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JPS522785A - Analyzing method and its device for the same - Google Patents

Analyzing method and its device for the same

Info

Publication number
JPS522785A
JPS522785A JP50078974A JP7897475A JPS522785A JP S522785 A JPS522785 A JP S522785A JP 50078974 A JP50078974 A JP 50078974A JP 7897475 A JP7897475 A JP 7897475A JP S522785 A JPS522785 A JP S522785A
Authority
JP
Japan
Prior art keywords
same
analyzing method
analyze
sample
dividing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50078974A
Other languages
Japanese (ja)
Inventor
Hiroshi Yamauchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Shimadzu Seisakusho Ltd
Original Assignee
Shimadzu Corp
Shimadzu Seisakusho Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp, Shimadzu Seisakusho Ltd filed Critical Shimadzu Corp
Priority to JP50078974A priority Critical patent/JPS522785A/en
Publication of JPS522785A publication Critical patent/JPS522785A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To analyze a sample itself or sample closed in the supporting items, into its elements or to analyze it in its condition without dividing it into small ones.
JP50078974A 1975-06-24 1975-06-24 Analyzing method and its device for the same Pending JPS522785A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50078974A JPS522785A (en) 1975-06-24 1975-06-24 Analyzing method and its device for the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50078974A JPS522785A (en) 1975-06-24 1975-06-24 Analyzing method and its device for the same

Publications (1)

Publication Number Publication Date
JPS522785A true JPS522785A (en) 1977-01-10

Family

ID=13676862

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50078974A Pending JPS522785A (en) 1975-06-24 1975-06-24 Analyzing method and its device for the same

Country Status (1)

Country Link
JP (1) JPS522785A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007292702A (en) * 2006-04-27 2007-11-08 Jeol Ltd Sample inspection apparatus, sample inspection method, and sample inspection system
JP2007294365A (en) * 2006-04-27 2007-11-08 Jeol Ltd Sample inspection method, sample holder, sample inspection apparatus, and sample inspection system
JP2008153086A (en) * 2006-12-19 2008-07-03 Jeol Ltd Sample inspection apparatus, sample inspection method, and sample inspection system
JP2008309676A (en) * 2007-06-15 2008-12-25 Dialight Japan Co Ltd Inspection system
JP2009238426A (en) * 2008-03-26 2009-10-15 Jeol Ltd Sample inspecting device, and sample inspecting method
JP2012160267A (en) * 2011-01-31 2012-08-23 Hitachi High-Technologies Corp Charged particle beam apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007292702A (en) * 2006-04-27 2007-11-08 Jeol Ltd Sample inspection apparatus, sample inspection method, and sample inspection system
JP2007294365A (en) * 2006-04-27 2007-11-08 Jeol Ltd Sample inspection method, sample holder, sample inspection apparatus, and sample inspection system
JP2008153086A (en) * 2006-12-19 2008-07-03 Jeol Ltd Sample inspection apparatus, sample inspection method, and sample inspection system
JP2008309676A (en) * 2007-06-15 2008-12-25 Dialight Japan Co Ltd Inspection system
JP2009238426A (en) * 2008-03-26 2009-10-15 Jeol Ltd Sample inspecting device, and sample inspecting method
JP2012160267A (en) * 2011-01-31 2012-08-23 Hitachi High-Technologies Corp Charged particle beam apparatus

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