KR101888869B1 - Spatial light modulator - Google Patents

Abstract

The present invention relates to a spatial light modulator comprising a substrate, a first pattern formed in a predetermined shape on the first surface of the substrate, a second pattern formed in a predetermined shape on the first surface of the substrate at a position spaced apart from the first pattern, A light modulation device connected to the first and second patterns for modulating light incident by a bias applied through the first and second patterns, and a second pattern formed on the opposite side of the first surface And a bias line portion formed on a second surface of the substrate and electrically connected to the first and second patterns so that the bias supplied from the bias supply portion is transmitted to the first and second patterns.
Since the bias line portion is formed on the second surface opposite to the first surface of the substrate on which the optical modulating device is mounted, the interference of the bias optical modulation device passing through the bias line portion is minimized, Thereby preventing malfunction of the battery.

Description

≪ RTI ID = 0.0 > Spatial light modulator &

The present invention relates to a spatial light modulator, and more particularly to a spatial light modulator provided with a bias line on a second surface opposite a first surface of a substrate on which first and second patterns are formed.

Terahertz science and technology contributes greatly in fields such as diagnosis and treatment of cancer which accounts for the highest percentage of human deaths, research on life sciences such as DNA structure analysis, national security such as detection of explosives and psychotropic drugs, and construction of next generation telecommunication system As a base technology to do this, researches on the terahertz technology field have been actively conducted recently.

The terahertz band is the RF, microwave, millimeter wave, and frequency band of light that is already actively being used and is relatively untapped frequency band, so it is called the terahertz gap. In other words, signals are generated, modulated, and detected using mainly photonics technology in the lower frequency bands than in the terahertz band, and in the higher frequency bands. However, in the terahertz band, both of the above technologies are easily applied I can not do that, the development of the technology is slow.

The terahertz wave is very actively used as a spectral region in which electromagnetic waves are located between the infrared and microwave bands and the technologies are far behind in the relatively unexplored regions from generation to generation, Due to limited application technology, components and system technology relative to the adjacent frequency region, the terahertz region forms a gap between the RF and the light wave and is referred to as the Terahertz gap.

This terahertz wave has the intermediate nature such as having the linearity of the light wave and the permeability of the radio wave, which makes it difficult to apply the signal generation, modulation, and detection techniques used in the fields of Photonics and Electronics. In other words, terahertz wave is less affected by electric field and magnetic field compared to radio wave below microwave frequency, so it is difficult to control the signal and the technology of photomatical field is the most advanced technology in the terahertz field. However, Has not yet reached a satisfactory level. In particular, there are many cases in which cryogenic temperature, high voltage equal to or higher than kV is required, large volume, and difficult to integrate, resulting in a fundamental problem that a compact system can not be developed.

The next generation terahertz system is a small and lightweight system that can operate at low temperature and low power at room temperature. Since it is necessary to develop core material, integratable element and component technology to realize this, it is required to be preceded for practical use of a system using terahertz wave Component technology development is required to be a component suitable for a compact and lightweight system, capable of electrical control, and a component that can be used at room temperature.

For the development of next-generation terahertz systems, the development of component technology as described above is very active, but the technology for modulation and control of terahertz waves is still in its infancy. This is because the terahertz waves are hardly affected by the electric field and the magnetic field in comparison with the electromagnetic waves below the microwave frequency, and it is difficult to control the signals in the terahertz band.

The direct modulation technique in the terahertz band studied up to now has a modulation method using a microelectromechanical system (MEMS), a method of modulating at a level of about KHz using a chopper, but it can be electrically controlled in a terahertz band, A modulation technique capable of processing the modulation frequency up to a certain level has not been disclosed.

In the next generation Outdoor or Indoor wireless communication system, it is expected that the use of a frequency in the terahertz or sub-millimeter wave band is inevitable as a transmission speed of 40 Gbps or more is required, and accordingly, the terahertz wave is modulated to the level of several tens of GHz Technology development is indispensable.

The next generation terahertz system is a compact and lightweight system that can operate at low temperature and low power at room temperature. Terahertz generation, modulation and detection devices must be implemented using semiconductor devices.

However, in a conventional spatial light modulator including a terahertz system, since a bias line is formed on a first surface of a substrate on which devices are mounted, a bias transmitted through the bias lines interferes with the device, .

Open Patent Publication No. 10-2016-0057950: meta-material-based terahertz wave modulator

SUMMARY OF THE INVENTION It is an object of the present invention to provide a spatial light modulator formed on a second surface opposite to a first surface of a substrate on which a bias line is mounted.

According to an aspect of the present invention, there is provided a spatial light modulator including a substrate, a first pattern formed on the first surface of the substrate in a predetermined shape, and a second pattern formed on the first surface of the substrate, A light modulation device connected to the first and second patterns and modulating light incident by a bias applied through the first and second patterns, a second pattern formed in a predetermined shape on the first and second patterns, And a bias line portion electrically connected to the first and second patterns for transmitting the bias supplied from the bias supply portion to the first and second patterns, the bias line portion being formed on a second surface of the substrate opposite to the surface .

Wherein the bias line portion is disposed on a second surface of the substrate and includes a first line member electrically connected to the first pattern via a first via and a second line member disposed on a second surface of the substrate, 2 pattern of the first line member.

The first via is installed to penetrate the substrate so that both ends can be connected to the first line member and the first pattern, respectively.

The second vias are installed to penetrate the substrate so that both ends can be connected to the second line member and the second pattern, respectively.

Meanwhile, a spatial light modulator according to the present invention includes a source contact member connected to the bias supply unit and provided on a first surface of the substrate, the source contact member being electrically connected to the first line member by a first connection member, And a drain contact member electrically connected to the second line member by a second connection member.

The first connection member is installed to penetrate the substrate such that both ends thereof are respectively coupled to the source contact member and the first line member.

The second connection member is installed to penetrate the substrate such that both ends thereof are respectively coupled to the drain contact member and the second line member.

The first and second line members may be formed by extending a predetermined length in a mutually parallel direction.

Wherein the optical modulation element is a terahertz wave modulator for modulating an incident terahertz wave and the first line member comprises a first line member intersecting a direction of an electric field of the terahertz wave incident on a first surface of the substrate, Direction.

Wherein the optical modulation element is a terahertz wave modulator for modulating an incident terahertz wave and the second line member is formed to extend in a direction intersecting the direction of the electric field of the terahertz wave incident on the first surface of the substrate do.

Wherein the first pattern comprises a first main line extending a predetermined length on a first surface of the substrate and a second main line extending from the first main line to the second pattern to be connected to the optical modulation device, And a first connection line extending in a direction crossing the longitudinal direction.

The first line member is preferably formed on the second surface of the substrate so as to extend along the longitudinal direction of the first main line so that the bias can be prevented from interfering with the light incident on the optical modulator.

The plurality of first line members may be spaced apart from each other along the longitudinal direction of the first connection line.

The second pattern includes a second main line extending from the first surface of the substrate at a position spaced apart from the first main line by a predetermined length along the longitudinal direction of the first main line, And a second connection line extending in a direction crossing the longitudinal direction of the second main line so as to be adjacent to the first pattern from the second main line.

The second line member may extend along a longitudinal direction of the second main line on a second surface of the substrate so that the bias may be prevented from interfering with light incident on the optical modulation device.

The plurality of second line members are spaced apart from each other along the longitudinal direction of the second connection line.

Since the bias line portion is formed on the second surface opposite to the first surface of the substrate on which the optical modulation device is mounted, the interference of the bias modulation portion with the bias light passing through the bias line portion is minimized, Thereby preventing malfunction of the battery.

1 is a perspective view of a spatial light modulator according to the present invention,
FIGS. 2 and 3 are cross-sectional views of the spatial light modulator of FIG. 1,
FIG. 4 is a partial cutaway perspective view of the spatial light modulator of FIG. 1,
5 and 6 are graphs showing the performance of the optical modulator of the spatial light modulator of FIG. 1,
7 is a partial cutaway perspective view of a spatial light modulator according to another embodiment of the present invention,
8 is a partial cutaway perspective view of a spatial light modulator according to another embodiment of the present invention,
FIGS. 9 and 10 are graphs illustrating performance of an optical modulator of a spatial light modulator according to embodiments of the present invention.

Hereinafter, a spatial light modulator according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings. The present invention is capable of various modifications and various forms, and specific embodiments are illustrated in the drawings and described in detail in the text. It is to be understood, however, that the invention is not intended to be limited to the particular forms disclosed, but on the contrary, is intended to cover all modifications, equivalents, and alternatives falling within the spirit and scope of the invention. Like reference numerals are used for like elements in describing each drawing. In the accompanying drawings, the dimensions of the structures are enlarged to illustrate the present invention in order to clarify the present invention.

The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as a second component, and similarly, the second component may also be referred to as a first component.

The terminology used in this application is used only to describe a specific embodiment and is not intended to limit the invention. The singular expressions include plural expressions unless the context clearly dictates otherwise. In this application, the terms "comprises", "having", and the like are used to specify that a feature, a number, a step, an operation, an element, a part or a combination thereof is described in the specification, But do not preclude the presence or addition of one or more other features, integers, steps, operations, components, parts, or combinations thereof.

Unless defined otherwise, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Terms such as those defined in commonly used dictionaries are to be interpreted as having a meaning consistent with the contextual meaning of the related art and are to be interpreted as either ideal or overly formal in the sense of the present application Do not.

1 to 4 show a spatial light modulator 100 according to the present invention.

Referring to FIG. 1, the cavity optical modulator includes a substrate 110, a first pattern 120 formed in a predetermined shape on a first surface of the substrate 110, A second pattern 130 formed in a predetermined shape on a first surface of the substrate 110 at a position where the first and second patterns 120 and 130 are connected to the first and second patterns 120 and 130, And the bias supplied from the bias supply unit is formed on the second surface of the substrate 110 opposite to the first surface, and the bias supplied from the bias supply unit is formed on the second surface of the substrate 110 opposite to the first surface, And a bias line portion 140 electrically connected to the first and second patterns 120 and 130 to be transferred to the first and second patterns 120 and 130.

The substrate 110 is formed of a plate having a predetermined thickness, and is formed of a material such as GaAs, InP, Sappire, SiC, Highly resistive Si, or glass. At this time, since the substrate 110 requires electrical characteristics that are very low, that is, close to that of an insulator, it is preferable to utilize a highly resistive Si of a special material.

The first pattern 120 is formed on the first surface, which is the upper surface of the substrate 110, and is formed of a conductive material so that a bias can be transmitted. At this time, the first pattern 120 includes a first main line and a plurality of first connection lines.

The first main line extends a predetermined length on the first surface of the substrate 110. Referring to FIG. 4, the first main line preferably extends a predetermined length in the x-axis direction.

A first connection line extends from the first main line in a direction crossing the longitudinal direction of the first main line so as to be adjacent to the second pattern to be connected to the optical modulation element. That is, the first connection line extends a predetermined length in the y-axis direction. At this time, a plurality of first connection lines are formed to be spaced apart from each other along the longitudinal direction of the first main line.

The shape of the first pattern 120 is not limited thereto and the size of the optical modulation device 160 and the substrate 110 may be changed depending on the size of the first pattern 120. [ And thus can be formed into various shapes.

The second pattern 130 is formed on the first surface of the substrate 110 and is formed of a conductive material so that a bias can be transmitted. At this time, the second pattern 130 includes a second main line and a plurality of second connection lines.

The second main line extends a predetermined length on the first surface of the substrate 110. Referring to FIG. 4, the second main line preferably extends a predetermined length in the x-axis direction.

A second connection line extends from the second main line in a direction crossing the longitudinal direction of the second main line so as to be adjacent to the first pattern 120 to be connected to the optical modulation element. That is, the second connection line extends a predetermined length in the y-axis direction. At this time, a plurality of second connection lines are formed to be spaced apart from each other along the longitudinal direction of the second main line.

However, the shape of the first pattern 120 is not limited to the shape of the first pattern 120, and the size of the optical modulation device 160 and the size of the substrate 110 As shown in FIG. At this time, it is preferable that the second pattern 130 is located so that both ends of the second pattern 130 are opposed to the first pattern 120.

The light modulation element 160 has ends connected to the first connection line of the first pattern 120 and the second connection line of the second pattern 130. The first pattern 120 has a Schottky contact and may be connected to the second pattern 130 through an ohmic contact. The terahertz wave modulation device is applied to the optical modulation device 160, but the present invention is not limited thereto, and a pixel unit of a CMOS image sensor may be applied.

The first pattern 120, the second pattern 130 and the optical modulation elements 160 form one unit group and the first surface of the substrate 110 has a plurality of unit groups. In the illustrated example, sixteen unit groups are arranged in the 4X4 form on the first surface of the substrate 110, but the unit groups are not limited thereto and 64 units may be arranged in the 8X8 form on the substrate 110 have.

On the other hand, a source contact member 151 and a drain contact member 152 are provided at positions adjacent to left and right edges of the first surface of the substrate 110, respectively.

The source contact member 151 is formed of a conductive material, extends a predetermined length in the front-rear direction, and is connected to a bias supply unit (not shown). The bias supply unit is conventionally used as a means for supplying a bias to a modulator such as a spatial light modulator, and a detailed description thereof will be omitted. At this time, the source contact portion is connected to the first pattern 120 by the bias line portion 140, and the light modulation device 160 uses the first pattern 120 as a source terminal.

The drain contact member 152 is formed of a corrugated material and extends a predetermined length in the longitudinal direction in parallel with the source contact member 151. The drain contact member 152 is connected to the second pattern 130 by the bias line unit 140 and the optical modulation device 160 uses the second pattern 130 as a drain terminal.

The bias line unit 140 is provided on the second surface of the substrate 110 and includes a plurality of first line members 141 electrically connected to the first pattern 120 through a first via 143, And a plurality of second line members 142 disposed on a second surface of the substrate 110 and electrically connected to the second pattern 130 through a second via 144.

The first line member 141 is formed of a conductive material so that a bias can be transmitted and one end is installed on a second surface of the substrate 110 at a position facing the source contact member 151. The first line members 141 are arranged on the second surface of the substrate 110 so as to be spaced apart from each other along the longitudinal direction of the source contact member 151 so as to face the first patterns 120 of the unit groups desirable.

The first line member 141 is provided at one end with a first connection member 145 so as to be electrically connected to the source contact member 151. The first connection member 145 is formed of a conductive material and includes a substrate 110 at a position opposite to the source contact member 151 so that both ends thereof are coupled to the source contact member 151 and the first line member 141, (Not shown) through the first via hole formed in the substrate 110.

The first via 143 is formed of a conductive material and is provided on the first line member 141 at a position where a plurality of the unit groups are opposed to the first patterns 120 of the unit groups. The first via 143 is formed on the substrate 110 at a position corresponding to the first pattern 120 so that both ends of the first via 143 are connected to the first line member 141 and the first pattern 120 of unit groups, 2 via a via hole.

4, the terahertz wave incident on the optical modulation device 160 has an electric field in the y-axis direction with respect to the substrate 110, and the first line member 141 has the bias And extend in a direction intersecting the direction of the electric field of the terahertz wave so as to be prevented from interfering with the light incident on the optical modulation element 160. That is, the first line member 141 is formed on the second surface of the substrate 110 along the x-axis direction which is the longitudinal direction of the first main line. At this time, the width of the first line member 141 in the y-axis direction is set to 4 um to 6 um, preferably 5 um.

The second line member 142 is formed of a conductive material so that a bias can be transmitted. The second line member 142 extends a predetermined length along the lateral direction in parallel with the first line member 141, and one end thereof is opposed to the drain contact member 152 Lt; RTI ID = 0.0 > 110 < / RTI > The second line members 142 are disposed on the second surface of the substrate 110 so as to be spaced apart from each other along the longitudinal direction of the drain contact member 152 so as to face the second patterns 130 of the unit groups desirable.

The second line member 142 is provided at one end thereof with a second connection member 146 so as to be electrically connected to the drain contact member 152. The second connection member 146 is made of a conductive material and is connected to the drain contact member 152 at a position corresponding to the drain contact member 152 so that both ends thereof are coupled to the drain contact member 152 and the second line member 142, Through the third via hole formed in the substrate 110.

The second vias 144 are formed of a conductive material and are provided on the second line members 142 at positions where a plurality of unit groups are opposed to the second patterns 130. The second vias 144 are formed on the substrate 110 at positions corresponding to the second patterns 130 so that both ends can be connected to the second line members 142 and the second patterns 130 of unit groups, 4 via a via hole.

The terahertz wave incident on the optical modulator 160 has an electric field in the y-axis direction with respect to the substrate 110. The second line member 142 has a bias voltage applied to the optical modulator 160, So as to be prevented from interfering with the light incident on the terahertz wave. That is, the second line member 142 is formed on the second surface of the substrate 110 along the x-axis direction which is the longitudinal direction of the first main line. At this time, the second line member 141 has a width in the y axis direction of 4 um to 6 um, preferably 5 um.

Since the bias line portion 140 is formed on the second surface of the substrate 110 on which the optical modulation device 160 is provided, There is an advantage that interference of the bias through the line section 140 with the optical modulation device 160 is minimized to prevent the optical modulation device 160 from being operated.

5 and 6 are schematic diagrams of a light modulation device 160 (hereinafter referred to as Embodiment 1) of a spatial light modulator provided with first and second line members 141 and 142 according to the present invention, (Hereinafter referred to as comparative example 1) of a line member formed by extending a light source (a light source) and a spatial light modulator. At this time, in Example 1 and Comparative Example 1, the line member has a width of 5 mu m. 5 is a graph showing the transmittance of the optical modulator 160 according to the first embodiment and the first comparative example when the bias voltage is 0 V. FIG. 6 is a graph showing the transmittance of the light wave Is a graph showing the transmittance of the optical modulator 160 of Example 1 and Comparative Example 1 in accordance with the change. Here, the horizontal line is the first embodiment, and the vertical line is the first comparative example. Referring to the drawings, Example 1 shows that the transmittance of the optical modulation device 160 is higher than that of Comparative Example 1. Therefore, the bias line portion 140 having the first and second line members 141 and 142 extending in the direction crossing the electric field direction of the terahertz wave can further reduce the interference to the light modulation element 160 .

7 shows a first line member 141 and a second line member (not shown) according to another embodiment of the present invention.

Elements having the same functions as those in the previous drawings are denoted by the same reference numerals.

Referring to FIG. 4, the first line member 141 and the second line member are formed to have a longer width than the first and second line members 141 and 142 of FIG. That is, the lengths of the first and second line members 141 and 142 in the y-axis direction are longer than the lengths of the first and second line members 141 and 142 in the y-axis direction in FIG. At this time, the first line member 141 and the second line member are formed to have a height of 15 um to 25 um and a height of 20 um.

8 shows a first line member 141 and a second line member (not shown) according to another embodiment of the present invention.

Referring to the drawings, a plurality of the first line members 141 are formed to be spaced apart from each other along the longitudinal direction of the first connection line. At this time, the interval between the first line members 141 is preferably from 15 to 35 mu m.

Although not shown in the drawing, the second line member is formed so as to be spaced apart from each other along the longitudinal direction of the first connection line. At this time, the interval between the second line members is preferably from 15 탆 to 35 탆.

10 and 11 show the optical modulator 160 (hereinafter referred to as Comparative Example 2) of the spatial light modulator provided with the first and second line members 141 and 142 of FIG. 4, the first and second lines (Hereinafter referred to as Embodiment 2) of the spatial light modulator provided with the first and second line members at positions spaced apart from the members 141 and 142 in the y-axis direction, the first and second line members 141 and 142 of Fig. The optical modulation device 160 of the spatial light modulator in which the first and second line members 141 and 142 of the spatial light modulator in FIG. 4). 9 is a graph showing the transmittance of the optical modulator 160 of Comparative Example 2 and Embodiments 2, 3 and 4 according to a change in incident light wave when the bias voltage is 0 V. FIG. 10 is a graph showing the transmittance of the optical modulator 160 when the bias voltage is 3 V, 2 is a graph showing the transmittance of the optical modulator 160 of Comparative Example 2 and Examples 2, 3, and 4 according to changes of incident light waves. Here, the horizontal line is Comparative Example 2, Type 1 is Embodiment 2, Type 2 is Embodiment 3, and Type 3 is Embodiment 4. Referring to the drawings, Examples 2, 3 and 4 show the transmittance of the optical modulation element 160 similar to Comparative Example 2. Accordingly, since the first and second line members 141 and 142 do not affect the transmittance of the optical surface roughness element depending on the size and the installation position, according to the spatial light modulator 100 to be formed or manufactured, , And Examples 2, 3, and 4.

The description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features presented herein.

100: spatial light modulator
110: substrate
120: First pattern
130: the second pattern
140: bias line section
141: first line member
142: second line member
151: source contact member
152: drain contact member
160: optical modulation element

Claims (16)

Board;
A first pattern formed on the first surface of the substrate in a predetermined shape;
A second pattern formed in a predetermined shape on a first surface of the substrate at a position spaced apart from the first pattern;
An optical modulator connected to the first and second patterns and modulating light incident by the bias applied through the first and second patterns;
Wherein the bias supplied from the bias supply portion is formed on a second surface of the substrate opposite to the first surface, the bias line being electrically connected to the first and second patterns to transmit the first and second patterns, Comprising:
Spatial light modulator.
The method according to claim 1,
The bias line portion
A first line member mounted on a second surface of the substrate and electrically connected to the first pattern via a first via;
And a second line member electrically connected to the second pattern via a second via, the second line member being disposed on a second surface of the substrate,
Spatial light modulator.
3. The method of claim 2,
Wherein the first via is provided to penetrate the substrate so that both ends thereof can be connected to the first line member and the first pattern,
Spatial light modulator.
3. The method of claim 2,
Wherein the second vias are disposed so as to penetrate the substrate so that both ends thereof can be connected to the second line member and the second pattern, respectively,
Spatial light modulator.
3. The method of claim 2,
A source contact member connected to the bias supply unit, the source contact member being provided on a first surface of the substrate and electrically connected to the first line member by a first connection member;
And a drain contact member mounted on a first surface of the substrate and electrically connected to the second line member by a second connection member,
Spatial light modulator.
6. The method of claim 5,
Wherein the first connection member is provided so as to penetrate the substrate so that both ends thereof are respectively coupled to the source contact member and the first line member,
Spatial light modulator.
6. The method of claim 5,
Wherein the second connection member is provided so as to penetrate the substrate such that both ends thereof are respectively coupled to the drain contact member and the second line member,
Spatial light modulator.
3. The method of claim 2,
Wherein the first and second line members are formed by extending a predetermined length in a mutually-
Spatial light modulator.
3. The method of claim 2,
Wherein the optical modulator is a terahertz wave modulator for modulating an incident terahertz wave,
Wherein the first line member is formed extending in a direction crossing the direction of an electric field of the terahertz wave incident on the first surface of the substrate,
Spatial light modulator.
3. The method of claim 2,
Wherein the optical modulator is a terahertz wave modulator for modulating an incident terahertz wave,
The second line member being formed extending in a direction crossing the direction of the electric field of the terahertz wave incident on the first surface of the substrate,
Spatial light modulator.
3. The method of claim 2,
Wherein the first pattern comprises a first main line extending a predetermined length on a first surface of the substrate and a second main line extending from the first main line to the second pattern to be connected to the optical modulation device, And a first connection line extending in a direction crossing the longitudinal direction,
Spatial light modulator.
12. The method of claim 11,
The first line member is formed on the second surface of the substrate so as to extend along the longitudinal direction of the first main line so that the bias can be prevented from interfering with the light incident on the optical modulation element,
Spatial light modulator.
13. The method of claim 12,
Wherein the plurality of first line members are spaced apart from each other along a longitudinal direction of the first connection line,
Spatial light modulator.
12. The method of claim 11,
The second pattern includes a second main line extending from the first surface of the substrate at a position spaced apart from the first main line by a predetermined length along the longitudinal direction of the first main line, And a second connection line extending in a direction crossing the longitudinal direction of the second main line so as to be adjacent to the first pattern from the second main line,
Spatial light modulator
15. The method of claim 14,
The second line member is formed on the second surface of the substrate so as to extend along the longitudinal direction of the second main line so that the bias can be prevented from interfering with the light incident on the optical modulation element,
Spatial light modulator.
16. The method of claim 15,
Wherein the second line members are spaced apart from each other along a longitudinal direction of the second connection line,
Spatial light modulator.

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