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JPS52127169A - Monitoring method of etching amount in etching performance - Google Patents

Monitoring method of etching amount in etching performance

Info

Publication number
JPS52127169A
JPS52127169A JP4364876A JP4364876A JPS52127169A JP S52127169 A JPS52127169 A JP S52127169A JP 4364876 A JP4364876 A JP 4364876A JP 4364876 A JP4364876 A JP 4364876A JP S52127169 A JPS52127169 A JP S52127169A
Authority
JP
Japan
Prior art keywords
etching
amount
monitoring method
performance
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4364876A
Other languages
Japanese (ja)
Inventor
Minoru Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4364876A priority Critical patent/JPS52127169A/en
Publication of JPS52127169A publication Critical patent/JPS52127169A/en
Pending legal-status Critical Current

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  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To monitor etching amount of processed body by providing oscillating body fixed contrast body on one part of electrode and then by etching at the same time when processed body mounted on electrode is sputter-etched and by applying for formula showing relation with mass reducing amount of processed body and alteration amount of previously produced oscillating frequency.
COPYRIGHT: (C)1977,JPO&Japio
JP4364876A 1976-04-19 1976-04-19 Monitoring method of etching amount in etching performance Pending JPS52127169A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4364876A JPS52127169A (en) 1976-04-19 1976-04-19 Monitoring method of etching amount in etching performance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4364876A JPS52127169A (en) 1976-04-19 1976-04-19 Monitoring method of etching amount in etching performance

Publications (1)

Publication Number Publication Date
JPS52127169A true JPS52127169A (en) 1977-10-25

Family

ID=12669674

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4364876A Pending JPS52127169A (en) 1976-04-19 1976-04-19 Monitoring method of etching amount in etching performance

Country Status (1)

Country Link
JP (1) JPS52127169A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109937471A (en) * 2016-11-14 2019-06-25 应用材料公司 Selective Etch Rate Monitor
JPWO2022157908A1 (en) * 2021-01-22 2022-07-28

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109937471A (en) * 2016-11-14 2019-06-25 应用材料公司 Selective Etch Rate Monitor
JP2021106272A (en) * 2016-11-14 2021-07-26 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Selective etch rate monitor
CN109937471B (en) * 2016-11-14 2023-08-22 应用材料公司 Selective Etch Rate Monitor
JPWO2022157908A1 (en) * 2021-01-22 2022-07-28

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