KR100943549B1 - 물- 및 오일-반발성 정전기 방지 조성물 - Google Patents
물- 및 오일-반발성 정전기 방지 조성물 Download PDFInfo
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- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
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- H05F—STATIC ELECTRICITY; NATURALLY-OCCURRING ELECTRICITY
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- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/333—Polymers modified by chemical after-treatment with organic compounds containing nitrogen
- C08G65/33303—Polymers modified by chemical after-treatment with organic compounds containing nitrogen containing amino group
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- C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
- C08L71/02—Polyalkylene oxides
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- C08G2650/28—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type
- C08G2650/50—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing nitrogen, e.g. polyetheramines or Jeffamines(r)
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- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
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- Y10T428/2933—Coated or with bond, impregnation or core
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2913—Rod, strand, filament or fiber
- Y10T428/2933—Coated or with bond, impregnation or core
- Y10T428/2964—Artificial fiber or filament
- Y10T428/2967—Synthetic resin or polymer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
- Y10T442/20—Coated or impregnated woven, knit, or nonwoven fabric which is not [a] associated with another preformed layer or fiber layer or, [b] with respect to woven and knit, characterized, respectively, by a particular or differential weave or knit, wherein the coating or impregnation is neither a foamed material nor a free metal or alloy layer
- Y10T442/2164—Coating or impregnation specified as water repellent
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
- Y10T442/20—Coated or impregnated woven, knit, or nonwoven fabric which is not [a] associated with another preformed layer or fiber layer or, [b] with respect to woven and knit, characterized, respectively, by a particular or differential weave or knit, wherein the coating or impregnation is neither a foamed material nor a free metal or alloy layer
- Y10T442/2164—Coating or impregnation specified as water repellent
- Y10T442/2189—Fluorocarbon containing
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
- Y10T442/20—Coated or impregnated woven, knit, or nonwoven fabric which is not [a] associated with another preformed layer or fiber layer or, [b] with respect to woven and knit, characterized, respectively, by a particular or differential weave or knit, wherein the coating or impregnation is neither a foamed material nor a free metal or alloy layer
- Y10T442/2221—Coating or impregnation is specified as water proof
- Y10T442/2246—Nitrogen containing
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Abstract
Description
| 성분 | 설명 | 시판 회사/제법 |
| 비스(트리플루오로메탄술포닐)이미드 | HN(SO2CF3)2 | 정전기 방지 물질 3의 제법 참조 |
| 디메틸 술페이트 | (CH3O)2SO2 | 시그마-알드리치 (Milwaukee, Wisconsin) |
| EMPOL(상표명) 1008 애시드 | 적정에 의해 측정할 때 산 등중량이 305인 올레산 기재의 증류 및 수소화된 이량체 산 | 헨켈 코포레이션/에머리 그룹 (Cincinnati, Ohio) |
| 에피클로로히드린 | 시그마-알드리치 | |
| 에토쿼드(ETHOQUAD (상표명) C/25 | [C12H25N+(CH3)(CH2CH2O)mH(CH2CH2O)nH-Cl] (m+n은 15임) | 악조 노벨 서피스 케미스트리 엘엘씨 (Chicago, Illinois) |
| 에토쿼드 (상표명) 18/25 | [C18H37N+(CH3)(CH2CH2O)mH(CH2CH2O)nH-Cl] (m+n은 15임) | 악조 노벨 서피스 케미스트리 엘엘씨 |
| 에토멘(ETHOMEEN)(상표명) C/15 | [C12H25N(CH2CH2O)mH(CH2CH2O)nH] (m+n은 15임) | 악조 노벨 서피스 케미스트리 엘엘씨 |
| 플루오라드(FLUORAD)(상표명) FC-94 | 리튬 퍼플루오로옥탄술포네이트 | 출발 물질로서 CH3(CH2)7SO2Cl을 CH3(CH2)7SO2F로 대체하고, 50% 수성 KOH를 50% 수성 LiOH로 대체한 것을 제외하고는 미국 특허 제2,732,398호(실시예 5)에 따라 본질적으로 제조 |
| HQ-115 (상표명) | LiN(SO2CF3)2 | 미네소타 마이닝 앤드 메뉴팩춰링 컴퍼니 (3M; St. Paul, MN) |
| 성분 | 설명 | 시판 회사/제법 |
| 헌츠만 XJT-506 | CH3(OCH2CH2)19(OCH2CHCH3)2NH2 | 헌츠만(Houston, TX) |
| 이소프로필 에테르 | CH3CH(OH)CH3 | 시그마-알드리치 |
| 리튬 노나플레이트 | 리튬 노나플루오로부탄술포네이트 | 3M |
| 리튬 트리플레이트 | 리튬 트리플루오로메탄술포네이트(FLUORAD(상표명) FC 122) | 3M |
| MeFOSE 알콜 | C8F17SO2N(CH3)CH2CH2OH | 미국 특허 2,803,656호(Ahlbrecht 등)의 실시예 1에 기재된 것과 유사한 과정을 사용하지만, N-프로필 아민을 메틸 아민으로 대체하여 제조함 |
| MEK | 메틸 에틸 케톤; 2-부타논; CH3C(O)C2H5 | 시그마-알드리치 |
| 메틸렌 클로라이드 | 디클로로메탄; CH2Cl2 | 시그마-알드리치 |
| N-메틸퍼플루오로옥틸술폰아미드 | ||
| NaHCO3 | 탄산수소나트륨 | 시그마-알드리치 |
| 옥타데실 이소시아네이트 | CH3(CH2)17NCO | 시그마-알드리치 |
| p-톨루엔술폰산 | CH3C6H4SO3H | 시그마-알드리치 |
| PBSF | 퍼플루오로부탄술포닐 플루오라이드 | 3M |
| PE6806 | 용융 흐름 지수가 105인 ASPUN(상표명) 6806 폴리에틸렌 | 다우 케미칼 캄파니(Dow Chemical Co.)(Midland, Michigan) |
| PP3960 | 용융 흐름 지수가 약 400인 FINA (상표명) 3960 폴리프로필렌 | 피나 오일 앤드 케미칼 컴퍼니 (FINA Oil & Chemical Co.)(LaPorte, Texas) |
| PRIPOL(상표명) 1048 애시드 | 올레산 기재의 수소화된 증류 이량체/삼량체 산 | 유니케마 노쓰 아메리카(Unichema North America)(Chicago, Illinois) |
| PS440-200 | MORTHANE(상표명) PS440-200 우레탄 | 모르톤 씨오콜 코포레이션(Morton Thiokol Corp.)(Chicago, Illinois) |
| 물 반발성 등급 번호 | 물/IPA 블렌드(부피%) |
| 0 | 100% 물 |
| 1 | 90/10 물/IPA |
| 2 | 80/20 물/IPA |
| 3 | 70/30 물/IPA |
| 4 | 60/40 물/IPA |
| 5 | 50/50 물/IPA |
| 6 | 40/60 물/IPA |
| 7 | 30/70 물/IPA |
| 8 | 20/80 물/IPA |
| 9 | 10/90 물/IPA |
| 10 | 10% IPA |
| 오일 반발성 등급 번호 | 오일 조성 |
| 0 | (KAYDOL(상표명) 광유 실패) |
| 1 | KAYDOL(상표명) 광유 |
| 2 | 65/35(vol) 광유/n-헥사데칸 |
| 3 | n-헥사데칸 |
| 4 | n-테트라데칸 |
| 5 | n-도데칸 |
| 6 | n-데칸 |
| 7 | n-옥탄 |
| 8 | n-헵탄 |
| PS 440-200 부직포의 오일- 및 물-반발성 및 정전하 소실 | ||||||||
| 전하(KV) | 붕괴율(초) | |||||||
| 실시예 | EFD* (㎛) | 오일 반발성(물 반발성) | 10% RH | 25% RH | 50% RH | 10% RH | 25% RH | 50% RH |
| 1 | 11.4 | 8(8) | 5+ | 5+ | 5+ | 0.99 | 0.85 | 0.30 |
| C1 | 14.2 | 0(2) | 5+ | 5+ | >60 | 46.02 | ||
| C2 | 11 | 8(9) | 5+ | 5+ | 5+ | 16.37 | 18.36 | 5.12 |
| C10 | 13.4 | 0(2) | 5+ | 5+ | 5+ | 1.08 | 1.06 | 0.473 |
| * 유효 섬유 직경 | ||||||||
| PE 6806 부직포의 오일- 및 물-반발성 및 정전하 소실 | ||||||||
| 전하(KV) | 붕괴율(초) | |||||||
| 실시예 | EFD* (㎛) | 오일 반발성(물 반발성) | 10% RH | 25% RH | 50% RH | 10% RH | 25% RH | 50% RH |
| 2 | 15.3 | 3(10) | 5+ | 5+ | 5+ | 0.14 | 0.06 | 0.04 |
| C-4 | 16 | 6(10) | 0.5 | 1.28 | 0.91 | >60 | 0.01 | 39.48 |
| C-3 | 14.8 | 0(2) | 0.75 | >60 | ||||
| C11 | 15.1 | 0(2) | 5+ | 5+ | 5+ | 0.1 | 0.06 | 0.01 |
| * 유효 섬유 직경 | ||||||||
Claims (29)
- (a) (i) 양이온성 질소 중심에 결합된 하나 이상의 폴리옥시알킬렌 잔기를 가지며,[C12H25N+(CH3)(CH2CH2O)mH(CH2CH2O)nH]; (m+n=15),[C6H5CH2N+(CH3)(CH2CH2O)mH(CH2CH2O)nH]; (m+n=15), (여기서, C6H5CH2 = 벤질),[C18H37N+(CH3)(CH2CH2O)mH(CH2CH2O)nH]; (m+n=15),[C18H37N+(CH3)(CH2CH2O)mH(CH2CHCH3O)nH]; (m+n=15),[C12H25N+(CH3)(CH2CH2O)mH(CH2CH2O)nH]; (m+n=5),[C12H25N+(CH3)2(CH2CHCH3O)mH]; (m=15),[C12H25N+(CH3)2(CH2CH2CH2CH2O)mH]; (m=15),[C12H25N+(CH3)2(CH2CH2O)mH]; (m=15),[C8H17N+(CH3)2(CH2CH2O)mH]; (m=8),[C12H25N+(CH2CH2O)mH(CH2CH2O)nH(CH2CH2O)oH]; (m+n+o=15), 및[N+(CH2CH2O)mH(CH2CH2O)nH(CH2CH2O)oH(CH2CH2O)pH]; (m+n+o+p=20)(식 중, 폴리옥시알킬렌 잔기에 대한 반복 단위의 개수는 근사값임)로 이루어진 군으로부터 선택된 하나 이상의 양이온, 및(ii) 음이온의 공액 산이 탄화수소 술폰산보다 크거나 또는 그와 동일한 산도를 갖는 것인, 퍼플루오르화 음이온이거나, 하기 화학식 A 및 B로 이루어진 군으로부터 선택된 하나 이상의 약배위하는 음이온(식 중, Rf는 각각 독립적으로, N, O 및 S로 이루어진 군으로부터 선택되는 사슬내 또는 말단 헤테로원자를 함유할 수 있는, 시클릭 또는 아시클릭(acyclic)의 포화 또는 불포화 플루오르화 알킬 또는 아릴기이고,Q는 독립적으로 SO2 연결기이고,X는 QRf임)으로 이루어진 1종 이상의 중합체 염; 및(b) 탄소수 3 내지 20인 퍼플루오르화 탄소쇄를 함유하는 하나 이상의 플루오로화합물 기, 또는 플루오로화합물 우레탄, 우레아 및 치환된 우레아, 에스테르, 에테르, 알콜, 에폭시드, 알로파네이트, 아미드, 아민 및 그의 염, 산 및 그의 염, 카르보디이미드, 구아니딘, 옥사졸리디논, 이소시아누레이트, 피페라진, 아미노알콜, 술폰, 이미드, 비우레트, 아크릴레이트 및 메타크릴레이트 단독중합체 및 공중합체, 실록산, 알콕시실란, 클로로실란 및 이들의 혼합물로 이루어진 군으로부터 선택되는 하나 이상의 플루오로화합물을 포함하는 1종 이상의 플루오로화합물 반발제의 블렌드를 포함하며, 1종 이상의 절연 물질과 블렌딩된, 물- 및 오일-반발성 정전기 방지 조성물.
- 삭제
- (a) (i) 양이온성 질소 중심에 결합된 하나 이상의 폴리옥시알킬렌 잔기를 가지며,[C12H25N+(CH3)(CH2CH2O)mH(CH2CH2O)nH]; (m+n=15),[C6H5CH2N+(CH3)(CH2CH2O)mH(CH2CH2O)nH]; (m+n=15), (여기서, C6H5CH2 = 벤질),[C18H37N+(CH3)(CH2CH2O)mH(CH2CH2O)nH]; (m+n=15),[C18H37N+(CH3)(CH2CH2O)mH(CH2CHCH3O)nH]; (m+n=15),[C12H25N+(CH3)(CH2CH2O)mH(CH2CH2O)nH]; (m+n=5),[C12H25N+(CH3)2(CH2CHCH3O)mH]; (m=15),[C12H25N+(CH3)2(CH2CH2CH2CH2O)mH]; (m=15),[C12H25N+(CH3)2(CH2CH2O)mH]; (m=15),[C8H17N+(CH3)2(CH2CH2O)mH]; (m=8),[C12H25N+(CH2CH2O)mH(CH2CH2O)nH(CH2CH2O)oH]; (m+n+o=15), 및[N+(CH2CH2O)mH(CH2CH2O)nH(CH2CH2O)oH(CH2CH2O)pH]; (m+n+o+p=20)(식 중, 폴리옥시알킬렌 잔기에 대한 반복 단위의 개수는 근사값임)로 이루어진 군으로부터 선택된 하나 이상의 양이온 및(ii) 퍼플루오르화 음이온이거나, 하기 화학식 A 및 B로 이루어진 군으로부터 선택된 하나 이상의 약배위하는 플루오로유기 음이온(식 중, Rf는 각각 독립적으로, N, O 및 S로 이루어진 군으로부터 선택되는 사슬내 또는 말단 헤테로원자를 함유할 수 있는, 시클릭 또는 아시클릭의 포화 또는 불포화 플루오르화 알킬 또는 아릴기이고,Q는 독립적으로 SO2 연결기이고,X는 QRf임)으로 이루어진 1종 이상의 중합체 염; 및(b) 탄소수 3 내지 20인 퍼플루오르화 탄소쇄를 함유하는 하나 이상의 플루오로화합물 기, 또는 플루오로화합물 우레탄, 우레아 및 치환된 우레아, 에스테르, 에테르, 알콜, 에폭시드, 알로파네이트, 아미드, 아민 및 그의 염, 산 및 그의 염, 카르보디이미드, 구아니딘, 옥사졸리디논, 이소시아누레이트, 피페라진, 아미노알콜, 술폰, 이미드, 비우레트, 아크릴레이트 및 메타크릴레이트 단독중합체 및 공중합체, 실록산, 알콕시실란, 클로로실란 및 이들의 혼합물로 이루어진 군으로부터 선택되는 하나 이상의 플루오로화합물을 포함하는 1종 이상의 플루오로화합물 반발제를 포함하는 물- 및 오일-반발성 정전기 방지 조성물.
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- 제1항 또는 제3항의 조성물이 도포된, 열가소성 중합체의 절연 물질을 포함하는 조성물.
- (a) (i) 양이온성 질소 중심에 결합된 하나 이상의 폴리옥시알킬렌 잔기를 가지며,[C12H25N+(CH3)(CH2CH2O)mH(CH2CH2O)nH]; (m+n=15),[C6H5CH2N+(CH3)(CH2CH2O)mH(CH2CH2O)nH]; (m+n=15), (여기서, C6H5CH2 = 벤질),[C18H37N+(CH3)(CH2CH2O)mH(CH2CH2O)nH]; (m+n=15),[C18H37N+(CH3)(CH2CH2O)mH(CH2CHCH3O)nH]; (m+n=15),[C12H25N+(CH3)(CH2CH2O)mH(CH2CH2O)nH]; (m+n=5),[C12H25N+(CH3)2(CH2CHCH3O)mH]; (m=15),[C12H25N+(CH3)2(CH2CH2CH2CH2O)mH]; (m=15),[C12H25N+(CH3)2(CH2CH2O)mH]; (m=15),[C8H17N+(CH3)2(CH2CH2O)mH]; (m=8),[C12H25N+(CH2CH2O)mH(CH2CH2O)nH(CH2CH2O)oH]; (m+n+o=15), 및[N+(CH2CH2O)mH(CH2CH2O)nH(CH2CH2O)oH(CH2CH2O)pH]; (m+n+o+p=20)(식 중, 폴리옥시알킬렌 잔기에 대한 반복 단위의 개수는 근사값임)로 이루어진 군으로부터 선택된 하나 이상의 양이온 및(ii) 음이온의 공액 산이 메탄 술폰산 또는 p-톨루엔 술폰산보다 크거나 또는 그와 동일한 산도를 갖는 것인, 퍼플루오르화 음이온이거나, 하기 화학식 A 및 B로 이루어진 군으로부터 선택된 하나 이상의 약배위하는 음이온(식 중, Rf는 각각 독립적으로, N, O 및 S로 이루어진 군으로부터 선택되는 사슬내 또는 말단 헤테로원자를 함유할 수 있는, 시클릭 또는 아시클릭의 포화 또는 불포화 플루오르화 알킬 또는 아릴기이고,Q는 독립적으로 SO2 연결기이고,X는 QRf임)으로 이루어진 1종 이상의 중합체 염;(b) 탄소수 3 내지 20인 퍼플루오르화 탄소쇄를 함유하는 하나 이상의 플루오로화합물 기, 또는 플루오로화합물 우레탄, 우레아 및 치환된 우레아, 에스테르, 에테르, 알콜, 에폭시드, 알로파네이트, 아미드, 아민 및 그의 염, 산 및 그의 염, 카르보디이미드, 구아니딘, 옥사졸리디논, 이소시아누레이트, 피페라진, 아미노알콜, 술폰, 이미드, 비우레트, 아크릴레이트 및 메타크릴레이트 단독중합체 및 공중합체, 실록산, 알콕시실란, 클로로실란 및 이들의 혼합물로 이루어진 군으로부터 선택되는 하나 이상의 플루오로화합물을 포함하는 1종 이상의 플루오로화합물 반발제; 및(c) 1종 이상의 열가소성 중합체를 포함하며, 성분 (a), (b) 및 (c)의 블렌드를 형성함으로써 제조되는 물- 및 오일-반발성 정전기 방지 조성물.
- 제1항, 제3항 및 제10항 중 어느 한 항의 조성물을 포함하는 섬유, 직물, 필름, 성형품 또는 블로운(blown) 물품.
- (a) (i) 양이온성 질소 중심에 결합된 하나 이상의 폴리옥시알킬렌 잔기를 가지며,[C12H25N+(CH3)(CH2CH2O)mH(CH2CH2O)nH]; (m+n=15),[C6H5CH2N+(CH3)(CH2CH2O)mH(CH2CH2O)nH]; (m+n=15), (여기서, C6H5CH2 = 벤질),[C18H37N+(CH3)(CH2CH2O)mH(CH2CH2O)nH]; (m+n=15),[C18H37N+(CH3)(CH2CH2O)mH(CH2CHCH3O)nH]; (m+n=15),[C12H25N+(CH3)(CH2CH2O)mH(CH2CH2O)nH]; (m+n=5),[C12H25N+(CH3)2(CH2CHCH3O)mH]; (m=15),[C12H25N+(CH3)2(CH2CH2CH2CH2O)mH]; (m=15),[C12H25N+(CH3)2(CH2CH2O)mH]; (m=15),[C8H17N+(CH3)2(CH2CH2O)mH]; (m=8),[C12H25N+(CH2CH2O)mH(CH2CH2O)nH(CH2CH2O)oH]; (m+n+o=15), 및[N+(CH2CH2O)mH(CH2CH2O)nH(CH2CH2O)oH(CH2CH2O)pH]; (m+n+o+p=20)(식 중, 폴리옥시알킬렌 잔기에 대한 반복 단위의 개수는 근사값임)로 이루어진 군으로부터 선택된 하나 이상의 양이온, 및음이온의 공액 산이 탄화수소 술폰산보다 크거나 또는 그와 동일한 산도를 갖는 것인, 퍼플루오르화 음이온이거나, 하기 화학식 A 및 B로 이루어진 군으로부터 선택된 하나 이상의 약배위하는 음이온(식 중, Rf는 각각 독립적으로, N, O 및 S로 이루어진 군으로부터 선택되는 사슬내 또는 말단 헤테로원자를 함유할 수 있는, 시클릭 또는 아시클릭의 포화 또는 불포화 플루오르화 알킬 또는 아릴기이고,Q는 독립적으로 SO2 연결기이고,X는 QRf임)으로 이루어진 1종 이상의 중합체 염,(ii) 탄소수 3 내지 20인 퍼플루오르화 탄소쇄를 함유하는 하나 이상의 플루오로화합물 기, 또는 플루오로화합물 우레탄, 우레아 및 치환된 우레아, 에스테르, 에테르, 알콜, 에폭시드, 알로파네이트, 아미드, 아민 및 그의 염, 산 및 그의 염, 카르보디이미드, 구아니딘, 옥사졸리디논, 이소시아누레이트, 피페라진, 아미노알콜, 술폰, 이미드, 비우레트, 아크릴레이트 및 메타크릴레이트 단독중합체 및 공중합체, 실록산, 알콕시실란, 클로로실란 및 이들의 혼합물로 이루어진 군으로부터 선택되는 하나 이상의 플루오로화합물을 포함하는 1종 이상의 플루오로화합물 반발제 및(iii) 1종 이상의 열가소성 중합체를 배합하는 단계, 및(b) 생성된 배합물을 용융 가공하는 단계를 포함하는 물- 및 오일-반발성 정전기 방지 조성물의 제조 방법.
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| US09/992,877 | 2001-11-05 | ||
| US09/992,877 US6924329B2 (en) | 2001-11-05 | 2001-11-05 | Water- and oil-repellent, antistatic compositions |
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| KR20050033539A KR20050033539A (ko) | 2005-04-12 |
| KR100943549B1 true KR100943549B1 (ko) | 2010-02-22 |
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| EP (2) | EP1444872B1 (ko) |
| JP (2) | JP2005509054A (ko) |
| KR (1) | KR100943549B1 (ko) |
| CN (1) | CN1288190C (ko) |
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| US20030054172A1 (en) * | 2001-05-10 | 2003-03-20 | 3M Innovative Properties Company | Polyoxyalkylene ammonium salts and their use as antistatic agents |
| US20030114560A1 (en) * | 2001-08-02 | 2003-06-19 | Jie Yang | Optically clear and antistatic pressure sensitive adhesives |
| US7931944B2 (en) | 2003-11-25 | 2011-04-26 | Kimberly-Clark Worldwide, Inc. | Method of treating substrates with ionic fluoropolymers |
| US7811949B2 (en) | 2003-11-25 | 2010-10-12 | Kimberly-Clark Worldwide, Inc. | Method of treating nonwoven fabrics with non-ionic fluoropolymers |
| US20080005852A1 (en) * | 2004-07-27 | 2008-01-10 | Nano-Tex, Inc. | Durable multifunctional finishing of fabrics |
| US20060110997A1 (en) * | 2004-11-24 | 2006-05-25 | Snowden Hue S | Treated nonwoven fabrics and method of treating nonwoven fabrics |
| EP2139971A4 (en) * | 2007-04-13 | 2011-09-21 | 3M Innovative Properties Co | ANTISTATIC TRANSPARENT SELF-ADHESIVE ADHESIVE |
| JP5435536B2 (ja) * | 2008-09-04 | 2014-03-05 | 学校法人神奈川大学 | 光分解性ブロックコポリマー |
| WO2011053709A2 (en) | 2009-10-30 | 2011-05-05 | 3M Innovative Properties Company | Optical device with antistatic property |
| JP5552310B2 (ja) * | 2009-12-24 | 2014-07-16 | 日清紡ホールディングス株式会社 | 樹脂架橋剤 |
| WO2011122287A1 (ja) * | 2010-03-31 | 2011-10-06 | 東レフィルム加工株式会社 | 表面保護フィルム |
| CN103174025B (zh) * | 2011-12-23 | 2016-06-22 | 东丽纤维研究所(中国)有限公司 | 一种抗静电尼龙纺织品 |
| BR112014032247A2 (pt) | 2012-06-21 | 2018-05-02 | 3M Innovative Properties Co | filme gravável a laser susceptível a dissipação estática: |
| CN104312354A (zh) * | 2014-10-08 | 2015-01-28 | 安徽真信涂料有限公司 | 一种抗静电涂料 |
| CN107001537A (zh) | 2014-12-16 | 2017-08-01 | 3M创新有限公司 | 抗静电聚合物及其制备方法 |
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- 2002-10-03 DE DE60236882T patent/DE60236882D1/de not_active Expired - Lifetime
- 2002-10-03 AT AT02778421T patent/ATE472929T1/de not_active IP Right Cessation
- 2002-10-03 EP EP20020778421 patent/EP1444872B1/en not_active Expired - Lifetime
- 2002-10-03 JP JP2003543361A patent/JP2005509054A/ja not_active Withdrawn
- 2002-10-03 EP EP20090156908 patent/EP2070969A3/en not_active Withdrawn
- 2002-10-03 CN CNB028215990A patent/CN1288190C/zh not_active Expired - Lifetime
- 2002-10-03 KR KR1020047006802A patent/KR100943549B1/ko not_active Expired - Lifetime
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2010
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Also Published As
| Publication number | Publication date |
|---|---|
| EP1444872A1 (en) | 2004-08-11 |
| EP2070969A2 (en) | 2009-06-17 |
| US6924329B2 (en) | 2005-08-02 |
| WO2003041458A1 (en) | 2003-05-15 |
| KR20050033539A (ko) | 2005-04-12 |
| US20030149158A1 (en) | 2003-08-07 |
| JP2010285629A (ja) | 2010-12-24 |
| ATE472929T1 (de) | 2010-07-15 |
| DE60236882D1 (de) | 2010-08-12 |
| JP2005509054A (ja) | 2005-04-07 |
| CN1288190C (zh) | 2006-12-06 |
| CN1579119A (zh) | 2005-02-09 |
| EP1444872B1 (en) | 2010-06-30 |
| EP2070969A3 (en) | 2009-08-12 |
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