KR101182320B1 - Liquid Crystal Display Device and method for manufacturing the same - Google Patents

Abstract

The present invention relates to a liquid crystal display device and a method for manufacturing the same, in which only the convex portions provided for each column spacer contact the first substrate, which is the opposite substrate, so that the contact area is reduced, compared to the column spacer having the flat corresponding surface. The display device corresponds to a first substrate and a second substrate disposed to face each other, a gate line and a data line crossing each other on the first substrate to define a pixel region, and an area excluding the pixel region on the second substrate. And a color matrix formed on a second substrate including the black matrix layer corresponding to the pixel region and the gate line, a plurality of holes formed in the color filter layer in the region corresponding to the gate line, It includes a column spacer formed on the second substrate to have a recess in the surface of the portion corresponding to the hole.

Column spacer, bad touch

Description

Liquid crystal display device and method for manufacturing the same

1 is an exploded perspective view showing a general liquid crystal display device

2 is a plan view illustrating a liquid crystal display device having a column spacer according to the related art.

3 is a cross-sectional view taken along line II ′ of FIG. 2;

4A is a plan view showing a color filter array substrate according to a first embodiment of the present invention.

Fig. 4B is a cross sectional view along II-II 'line.

5A is a plan view illustrating a color filter array substrate according to a second embodiment of the present invention.

Fig. 5B is a cross sectional view along II-II 'line.

6 is a plan view of a liquid crystal display device having a column spacer according to the present invention.

FIG. 7 is a cross-sectional view taken along line II-II 'of FIG. 6

8A, 9A, and 10A are plan views illustrating a method of forming a color filter array substrate having a column spacer according to the present invention.

8B, 9B and 10B are cross sectional views taken along line III-III 'of FIGS. 8A, 9A and 10A.

* Description of the Signs of the Major Parts of the Drawings *

30: first glass substrate 31: black matrix layer

32a, 32b, 32c: first, second and third color filter layers

33: overcoat layer 50: column spacer

52a: hole 55: liquid crystal layer

100: second substrate 200: first substrate

111: gate line 111a: gate electrode

112: data line 112a: source electrode

112b: drain electrode 113: pixel electrode

117: common line

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device and a method for manufacturing the same, and more particularly, to a liquid crystal display device and a method for manufacturing the same that can prevent touch failure.

(PDP), Electro Luminescent Display (ELD), Vacuum Fluorescent (VFD), and the like have been developed in recent years in response to the demand for display devices. Display) have been studied, and some of them have already been used as display devices in various devices.

Among them, LCD is the most widely used as the substitute for CRT (Cathode Ray Tube) for mobile image display device because of its excellent image quality, light weight, thinness, and low power consumption. In addition to the use of the present invention has been developed in various ways such as a television and a computer monitor for receiving and displaying broadcast signals.

In order to use such a liquid crystal display as a general screen display device in various parts, it is a matter of how high quality images such as high definition, high brightness and large area can be realized while maintaining the characteristics of light weight, thinness and low power consumption. Can be.

Hereinafter, a liquid crystal display according to the related art will be described with reference to the accompanying drawings.

1 is an exploded perspective view showing a general liquid crystal display.

As shown in FIG. 1, a liquid crystal display device includes a liquid crystal injected between a first substrate 1 and a second substrate 2 bonded to each other with a predetermined space, and between the first substrate 1 and the second substrate 2. It consists of layer (3).

In more detail, the first substrate 1 has a plurality of gate lines 4 in one direction and constant in a direction perpendicular to the gate lines 4 at regular intervals to define the pixel region P. FIG. A plurality of data lines 5 are arranged at intervals. In addition, a pixel electrode 6 is formed in each pixel region P, and a thin film transistor T is formed at a portion where the gate line 4 and the data line 5 cross each other, so that the thin film transistor is formed. The data signal of the data line is applied to each pixel electrode according to the signal of the gate line.

In addition, a black matrix layer 7 is formed on the second substrate 2 to block light in portions other than the pixel region P, and portions R corresponding to the respective pixel regions are formed to express colors. , G, B color filter layers 8 are formed, and a common electrode 9 for realizing an image is formed on the color filter layers 8.

In the liquid crystal display as described above, the liquid crystal layer 3 formed between the first and second substrates 1 and 2 is oriented by an electric field formed between the pixel electrode 6 and the common electrode 9, The amount of light passing through the liquid crystal layer 3 may be adjusted according to the degree of alignment of the liquid crystal layer 3 to express an image.

Such a liquid crystal display is called a twisted nematic (TN) mode liquid crystal display, and the TN mode liquid crystal display has a disadvantage of having a narrow viewing angle, and an in-plane switching (IPS) mode to overcome the disadvantage of the TN mode. Liquid crystal display devices have been developed.

In the IPS mode liquid crystal display, a pixel electrode and a common electrode are formed parallel to each other at a predetermined distance in a pixel area of the first substrate so that a horizontal electric field is generated between the pixel electrode and the common electrode and the horizontal electric field is generated. This is to align the liquid crystal layer.

Meanwhile, spacers are formed between the first and second substrates of the liquid crystal display device formed as described above to maintain a constant gap between the liquid crystal layers. These spacers are divided into ball spacers or column spacers according to their shape.

The ball spacer has a spherical shape, is distributed and manufactured on the first and second substrates, the movement is relatively free even after the bonding of the first and second substrates, and the contact area with the first and second substrates is small.

On the other hand, the column spacer is formed in an array process on the first substrate or the second substrate, and is fixed in a pillar shape having a predetermined height on the predetermined substrate. Therefore, the contact area with the 1st, 2nd board | substrate is relatively large compared with a ball spacer.

FIG. 2 is a plan view illustrating a liquid crystal display device having a column spacer according to the related art, and FIG. 3 is a cross-sectional view taken along line II ′ of FIG. 2.

2 and 3, in the array area of the conventional liquid crystal display device, the gate line 4 and the data line 5 are arranged perpendicularly to each other to define the pixel area, and the respective gate lines 4 are arranged. ) And a thin film transistor TFT are formed at a portion where the data line 5 crosses each other, and a pixel electrode 6 is formed in each pixel region. In addition, column spacers 20 are formed to maintain a cell gap at regular intervals. In FIG. 2, one column spacer 20 is disposed in every three pixel regions.

Here, the column spacer 20 is formed in a portion corresponding to the upper side of the gate line 4, as shown in FIG. That is, the gate line 4 is formed on the first substrate 1, the gate insulating layer 15 is formed on the entire surface of the substrate including the gate line 4, and the passivation layer 16 is formed on the gate insulating layer 15. Is formed.

The second substrate 2 includes a black matrix layer 7 for shielding non-pixel regions (gate lines, data lines, and thin film transistor regions) other than the pixel region, and the second substrate 2 on the second substrate 2. A color filter layer 8 formed by sequentially matching R, G, and B pigments to each pixel region and a common electrode 14 formed on the entire surface of the second substrate 2 including the color filter layer 8 are formed.

The column spacer 20 is formed on the common electrode 14 of the portion corresponding to the gate line 4 so that the two substrates 1 and 2 are positioned so that the column spacer 20 is positioned on the gate line 4. Are coalesced.

However, the following problem occurs in the liquid crystal display device in which the column spacer is formed as described above.

In the conventional liquid crystal display including the column spacer, when the surface of the liquid crystal panel 10 is touched in a predetermined direction by using a hand or other object, spots are generated at the touched portion. Such spots are referred to as spot spots generated at the time of touch, and are referred to as touch spots, and are also referred to as touch defects because spots are observed on the screen. Such a touch failure is considered to be large because the contact area between the column spacer 20 and the first substrate 1 facing the column spacer 20 is larger than the structure of the previous ball spacer. That is, since the column spacer 20 formed in a cylindrical shape compared to the ball spacer has a large contact area with the first substrate 1, after being shifted between the first and second substrates 1 and 2 due to the touch, Because it takes a long time to restore to the original state, the stain remains until the original state is restored.

Accordingly, an object of the present invention is to provide a liquid crystal display device and a manufacturing method which can prevent touch defects, which are devised to solve the above problems.

The liquid crystal display of the present invention for achieving the above object is a first substrate and a second substrate disposed to face each other, a gate line and a data line crossing each other on the first substrate to define a pixel region, the second A black matrix layer formed on a substrate corresponding to an area other than the pixel area, a color filter layer formed on a second substrate corresponding to the pixel area including a black matrix layer, and formed on the color filter layer in an area corresponding to the gate line And a column spacer formed on the second substrate to have a recess in a surface of the plurality of holes and a portion corresponding to each of the holes.

An overcoat layer is further provided on the color filter layer to reflect the step between the hole and the hole peripheral part.

A common electrode is further provided on the color filter layer to reflect the step between the hole and the hole peripheral part.

One column spacer is disposed in one pixel area or one column in three pixel areas.

According to an aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, the method including forming a thin film transistor array including a gate line, a data line, and a pixel electrode on a first substrate, and forming a black matrix layer on the second substrate. Forming a color filter layer on a second substrate including the black matrix layer by forming a plurality of holes in a region corresponding to a gate line of the first substrate; Forming a column spacer such that the surface corresponding to the recess has a recess.

The forming of the color filter layer and the hole may include forming a color filter layer forming composition on the black matrix layer and a pattern for forming a color filter layer and forming a hole on the color filter layer forming composition. Opposing and developing the photomask.

The method may further include forming an overcoat layer on an entire surface of the color filter layer including the black matrix layer and the holes.

The method may further include forming a common electrode on an entire surface of the color filter layer including the black matrix layer and the holes.

One column spacer is disposed in one pixel area or one column in three pixel areas.

DETAILED DESCRIPTION OF THE EMBODIMENTS Embodiments of a liquid crystal display and a method of manufacturing the same according to the present invention having the above characteristics will be described in more detail with reference to the accompanying drawings.

4A is a plan view showing a color filter array substrate according to a first embodiment of the present invention, and FIG. 4B is a cross-sectional view taken along line II-II '.

As shown in FIGS. 4A and 4B, the color filter array substrate 100 having column spacers may include gate lines formed in pixel regions (the first substrate TFT array substrate) on the first glass substrate 30. A black matrix layer 31 having a mesh structure formed in correspondence with an area except for the area defined by the intersection of the data lines and a stripe shape parallel to the data line (vertical direction). First, second, and third color filter layers 32a, 32b, and 32c that are formed to correspond to the pixel region to express colors, and the first, second, and third colors corresponding to predetermined portions of the gate line. The concave portion A is provided in the hole 52a formed in the filter layers 32a, 32b, and 32c, the overcoat layer 33 formed in the color filter layer 32, and the region corresponding to the hole 52a. Even if the convex portion B is provided in the peripheral portion 52b of the hole 52a, And a column spacer 50 formed on the overcoat layer 33 on the upper side of the hole.

That is, the overcoat layer 33 is formed to have a recess in a portion corresponding to the hole 52a, and a column spacer 50 is formed thereon.

In this case, one column spacer 50 is disposed in one pixel area.

Meanwhile, unlike the first embodiment, one column spacer 50 may be disposed in three pixel areas, which is as follows.

5A is a plan view illustrating a color filter array substrate according to a second embodiment of the present invention, and FIG. 5B is a cross-sectional view taken along line II-II '.

As shown in FIGS. 5A and 5B, the color filter array substrate 100 having the column spacer formed thereon is a black matrix layer 31 having a mesh structure formed on the first glass substrate 30 to correspond to a region other than the pixel region. ) And first, second, and third color filter layers 32a, 32b, 32c: 32 formed on a stripe parallel to the data line (vertical direction) to represent the color. And a hole 52a formed in the center of one of the first, second and third color filter layers corresponding to the predetermined portion of the gate line, and the first, second and third color filter layers 32a. , 32b, 32c: A recessed portion A in an area corresponding to the overcoat layer 33 formed on the upper portion 32 and the hole 52a formed in any one of the first, second and third color filter layers. ) Is provided, and the convex portion B is provided on the periphery portion 52b of the hole. It comprises a column spacer 50 formed on the overcoat layer 33 of the upper hole.

That is, the overcoat layer 33 is formed to have a recess in a portion corresponding to the hole 52a, and a column spacer 50 is formed thereon.

One column spacer 50 is disposed in three pixel areas.

6 is a plan view of a liquid crystal display device having a column spacer according to the present invention, and FIG. 7 is a cross-sectional view taken along line II-II 'of FIG. 6.

6 and 7, the liquid crystal display device of the present invention described in the following embodiments is a liquid crystal display device in an IPS mode, and is opposed to the TFT array substrate 200 and the TFT array substrate 200. The formed color filter array substrate 100 and the liquid crystal layer 55 filled between the two array substrates are included.

The TFT array substrate 200 is a thin film formed at the intersection of the gate line 111 and the data line 112 and the gate line 111 and the data line 112 to cross the other to define a pixel region on the substrate. A transistor TFT, a pixel electrode 113 and a common electrode 117a alternately formed in a zigzag pattern in the pixel region, and are formed to cross the pixel region in parallel with the gate line 111; A common line 117 connected to the common electrode 117a and a storage electrode 113a overlapping the common line 117 with a predetermined portion within the pixel area and branching the pixel electrode 113 are included.

The thin film transistor TFT may include a gate electrode 111a protruding from the gate line 111 and a source electrode 112a and a drain electrode 112b spaced apart from each other by a predetermined interval to cover both sides of the upper portion of the gate electrode 111a. ), A channel is formed at a portion of the source electrode 112a and the drain electrode 112b spaced apart from each other, and is formed under the metal layer forming the data line 112, the source electrode 112a, the drain electrode 112b, and the like. It includes a formed semiconductor layer (not shown).

A gate insulating film (not shown) covering the gate line 111 and the gate electrode 111a is formed on the entire surface of the substrate under the semiconductor layer, and a passivation layer is disposed between the drain electrode 112b and the pixel electrode 113. (Not shown) is provided with a protective film hole in the protective film to contact the drain electrode 112b and the pixel electrode 113.

Here, the common line 117 and the common electrode 117a branched from the common line 117 are simultaneously deposited in the gate line 111 forming step, and the pixel electrode 113 is formed on the passivation layer including the passivation layer hole. Is formed.

An alignment film having a surface rubbed at a predetermined angle is further formed on the top surface of the TFT array substrate.

The color filter array substrate 100 corresponding to the TFT array substrate 200 has the following configuration.

The color filter array substrate 100 may include a black matrix layer 31 formed on a first glass substrate 30 that is a second substrate, corresponding to an area excluding a pixel area, and a first color that corresponds to the pixel area. And second and third color filter layers 32a, 32b, and 32c: 32, a hole 52a formed by patterning a central portion of the color filter layer corresponding to a predetermined portion of the gate line of the first substrate as the opposing substrate, and the color filter layer. (32a, 32b, 32c: 32) is provided with an overcoat layer 33 formed in the upper portion and the concave portion (A) and the convex portion (B), the concave portion (A) corresponds to the hole (52a), The convex portion B includes a column spacer 50 formed to correspond to the periphery of the hole (52b in FIG. 4A).

In this case, one column spacer 50 is disposed in one pixel region, and one column spacer 50 may be disposed in three pixel regions.

The column spacer 50 provided with the concave portion A and the convex portion B has a function of maintaining a cell gap and a plastic deformation is not severely reflected when an external pressure is applied, thereby preventing a depression. That is, when no pressure is applied to the first substrate or the second substrate, the convex portion B of the column spacer is in contact with the first substrate 200 which is the opposing substrate. Only the concave portion A comes into contact with the first substrate, which is the opposing substrate, and serves to prevent the column spacer from being pressed and plastically deformed while sharing the cell gap function.

Therefore, in the column spacer according to the present invention, since only the convex portions provided for each column spacer contact the first substrate as the counter substrate, the contact area is reduced compared to the column spacer having the flat corresponding surface, and the friction force between the column spacer and the counter substrate is reduced. This reduces the touch defects.

Meanwhile, in the exemplary embodiment of the present invention, the liquid crystal display of the IPS mode in which the overcoat layer is formed on the uppermost surface has been described. However, the present invention may be applied to the liquid crystal display of TN mode in which the common electrode layer is formed on the uppermost surface.

8A, 9A and 10A are plan views sequentially illustrating a method of forming a color filter array substrate with column spacers according to the present invention, and FIGS. 8B, 9B and 10B are III- of FIGS. 8A, 9A and 10A. Cross-sectional views along the III 'line are shown sequentially.

As shown in FIGS. 8A and 8B, a black matrix layer 31 having a mesh structure is formed on the glass substrate 30 serving as the second substrate, and then a stripe (parallel to the data line (vertical direction)) is formed. The first, second and third color filter layers 32a, 32b, and 32c are formed on the stripe, and the holes 52a are formed in the center of the color filter layer corresponding to the gate line of the first substrate.

The method of forming the black matrix layer 31, the color filter layers R, G, and B, and the holes 52a will be described in detail as follows.

First, a chromium (Cr) -based inorganic material is used as a material (not shown) of the black matrix layer by performing a cleaning on the substrate 30 and sputtering the entire surface of the cleaned substrate 30. Alternatively, carbon-based organic materials are deposited. Subsequently, a photoresist (not shown) is coated on the substrate 30 on which the material of the black matrix layer is deposited, and the photoresist is spaced apart from the substrate 30 by a predetermined distance to the black matrix layer. A mask (not shown) on which a pattern is formed is positioned. When the photosensitive material is irradiated with light such as ultraviolet (UV) light through the mask and developed with a developer, the photosensitive material is patterned to correspond to the pattern formed on the mask. The black matrix layer 32 is formed by selectively etching the material of the black matrix layer by using the patterned photosensitive material as a mask. Subsequently, the substrate 30 is cleaned and the remaining photosensitive material is removed, so that the black matrix layer 31 matching the pattern of the mask is formed at a predetermined interval.

In this case, the formed black matrix layer 31 corresponds to an area except the pixel area of the first substrate and has a net structure (shown in FIG. 11A). In some cases, a black matrix layer may be formed at the intersection of the gate line and the data line to cover the thin film transistor.

Next, when the composition for forming the first color filter layer is coated on the black matrix layer 31 formed as shown in FIG. 10A and exposed and developed using a photomask for forming the first color filter layer (shown in FIG. 11B), One color filter layer 32a is formed.

In this case, the photomask for forming the first color filter layer (FIG. 11B) includes not only a pattern for forming the color filter layer but also a pattern for forming the hole 52a, thereby forming the first color filter layer 32a. And holes 52a are formed at the same time.

Subsequently, the above process is repeated using the second and third color filter layer forming compositions instead of the first color filter layer forming composition to form the second color filter layer 32b and the third color filter layer 32c, respectively. A hole 52a is formed on each of the second color filter layer 32b and the third color filter layer 32c.

The color filter layer of any one of the first, second, and third color filter layers may be formed of any one of red, blue, and green color filter layers.

At this time, the diameter of the formed hole is formed to have about 1.5 to 2.5㎛.

9A and 9B, an overcoat on the substrate 30 including the black matrix layer 31, the first, second and third color filter layers 32a, 32b, 32c and holes 52a. Form layer 33.

The overcoat layer is formed to a thickness of about 1 to 3㎛, and after the formation of the overcoat layer 33, the black matrix 31 and the first, second and third color filter layers 32a, 32b, 32c. The planarization can be maintained between the overlapped portion and) and the remaining area.

On the other hand, the overcoat layer 33 deposited in the region where the hole 52a is formed has a step (C in FIG. 8B) and the overcoat layer 33 deposited in a region other than the region where the hole 52a is formed.

Next, as shown in FIGS. 10A and 10B, the photosensitive resin or the organic insulating layer is formed and then selectively patterned to form the column spacer 50 having the concave portion A and the convex portion B. FIG. do.

On the other hand, when the column spacer 50 is formed on the overcoat layer in which the step C between the hole and the periphery of the hole is reflected, the recess A corresponds to the hole 52a, and the periphery of the hole (Fig. 52b of 4a corresponds to the convex part B raised compared with the said recessed part.

At this time, the diameter of the hole is about 1.5 ~ 2.5㎛, the concave portion (A) formed in the center of the convex portion (B) of the column spacer 50 may have a flat surface as the diameter of the hole is larger.

Although not shown in the drawing, an alignment film (not shown) is formed on the entire surface of the overcoat layer 33 including the column spacer 50, and then the upper surface is rubbed.

In the exemplary embodiment of the present invention, one column spacer is disposed in one pixel region, but one column spacer may be formed in three pixel regions.

According to the liquid crystal display device having the column spacer with the convex portion and the concave portion of the present invention as described above, only the convex portion provided in the column spacer is in contact with the first substrate which is the opposing substrate, and thus the column spacer has a flat corresponding surface. Compared with this, the contact area is reduced, and the friction between the column spacer and the opposing substrate is reduced, thereby reducing the touch failure.

Claims (11)

A first substrate and a second substrate disposed to face each other; A gate line and a data line crossing each other on the first substrate to define a pixel area; A black matrix layer formed on the second substrate to correspond to a region other than the pixel region; A color filter layer formed on a second substrate corresponding to the pixel region and the gate line and including the black matrix layer; A plurality of holes formed in the color filter layer in a region corresponding to the gate line; And And a column spacer formed on the second substrate to have a concave portion on a surface of a portion corresponding to each of the holes. The method according to claim 1, And an overcoat layer on the color filter layer to reflect the step between the hole and the hole peripheral portion. The method according to claim 1, And a common electrode on the color filter layer to reflect the step between the hole and the hole peripheral part. The method according to claim 1, And one hole and one column spacer in one pixel area. The method according to claim 1, And one hole and one column spacer are disposed in three pixel areas. Forming a thin film transistor array on the first substrate, the thin film transistor array including a gate line, a data line, and a pixel electrode defining a pixel region; Forming a black matrix layer on the second substrate; Forming a color filter layer on a second substrate including the black matrix layer by providing a plurality of holes in a region corresponding to the gate line of the first substrate; And And forming a column spacer in a corresponding portion of each hole such that a surface corresponding to the hole has a concave portion. The method according to claim 6, The forming of the color filter layer and the hole may include forming a color filter layer forming composition on the black matrix layer; And And exposing and developing a photomask having a pattern for forming a color filter layer and a pattern for forming holes on the composition for forming a color filter layer. The method according to claim 6, And forming an overcoat layer on an entire surface of the color filter layer including the black matrix layer and the holes. The method according to claim 6, And forming a common electrode on an entire surface of the color filter layer including the black matrix layer and the holes. The method according to claim 6, And one column spacer is formed in one pixel area. The method according to claim 6, And one column spacer formed in three pixel areas.

Images