KR100302106B1 - Metal deposition film for capacitor with two reinforcement layers and manufacturing method - Google Patents

Abstract

The present invention is characterized in that the loss value does not change with the use voltage and time, the spray characteristics are excellent, the capacity reduction is extremely small, and the electrode metal is formed at the upper end of the margin side electrode to produce a deposition film having excellent withstand voltage characteristics. The present invention relates to a deposition film for a capacitor manufactured by depositing aluminum or zinc as an electrode on a plastic film surface of a dielectric in a vacuum so as to form a reinforcing layer, and a method of manufacturing the same.

Description

Metal deposited film for capacitor having two reinforcement layers and manufacturing method thereof

The present invention relates to a film having two reinforcing layers and a method of manufacturing the same, and in particular, a loss value does not change with use voltage and time, excellent spray characteristics, extremely low capacity reduction, and excellent deposition resistance film. Deposition film for capacitors manufactured by depositing aluminum or zinc with electrodes continuously on the plastic film surface of the dielectric in vacuum so that two reinforcement layers are formed at the upper end of the margin side electrode to produce the It relates to a manufacturing method.

In general, film type capacitors have excellent high-frequency characteristics electrically and have a thin electrode surface, and thus have low self-recovery characteristics and low loss ratios. Further, the voltage of the film capacitor, the structure of the electrode, the free margin width, the size, and the like differ depending on the electrode metal, and the uses thereof also vary.

In the film capacitor, a capacitor used for alternating current is often used in a range of 10 to 1000 microfarads (μF) and 10 to 480 volts (Volt), and even when the AC voltage is high at 240 to 600V even below 10 microfarads (μF). Many OPP films are used. In addition, even in the range of 3 to 800 μF, OPP films are also widely used in the range of 480 V to 1000 V. PET films are often used by evaporating aluminum, and are mainly used for alternating voltages of 240V or less at capacitances of 10 μF or less.

Film capacitors generally use a plastic film as the dielectric and deposit aluminum or zinc on the surface of the plastic film as the active electrode in vacuum. The metal deposition film is used in such a film capacitor because the metal film used as the electrode is considerably thin, so that self-recovery characteristics can be obtained. Also, the metal deposition film is applied to a range in which the voltage withstand voltage is considerably higher than that of a capacitor using an aluminum thin electrode. do.

Here, the self-recovery characteristic is the thickness of the electrode metal of the film capacitor is hundreds of Å thin, so when there is voltage breakdown in the weak part of the dielectric film, the temperature is suddenly increased to 5000 ° C or more due to the electrostatic energy or short circuit current of the capacitor. It is the characteristic that the metal electrode film around the breakdown part melts or evaporates in the larger area than the breakdown part, and the insulation is restored and acts as a condenser again.

As such, the film type capacitor has a lower tan δ loss than other capacitors due to the self-recovery characteristic of low clearing energy when applied to the voltage, and is thus melted in a positive type current, such as a converting lamp and a motor starting. ), Most commonly used for ELECTRIC POWER and MONITOR.

In the case of manufacturing a film capacitor using a metal deposition film, the film has a spray process (SPRAY / METALLICON) for the adhesion of the electrode and the bridge of the capacitor, and in general, the thin film of the metal electrode film for the film capacitor is the active electrode ( That is, the higher the resistance value, the better the self-recovery characteristic, so that it can withstand a high voltage, but as the thickness of the electrode becomes thinner, the slitting edge part, that is, the part to be sprayed, becomes thinner and the shaving sprayed becomes thinner. .

Therefore, since the thickness of the electrode metal film 2 is formed thin, the adhesion area between the electrode metal film and the lead is thin, resulting in poor adhesion between the metals during metal spraying, and thus the tan δ value (loss value). ) Increases, so that only the slitting edge part to be sprayed is generally applied thickly to compensate for the disadvantage of this part. In other words, in order to improve the adhesive properties of the spray metal and the thin electrode when the metal spray, the coating area is thicker than the active electrode to increase the adhesion area.

In order to compensate for this disadvantage, as shown in FIG. 1, the conventional metal deposition film for a film type capacitor is one side of the aluminum electrode 2 deposited on the top surface of the dielectric plastic film 1 to enhance spray characteristics, that is, The reinforcement part 3 was formed in the part to which the opposite lead of the margin 4 is joined.

However, even in such a case, it is not possible to sufficiently prevent the discharge generated from the electrode, and even if a high current flows in the high capacitor, the disadvantage of overheating and burning of the electrode could not be prevented.

In other words, electrons are generally concentrated at the edges, so electrons are concentrated and accumulated at the ends of the electrode metal film, and partial discharge occurs due to the flow of high current in the accumulated corners. Therefore, as time passes, the partial discharge phenomenon causes a high current that the metal film cannot tolerate. Therefore, when the metal film in the electron accumulation portion is thinner than the current size, the resistance value becomes very high, so the metal at the margin portion Combustion occurs in the membrane part.

As a result, the area of the electrode is reduced, the capacitance is reduced, and the function of the capacitor is deteriorated.

An object of the present invention is to solve the above problems, the loss value does not change with the use voltage and time, the spray characteristics are excellent, while the capacity reduction is extremely small, the margin (margin) to produce a good withstand voltage characteristics The present invention provides a deposition film for a capacitor manufactured by depositing aluminum or zinc as an electrode on a plastic film surface of a dielectric in an electrode in vacuum so that a reinforcing layer is formed on the upper end of the secondary electrode.

A feature of the present invention for achieving the above object is a metal deposition film for a capacitor having a first reinforcing part formed at an end of an aluminum electrode opposite to a margin in order to improve spray characteristics, the second at the end portion of the margin of the electrode. The reinforcement part is further formed, and the widths of the first reinforcement part and the second reinforcement part are 1.5 to 3 mm and 1 to 2 mm, respectively, so that the resistance ratio of the electrode between each of the first reinforcement part and the second reinforcement part and each reinforcement part is 1.5. To 4 Ω / □: 3.5 to 7 Ω / □: 5 to 15 Ω / □.

In addition, another feature of the present invention is a method of manufacturing a metal deposition film for a capacitor formed with a first strengthening portion at the end of the aluminum electrode opposite the margin in order to improve the spray characteristics, the aluminum electrode on top of the dielectric plastic film When depositing and depositing a first reinforcement on an upper end opposite the margin of the aluminum electrode, further comprising depositing a second reinforcement on an upper end of the aluminum electrode opposite the first reinforcement; The width of the reinforcement part is 1.5 to 3 mm and 1 to 2 mm, respectively, and the resistance ratio of the electrode between each of the first and second reinforcement parts and each of the reinforcement parts is 1.5 to 4 Ω / □: 3.5 to 7 Ω / □: 5 to 5 The method of manufacturing a metal deposition film for a capacitor having two reinforcing layers, characterized in that 15Ω / □.

1 is a cross-sectional view showing a conventional metal deposition film for a capacitor,

2 is a cross-sectional view of a metal deposition film for a film capacitor according to the present invention,

3 is a graph showing the resistance distribution according to the position of the film produced by the present invention,

Figure 4 is a graph showing the tangent (tan) δ of a capacitor manufactured using a film according to the present invention.

* Description of the symbols for the main parts of the drawings *

1101 ... dielectric plastic film 2102 ... metal electrode

3,103 ... 1st reinforced part 4,105 ... margin

100 ... metal deposition film 104 ... second reinforced part

2 is a side cross-sectional view of the metal deposition film 100 for a film capacitor according to the present invention. As described above, the plastic film according to the present invention has an M-margin portion 105 having a predetermined length on one side of the dielectric plastic film 101 on the upper surface of the dielectric plastic film 101 having a thickness of about 0.6 to 12 μm. The aluminum electrode 102 is first deposited in vacuo, and then aluminum or zinc so that first and second reinforcement portions 103 and 104 are formed on the upper surfaces of both ends of the layer of aluminum electrodes 102, respectively. Vacuum deposition is made thicker with a metal such as. Each of the reinforcement parts 103 and 104 is formed to have a different thickness, and in the case of the electrode 102 using aluminum according to the thickness ratio of the reinforcement parts 103 and 104, the parts to be strengthened are formed to be 2 to 10 Ω / A.

When aluminum or zinc is deposited on the first dielectric plastic film 101 to form the first reinforcement 103 and the second reinforcement 104, a mask (not shown) in the longitudinal direction of the film 100 is formed. Cover with coating.

After slitting the deposited film 100, the width of each of the first and second reinforcement portions 103 and 104 formed at both ends of the electrode 102 is 1.5 to 3 mm and 1 to 2 mm, respectively. It is desirable to make a range. This is because when the width of each of the first and second reinforcement portions 103 and 104 exceeds 1.5 to 3 mm and 1 to 2 mm, respectively, the self-recovery characteristics of the electrode 102 are likely to be lost. .

In this manner, the resistivity ratio of the metal deposited film is a constant ratio of 1: 1.5 to 3: 2 to 4, and the resistance value of the entire surface is continuously 1.0 to 7.0 Ω / A (A: area). While coating, the width of the reinforcing portion is made from 2 to 5 mm in the first reinforcing portion, and the second reinforcing portion is made in 1 to 3 mm.

As such, the stress concentration at the edge of the deposited film may be described as follows.

The field strength at the end of the deposited film

When the field strength is Ge, the average field strength is G, 2Ⅱ f each frequency is ω, the constant is χ, the dielectric constant is ε, the dielectric thickness is t and the surface resistance is R _S.

Becomes

It can be seen from the above equation that the electric field strength at the tip of the membrane is related to the surface resistance value. Therefore, it can be seen that increasing the surface resistance increases the electric field strength at the tip of the membrane.

The deposition film 100 for the film capacitor is manufactured in a manner similar to that of manufacturing a conventional deposition film. That is, the aluminum electrode 102 is continuously deposited in a vacuum state at a predetermined interval on the long dielectric plastic film 101 continuously wound, and the first reinforcement part 103 is disposed in the longitudinal direction at the center of the electrode 102. Deposit in succession.

In addition, the second reinforcement 104 is continuously deposited along the edge of the portion of the margin 105 of the electrode 102. At this time, as described above, the resistance ratio of the electrode 102 between the first reinforcement unit 103, the second reinforcement unit 104, and the first reinforcement unit 103 and the second reinforcement unit 104 is 1: 1.5. It is preferable to deposit each of the first and second reinforcing portions 103 and 104 so as to be in the range of 3 to 2: 4.

Thereafter, the wound deposition film 100 is cut continuously in the center portion of the first reinforcement portion 103 and the center portion of the margin 105 to obtain a deposition film 100 having a cross section as shown in FIG. 2. . After the deposition film 100 is wound up, it is compressed, and after the spraying process is performed on the first reinforcement part 103, the lead wire is connected.

(Example)

The surface resistance of the non-reinforced metal electrode 102 with the width of the margin portion 105 on the upper surface of the polypropylene (OPP) film 101 having a thickness of 7 μm and the width of the electrode metal film 102 on 39 mm. Was about 3.2 Ω / A, and the metal resistance film was manufactured such that the surface resistance of the first reinforced portion 103 was about 1.2 Ω / A, and the surface resistance of the second reinforced portion 104 was about 2 Ω / A. The metal vapor deposition film thus obtained was produced as a capacitor (MF capacitor) having a capacity of 0.47 μF through the procedure of winding → compression → spraying → lead wire connection work.

Since the aluminum deposition film of the non-reinforced portion is formed thinner than the zinc-based deposition film, it can be self-recovered with a small energy. The thickness of the deposited film of aluminum is about 340 kW in the case of 1.2 Ω / A, about 205 kW in the case of 2.0 Ω / A, and about 128 kPa in the case of 3.2 Ω / A.

The table below shows the performance and test results of the capacitor thus manufactured.

Item Contents Volume 0.47 μF Rated frequency 50/60 Hz Rated voltage According to each specification Rated voltage According to each specification Rated energizing time (symbol) 40000 hours (40D) Maximum allowable temperature (symbol) 75 ° C (Y) Ambient temperature 65 ℃ (Resin) Minimum allowable temperature (symbol) -25 ° C (B)

In these performances and tests, standard test conditions were carried out at a temperature of 5 to 35 ° C. and a humidity of 45 to 85%, and when there was any objection to the determination, the standard test conditions were performed at a temperature of 20 ± 2 ° C. and a humidity of 65 ± 5%.

FIG. 3 is a data obtained by shearing a portion of a deposition film manufactured according to an embodiment in a width direction to measure optical density according to a distance from a slit edge surface, and converting the resistance into resistance. The difference in resistance between the 103, second reinforced 104 and non-reinforced 102 can be easily seen.

Figure 4 is a graph showing the charge and discharge test results of the capacitor manufactured using the film 100 according to the present invention, it can be seen that the change in the loss value (tanδ) according to the applied voltage hardly appeared compared to the conventional capacitor Can be.

The metal deposition film 100 thus formed is generally used to manufacture a capacitor with leads connected through a winding and spraying process.

In the film capacitor thus manufactured, even when a high current flows during use, combustion does not occur in the electrode located near the margin, and thus no change occurs in the area of the electrode, thereby reducing the change in capacitance and increasing the potential hardness. In order to obtain high dislocation hardness, the deposition end is made thinner to have high resistance to the aluminum electrode metal, that is, the non-reinforced portion, so that the clearing energy of the defective portion can be lowered.

Claims (2)

In the metal deposition film for a capacitor formed with a first strengthening portion at the end of the aluminum electrode opposite the margin, The second reinforcement 104 is further formed at an end portion of the margin 105 of the electrode 102, and the widths of the first reinforcement 103 and the second reinforcement 104 are 1.5 to 3 mm and 1, respectively. To 2 mm so that the resistance ratio of the electrode 102 between each of the first and second reinforcement portions 103 and 104 and each of the reinforcement portions 103 and 104 is 1.5 to 4 Ω / □: 3.5 to 7 Ω / □: 5 A metal deposition film for a capacitor having two reinforcing layers, characterized in that from to 15 Ω / □. In the method for producing a metal deposited film for a capacitor formed with a first strengthening portion at the end of the aluminum electrode opposite the margin, When the aluminum electrode 102 is deposited on the dielectric plastic film 101 and the first reinforcement 103 is deposited on the upper end opposite the margin 105 of the aluminum electrode 102, the first reinforcement part ( And further depositing a second reinforcement part 104 on the upper end of the aluminum electrode 102 opposite the 103, wherein the widths of the first reinforcement part 103 and the second reinforcement part 104 are 1.5 to 1.5, respectively. 3 mm and 1 to 2 mm, and the resistance ratio of the electrode 102 between each of the first and second reinforcement portions 103 and 104 and the respective reinforcement portions 103 and 104 is 1.5 to 4 Ω / □: 3.5 to 7 Ω / □: Method of producing a metal deposition film for a capacitor having two reinforcing layers, characterized in that 5 to 15 Ω / □.