KR100258118B1 - Improved actuated mirror arrays and a method fabricating method thereof - Google Patents

Abstract

PURPOSE: A thin film actuated mirror arrays and a method for manufacturing the same are to achieve a large drive strength by alternatively driving two actuator for supporting both ends of a mirror in the upper and lower direction. CONSTITUTION: An actuated mirror arrays has the double structure that a free upper part of the first actuator(230) is connected to one end of a supporting part(510) in a mirror(500) and a free upper part of the second actuator(330) is connected to another end of the supporting part in the mirror. The first actuator consists of the first membrane, the first signal electrode, the first deformation layer, and the first common electrode formed in this order parallel to a pad base. An air gap is interposed between the first actuator and an etching stop layer. The second actuator consists of the second membrane, the second common electrode, the second deformation layer, and the second signal electrode formed in this order parallel to the pad base. The air gap is interposed between the second actuator and the etching stop layer.

Description

Improved thin film type optical path control device and manufacturing method thereof

The present invention relates to a thin-film optical path control device, and more particularly, to an improved optical path control device suitable for securing a large actuator driving angle by deforming a membrane by an electric field formed by an applied electric field to drive an actuator. It is about a method.

In general, a spatial light modulator, which is a device for projecting optical energy onto a screen, may be variously applied to optical communication, image processing, and information display devices. Such devices are classified into a direct view type image display device and a projection type image display device according to a method of projecting a light beam incident from a light source onto a screen.

At this time, an example of a direct view type image display device includes a CRT (Cathod Ray Tube), and a projection type image display device includes a liquid crystal display (hereinafter referred to as an LCD), a DMD (Deformable Mirror Device), and an AMA (Actuated Mirror). Arrays). Here, the present invention relates to the improvement of AMA which is a projection type image display apparatus.

Among the projection-type image display devices described above, LCD has a problem that it is difficult to completely planarize the screen due to its large weight and volume and high mechanical strength, which distorts the peripheral part of the image, and requires a high voltage for light emission of the phosphor by an electron beam. It was developed as an alternative technology to replace the CRT.

However, the LCD also has the advantage of operating at a low voltage, having a low power consumption and providing an image without deformation, while having a low light efficiency of 1 to 2% due to the polarization of the light beam, and the liquid crystal material therein. The problem of slow response speed still holds.

On the other hand, image display devices such as DMD, AMA, etc. have been developed to solve the above-mentioned drawbacks of LCD, and at present, AMA can obtain at least 10% or more of light efficiency, while DMD has about 5% of light efficiency. It is known to be an image display device. In addition, the AMA is not only affected by the polarity of the incident luminous flux but also does not affect the polarity of the luminous flux.

Typically, each of the actuators formed inside the AMA causes deformation in accordance with the electric field generated by the applied image signal and bias voltage, which is applied to the top of the actuator when this actuator causes deformation (i.e., when the actuator is driven). Each of the mounted mirrors is inclined in proportion to the magnitude of the electric field, and the inclined mirrors reflect the light incident from the light source (eg, R, G, B) at a predetermined angle to target the pixel targeted for display. Will be created.

At this time, piezoelectric ceramics such as PZT (Pb (Zr, Ti) O ₃ ), PLZT ((Pb, La) (Zr, Ti) O ₃ ) are used as the constituent material of the actuator for driving the respective mirrors. As the constituent material of the actuator, electrodistorted ceramics such as PMN (Pb (Mg, Nb) O ₃ ) may be used.

As described above, the thin film type optical path control device having a plurality of actuators each reflecting each light incident from the light source at a predetermined angle, has been referred to the Korean Patent Office under the name of "Method of manufacturing a thin film type optical path control device module" by the present applicant. It is well described in patent application No. 96-64447 filed December 11, 1996 (hereinafter referred to as prior application).

1 is a cross-sectional view of the above-described thin film type optical path control device module of the prior application, for the purpose of understanding and convenience of explanation, a plurality of optical path adjustments corresponding to the number of pixels M × N (eg, 640 × 480) Only the cross section for one optical path control device is shown in an AMA panel with the device.

Referring to FIG. 1, the conventional thin film type optical path adjusting device has an actuator 130 and a mirror 160 formed on an upper portion of the actuator 130 that are connected through a support portion formed on an upper portion of the panel base 110 and the drain pad 112. The air gap 120 is interposed between the panel base 110 and the actuator 130.

In addition, although the detailed illustration in the same figure is abbreviate | omitted, MxN (M and N are integer) transistors are integrated in the drive board 111 in matrix form.

Meanwhile, the panel base 110 is formed by sequentially depositing the driving substrate 111, the protection layer 113, and the etch stop layer 115 having the drain pad 112 formed on one side thereof, and the actuator 130 is air. Patterning a portion of the sacrificial layer deposited on the etch stop layer 115 (ie, the region where the air gap 120 currently exists), that is, the upper side sacrificial layer of the drain pad 112 to form the gap 120. One side is in contact with the support region formed by the other side and the other side is formed in parallel with the etch stop layer 115 via the air gap 120, the lower electrode 133, the lower electrode formed on the membrane 131 And a strained layer 135 formed on the upper portion of the 133, and an upper electrode 137 formed on the strained layer 135.

In this case, when the actuator is driven, the upper electrode 137 is uniformly operated on the upper side of the upper electrode 137, which is a common electrode, to prevent diffuse reflection of the light beam incident from the light source, not shown. ) Is formed.

Furthermore, a mirror 160 reflecting light incident from a light source, not shown, is formed through the support part 162 on one side of the upper electrode 137, which is a common electrode, between the upper electrode 137 and the mirror 160. An air gap 150 is interposed therebetween.

In addition, the actuator 130 penetrates through the lower electrode 133, the membrane 131, the etch stop layer 115, and the protective layer 113 from one side (side, support side) of the strained layer 135 to drive substrate 111. The distribution hole 140 is vertically formed up to the drain pad 112 in the c). In the distribution hole 140, a distribution 141 electrically connecting the lower electrode 133 and the drain pad 112 is formed. Formed.

Therefore, the conventional optical path control apparatus having the above-described configuration applies a bias voltage to the upper electrode 137 which is a common electrode, and an image signal to the lower electrode 133 through the drain pad 112 and the distributor 141. When is applied, an electric field is generated between the upper electrode 137 and the lower electrode 133, the deformation layer 135 formed between the upper electrode 137 and the lower electrode 133 by the generated electric field is By causing the deformation, the actuator 130 is driven at a predetermined angle so that the mirror 160 is inclined. At this time, the strained layer 135 is contracted in the vertical direction with respect to the generated electric field, so that the mirror () is driven at an angle of Q (eg, approximately 3-5 degrees) in the direction of the arrow Y in FIG. do.

Accordingly, the light R, G or B incident from the light source is reflected at a predetermined angle through the mirror 160 formed on the upper electrode 137 by driving the actuator 130. It will pass through the slit (not shown) and build up as pixels on the screen.

However, in the conventional optical path adjusting device as described above, the driving angle Q of the actuator operated by the predetermined driving voltage (for example, 0V to 17V) is approximately 3, as shown in FIG. 10A as an example. It has a range of about 5 degrees, which is not enough to obtain good contrast. That is, when displaying an image using a conventional optical path control device, there is no limit to the image quality.

Accordingly, the present invention is to solve the above problems of the prior art, an improved optical path control device that can obtain a large driving angle by simultaneously cross-driving two actuators respectively supporting both ends of the mirror in the vertical direction facing each other The purpose is to provide.

Another object of the present invention is to provide an improved actuator manufacturing method having a double support structure capable of simultaneously driving two actuators, each supporting both ends of a mirror, in the vertical direction opposite to each other.

According to an aspect of the present invention, there is provided a driving substrate having a drain pad formed on one side thereof, a panel base having a protective layer and an etch stop layer sequentially stacked on the driving substrate, and a support base on the panel base. An optical path adjusting device including an actuator for providing a driving angle of a mirror for reflecting incident light, wherein the optical path adjusting device includes a part of the upper end of the free end of one actuator connected to one end of the mirror support and the other side of the actuator. The upper portion of the free end has a double support structure connected to the other end of the mirror support, the one actuator: the air gap is interposed between the etch stop layer and the membrane, signal electrode, strain layer, Sequentially formed with a common electrode; And a distribution hole penetrating through the strain layer, the signal electrode, the membrane, the etch stop layer, and the protective layer, connected to a drain pad on one side of the driving substrate, the distribution hole having a signal applying distributor therein, wherein the other actuator includes: An air gap is interposed between the etch stop layer and sequentially formed as a membrane, a common electrode, a strain layer, and a signal electrode in parallel with the panel base; A distribution hole penetrating through the signal electrode, the strain layer, the membrane, the etch stop layer, and the protective layer and connected to a drain pad on the other side of the driving substrate, the distribution hole having a signal application distributor therein; Provided is an improved optical path control device, characterized in that both free ends are formed in parallel with the common electrode and the signal electrode by placing the air gap around the support.

According to another aspect of the present invention, there is provided a driving substrate having a drain pad formed on one side thereof, a panel base having a protective layer and an etch stop layer sequentially stacked on the driving substrate, and a support base on the panel base. In the method for manufacturing an optical path control device comprising an actuator for providing a driving angle of the mirror for the reflection of the incident light, applying a sacrificial layer of a predetermined thickness on the etch stop layer, and etching through patterning Exposing each portion of the sacrificial layer formed on top of each drain pad in the drive substrate; Applying a membrane material on each top of the exposed etch stop layer and on top of the sacrificial layer, and etching through patterning to form a membrane having respective protrusions over one side and the other top of the exposed etch stop layer and a top portion of the sacrificial layer, respectively. Forming; Applying an electrode material on top of each of the membranes, and etching through patterning to form a signal electrode on the upper part of the membrane including one side of the exposed etch stop layer, and at the same time the top of the other side of the exposed etch stop layer Forming a common electrode on an upper portion of the membrane not included; Applying a modifying material on the signal electrode and the common electrode and etching through patterning to form a deforming layer having a predetermined thickness; Applying an electrode material on each of the strained layer, and etching through patterning to form a common electrode on the upper portion of the strained layer that does not include one side of the exposed etch stop layer, and at the same time of the exposed etch stop layer Forming a signal electrode on an upper portion of the strained layer including an upper portion of the other side; In the vertical direction corresponding to the drain pad, a portion of the strained layer, the signal electrode, the membrane, the etch stop layer, and the protective layer are sequentially etched to form a distribution hole having a power distribution, and at the same time, a vertical direction corresponding to the drain pad. The method may further include etching a portion of the signal electrode, the strain layer, the membrane, the etch stop layer, and the protective layer sequentially to form a distribution hole having a power distributor; Applying a sacrificial layer material over the common electrode and the signal electrode and over each of the protrusions and etching through patterning to expose a portion of the upper end of the free end of each of the protrusions; Applying a mirror material on top of the sacrificial layer and the exposed area and etching through patterning to form a mirror on a part of the top of the sacrificial layer using the exposed area as a center support; And forming each air gap by removing the sacrificial layer interposed between the membrane and the etch stop layer and the sacrificial layer interposed between the common electrode, the signal electrode, and the mirror with the support interposed therebetween. It provides a method for producing an optical path control device consisting of.

1 is a cross-sectional view of a conventional thin film type optical path control device,

2 is a perspective view of an improved thin film type optical path control device according to a preferred embodiment of the present invention;

3 is a view showing a detailed example of driving the mirror formed on the projections of the two actuators according to the present invention;

Figure 4 is a cross-sectional view showing a cross-sectional view of the optical path control device of the present invention shown in Figure 2 in the Z-direction,

5 is a cross-sectional view taken along the line M-M 'of one actuator of the optical path control device shown in FIG.

6 is a cross-sectional view taken along the line N-N 'of the other actuator of the optical path control device shown in FIG.

7 is a view showing a part of the arrangement pattern of the optical path control device having a dual support structure of two actuators according to the present invention,

8 is a plan view showing a plane of two actuators with a mirror removed in an optical path control device having a dual support structure of two actuators according to the present invention;

9a to 9h is a process diagram showing the manufacturing process of the improved optical path control apparatus according to the present invention,

10 is a view showing a comparative example of the driving angle according to the conventional thin film type optical path control device and the driving angle according to the improved thin film type optical path control device of the present invention.

<Description of the code | symbol about the principal part of drawing>

210: panel base 211: driving substrate

212 and 212 ': Drain pad 213: Protective layer

215: etch stop layer 220, 400: air gap

230, 330: actuators 231, 331: membrane

232, 332: protrusion 233: lower electrode (signal electrode)

235 and 335 strain layer 237 upper electrode (common electrode)

333: lower electrode (common electrode) 337: upper electrode (signal electrode)

500 mirror 510 support

The above and other objects and various advantages of the present invention will become more apparent from the preferred embodiments of the present invention described below with reference to the accompanying drawings by those skilled in the art.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

First and foremost, the main core technical aspect of the present invention is that the optical path adjusting device according to the present invention drives a double supporting structure, that is, a mirror (that is, a mirror corresponding to each pixel) that reflects light incident from a light source not shown. By forming the actuator as a double support structure that is cross-driven in the upper and lower directions at both ends of the mirror center support, it is possible to achieve the object to be obtained in the present invention by using the actuator of such a double support structure.

That is, in the optical path adjusting device of the present invention, when one actuator connected to one end of the mirror center is driven upward by, for example, the generated electric field, the other actuator connected to the other end of the mirror center is driven downward. Using the principle of operation, when the larger driving angle, for example, the above-mentioned conventional device obtains a driving angle of approximately 3-5 degrees, the apparatus of the present invention can obtain a driving angle of 6-10 degrees.

Figure 2 shows a perspective view of an improved thin film type optical path control device according to a preferred embodiment of the present invention.

2, the optical path control device of the present invention is a part of the two end and the other actuator 230, 330 formed on the upper portion of the panel base, each of the projection end of the free end side of the actuator 230, 330 It is composed of a mirror 500 formed through the support portion 510 abutting each.

At this time, one end of the actuator 230 is deposited on a portion of the upper portion of the exposed etch stop layer 225 by removing a portion of the sacrificial layer deposited over the entire surface of the protective layer through patterning using a dry process or a wet process, and the other end. Is deposited on a portion of the top of the other etch stop layer exposed simultaneously in the same process. In addition, similarly to the actuator 230 described above, the actuator 330 is deposited at one end of the upper portion of the etch stop layer 225 and the other end of the actuator 330 is deposited at the upper portion of the other etch stop layer 225.

In addition, the two actuators 230 and 330 have a shape in which each free end faces each other at regular intervals, and the free end of one actuator 230 protrudes toward the free end of the other actuator 330 side. Is formed, and the free end of the other actuator 330 is formed with a projection for directing the free end of the side of the actuator 230 side, each projection has a form facing each other at a predetermined interval.

In addition, the mirror 500 is formed through the support 510 formed to abut on the upper end of each of the protrusions of the one side and the other side actuators 230 and 330, respectively.

Therefore, in the optical path adjusting device of the present invention having the above-described configuration, when an electric field is generated between two electrodes (that is, the lower electrode and the upper electrode) in each of the actuators 230 and 330 by the signal application, the one-side actuator 230 ) Is driven in the direction of arrow Y, and the other actuator 330 is driven in the direction of arrow Y '.

That is, when an electric field is generated between each electrode, as shown in FIG. 3 as an example, the one-side actuator 230 is deformed upwardly by + Q in the direction of the arrow Y, and the protrusion of the other actuator 330 ( 332) is deformed as much as -Q in the direction of arrow Y '. Thus, the actual driving angle of the mirror 500 is approximately 6-10 degrees when 2Q, for example, the driving angle of one actuator is 3-5.

4 is a cross-sectional view illustrating a light path adjusting device of the present invention shown in FIG. 2 as viewed in the Z-direction.

Referring to FIG. 4, at the lower end of each actuator 230, 330, as in the conventional optical path control apparatus shown in FIG. 1, a driving substrate 211 having respective drain pads 212, 212 ′ at a portion thereof. ), And a panel base 210 in which the protective layer 213 and the etch stop layer 215 are sequentially stacked is formed, and each upper portion of the etch stop layer 215 in a direction perpendicular to each of the drain pads 212 and 212 ′ is formed. Some abut on the lower portion of the support for supporting each actuator (230, 330).

On the other hand, one actuator 230 includes a membrane 231 formed on one side of the etch stop layer 215, the lower electrode 233 as a signal electrode, the strain layer 235 and the upper electrode 237 as a common electrode are sequentially On the free end side opposite to the fixed end on the support side side, as shown in FIG. 4, a protrusion 232 extending from the mebrane 231 layer is formed. The protrusion 232 formed at the free end end of the membrane 231 is positioned to be directed toward the free end end of the other actuator 330 side by bending at an approximately 90 degree angle, as shown in FIG. 2 as an example. .

At this time, the cross-sectional view of FIG. 4 is not revealed due to its cross-sectional characteristics. However, as illustrated in FIG. 5, the deformable layer 235, the lower electrode 233, the membrane 231, and the etch stop layer 215 are disposed on one actuator 230. And a power distribution hole 240 and a power distribution 241 connected to an upper portion of the drain pad 212 in the driving substrate 211 through the protection layer 213, and the power distribution hole and the power distribution structure are substantially the same. In order to perform the same function with a structure substantially the same as those in the conventional apparatus shown in FIG.

Therefore, when the electric field is generated between the lower electrode 231 and the upper electrode 237 in one side actuator 2 having such a laminated structure, as shown in FIG. 3 as an example, the strained layer 235 is deformed. The free end will cause an upward strain that rises by Q.

On the other hand, the other actuator 330 includes a membrane 331 formed on one side of the etch stop layer 215, the lower electrode 333, the common electrode, the strain layer 335 and the upper electrode 337, which is a signal electrode Although sequentially formed, at the free end side opposite to the fixed end on the support side, as shown in FIG. 4, a protrusion 332 extending from the mebrane 331 layer is formed. Protruding portion 332 formed at the free end of the membrane 331, as shown in FIG. 2 as an example, so as to be oriented at the free end end of the one-side actuator 230 side while being bent at an approximately 90 degree angle Located.

At this time, the other actuator 330, unlike the above-described one actuator 230, the lower electrode 333 formed on the membrane 331 functions as a common electrode, the upper electrode formed on the deformation layer 335 337 functions as a signal electrode.

As described above, using the lower electrode 333 as a common electrode and using the upper electrode 337 as a signal electrode, as shown in FIG. 6 showing a cross section taken along the line M-M 'in FIG. The lower electrode 333 is formed only on the upper part of the membrane 331 except the supporting part side in which the hole 340 is formed (that is, the part except the protruding part 332 on the free end side), and the distribution hole 340 is formed. This can be achieved by forming the upper electrode 337 on top of the strained layer 335 including the support portion side.

On the other hand, Figure 7 is a view showing a part of the arrangement pattern of the optical path control device having a dual support structure of two actuators according to the present invention, corresponding to each pixel through each upper support of the etch stop layer exposed through the patterning The pair of actuators 230 and 330 are formed in such a way that the protrusions on each free end side are refracted by about 90 degrees, that is, the bent protrusions on each free end side are formed to face each other at a predetermined interval. In addition, the optical path control device has a structure in which the mirror 500 is formed through a support 510 formed in contact with a portion of the upper end of each protrusion.

Therefore, the optical path control device having the structure as described above will be arranged in the number of M × N, thereby achieving a respective total optical path control system for each R.G.B.

8 is a plan view of one side and the other side of the actuator 230, 330 of the dual support structure employed in the optical path control device of the present invention.

As shown in the drawing, the actuator 230 has a structure in which a membrane 231, a lower electrode 233, which is a signal electrode, a strained layer 235, and an upper electrode 237, which is a common electrode, are sequentially stacked. In addition, the protrusion 232 having a shape refracted by about 90 degrees on the free end side is formed by the extension of the membrane 231 layer, and the strained layer 235, the lower electrode 233, and the membrane when viewed from the top side. A distribution hole 240 penetrating 231 is formed. In this case, although not illustrated in the same drawing, the distribution hole 240 is connected to an upper portion of the drain pad 212 in the driving substrate 211 through the etch stop layer 215 and the protection layer 213.

In addition, the other actuator 330 has a structure in which the membrane 331, the lower electrode 333, which is a common electrode, the strained layer 335, and the upper electrode 337, which is a signal electrode, are sequentially stacked. By extension of the layer, the free end side is refracted by about 90 degrees to form a protrusion 332 having a shape facing the protrusion 232 of the one-actuator 230 described above, and also the upper electrode 337 when viewed from the top side. ), A distribution layer 335, and a distribution hole 340 penetrating the membrane 331 are formed. In this case, although not illustrated in the same drawing, the distribution hole 340 is connected to the upper portion of the drain pad 212 ′ in the driving substrate 211 through the etch stop layer 215 and the protection layer 213.

Therefore, the other actuator 330 having the stacked structure as described above has the above-described one-side actuator 230 which causes a rising deformation when an electric field is generated between the lower electrode 333 as the common electrode and the upper electrode 337 as the signal electrode. Unlike), as shown in FIG. 3 as an example, the free end causes a downward deformation of Q.

That is, in the improved optical path control apparatus having the dual support structure according to the present invention, when an electric field is generated between each electrode, as shown in FIG. 10B as an example, the signal electrode 233 has a lower portion of the strained layer 235. One-side actuator 230 having a common electrode 237 formed on the strained layer 235 causes upward strain Y by + Q, and the signal electrode 337 is formed on the strained layer 335. The other actuator 330, which is formed and the common electrode 333 is formed under the strained layer 335, causes a downward strain Y ′ by -Q, thereby providing a driving angle approximately twice that of the conventional apparatus described above. For example, approximately 6-10 degrees).

As described above, the one actuator 230 is deformed in the upper direction (arrow Y direction), the other actuator 330 is deformed in the lower direction (arrow Y 'direction) is the electrode laminated structure of each actuator (230, 330) It is determined by the characteristics.

Next, a process of manufacturing the optical path control apparatus according to the present invention having the double support structure as described above will be described in detail with reference to FIGS. 9A to 9H showing a sequential manufacturing process.

First, referring to FIG. 4, the structure and manufacturing process of the panel base 210 formed under the two actuators 230 and 330 may include the structure and manufacturing process of the panel base 110 shown in FIG. 1. Same to similar. Therefore, since the structure and manufacturing process of such a panel base 210 is disclosed in detail in the above-mentioned prior application, a detailed description thereof will be omitted, and hereinafter, a dual support structure employed in the improved optical path control apparatus according to the present invention. The manufacturing process of the actuator which has a description is demonstrated in detail.

9A to 9H are process diagrams illustrating the manufacturing process of the improved optical path control apparatus according to the present invention, which is a center of the cross section when the optical path control apparatus of the present invention shown in FIG. 2 is viewed from the Z-direction. It is shown as.

First, the driving substrate 211 having the etch stop layer 215, the protection layer 213, and the drain pads 212 and 212 ′ is stacked on the panel base 210, which is sequentially stacked downward, that is, the etch stop layer 225. The sacrificial layer 217 is coated on the sacrificial layer, that is, the silicate glass having a high concentration of phosphorus (P) has a sacrificial layer having a thickness of about 1.0 to 2.0 μm by the Atmospheric Pressure Vapor Deposition (APCVD) method. In the state in which the 217 is formed, the supporting portion forming portion in which the drain pad 212 is formed at the lower portion of the sacrificial layer 217 is etched through patterning, so that the etch stop layer 215 of the etch stop layer 215 is shown. Part of both ends is exposed.

Here, the sacrificial layer 217 serves to facilitate the lamination required to form the AMA module, and the sacrificial layer 217 is formed by hydrogen fluoride (HF) vapor after the lamination of the AMA module is completed. The space where the sacrificial layer 217 is removed thus becomes the air gap 220 region, for example as shown in FIG. 4.

Next, as shown in FIG. 9B, the membrane material is formed on the exposed etch stop layer 215 and on the sacrificial layer 217 to have a thickness of about 0.1 to 1.0 μm using silicon nitride by low pressure chemical vapor deposition. And etched through patterning to form membranes 231 and 331 respectively extending from a portion of the exposed etch stop layer 215 to a portion of the sacrificial layer 217, respectively.

At this time, each of the membranes 231 and 331 to be formed, as shown in FIG. 8 as an example, the projections 232 and 332 are refracted by about 90 degrees at each free end side and the ends of the membranes face each other at a predetermined interval. Each of the protrusions 232 and 332 may be formed, and the support part 510 of the mirror 500 may be formed on the upper portion of the terminal side.

Then, a lower electrode material made of a material having high electrical conductivity such as platinum / tantalum (Pt / Ta), for example, by using a sputtering technique, on top of each membrane 231 and 331 and on top of the sacrificial layer 217. 9 and by etching through patterning, as shown in FIG. 9C, lower electrodes 233 and 333 are formed on the respective membranes 231 and 331, respectively, wherein the lower electrodes 233 and 333 are formed. As for thickness, about 500-2000 GPa is preferable.

At this time, the lower electrode 233 formed on the membrane 231 is, for example, an upper region of the exposed etch stop layer 215 on the drain pad 212 (ie, as shown in FIG. 5). A lower electrode 333 formed over the upper portion of the membrane 231 except for the protrusion 232 to the distribution hole, and serving as a signal electrode, and formed on the membrane 331. As an example, as shown in FIG. 6, the upper region of the exposed etch stop layer 215 on the drain pad 212 ′ (ie, the support region where a distribution hole is to be formed later) and the membrane excluding the protrusion 332 ( It is formed on the upper part of 331 and functions as a common electrode.

Referring to FIG. 9D, piezoelectric material PZT or PLZT is applied and patterned on top of each lower electrode 233 and 333 and a part of the membrane 331 by using a sol-gel method. For example, each of the strained layers 235 and 335 is formed by etching a portion of the strained layer material through a photolithography process, and the thickness of the strained layers 235 and 335 is about 0.1 to 1.0 μm. desirable. Subsequently, the strained layers 245 and 263 are phase-shifted by applying heat treatment based on a rapid thermal annealing (RTA) technique.

Next, metals such as aluminum (Al) and platinum (Pt), which are excellent in electrical conductivity and reflectivity, are coated on the strain layers 235 and 335, and patterned for each pixel to form the upper electrodes 237 and 337. 9E, the thickness of the upper electrodes 237 and 337 formed at this time is preferably about 500 to 2000 m 3.

In this case, the upper electrode 237 formed on the strained layer 235 is, for example, an upper region of the exposed etch stop layer 215 on the drain pad 212 (ie, as shown in FIG. 5). The upper electrode 337 formed on the upper part of the strained layer 235 except for the support part region in which the distribution hole is to be formed later and serving as a common electrode, and formed on the strained layer 335, is illustrated as an example. As shown in Fig. 6, the upper portion of the entire strained layer 335 includes an upper region of the exposed etch stop layer 215 on the drain pad 212 '(i.e., a support region where a distribution hole is to be formed later). It is formed over and functions as a signal electrode.

That is, as is apparent from the above description, one actuator 230 is formed such that the lower electrode 233 functions as a signal electrode and the upper electrode 237 functions as a common electrode, while the other actuator 330 is provided as a lower portion. The electrode 333 is formed to function as a common electrode and the upper electrode 337 is formed to function as a signal electrode.

Therefore, in the optical path adjusting device of the present invention, when an electric field is generated between the two electrodes 233 and 237 and the two electrodes 333 and 337, the one-side actuator is deformed by the deformation of each of the deformation layers 235 and 335 corresponding thereto. While 230 causes upward deformation by Q in the upward direction, the other actuator 330 causes downward deformation by Q in the downward direction, thereby realizing a driving angle of 2Q.

Next, by using a photolithography process, the strained layer 235, the lower electrode 233, which is a signal electrode, the membrane 231, and the etch stopper layer 235 from one side of the strained layer 235 of the one-side actuator 230. 215 and the protective layer 213 are sequentially etched (that is, sequentially etched in the direction of the arrow n in FIG. 9F), thereby distributing the distribution hole 240 vertically from the strained layer 235 to the drain pad 212. At the same time, the upper electrode 337, the strain layer 335, the membrane 331, the etch stop layer 215, and the protective layer 213, which are signal electrodes, are formed from one side of the upper electrode 337 of the other actuator 330. By sequentially etching (that is, sequentially etching in the direction of the arrow n 'in FIG. 9F), the distribution hole 340 is formed vertically from the upper electrode 337 to the drain pad 212 ′.

Subsequently, each of the distribution holes 240 and 340 is filled with a metal such as tungsten, platinum, or titanium to form the distributors 241 and 341. In this case, the distributors 241 and 341 are formed by a sputtering method to electrically connect the drain pad 212, the lower electrode 233, and the upper electrode 337, respectively.

Therefore, the manufacturing process as described above can complete the actuator of the improved optical path control device according to the present invention, that is, the actuator of the dual support structure.

Next, as described above, a process of forming a mirror on the actuator in the state where the actuator of the double support structure is completed will be described in detail.

That is, when the actuator of the dual support structure is completed, the atmospheric pressure chemical vapor deposition (Atmospheric Pressure CVD) is performed on the silicate layer having a high concentration of phosphorus (P) on one side and the other of the actuators 230 and 330. Applying the sacrificial layer material to a thickness of about 1.0 ~ 2.0㎛ by APCVD method, and etching through the patterning to remove a part of the sacrificial layer material, the end of the projections (232, 332) on the free end side of each actuator (230, 330) A portion of the sacrificial layer 390 including the upper portion is removed. At this time, the sacrificial layer region 391 removed here is used as a support region of the mirror to be formed later on the upper portion of the sacrificial layer.

Here, the sacrificial layer 390 serves to facilitate the lamination required to form the mirror of the AMA module, and this sacrificial layer 390 is a hydrogen fluoride (HF) vapor after the lamination of the AMA module is completed. Is removed, and the space in which the sacrificial layer 390 is removed thus becomes an air gap 400 region, for example, as shown in FIG. 4.

Next, as shown in FIG. 9H, a mirror material is applied over the sacrificial layer 390 and over the removed region 391, for example, by sputtering a metal such as platinum, aluminum, or silver to form the mirror material. The mirror 500 is formed on a portion of the upper portion of the sacrificial layer 390 by applying the upper portion of the region 391 removed by etching through patterning as the support 510.

Accordingly, the mirror 500 has a support 510 on the central axis abutting a portion of the upper end of each of the protrusions 232 and 332, respectively, and free ends on both sides are formed in parallel with the upper electrodes 237 and 337, respectively. In this case, the formed mirror 500 preferably has a thickness of about 0.1 to 1.0 μm, and reflects light incident from a light source not shown at a predetermined reflection angle.

Lastly, the sacrificial layer 390 interposed between the upper electrodes 237 and 337 and the mirror 500 and the lower portion of the membrane 231 and 331 of the actuators 230 and 330 and the etching protection layer 215 are interposed between the sacrificial layer 390 and the mirror 500. The respective sacrificial layers 217 are removed by, for example, hydrogen fluoride (HF) vapor to form respective air gaps 400 and 220, respectively, as shown in FIG. 400, 220) is filled with liquid p-dichlobenznen (p-dichlobenznen). At this time, the moisture present in each of the air gaps 400 and 220 is discharged to the outside. Subsequently, the p-dichlorobenzene filled in each of the air gaps 400 and 220 is sublimed in a vacuum to complete the thin film type optical path control device, that is, the optical path control device of the dual support structure having a cross section as shown in FIG. Is completed.

As described above, according to the present invention, the actuator of the optical path adjusting device for driving the mirror reflecting the light incident from the light source is formed in a double support structure that cross-drives the upper and lower directions at the central portion of the mirror to support one end of the mirror center. When one actuator connected to the other side is driven in the upper direction, the other actuator connected to the other end of the support center of the mirror is driven downward, thereby realizing a larger driving angle compared to the driving angle in the conventional apparatus, so that Higher quality can be achieved.

Claims (5)

A panel base 210 having a driving substrate 211 having a drain pad formed on one side thereof, a protective layer 213 and an etch stop layer 215 sequentially stacked on the driving substrate 211, and a panel base through a support part. An optical path control apparatus including an actuator formed on 210 to provide a driving angle of a mirror for reflection of incident light, The optical path control device, the upper portion of the free end of one actuator 230 is connected to one end of the mirror 500 support 510 and the upper portion of the free end of the other actuator 330 is the mirror 500 support 510 It has a double support structure connected to the other end of The one side actuator 230 is: An air gap 220 is interposed between the etch stop layer 215 to the membrane 231, the signal electrode 233, the strained layer 235, and the common electrode 237 in parallel with the panel base 210. Sequentially formed; It penetrates through the strain layer 235, the signal electrode 233, the membrane 231, the etch stop layer 215, and the protective layer 213, and is connected to the drain pad 212 on one side of the driving substrate 211. A distribution hole 240 having a signal applying distributor 241 therein; The other actuator 330 is: An air gap 220 is interposed between the etch stop layer 215 and the membrane 331, the common electrode 333, the strained layer 335, and the signal electrode 337 in parallel with the panel base 210. Sequentially formed; The signal electrode 337, the strained layer 335, the membrane 331, the etch stop layer 215, and the passivation layer 213 pass through and are connected to the drain pad 212 ′ on the other side of the driving substrate 211. And a distribution hole 340 having a signal distribution distributor 341 therein, The mirror 500 has an improvement in that both free ends are formed in parallel with the common electrode 237 and the signal electrode 337 by placing the air gap 400 around the support part 510. Light adjustment device. According to claim 1, wherein the upper portion of the free end of the one-side actuator 230 is a free end end portion of the protrusion 232 integrally formed in the membrane 231, the upper portion of the free end of the other actuator 330 is Improved optical path control device, characterized in that the upper end of the free end of the protrusion (332) formed integrally with the membrane (331). 3. The free end of the protrusion 232 integrally formed in the membrane 231 has a shape refracted at right angles at the free end of the membrane 231, and integrally formed in the membrane 331. The free end of the formed projection (332) is an improved optical path control device, characterized in that it is refracted at right angles at the free end of the membrane (331) facing the free end of the membrane (231). A panel base 210 having a driving substrate 211 having a drain pad formed on one side thereof, a protective layer 213 and an etch stop layer 215 sequentially stacked on the driving substrate 211, and a panel base through a support part. In the method of manufacturing an optical path control device comprising an actuator formed on the 210 to provide a drive angle of the mirror for the reflection of the incident light, A sacrificial layer having a predetermined thickness is coated on the etch stop layer 215, and is etched through patterning to form the sacrificial layer 217 formed on the drain pads 212 and 212 ′ in the driving substrate 211. Exposing each portion; A membrane material is coated on each of the exposed etch stop layer 225 and the top of the sacrificial layer 217, and is etched through patterning so as to form one and the other sides of the exposed etch stop layer 215 and the sacrificial layer 217. Forming membranes 231, 331, each having a protrusion 232, 332 over an upper portion of the substrate; Signal electrode 233 is applied to a portion of the upper portion of the membrane 231 including an upper portion of one side of the exposed etch stop layer 215 by applying an electrode material on top of each of the membranes 231 and 331 and etching through patterning. Forming a common electrode 333 on an upper portion of the membrane 331 that does not include the other upper portion of the exposed etch stop layer 215; Applying a strain material on the signal electrode 233 and the common electrode 333 and etching through patterning to form strain layers 235 and 335 having a predetermined thickness, respectively; A common electrode is coated on an upper portion of the strained layer 235 that does not include an upper portion of one side of the exposed etch stop layer 215 by coating an electrode material on the upper portions of the strained layers 235 and 335 and etching the patterned portion. Forming a signal electrode 337 on the strain layer 335 including an upper portion of the exposed etch stop layer 215 at the same time as the 237 is formed; In the vertical direction corresponding to the drain pad 212, a portion of the strained layer 235, the signal electrode 233, the membrane 231, the etch stop layer 215, and the passivation layer 213 may be sequentially etched. The signal electrode 337, the strained layer 335, the membrane 331, and the etch stop layer are formed in the vertical direction corresponding to the drain pad 212 ′ while forming a power distribution hole 240 having a 241. Sequentially etching the portions 215 and 213 of the protective layer 213 to form a distribution hole 340 having a distributor 341; Applying a sacrificial layer 390 material over the upper portion of the common electrode 237 and the signal electrode 337 and the protrusions 232 and 332, and etching through patterning to free the protrusions 232 and 332. Exposing a short termination top portion 391; A mirror material is coated on the sacrificial layer 390 and the exposed area 391, and is etched through patterning to expose a portion of the upper part of the sacrificial layer 390 using the exposed area 391 as the center support 510. Forming a mirror 500; And The common electrode 237, the signal electrode 337, and the mirror with the sacrificial layer 217 interposed between the membranes 231 and 331 and the etch stop layer 215, and the support 510 interposed therebetween. Method of manufacturing an optical path control device comprising the step of removing each of the sacrificial layer (390) interposed between the 500 to form each air gap (220, 400), respectively. 5. The free end of the protrusion 232 is bent at a right angle from the free end of the membrane 231, and the free end of the protrusion 332 is formed in the membrane 331. Method of manufacturing an optical path control device, characterized in that it is refracted at right angles at the free end of the to face the free end of the membrane (231).

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