KR101623618B1 - Photosensitive resin composition, pattern formed by using the same and display panel comprising the same - Google Patents

Abstract

The present application provides a photosensitive resin composition comprising a colorant composition. The photosensitive resin composition according to the present application has an effect of minimizing a decrease in resistance value in a high-temperature process and having excellent heat resistance. It is possible to form a pattern using the above composition, to enable the development of a display panel for a cover glass, and in particular to improve the quality of a mobile display.

Description

TECHNICAL FIELD [0001] The present invention relates to a photosensitive resin composition, a pattern formed using the same, and a display panel comprising the same. BACKGROUND ART [0002]

The present invention relates to a photosensitive resin composition, a pattern formed using the same, and a display panel including the pattern.

Recently, the touch screen is in the mainstream of the mobile display market. The touch screen has a method of inputting a human hand or an object directly on the screen without using an input device such as a keyboard and a mouse. Therefore, since most of the operations on the screen, that is, the use of the Internet, the moving image, and the multi-touch are easily performed, it becomes one of the most convenient user interfaces.

Examples of the touch screen include a resistance film type, a capacitive type, an ultrasonic type, an optical type, and an infrared type. The resistance film method has a problem that durability is low, light transmittance is low, and multi-touch implementation is almost impossible.

The electrostatic capacity type is a method for solving the problem of the resistive film type. The electrostatic capacity method uses a constant current by sensing and driving a minute current generated in a human body, so that the touch sensitivity is excellent, and in particular, a multi-touch function is possible. In addition, since glass is used as a cover, it has good durability, light transmittance of 90% or more, and high sensitivity. However, there is a limitation in the input method and a manufacturing cost is high.

The present inventors have completed the present invention in the necessity of developing a composition suitable for pattern formation in a panel during development of a touch screen to solve the above problems.

Korean Patent Laid-Open No. 10-2008-0107846

The present invention provides a photosensitive resin composition having a thin thickness, a smooth taper and a sufficient light diffusing power at the time of forming a bezel pattern of a display panel and having excellent heat resistance.

One embodiment of the present application is a photosensitive resin composition comprising a colorant composition, wherein the colorant composition comprises a colorant; And a cadmium-based binder.

Further, one embodiment of the present application provides a pattern formed using the photosensitive resin composition.

Further, one embodiment of the present application provides a pattern formed using the photosensitive resin composition.

Further, one embodiment of the present application is a method of manufacturing a light-emitting device, comprising: applying a photosensitive resin composition to a substrate; And a step of exposing and developing the applied photosensitive resin composition.

In addition, one embodiment of the present application provides a display panel including the pattern.

The photosensitive resin composition according to one embodiment of the present application has an effect of minimizing a decrease in resistance value in a high-temperature process and having excellent heat resistance. It is possible to form a pattern using the composition of the present invention, to enable the development of a cover panel monolithic display panel, and in particular to improve the quality of a mobile display.

Hereinafter, the present application will be described in detail.

Unless defined otherwise, technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs.

In order to reduce the cost, which has been a problem in the capacitance type, the inventors of the present invention have found that it is possible to reduce the ITO (Indium Tin Oxide) film sensor layer to which a plurality of sheets are applied or to adhere the touch sensor directly to the uppermost tempered glass And developed a method for developing an integrated touch screen panel. At this time, the transmittance can be improved and the cost reduction effect can be obtained. Such an integrated touch panel is manufactured by coating a bezel film for shielding on a cover glass and forming a touch sensor layer thereon. At this time, the thickness of the bezel film was mostly 6 microns or more, 10 microns on average, by printing using a conventional bezel film coating ink. However, when the sensor layer is applied on the bezel film with such a thickness, shorting of wiring occurs due to a step between the bezel layer and the substrate, which makes it difficult to drive the sensor layer properly. Therefore, there is a need for a material for replacing the conventional ink for coating a bezel film, which has a thin thickness and a soft taper and has a sufficient light shielding property. In particular, since the resistance value is lowered in a high-temperature process for forming a touch sensor, it has been necessary to solve the problem of deteriorating the product characteristics of the bezel material of the touch screen panel requiring high resistance. Therefore, the inventors of the present application have developed a photosensitive resin composition that can be used as a bezel material of a touch screen panel having excellent heat resistance by minimizing a decrease in resistance value in a high-temperature process.

One embodiment of the present application relates to a colorant; And a colorant composition comprising a cationic binder.

The colorant composition contains a cadmium binder in the colorant composition, so that the photosensitive resin composition containing the colorant composition can minimize a decrease in resistance value in a high-temperature process, thereby excelling in heat resistance.

The cation system is a resin having a skeleton structure in which two cyclic structures are bonded to quaternary carbon atoms constituting the cyclic structure.

In one embodiment of the present application, the cation binder may include a repeating unit represented by the following formula (1).

[Chemical Formula 1]

The substituents of Formula 1 will be described in more detail as follows.

The Rx may be a structure formed by reacting a carboxylic acid anhydride or a diisocyanate of the following five-membered ring, but is not limited thereto.

The carboxylic acid anhydrides of the five-membered ring include, for example, succinic anhydride, methylsuccinic anhydride, 2,2-dimethyl succinic anhydride, isobutenyl succinic anhydride, 1,2-cyclohexanedicarboxylic anhydride, hexahydro- -Methyl phthalic anhydride, itaconic anhydride, tetrahydrophthalic anhydride, 5-norbornene-2,3-dicarboxylic anhydride, mell-5-norbornene-2,3-dicarboxylic anhydride, 4-cyclobutane tetracarboxylic dianhydride, maleic anhydride, citraconic anhydride, 2,3, -dimethyl maleic anhydride, 1-cyclopentene-1,2-dicarboxylic dianhydride, 3,4,5,6- But are not limited to, tetrahydrophthalic anhydride, phthalic anhydride, bisphthalic anhydride, 4-methylphthalic anhydride, 3,6-dichlorophthalic anhydride, 3-hydrophthalic anhydride, 1,2,4-benzenetricarboxylic anhydride, Diethylene glycol-1,2-bistrimelic acid anhydride. Be, but is not limited to these.

Alternatively, the diisocyanate may be, for example, trimethylene diisocyanate, tetramethylene diisocyanate, hexamethylene diisocyanate, pentamethylene diisocyanate, 1,2-propylene diisocyanate, 2,3-butylene diisocyanate, Butylene diisocyanate, dodecamethylene diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate, w, w'-diisocyanate-1,3-dimethylbenzene, w, w'-diisocyanate- Benzene, w, w'-diisocyanate-1,3-diethylbenzene, 1,4-tetramethylxylene diisocyanate, 1,3-tetramethylxylene diisocyanate, isophorone diisocyanate, 1,3- 1,3-cyclohexane diisocyanate, 1,4-cyclohexane diisocyanate, methyl-2,4-cyclohexane diisocyanate, methyl-2,6-cyclohexane diisocyanate, Isocyanate methyl bicyclo [2,2,2] heptane and 2,6-isocyanate methylbicyclo [2,2,1] heptane, but they may be selected from the group consisting of The present invention is not limited thereto.

The Ry may be selected from the group consisting of hydrogen, acryloyl and methacryloyl, but is not limited thereto.

Each of R ₁ to R ₃ is independently hydrogen; A halogen group; A substituted or unsubstituted alkyl group having 1 to 5 carbon atoms; A substituted or unsubstituted C1-C5 alkoxy group; And a substituted or unsubstituted C2 to C5 alkenyl group; ≪ / RTI >

Each of R ₄ to R ₇ independently represents a substituted or unsubstituted alkylene group having 1 to 5 carbon atoms; A substituted or unsubstituted alkoxysilyl group having 1 to 5 carbon atoms and a substituted or unsubstituted alkenylene group having 2 to 5 carbon atoms; ≪ / RTI >

The halogen group may be fluorine, chlorine, bromine or iodine.

The alkyl group may be linear or branched and may be substituted or unsubstituted. The number of carbon atoms is not particularly limited, but may be 1 to 5. Specific examples of the monovalent group include, but are not limited to, methyl, ethyl, propyl, isopropyl, butyl, t-butyl and the like.

The alkylene group may be linear or branched and may be substituted or unsubstituted. The number of carbon atoms is not particularly limited but may be 1 to 5. Specific examples of the alkylene group include, but are not limited to, methylene, ethylene, propylene, isopropylene, butylene, and t-butylene.

The alkoxy group may be straight-chain or branched, and may be substituted or unsubstituted. The number of carbon atoms is not particularly limited, but may be 1 to 5. Specific examples of the alkoxy group include, but are not limited to, methoxy, ethoxy, isopropyloxy, and the like.

The alkoxylene group may be straight-chain or branched and may be substituted or unsubstituted, and may have 1 to 5 carbon atoms. Specific examples of the alkoxylene group include, but are not limited to, methoxylene, ethoxylene, and isopropyloxylene.

The alkenyl group may be linear or branched, and may be substituted or unsubstituted. The number of carbon atoms is not particularly limited, but may be 1 to 5. Specific examples of the alkenyl group include, but are not limited to, ethenyl, propenyl, butenyl, pentenyl, and the like.

The alkenylene group may be linear or branched, and may be substituted or unsubstituted. The number of carbon atoms is not particularly limited, but may be 1 to 5. Specific examples of the alkenylene group include, but are not limited to, ethenylene, propenylene, butenylene, pentenylene, and the like.

The substituent may be a halogen group, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, or an alkenyl group having 2 to 5 carbon atoms.

Wherein l is an integer of 1 to 4, m is an integer of 1 to 8, and n represents a repeating unit represented by the formula (1).

The cadmium binder may be one prepared by using an epoxy acrylate resin.

In one embodiment of the present application, the cation binder may specifically be an acid value of 10 to 200 KOH mg / g, more specifically an acid value of 30 to 150 KOH mg / g.

In addition, the weight average molecular weight (measured by gel permeation chromatography, i.e., GPC) of the cationic binder resin may be specifically 1,000 to 30,000, more specifically 1,500 to 10,000. When the molecular weight is 1,000 to 30,000, the milling function is good and the physical properties such as heat resistance and chemical resistance can be satisfied.

In one embodiment of the present application, the content of the cationic binder may be 0.1 to 10 parts by weight based on 100 parts by weight of the colorant composition. The milling effect is good when it is 0.1 to 10 parts by weight. If the amount is less than 0.1 part by weight, the milling effect is insignificant. If the amount is more than 10 parts by weight, the milling effect is hardly increased compared with the increase amount of the binder.

In one embodiment of the present application, the content of the cationic binder may be 50 to 100 parts by weight based on 100 parts by weight of the binder in the colorant composition. The binder may further include an acrylic binder. The mixing ratio of the photocatalyst binder: acrylic binder in the colorant composition may be 50 to 100: 0 to 50.

The cationic binder and the acrylic binder may function as a milling agent in the colorant composition. Milling refers to covering one component particle surface with another component. The incorporation of a cadmium binder among the binders in the colorant composition further enhances the function of milling the carbon black and has the effect of minimizing a decrease in resistance value in a high temperature process.

The colorant composition may further include at least one of a solvent and a dispersant.

In one embodiment of the present application, the colorant composition may comprise a colorant comprising a black pigment. The colorant may be a black pigment alone or a mixture of a black pigment and a color pigment.

The black pigment may be carbon black having a surface resistance value of 10 ¹¹ ? Cm or more by subjecting the carbon black to high resistance treatment, and may be a mixture of the carbon black and the organic black pigment. The mixing of the organic black pigment not only raises the average optical density but also has an effect of uniformly adjusting the average optical density (OD) for each unit wavelength to have a high light shielding property.

Examples of the carbon black include CISTO 5HIISAF-HS, CISTO KH, CISTO 3HHAF-HS, CISTO NH, CISTO 3M, CISTO 300HAF-LS, CISTO 116HMMAF-HS, CISTO 116MAF , Cysto FMFEF-HS, Cysto SOFEF, Cysto VGPF, Cysto SVHSRF-HS, and Cysto SSRF; Tokushikisha BK_8132; Diagram Black II, Diagram Black N339, Diagram Black SH, Diagram Black H, Diagram LH, Diagram HA, Diagram SF, Diagram N550M, Diagram M, Diagram E, Diagram G, Diagram R, Diagram N760M, Diagram LR, # 2700, # 2600, # 2400, # 2350, # 2300, # 2200, # 1000, # 980, # 900, MCF88, # 52, # 50, # 47, # 45, # 45L, CF9, # 95, # 3030, # 3050, MA7, MA77, MA8, MA11, OIL7B, OIL9B, OIL11B, OIL30B, and OIL31B; PRINTEX-55, PRINTEX-55, PRINTEX-45, PRINTEX-35, PRINTEX-55, PRINTEX-85, PRINTEX-75, PRINTEX- SPECIAL BLACK-350, SPECIAL BLACK-250, SPECIAL BLACK-100, and LAMP BLACK-101; PRINTEX-25, PRINTEX-200, PRINTEX-40, PRINTEX-30, PRINTEX-3, PRINTEX-A; SPECIAL BLACK-550; RAVEN-1080 ULTRA, RAVEN-1060ULTRA, RAVEN-1060ULTRA, RAVEN-1040, RAVEN-1035, RAVEN-1020, RAVEN-1000, RAVEN-890H, RAVEN-890, RAVEN- 420, RAVEN-410, RAVEN-850, RAVEN-820, RAVEN-790ULTRA, RAVEN-780ULTRA, RAVEN-760ULTRA, RAVEN-520, RAVEN-500, RAVEN-460, RAVEN- RAVEN-1250, RAVEN-1200, RAVEN-1190ULTRA, and RAVEN-1170 may be used alone or in combination.

As the organic black pigment, it is effective that the surface resistance value is 10 ¹¹ ? Cm or more. For example, lactam black, aniline black or perylene black can be used.

It is effective that the carbon black is contained in an amount of 5 to 30 parts by weight based on 100 parts by weight of the total colorant composition.

When the content of the carbon black is less than 5 parts by weight, the optical density of the formed film is low, so that it may not have sufficient light shielding property. If the content is more than 30 parts by weight, there is a problem in development or residue.

Examples of coloring pigments usable in combination with the carbon black include carmine 6B (CI12490), phthalocyanine green (CI 74260), phthalocyanine blue (CI 74160), linool yellow (CI 21090), lino yellow yellow GRO (CI 21090) Yellow 4T-564D, Victoria Pure Blue (CI42595), CI PIGMENT RED97, 122, 149, 168, 177, 180, 192, 215, C.I. PIGMENT GREEN 7, 36, C.I. PIGMENT 15: 1, 15: 4, 15: 6, 22, 60, 64, C.I. PIGMENT 83, 139 C.I. PIGMENT VIOLET 23, etc. In addition, white pigments, fluorescent pigments, etc. may be used.

In one embodiment of the present application, the photosensitive resin composition further comprises, in addition to the colorant composition, an alkali-soluble binder resin; A crosslinkable compound; A photopolymerization initiator; Adhesion promoters; And a solvent may be further included.

In one embodiment of the present application, the photosensitive resin composition comprises a colorant composition; An alkali soluble binder; A crosslinkable compound; A photopolymerization initiator; And a solvent.

In one embodiment of the present invention, the content of the colorant composition may be 30 to 60 parts by weight based on 100 parts by weight of the photosensitive resin composition.

In one embodiment of the present application, the alkali soluble binder may include at least one of an acrylic binder and a cadmium binder. When used in combination, the mixing ratio of the acrylic binder: caustic binder may be specifically from 1 to 99:99 to 1, more specifically, 50:50.

The acrylic binder or the cadmium-based binder used as the binder in the photosensitive resin composition shows excellent effects on the substrate adhesion.

The cation binder which may be contained in the alkali-soluble binder may include the repeating unit represented by the formula (1).

Specifically, the cation binder may have an acid value of 10 to 200 KOH mg / g, and more specifically, an acid value of 30 to 150 KOH mg / g. When the acid value is more than 10 KOH mg / g, the solubility in the alkaline developer is good, shortening the development time and preventing the residue from remaining on the substrate. When the acid value is less than 200 KOH mg / g, .

In addition, the weight average molecular weight (gel permeation chromatography, that is, the value measured by GPC) of the cation binder may specifically be 1,000 to 30,000, more specifically 1,500 to 10,000. When the molecular weight is 1,000 or more, the binding function is good, and it can withstand the physical external force at the time of development, the pattern is not lost, and the physical properties such as basic heat resistance and chemical resistance can be satisfied. Further, when the molecular weight is 30,000 or less, the problem that the developability with respect to the alkali developer is small and the development can not be made is prevented, and the flowability is deteriorated to prevent the control of the coating thickness and the uniformity of the thickness.

The acrylic binder may be composed of a monomer which imparts mechanical strength to the film and a monomer which imparts alkali solubility, and at the same time, a taper angle of the pattern can be reduced.

 Examples of the monomer that can be used for adjusting the mechanical strength and taper angle of the film include benzyl (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, dimethylaminoethyl (Meth) acrylate, isobutyl (meth) acrylate, t-butyl (meth) acrylate, cyclohexyl Hydroxypropyl (meth) acrylate, ethyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, hydroxyethyl (meth) acrylate, 2- (Meth) acrylate, 2-methoxyethyl (meth) acrylate, 3-methoxybutyl (meth) acrylate, ethoxydiethylene glycol (meth) Late, meth (Meth) acrylate, p-nonylphenoxypolyethylene glycol (meth) acrylate, pentaerythritol tri (meth) acrylate, (Meth) acrylate, dicyclopentenyl (meth) acrylate, dicyclopentenyl (meth) acrylate, dicyclopentanyl (meth) acrylate, p-nonylphenoxypolypropylene glycol (Meth) acrylate, hexyl (meth) acrylate, heptyl (meth) acrylate, oxyl (meth) acrylate, (Meth) acrylate, nonyl (meth) acrylate, decyl (meth) acrylate, lauryl methacrylate, methyl a- hydroxymethylacrylate, ethyl a- Unsaturated carboxylic acid esters such as acrylate, propyl α- hydroxymethyl acrylate, butyl α- hydroxymethyl acrylate; Aromatic vinyls such as styrene,? -Methylstyrene, (o, m, p) -vinyltoluene, (o, m, p) -methoxystyrene and (o, m, p) -chlorostyrene; Unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether and allyl glycidyl ether; Unsaturated imides such as N-phenylmaleimide, N- (4-chlorophenyl) maleimide, N- (4-hydroxyphenyl) maleimide and N-cyclohexylmaleimide; Maleic anhydride and maleic anhydride such as maleic anhydride and methylmaleic anhydride, and it is effective to use two or more kinds thereof. In particular, it is preferable to use 1 to 30 molar equivalents of monomers having a substituted chain length of 6 to 18, but not limited thereto.

Examples of the monomer which imparts alkali solubility include (meth) acrylic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, monomethyl maleic acid, 5-norbornene-2-carboxylic acid, mono- It is effective to use at least one member selected from the group consisting of (meth) acrylic acid mono (meth) acrylate mono (meth) acrylate mono (meth) acrylate mono But are not limited to these.

In one embodiment of the present application, the acrylic binder may specifically have an acid value of 10 to 200 KOH mg / g, more specifically, an acid value of 30 to 150 KOH mg / g. When the acid value is more than 10 KOH mg / g, the solubility in the alkaline developer is good, shortening the development time and preventing the residue from remaining on the substrate. When the acid value is less than 200 KOH mg / g, So that reverse paper having a taper angle of the pattern exceeding 90 degrees is not generated.

The weight average molecular weight (measured by gel permeation chromatography, i.e., GPC) of the acrylic binder may be specifically from 1,000 to 50,000, more specifically from 2,000 to 30,000. When the molecular weight is 1,000 or more, the binding function is good, and it can withstand the physical external force at the time of development, the pattern is not lost, and the physical properties such as basic heat resistance and chemical resistance can be satisfied. In addition, when the molecular weight is 50,000 or less, the problem that the developability with respect to the alkali developer is small and the development is impossible is prevented, and the flowability is deteriorated, thereby preventing the control of the thickness of the coating and the uniformity of the thickness.

The above-mentioned photosensitive resin composition is effective when it contains 1 to 20 parts by weight, specifically 1 to 10 parts by weight, of an alkali-soluble binder based on 100 parts by weight of the total composition. If the content of the alkali soluble binder is less than 1 part by weight, the adhesion of the formed pattern may be deteriorated or the patterning using the alkali aqueous solution may be difficult. If the content is more than 20 parts by weight, the strength and sensitivity of the formed image may be deteriorated, May be lost.

In one embodiment of the present application, the crosslinkable compound may specifically be a polyfunctional monomer having an ethylenically unsaturated double bond, more specifically, a compound having a boiling point of not lower than 100 占 폚 having at least one unsaturated group capable of addition- But may be one or more of the polyfunctional monomers into which caprolactone is introduced.

Examples of the compound having at least one addition polymerizable unsaturated group in the molecule and having a boiling point of 100 ° C or higher include polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate and phenoxyethyl (meth) Monofunctional monomers; (Meth) acrylates such as polyethylene glycol (meth) acrylate, polypropylene glycol (meth) acrylate, trimethylol ethane triacrylate, trimethylolpropane triacrylate, neopentyl glycol (meth) acrylate, pentaerythritol tetraacrylate, Polyfunctional monomers such as triacrylate, dipentaerythritol pentaacrylate, and dipentaerythritol hexaacrylate; and the like, but are not limited thereto.

The caprolactone-introduced polyfunctional monomer was KAYARAD DPCA-20, 30, 60, 120 introduced into dipentaerythritol, KAYARAD TC-110S introduced into tetrahydrofuryl acrylate, and neopentyl glycol hydroxypivalate KAYARAD HX-220, KAYARAD HK-620, etc .; Epoxy ester 200PA, epoxy ester 3002M, epoxy ester 3002A, epoxy ester 3000M; And UA306H, UA306T, UA306I, UA510H, UF8001, and U-324A, U15HA, and U-4HA as the urethane acrylate series, but the present invention is not limited thereto.

It is effective that the crosslinkable compound is contained in an amount of 1 to 10 parts by weight based on 100 parts by weight of the entire photosensitive resin composition. When the amount is less than 10 parts by weight, the tackiness of the photosensitive layer prevents the excessively toughness of the film, so that the strength of the film is sufficient, There is an effect of preventing loss.

In one embodiment of the present application, the photopolymerization initiator may be one or more selected from the group consisting of an acetophenone-based compound, a nonimidazole-based compound, a triazine-based compound, and a oxime-based compound.

Examples of the acetophenone compound include 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1- (4-isopropylphenyl) -2- (2-hydroxy-2-propyl) ketone, 1-hydroxycyclohexyl phenyl ketone, benzoin methyl ether, benzoin ethyl ether, benzoin iso Butyl ether, benzoin butyl ether, 2,2-dimethoxy-2-phenylacetophenone, 2-methyl- (4-methylthio) phenyl- 2-dimethylamino-1- (4-morpholinophenyl) -butane, 2- (4-bromo- 1-one and 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one.

Examples of the imidazole-based compound include 2,2-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis Phenyl) -4,4 ', 5,5'-tetrakis (3,4,5-trimethoxyphenyl) -1,2'-biimidazole, 2,2'-bis (2,3-dichlorophenyl ) -4,4 ', 5,5'-tetraphenylbiimidazole and 2,2'-bis (o-chlorophenyl) -4,4', 5,5'-tetraphenyl- But are not limited to, at least one selected from the group consisting of imidazoles.

 Examples of the triazine-based compound include 3- {4- [2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio} propionic acid, 1,1,1,3 , 3,3-hexafluoroisopropyl-3- {4- [2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio} propionate, ethyl 2- { - [2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio} acetate, 2- Yl] phenylthio} acetate, cyclohexyl-2- {4- [2,4-bis (trichloromethyl) -s-triazine- - {4- [2,4-bis (trichloromethyl) -s-triazine-6-yl] phenylthio} acetate, 3- { -Triazin-6-yl] phenylthio} propionic acid, 3- {4- [2,4-bis (trichloromethyl) -Bis (trichloromethyl) -6- p-methoxystyryl-s-triazine, 2,4-bis (trichloro Methyl-6- (1-p-dimethylaminophenyl) -1,3, -butadienyl-s-triazine and 2-trichloromethyl- And triazine. However, the present invention is not limited thereto.

Examples of the oxime compounds include 1,2-octadione, -1- (4-phenylthio) phenyl, 2- (o-benzoyloxime) (Ciba Geigy, Shisei 124) (O-acetyloxime) (Cajai 242) and N-1919 (Adeca), which is a compound selected from the group consisting of But it is not limited thereto.

In one embodiment of the present invention, it is effective that the photopolymerization initiator is contained in an amount of 0.1 to 10 parts by weight based on 100 parts by weight of the entire photosensitive resin composition. If the amount is less than 0.1 part by weight, the effect of addition is insignificant. If the amount is more than 10 parts by weight, there is no difference in the effect compared with the increase amount.

The photopolymerization initiator is preferably used in an amount of 1 to 300 parts by weight based on 100 parts by weight of the sum of the multifunctional monomer having an ethylenically unsaturated double bond and the binder resin in the photosensitive resin composition. Specifically, one or more of acetophenone-based compounds, nonimidazole-based compounds, triazine-based compounds and oxime-based compounds may be used in combination. Specifically, the acetophenone-based compound is preferably used in an amount of 1 to 300 parts by weight, more specifically 1 to 200 parts by weight, and the non-imidazole-based compound is specifically used in an amount of 1 to 300 parts by weight, more specifically 1 to 100 parts by weight 1 to 300 parts by weight, more specifically 1 to 100 parts by weight, of the triazine-based compound is effective, and the oxime-based compound is specifically 1 to 300 parts by weight, more specifically 1 to 50 parts by weight It is effective to use the part.

In one embodiment of the present application, the photopolymerization initiator may include a photo-crosslinking sensitizer for accelerating generation of radicals as an auxiliary component or a curing accelerator for promoting curing, and may include both a crosslinking sensitizer and a curing accelerator have. The content of the photo-crosslinking sensitizer or the curing accelerator may be 0.01 to 10 parts by weight based on 100 parts by weight of the photopolymerization initiator. If the amount is less than 0.01 part by weight, the effect of addition is insignificant. If the amount is more than 10 parts by weight, the effect is not different from the increase amount.

Examples of the photo-crosslinking sensitizer include benzophenone, 4,4-bis (dimethylamino) benzophenone, 4,4-bis (diethylamino) benzophenone, 2,4,6-trimethylaminobenzophenone, methyl -benzoyl benzoate, 3,3-dimethyl-4-methoxybenzophenone, and 3,3,4,4-tetra (t-butylperoxycarbonyl) benzophenone; Fluorene-based compounds such as 9-fluorenone, 2-chloro-9-proprenone and 2-methyl-9-fluorenone; Thioxanthone systems such as thioxanthone, 2,4-diethylthioxanthone, 2-chlorothioxanthone, 1-chloro-4-propyloxytioxanthone, isopropylthioxanthone and diisopropylthioxanthone compound; Xanthone compounds such as xanthone and 2-methylxanthone; Anthraquinone compounds such as anthraquinone, 2-methyl anthraquinone, 2-ethyl anthraquinone, t-butyl anthraquinone, and 2,6-dichloro-9,10-anthraquinone; (9-acridinylpentane), 1,3-bis (9-acridinyl) propane, and the like Acridine-based compounds; Dicarbonyl compounds such as benzyl, 1,7,7-trimethyl-bicyclo [2,2,1] heptane-2,3-dione, and 9,10-phenanthrenequinone; Phosphine oxide-based compounds such as 2,4,6-trimethylbenzoyldiphenylphosphine oxide and bis (2,6-dimethoxybenzoyl) -2,4,4-trimethylpentylphosphine oxide; Benzoate-based compounds such as methyl-4- (dimethylamino) benzoate, ethyl-4- (dimethylamino) benzoate and 2-n-butoxyethyl-4- (dimethylamino) benzoate; (4-diethylaminobenzal) cyclopentanone, 2,6-bis (4-diethylaminobenzal) cyclohexanone, 2,6-bis Amino-synergists such as methyl-cyclopentanone; (Diethylamino) coumarin, 3- (2-benzothiazolyl) -7- (diethylamino) coumarin, 3-benzoyl- -Benzoyl-7-methoxy-coumarin, 10,10-carbonylbis [1,1,7,7-tetramethyl-2,3,6,7-tetrahydro-1H, 5H, 11H- Pyran o [6,7,8-ij] -quinolizine-11-one; Chalcone compounds such as 4-diethylaminokalone and 4-azidobenzalacetophenone; 2-benzoylmethylene, and 3-methyl-b-naphthothiazoline; however, the present invention is not limited thereto.

Examples of the curing accelerator include 2-mercaptobenzoimidazole, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2,5-dimercapto-1,3,4-thiadiazole, (2-mercapto-4,6-dimethylaminopyridine, pentaerythritol tetrakis (3-mercaptopropionate), pentaerythritol-tris Mercaptoacetate), pentaerythritol-tris (2-mercaptoacetate), trimethylolpropane-tris (2-mercaptoacetate), and trimethylolpropane-tris (3-mercaptopropionate) , But is not limited thereto.

In one embodiment of the present application, the photosensitive resin composition may further include an adhesion promoter.

In one embodiment of the present application, the adhesion promoter may be an acryloyl silane coupling agent or alkyl trimethoxysilane. The acryloylsilane coupling agent may be, for example, methacryloyloxypropyltrimethoxysilane, methacryloyloxypropyldimethoxysilane, methacryloyloxypropyltriethoxysilane, and methacryloyloxypropyl Dimethoxysilane, and the alkyltrimethoxysilane may be selected from the group consisting of, for example, octyltrimethoxysilane, dodecyltrimethoxysilane, and octadecyltrimethoxysilane. Or more.

In one embodiment of the present application, the content of the adhesion promoter may be 0.01 to 1 part by weight based on 100 parts by weight of the total composition. If the content is less than 0.01 part by weight, the effect of addition is insignificant. If the content is more than 1 part by weight, there is no difference in the effect compared with the increase.

In one embodiment of the present application, the solvent may be used in consideration of solubility, pigment dispersibility, coating properties, and the like. For example, a mixture of methyl-3-methoxypropionate (144 占 폚), ethylene glycol methyl ether (125 占 폚), ethylene glycol ethyl ether (135 占 폚), ethylene glycol diethyl ether Propyleneglycol methyl ether acetate (146 占 폚), n-butyl acetate (125 占 폚), isobutyl acetate (116 占 폚), amyl acetate (140 占 폚), ethyl pyruvate 149 DEG C), isoamyl acetate (143 DEG C), butyl propionate (146 DEG C), isoamyl propionate (156 DEG C), ethyl butyrate (120 DEG C), propyl butyrate Methyl methoxyacetate (150 占 폚), methyl lactate (145 占 폚), ethyl lactate (154 占 폚), methyl-2-hydroxyisobutyrate (156 DEG C), 2-methoxyethyl acetate (145 DEG C), ethylene glycol methyl ether acetate (145 DEG C), 2-ethoxy Cyclohexanone (155 占 폚), 2-hexanone (127 占 폚), 3-hexanone (123 占 폚), 5 Heptanone (145 占 폚), 2-methyl-3-heptanone (159 占 폚) ), 1-methoxy-2-propanol (118 占 폚), ethyl-2-hydroxypropionate (154 占 폚), and ethyl-3-methoxypropionate Ethoxy-propanol (161 占 폚), di (3-methoxybutyl acetate) at 170 占 폚, 2-ethoxyethyl ether at 185 占 폚, (169 ° C), 2-octanone (173 ° C), 3-octanone (168 ° C), ethylene glycol dodecyl ether (169 ° C), dipropylene glycol methyl ether Methylene-2-pentanone (166 占 폚), 2-methylcyclohexanone (163 占 폚), 3-nonanoanone (188 占 폚) 3-methylcyclohexanone (170 DEG C), 4-methylcyclohexanone (170 DEG C), 2,6-dimethylcyclohexane (175 DEG C), 2,2,6-trimethylcyclohexanone (179 DEG C), cycloheptanone (179 DEG C), hexyl acetate (169 DEG C), amyl butyrate (185 DEG C), isopropyl lactate (167 DEG C) , Butyl lactate (186 ° C), ethyl-3-hydroxybutyrate (170 ° C), ethyl-3-ethoxypropionate Propylene glycol diethyl ether (162 DEG C), propylene glycol diisopropyl ether (170 DEG C), propylene glycol methyl ether propionate (160 DEG C), and diethylene glycol dimethyl ether ), Diethylene glycol dimethyl ether acetate (165 DEG C), dipropylene glycol methyl ether (188 DEG C), dipropylene glycol dimethyl ether (171 DEG C), ethylene glycol butyl ether (171 DEG C), diethylene glycol methyl ethyl ether ° C.), diethylene glycol methyl isopropyl ether (179 ° C.), diethylene glycol diethyl ether (189 ° C.) Butyl acrylate (194 占 폚), 4-ethylcyclohexanone (193 占 폚), and 2-butoxyethyl acetate Diethylene glycol monoethyl ether (202 占 폚), butyrolactone (204 占 폚), hexyl butyrate (205 占 폚), diethylene glycol methyl ether acetate (209 占 폚), diethylene glycol butyl methyl ether 212 ° C), tripropyl glycol dimethyl ether (215 ° C), triethylene glycol dimethyl ether (216 ° C), diethylene glycol ethyl ether acetate (217 ° C), diethylene glycol butyl ether acetate (245 ° C) Diethyleneglycol monobutyl ether (231 占 폚), tripropylglycol methyl ether (242 占 폚), diethylene glycol (245 占 폚), 1,2-propanediol (222 占 폚) (245 占 폚), catechol (245 占 폚), triethylene glycol methyl ether (2 (2-butoxyethoxy) ethyl acetate 49 DEG C), diethylene glycol dibutyl ether (256 DEG C), triethylene glycol ethyl ether (256 DEG C), diethylene glycol monohexyl ether (260 DEG C), triethylene glycol butyl methyl ether (261 DEG C) (271 ° C), tripropyl glycol (273 ° C) and tetraethylene glycol dimethyl ether (276 ° C), and more preferably two or more.

In one embodiment of the present application, it is effective that the content of the solvent is 40 to 90 parts by weight based on 100 parts by weight of the total composition.

In one embodiment of the present application, the photosensitive resin composition may further include at least one primary additive selected from the group consisting of a surfactant, a dispersant, an antioxidant, an ultraviolet absorber, a thermal polymerization inhibitor, and a leveling agent. These can be used as long as they are known in the art.

Examples of the surfactant include, but are not limited to, MCF 350SF, F-475, F-488 and F-552 (hereinafter referred to as DIC).

The dispersing agent may be used either in a manner of internally adding the pigment to the pigment in the form of surface-treating the pigment in advance or in a method of externally adding the pigment.

As the dispersing agent, a polymer type, nonionic, anionic, or cationic dispersing agent may be used. Non-limiting examples of such dispersants include polyalkylene glycols and esters thereof, polyoxyalkylene polyhydric alcohols, ester alkylene oxide adducts, alcohol alkylene oxide adducts, sulfonic acid esters, sulfonates, carboxylic acid esters, Alkyl amide alkylene oxide adducts, alkyl amines, and the like, and may be used alone or in admixture of two or more selected from them, but is not limited thereto.

Non-limiting examples of the antioxidant may include at least one selected from 2,2-thiobis (4-methyl-6-t-butylphenol), 2,6-g, t- The present invention is not limited thereto.

Non-limiting examples of the ultraviolet absorber may include at least one selected from 2- (3-t-butyl-5-methyl-2-hydroxyphenyl) -5-chloro-benzotriazole, However, the present invention is not limited to these.

Nonlimiting examples of the thermal polymerization inhibitor include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t- butyl catechol, benzoquinone, 4,4- Methyl-6-t-butylphenol), 2,2-methylenebis (4-methyl-6-t-butylphenol), 2-mercaptoimidazole, and the like. But are not limited thereto.

The photosensitive resin composition may further comprise at least one secondary additive selected from the group consisting of a carbon black dispersion, a functional resin binder, a monomer, a radiation-sensitive compound, and other additives.

In one embodiment of the present application, the content of the additive may be in the range of more than 0 to 5 parts by weight based on 100 parts by weight of the total composition, but is not limited thereto.

One embodiment of the present application provides a pattern formed using the photosensitive resin composition. Specifically, the pattern may be a bezel pattern, more specifically, a bezel pattern formed on a display panel, and more specifically, a bezel pattern formed on a touch panel.

It is effective that the pattern has a layer thickness of 0.3 to 5 mu m, more specifically 0.8 to 3 mu m. 0.3 占 퐉 to 5 占 퐉 has an effect of preventing short-circuiting of the metal wiring.

Since the pattern formed using the photosensitive resin composition exhibits an optical density (OD) of 3 or more, more specifically 3.5 or more, and more specifically 4 or more at a visible light wavelength (380 to 780 nm) There is an effect of having straightness.

One embodiment of the present application includes the steps of applying the photosensitive resin composition to a substrate; And a step of exposing and developing the applied photosensitive resin composition.

One embodiment of the present application includes the steps of applying the photosensitive resin composition to a substrate; And a step of exposing and developing the applied photosensitive resin composition.

In the coating step, the coating may be carried out by a spraying method, a roll coating method, a spin coating method, a bar coating method, a spin coating method or a slit coating method Method can be used.

After the applying step, the film can be formed by removing the solvent by pre-bake. The prebaking conditions can be, for example, from 70 to 150 DEG C for 0.5 to 30 minutes.

After the pre-baking, the exposed photosensitive layer is exposed to light through a method such as a photomask having a desired pattern, and then the exposed photosensitive layer is developed with an appropriate developer to form a pattern.

As the developing method, a dipping method, a shower method, a spraying method, a paddle method, or the like can be applied without limitation. The development time may be, for example, about 30 to 180 seconds.

Examples of the developer include aqueous alkaline solutions such as sodium hydroxide, potassium hydroxide, sodium silicate, sodium metasilicate and ammonia; Primary amines such as ethylamine and N-propylamine; Secondary amines such as diethylamine and di-n-propylamine; Tertiary amines such as trimethylamine, methyldiethylamine and dimethylethylamine; Tertiary alcohol amines such as dimethylethanolamine, methyldiethanolamine and triethanolamine; Diazabicyclo [4.3.0] hept-2-ene, 1,1-diazabicyclo [5.4.0] Cyclic tertiary amines such as cyclohexane-5-nonene; Aromatic tertiary amines such as pyridine, coridine, lutidine and quinoline; Or an aqueous solution of a quaternary ammonium salt such as tetramethylammonium hydroxide or tetraethylammonium hydroxide.

After development, washing with water is carried out for about 30 to 90 seconds, followed by drying with air or nitrogen to form a pattern. This pattern can be obtained through a post-bake by using a heating device such as a hot plate or an oven to obtain a completed bezel layer.

One embodiment of the present application provides a display panel including the pattern. The display panel may be a display panel including the bezel pattern, more specifically, a touch panel including the bezel pattern.

Hereinafter, the present application will be described in more detail through the following examples, comparative examples and test examples. However, the following examples, comparative examples and test examples are provided for illustrative purposes only in order to facilitate understanding of the present application, and the scope and scope of the present application are not limited thereto.

≪ Example 1 >

600 parts by weight of a carbon dispersion (25% by weight Tacoma K. 1064) as a colorant composition, 8 parts by weight of a cadmium-based binder resin (B1) as a milling binder in the above carbon dispersion and 1 part by weight of a benzylmethacrylate / Methacrylic acid / methacrylic acid (molar ratio 38/7/7/21/27, Mw = 9000, 105 KOH mg / g) having a maleimide / styrene / glycidyl methacrylate added thereto, and a solid content of 30% (Mw = 19000, 124 KOH mg / g) as the acrylic binder 2, benzyl methacrylate / N-phenylmaleimide / styrene / laurylmethacrylate / methacrylic acid (molar ratio 40/7/8/14/31, , Solid content 30%}, 35 parts by weight of dipentaerythritol hexaacrylate as a polyfunctional monomer, 20 parts by weight of N-1919 (Adeca) as a photopolymerization initiator, 3 parts by weight of 3-methacryloxypropyltrimethoxysilane 5 parts by weight of ethoxysilane and 1 part by weight of F-475 (dic Co.) as a leveling agent, Propylene glycol monomethyl ether acetate were mixed with 530 parts by weight of 3-methoxybutyl acetate to 100 parts by weight.

Then, the mixture was stirred for 5 hours to prepare a photosensitive resin composition.

The photosensitive resin composition solution thus prepared was coated on glass by spin coating and then heat treated at about 100 캜 for 2 minutes to form a coating film having a thickness of about 1.44 탆. Then, after cooling at room temperature, exposure was performed at a energy of 100 mJ / cm 2 under a high-pressure mercury lamp using a photomask. The exposed substrate was developed in a 0.04% aqueous solution of KOH at a temperature of 25 ° C by a spray method, washed with pure water, and dried, post-baked in a convection oven at 230 ° C for 20 minutes.

The obtained film was obtained as a clean coating film having no surface defects according to each process, and a film thickness of 1.31 탆 and an OD of 5.0 was obtained, and a bezel pattern film having good linearity could be obtained.

≪ Example 2 >

600 parts by weight of a carbon dispersion (TOKUSHIKISA BK_8132 content 20%), 3 parts by weight of a cadmium-based binder resin (X-15) as a milling binder in the carbon dispersion, 3 parts by weight of benzyl methacrylate / Methacrylic acid / methacrylic acid (molar ratio 38/7/7/21/27, Mw = 9000, 105 KOH mg / g) having a maleimide / styrene / glycidyl methacrylate added thereto, and a solid content of 30% (Mw = 19000, 124 KOH mg / g) as the acrylic binder 2, benzyl methacrylate / N-phenylmaleimide / styrene / laurylmethacrylate / methacrylic acid (molar ratio 40/7/8/14/31, , Solid content 30%}, 35 parts by weight of dipentaerythritol hexaacrylate as a polyfunctional monomer, 20 parts by weight of N-1919 (Adeca) as a photopolymerization initiator, 3 parts by weight of 3-methacryloxypropyltrimethoxysilane 5 parts by weight of ethoxy silane and 1 part by weight of F-475 (dic) as leveling agent, propylene glycol moiety Ether acetate were mixed with 530 parts by weight of 3-methoxybutyl acetate to 100 parts by weight.

Then, the mixture was stirred for 5 hours to prepare a photosensitive resin composition.

The photosensitive resin composition solution thus prepared was coated on glass by spin coating and then heat treated at about 100 캜 for 2 minutes to form a coating film having a thickness of about 1.44 탆. Then, after cooling at room temperature, exposure was performed at a energy of 100 mJ / cm 2 under a high-pressure mercury lamp using a photomask. The exposed substrate was developed in a 0.04% aqueous solution of KOH at a temperature of 25 ° C by a spray method, washed with pure water, and dried, post-baked in a convection oven at 230 ° C for 20 minutes.

The thus obtained film was obtained as a clean coating film having no surface defects according to each step, and a bezel pattern film having a film thickness of 1.31 탆 and an OD of 5.0 was obtained with good linearity.

≪ Example 3 >

600 parts by weight of a carbon dispersion (TOKUSHIKISA BK_4622, 20% of carbon content), 1.5 parts by weight of a carcass binder resin (X-15) as a milling binder and 1.5 parts by weight of an acrylic binder resin (T-4) Methacrylic acid / methacrylic acid {(molar ratio 38/7/7/21/27, Mw = 1/2) to which benzyl methacrylate / N-phenylmaleimide / styrene / glycidyl methacrylate was added as alkali soluble acrylic binder 1, (Molar ratio of 40/7 to 9/100, KOH mg / g) and 70% by weight of a solid content of 30%}, benzyl methacrylate / N-phenylmaleimide / styrene / laurylmethacrylate / methacrylic acid { , 35 parts by weight of dipentaerythritol hexaacrylate as a polyfunctional monomer, N-1919 (trade name: Adeka Co., Ltd.) as a photopolymerization initiator, ), 20 parts by weight of 3-methacryloxypropyltrimethoxysilane as an adhesion promoter, 5 parts by weight And 1 part by weight of F-475 (dic) as a leveling agent, 530 parts by weight of propylene glycol monomethyl ether acetate as a solvent and 100 parts by weight of 3-methoxybutyl acetate were mixed.

Then, the mixture was stirred for 5 hours to prepare a photosensitive resin composition.

The photosensitive resin composition solution prepared above was coated on glass by spin coating and then heat treated at about 100 캜 for 2 minutes to form a coating film having a thickness of about 1.44 탆. Then, after cooling at room temperature, exposure was performed at a energy of 100 mJ / cm 2 under a high-pressure mercury lamp using a photomask. The exposed substrate was developed in a 0.04% aqueous solution of KOH at a temperature of 25 ° C by a spray method, washed with pure water, and dried, post-baked in a convection oven at 230 ° C for 20 minutes.

The obtained film was obtained as a clean coating film having no surface defects according to each process, and a film thickness of 1.31 탆 and an OD of 5.0 was obtained, and a bezel pattern film having good linearity could be obtained.

≪ Comparative Example 1 &

600 parts by weight of a carbon dispersion (TOKUSHIKISA BK_8115, carbon content 20%), 3 parts by weight of an acrylic binder resin as a milling binder in the above carbon dispersion, 1 part by weight of benzyl methacrylate / N-phenylmaleimide / styrene / , 200 parts by weight of a methacrylic acid / methacrylic acid (mole ratio 38/7/7/21/27, Mw = 9000, 105 KOH mg / g) having a glycidyl methacrylate added thereto, a solid content 30% 35 parts by weight of dipentaerythritol hexaacrylate, 20 parts by weight of N-1919 (Adeka Corp.) as a photopolymerization initiator, 5 parts by weight of 3-methacryloxypropyltrimethoxysilane as an adhesion promoter, and F-475 1 part by weight), 530 parts by weight of propylene glycol monomethyl ether acetate as a solvent and 100 parts by weight of 3-methoxybutyl acetate were mixed.

Then, the mixture was stirred for 5 hours to prepare a photosensitive resin composition.

The photosensitive resin composition solution thus prepared was processed in the same manner as in Example 1. At this time, a clear coating film having a film thickness of 1.3 탆 was obtained which had no surface defects according to each process. However, a reverse taper (T-shaped) taper which causes a short development margin and short- And it was impossible to use it as a bezel pattern film.

Therefore, when the photosensitive resin composition of the present application is directly applied to a cover glass of a touch panel to form a bezel pattern, an excellent touch panel can be manufactured. Further, when the bezel pattern is formed by using the photosensitive resin composition of the present invention in which the composition and the composition ratio are optimized, a change in resistance value in a high-temperature process can be minimized and a more excellent touch panel can be manufactured.

< Experimental Example > Heat resistance test

The substrate having the bezel patterns obtained in Examples 1 to 3 and Comparative Example 1 was further heat-treated at 250 ° C for 1 hour and at 300 ° C for 1 hour, and the change in resistance value was measured.

Milling binder Sheet resistance (Ω / sq) Kinds Content (parts by weight) Early 250 ℃ 1 hour 300 ° C 1 hour Example 1 B1 8.0 > 10 ¹⁴ > 10 ¹⁴ 4.0 × 10 ¹¹ Example 2 X-15
T-4 3.0
0 > 10 ¹⁴ > 10 ¹⁴ 5.4 x 10 ⁸ Example 3 X-15
T-4 1.5
1.5 > 10 ¹⁴ > 10 ¹⁴ 2.0 × 10 ⁷ Comparative Example 1 X-15
T-4 0
3.0 > 10 ¹⁴ > 10 ¹⁴ 1.5 × 10 ⁶

When the pattern is formed using the photosensitive resin composition of the present application, the sheet resistance may exceed 1.0 × 10 ⁶ (Ω / sq) when subjected to a heat treatment at a high temperature of 300 ° C. or higher, specifically 1.0 × 10 ⁷ ) Or more. The higher the sheet resistance after the heat treatment at a high temperature, the less the resistance value at the high temperature process is, so the heat resistance is excellent.

From the results shown in Table 1, it can be seen that a composition can be produced which minimizes a decrease in resistance value in a high-temperature process using the photosensitive resin composition according to the present application. This effect depends on the type and composition of the milling binder used in the colorant composition.

Particularly, in the present application, a cadmium binder such as B1 and X-15 binder of Example 1 and Example 2 can minimize a decrease in resistance value, and the acrylic binder resin such as T-4 of Comparative Example 1 has a lowered resistance value Of the population.

It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.

Having described specific portions of the present application in detail, those skilled in the art will appreciate that these specific embodiments are merely preferred embodiments and that the scope of the present application is not limited thereto. Accordingly, the actual scope of the present application will be defined by the appended claims and their equivalents.

Claims (29)

coloring agent; And cadmium binder
&Lt; / RTI &gt;
When the pattern is formed at a high temperature of 300 ° C or higher, the sheet resistance is 1.0 × 10 ⁷ (Ω / sq) Or more of the photosensitive resin composition. The method according to claim 1,
Wherein the cadmium binder comprises a repeating unit represented by the following formula (1): &lt; EMI ID =
[Chemical Formula 1]

Rx is a structure formed by reacting a carboxylic acid anhydride or a diisocyanate of a 5-membered ring,
Ry is selected from the group consisting of hydrogen, acryloyl and methacryloyl,
R ₁ to R ₃ are each independently hydrogen; A halogen group; A substituted or unsubstituted alkyl group having 1 to 5 carbon atoms; A substituted or unsubstituted C1-C5 alkoxy group; And a substituted or unsubstituted C2 to C5 alkenyl group; , &Lt; / RTI &gt;
R ₄ to R ₇ each independently represent a substituted or unsubstituted alkylene group having 1 to 5 carbon atoms; A substituted or unsubstituted alkoxysilyl group having 1 to 5 carbon atoms; And a substituted or unsubstituted C2-C5 alkenylene group; , &Lt; / RTI &gt;
l is an integer of 1 to 4,
m is an integer of 1 to 8,
n represents a repeating unit represented by the formula (1). The method according to claim 1,
Wherein the cationic binder has an acid value of 10 to 200 KOH mg / g and a weight average molecular weight of 1,000 to 30,000. The method according to claim 1,
Wherein the content of the cationic binder is 0.1 to 10 parts by weight based on 100 parts by weight of the colorant composition. The method according to claim 1,
Wherein the content of the cadmium-based binder is 50 to 100 parts by weight based on 100 parts by weight of the binder in the colorant composition. The method according to claim 1,
The colorant may be carbon black; Or a black pigment which is a mixture of the carbon black and the organic black pigment. The bezel pattern formed by using the photosensitive resin composition. The method of claim 6,
Wherein the carbon black has a surface resistance value of 10 &lt; ¹¹ &gt; OMEGA cm or more. The method of claim 6,
Wherein the content of the carbon black is 5 to 30 parts by weight based on 100 parts by weight of the colorant composition. The method according to claim 1,
Wherein the content of the colorant composition is 30 to 60 parts by weight based on 100 parts by weight of the photosensitive resin composition. The method according to claim 1,
The photosensitive resin composition comprises an alkali-soluble binder; A crosslinkable compound; A photopolymerization initiator; And a solvent. The bezel pattern is formed by using the photosensitive resin composition. The method of claim 10,
Wherein the content of the alkali-soluble binder is 1 to 20 parts by weight based on 100 parts by weight of the photosensitive resin composition. The method of claim 10,
Wherein the content of the crosslinkable compound is 1 to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. The method of claim 10,
Wherein the content of the photopolymerization initiator is 0.1 to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. The method of claim 10,
Wherein the content of the solvent is 40 to 90 parts by weight based on 100 parts by weight of the photosensitive resin composition. The method of claim 10,
Wherein the alkali-soluble binder comprises at least one of an acryl-based binder and a cadmium-based binder. The method of claim 10,
Wherein the photosensitive resin composition further comprises a photo-crosslinking sensitizer or a curing accelerator. 18. The method of claim 16,
Wherein the content of the photo-crosslinking sensitizer or the curing accelerator is 0.01 to 10 parts by weight based on 100 parts by weight of the photopolymerization initiator. The method of claim 10,
Wherein the photosensitive resin composition further comprises an adhesion promoter. 19. The method of claim 18,
Wherein the content of the adhesion promoter is 0.1 to 1 part by weight based on 100 parts by weight of the photosensitive resin composition. The method according to claim 1,
The photosensitive resin composition may contain one or more kinds selected from the group consisting of a surfactant, a dispersant, an antioxidant, an ultraviolet absorber, a thermal polymerization inhibitor, a leveling agent, a carbon black dispersion, a functional resin binder, a monomer, and a radiation- The bezel pattern formed by using the photosensitive resin composition further comprising an additive. delete delete The method according to claim 1,
The pattern may include a step of applying a photosensitive resin composition to a substrate; And
And exposing and developing the applied photosensitive resin composition to form a bezel pattern. delete delete The method according to claim 1,
Wherein the pattern has a layer thickness of 0.3 to 5 占 퐉 and an optical density (OD) of 3 or more. delete A display panel comprising the bezel pattern of claim 1. 29. The method of claim 28,
Wherein the display panel is a touch panel.