KR100710141B1 - Manufacturing Method of Color Filter Substrate - Google Patents
Manufacturing Method of Color Filter Substrate Download PDFInfo
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- KR100710141B1 KR100710141B1 KR1020000050370A KR20000050370A KR100710141B1 KR 100710141 B1 KR100710141 B1 KR 100710141B1 KR 1020000050370 A KR1020000050370 A KR 1020000050370A KR 20000050370 A KR20000050370 A KR 20000050370A KR 100710141 B1 KR100710141 B1 KR 100710141B1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133519—Overcoatings
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/28—Adhesive materials or arrangements
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Abstract
본 발명은 기존의 유리 대신 플라스틱을 기판으로 하는 컬러필터 기판의 제조방법에 관한 것으로서, 모기판 전면에 공통 전극을 형성하는 공정과, 상기 공통 전극 상에 블랙 매트릭스 패턴을 형성하는 공정과, 상기 블랙 매트릭스 패턴 사이에 컬러필터층을 형성하는 공정과, 상기 컬러필터층을 포함한 전면에 접착물질을 형성하는 공정과, 상기 접착물질 상에 플라스틱 기판을 부착하는 공정과, 상기 모기판을 제거하는 공정을 포함하여 이루어지는 것을 특징으로 한다.The present invention relates to a method for manufacturing a color filter substrate using plastic as a substrate instead of glass, comprising: forming a common electrode on an entire surface of a mother substrate; forming a black matrix pattern on the common electrode; Forming a color filter layer between the matrix patterns, forming an adhesive material on the entire surface including the color filter layer, attaching a plastic substrate on the adhesive material, and removing the mother substrate. Characterized in that made.
컬러필터 기판, 플라스틱 기판Color filter substrate, plastic substrate
Description
도 1a 내지 1f는 종래기술에 따른 컬러필터 기판의 제조 방법을 나타낸 공정도.1A to 1F are process drawings showing a method for manufacturing a color filter substrate according to the prior art.
도 2a 내지 2e는 본발명에 따른 컬러필터 기판의 제조 방법을 나타낸 공정도.2a to 2e is a process chart showing a manufacturing method of a color filter substrate according to the present invention.
*도면의 주요 부분에 대한 부호설명* Explanation of symbols on the main parts of the drawings
11 : 모기판 13 : 블랙 매트릭스11: mosquito board 13: black matrix
15 : 컬러필터층 17 : 접착물질 15
18 : 공통 전극 19 : 플라스틱 기판18
본 발명은 액정표시장치의 제조방법에 관한 것으로 특히, 기판의 재료로 플라스틱을 사용한 컬러필터 기판의 제조방법에 관한 것이다.The present invention relates to a method for manufacturing a liquid crystal display device, and more particularly, to a method for manufacturing a color filter substrate using plastic as a substrate material.
근래 고품위 TV(high definition TV) 등의 새로운 첨단 영상기기가 개발됨에 따라 브라운관(CRT) 대신에 LCD(Liquid Crystal Display), ELD(electro luminescence display), VFD(vacuum fluorescence display), PDP(plasma display panel)등과 같은 평판표시장치에 대한 연구가 활발히 진행되고 있다. Recently, with the development of new advanced imaging devices such as high definition TVs, liquid crystal displays (LCDs), electro luminescence displays (ELDs), vacuum fluorescence displays (VFDs), and plasma display panels (PDPs) are used instead of CRTs. Research on flat panel display devices such as) has been actively conducted.
그 중에서도 LCD는 평판 표시기의 대표적인 기술로써 박형, 저가, 저소비 전력 구동 등의 특징을 가져 랩 톱 컴퓨터(lap top computer)나 포켓 컴퓨터(pocket computer)의 표시 외에 차량 적재용, 칼라 TV의 화상용으로도 그 용도가 급속하게 확대되고 있다. Among them, LCD is a representative technology of flat panel display, which is characterized by thin, low cost, low power consumption, etc., and it is not only used to display lap top computer or pocket computer, but also for vehicle loading and color TV image. In addition, its use is expanding rapidly.
이러한 특성을 갖는 LCD는 상부기판인 컬러필터(color filter) 기판과 하부기판인 TFT(Thin Film Transistor) 기판이 서로 대향되도록 배치되고,그 사이에 유전 이방성을 갖는 액정이 형성되는 구조를 가져, 화소 선택용 어드레스(address) 배선을 통해 수십 만개의 화소에 부가된 TFT를 스위칭 동작시켜 해당 화소에 전압을 인가해 주는 방식으로 구동되게 된다. The LCD having such characteristics is arranged such that a color filter substrate, which is an upper substrate, and a TFT (Thin Film Transistor) substrate, which is a lower substrate, are disposed to face each other, and has a structure in which a liquid crystal having dielectric anisotropy is formed therebetween. The TFTs added to the hundreds of thousands of pixels through the selection address wiring are driven to switch voltages to the pixels.
이때, 상기 컬러필터 기판은 일정한 순서로 배열되어 색상을 구현하는 적색(Red), 녹색(Green), 청색(Blue)의 컬러필터층과 R,G,B 셀 사이의 구분과 광차단 역할을 하는 블랙 매트릭스, 그리고 액정 셀에 전압 인가를 위한 공통 전극으로 구성된다.At this time, the color filter substrate is arranged in a predetermined order to implement the color and the black and red light, the role between the red (Green), green (Blue) color filter layer and the R, G, B cells and light blocking The matrix and a common electrode for applying voltage to the liquid crystal cell.
상기 컬러필터층을 구성하는 세가지 색은 각각 독립적으로 구동되고 이들의 조합에 의해 한 화소(pixel)의 색이 표시된다.The three colors constituting the color filter layer are driven independently of each other, and a color of one pixel is displayed by the combination thereof.
한편, 컬러필터 기판을 제조하는 방법은 제조시 사용되는 유기 필터의 재료에 따라 염료 방식과 안료 방식이 있으며, 제작 방법에 따라 염색법, 분산법, 코팅법, 전착법, 잉크젯법등으로 분류할 수 있으나, 현재 TFT-LCD의 컬러필터층의 제조 시 사용되는 가장 보편적인 방법은 안료 분산법이다. On the other hand, the method of manufacturing a color filter substrate is a dye method and a pigment method according to the material of the organic filter used in the manufacturing, and may be classified into a dyeing method, dispersion method, coating method, electrodeposition method, inkjet method, etc. At present, the most common method used in the production of color filter layer of TFT-LCD is pigment dispersion method.
이하, 첨부된 도면을 참조하여 안료분산법을 이용한 종래 기술의 컬러필터 기판의 제조방법을 설명하면 다음과 같다.Hereinafter, with reference to the accompanying drawings will be described a method for manufacturing a prior art color filter substrate using the pigment dispersion method.
도 1a 내지 1f는 종래 기술에 따른 컬러필터 기판의 제조방법을 나타낸 공정도이다.1A to 1F are process diagrams showing a method of manufacturing a color filter substrate according to the prior art.
먼저, 유리 기판(1) 세정을 실시한 후, 도 1a에서와 같이, 블랙 매트릭스(3) 재료로 사용되는 크롬 또는 카본(Carbon) 계통의 유기 재료를 스퍼터링에 의하여 증착한다.First, after cleaning the glass substrate 1, as shown in FIG. 1A, a chromium or carbon-based organic material used as the
상기 블랙 매트릭스(3) 형성 후, 색상을 구현하기 위해 컬러 리지스트(color resist)를 사용하여 컬러필터층을 패터닝한다.After the
즉, 도 1b에서와 같이, 상기 블랙 매트릭스(3)를 포함한 전면에 상기 블랙 매트릭스(3)를 완전히 덮을 수 있도록 적색(Red)이 착색된 제 1 컬러 리지스트(4)를 도포한다. That is, as shown in FIG. 1B, a first color resist 4 colored with red is applied to the entire surface including the
다음 도 1c에서와 같이, 마스크(7)를 이용하여 도포된 상기 제 1 컬러 리지스트(4) 상부의 특정 영역만을 노출시킨 후, 부분 노광을 실시한다.Next, as shown in FIG. 1C, after exposing only a specific region on the
다음 도 1d에서와 같이, 노광에 의해 광화학적 구조가 변경된 상기 제 1 컬러 리지스트(4)를 현상액에 담궈 패터닝하여 제 1 착색층 패턴(5a)을 형성한다. Next, as shown in FIG. 1D, the
일반적으로 컬러 리지스트는 네가티브(negative) 리지스트의 성격을 가지므로 노광되지 않는 부분이 제거된다.In general, the color resist has the characteristics of a negative resist, so that an unexposed part is removed.
그리고, 상기 도 1b 내지 1d에서 보여진 공정들을 반복 수행하여 도 1e에서 와 같이 녹색, 청색(Green, Blue)이 각각 착색된 제 2 및 제 3 착색층 패턴(5b, 5c)을 형성한다.Then, the processes shown in FIGS. 1B to 1D are repeatedly performed to form second and third colored
이 때, 사용하는 마스크는 제 1 컬러 리지스트를 노광 할 때 쓰던 동일한 마스크를 쉬프트(shift)시켜 사용한다.At this time, the mask to be used is used by shifting the same mask used when exposing the first color resist.
마지막으로, TFT기판에 형성된 화소 전극과 함께 액정 셀을 동작시키기 위한 공통 전극(8)의 형성은 컬러필터층 형성 후에 이루어진다.Finally, the formation of the
도 1f에서와 같이, 상기 착색된 패턴을 포함한 전면에 투과성과 도전성이 좋으며 화학적, 열적 안정성이 우수한 투명 전극 재료인 ITO(Indium Tin Oxide)를 스퍼터링에 의해 증착한다. 상기 공통 전극(8)으로서의 ITO는 별도의 패턴 형성을 하지 않는다.As shown in FIG. 1F, ITO (Indium Tin Oxide), which is a transparent electrode material having good permeability and conductivity and excellent chemical and thermal stability, is deposited on the entire surface including the colored pattern by sputtering. ITO as the
참고적으로, 공통 전극 형성 전에 착색된 패턴의 보호와 평탄화를 위하여 아크릴(Acryl)계 수지 또는 폴리이미드(Polyimide)계 수지를 사용하여 스핀 코팅 방법으로 평탄화막을 형성하는 경우도 있지만 제조 공정 코스트를 낮추기 위해 생략하기도 한다. For reference, in order to protect and planarize the colored pattern before forming the common electrode, the planarization film may be formed by spin coating using an acrylic resin or a polyimide resin, but the manufacturing process cost may be reduced. May be omitted.
그러나, 상기와 같은 종래의 컬러필터 기판의 제조방법은 다음과 같은 문제점이 있다.However, the conventional method of manufacturing a color filter substrate as described above has the following problems.
기존의 컬러필터 기판으로 사용되는 유리 기판은 내구성에 문제가 있고 경량 박형화에 한계가 있다. 그리고, 기존 컬러필터층 제조공정이 150℃이상의 고온 공정이므로 플라스틱에 적용하기도 어렵다. Glass substrates used as conventional color filter substrates are problematic in durability and limited in light weight thinning. In addition, since the existing color filter layer manufacturing process is a high temperature process of more than 150 ℃ it is difficult to apply to plastics.
본 발명은 상기와 같은 문제점을 해결하기 위하여 안출한 것으로 플라스틱 기판의 열에 의한 변형없이 컬러필터 기판을 제조하는 컬러필터 기판의 제조방법을 제공하는데 그 목적이 있다.An object of the present invention is to provide a method of manufacturing a color filter substrate for producing a color filter substrate without deformation due to heat of the plastic substrate to solve the above problems.
상기와 같이 구성되는 본 발명의 컬러필터 기판의 제조방법은 모기판 전면에 공통 전극을 형성하는 공정과, 상기 공통 전극 상에 블랙 매트릭스 패턴을 형성하는 공정과, 상기 블랙 매트릭스 패턴 사이에 컬러필터층을 형성하는 공정과, 상기 컬러필터층을 포함한 전면에 접착물질을 형성하는 공정과, 상기 접착물질 상에 플라스틱 기판을 부착하는 공정과, 상기 모기판을 제거하는 공정을 포함하여 이루어지는 것을 특징으로 한다. The method of manufacturing a color filter substrate of the present invention configured as described above includes a process of forming a common electrode on the entire surface of a mother substrate, a process of forming a black matrix pattern on the common electrode, and a color filter layer between the black matrix pattern. And forming a bonding material on the entire surface including the color filter layer, attaching a plastic substrate on the bonding material, and removing the mother substrate.
이하, 첨부된 도면을 참조하여 본 발명에 의한 컬러필터 기판의 제조방법을 상세히 설명하면 다음과 같다.Hereinafter, a manufacturing method of a color filter substrate according to the present invention will be described in detail with reference to the accompanying drawings.
도 2a 내지 2e는 본 발명에 따른 컬러필터 기판의 제조 방법을 나타낸 공정도이다.2a to 2e is a process chart showing a manufacturing method of a color filter substrate according to the present invention.
먼저, 유리 또는 금속을 재료로 하는 모기판(11)(mother substrate)을 준비하여 세정을 실시한 후, 도 2a에서와 같이, 스퍼터링에 의하여 투명 도전막인 ITO를 증착하여 공통 전극(18)을 형성한다. 단, 상기 모기판은 이후 공정에서 에칭 또는 그라인딩에 의해 제거 가능한 것으로 한다.First, a
다음 도 2b에서와 같이, 상기 공통 전극(18) 상에 스퍼터링에 의하여 블랙 매트릭스(13)를 증착하고, TFT기판에서의 TFT형성부와 게이트 및 데이터 배선부에 대응하여 남도록 패터닝한다.Next, as shown in FIG. 2B, the
이 때, 상기 블랙 매트릭스의 재료로는 광밀도 3.5이상의 크롬 등의 금속 박막이나 카본(Carbon) 계통의 유기재료가 주로 쓰인다. In this case, as the material of the black matrix, a metal thin film such as chromium having a light density of 3.5 or more, or a carbon-based organic material is mainly used.
그리고, 상기 블랙 매트릭스(13)를 패터닝한 후에 행해지는 컬러필터층의 형성은 색상을 구현하는 안료가 함유된 컬러 리지스트를 사용하여 사진식각(photolithograpy) 기술을 이용한다. 이에는 염색법, 안료 분산법, 코팅법, 전착법, 잉크젯법등이 있다.The color filter layer is formed after the
주로 이용되는 안료 분산법으로 좀 더 상세히 설명하면 다음과 같다.The pigment dispersion method mainly used will be described in more detail as follows.
상기 블랙 매트릭스(13)를 포함한 전면에 상기 블랙 매트릭스(13)를 완전히 덮을 수 있도록 적색(Red)이 착색된 제 1 컬러 리지스트를 도포한다. The first color resist with red color is applied to the entire surface including the
리지스트 도포하는 방법에는 스핀(spin)법과 롤 코트(roll coat)법이 있는데, 스핀법은 기판 위에 리지스트를 적당히 흘려 놓고 기판을 고속으로 회전시킴으로써 상기 리지스트를 기판 전체에 고루 퍼지게 하는 방법이고, 롤 코트법은 롤 위에 전개한 리지스트를 기판에 전사하여 가는 방법이다. The resist coating method includes a spin method and a roll coat method. The spin method is a method in which the resist is evenly spread on the substrate and the substrate is spread evenly throughout the substrate by rotating the substrate at a high speed. The roll coating method is a method of transferring a resist developed on a roll onto a substrate.
다음 마스크를 이용하여 도포된 상기 리지스트 상부의 특정 영역만을 노출시킨 후, 부분 노광을 실시한다.After exposing only a specific region on the resist applied using the next mask, partial exposure is performed.
이 때, 노광시키는 방법에는 원판을 일광 노광하는 프록시미티(proximity)방법, 축소 패턴을 반복하여 노광하는 스테퍼(stepper)방법, 마스크 패턴을 투영하여 노광하는 미러(mirror) 투영방법의 3가지가 있는데, 생산성을 우선으로 하는 단순 매트릭스 LCD는 처리속도가 빠른 프록시미티 방식을, 고정밀도가 요구되는 능동 매트릭스 LCD는 스테퍼 방식이나 미러 투영방식이 사용된다.At this time, there are three methods of exposing, including a proximity method for exposing the original to daylight, a stepper method for repeatedly exposing a reduced pattern, and a mirror projection method for projecting and exposing a mask pattern. For example, simple matrix LCDs that give priority to productivity use proximity methods with high processing speed, and active matrix LCDs that require high precision use stepper methods or mirror projection methods.
다음 노광에 의해 광화학적 구조가 변경된 상기 제 1 컬러 리지스트를 현상액에 담구면 노광되지 않는 부분이 제거되어 원하는 제 1 착색층 패턴이 형성된다. 이 때, 현상(develop)은 딥핑(dipping), 퍼들(puddle), 샤워 스프레이(shower spray)법 중 어느 하나로 한다.Subsequently, when the first color resist whose photochemical structure is changed by immersion is immersed in a developing solution, an unexposed portion is removed to form a desired first colored layer pattern. At this time, the development is any one of dipping, puddle, and shower spray methods.
그리고, 제 1 착색층 패턴을 형성한 것처럼 상기 공정을 반복 수행하여 녹색, 청색(Green, Blue)이 각각 착색된 제 2 및 제 3 착색층 패턴을 형성한다.As the first color layer pattern is formed, the process is repeated to form second and third color layer patterns in which green and blue colors are respectively colored.
상기 컬러필터층(15)의 형성은 통상적으로 R, G, B순서로 한다. Formation of the
한편, 상기 컬러 리지스트의 주요 성분은 일반적인 포토 리지스트와 같이 감광 조성물인 광중합 개시제, 모노머(monomer), 바인더(binder) 등과 색상을 구현하는 유기 안료 등으로 구성된다. On the other hand, the main components of the color resist is composed of a photopolymerization initiator, a monomer (monomer), a binder (binder) and the like as a general photoresist, an organic pigment for implementing the color.
이상의 방법으로 컬러필터층을 형성한 후에는 도 2d에서와 같이 상기 컬러필터층(15) 상에 접착물질(17)을 코팅하고, 상기 접착물질 상에 플라스틱 기판(19)을 부착한다.After the color filter layer is formed in the above manner, the
마지막으로 상기 모기판(11)을 에칭 또는 그라인딩에 의해 제거하면 플라스틱을 기판(19)으로 하는 컬러필터 기판이 완성된다.Finally, when the
참고적으로, 상기 컬러필터층(15) 형성 공정과 접착물질(17) 도포 공정 사이에 오버 코팅(over coating) 공정을 추가할 수 있는데, 이것은 플라스틱 기판 접착시 접착물질(17)에 의한 컬러필터층(15)의 불량을 방지하고, 접착물질이 도포될 표면을 평탄하게 하기 위한 것이다. For reference, an over-coating process may be added between the process of forming the
상기와 같은 본 발명의 컬러필터 기판의 제조방법은 다음과 같은 효과가 있다.The manufacturing method of the color filter substrate of the present invention as described above has the following effects.
저온 공정이 아닌 고온 공정이 포함된 기존의 TFT-LCD 제조공정 내에서 기존의 유리 기판을 플라스틱 기판으로 대체하여 컬러필터 기판을 형성함으로 액정표시소자의 내구성을 향상시키고 경량 박형화를 실현할 수 있다. In the existing TFT-LCD manufacturing process that includes a high temperature process, not a low temperature process, the glass substrate is replaced with a plastic substrate to form a color filter substrate, thereby improving durability of the liquid crystal display device and realizing light weight thinning.
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| JPH11212116A (en) * | 1998-01-26 | 1999-08-06 | Hitachi Ltd | Liquid crystal display device and manufacturing method thereof |
| JPH11212111A (en) * | 1997-10-30 | 1999-08-06 | Eastman Kodak Co | Display device having optical patterning enabled conductive trace |
| JP2000047023A (en) * | 1998-07-24 | 2000-02-18 | Kyodo Printing Co Ltd | Manufacturing method of color filter |
| JP2000199814A (en) * | 1999-01-06 | 2000-07-18 | Toppan Printing Co Ltd | Color filter manufacturing method |
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| JPH11212111A (en) * | 1997-10-30 | 1999-08-06 | Eastman Kodak Co | Display device having optical patterning enabled conductive trace |
| JPH11212116A (en) * | 1998-01-26 | 1999-08-06 | Hitachi Ltd | Liquid crystal display device and manufacturing method thereof |
| JP2000047023A (en) * | 1998-07-24 | 2000-02-18 | Kyodo Printing Co Ltd | Manufacturing method of color filter |
| JP2000199814A (en) * | 1999-01-06 | 2000-07-18 | Toppan Printing Co Ltd | Color filter manufacturing method |
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