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JPS6416610A - Cleaving device - Google Patents

Cleaving device

Info

Publication number
JPS6416610A
JPS6416610A JP17251087A JP17251087A JPS6416610A JP S6416610 A JPS6416610 A JP S6416610A JP 17251087 A JP17251087 A JP 17251087A JP 17251087 A JP17251087 A JP 17251087A JP S6416610 A JPS6416610 A JP S6416610A
Authority
JP
Japan
Prior art keywords
divided
tables
operated
cleavage
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17251087A
Other languages
Japanese (ja)
Inventor
Nobuo Imazeki
Shinichiro Kono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP17251087A priority Critical patent/JPS6416610A/en
Publication of JPS6416610A publication Critical patent/JPS6416610A/en
Pending legal-status Critical Current

Links

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  • Processing Of Stones Or Stones Resemblance Materials (AREA)

Abstract

PURPOSE:To prevent the defect or contamination on the surface of crystal after its cleavage by a method in which the working table almost corresponding to the shape of the object to be cleft is provided with suction holes, and is divided along the desired cutting lines by providing the difference in level, and then the divided tables are independently operated by vacuum. CONSTITUTION:A working table 5 is a circular table with the size corresponding to a wafer, and is divided into five parts. Each divided table 5a-5e is capable of rising and lowering independently and is provided with a number of suction holes 15. When the wafer which has been preliminarily registered is transferred onto the table, first the vacuum of the divided tables 5a-5c are operated and the divided tables 5a ands 5e are lowered, and then the vacuum of the tables 5d and 5e are operated. Then, bending impact is applied to the wafer, whereby its cleavage is advanced along the difference in level of the table, and both ends thereof are cut. Next, the divided tables 5b, 5c are operated similarly, and by the bending in the direction crossing at right angle to above mentioned direction, the cleavage is advanced along the difference in level, whereby a rectangular crystalline base plate remains one the table 5a.
JP17251087A 1987-07-10 1987-07-10 Cleaving device Pending JPS6416610A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17251087A JPS6416610A (en) 1987-07-10 1987-07-10 Cleaving device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17251087A JPS6416610A (en) 1987-07-10 1987-07-10 Cleaving device

Publications (1)

Publication Number Publication Date
JPS6416610A true JPS6416610A (en) 1989-01-20

Family

ID=15943298

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17251087A Pending JPS6416610A (en) 1987-07-10 1987-07-10 Cleaving device

Country Status (1)

Country Link
JP (1) JPS6416610A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5829658A (en) * 1995-05-22 1998-11-03 Alcatel N.V. Method and device for carrying out the cleavage in ultra-high vacuum environment of portions of a processed semiconductor wafer
JP2008159959A (en) * 2006-12-26 2008-07-10 Sanyo Electric Co Ltd Semiconductor substrate cleaving method and cleaving apparatus, solar cell cleaving method and solar cell module manufacturing method
JP2009166143A (en) * 2008-01-11 2009-07-30 Disco Abrasive Syst Ltd Cutting equipment
JP2015191993A (en) * 2014-03-28 2015-11-02 株式会社東京精密 Semiconductor manufacturing device and semiconductor manufacturing method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5829658A (en) * 1995-05-22 1998-11-03 Alcatel N.V. Method and device for carrying out the cleavage in ultra-high vacuum environment of portions of a processed semiconductor wafer
JP2008159959A (en) * 2006-12-26 2008-07-10 Sanyo Electric Co Ltd Semiconductor substrate cleaving method and cleaving apparatus, solar cell cleaving method and solar cell module manufacturing method
JP2009166143A (en) * 2008-01-11 2009-07-30 Disco Abrasive Syst Ltd Cutting equipment
JP2015191993A (en) * 2014-03-28 2015-11-02 株式会社東京精密 Semiconductor manufacturing device and semiconductor manufacturing method

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