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JPS60116775A - Treatment device for vapor deposition - Google Patents

Treatment device for vapor deposition

Info

Publication number
JPS60116775A
JPS60116775A JP22497783A JP22497783A JPS60116775A JP S60116775 A JPS60116775 A JP S60116775A JP 22497783 A JP22497783 A JP 22497783A JP 22497783 A JP22497783 A JP 22497783A JP S60116775 A JPS60116775 A JP S60116775A
Authority
JP
Japan
Prior art keywords
gear
gears
planetary gears
vapor deposition
fixed gear
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22497783A
Other languages
Japanese (ja)
Other versions
JPH0350833B2 (en
Inventor
Yoshikazu Sakashita
坂下 嘉和
Shunji Inamura
稲村 俊二
Kazuyuki Suganuma
菅沼 一幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pioneer Corp
Original Assignee
Pioneer Corp
Pioneer Electronic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pioneer Corp, Pioneer Electronic Corp filed Critical Pioneer Corp
Priority to JP22497783A priority Critical patent/JPS60116775A/en
Publication of JPS60116775A publication Critical patent/JPS60116775A/en
Publication of JPH0350833B2 publication Critical patent/JPH0350833B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • C23C14/505Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To increase the number of materials for vapor deposition to be housed in each one batch by disposing alternately plural basic planetary gears and additive planetary gears attached with said materials at equal intervals on the circumference of a stationary gear and rotating synchronously the adjacent materials in opposite directions. CONSTITUTION:Plural basic planetary gears 11a-11f are freely rotatably supported at equal intervals on the circumference of a stationary gear 3 installed with a vapor deposition source 4 in the central part. Additive planetary gears 12a-12f are disposed at the intermediate of the gears 11a-11f and are rotated in opposite directions in synchronization with the gears 11a-11f by two-stage counter gears 13a-13f, 14a-14f. Discs 9a-9l are respectively attached to the gears 11a-11f and the gears 12a-12f. The pitch circle and number of teeth of the respective gears are respectively determined in such a way that the adjacent discs do not collide against each other. The treating capacity for the discs 9a- 9l is thus increased.

Description

【発明の詳細な説明】 本発明は、蒸着処理装置に関し、特に光学式情報記録媒
体(以下単にディスクと称する)の信号面上に金属を真
空蒸着して反射膜を形成するための蒸着処理装置に関す
るものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a vapor deposition processing apparatus, and particularly to a vapor deposition processing apparatus for forming a reflective film by vacuum vapor depositing metal on the signal surface of an optical information recording medium (hereinafter simply referred to as a disk). It is related to.

従来この種の装置として第1図に示すものがあった。図
において、基台1及びハウジング2によシ、真空で金属
蒸気雰囲気の蒸着室が画定され、基台1の中央部には固
定ギア3が配置きれている。
A conventional device of this type is shown in FIG. In the figure, a base 1 and a housing 2 define a vacuum deposition chamber with a metal vapor atmosphere, and a fixed gear 3 is disposed in the center of the base 1.

固定ギア3の中心部には、蒸着されるべき金属の蒸着源
4が配置されている。蒸着源4には、第2図に示す如く
、支柱5によシ保持された電極6(よって電位が与えら
れる。固定ギア3の下方に設せられた駆動、部材7は固
定ギア3の中心軸の周シに回転自在であシ、この駆動部
材7上でかつ固定ギア3を中心とする所蓚円周1には、
例えば81周の遊星ギア8a〜8hが等間隔にて回転自
在に軸支されている。
At the center of the fixed gear 3, a vapor deposition source 4 for metal to be vapor-deposited is arranged. As shown in FIG. It is rotatable around the circumference of the shaft, and on this drive member 7 and around the fixed gear 3, there is a circumference 1,
For example, 81 planetary gears 8a to 8h are rotatably supported at equal intervals.

これら遊星ギア8a〜8hは互いに同一径を有して固定
ギア3に噛合し、前記駆動部材7の回転に伴って固定ギ
ア3の周シを自転しつつ公転する。
These planetary gears 8a to 8h have the same diameter and mesh with the fixed gear 3, and revolve around the fixed gear 3 while rotating on its own axis as the drive member 7 rotates.

例えば、固定ギア3のピッチ円を53’Qm、歯数を3
1”5.モジュールを2とし、遊星ギア8α〜8hのピ
ッチ円を210IIB、歯数を105.モジュールを2
とすると、公転直径が84 Q wb 、公転/自転=
173となる。遊星ギア8α〜8h上には、8枚のディ
スク9a〜9hがホルダ(図示せず)を介して担持され
る。
For example, the pitch circle of fixed gear 3 is 53'Qm, and the number of teeth is 3.
1"5. The module is 2, the pitch circle of the planetary gears 8α to 8h is 210IIB, and the number of teeth is 105. The module is 2.
Then, the revolution diameter is 84 Q wb, revolution/rotation =
It becomes 173. Eight disks 9a to 9h are supported on the planetary gears 8α to 8h via holders (not shown).

8枚のディスク9α〜9hは駆動部材7の回転に伴って
各遊星ギア8LL〜8hと一体に固定ギア3の周シを自
転しつつ公転する。そして各ディスクの表面及び裏面が
蒸着源4とほぼ対向する角度範囲X、Xが蒸着有効範囲
となり、他の角度範囲Y。
As the drive member 7 rotates, the eight disks 9α to 9h revolve around the fixed gear 3 while rotating together with the planetary gears 8LL to 8h. The angular ranges X and X in which the front and back surfaces of each disk substantially face the evaporation source 4 are the effective evaporation ranges, and the other angular ranges Y.

このように構成された従来装置では、隣り、ディスク同
士が自転するときにぶつかシ合わないようにするために
は、隣シ合う遊星ギアの軸間距離をディスクの自転直径
よシ大に設定しなければならないので、所定の公転直径
に対し1′バツチ当シのディスクの収容数量に限界が生
じていた。例えば、公転直径を84011とした場合に
は、30crnデイスクで8枚/バッチ、20I:In
ディスクで12枚/バッチが限界となっていた。
In conventional devices configured in this way, in order to prevent adjacent disks from colliding with each other when they rotate, the distance between the axes of adjacent planetary gears must be set to be larger than the rotational diameter of the disks. As a result, there is a limit to the number of disks that can be accommodated in 1' batches for a given revolution diameter. For example, if the revolution diameter is 84011, 8 disks/batch with 30crn disk, 20I:In
The limit was 12 discs/batch.

但し、物理的には、隣り合うディスクの取付は位相を適
当に設定することにより、前記軸間距離をディスクの自
転直径以下にすることは可能であるが、この場合次の理
由により現実的には非常に好ましくない。すなわち、自
公転方式の場合、蒸着源4に電位を与える為の電極6や
、この電極6を保持する為の支柱5などが必要であり、
これらによって遮蔽される角度範囲Y、Yでは有効に蒸
着されず、また上記の様に位相をずらせた場合、蒸着有
効範囲X、X内では、蒸着源4に全面が対向すべきディ
スクが隣シのディスクによシ遮ぎられてしまうことにな
るからである。
However, physically, it is possible to make the distance between the axes less than or equal to the rotational diameter of the disks by appropriately setting the phase when installing adjacent disks, but in this case, it is not practical for the following reasons. is very undesirable. That is, in the case of the rotation-revolution method, an electrode 6 for applying a potential to the evaporation source 4, a support 5 for holding this electrode 6, etc. are required.
In the angular ranges Y and Y that are shielded by these, effective deposition is not performed, and when the phase is shifted as described above, within the effective deposition ranges X and X, the disk whose entire surface should face the deposition source 4 is in the adjacent This is because it will be blocked by the other disk.

本発明は、上記のような従来のものの久、点を除去すべ
くなされたもので、1バッチ当りのディスク収容数量を
増加させるりとにより、生産坤を向上せしめた蒸着処理
装置を提供することを目的とする。
The present invention has been made in order to eliminate the disadvantages of the conventional apparatus as described above, and to provide a vapor deposition processing apparatus that improves production efficiency by increasing the number of disks accommodated per batch. With the goal.

本発明による蒸着処理装置においては、固定ギアに対し
て回転自在な駆動部材上に、該固定ギアに噛合した複数
の基本遊星ギアを等間隔に千回転自在に設けると共に、
これ、ら基本遊星ギアの隣り合うもの同土間に複数の付
加遊星ギアを等間隔にて回転自在に設け、基本遊星ギア
と付加遊星ギアとを該駆動部材の回転に伴って互いに同
期させつつ反対方向に回転させる構成となっている。
In the vapor deposition processing apparatus according to the present invention, a plurality of basic planetary gears meshed with the fixed gear are provided on a drive member that is freely rotatable with respect to the fixed gear, and are arranged at equal intervals so as to be rotatable by 1,000 rotations.
In this method, a plurality of additional planetary gears are rotatably installed at equal intervals on the same earthen floor adjacent to the basic planetary gears, and the basic planetary gears and the additional planetary gears are synchronized with each other as the drive member rotates and are opposed to each other. It is configured to rotate in the direction.

以下、本発明の実施例を図面に基づいて説明するO 第3図は、本発明の一実施例を示す平面図である。第3
図において、固定ギア3に対して回転自在な駆動部材7
(第1図参照)上でかつ固定ギア3を中心とする所定円
周上には、例えば6個の基本遊星ギア11α〜11fが
等間隔にて回転自在に軸支され、これら基本遊星ギアl
id〜11fは互いに同一径を有して固定ギア3に噛合
し、前記駆動部材7の回転に伴って固定ギア3の周シを
自転しつつ公転する。駆動部材7上の前記所定円周上に
は更に、基本遊星ギアlla〜11fの隣シ合うもの同
土間に等間隔で位置するように、互いに同一径の6個の
付加遊星ギア12α〜12/が回転自在に軸支されてい
る。これら付加遊星ギア12a〜12fと固定ギア3と
の間には、双方に噛合した同軸の2段中間ギア13α〜
13f、14a〜14/が介在1ておシ、とnら中間ギ
ア13tz−13/ 、 14a−147i前記駆動部
材7の回転に伴って付加遊星ギア12α〜12fを基本
遊星ギア11α〜11/に対して同期させつ2反対方向
に回転せしめる機械的連絡手段を構成している。基本遊
星ギア11a〜11f及び付加遊星ギア12a〜12f
上には、図示せぬホルダを介して12枚のディスク9α
〜’lが担持され、これらディスクの49合うもの同士
は前記駆動部材70回転に伴って固定ギア3の周シを互
いに同期しかつ逆方向に自転しつつ公転する。
Embodiments of the present invention will be described below based on the drawings. FIG. 3 is a plan view showing an embodiment of the present invention. Third
In the figure, a drive member 7 that is rotatable with respect to the fixed gear 3
For example, six basic planetary gears 11α to 11f are rotatably supported at equal intervals on a predetermined circumference centered on the fixed gear 3 (see FIG. 1), and these basic planetary gears l
id to 11f have the same diameter and mesh with the fixed gear 3, and revolve around the circumference of the fixed gear 3 while rotating on its own axis as the drive member 7 rotates. Further, on the predetermined circumference of the drive member 7, six additional planet gears 12α to 12/12/12/12/12/12/12/12/12/12/12/12/12/12/12/2008 are arranged on the predetermined circumference of the drive member 7 so that the adjacent basic planetary gears 11a to 11f are located at equal intervals on the same dirt floor. is rotatably supported. Between these additional planetary gears 12a to 12f and the fixed gear 3, coaxial two-stage intermediate gears 13α to 13α to
13f, 14a to 14/ are interposed between the intermediate gears 13tz-13/, 14a-147i and the additional planetary gears 12α to 12f to the basic planetary gears 11α to 11/ as the driving member 7 rotates. It constitutes a mechanical communication means for rotating the two in opposite directions while synchronizing the two. Basic planetary gears 11a to 11f and additional planetary gears 12a to 12f
Twelve disks 9α are placed on the top via a holder (not shown).
~'l are supported, and these discs, which match each other 49 times, revolve around the circumference of the fixed gear 3 in synchronization with each other and rotate in opposite directions as the driving member 70 rotates.

ここで、49合うディスク同士が互いに同期しつつ逆方
向に自転するためには、各ギア間で次の条件を満足する
必要がある。すなわち、基本遊星ギアtxa−tt、7
’(搏のピッチ円をφh、歯数をTb。
Here, in order for the 49 matched disks to rotate in opposite directions while being synchronized with each other, the following conditions must be satisfied between each gear. That is, the basic planetary gear txa-tt, 7
'(The pitch circle of 搏 is φh, and the number of teeth is Tb.

中間ギア13α〜13 f (Qのピッチ円をφ。、歯
数を1゛o、中間ギア14a 〜14fO))のピッチ
円をφd。
The pitch circle of intermediate gears 13α to 13f (Pitch circle of Q is φ., number of teeth is 1゛o, intermediate gears 14a to 14fO)) is φd.

歯数をTd、付加遊星ギア(ト))12a〜12/のピ
ッチ円をφ5.歯数をT、とすると、 φh=φ、十φd十φ。
The number of teeth is Td, and the pitch circle of the additional planetary gears (G) 12a to 12/ is φ5. When the number of teeth is T, φh=φ, 1φd1φ.

φh〉 2φ0 ’r5 / Tc = Te / Td具体的数値の一
例を示すと、固定ギア3(5)のピッチ円をφ9.歯数
をTaとすると、 固定ギアA:φ、=630mI T、=313遊星ギア
B:φ、6 = 210鵡 Tb=105中間ギアC:
φo=848 T、=42′中間ギアD:φd−36臥
 ”J’d = 18遊星ギアE:φ、 = 90ss
 T、 = 45となシ、各ギアのモジュールMは共に
2となる。
φh〉 2φ0 'r5 / Tc = Te / Td To give an example of specific numerical values, the pitch circle of the fixed gear 3 (5) is φ9. If the number of teeth is Ta, fixed gear A: φ, = 630 m I T, = 313 planetary gear B: φ, 6 = 210 m Tb = 105 intermediate gear C:
φo = 848 T, = 42' Intermediate gear D: φd - 36 〥 ``J'd = 18 Planetary gear E: φ, = 90ss
Since T, = 45, the module M of each gear is both 2.

このときの自公転比率は公転/自転−1/3となる。な
お、この数値に限定されるものではない。
The rotation/revolution ratio at this time is revolution/rotation - 1/3. Note that it is not limited to this value.

また、49合うディスク(又はホルダノ同士が自転する
ときぶつかり合わないようにするためには、公転半径R
9隣シ合う遊星ギアの軸間角度A。
In addition, in order to prevent the 49 matching disks (or holders from colliding with each other when they rotate), the revolution radius R
9 Angle A between the axes of adjacent planetary gears.

ディスク(又はホルダ)の自転直径2L、49合うディ
スク(又はホルダ)の位相差Bを適当に設定することが
重要である。こ扛について、第4図及び第5図(Q 、
 (b)を参照して説明する。今、回動面内におけるデ
ィスク(又はホルダ)Iのタ1力端の座標を(Xz、Y
l)、中心の座標を(X2.Ya)、ディスク(又はホ
ルダ)■の外力端の座標を(X、。
It is important to appropriately set the rotational diameter 2L of the disk (or holder) and the phase difference B of the matching disk (or holder). Regarding this, Figures 4 and 5 (Q,
This will be explained with reference to (b). Now, the coordinates of the force end of the disk (or holder) I in the rotation plane are (Xz, Y
l), the coordinates of the center are (X2.Ya), and the coordinates of the external force end of the disk (or holder) (X,).

Y、)、中心の座標を(Xl 、Y4 )とする。また
、点(Xl、Yt)一点(X2 、Ya )を通る直線
と点(X、、。
Y,), and the coordinates of the center are (Xl, Y4). Also, a straight line passing through the point (Xl, Yt) and the point (X2, Ya) and the point (X,...).

Y、)、点(Xl 、Y4 )を通る直線との交点の座
標を(LL、υンとする。そして、ディスクI、ディス
ク■を共に角度P (00−1800)回転したときに
、(u、υ)と(X2 、Ya )間の距離くLがッ(
u、、v)と(Xl 、Y4 )間の距離〈Lの時、デ
ィスクi、nがぶつかり、その他の時にはぶつからない
と判断する。
Let the coordinates of the intersection of Y, ) and the straight line passing through the point (Xl, Y4) be (LL, υn). Then, when disk I and disk ■ are both rotated by an angle P (00-1800), (u , υ) and (X2, Ya), L is (
When the distance between u,,v) and (Xl, Y4) is <L, it is determined that the disks i and n collide, and in other cases, they do not collide.

Xl−■(→−L −aaBP ・−・・−(1)Y□
= L −ain P −山(2)X、= 1も ・・
団・(3) Y2= O・・・・・・(4) X8= R−006A+L −cts (−P+B) 
−・・15)Y8= R−5inA+L −ain (
−P十B) ・” ・・・(6)X、 = R,−oo
s A ・・・・・・(7)¥4−■も一8inA・・
団・(8) 点(Xl 、Yl )、点(X2.Ya)を通る直線の
式は〜(X2−Xt) (y−Yt) = (Ya−Y
l) (z −Xt) ”’(9ン点(XB、Y、へ点
(Xi、YJを通る直線の式は、(Xl−Xa)(y−
Y、)= (Y4−Yll)(z−X8ン−a1交点の
座標(u、、v)は u = (Xit−Xt ) (Xl−Xll) (Y
、−Yl)+(Ya−Yl) (Xl−x8)・Xよ−
(y、 y3) (心−X、)・X8/ (Ya Yt
)(Xl XB) (Y4 Ya) (X2 XI)I
’ = (Ya−Yl) (Y4−Ya) (XB−X
I)+(Xl−XB) (Y21−Y、)・Ya−(X
、−X□) (y、−y8)・Y□/ (X2 Xl、
)(Y4−¥11 )−(Xl−XB) (Y、−Y工
)−A−X工+Y1=−A −X8+Y3Y、−Ya−
A (XニーX、J=O Y□−Ya−A(X□−XB)=Oのとき ぶつかるY
、−Ya−A(X□−XB)\0のとき ぶつからない
1(、A 、 L 、 Bを代入して、Pを0→180
°としたとき 1丁でπ丁−yy、 A;扉ワ7票ア とLとの大小を比較する。
Xl-■(→-L -aaBP ・-・・-(1)Y□
= L -ain P -Mountain (2)X, = 1 too...
Group・(3) Y2= O・・・・・・(4) X8= R-006A+L -cts (-P+B)
-...15) Y8= R-5inA+L -ain (
-P1B) ・” ...(6)X, = R, -oo
s A...(7) ¥4-■Mo-18inA...
Group・(8) The equation of the straight line passing through point (Xl, Yl) and point (X2.Ya) is ~(X2-Xt) (y-Yt) = (Ya-Y
l) (z -
Y, ) = (Y4-Yll) (z-X8-a1 intersection coordinates (u,,v) are u = (Xit-Xt) (Xl-Xll) (Y
, -Yl)+(Ya-Yl) (Xl-x8)・Xyo-
(y, y3) (heart-X,)・X8/ (Ya Yt
)(Xl XB) (Y4 Ya) (X2 XI)I
' = (Ya-Yl) (Y4-Ya) (XB-X
I) + (Xl-XB) (Y21-Y, )・Ya-(X
, -X□) (y, -y8)・Y□/ (X2 Xl,
)(Y4-¥11)-(Xl-XB) (Y, -Y engineering)-A-X engineering+Y1=-A -X8+Y3Y, -Ya-
A (X knee
When , -Ya-A(X□-XB)\0, there is no collision 1 (, Substituting A, L, B, P changes from 0 to 180
When 1 door is 1 door - yy, A: Compare the size of door 7 votes A and L.

本願発明者の実験結果によれば、30crnデイスクの
場合、R=420sa、A=30°+2L=319sa
According to the experimental results of the inventor of the present application, in the case of a 30 crn disk, R = 420 sa, A = 30° + 2L = 319 sa
.

13=120°とすることにより、隣シ合うディスク同
士がぶつかシ合わないことが判明している。また、20
儒デイスクの場合、R=420簾、A=22°。
It has been found that by setting 13=120°, adjacent disks do not collide with each other. Also, 20
For Confucian discs, R = 420 blinds, A = 22°.

2L=215ms、B=112°とすることによシ、隣
シ合うディスク同士がぶつかり合わないことが判明して
いる。
It has been found that by setting 2L=215ms and B=112°, adjacent disks do not collide with each other.

また、上記数値例においては、蒸着源4と対向するディ
スクを全面に亘って有効に蒸着できるという実験結果も
得られている0 なお、上記実施例においては、30αデイスク用の蒸着
処理装置に適用した場合について説明したが、20tr
nディスク用蒸着処理装置の場合には、各ギアの組み合
わせを、例えば 固定ギアA:φ、 = 67218 Ta= 336遊
星ギアB:φ7=168m Tb= 84中間ギアC:
φ、= 565m Tc= 28中間ギアD:φd= 
28m Td= 14遊星ギアE:φ、= 84語 T
、=42とし、各ギアのモジュールMを共に2とするこ
とによシ、公転/自転=1/4なる自公転比率となる。
In addition, in the above numerical example, an experimental result has been obtained that the disk facing the vapor deposition source 4 can be effectively vaporized over the entire surface. I explained the case where 20tr
In the case of a vapor deposition processing apparatus for n disks, the combination of each gear is, for example, fixed gear A: φ, = 67218 Ta = 336 planetary gear B: φ7 = 168 m Tb = 84 intermediate gear C:
φ, = 565m Tc = 28 intermediate gear D: φd =
28m Td = 14 planetary gear E:φ, = 84 words T
, = 42, and by setting the module M of each gear to 2, the revolution/revolution ratio becomes 1/4.

なお、上記数値例に限定されるものではない。Note that it is not limited to the above numerical examples.

第6図は、本発明の他の実施例を示す一部分の平面図で
アシ、本実施例においては、基本遊星ギア11に中間ギ
ア15が同情にかつ一体に設けられており、この中間ギ
ア15は付加遊星ギア12と噛合し、この付加遊星ギア
12を基本遊星ギア11に対して同期させつつ反対方向
に回転せしめる機械的連絡手段を構成している。中間ギ
ア15は基本遊星ギア11とほぼ等しいピッチ円及び歯
数を有し、付加遊星ギア12とは全く等しいL′ツチ円
及び歯数を有しておシ、この構成により上記実施例と同
様の効果が得られる。
FIG. 6 is a partial plan view showing another embodiment of the present invention. In this embodiment, an intermediate gear 15 is provided sympathically and integrally with the basic planetary gear 11. constitutes a mechanical communication means that meshes with the additional planetary gear 12 and rotates the additional planetary gear 12 in synchronization with the basic planetary gear 11 in the opposite direction. The intermediate gear 15 has approximately the same pitch circle and number of teeth as the basic planetary gear 11, and has exactly the same pitch circle and number of teeth as the additional planetary gear 12. With this configuration, it is similar to the above embodiment. The effect of this can be obtained.

以上説明したように、本発明によれ慎、固定ギアに対し
て回転自在な駆動部材上に、該固定ギアに噛合した複数
の基本遊星ギアを等間隔にて回転自在に設けると共に、
これら基本遊星ギアの隣シ合うもの同土間に複数の付加
遊星ギアを等間隔にて回転自在に設け、基本遊星ギアと
付加遊星ギアとを該駆動部材の回転に伴って互いに同期
させつつ反対方向に回転させる構成としたので、従来と
同じ公転直径であってもディスクの処理量を増加でき、
生産性を向上できることになる。具体的には、公転直径
を例えば840111とした場合、30I0Ynデイス
クで従来8枚/バッチであったものを12枚/バッチと
50チ増加でき、20cmディスクでは従来12枚/バ
ッチであったものを16枚/バッチと33.3%増加で
きるという結果が得られている。
As explained above, according to the present invention, a plurality of basic planetary gears meshed with the fixed gear are rotatably provided at equal intervals on a drive member that is rotatable with respect to the fixed gear, and
A plurality of additional planetary gears are installed rotatably at equal intervals on the same dirt floor adjacent to these basic planetary gears, and the basic planetary gears and the additional planetary gears are synchronized with each other as the drive member rotates, and are moved in opposite directions. Since it is configured to rotate around 300 degrees, the throughput of the disk can be increased even if the orbital diameter is the same as before.
This will improve productivity. Specifically, if the revolution diameter is, for example, 840111, the conventional 8 disks/batch for a 30I0Yn disk can be increased to 12 disks/batch, an increase of 50 inches, and the conventional 12 disks/batch for a 20cm disk. The results show that the number can be increased by 33.3% to 16 sheets/batch.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来装置を示す一部断面を含む斜視間、第2図
は第1図の要部の平面図、第3図は本発明の一実施例を
示す平面図、第4図及び第5図(α)。 (b)は第3図の動作原理を示す図、第6図は本発明の
他の実施例を示す平面図である。 主要部分の符号の説明 4・・・蒸着源 9,9α〜9β・・・ディスク11.
11tL〜11f・・・基本遊星ギア12.12α〜1
2f・・・付加遊星ギア13α〜13f、14α〜14
f、15・・・中間ギア出 願 人 パイオニア株式会
社 代理人 弁理士藤村元彦 (外1名ン 泉2図 尾312I
Fig. 1 is a perspective view including a partial cross section showing a conventional device, Fig. 2 is a plan view of the main part of Fig. 1, Fig. 3 is a plan view showing an embodiment of the present invention, Figs. Figure 5 (α). (b) is a diagram showing the operating principle of FIG. 3, and FIG. 6 is a plan view showing another embodiment of the present invention. Explanation of symbols of main parts 4... Vapor deposition source 9, 9α to 9β... Disk 11.
11tL~11f...Basic planetary gear 12.12α~1
2f... Additional planetary gears 13α to 13f, 14α to 14
f, 15...Intermediate Gear Applicant Person: Pioneer Co., Ltd. Agent Patent Attorney Motohiko Fujimura (1 other person) Izumi 2 Zuo 312I

Claims (3)

【特許請求の範囲】[Claims] (1)ハウジング内に配置された固定ギアと、前記固定
ギアの中心部に配置された蒸着されるべき金属の蒸着源
と、前記固定ギアの中心軸の周シに回転自在に設けられ
た駆動部材と、前記駆動部材上でかつ前記固定ギアを中
心とする所定円゛周上に等間隔にて回転自在に配置され
かつ前記固定ギアに噛合した同一径の複数の基本遊星ギ
アと、前記基本遊星ギアの隣り合うもの同土間に等間隔
で位置するように前記駆動部材上の前記所定円周上に回
転自在に配置された同一径の複数の付加遊星ギアと、前
記付加遊星ギアと前記固定ギアとの間を機械的に連絡し
前記駆動部材の回転に伴って前記付加遊星ギアを前記基
本遊星ギアに対して同期させつつ反対方向に回転せしめ
る機械的連絡手段と、前記基本及び付加遊星ギア上に設
けられた被蒸着対象物ホルダとからなることを特徴とす
る蒸着処理装置。
(1) A fixed gear disposed in a housing, a vapor deposition source for the metal to be vapor-deposited disposed at the center of the fixed gear, and a drive rotatably provided around the central axis of the fixed gear. a plurality of basic planetary gears having the same diameter, which are rotatably arranged on the driving member at equal intervals on a predetermined circle around the fixed gear and meshed with the fixed gear; a plurality of additional planetary gears having the same diameter rotatably arranged on the predetermined circumference on the drive member so as to be located at equal intervals between adjacent planetary gears; and the additional planetary gears and the fixed planetary gears. mechanical communication means that mechanically communicates with the gear and causes the additional planetary gear to rotate in the opposite direction while being synchronized with the basic planetary gear as the driving member rotates; and the basic and additional planetary gears. A vapor deposition processing apparatus comprising a vapor deposition target object holder provided above.
(2) 前記機械的連絡手段は、前記付加遊星ギアと前
記固定ギアとの間に介在して双方に噛合した中間ギアで
あることを特徴とする特許請求の範囲第1項記載の蒸着
処理装置。
(2) The vapor deposition processing apparatus according to claim 1, wherein the mechanical communication means is an intermediate gear interposed between the additional planetary gear and the fixed gear and meshed with both. .
(3)前記機械的連絡手段は、前記基本遊星キアと同軸
にかつ一体に設けられて前記付加遊星ギアに噛合した中
間ギアであることを特徴とする特許請求の範囲第1項記
載の蒸着処理装置。
(3) The vapor deposition process according to claim 1, wherein the mechanical communication means is an intermediate gear provided coaxially and integrally with the basic planetary gear and meshed with the additional planetary gear. Device.
JP22497783A 1983-11-28 1983-11-28 Treatment device for vapor deposition Granted JPS60116775A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22497783A JPS60116775A (en) 1983-11-28 1983-11-28 Treatment device for vapor deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22497783A JPS60116775A (en) 1983-11-28 1983-11-28 Treatment device for vapor deposition

Publications (2)

Publication Number Publication Date
JPS60116775A true JPS60116775A (en) 1985-06-24
JPH0350833B2 JPH0350833B2 (en) 1991-08-02

Family

ID=16822164

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22497783A Granted JPS60116775A (en) 1983-11-28 1983-11-28 Treatment device for vapor deposition

Country Status (1)

Country Link
JP (1) JPS60116775A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105051247A (en) * 2013-03-19 2015-11-11 株式会社神户制钢所 PVD processing device and PVD processing method
US20170301502A1 (en) * 2012-08-09 2017-10-19 Vactronix Scientific, Llc Inverted cylindrical magnetron (icm) system and methods of use
US10968527B2 (en) 2015-11-12 2021-04-06 California Institute Of Technology Method for embedding inserts, fasteners and features into metal core truss panels
US11155907B2 (en) 2013-04-12 2021-10-26 California Institute Of Technology Systems and methods for shaping sheet materials that include metallic glass-based materials
US11168776B2 (en) 2015-03-05 2021-11-09 California Institute Of Technology Systems and methods for implementing tailored metallic glass-based strain wave gears and strain wave gear components
US11773475B2 (en) 2017-06-02 2023-10-03 California Institute Of Technology High toughness metallic glass-based composites for additive manufacturing
US11839927B2 (en) 2017-03-10 2023-12-12 California Institute Of Technology Methods for fabricating strain wave gear flexsplines using metal additive manufacturing
US11905578B2 (en) 2017-05-24 2024-02-20 California Institute Of Technology Hypoeutectic amorphous metal-based materials for additive manufacturing
US11920668B2 (en) 2012-06-26 2024-03-05 California Institute Of Technology Systems and methods for implementing bulk metallic glass-based macroscale gears

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57207570A (en) * 1981-06-12 1982-12-20 Matsushita Electric Works Ltd Article holding jig

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57207570A (en) * 1981-06-12 1982-12-20 Matsushita Electric Works Ltd Article holding jig

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11920668B2 (en) 2012-06-26 2024-03-05 California Institute Of Technology Systems and methods for implementing bulk metallic glass-based macroscale gears
US20170301502A1 (en) * 2012-08-09 2017-10-19 Vactronix Scientific, Llc Inverted cylindrical magnetron (icm) system and methods of use
US11004644B2 (en) * 2012-08-09 2021-05-11 Vactronix Scientific, Llc Inverted cylindrical magnetron (ICM) system and methods of use
CN105051247A (en) * 2013-03-19 2015-11-11 株式会社神户制钢所 PVD processing device and PVD processing method
US11155907B2 (en) 2013-04-12 2021-10-26 California Institute Of Technology Systems and methods for shaping sheet materials that include metallic glass-based materials
US11168776B2 (en) 2015-03-05 2021-11-09 California Institute Of Technology Systems and methods for implementing tailored metallic glass-based strain wave gears and strain wave gear components
US10968527B2 (en) 2015-11-12 2021-04-06 California Institute Of Technology Method for embedding inserts, fasteners and features into metal core truss panels
US11753734B2 (en) 2015-11-12 2023-09-12 California Institute Of Technology Method for embedding inserts, fasteners and features into metal core truss panels
US11839927B2 (en) 2017-03-10 2023-12-12 California Institute Of Technology Methods for fabricating strain wave gear flexsplines using metal additive manufacturing
US11905578B2 (en) 2017-05-24 2024-02-20 California Institute Of Technology Hypoeutectic amorphous metal-based materials for additive manufacturing
US11773475B2 (en) 2017-06-02 2023-10-03 California Institute Of Technology High toughness metallic glass-based composites for additive manufacturing

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