KR100797520B1 - LCD and its manufacturing method - Google Patents

Abstract

A liquid crystal display device in which the external shape is symmetrical is disclosed. The gate line formed in the process of manufacturing the gate electrode of the thin film transistor is extended to one side of the substrate, and the gate line is insulated, and the data line formed in the process of manufacturing the source electrode passes again through the insulated gate line. By extending to one side, the gate driving IC and the data driving IC are disposed adjacent to each other. Since the liquid crystal display device having the symmetrical left and right can be manufactured, the left and right eccentricity is prevented from occurring by the liquid crystal display device when it is mounted on the information processing device.

LCD, Left and Right Eccentric, Gate Line, Insulation, Data Line

Description

Liquid crystal display and its manufacturing method {LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR FABRICATING THE SAME}

1 is a process diagram illustrating a channel pattern formed on a first substrate of a liquid crystal display according to an exemplary embodiment of the present invention.

FIG. 2 is a cross-sectional view taken along line 2-2 'of FIG. 1.

3 is a process diagram illustrating that a gate electrode and a gate line are formed after the gate insulating film is formed on the upper surface of FIG. 1.

4 is a cross-sectional view taken along line 4-4 'of FIG.

FIG. 5 is a process diagram illustrating that contact holes are formed in an insulating film formed on an upper surface of FIG. 3.

6 is a cross-sectional view taken along line 6-6 'of FIG.

FIG. 7 is a flowchart illustrating a data line formed on an upper surface of FIG. 5.

8 is a cross-sectional view taken along line 8-8 'of FIG.

9 is a flowchart illustrating a pixel electrode formed on the drain electrode of FIG. 7.

FIG. 10 is a cross-sectional view taken along line 10-10 'of FIG. 9.

11 is a conceptual diagram of a liquid crystal display device according to the present invention.

The present invention relates to a liquid crystal display device and a manufacturing method thereof, and more particularly, to a liquid crystal display device and a manufacturing method thereof manufactured to have a symmetrical shape.

In general, a display device for allowing a user to recognize the result data processed by the information processing device includes an image display device for outputting the result data as an image, a media output device such as a printer for outputting the result data to a medium such as paper, and the like. There is a voice display device for outputting the result data by voice or sound.

Video display apparatuses capable of obtaining the largest amount of data in a short time are divided into analog image display apparatuses and digital image display apparatuses according to operating mechanisms.

At this time, the analog video display device is a typical CRT display device (Cathode Ray Tube type display device).

On the other hand, the digital image display device is divided into a liquid crystal display (LCD) or an organic electroluminescence device (Organic Electroluminescence device).

In this case, when comparing the digital image display apparatus and the analog image display apparatus having the same screen size, the volume and weight of the digital image display apparatus are significantly smaller than the analog image display apparatus.

The digital image display apparatuses having such advantages have a first substrate capable of applying an electric field in a very small area unit, and a second substrate facing the first substrate and always applying a constant power supply and an RGB pixel.

Specifically, the effective display area in which the actual display is performed among the first substrates of the digital image display apparatuses is divided into a plurality of very fine areas.

In order to form a different electric field in each of the plurality of divided regions, thin film transistors are formed in each region by a semiconductor manufacturing process.

In order to drive thin film transistors, a gate line connected to a gate electrode formed in each thin film transistor and a data line formed in a source electrode are required.

At this time, the gate lines all have a first direction, and the data lines have a second direction orthogonal to the first direction. In this case, a source driving IC is formed in the data lines so that the data signal is applied to the data line at an appropriate timing, and a gate driving IC is formed in the gate lines so that the turn-on signal is applied to the gate line at an appropriate timing.

At this time, the gate line and the data line are orthogonal, so that the source driving ICs and the gate driving ICs are also perpendicular to each other. That is, with such a structure, the external appearance is never symmetrical.

However, when a liquid crystal display device which is not symmetrical in this way is mounted on an arbitrary information processing device, the center of the liquid crystal display device is not set at a designated position of the information processing device, which causes a problem of frequent assembly failure.

Accordingly, the present invention has been made in view of the above problems, and a first object of the present invention is to provide a liquid crystal display device having symmetrical left and right.

It is a second object of the present invention to provide a method of manufacturing a liquid crystal display device having right and left symmetry.

In order to achieve the first object of the present invention, a liquid crystal display device includes an effective display area, a first invalid display area surrounding an outside of the effective display area, and a second invalid display area adjacent to the first invalid display area. A gate line and a gate line connected to the gate electrode and extending to the second invalid display area are formed by manufacturing a first substrate and a channel pattern arranged in a matrix form on the first substrate, and forming a gate electrode to be insulated from the channel pattern. Insulated and connected to the first insulating means having first contact holes formed thereon so as to expose the source side channel pattern and the drain side channel pattern, the source side channel pattern being extended to the second invalid display area via the first invalid display area; A drain electrode connected to the data line and the drain side channel pattern, the first A second substrate formed with a pixel electrode formed through the second contact hole of the second insulating means in which the second contact hole is formed to expose a portion of the drain electrode, and a common electrode facing the pixel electrode, and coupled to the first substrate And a liquid crystal injected between the first substrate and the second substrate.

In addition, the manufacturing method of the liquid crystal display device for achieving the second object of the present invention is the effective display area, the first non-effective display area surrounding the effective display area, the second non-effective display area adjacent to the second ratio Manufacturing a first substrate having an effective display area formed thereon, manufacturing a channel pattern arranged in a matrix form on the first substrate, and forming a gate electrode so as to be insulated from the channel pattern, and connected to the gate electrode to a second invalid display area; Fabricating an extended gate line; forming a first insulating film having first contact holes formed to insulate the gate line and exposing the source side channel pattern and the drain side channel pattern; and connected to the source side channel pattern and having a first ratio Extending to the second invalid display area via the effective display area; Forming a drain electrode connected to the data line and the drain-side channel pattern, forming a second insulating layer having a second contact hole to expose a portion of the drain electrode on the first substrate, and forming a pixel electrode through the second contact hole And forming a common electrode facing the pixel electrode and assembling the second substrate to be coupled to the first substrate, and injecting a liquid crystal between the first substrate and the second substrate.

According to the present invention, the liquid crystal display device is manufactured to be close to the left and right symmetry, thereby preventing the left and right eccentricity generated when the liquid crystal display device is finally assembled to the information processing device or the like.

Hereinafter, a method of manufacturing a liquid crystal display device and a liquid crystal display device according to an embodiment of the present invention will be described with reference to the accompanying drawings.

First, a method of manufacturing a symmetric liquid crystal display device will be described with reference to FIG. 1 and below.

1, the first substrate 10, which is one of the components of the liquid crystal display, and the channel pattern 30 formed on the first substrate 10 are illustrated.

More specifically, the first substrate 10 is a transparent substrate having a rectangular parallelepiped shape, for example, a glass substrate.

Thus, the first substrate 10 having a rectangular parallelepiped plate shape is divided into three regions.

The three regions are divided into an effective display region 3, a first invalid display region 5 and a second invalid display region 7 as shown in FIG. 1.

On the other hand, outside the edge of the effective display area 3 defined as above, a first invalid display area 5 having a band shape is formed. Various wirings and the like pass through the bottom surface of the first invalid display area 5.

On the other hand, the remaining area of the first substrate 10 except for the effective display area 3 and the first invalid display area 5 is the second invalid display area 7.

Thin film transistors are formed in the effective display area 3 of the first substrate 10 defined as described above.

1 to 8 illustrate a process of forming a thin film transistor, a data line, and a gate line in detail.                     

First, referring to FIG. 1 or FIG. 2, a plurality of channel patterns 30 are formed in the effective display area 3 in a matrix form. Reference numeral 20 denotes a blocking layer that prevents ions that affect the semiconductor from eluting from the transparent substrate.

The channel pattern 30 is formed by patterning a channel layer (not shown) formed over the entire top surface of the blocking layer 20. Generally, in the effective display area 3, a myriad of channel patterns 30 are formed according to the resolution. However, in the present invention, for the sake of clarity, 3 × 3 channel patterns 30 are used as an example. That is, in the present invention, a process of manufacturing nine pixels is described below.

Subsequently, as shown in FIG. 3 or 4, the gate insulating layer 40 is formed on the top surface of the first substrate 10 in the state in which the channel pattern 30 is formed on the first substrate 10. It is applied to a predetermined thickness over the entire area.

Thereafter, a gate thin film is formed on the top surface of the gate insulating layer 40, and is patterned to form the gate electrode 50 as illustrated in FIG. 3 or 4.

At this time, the gate line 55 is formed together with the gate electrode 50 in the process of forming the gate electrode 50.

In this case, each gate line 55 is connected to all the gate electrodes 50 belonging to a row of the gate electrodes 50 having a matrix shape in one embodiment.

In the present invention, three gate lines 55 are formed by requiring a thin film transistor having a 3 × 3 matrix in one embodiment. At this time, each gate line 55 extends to the second invalid display region 7 in a state in which the gate lines 55 are commonly connected to all the gate electrodes 50 belonging to each row. Reference numeral 55a denotes a contact pad formed at an end of the gate line.

Subsequently, as illustrated in FIG. 5 or 6, the gate insulating layer 60 is deposited on the upper surface of the effective display area 3 of the first substrate 10 to a predetermined thickness.

At this time, an end portion of the gate line 55 existing in the second invalid display area 7 among the gate lines 55 is exposed without being covered by the gate insulating film 60. Thus, a gate IC (not shown) is formed in the region 2a that is not covered by the gate insulating film 60.

The other side of the channel pattern 30 based on the first contact hole 62 and the gate electrode 50 is exposed to the gate insulating layer 60 such that one side of the channel pattern 30 is exposed based on the gate electrode 50. The second contact hole 64 is formed to be exposed.

As shown in FIG. 7 or 8, the source / drain thin film is patterned as shown in FIG. 7 or 8 while the conductive source / drain thin film (not shown) is formed on the top surface of the first substrate 10. The data line 72 and the source electrode (not shown) drain electrode 74 are formed.

More specifically, in the state in which the first and second contact holes belonging to each column are filled, they are patterned to form a source electrode in the first contact hole 62, and the drain electrode 74 in the second contact hole 64. ) Is formed.

Thereafter, the source electrodes belonging to each row are all connected in common by the data line 72, and the end of the data line 72 extends to the second invalid display area 7. In this case, an end portion of the data line 72 is formed adjacent to the end portion of the gate line 55. Reference numeral 72a denotes a connection pad formed at an end of the data line 72, and reference numeral 2b denotes a region where the data IC is to be formed.

Subsequently, as shown in FIG. 9 or FIG. 10, the insulating film 80 is formed again over the entire area of the first substrate 10 except for a part.

At this time, the portion where the insulating film 80 is not formed is a part of the second invalid display region 7 and the drain electrode 74.

Thereafter, the pixel electrode 90 is formed on a portion of the drain electrode 74 where no insulating film is formed.

Thereafter, a gate IC (not shown) is connected to an end of the gate line 55 exposed to the second invalid display area 7, and a source IC (not shown) is connected to an end of the data line 72.

As a result, the gate IC and the source IC are formed side by side in the second ineffective display region 7 of the first substrate 10 so that the first substrate 10 has a shape close to symmetry in appearance.

Thereafter, as shown in FIG. 11, the first substrate 10 is disposed between the first substrate 10 and the second substrate 110 in an assembled state with the second substrate 110 on which the common electrode and the RGB pixel are formed. The liquid crystal 120 is injected to manufacture the liquid crystal display 140.

As described in detail above, the liquid crystal display device is manufactured to be close to the left and right symmetry, thereby preventing the left and right eccentricity generated when the liquid crystal display device is finally assembled to the information processing device or the like.

Claims (4)

A first substrate having a valid display area, a first invalid display area surrounding the effective display area, and a second invalid display area adjacent to the first invalid display area; Forming a channel pattern arranged in a matrix form on the first substrate, forming a gate electrode to be insulated from the channel pattern, and extending the gate pattern to the second invalid display area while connected to the gate electrode; First insulating means including an amorphous silicon thin film insulating the gate line formed in the effective and second invalid display regions and having first contact holes formed to expose a source side channel pattern and a drain side channel pattern of the channel pattern; A drain electrode connected to the source side channel pattern and extending to the second invalid display area via the first invalid display area and a drain electrode connected to the drain side channel pattern; Second insulating means having a second contact hole formed to expose a portion of the drain electrode on the first substrate; A pixel electrode formed on the insulating layer and connected to the drain electrode through the second contact hole; A gate driving IC and a data driving IC electrically coupled to an end of the gate line and an end of the data line; A second substrate having a common electrode facing the pixel electrode and coupled to the first substrate; And And a liquid crystal injected between the first substrate and the second substrate. The liquid crystal display device according to claim 1, wherein the second insulating means is one of an insulating film and an amorphous silicon thin film. The method of claim 1, wherein the gate driving IC and the data driving IC And a second ineffective display area in parallel with each other. Iii) fabricating a first substrate having a valid display area, a first invalid display area surrounding the effective display area, and a second invalid display area adjacent to the first invalid display area; Ii) forming a channel pattern arranged in a matrix form on the first substrate, forming a gate electrode on the upper surface of the channel pattern to be insulated from the channel pattern, and connecting to the gate electrode and extending to the second invalid display area; Fabricating a gate line; Iv) a first contact hole formed to insulate the gate line formed in the effective and second invalid display regions, and to expose a source side channel pattern and a drain side channel pattern of the channel pattern, and including an amorphous silicon thin film Forming an insulating film; Iii) forming a drain line connected to the drain side channel pattern and a data line connected to the source side channel pattern and extending to the second invalid display area via the first invalid display area; A second insulating film having a second contact hole formed on the first substrate to expose a portion of the drain electrode, and forming a pixel electrode through the second contact hole; Iv) coupling a gate driver IC and a data driver IC to an end of the gate line and an end of the data line, respectively; Iii) assembling a second substrate such that a common electrode facing the pixel electrode is formed and is coupled to the first substrate; Iii) injecting a liquid crystal between the first substrate and the second substrate.

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