあげられる。When blended with a gadolinium compound or added to a resin forming raw material, preferred examples include those selected from gadolinium(9) oxide, gadolinium carbonate, gadolinium hydroxide compounds, and complex compounds of gadolinium. In addition, when using a gadolinium compound in a mixture with a resin forming raw material and a solvent, gadolinium nitrate, gadolinium methacrylate, or gadolinium acrylate obtained by reacting gadolinium oxide with an inorganic or organic acid. Tris(acetylacetonato)gadolinium or tris(be/diylacetonato)gadolinium obtained by reacting gadolinium salts of inorganic or organic acids such as gadolinium salts and their double salts, or gadolinium oxides with acetylacetone, benzoylacetone, etc. Preferred examples include gadolinium complex compounds such as .
本発明の樹脂組成物を製造する際に使用される溶媒とし
ては、樹脂形成原料およびガドリニウム化合物に対して
溶解性を示す下記の一般式(10)
R,−C−OH(1)
(式中I R,は炭素数1〜20の飽和あるいは不飽和
の炭化水素残基である)
(式中I R2は水素または炭素数1〜9の飽和または
不飽和の炭化水素残基、R3は炭素数1〜4の飽和ある
いは不飽和の炭化水素残基である)
(式中、R4は水素またはメチル基、A、は炭素数2〜
6のアルキル基、nは0あるいは1〜10の整数である
)
(式中I R,は水素またはメチル基、R6は炭素数2
〜6のアルキレン基である)
R,−0)I (5) または
(式中、R7は炭素数3〜10の飽和あるいは不飽和の
炭化水素残基である)
R,(−A、 −0輻H(6)
(式中、R8は水酸基または炭素数1〜10の飽和ある
いは不飽和の炭化水素残基、A、は炭素数2〜4のアル
キレフ基、mは2〜10の整数である)から選ばれる化
合物である。As the solvent used when manufacturing the resin composition of the present invention, the following general formula (10) R, -C-OH (1) (in the formula I R is a saturated or unsaturated hydrocarbon residue having 1 to 20 carbon atoms) (In the formula, I R2 is hydrogen or a saturated or unsaturated hydrocarbon residue having 1 to 9 carbon atoms, and R3 is a carbon number 1 to 4 saturated or unsaturated hydrocarbon residues) (In the formula, R4 is hydrogen or a methyl group, and A is a carbon number of 2 to 4.
6 alkyl group, n is 0 or an integer from 1 to 10) (In the formula, I R is hydrogen or a methyl group, R6 has 2 carbon atoms
-6 alkylene group) R, -0)I (5) or (wherein R7 is a saturated or unsaturated hydrocarbon residue having 3 to 10 carbon atoms) R, (-A, -0 Radiation H (6) (wherein R8 is a hydroxyl group or a saturated or unsaturated hydrocarbon residue having 1 to 10 carbon atoms, A is an alkylev group having 2 to 4 carbon atoms, and m is an integer of 2 to 10 ) is a compound selected from
前記一般式(1)、 (2)、 (3)、 (41,(
5)および(6)で示される溶媒は、ガドリニウム化合
物を樹脂形成原料に均一に溶解させるための共溶媒であ
って例えばメタクリル酸、アクリル酸等の不飽和カルボ
y酸、プロピオン酸、オクチル酸、イン酪酸、ヘキサン
酸、オクチル安息香酸、ステアリン酸、バルミチ/酸、
ナフテン酸等の飽和または不飽和脂肪酸、2−ヒドロキ
シエチルアクリレート、2−ヒドロキシエチルメタクリ
レート等の不飽和アルコール、プロピルアルコール。The general formula (1), (2), (3), (41, (
The solvents shown in 5) and (6) are cosolvents for uniformly dissolving the gadolinium compound in the resin forming raw material, and include unsaturated carboxylic acids such as methacrylic acid and acrylic acid, propionic acid, octylic acid, Inbutyric acid, hexanoic acid, octylbenzoic acid, stearic acid, valmic acid,
Saturated or unsaturated fatty acids such as naphthenic acid, unsaturated alcohols such as 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, propyl alcohol.
シクロヘキシルアルコール等の飽和脂肪族アルコール、
エチレンクリコール、ジエチレングリコール、プロピレ
ングリコール等のグリコールがあげられる。これらの溶
媒のうち、メタクリル酸、アクリル酸、2−ヒドロキシ
エチルメタクリレート、2−ヒドロキシエチルアクリレ
ート等のメタクリル酸メチルと共重合性のある単量体が
好ましい。これらの溶媒は単独でまたは2種以上を組み
合わせて用いることができる。Saturated aliphatic alcohols such as cyclohexyl alcohol,
Examples include glycols such as ethylene glycol, diethylene glycol, and propylene glycol. Among these solvents, monomers copolymerizable with methyl methacrylate, such as methacrylic acid, acrylic acid, 2-hydroxyethyl methacrylate, and 2-hydroxyethyl acrylate, are preferred. These solvents can be used alone or in combination of two or more.
本発明における溶媒の使用量は、使用するガドリニウム
化合物の種類、量により一概に決めることが出来ないが
、40重量係以下、好ましくは10重量係以下である。The amount of the solvent to be used in the present invention cannot be determined unconditionally depending on the type and amount of the gadolinium compound used, but it is not more than 40 parts by weight, preferably not more than 10 parts by weight.
使用量が40重量係を越える場合には得られる樹脂組成
物の機械的。When the amount used exceeds 40% by weight, the mechanical properties of the resulting resin composition.
熱的性質を低下させるので好ましくない。This is not preferred because it lowers the thermal properties.
本発明において使用する重合開始剤としては例えばベン
ゾイルパーオキサイド、ラウロイルパーオキサイド等の
過酸化物系、 2.2’−アゾビスインブチロニトリ
ル、 2.2’−アゾビス−(2゜4−ジメチルバレ
ロニトリル)、2.2′−アゾビス−(2@4−ジメチ
ル−4−メトキシ−バレロニトリル)等のアゾビス系の
ような公知のラジカル開始剤が使用できる。これらの重
合開始剤(13)
は単独のみならびに2種以上を混合して使用でき、その
使用量は樹脂原料100重量部に対して0.001〜0
.13i、置部である。Examples of the polymerization initiator used in the present invention include peroxides such as benzoyl peroxide and lauroyl peroxide, 2,2'-azobisinbutyronitrile, 2,2'-azobis-(2°4-dimethyl Known radical initiators such as azobis-based initiators such as valeronitrile) and 2,2'-azobis-(2@4-dimethyl-4-methoxy-valeronitrile) can be used. These polymerization initiators (13) can be used alone or in combination of two or more, and the amount used is 0.001 to 0.00 parts by weight per 100 parts by weight of the resin raw material.
.. 13i, Okibe.
本発明の樹脂組成物を得るに際しての重合法としては、
特に限定されないが注型重合が好ましい重合法としてあ
げられる。この注型重合の場合には、前記成分(R1,
(hl−#よび(clから調Rされた重合混合物を1例
えば無機ガラス板、ステンレス・スチール板、ニッケル
クロム板マたはアルミニウム板等と軟質の塩化ビニル製
のガスケットとで構成された鋳型内に注入して重合させ
ろ。注型重合は45〜95℃で0.3〜15時間、引続
き100〜145℃でlO分〜5時間かけて重合を完結
させる。The polymerization method for obtaining the resin composition of the present invention is as follows:
Although not particularly limited, cast polymerization is a preferred polymerization method. In the case of this cast polymerization, the components (R1,
The polymerization mixture prepared from (hl-# and (cl) is placed in a mold made of, for example, an inorganic glass plate, stainless steel plate, nickel chromium plate, or aluminum plate, etc., and a soft vinyl chloride gasket. Cast polymerization is carried out at 45-95° C. for 0.3-15 hours, and then at 100-145° C. for 10 minutes to 5 hours to complete the polymerization.
本発明においては必要に応じて紫外線吸収剤。In the present invention, an ultraviolet absorber is used as necessary.
離型剤、熱安定剤1着色剤、光拡散剤を、また更に他の
中性子遮蔽用化合物および鉛化合物等を添加することも
できる。A mold release agent, a heat stabilizer, a coloring agent, a light diffusing agent, and other neutron shielding compounds, lead compounds, etc. can also be added.
以上述べたような構成からなる本発明の光学的および機
械的性質に優れたガドリニウム含有(14)
メタクリル樹脂組成物は、一般のアクリル樹脂と同じ装
造工程で容易に製造でき、中性子線を主体とする放射線
の遮蔽材料として利用できる。The gadolinium-containing methacrylic resin composition (14) of the present invention having the above-mentioned structure and having excellent optical and mechanical properties can be easily produced in the same manufacturing process as general acrylic resins, and is mainly neutron ray-containing. It can be used as a radiation shielding material.
また本発明の組成物中に鉛化合物を併用するとX線、r
@、中性子線のいずれとも遮蔽することが可能となる。Furthermore, when a lead compound is used in combination with the composition of the present invention, X-rays,
It becomes possible to shield from both @ and neutron beams.
本発明のメタクリル樹脂組成物は中性子遮蔽材料にとり
わけ有用であるが。The methacrylic resin compositions of the present invention are particularly useful as neutron shielding materials.
他の用途1例えば光学フィルター、光学レンズ。Other uses 1 For example, optical filters, optical lenses.
光変換材、照明材などの用途にも使用できる。It can also be used for applications such as light conversion materials and lighting materials.
次に実施例によって本発明を更に詳しく説明するが1本
発明を限定するものではない。Next, the present invention will be explained in more detail with reference to examples, but the present invention is not limited thereto.
参考例1 メタクリル酸ガドリニウムの合成メタクリル
酸2807’およびトルエン1000Iの混合物に重合
禁止剤としてハイドロキノンモノメチルエーテル0.3
J’を均一に溶解し、これを60℃に加温した後、こ
の溶液に酸化ガドリニウム粉末166!を20分かげて
添加してゆき、1時間攪拌を続ける。Reference Example 1 Synthesis of gadolinium methacrylate Hydroquinone monomethyl ether 0.3 as a polymerization inhibitor was added to a mixture of methacrylic acid 2807' and toluene 1000I.
After uniformly dissolving J' and heating it to 60°C, gadolinium oxide powder 166! is added to this solution. was added over 20 minutes and stirring continued for 1 hour.
次いで該反応液を1日放置した後、濾過し。The reaction solution was then allowed to stand for one day, and then filtered.
F液を除去してメタクリル酸ガドリニウムを得る。収量
は357Fであった。The F solution is removed to obtain gadolinium methacrylate. The yield was 357F.
参考例2 硝酸ガドリニウムの合成
濃硝酸に少過剰の酸化ガドリニウムを加熱溶解し反応さ
せる。1時間後、F液を冷却し硝酸ガドリニウムの結晶
を析出させた。収率は62チであった。Reference Example 2 Synthesis of Gadolinium Nitrate A slight excess of gadolinium oxide is dissolved in concentrated nitric acid by heating and reacted. After 1 hour, the F solution was cooled to precipitate gadolinium nitrate crystals. The yield was 62 inches.
参考例3 トリス(アセチルアセトナト)ガドリニウム
の合成
アセチルアセト/100cL3と酸化ガドリニウム18
07’を無水ジエチルエーテル30006eに懸濁させ
2時間還流を行ない、引続きジエチルエーテルを溜出除
去しエトリス(アセチルアセトナト)ガドリニウムの結
晶を得た。収率は65%であった。Reference example 3 Synthesis of tris(acetylacetonato)gadolinium Acetylaceto/100cL3 and gadolinium oxide 18
07' was suspended in anhydrous diethyl ether 30006e and refluxed for 2 hours, followed by distillation and removal of diethyl ether to obtain crystals of etris(acetylacetonato)gadolinium. The yield was 65%.
実施例1
参考例2で合成した硝酸ガドリニウム3Iを2−ヒドロ
キシエチルメタクリレ−)177’およびプロピレング
リコール21の混合液に溶解させ、この溶液にメタクリ
ル酸メチル78Pを添加、攪拌し混合する。この混合液
は透明液であった。Example 1 Gadolinium 3I synthesized in Reference Example 2 is dissolved in a mixed solution of 2-hydroxyethyl methacrylate) 177' and propylene glycol 21, and methyl methacrylate 78P is added to this solution and mixed by stirring. This liquid mixture was a transparent liquid.
次にこの混合液に重合触媒として0.04J’の2.2
′−アゾビス−(2,4−ジメチルバレロニトリル)お
よび離型剤として0.00℃Mのジオクチルスルホサク
シネートナトリウム塩を添加して溶解させた後、脱気し
、予め板厚が3 zxとなるよう設定された常法の無機
ガラスの鋳型中に注入し、この鋳型を65℃の温水に1
80分浸漬し1次いで110℃の空気浴に120分滞在
させて重合を完結させた。鋳型から取り出した樹脂板は
透明であった。Next, add 0.04 J' of 2.2 to this mixture as a polymerization catalyst.
'-Azobis-(2,4-dimethylvaleronitrile) and 0.00 °C M dioctyl sulfosuccinate sodium salt as a mold release agent were added and dissolved, then degassed and molded to a plate thickness of 3zx in advance. Pour the mold into a conventional inorganic glass mold set to
The polymerization was completed by immersing for 80 minutes and then staying in an air bath at 110°C for 120 minutes. The resin plate taken out from the mold was transparent.
実施例2
参考例2で合成した硝酸ガドリニウム1.51を、2−
ヒドロキシエチルメタクリレート8.5Iに溶解させ、
更にこれをメタクリル酸メチル90/に添加して攪拌混
合する。この混合液は透明であった。この混合液に実施
例1で使用したのと同じ種類および量の重合触媒と離型
剤を添加して実施例1と同じ条件で注型重合を行なった
。得られた樹脂板は透明であった。Example 2 Gadolinium nitrate 1.51 synthesized in Reference Example 2 was converted into 2-
Dissolved in hydroxyethyl methacrylate 8.5I,
Further, this was added to 90% of methyl methacrylate and mixed with stirring. This mixture was clear. The same type and amount of polymerization catalyst and mold release agent as used in Example 1 were added to this mixed solution, and cast polymerization was carried out under the same conditions as in Example 1. The obtained resin plate was transparent.
(17)
実施例3
参考例3で合成したトリス(アセチルアセトナト)ガド
リニウム1.5tを、メタクリル酸8.5Pに溶解させ
、この液をメタクリル酸メチル907’に添加、攪拌し
て混合する。(17) Example 3 1.5 t of tris(acetylacetonato)gadolinium synthesized in Reference Example 3 is dissolved in 8.5 P of methacrylic acid, and this solution is added to methyl methacrylate 907' and mixed by stirring.
この混合液に実施例1と同じ重合触媒、離型剤を添加し
、実施例1と同じ注型重合を行なった。重合完結後、鋳
型から剥離した樹脂板は透明であった。The same polymerization catalyst and mold release agent as in Example 1 were added to this mixed solution, and the same cast polymerization as in Example 1 was performed. After completion of polymerization, the resin plate peeled off from the mold was transparent.
実施例4
参考例1で合成したメタクリル酸ガドIJ ニウム8t
と、n−オクチル酸2P、プロピレングリコール1/、
2−ヒドロキシエチルメタクリレートll、スチレン5
1およびメタクリル酸メチル83J’を混合し、実施例
1と同じ重合条件で注型重合を繰返した。得られた樹脂
板は透明であった。Example 4 Gado IJ methacrylate synthesized in Reference Example 1 8t
and n-octylic acid 2P, propylene glycol 1/,
2-hydroxyethyl methacrylate 1l, styrene 5
1 and methyl methacrylate 83J' were mixed, and cast polymerization was repeated under the same polymerization conditions as in Example 1. The obtained resin plate was transparent.
実施例5
アクリル酸ガドリニウム31.メタクリル酸サマリウム
31.メタクリル酸ユーロピウム1(18)
/、n−オクチル酸31.プロピレングリコール11を
メタクリル酸メチル89J’に混合し。Example 5 Gadolinium acrylate 31. Samarium methacrylate 31. europium methacrylate 1(18)/n-octylic acid 31. Mix propylene glycol 11 with methyl methacrylate 89J'.
実施例1と同じ重合条件で注型重合を繰返した。Cast polymerization was repeated under the same polymerization conditions as in Example 1.
得られた樹脂板は透明であった。The obtained resin plate was transparent.
実施例6
参考例1で得られたメタクリル酸ガドリニウム4t、メ
タクリル酸鉛4J’en−オクチル酸31、プロピレン
グリコール2J’、2−ヒドロキシおよびエチルメタグ
リレー)11ヲ、 メタクリル酸メチル867’に混
合し、実施例1と同じ条件で注型重合を繰返した。得ら
れた樹脂板は透明であった。Example 6 4t of gadolinium methacrylate obtained in Reference Example 1, 4t of lead methacrylate, 31 of octylic acid, 2J' of propylene glycol, 11 of 2-hydroxy and ethylmethacrylate), and 867' of methyl methacrylate were mixed. Then, the casting polymerization was repeated under the same conditions as in Example 1. The obtained resin plate was transparent.
実施例7
メタクリル酸メチルの部分重合体(重合率18%)10
0重量部に9重合触媒としてα、α′−アゾビス−(2
,4−ジメチルバレロニトリル)0.04重量部、離型
剤としてジオクチルスルホサクシネート・ナトリタム塩
0.005重量部。Example 7 Partial polymer of methyl methacrylate (polymerization rate 18%) 10
α, α′-Azobis-(2
, 4-dimethylvaleronitrile) 0.04 parts by weight, and 0.005 parts by weight of dioctyl sulfosuccinate natritam salt as a mold release agent.
平均粒径が2μである酸化ガドリニウム2.0重量部を
添加混合し、脱気した後予め板厚が311!となるよう
にした強化ガラスと軟質の塩化ビニール製ガスケットで
構成した鋳型中に注入し。After adding and mixing 2.0 parts by weight of gadolinium oxide with an average particle size of 2μ and degassing, the plate thickness is 311mm! It is poured into a mold made of tempered glass and a soft vinyl chloride gasket.
70℃の温水で60分間浸漬し1次いで130℃の空気
浴中で80分分間−て重合を完結して樹脂板を得た。The resin plate was immersed in warm water at 70°C for 60 minutes and then placed in an air bath at 130°C for 80 minutes to complete polymerization.
実施例8
メタクリル樹脂(三菱レイヨン(株)裂、商品名 アク
リベットVH) loo重量部に対して平均粒径0.
5μの水酸化ガドリニウム2.0重量部及び平均粒径が
2μの炭酸ガドリニウム1.0重量部添加して夕/ブラ
ーで十分混合して均一化した後、常法により押出機より
押出して板厚3隨のシートを得た。Example 8 Methacrylic resin (manufactured by Mitsubishi Rayon Co., Ltd., trade name: Acryvet VH) Average particle size of 0.00% based on loo parts by weight.
Add 2.0 parts by weight of gadolinium hydroxide having a particle size of 5μ and 1.0 part by weight of gadolinium carbonate having an average particle size of 2μ, mix thoroughly with a mixer/blurr to make it homogeneous, and then extrude it from an extruder using a conventional method to obtain a plate thickness. Got 3 seats.
実施例1〜7で得られたメタクリル樹脂板の全光線透過
率(%)、曇価(%)1曲げ破壊強度(’#/crrL
’ )および中性子遮蔽能(熱中性子吸収断面積)の結
果を表1に示す。Total light transmittance (%), haze value (%) 1 bending fracture strength ('#/crrL) of the methacrylic resin plates obtained in Examples 1 to 7
) and neutron shielding ability (thermal neutron absorption cross section) results are shown in Table 1.
なお、全光線透過率Rよび曇価はASTM−I)−10
03−61,曲げ破壊強度はASTM−D−790に準
じて測定した。また熱中性子吸収断面積は実験化学講座
(12)放射化学(丸善)に記載の数値および下記式に
゛より求めた。In addition, the total light transmittance R and haze value are ASTM-I)-10
03-61, bending fracture strength was measured according to ASTM-D-790. The thermal neutron absorption cross section was determined using the numerical values described in Experimental Chemistry Course (12) Radiochemistry (Maruzen) and the following formula.
但し S ;組成物1007’当りの熱中性子吸収断面
積(cm” )
Ml; 1種元素の原子量
Wi; 1種元素の存在量
81;i種元素の熱中性子吸収断面積
(barns )
N;アボガドロ数
(量=1・・・・・n)
(21]
(22)However, S: Thermal neutron absorption cross section per composition 1007'(cm") Ml: Atomic weight of type 1 element Wi; Abundance of type 1 element 81; Thermal neutron absorption cross section of type i element (barns) N: Avogadro Number (amount = 1...n) (21] (22)
Claims (1)
中にガドリニウムを含有せしめたメタクリル樹脂組成物
〇 ユ ガドリニウム原子の重量濃度が全組成物に対して0
.07〜10重量%であることを特徴とする特許請求の
範囲第1項記載のメタクリル樹脂組成物。 3、 (a) メタクリル酸メチル単量体あるいはメ
タクリル酸メチルを主成分とする単量体混合物またはそ
れらの部分重合物から選ばれる樹脂原料 (b) ガドリニウム化合物 (0) 前記成分(IL)およびtb>に対して溶解
性を示す下記の一般式 (1) %式%[1 (式中、R1は炭素WI/〜−〇の飽和あるいは不飽和
の炭化水素残基である) (式中、R,Gt水素または炭素数l〜9の炭化水素残
基、R5は炭素数/−Qの飽和あるいは不飽和の炭化水
素残基である) (式中、R4は水素またはメチル基、AIは炭素数2〜
Aのアルキル基、nはOまたは1−10の整数である) (式中、R5は水素またはメチル基、R6は炭素数−〜
乙のアルキレン基である) R,−OH(、!t) または (式中、R1は炭素数3〜10の飽和あるいは不飽和の
炭化水素残基である) R,(−A、 −0+rnl−1(Al(式中、R1は
水酸基または炭素数lNl0の飽和あるいは不飽和の炭
化水素残基、A、は炭素数a〜ダリアルキレン基、mG
まコ〜ioの整数である) から遠ばれる少なくとも7種の溶媒および(dl 重
合開始剤 よりなる重合混合*を鋳型中で重合することを特徴とす
るメタクリル樹脂組成物の製造法。 の諾化合・物から遠ばれたものであることを特徴とする
特許mG求の範囲第3項記載σ〕メタクリル樹脂組成物
の製造法0 ぷ ガドリニウム化合物がメタクリル酸ガドリニウム、
アクリル酸ガドリニウムまたはトリス(アセチルアセト
ナト)ガドリニウムから選ばれたものであり、また溶媒
がオクチル酸およびプロピレングリコールおよび/また
はコーヒドロキシエチルメタクリレートまたはコーヒド
四キシエチルアクリレートであることを特徴とする特許
請求の範@第3項記載のメタクリル樹脂組成物の製造法
。[Scope of Claims] l A methacrylic resin composition in which gadolinium is contained in a methacrylic resin containing methyl methacrylate as a main component.The weight concentration of gadolinium atoms is 0 relative to the entire composition.
.. 2. The methacrylic resin composition according to claim 1, wherein the amount is 07 to 10% by weight. 3. (a) Resin raw material selected from methyl methacrylate monomer, a monomer mixture containing methyl methacrylate as a main component, or a partial polymer thereof (b) Gadolinium compound (0) The above component (IL) and tb The following general formula (1) showing solubility in , Gt hydrogen or a hydrocarbon residue having 1 to 9 carbon atoms, R5 is a saturated or unsaturated hydrocarbon residue having carbon number/-Q) (wherein, R4 is hydrogen or a methyl group, and AI is a carbon number 2~
A's alkyl group, n is O or an integer of 1-10) (wherein, R5 is hydrogen or a methyl group, R6 is the number of carbon atoms -
R, -OH (,!t) or (in the formula, R1 is a saturated or unsaturated hydrocarbon residue having 3 to 10 carbon atoms) R, (-A, -0+rnl- 1 (Al (in the formula, R1 is a hydroxyl group or a saturated or unsaturated hydrocarbon residue with a carbon number of 1N10, A is a carbon number of a to darylkylene group, mG
A method for producing a methacrylic resin composition, characterized by polymerizing in a mold a polymerization mixture* consisting of at least seven types of solvents far from (dl is an integer between mako and io) and (dl) a polymerization initiator.・Patent characterized by being far from physical objects (mG) Scope described in item 3 σ] Manufacturing method of methacrylic resin composition 0 p The gadolinium compound is gadolinium methacrylate,
selected from gadolinium acrylate or tris(acetylacetonato)gadolinium, and the solvent is octylic acid and propylene glycol and/or co-hydroxyethyl methacrylate or co-hydro-tetraxyethyl acrylate. A method for producing a methacrylic resin composition according to Section 3.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19580082A JPS5986609A (en) | 1982-11-08 | 1982-11-08 | Methacrylic resin composition and its manufacturing method |
| EP83306711A EP0108622B1 (en) | 1982-11-08 | 1983-11-03 | Synthetic resin composition and process for producing the same |
| DE8383306711T DE3375794D1 (en) | 1982-11-08 | 1983-11-03 | Synthetic resin composition and process for producing the same |
| US06/548,444 US4563494A (en) | 1982-11-08 | 1983-11-03 | Synthetic resin composition and process for producing the same |
| IT23617/83A IT1170240B (en) | 1982-11-08 | 1983-11-07 | COMPOSITION BASED ON SYNTHETIC RESIN AND PROCESS FOR ITS PRODUCTION |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19580082A JPS5986609A (en) | 1982-11-08 | 1982-11-08 | Methacrylic resin composition and its manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5986609A true JPS5986609A (en) | 1984-05-18 |
| JPH0262562B2 JPH0262562B2 (en) | 1990-12-26 |
Family
ID=16347183
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19580082A Granted JPS5986609A (en) | 1982-11-08 | 1982-11-08 | Methacrylic resin composition and its manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5986609A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01253696A (en) * | 1988-04-01 | 1989-10-09 | Ask Corp | Shielding material for thermal neutron |
| JP2011506747A (en) * | 2007-12-17 | 2011-03-03 | インクテック カンパニー リミテッド | Method for producing silver nanoparticle dispersed resin |
| JP2016029154A (en) * | 2014-07-18 | 2016-03-03 | 三洋化成工業株式会社 | Polyurethane resin-formable composition for radiation shielding material |
-
1982
- 1982-11-08 JP JP19580082A patent/JPS5986609A/en active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01253696A (en) * | 1988-04-01 | 1989-10-09 | Ask Corp | Shielding material for thermal neutron |
| JP2011506747A (en) * | 2007-12-17 | 2011-03-03 | インクテック カンパニー リミテッド | Method for producing silver nanoparticle dispersed resin |
| JP2016029154A (en) * | 2014-07-18 | 2016-03-03 | 三洋化成工業株式会社 | Polyurethane resin-formable composition for radiation shielding material |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0262562B2 (en) | 1990-12-26 |
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