KR101899290B1 - Colored photosensitive resin composition, color filter and display device - Google Patents
Colored photosensitive resin composition, color filter and display device Download PDFInfo
- Publication number
- KR101899290B1 KR101899290B1 KR1020180063352A KR20180063352A KR101899290B1 KR 101899290 B1 KR101899290 B1 KR 101899290B1 KR 1020180063352 A KR1020180063352 A KR 1020180063352A KR 20180063352 A KR20180063352 A KR 20180063352A KR 101899290 B1 KR101899290 B1 KR 101899290B1
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- KR
- South Korea
- Prior art keywords
- solvent
- resin composition
- photosensitive resin
- colored photosensitive
- meth
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims abstract description 54
- 239000002904 solvent Substances 0.000 claims abstract description 63
- 229920005989 resin Polymers 0.000 claims abstract description 30
- 239000011347 resin Substances 0.000 claims abstract description 30
- 239000001023 inorganic pigment Substances 0.000 claims abstract description 20
- 239000000178 monomer Substances 0.000 claims abstract description 20
- 239000003999 initiator Substances 0.000 claims abstract description 18
- 150000001408 amides Chemical group 0.000 claims description 20
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 14
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 claims description 12
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 claims description 8
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 8
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 7
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 claims description 6
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 claims description 5
- 238000009835 boiling Methods 0.000 claims description 4
- 229940116333 ethyl lactate Drugs 0.000 claims description 3
- UWHSPZZUAYSGTB-UHFFFAOYSA-N 1,1,3,3-tetraethylurea Chemical compound CCN(CC)C(=O)N(CC)CC UWHSPZZUAYSGTB-UHFFFAOYSA-N 0.000 claims description 2
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 claims description 2
- MBHINSULENHCMF-UHFFFAOYSA-N n,n-dimethylpropanamide Chemical compound CCC(=O)N(C)C MBHINSULENHCMF-UHFFFAOYSA-N 0.000 claims description 2
- NQPJDJVGBDHCAD-UHFFFAOYSA-N 1,3-diazinan-2-one Chemical group OC1=NCCCN1 NQPJDJVGBDHCAD-UHFFFAOYSA-N 0.000 claims 1
- 238000004040 coloring Methods 0.000 claims 1
- 238000000059 patterning Methods 0.000 abstract description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract description 7
- 125000000217 alkyl group Chemical group 0.000 abstract description 5
- 125000003368 amide group Chemical group 0.000 abstract 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 36
- -1 tetracarboxylic acid dianhydride Chemical class 0.000 description 19
- 239000003822 epoxy resin Substances 0.000 description 11
- 229920000647 polyepoxide Polymers 0.000 description 11
- 239000000049 pigment Substances 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 239000002270 dispersing agent Substances 0.000 description 9
- 239000011159 matrix material Substances 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 8
- 239000006229 carbon black Substances 0.000 description 8
- 235000019241 carbon black Nutrition 0.000 description 8
- 150000002148 esters Chemical class 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 229930185605 Bisphenol Natural products 0.000 description 4
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 4
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 125000004018 acid anhydride group Chemical group 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 4
- LPEKGGXMPWTOCB-UHFFFAOYSA-N methyl 2-hydroxypropionate Chemical compound COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- SEFYJVFBMNOLBK-UHFFFAOYSA-N 2-[2-[2-(oxiran-2-ylmethoxy)ethoxy]ethoxymethyl]oxirane Chemical compound C1OC1COCCOCCOCC1CO1 SEFYJVFBMNOLBK-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 235000011187 glycerol Nutrition 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 150000002923 oximes Chemical class 0.000 description 3
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- RECKYPXSRZFZJV-UHFFFAOYSA-N 1-(4-tert-butylphenyl)butane-1,3-dione Chemical compound CC(=O)CC(=O)C1=CC=C(C(C)(C)C)C=C1 RECKYPXSRZFZJV-UHFFFAOYSA-N 0.000 description 2
- CNJRPYFBORAQAU-UHFFFAOYSA-N 1-ethoxy-2-(2-methoxyethoxy)ethane Chemical compound CCOCCOCCOC CNJRPYFBORAQAU-UHFFFAOYSA-N 0.000 description 2
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- QTUVQQKHBMGYEH-UHFFFAOYSA-N 2-(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC=NC=N1 QTUVQQKHBMGYEH-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 2
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- FFOPEPMHKILNIT-UHFFFAOYSA-N Isopropyl butyrate Chemical compound CCCC(=O)OC(C)C FFOPEPMHKILNIT-UHFFFAOYSA-N 0.000 description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical class OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 2
- IYTXKIXETAELAV-UHFFFAOYSA-N Nonan-3-one Chemical compound CCCCCCC(=O)CC IYTXKIXETAELAV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 239000006231 channel black Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- 230000008034 disappearance Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
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- 229920001515 polyalkylene glycol Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 150000007519 polyprotic acids Polymers 0.000 description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 2
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KFJJYOKMAAQFHC-UHFFFAOYSA-N (4-methoxy-5,5-dimethylcyclohexa-1,3-dien-1-yl)-phenylmethanone Chemical compound C1C(C)(C)C(OC)=CC=C1C(=O)C1=CC=CC=C1 KFJJYOKMAAQFHC-UHFFFAOYSA-N 0.000 description 1
- ZLRFFLHHPJOMEU-UHFFFAOYSA-N (9-ethylcarbazol-3-yl)-(2-methylphenyl)methanone Chemical compound C=1C=C2N(CC)C3=CC=CC=C3C2=CC=1C(=O)C1=CC=CC=C1C ZLRFFLHHPJOMEU-UHFFFAOYSA-N 0.000 description 1
- XHXSXTIIDBZEKB-UHFFFAOYSA-N 1,2,3,4,5,6,7,8-octamethylanthracene-9,10-dione Chemical compound CC1=C(C)C(C)=C2C(=O)C3=C(C)C(C)=C(C)C(C)=C3C(=O)C2=C1C XHXSXTIIDBZEKB-UHFFFAOYSA-N 0.000 description 1
- KMOUUZVZFBCRAM-UHFFFAOYSA-N 1,2,3,6-tetrahydrophthalic anhydride Chemical compound C1C=CCC2C(=O)OC(=O)C21 KMOUUZVZFBCRAM-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- RASRVRRFBDIUJO-UHFFFAOYSA-N 1,5,6-trichloro-6-[2-(4-ethoxyphenyl)ethenyl]-2,4-bis(trichloromethyl)-2H-1,3,5-triazine Chemical compound ClN1C(N(C(=NC1C(Cl)(Cl)Cl)C(Cl)(Cl)Cl)Cl)(C=CC1=CC=C(C=C1)OCC)Cl RASRVRRFBDIUJO-UHFFFAOYSA-N 0.000 description 1
- VZXPHDGHQXLXJC-UHFFFAOYSA-N 1,6-diisocyanato-5,6-dimethylheptane Chemical compound O=C=NC(C)(C)C(C)CCCCN=C=O VZXPHDGHQXLXJC-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 description 1
- UYFJYGWNYQCHOB-UHFFFAOYSA-N 1-(4-tert-butylphenyl)ethanone Chemical compound CC(=O)C1=CC=C(C(C)(C)C)C=C1 UYFJYGWNYQCHOB-UHFFFAOYSA-N 0.000 description 1
- ONCICIKBSHQJTB-UHFFFAOYSA-N 1-[4-(dimethylamino)phenyl]propan-1-one Chemical compound CCC(=O)C1=CC=C(N(C)C)C=C1 ONCICIKBSHQJTB-UHFFFAOYSA-N 0.000 description 1
- HNAGHMKIPMKKBB-UHFFFAOYSA-N 1-benzylpyrrolidine-3-carboxamide Chemical compound C1C(C(=O)N)CCN1CC1=CC=CC=C1 HNAGHMKIPMKKBB-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- VKQJCUYEEABXNK-UHFFFAOYSA-N 1-chloro-4-propoxythioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C(OCCC)=CC=C2Cl VKQJCUYEEABXNK-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
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- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 1
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- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
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- 238000002329 infrared spectrum Methods 0.000 description 1
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- 229940011051 isopropyl acetate Drugs 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
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- 239000004310 lactic acid Substances 0.000 description 1
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- 230000007774 longterm Effects 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
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- 239000012528 membrane Substances 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
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- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
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- 150000003077 polyols Chemical class 0.000 description 1
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- ILPVOWZUBFRIAX-UHFFFAOYSA-N propyl 2-oxopropanoate Chemical compound CCCOC(=O)C(C)=O ILPVOWZUBFRIAX-UHFFFAOYSA-N 0.000 description 1
- HUAZGNHGCJGYNP-UHFFFAOYSA-N propyl butyrate Chemical compound CCCOC(=O)CCC HUAZGNHGCJGYNP-UHFFFAOYSA-N 0.000 description 1
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- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 1
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- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000003698 tetramethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000006234 thermal black Substances 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Abstract
[과제] 점도 및 패터닝 특성의 시간 경과 안정성이 뛰어난 착색 감광성 수지조성물, 상기 착색 감광성 수지조성물을 이용해 형성된 컬러 필터 및 컬러 필터를 구비한 표시장치를 제공한다.
[해결 수단] 본 발명에 관련되는 착색 감광성 수지조성물은 알칼리 가용성 수지, 광 중합성 모노머, 광중합 개시제, 무기 안료 및 용제를 함유하며, 상기 용제는 아미드 구조를 가지는 용제를 포함한다. 아미드 구조를 가지는 용제는 하기 식으로 나타내는 것이 바람직하다. 식 중, R1, R2, R3은 각각 독립적으로 수소 원자 또는 알킬기를 나타내며, n는 1∼3의 정수를 나타낸다.[PROBLEMS] To provide a colored photosensitive resin composition excellent in stability of viscosity and patterning characteristics over time, a color filter formed using the colored photosensitive resin composition, and a display device provided with a color filter.
[Solution] The colored photosensitive resin composition according to the present invention contains an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, an inorganic pigment and a solvent, and the solvent includes a solvent having an amide structure. The solvent having an amide structure is preferably represented by the following formula. In the formulas, R 1 , R 2 and R 3 each independently represent a hydrogen atom or an alkyl group, and n represents an integer of 1 to 3.
Description
본 발명은 착색 감광성 수지조성물, 컬러 필터 및 표시장치에 관한 것이다.The present invention relates to a colored photosensitive resin composition, a color filter, and a display device.
일반적으로, 컬러 필터는 리소그라피법에 의해 제조된다. 이 리소그라피법에서는 먼저 기판상에 흑색의 착색 감광성 수지조성물을 도포한 후, 노광, 현상하여 블랙 매트릭스를 형성한다. 그 다음에, 적색, 녹색 및 청색의 각 색의 착색 감광성 수지 조성물마다 도포, 건조, 노광 및 현상을 반복하여, 각 색의 화소 영역을 소정 위치에 형성하여 컬러 필터를 제조한다.Generally, a color filter is manufactured by a lithography method. In this lithography method, first, a black colored photosensitive resin composition is coated on a substrate, followed by exposure and development to form a black matrix. Then, coating, drying, exposure, and development are repeated for each colored photosensitive resin composition of each color of red, green, and blue to form a pixel region of each color at a predetermined position to produce a color filter.
컬러 필터에 이용되는 착색 감광성 수지조성물은 먼저 안료와 안료 분산제를 용제에 분산시켜 안료 분산액으로 하고, 그 다음에 이 안료 분산액에 수지 등의 다른 구성 성분을 첨가하고, 혼합함으로써 조제하는 것이 일반적이다.The colored photosensitive resin composition used for the color filter is generally prepared by first dispersing a pigment and a pigment dispersant in a solvent to prepare a pigment dispersion, then adding other components such as a resin to the pigment dispersion, and mixing them.
용제로는, 종래 착색 감광성 수지조성물에 포함되는 각 성분에 대해서 용해성이 높은 것, 혹은 착색 감광성 수지조성물을 기판 등에 도포했을 때에 도포성, 증발성이 뛰어난 것이 이용되며, 에스테르계, 케톤계 용제가 많이 이용되고 있다. 그러나 유기안료와 안료 분산제를 포함한 착색 감광성 수지조성물의 경우, 안료 분산제가 에스테르계, 케톤계 용제에 녹기 어렵고, 안료의 입경을 미립자화할 수 없기 때문에, 이와 같은 착색 감광성 수지조성물을 이용하면 높은 콘트라스트를 가지는 컬러 필터를 제작할 수 없다는 문제가 있었다. 이에 대해서, 용제로서 아미드 구조를 가지는 용제를 이용하면, 안료 분산제의 용해도를 높일 수 있고, 안료 입경을 작게 해서, 높은 투과율을 가지는 착색 감광성 수지조성물을 작성할 수 있으며, 이것을 이용했더니 높은 콘트라스트를 가지는 컬러 필터를 제작할 수 있다고 보고되고 있다(특허문헌 1 참조).As the solvent, those having high solubility for each component contained in the conventional colored photosensitive resin composition or those having excellent coatability and evaporability when the colored photosensitive resin composition is applied to a substrate or the like are used, and an ester type or ketone type solvent is used It is widely used. However, in the case of a colored photosensitive resin composition containing an organic pigment and a pigment dispersant, since the pigment dispersant is hardly soluble in an ester or ketone solvent and the particle diameter of the pigment can not be made fine, the use of such a colored photosensitive resin composition provides a high contrast There is a problem in that a color filter having a branch can not be manufactured. On the other hand, when a solvent having an amide structure is used as the solvent, the solubility of the pigment dispersant can be increased, the pigment particle diameter can be reduced, and a colored photosensitive resin composition having a high transmittance can be prepared. It is reported that a filter can be fabricated (see Patent Document 1).
한편, 안료로서 무기 안료를 이용한 착색 감광성 수지조성물에서는 용제로 에스테르계, 케톤계 용제를 이용하면, 장기 보관에 의해 큰 점도 변화가 생겨, 패터닝 특성이 열화 된다는 문제가 있었다. 이 때문에, 보존 안정성이 뛰어난 착색 감광성 수지조성물이 요망되고 있다.On the other hand, when an ester-based or a ketone-based solvent is used as a solvent in a colored photosensitive resin composition using an inorganic pigment as a pigment, there is a problem that a large viscosity change is caused by long-term storage and the patterning property is deteriorated. For this reason, a colored photosensitive resin composition excellent in storage stability is desired.
본 발명은 점도 및 패터닝 특성의 시간 경과 안정성이 뛰어난 착색 감광성 수지조성물, 상기 착색 감광성 수지조성물을 이용해 형성된 컬러 필터, 및 컬러 필터를 구비한 표시장치를 제공하는 것을 목적으로 한다.An object of the present invention is to provide a colored photosensitive resin composition excellent in viscosity and patterning characteristics with a lapse of time stability, a color filter formed using the colored photosensitive resin composition, and a display device provided with a color filter.
본 발명자들은 예의 연구를 거듭한 결과, 특정의 용제를 함유함으로써 상기 과제를 해결할 수 있는 것을 알아내어 본 발명을 완성하는 것에 도달했다.As a result of intensive studies, the present inventors have found out that the above problems can be solved by containing a specific solvent, and have reached the completion of the present invention.
본 발명의 제1 태양은 알칼리 가용성 수지, 광 중합성 모노머, 광중합 개시제, 무기 안료 및 용제를 함유하는 착색 감광성 수지조성물로서, 상기 용제가 아미드 구조를 가지는 용제를 포함하는 것을 특징으로 하는 착색 감광성 수지조성물이다.A first aspect of the present invention is a colored photosensitive resin composition comprising an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, an inorganic pigment and a solvent, wherein the solvent comprises a solvent having an amide structure .
본 발명의 제2 태양은 본 발명에 관련되는 착색 감광성 수지조성물을 이용해 형성된 컬러 필터이며, 본 발명의 제3 태양은 본 발명에 관련되는 컬러 필터를 구비한 표시장치이다.A second aspect of the present invention is a color filter formed using the colored photosensitive resin composition according to the present invention, and the third aspect of the present invention is a display device having a color filter according to the present invention.
본 발명에 의하면, 점도 및 패터닝 특성의 시간 경과 안정성이 뛰어난 착색 감광성 수지조성물을 얻을 수 있다. 이 때문에 본 발명에 관련되는 착색 감광성 수지조성물은 각종 컬러 필터의 제작 및 그것을 구비한 표시장치에 매우 적합하게 사용할 수 있다.According to the present invention, it is possible to obtain a colored photosensitive resin composition excellent in stability with time and stability of viscosity and patterning characteristics. Therefore, the colored photosensitive resin composition according to the present invention can be suitably used for various color filter fabrication and display devices equipped with the same.
본 발명에 관련되는 착색 감광성 수지조성물은 알칼리 가용성 수지, 광 중합성 모노머, 광중합 개시제, 무기 안료 및 용제를 함유한다. 먼저, 이들 구성 성분에 대해서 설명한다.The colored photosensitive resin composition according to the present invention contains an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, an inorganic pigment and a solvent. First, these constituent components will be described.
<알칼리 가용성 수지><Alkali-soluble resin>
본 발명에 이용되는 알칼리 가용성 수지로는 특별히 한정되지 않으며, 종래 공지의 알칼리 가용성 수지를 이용할 수 있다. 본 명세서에 있어서 알칼리 가용성 수지란, 수지 농도 20 중량%의 수지 용액 (용제: 프로필렌 글리콜 모노메틸 에테르 아세테이트)으로 막 두께 1㎛의 수지막을 기판상에 형성하고, 23℃에서 2.38 중량%의 테트라메틸암모늄히드록시드 (TMAH) 수용액에 1분간 침지했을 때에 막 두께가 0.01㎛ 이상 용해되는 것을 말한다.The alkali-soluble resin used in the present invention is not particularly limited, and conventionally known alkali-soluble resins can be used. In this specification, the alkali-soluble resin means a resin film having a thickness of 1 占 퐉 formed on a substrate with a resin solution (solvent: propylene glycol monomethyl ether acetate) having a resin concentration of 20% by weight and a 2.38% by weight tetramethyl Means that the film thickness is dissolved by 0.01 m or more when immersed in an aqueous solution of ammonium hydroxide (TMAH) for 1 minute.
알칼리 가용성 수지로는, 예를 들면 에폭시 화합물과 불포화 카르복시산의 반응물을 다염기산 무수물과 재차 반응시킴으로써 얻어진 수지를 이용할 수 있다.As the alkali-soluble resin, for example, a resin obtained by reacting a reaction product of an epoxy compound and an unsaturated carboxylic acid with a polybasic acid anhydride may be used.
그 중에서도, 하기 식 (a-1)로 나타내는 수지가 바람직하다. 이 식 (a-1)로 나타내는 수지는 그 자체가 광 경화성이 높은 점에서 바람직하다.Among them, a resin represented by the following formula (a-1) is preferable. The resin represented by the formula (a-1) is preferable because of its high photocurability.
상기 식 (a-1) 중, Xa는 하기 식 (a-2)로 나타내는 기를 나타낸다.In the above formula (a-1), X a represents a group represented by the following formula (a-2).
상기 식 (a-2) 중 Ra1은 각각 독립적으로 수소 원자, 탄소수 1∼6의 탄화수소기, 또는 할로겐 원자를 나타내고, Ra2는 각각 독립적으로 수소 원자 또는 메틸기를 나타내며, Wa는 단결합 또는 하기 식 (a-3)으로 나타내는 기를 나타낸다.In formula (a-2), R a1 independently represents a hydrogen atom, a hydrocarbon group of 1 to 6 carbon atoms, or a halogen atom, R a2 each independently represents a hydrogen atom or a methyl group, and W a represents a single bond or Represents a group represented by the following formula (a-3).
또, 상기 식(a-1) 중, Ya는 디카르복시산 무수물로부터 산무수물기(-CO-O-CO-)를 뺀 잔기를 나타낸다. 디카르복시산 무수물의 예로는 무수 말레산, 무수 숙신산, 무수 이타콘산, 무수 프탈산, 무수 테트라히드로프탈산, 무수 헥사히드로프탈산, 무수 메틸 엔도 메틸렌 테트라히드로프탈산, 무수 클로렌드산, 메틸테트라히드로 무수 프탈산, 무수 글루타르산 등을 들 수 있다.In the formula (a-1), Y a represents a residue obtained by removing an acid anhydride group (-CO-O-CO-) from a dicarboxylic acid anhydride. Examples of the dicarboxylic acid anhydride include maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylendomethylene tetrahydrophthalic anhydride, chlorenedic anhydride, methyltetrahydrophthalic anhydride, And glutaric acid.
또, 상기 식 (a-1) 중, Za는 테트라카르복시산 2무수물로부터 2개의 산무수물기를 뺀 잔기를 나타낸다. 테트라카르복시산 2무수물의 예로는 피로멜리트산 2무수물, 벤조페논테트라카르복시산 2무수물, 비페닐테트라카르복시산 2무수물, 비페닐에테르테트라카르복시산 2무수물 등을 들 수 있다.In the above formula (a-1), Z a represents a residue obtained by subtracting two acid anhydride groups from a tetracarboxylic acid dianhydride. Examples of the tetracarboxylic acid dianhydride include pyromellitic dianhydride, benzophenonetetracarboxylic dianhydride, biphenyltetracarboxylic dianhydride, and biphenyl ether tetracarboxylic dianhydride.
또, 상기 식 (a-1) 중, m은 0∼20의 정수를 나타낸다.In the above formula (a-1), m represents an integer of 0 to 20.
또, 에틸렌성 불포화기를 가지는 알칼리 가용성 수지로는, 다가 알코올류와 일염기산 또는 다염기산을 축합하여 얻어진 폴리에스테르 프리폴리머에 (메타)아크릴산을 반응시켜 얻어진 폴리에스테르 (메타)아크릴레이트; 폴리올과 2개의 이소시아네이트기를 가지는 화합물을 반응시킨 후, (메타)아크릴산을 반응시켜 얻어진 폴리우레탄 (메타)아크릴레이트; 비스페놀 A형 에폭시 수지, 비스페놀 F형 에폭시 수지, 비스페놀 S형 에폭시 수지, 페놀 또는 크레졸 노볼락형 에폭시 수지, 레졸형 에폭시 수지, 트리페놀메탄형 에폭시 수지, 폴리카르복시산 폴리글리시딜에스테르, 폴리올폴리글리시딜에스테르, 지방족 또는 지환식 에폭시 수지, 아민 에폭시 수지, 디히드록시 벤젠형 에폭시 수지 등의 에폭시 수지와, (메타)아크릴산을 반응시켜 얻어진 에폭시 (메타)아크릴레이트 수지 등을 이용할 수도 있다.Examples of the alkali-soluble resin having an ethylenic unsaturated group include polyester (meth) acrylate obtained by reacting a (meth) acrylic acid with a polyester prepolymer obtained by condensing a polyhydric alcohol with a monobasic acid or a polybasic acid; Polyurethane (meth) acrylate obtained by reacting a polyol with a compound having two isocyanate groups and then reacting with (meth) acrylic acid; Bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, phenol or cresol novolak type epoxy resin, resol type epoxy resin, triphenol methane type epoxy resin, polycarboxylic acid polyglycidyl ester, An epoxy (meth) acrylate resin obtained by reacting an epoxy resin such as a cydyl ester, an aliphatic or alicyclic epoxy resin, an amine epoxy resin, or a dihydroxybenzene type epoxy resin with (meth) acrylic acid may be used.
또한, 본 명세서에 있어서, 「(메타)아크릴산」은 아크릴산과 메타크릴산의 양쪽 모두를 의미한다. 마찬가지로, 「(메타)아크릴레이트」는 아크릴레이트와 메타크릴레이트의 양쪽 모두를 의미한다.In the present specification, "(meth) acrylic acid" means both acrylic acid and methacrylic acid. Likewise, "(meth) acrylate" means both acrylate and methacrylate.
알칼리 가용성 수지의 중량평균분자량은 1000∼40000인 것이 바람직하고, 2000∼30000인 것이 보다 바람직하다. 상기 범위로 함으로써, 양호한 현상성이 얻어지는 것으로부터, 충분한 내열성, 막 강도를 얻을 수 있다.The weight average molecular weight of the alkali-soluble resin is preferably from 1,000 to 400,000, more preferably from 2,000 to 30,000. Within this range, satisfactory developability can be obtained, and sufficient heat resistance and film strength can be obtained.
알칼리 가용성 수지의 함유량은 착색 감광성 수지조성물의 고형분에 대해서 5∼80 중량%인 것이 바람직하고, 15∼50 중량%인 것이 보다 바람직하다. 여기서 말하는 고형분이란, 용제 이외의 성분이다. 상기의 범위로 함으로써 현상성의 밸런스를 얻기 쉬운 경향이 있다.The content of the alkali-soluble resin is preferably 5 to 80% by weight, more preferably 15 to 50% by weight based on the solid content of the colored photosensitive resin composition. The solid content referred to herein is a component other than the solvent. When the amount is in the above range, the balance of developability tends to be easily obtained.
<광 중합성 모노머>≪ Photopolymerizable monomer >
본 발명에 관련되는 착색 감광성 수지조성물은, 광 중합성 모노머를 함유한다. 광 중합성 모노머로는 단관능 모노머와 다관능 모노머가 있다.The colored photosensitive resin composition according to the present invention contains a photopolymerizable monomer. The photopolymerizable monomers include monofunctional monomers and polyfunctional monomers.
단관능 모노머로는 (메타)아크릴아미드, 메틸올 (메타)아크릴아미드, 메톡시메틸 (메타)아크릴아미드, 에톡시메틸 (메타)아크릴아미드, 프로폭시메틸 (메타)아크릴아미드, 부톡시메톡시메틸 (메타)아크릴아미드, N-메틸올 (메타)아크릴아미드, N-히드록시메틸 (메타)아크릴아미드, (메타)아크릴산, 푸말산, 말레산, 무수 말레산, 이타콘산, 무수 이타콘산, 시트라콘산, 무수 시트라콘산, 크로톤산, 2-아크릴아미드-2-메틸프로판설폰산, tert-부틸아크릴아미드설폰산, 메틸 (메타)아크릴레이트, 에틸 (메타)아크릴레이트, 부틸 (메타)아크릴레이트, 2-에틸헥실 (메타)아크릴레이트, 시클로헥실 (메타)아크릴레이트, 2-히드록시에틸 (메타)아크릴레이트, 2-히드록시프로필 (메타)아크릴레이트, 2-히드록시부틸 (메타)아크릴레이트, 2-페녹시-2-히드록시프로필 (메타)아크릴레이트, 2-(메타)아크릴로일옥시-2-히드록시프로필프탈레이트, 글리세린 모노(메타)아크릴레이트, 테트라히드로푸르푸릴 (메타)아크릴레이트, 디메틸아미노 (메타)아크릴레이트, 글리시딜 (메타)아크릴레이트, 2,2,2-트리플루오로에틸 (메타)아크릴레이트, 2,2,3,3-테트라플루오로프로필 (메타)아크릴레이트, 프탈산 유도체의 하프(메타)아크릴레이트 등을 들 수 있다. 이들 단관능 모노머는 단독으로 이용해도 되고, 2종 이상 조합하여 이용해도 된다.Examples of the monofunctional monomer include (meth) acrylamide, methylol (meth) acrylamide, methoxymethyl (meth) acrylamide, ethoxymethyl (meth) acrylamide, propoxymethyl (meth) acrylamide, butoxymethoxy (Meth) acrylic acid, maleic acid, maleic anhydride, itaconic acid, itaconic anhydride, maleic anhydride, maleic anhydride, Methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, (Meth) acrylate, 2-ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-hydroxyethyl ) Acrylate, 2-phenoxy-2-hydroxypropyl (meth) (Meth) acrylate, glycerin mono (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, dimethylamino (meth) acrylate, glycidyl (Meth) acrylate, 2,2,2-trifluoroethyl (meth) acrylate, 2,2,3,3-tetrafluoropropyl (meth) acrylate, and half . These monofunctional monomers may be used alone or in combination of two or more.
한편, 다관능 모노머로는 에틸렌글리콜 디(메타)아크릴레이트, 디에틸렌글리콜 디(메타)아크릴레이트, 테트라에틸렌글리콜 디(메타)아크릴레이트, 프로필렌글리콜 디(메타)아크릴레이트, 폴리프로필렌글리콜 디(메타)아크릴레이트, 부틸렌글리콜 디(메타)아크릴레이트, 네오펜틸글리콜 디(메타)아크릴레이트, 1,6-헥산글리콜 디(메타)아크릴레이트, 트리메틸올프로판 트리(메타)아크릴레이트, 글리세린 디(메타)아크릴레이트, 펜타에리트리톨 트리아크릴레이트, 펜타에리트리톨 테트라아크릴레이트, 디펜타에리트리톨 펜타아크릴레이트, 디펜타에리트리톨 헥사아크릴레이트, 펜타에리트리톨 디(메타)아크릴레이트, 펜타에리트리톨 트리(메타)아크릴레이트, 펜타에리트리톨 테트라(메타)아크릴레이트, 디펜타에리트리톨 펜타(메타)아크릴레이트, 디펜타에리트리톨 헥사(메타)아크릴레이트, 2,2-비스(4-(메타)아크릴옥시디에톡시페닐)프로판, 2,2-비스(4-(메타)아크릴옥시폴리에톡시페닐)프로판, 2-히드록시-3-(메타)아크릴로일옥시프로필 (메타)아크릴레이트, 에틸렌글리콜 디글리시딜에테르 디(메타)아크릴레이트, 디에틸렌글리콜 디글리시딜에테르 디(메타)아크릴레이트, 프탈산 디글리시딜에스테르 디(메타)아크릴레이트, 글리세린 트리아크릴레이트, 글리세린 폴리글리시딜에테르 폴리(메타)아크릴레이트, 우레탄 (메타)아크릴레이트 (즉, 톨릴렌디이소시아네이트), 트리메틸헥사메틸렌 디이소시아네이트와 헥사메틸렌 디이소시아네이트와 2-히드록시에틸 (메타)아크릴레이트의 반응물, 메틸렌비스(메타)아크릴아미드, (메타)아크릴아미드 메틸렌에테르, 다가 알코올과 N-메틸올(메타)아크릴아미드의 축합물 등의 다관능 모노머나, 트리아크릴포르말 등을 들 수 있다. 이들 다관능 모노머는 단독으로 이용해도 되고 2종 이상 조합하여 이용해도 된다.Examples of the polyfunctional monomer include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, polypropylene glycol di (Meth) acrylate, trimethylolpropane tri (meth) acrylate, glycerin di (meth) acrylate, butyleneglycol di (meth) acrylate, neopentyl glycol di (Meth) acrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, pentaerythritol di (meth) acrylate, pentaerythritol tri (Meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol penta (Meth) acryloxypolyethoxyphenyl) propane, 2,2-bis (4- (meth) acryloxy diethoxyphenyl) propane, (Meth) acrylate, diethylene glycol diglycidyl ether di (meth) acrylate, diethylene glycol diglycidyl ether di (meth) acrylate, diethylene glycol diglycidyl ether di (Meth) acrylate, glycerin triacrylate, glycerin polyglycidyl ether poly (meth) acrylate, urethane (meth) acrylate (i.e., tolylene diisocyanate), trimethylhexamethylene diisocyanate, (Meth) acrylamide, (meth) acrylamide methylene ether, polyhydric alcohol and N-methylol (meth) acrylamide, a reaction product of methylene diisocyanate and 2-hydroxyethyl There may be mentioned polyfunctional monomer and, triacrylate formal such as in the compounds and the like. These multifunctional monomers may be used alone or in combination of two or more.
광 중합성 모노머의 함유량은 착색 감광성 수지 조성물의 고형분에 대해서 1∼30 중량%인 것이 바람직하고, 5∼20 중량%인 것이 보다 바람직하다. 상기의 범위로 함으로써 감도, 현상성 및 해상성의 밸런스를 맞추기 쉬운 경향이 있다.The content of the photopolymerizable monomer is preferably 1 to 30% by weight, more preferably 5 to 20% by weight, based on the solid content of the colored photosensitive resin composition. When the concentration is in the above range, the balance of sensitivity, developability and resolution tends to be easily adjusted.
<광중합 개시제><Photopolymerization initiator>
본 발명에 관련되는 착색 감광성 수지조성물은 광중합 개시제를 함유한다. 광중합 개시제로는 특별히 한정되지 않으며, 종래 공지의 광중합 개시제를 이용할 수 있다.The colored photosensitive resin composition according to the present invention contains a photopolymerization initiator. The photopolymerization initiator is not particularly limited, and conventionally known photopolymerization initiators can be used.
광중합 개시제로서 구체적으로는 1-히드록시시클로헥실페닐케톤, 2-히드록시-2-메틸-1-페닐프로판-1-온, 1-[4-(2-히드록시에톡시)페닐]-2-히드록시-2-메틸-1-프로판-1-온, 1-(4-이소프로필페닐)-2-히드록시-2-메틸프로판-1-온, 1-(4-도데실페닐)-2-히드록시-2-메틸프로판-1-온, 2,2-디메톡시-1,2-디페닐에탄-1-온, 비스(4-디메틸아미노페닐)케톤, 2-메틸-1-[4-(메틸티오)페닐]-2-모르폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)-부탄-1-온, 에타논,1-[9-에틸-6-(2-메틸벤조일)-9H-카바졸-3-일],1-(o-아세틸옥심), 2,4,6-트리메틸벤조일디페닐포스핀옥시드, 4-벤조일-4'-메틸디메틸설피드, 4-디메틸아미노벤조산, 4-디메틸아미노벤조산메틸, 4-디메틸아미노벤조산 에틸, 4-디메틸아미노벤조산부틸, 4-디메틸아미노-2-에틸헥실벤조산, 4-디메틸아미노-2-이소아밀벤조산, 벤질-β-메톡시에틸아세탈, 벤질디메틸케탈, 1-페닐-1,2-프로판디온-2-(o-에톡시카르보닐)옥심, o-벤조일벤조산메틸, 2,4-디에틸티옥산톤, 2-클로로티옥산톤, 2,4-디메틸티옥산톤, 1-클로로-4-프로폭시티옥산톤, 티옥산텐, 2-클로로티옥산산텐, 2,4-디에틸티옥산텐, 2-메틸티옥산텐, 2-이소프로필티옥산텐, 2-에틸안트라퀴논, 옥타메틸안트라퀴논, 1,2-벤즈안트라퀴논, 2,3-디페닐안트라퀴논, 아조비스이소부티로니트릴, 벤조일퍼옥시드, 쿠멘퍼옥시드, 2-머르캅토벤조이미달, 2-머르캅토벤조옥사졸, 2-머르캅토벤조티아졸, 2-(o-클로로페닐)-4,5-디페닐이미다졸 2량체, 2-(o-클로로페닐)-4,5-디(메톡시페닐)-이미다졸 2량체, 2-(o-플루오로페닐)-4,5-디페닐이미다졸 2량체, 2-(o-메톡시페닐)-4,5-디페닐이미다졸릴 2량체, 2-(p-메톡시페닐)-4,5-디페닐이미다졸 2량체, 2,4,5-트리알릴이미다졸 2량체, 벤조페논, 2-클로로벤조페논, 4,4'-비스디메틸아미노벤조페논 (즉, 미힐러 케논 (Michler′s ketone)), 4,4'-비스디에틸아미노벤조페논 (즉, 에틸미힐러 케톤), 4,4'-디클로로벤조페논, 3,3-디메틸-4-메톡시벤조페논, 벤질, 벤조인, 벤조인메틸에테르, 벤조인에틸에테르, 벤조인이소프로필에테르, 벤조인-n-부틸에테르, 벤조인이소부틸에테르, 벤조인부틸에테르, 아세토페논, 2,2-디에톡시아세토페논, p-디메틸아세토페논, p-디메틸아미노프로피오페논, 디클로로아세토페논, 트리클로로아세토페논, p-tert-부틸아세토페논, p-디메틸아미노아세토페논, p-tert-부틸트리클로로아세토페논, p-tert-부틸디클로로아세토페논, α,α-디클로로-4-페녹시아세토페논, 티옥산톤, 2-메틸티옥산톤, 2-이소프로필티옥산톤, 디벤조스베론, 펜틸-4-디메틸아미노벤조에이트, 9-페닐아크리딘, 1,7-비스-(9-아크리디닐)헵탄, 1,5-비스-(9-아크리디닐)펜탄, 1,3-비스-(9-아크리디닐)프로판, p-메톡시트리아진, 2,4,6-트리스(트리클로로메틸)-s-트리아진, 2-메틸-4,6-비스(트리클로로메틸)-s-트리아진, 2-[2-(5-메틸푸란-2-일)에테닐]-4,6-비스(트리클로로메틸)-s-트리아진, 2-[2-(푸란-2-일)에테닐]-4,6-비스(트리클로로메틸)-s-트리아진, 2-[2-(4-디에틸아미노-2-메틸페닐)에테닐]-4,6-비스(트리클로로메틸)-s-트리아진, 2-[2-(3,4-디메톡시페닐)에테닐]-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-메톡시페닐)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-에톡시스티릴)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-n-부톡시페닐)-4,6-비스(트리클로로메틸)-s-트리아진, 2,4-비스-트리클로로메틸-6-(3-브로모-4-메톡시)페닐-s-트리아진, 2,4-비스-트리클로로메틸-6-(2-브로모-4-메톡시)페닐-s-트리아진, 2,4-비스-트리클로로메틸-6-(3-브로모-4-메톡시)스티릴페닐-s-트리아진, 2,4-비스-트리클로로메틸-6-(2-브로모-4-메톡시)스티릴페닐-s-트리아진, 「IRGACURE OXE02」, 「IRGACURE OXE01」, 「IRGACURE 369」, 「IRGACURE 651」, 「IRGACURE 907」(상품명: BASF제), 「NCI-831」(상품명: ADEKA제) 등을 들 수 있다. 이들 중에서도, 옥심계의 광중합 개시제를 이용하는 것이 감도 면에서 특히 바람직하고, 카르바졸 골격을 옥심계 광중합 개시제를 이용하는 것이 특히 바람직하다. 이들 광중합 개시제는 단독으로 이용해도 되고, 2종 이상을 조합하여 이용해도 된다.Specific examples of the photopolymerization initiator include 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1- [4- (2- hydroxyethoxy) Methyl-1-propan-1-one, 1- (4-isopropylphenyl) -2-hydroxy- 2-methylpropan-1-one, 2,2-dimethoxy-1,2-diphenylethan-1-one, bis (4-dimethylaminophenyl) 2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, ethanone, 1 - [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl], 1- (o-acetyloxime), 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 4- Benzyl-4'-methyldimethylsulfide, 4-dimethylaminobenzoic acid, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, butyl 4-dimethylaminobenzoate, 4- Dimethylamino-2-isoamylbenzoic acid, Ben Ethyl-1,2-propanediol-2- (o-ethoxycarbonyl) oxime, methyl o-benzoylbenzoate, 2,4-diethylthioxane 2-chlorothioxanthone, 2,4-dimethylthioxanthone, 1-chloro-4-propoxythioxanthone, thioxanthone, 2- , 2-methylthioxanthene, 2-isopropylthioxanthene, 2-ethyl anthraquinone, octamethylanthraquinone, 1,2-benzanthraquinone, 2,3-diphenylanthraquinone, azobisisobutyronitrile , Benzoyl peroxide, cumene peroxide, 2-mercaptobenzoimidal, 2-mercaptobenzoxazole, 2-mercaptobenzothiazole, 2- (o-chlorophenyl) -4,5-diphenylimidazole (O-chlorophenyl) -4,5-di (methoxyphenyl) imidazole dimer, 2- (o-fluorophenyl) -4,5-diphenylimidazole dimer, 2- A dimer of 2- (o-methoxyphenyl) -4,5-diphenylimidazolyl, a dimer of 2- (p-methoxyphenyl) -4,5- Triallyl (I.e., Michler's ketone), 4,4'-bisdiethylaminobenzophenone (that is, bisphenol) , Ethylhexyl ketone), 4,4'-dichlorobenzophenone, 3,3-dimethyl-4-methoxybenzophenone, benzyl, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, Benzoin isobutyl ether, benzoin butyl ether, acetophenone, 2,2-diethoxyacetophenone, p-dimethylacetophenone, p-dimethylaminopropiophenone, dichloroacetophenone, trichloro Butyl acetoacetophenone, p-tert-butyl acetophenone, p-tert-butyl acetoacetophenone, p-tert-butyl acetoacetophenone, , Thioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, dibenzosuberone, pentyl-4-dimethylaminobenzoate, 9 (9-acridinyl) heptane, 1,5-bis- (9-acridinyl) pentane, 1,3-bis- triazine, 2-methyl-4,6-bis (trichloromethyl) -s-triazine, 2- [2 (Trichloromethyl) -s-triazine, 2- [2- (furan-2-yl) ethenyl] -4,6 (Trichloromethyl) -s-triazine, 2- [2- (4-diethylamino-2-methylphenyl) ethenyl] -4,6-bis (Trichloromethyl) -s-triazine, 2- (4-methoxyphenyl) -4,6-bis (trichloro 2- (4-ethoxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-n-butoxyphenyl) Bis-trichloromethyl-6- (3-bromo-4-methoxy) phenyl-s-triazine, 2,4-bis- Trichloromethyl-6- (2-bromo-4-methoxy ) Phenyl-s-triazine, 2,4-bis-trichloromethyl-6- (3-bromo-4- methoxy) styrylphenyl- IRGACURE OXE02, IRGACURE OXE01, IRGACURE 369, IRGACURE 651, IRGACURE 907 (trade name: BASF) NCI-831 " (trade name, manufactured by ADEKA), and the like. Among them, it is particularly preferable to use a photopolymerization initiator of oxime type in terms of sensitivity, and it is particularly preferable to use oxime-based photopolymerization initiator as the carbazole skeleton. These photopolymerization initiators may be used alone or in combination of two or more.
광중합 개시제의 함유량은 착색 감광성 수지조성물의 고형분에 대해서 0.5∼20 중량%인 것이 바람직하다. 상기 범위로 함으로써 충분한 내열성, 내약품성을 얻을 수 있으며, 또 도막 형성능을 향상시켜, 경화 불량을 억제할 수 있다.The content of the photopolymerization initiator is preferably 0.5 to 20% by weight based on the solid content of the colored photosensitive resin composition. When the content is in the above range, sufficient heat resistance and chemical resistance can be obtained, and the coating film forming ability can be improved and the hardening failure can be suppressed.
<무기 안료><Inorganic pigment>
본 발명에 관련되는 착색 감광성 수지조성물은 무기 안료를 함유한다. 무기 안료로는 특별히 한정되지 않으며, 종래 공지의 무기 안료를 이용할 수 있다.The colored photosensitive resin composition according to the present invention contains an inorganic pigment. The inorganic pigment is not particularly limited, and conventionally known inorganic pigments can be used.
무기 안료로서 구체적으로는 카본 블랙, 티탄 블랙, Cu, Fe, Mn, Cr, Co, Ni, V, Zn, Se, Mg, Ca, Sr, Ba, Pd, Ag, Cd, In, Sn, Sb, Hg, Pb, Bi, Si 및 Al 등의 각종 금속 산화물, 복합 산화물, 금속 황화물, 금속 황산염, 또는 금속 탄산염 등을 들 수 있다.Specific examples of the inorganic pigments include carbon black, titanium black, Cu, Fe, Mn, Cr, Co, Ni, V, Zn, Se, Mg, Ca, Sr, Ba, Pd, Ag, Cd, In, Sn, Sb, Various metal oxides, complex oxides, metal sulfides, metal sulfates, metal carbonates, etc. of Hg, Pb, Bi, Si and Al.
블랙 매트릭스를 형성할 때에는 높은 차광성을 가지는 카본 블랙을 이용하는 것이 바람직하다. 카본 블랙으로는 채널 블랙, 퍼니스 블랙 (furnace black), 서멀 블랙, 램프 블랙 등의 공지의 카본 블랙을 이용할 수 있으나, 차광성이 뛰어난 채널 블랙을 이용하는 것이 특히 바람직하다. 또, 수지 피복 카본 블랙을 이용해도 된다.When the black matrix is formed, it is preferable to use carbon black having high light shielding properties. As carbon black, known carbon blacks such as channel black, furnace black, thermal black and lamp black can be used, but it is particularly preferable to use channel black having excellent light shielding properties. Resin-coated carbon black may also be used.
수지 피복 카본 블랙은 수지 피복이 없는 카본 블랙에 비해 도전성이 낮기 때문에 액정 디스플레이와 같은 액정 표시 소자의 블랙 매트릭스로서 이용했을 경우에 전류의 누출 (leak)이 적어, 신뢰성이 높은 저소비 전력의 디스플레이를 제조할 수 있다.Since resin-coated carbon black has low conductivity compared to carbon black without resin coating, leakage of current is small when used as a black matrix of a liquid crystal display element such as a liquid crystal display, and a display with low power consumption with high reliability is manufactured can do.
또, 무기 안료를 균일하게 분산시키기 위해서, 추가로 분산제를 사용해도 된다. 이러한 분산제로는 폴리에틸렌이민계, 우레탄 수지계, 아크릴 수지계 고분자 분산제를 이용하는 것이 바람직하다. 특히, 무기 안료로서 카본 블랙을 이용하는 경우에는 아크릴 수지계 분산제를 이용하는 것이 바람직하다. In order to uniformly disperse the inorganic pigment, a dispersant may be further used. As such a dispersing agent, it is preferable to use a polyethyleneimine-based, urethane resin-based, acrylic resin-based polymeric dispersing agent. Particularly, when carbon black is used as the inorganic pigment, it is preferable to use an acrylic resin dispersant.
무기 안료의 함유량은 착색 감광성 수지조성물의 고형분에 대해서 5∼70 중량%인 것이 바람직하고, 25∼55 중량%인 것이 보다 바람직하다. 상기의 범위로 함으로써, 목적으로 하는 패턴으로 블랙 매트릭스나 각 착색층을 형성할 수 있어 바람직하다. 특히 블랙 매트릭스를 형성하는 경우에는 막 두께 1㎛ 부근의 OD 값이 4 이상이 되도록 착색 감광성 수지조성물에서의 무기 안료의 양을 조정하는 것이 바람직하다. 블랙 매트릭스에서의 막 두께 1㎛ 부근의 OD 값이 4 이상이면, 액정 디스플레이의 블랙 매트릭스에 이용했을 경우에 충분한 표시 콘트라스트를 얻을 수 있다.The content of the inorganic pigment is preferably 5 to 70% by weight, more preferably 25 to 55% by weight, based on the solid content of the colored photosensitive resin composition. By setting the thickness within the above range, a black matrix or each colored layer can be formed with a desired pattern, which is preferable. In particular, in the case of forming a black matrix, it is preferable to adjust the amount of the inorganic pigment in the colored photosensitive resin composition so that the OD value in the vicinity of 1 mu m in film thickness becomes 4 or more. When the OD value in the vicinity of 1 mu m in film thickness in the black matrix is 4 or more, sufficient display contrast can be obtained when the black matrix is used for a black matrix of a liquid crystal display.
<용제><Solvent>
본 발명에 관련되는 착색 감광성 수지조성물은 용제를 함유하며, 해당 용제는 아미드 구조를 가지는 용제를 포함한다. 여기서, 아미드 구조를 가지는 용제란, 카르보닐기와 질소의 결합을 가지는 용제이며, 카르복시산아미드, 이미드, 요소 및 그 유도체 등을 의미한다. 아미드 구조를 가지는 용제를 포함함으로써 점도의 시간 경과 안정성, 패터닝 특성의 시간 경과 안정성이 향상한다.The colored photosensitive resin composition according to the present invention contains a solvent, and the solvent includes a solvent having an amide structure. Here, the solvent having an amide structure is a solvent having a bond of a carbonyl group and nitrogen, and means a carboxylic acid amide, an imide, an urea and a derivative thereof. By including a solvent having an amide structure, stability over time of viscosity and stability over time of patterning characteristics are improved.
상기 아미드 구조를 가지는 용제로는 하기 식 (1) 또는 (2)로 나타내는 것을 이용하는 것이 바람직하다.As the solvent having the amide structure, it is preferable to use one represented by the following formula (1) or (2).
상기 식 (1) 중, R1은 각각 독립적으로 수소 원자 또는 알킬기를 나타내며, X는 수소 원자, 알킬기 또는 아미노기를 나타낸다.In the formula (1), each R 1 independently represents a hydrogen atom or an alkyl group, and X represents a hydrogen atom, an alkyl group or an amino group.
상기 식 (2) 중, R2, R3은 각각 수소 원자 또는 알킬기를 나타내며, n는 1∼3의 정수를 나타낸다.In the formula (2), R 2 and R 3 each represent a hydrogen atom or an alkyl group, and n represents an integer of 1 to 3.
R1, R2 및 R3은 바람직하게는, 수소 원자 또는 탄소수 1∼3의 알킬기이다. 또, n는 바람직하게는 1 또는 2이다.R 1 , R 2 and R 3 are preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms. N is preferably 1 or 2.
또, 상기 아미드 구조를 가지는 용제는 그 비점이 150∼250℃인 것이 바람직하다. 상기의 범위로 함으로써 착색 감광성 수지조성물을 기판상에 도포한 후의 건조시에 돌비 (突沸)를 일으키지 않고 도막으로부터 충분히 휘발 되므로, 표면 결함이나 표면 거침을 일으키기 어렵다.The solvent having the amide structure preferably has a boiling point of 150 to 250 캜. When the color photosensitive resin composition is applied to a substrate in the above-described range, it is difficult to cause surface defects or surface roughness since it is sufficiently volatilized from the coating film without causing boiling during drying after coating the substrate.
상기 식 (1) 또는 (2)로 나타내며, 비점이 150∼250℃인 아미드 구조를 가지는 용제로는, 1,1,3,3-테트라메틸우레아, 1,1,3,3-테트라에틸우레아, 디메틸포름아미드, 디에틸포름아미드, 디메틸아세트아미드, 1,3-디메틸-2-이미다졸리돈, 1,3-디메틸-3,4,5,6-테트라히드로-2(1H)-피리미디논, N,N-디메틸프로피온아미드, N-메틸아세트아미드, N-메틸포름아미드 등을 들 수 있다.Examples of the solvent having an amide structure represented by the above formula (1) or (2) and having a boiling point of 150 to 250 ° C include 1,1,3,3-tetramethylurea, 1,1,3,3-tetraethylurea , Dimethylformamide, diethylformamide, dimethylacetamide, 1,3-dimethyl-2-imidazolidone, 1,3-dimethyl-3,4,5,6-tetrahydro-2 (1H) N, N-dimethylpropionamide, N-methylacetamide, N-methylformamide and the like.
상기 아미드 구조를 가지는 용제는 일반적으로 착색 감광성 수지조성물에 이용되는 다른 용제와 조합해서 이용하는 것이 좋다. 일반적으로 이용되는 다른 용제로는 알칼리 가용성 수지, 광 중합성 모노머, 광중합 개시제, 무기 안료를 분산 또는 용해하고, 또한 이들 성분과 반응하지 않으며, 적절한 휘발성을 가지는 것을 이용하면 되며, 폴리알킬렌 글리콜 모노알킬 에테르류, 폴리알킬렌 글리콜 모노알킬 에테르 아세테이트류, 케톤류, 에스테르류, 방향족 탄화수소류를 들 수 있다.The solvent having the amide structure is generally used in combination with other solvents used in the colored photosensitive resin composition. Other commonly used solvents include those which disperse or dissolve an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, and an inorganic pigment, do not react with these components, and those having appropriate volatility may be used, and polyalkylene glycol mono Alkyl ethers, polyalkylene glycol monoalkyl ether acetates, ketones, esters, and aromatic hydrocarbons.
구체적으로는 에틸렌글리콜 모노메틸 에테르, 에틸렌글리콜 모노에틸 에테르, 에틸렌글리콜-n-프로필 에테르, 에틸렌글리콜 모노-n-부틸 에테르, 디에틸렌글리콜 모노메틸 에테르, 디에틸렌글리콜 모노에틸 에테르, 디에틸렌글리콜 모노-n-프로필 에테르, 디에틸렌글리콜 모노-n-부틸 에테르, 트리에틸렌글리콜 모노메틸 에테르, 트리에틸렌글리콜 모노에틸 에테르, 프로필렌글리콜 모노메틸 에테르, 프로필렌글리콜 모노에틸 에테르, 프로필렌글리콜 모노-n-프로필 에테르, 프로필렌글리콜 모노-n-부틸 에테르, 디프로필렌글리콜 모노메틸에테르, 디프로필렌글리콜 모노에틸 에테르, 디프로피릴렌글리콜 모노-n-프로필 에테르, 디프로필렌글리콜 모노-n-부틸 에테르, 트리프로필렌글리콜 모노메틸 에테르, 트리프로필렌글리콜 모노에틸 에테르 등의 (폴리)알킬렌글리콜 모노알킬 에테르류; 에틸렌글리콜 모노메틸 에테르 아세테이트, 에틸렌글리콜 모노에틸 에테르 아세테이트, 디에틸렌글리콜 모노메틸 에테르 아세테이트, 디에틸렌글리콜 모노에틸 에테르 아세테이트, 프로필렌글리콜 모노메틸 에테르 아세테이트, 프로필렌글리콜 모노에틸 에테르 아세테이트 등의 (폴리)알킬렌글리콜 모노알킬 에테르 아세테이트류; 디에틸렌글리콜 디메틸 에테르, 디에틸렌글리콜 메틸에틸 에테르, 디에틸렌글리콜 디에틸 에테르, 테트라히드로푸란 등의 다른 에테르류; 메틸 에틸 케톤, 시클로헥사논, 2-헵타논, 3-헵타논 등의 케톤류; 2-히드록시 프로피온산 메틸, 2-히드록시 프로피온산 에틸 등의 락트산 알킬 에스테르류; 2-히드록시-2-메틸 프로피온산 에틸, 3-메톡시 프로피온산 메틸, 3-메톡시 프로피온산 에틸, 3-에톡시 프로피온산 메틸, 3-에톡시 프로피온산 에틸, 에톡시 아세트산 에틸, 히드록시 아세트산 에틸, 2-히드록시-3-메틸 부탄산메틸, 3-메틸-3-메톡시 부틸 아세테이트, 3-메틸-3-메톡시부틸 프로피오네이트, 아세트산 에틸, 아세트산 n-프로필, 아세트산 이소프로필, 아세트산 n-부틸, 아세트산 이소부틸, 포름산 n-펜틸, 아세트산 이소펜틸, 프로피온산 n-부틸, 부티르산 에틸, 부티르산 n-프로필, 부티르산 이소프로필, 부티르산 n-부틸, 피루브산메틸, 피루브산에틸, 피루브산 n-프로필, 아세트 아세트산 메틸, 아세트 아세트산 에틸, 2-옥소 부탄산에틸 등의 다른 에스테르류; 톨루엔, 크실렌 등의 방향족 탄화수소류를 들 수 있다. 이들 용제는 단독으로 이용해도 되고, 2종 이상을 조합하여 이용할 수 있다.Specific examples include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono- , Propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl Ether, tripropylene glycol monoethyl ether and the like ) Alkylene glycol monoalkyl ether; (Poly) alkylene ethers such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate and propylene glycol monoethyl ether acetate. Glycol monoalkyl ether acetates; Other ethers such as diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether and tetrahydrofuran; Ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone and 3-heptanone; Lactic acid alkyl esters such as methyl 2-hydroxypropionate and ethyl 2-hydroxypropionate; Methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, Methyl-3-methoxybutyl propionate, ethyl acetate, n-propyl acetate, isopropyl acetate, n- Butyl acetate, isobutyl acetate, n-pentyl formate, isopentyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyl butyrate, ethyl pyruvate, n-propyl pyruvate, Other esters such as methyl, ethyl acetate and ethyl 2-oxobutanoate; And aromatic hydrocarbons such as toluene and xylene. These solvents may be used alone or in combination of two or more.
상기 용제 중에서도, 프로필렌 글리콜 모노메틸 에테르, 에틸렌글리콜 모노메틸 에테르 아세테이트, 프로필렌 글리콜 모노메틸 에테르 아세테이트, 프로필렌 글리콜 모노에틸 에테르 아세테이트, 디에틸렌글리콜 디메틸 에테르, 디에틸렌글리콜 메틸에틸 에테르, 시클로헥사논, 3-메톡시 부틸 아세테이트, 락트산 에틸, 에틸렌글리콜 모노에틸 에테르는 상기 무기 안료의 분산성을 양호하게 할 수 있기 때문에 바람직하며, 프로필렌 글리콜 모노메틸 에테르 아세테이트, 3-메톡시 부틸 아세테이트를 이용하는 것이 특히 바람직하다.Among these solvents, propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, cyclohexanone, 3- Methoxybutyl acetate, ethyl lactate, and ethylene glycol monoethyl ether are preferable because they can improve the dispersibility of the inorganic pigment, and propylene glycol monomethyl ether acetate and 3-methoxybutyl acetate are particularly preferably used.
이들 용제와, 상기 아미드 구조를 가지는 용제를 조합해서 착색 감광성 수지조성물용 용제로 하는 것이 바람직하고, 상기 아미드 구조를 가지는 용제를 전 용제 중에 1∼90 중량% 포함하는 것이 바람직하며, 1∼50 중량% 포함하는 것이 보다 바람직하다. The solvent and the solvent having the amide structure are preferably combined to form a solvent for the colored photosensitive resin composition. The solvent having the amide structure is preferably contained in an amount of 1 to 90 wt%, more preferably 1 to 50 wt% %.
용제의 함유량은 얻어진 착색 감광성 수지조성물의 도포성, 안정성 등의 관점으로부터 착색 감광성 수지조성물의 전 고형분의 합계 농도가 1∼50 중량%가 되는 양이 바람직하고, 5∼30 중량%가 되는 양이 보다 바람직하다.The content of the solvent is preferably such that the total concentration of the total solid content of the colored photosensitive resin composition is from 1 to 50% by weight, preferably from 5 to 30% by weight, from the viewpoint of coatability and stability of the obtained colored photosensitive resin composition More preferable.
본 발명에 관련되는 착색 감광성 수지조성물은 필요에 따라서 여러 가지 첨가제를 함유할 수도 있다.The colored photosensitive resin composition according to the present invention may contain various additives as required.
첨가제로는, 예를 들면 유리, 알루미나 등의 충전제; 폴리비닐 알코올, 폴리(플루오로알킬아크릴레이트)류 등의 고분자 화합물; 불소계 계면활성제, 실리콘계 계면활성제 등의 계면활성제; 비닐트리메톡시실란, 비닐트리에톡시실란, 비닐트리스(2-메톡시 에톡시)실란, N-(2-아미노 에틸)-3-아미노프로필메틸디메톡시실란, N-(2-아미노 에틸)-3-아미노프로필트리메톡시실란, 3-아미노프로필트리에톡시실란, 3-글리시독시프로필트리메톡시실란, 3-글리시독시프로필메틸디메톡시실란, 2-(3,4-에폭시시클로헥실)에틸트리메톡시실란, 3-클로로프로필메틸디메톡시실란, 3-클로로프로필트리메톡시실란, 3-메타크릴로일옥시프로필트리메톡시실란, 3-머르캅토프로필트리메톡시실란 등의 밀착 촉진제; 2,2-티오비스(4-메틸-6-t-부틸페놀), 2,6-디-t-부틸 페놀 등의 산화 방지제; 2-(3-t-부틸-5-메틸-2-히드록시페닐)-5-클로로벤조트리아졸, 알콕시벤조페논류 등의 자외선 흡수제; 폴리아크릴산 나트륨 등의 응집 방지제; 말론산, 아디프산, 이타콘산, 시트라콘산, 푸말산, 메사콘산, 2-아미노 에탄올, 3-아미노-1-프로판올, 5-아미노-1-펜탄올, 3-아미노-1,2-프로판디올, 2-아미노-1,3-프로판디올, 4-아미노-1,2-부탄디올 등의 잔사 개선제 등을 들 수 있다.Examples of the additive include fillers such as glass and alumina; High molecular compounds such as polyvinyl alcohol and poly (fluoroalkyl acrylate); Surfactants such as fluorine-based surfactants and silicone-based surfactants; Vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) Aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2- (3,4-epoxycyclo Hexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloyloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane and the like Adhesion promoters; Antioxidants such as 2,2-thiobis (4-methyl-6-t-butylphenol) and 2,6-di-t-butylphenol; Ultraviolet absorbers such as 2- (3-t-butyl-5-methyl-2-hydroxyphenyl) -5-chlorobenzotriazole and alkoxybenzophenones; An anti-aggregation agent such as sodium polyacrylate; Amino-1-propanol, 5-amino-1-pentanol, 3-amino-1, 2-pentanone, Propanediol, 2-amino-1,3-propanediol, 4-amino-1,2-butanediol, and the like.
본 발명에 있어서, 착색 감광성 수지조성물은 적절한 방법에 의해 조제할 수 있다. 바람직한 착색 감광성 수지조성물의 조제 방법으로는 무기 안료를 용제 중, 필요에 따라서 첨가하는 다른 분산제의 존재하에서, 경우에 따라서는 알칼리 가용성 수지의 일부와 함께, 예를 들면 비즈밀, 롤밀 등을 이용하여, 분쇄하면서 혼합·분산하여 분산액으로 하고, 그 다음에 이 분산액에 알칼리 가용성 수지, 광 중합성 모노머, 광중합 개시제와 필요에 따라서 추가로 용제나 첨가제를 더 첨가하여, 혼합함으로써 조제하는 방법을 들 수 있다.In the present invention, the colored photosensitive resin composition can be prepared by an appropriate method. As a method for preparing a preferable colored photosensitive resin composition, there may be mentioned, in some cases, a method in which an inorganic pigment is added in a solvent in the presence of other dispersing agent, if necessary, , A method of preparing a dispersion by mixing and dispersing while pulverizing, and then adding an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator and, if necessary, a solvent and an additive to the dispersion, have.
이와 같이 조제된 착색 감광성 수지조성물은 점도 및 패터닝 특성의 시간 경과 안정성이 우수하다.The thus-prepared colored photosensitive resin composition is excellent in viscosity and patterning characteristics with respect to time-course stability.
≪컬러 필터, 표시장치≫«Color filter, display device»
본 발명에 관련되는 컬러 필터는 본 발명에 관련되는 착색 감광성 수지조성물을 이용해 형성된 착색층을 구비한 것이다. 기판상 혹은 미리 원하는 패턴의 차광층을 형성한 기판상에 착색 감광성 수지조성물을 이용해 도막을 형성하고, 상기 도막에 대해서 소정 패턴 형상으로 방사선을 조사하고, 현상함으로써, 예를 들면 액정 표시 디스플레이의 컬러 필터의 화소나 블랙 매트릭스를 형성할 수 있다.The color filter according to the present invention comprises a colored layer formed using the colored photosensitive resin composition according to the present invention. A coating film is formed on a substrate or on a substrate on which a light-shielding layer with a desired pattern is formed in advance by using a colored photosensitive resin composition, and the coating film is irradiated with radiation in a predetermined pattern shape and developed, A pixel of the filter or a black matrix can be formed.
본 발명에 관련되는 표시장치는 이러한 컬러 필터를 구비한 것이며, 표시장치로서 액정 표시 디스플레이나 유기 EL 디스플레이 등을 들 수 있다.The display device according to the present invention is provided with such a color filter, and a liquid crystal display display, an organic EL display, or the like can be given as a display device.
실시예Example
이하, 본 발명을 실시예에 근거하여 추가로 구체적으로 설명하지만, 본 발명은 이러한 실시예에 아무런 제약을 받지 않는다.Hereinafter, the present invention will be described more specifically based on examples, but the present invention is not limited to these embodiments.
<착색 감광성 수지조성물의 조제>≪ Preparation of colored photosensitive resin composition >
[실시예 1][Example 1]
이하의 각 성분을 혼합하고, 혼합물을 1시간 교반한 후, 5㎛의 멤브레인 필터로 여과하여 착색 감광성 수지조성물을 조제했다.The following components were mixed and the mixture was stirred for 1 hour and then filtered through a membrane filter of 5 占 퐉 to prepare a colored photosensitive resin composition.
·알칼리 가용성 수지· Alkali-soluble resin
수지 A (고형분 55%, 용제:3-메톡시 부틸 아세테이트)…60 중량부Resin A (solid content: 55%, solvent: 3-methoxybutyl acetate) 60 parts by weight
·광 중합성 모노머· Photopolymerizable monomer
디펜타에리트리톨헥사아크릴레이트 (일본화약사제)…25 중량부Dipentaerythritol hexaacrylate (manufactured by Nippon Yakuzaku Co., Ltd.) ... 25 parts by weight
·광중합 개시제· Photopolymerization initiator
에타논,1-[9-에틸-6-(2-메틸벤조일)-9H-카바졸-3-일]-,1-(o-아세틸옥심) 「IRGACURE OXE-02」(상품명:BASF 사제)…15 중량부(Trade name: BASF), 1- (9-ethyl-6- (2-methylbenzoyl) -9H-carbazol- ... 15 parts by weight
·무기 안료· Inorganic pigments
카본 분산액 「CF 블랙」(상품명: 미쿠니색소사제 고형분 25% 용제: 3-메톡시 부틸 아세테이트…400 중량부Carbon dispersion "CF Black" (trade name: 25% solids by Mikuni Color Co., Ltd. Solvent: 3-methoxybutyl acetate 400 parts by weight
·용제·solvent
3-메톡시 부틸 아세테이트/1,1,3,3-테트라메틸우레아/프로필렌 글리콜 모노메틸 아세테이트 = 55/10/35 (중량비)…300 중량부3-methoxybutyl acetate / 1,1,3,3-tetramethylurea / propylene glycol monomethyl acetate = 55/10/35 (by weight) 300 parts by weight
상기 수지 A의 합성법은 하기와 같다.The synthesis method of the resin A is as follows.
우선, 500㎖ 사구 플라스크 중에 비스페놀 플루오렌형 에폭시 수지 (에폭시 당량 235) 235g, 테트라메틸암모늄 클로라이드 110mg, 2,6-디-tert-부틸-4-메틸 페놀 100mg 및 아크릴산 72.0g을 투입하고, 이에 25㎖/분의 속도로 공기를 불어넣으면서 90∼100℃에서 가열 용해하였다. 다음에, 용액이 백탁한 상태대로 서서히 승온하여, 120℃에서 가열해 완전 용해 시켰다. 이때, 용액은 점차로 투명 점조 (粘稠)가 되었지만, 그대로 교반을 계속하였다. 이 사이, 산가를 측정하고, 1.0mg KOH/g 미만이 될 때까지 가열 교반을 계속하였다. 산가가 목표값에 이를 때까지 12시간을 필요로 했다. 그리고 실온까지 냉각하여, 무색 투명에 고체상의 하기 식 (a-4)로 나타내는 비스페놀 플루오렌형 에폭시 아크릴레이트를 얻었다.First, 235 g of bisphenol fluorene type epoxy resin (epoxy equivalent 235), 110 mg of tetramethylammonium chloride, 100 mg of 2,6-di-tert-butyl-4-methylphenol and 72.0 g of acrylic acid were introduced into a 500 ml four- And heated and dissolved at 90 to 100 占 폚 while blowing air at a rate of 25 ml / min. Then, the solution was slowly heated in a cloudy state, and completely dissolved by heating at 120 占 폚. At this time, the solution became gradually transparent (viscous), but stirring was continued. During this period, the acid value was measured, and heating and stirring were continued until the concentration was less than 1.0 mg KOH / g. It took 12 hours until the acid value reached the target value. The mixture was cooled to room temperature to obtain a bisphenol fluorene-type epoxy acrylate represented by the following formula (a-4) as a colorless transparent solid.
그 다음에, 이와 같이 하여 얻어진 상기의 비스페놀 플루오렌형 에폭시 아크릴레이트 307.0g에 3-메톡시 부틸 아세테이트 600g을 추가로 용해한 후, 벤조페논테트라카르복시산 2무수물 80.5g 및 브롬화 테트라에틸 암모늄 1g을 혼합하고, 서서히 승온하여 110∼115℃에서 4시간 반응시켰다. 산무수물 기의 소실을 확인한 후, 1,2,3,6-테트라히드로 무수 프탈산 38.0g을 혼합하고, 90℃에서 6시간 반응시켜 수지 A를 얻었다. 산무수물 기의 소실은 IR 스펙트럼에 의해 확인하였다.Subsequently, 600 g of 3-methoxybutyl acetate was further dissolved in 307.0 g of the bisphenol fluorene-type epoxy acrylate thus obtained, and then 80.5 g of benzophenone tetracarboxylic dianhydride and 1 g of tetraethylammonium bromide were mixed , The temperature was gradually raised, and the reaction was carried out at 110 to 115 ° C for 4 hours. After disappearance of the acid anhydride group was confirmed, 38.0 g of 1,2,3,6-tetrahydrophthalic anhydride was mixed and reacted at 90 DEG C for 6 hours to obtain a resin A. The disappearance of the acid anhydride group was confirmed by IR spectrum.
또한, 이 수지 A는 상기 식(a-1)로 표시되는 화합물에 상당한다.This resin A corresponds to the compound represented by the above formula (a-1).
[실시예 2∼10 및 비교예 1∼9][Examples 2 to 10 and Comparative Examples 1 to 9]
용제의 혼합 비율(중량비)을 표 1과 같이 변화시킨 것 이외에는 실시예 1과 동일하게 하여 착색 감광성 수지조성물을 조제했다.A colored photosensitive resin composition was prepared in the same manner as in Example 1 except that the mixing ratio (weight ratio) of the solvent was changed as shown in Table 1.
[표 1][Table 1]
MBA: 3-메톡시 부틸 아세테이트MBA: 3-methoxybutylacetate
PGMEA: 프로필렌 글리콜 모노메틸 에테르 아세테이트PGMEA: Propylene glycol monomethyl ether acetate
EL: 에틸락테이트EL: ethyl lactate
에틸 셀로솔브: 에틸렌글리콜 모노에틸 에테르Ethyl Cellosolve: Ethylene glycol monoethyl ether
AN: 시클로헥사논AN: cyclohexanone
γ-BL: γ-부티로락톤? -BL:? -butyrolactone
δ-VL: δ-발레로락톤? -VL:? -valerolactone
ε-CL: ε-카프로락톤? -CL:? -caprolactone
TMU: 1,1,3,3-테트라메틸우레아TMU: 1,1,3,3-tetramethylurea
DMF: 메틸포름아미드DMF: methylformamide
DMAC: 디메틸아세트아미드DMAC: Dimethylacetamide
DMI:1,3-디메틸-2-이미다졸리돈DMI: 1,3-dimethyl-2-imidazolidone
<착색 감광성 수지조성물의 평가>≪ Evaluation of colored photosensitive resin composition >
[점도 안정성 평가][Evaluation of viscosity stability]
실시예 1∼10, 비교예 1∼9의 착색 감광성 수지조성물을 조제 초기 단계와, 25℃에서 7일간 보관한 후에 E형 점도계를 이용해 점도를 측정해서 초기와 보관 후의 점도 차이를 구했다. 평가 지표는 점도차 0.1 미만을 ○으로 하고, 0.1 이상을 ×로서 평가하였다. 결과를 표 2에 나타낸다.After the colored photosensitive resin compositions of Examples 1 to 10 and Comparative Examples 1 to 9 were stored at the initial stage of preparation and at 25 ° C for 7 days, the viscosity was measured using an E-type viscometer to determine the viscosity difference between the initial stage and after storage. The evaluation indexes were evaluated as & cir & The results are shown in Table 2.
[표 2][Table 2]
표 2로부터 알 수 있는 바와 같이, 용제 중에 아미드 구조를 가지는 용제인 1,1,3,3-테트라메틸우레아, 디메틸포름아미드, 디메틸아세트아미드, 1,3-디메틸-2-이미다졸리논을 함유했을 경우는 7일간 보관 후에도 초기 점도와의 차이가 0.03∼0.04이며, 점도의 시간 경과 안정성이 우수하였다. As can be seen from Table 2, it was confirmed that 1,1,3,3-tetramethylurea, dimethylformamide, dimethylacetamide and 1,3-dimethyl-2-imidazolidinone, which are solvents having an amide structure in the solvent, , The difference from the initial viscosity was 0.03 to 0.04 even after storage for 7 days, and the stability of the viscosity over time was excellent.
용제 중에,δ-발레로락톤,ε-카프로락톤을 함유한 경우에도 점도의 시간 경과 안정성이 뛰어났다.Even when the solvent contains 隆 -valerolactone and 竜 -caprolactone, the viscosity stability over time is excellent.
[패터닝 특성 안정성 평가][Evaluation of Stability of Patterning Characteristics]
실시예 1∼10, 비교예 1∼9의 착색 감광성 수지조성물을 조제 초기 단계와 25℃에서 7일간 보관한 후에, 각각 다른 유리 기판 (10 mm×10 mm) 상에 스핀 코터 (코닝사제, Eagle-XG)를 이용해 도포하고, 핫 플레이트상에서 90℃에서 120초간 프리베이크를 실시하여, 막 두께 1.0㎛의 도막을 형성하였다. 그 다음에, 이 도막을 미러 프로젝션 얼라이너 (탑콘사제, TME-150 RTO)를 이용해 50mJ/㎠ (노광 갭 50㎛)으로 노광하였다. 노광시에는 선폭 치수 4, 6, 8, 10, 12, 14, 16, 18, 20㎛인 각 마스크를 통하여 노광하였다. 노광 후 26℃에서 0.04 중량% KOH 수용액으로 60초간 현상한 후, 광학 현미경으로 각 선폭의 해상 유무를 확인하고, 패터닝되어 있는 제일 가는 선을 확인하였다. 초기와 보관 후에 패터닝된 제일 가는 선폭의 차이를 구해, 그 차이가 0㎛인 경우는 ◎, 2∼4㎛에서는 ○, 6㎛ 이상인 경우는 ×라고 평가하였다. 결과를 표 3에 나타낸다.After the colored photosensitive resin compositions of Examples 1 to 10 and Comparative Examples 1 to 9 were stored at the initial stage of preparation and at 25 占 폚 for 7 days, a spin coater (Eagle Co., -XG), and prebaked on a hot plate at 90 DEG C for 120 seconds to form a coating film having a thickness of 1.0 mu m. Next, this coating film was irradiated with 50 mJ / cm < 2 > using a mirror projection aligner (TME-150 RTO) (Exposure gap: 50 mu m). And exposed through respective masks having line widths of 4, 6, 8, 10, 12, 14, 16, 18, and 20 탆. After the exposure, the resist film was developed with a 0.04% by weight KOH aqueous solution at 26 캜 for 60 seconds, and the presence or absence of each line width was confirmed by an optical microscope to confirm the patterned thinning line. The difference between the initial value and the patterned line width after storage was obtained. The difference was evaluated as? When the difference was 0 占,? When the difference was 2 to 4 占 퐉, and? When the difference was 6 占 퐉 or more. The results are shown in Table 3.
[표 3][Table 3]
표 3으로부터 알 수 있는 바와 같이, 어느 쪽 착색 감광성 수지조성물도, 조제 초기에는 양호한 미소 패터닝 특성을 나타내고 있었다. 용제 중에 아미드 구조를 가지는 용제인 1,1,3,3-테트라메틸우레아, 디메틸 포름아미드, 디메틸아세트아미드, 1,3-디메틸-2-이미다졸리논을 함유한 경우에는 7일간 보관 후에도 초기와 변함없는 양호한 미소 패터닝 특성을 나타내고 있어, 패터닝 특성의 시간 경과 안정성이 뛰어났다. 한편, 그 외의 경우에는 패터닝 특성의 열화를 볼 수 있었다. 특히, 점도의 시간 경과 안정성이 우수한 비교예 8, 9에서는 패터닝 특성의 열화가 현저했다.As can be seen from Table 3, both of the colored photosensitive resin compositions showed good minute patterning characteristics at the beginning of preparation. When the solvent contains 1,1,3,3-tetramethylurea, dimethylformamide, dimethylacetamide and 1,3-dimethyl-2-imidazolidinone, which are solvents having an amide structure, And good micropatterning characteristics. Thus, the patterning characteristics were excellent over time and stability. On the other hand, in other cases, deterioration of the patterning characteristics was observed. Particularly, in Comparative Examples 8 and 9, in which stability of viscosity over time was excellent, deterioration of the patterning property was remarkable.
이와 같이, 알칼리 가용성 수지, 광 중합성 모노머, 광중합 개시제, 무기 안료, 용제를 함유하는 착색 감광성 수지조성물에 있어서, 용제에 아미드 구조를 가지는 용제를 포함하면 점도 및 패터닝 특성의 시간 경과 안정성이 뛰어난 것을 얻을 수 있었다.As described above, when a solvent having an amide structure is contained in a solvent in a colored photosensitive resin composition containing an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, an inorganic pigment, and a solvent, .
Claims (6)
상기 아미드 구조를 가지는 용제는 1,1,3,3-테트라메틸우레아, 1,1,3,3-테트라에틸우레아, 1,3-디메틸-2-이미다졸리돈, 1,3-디메틸-3,4,5,6-테트라히드로-2(1H)-피리미디논, N,N-디메틸프로피온아미드, N-메틸아세트아미드 및 N-메틸포름아미드로 구성되는 군에서 선택되는 적어도 하나인 착색 감광성 수지 조성물.A colored photosensitive resin composition comprising an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, an inorganic pigment, and a solvent, wherein the solvent comprises a solvent having an amide structure,
The solvent having an amide structure may be 1,1,3,3-tetramethylurea, 1,1,3,3-tetraethylurea, 1,3-dimethyl-2-imidazolidone, 1,3- At least one coloring selected from the group consisting of 3,4,5,6-tetrahydro-2 (1H) -pyrimidinone, N, N-dimethylpropionamide, N-methylacetamide, Sensitive resin composition.
상기 아미드 구조를 가지는 용제의 비점은 150∼250℃인 착색 감광성 수지 조성물.The method according to claim 1,
Wherein the solvent having the amide structure has a boiling point of 150 to 250 캜.
상기 용제가 아미드 구조를 가지는 용제와, 프로필렌 글리콜 모노메틸 에테르 아세테이트, 3-메톡시 부틸 아세테이트, 락트산 에틸 및 에틸렌글리콜 모노에틸 에테르로 이루어지는 군으로부터 선택되는 적어도 하나를 포함하고,
상기 아미드 구조를 가지는 용제는 1,1,3,3-테트라메틸우레아, 디메틸포름아미드 및 1,3-디메틸-2-이미다졸리돈으로 이루어지는 군으로부터 선택되는 적어도 하나인, 착색 감광성 수지 조성물.1. A colored photosensitive resin composition comprising an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, an inorganic pigment, and a solvent,
Wherein the solvent contains at least one selected from the group consisting of a solvent having an amide structure and propylene glycol monomethyl ether acetate, 3-methoxybutyl acetate, ethyl lactate and ethylene glycol monoethyl ether,
Wherein the solvent having the amide structure is at least one selected from the group consisting of 1,1,3,3-tetramethylurea, dimethylformamide and 1,3-dimethyl-2-imidazolidone.
상기 아미드 구조를 가지는 용제의 비율은 전체 용제 중 1∼90 중량%인 착색 감광성 수지 조성물.The method according to any one of claims 1 and 3,
The proportion of the solvent having the amide structure is 1 to 90% by weight of the total solvent.
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| JP2011209397A JP5819693B2 (en) | 2011-09-26 | 2011-09-26 | Colored photosensitive resin composition, color filter and display device |
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| KR1020120106542A Ceased KR20130033329A (en) | 2011-09-26 | 2012-09-25 | Colored photosensitive resin composition, color filter and display device |
| KR1020180063352A Active KR101899290B1 (en) | 2011-09-26 | 2018-06-01 | Colored photosensitive resin composition, color filter and display device |
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| KR1020120106542A Ceased KR20130033329A (en) | 2011-09-26 | 2012-09-25 | Colored photosensitive resin composition, color filter and display device |
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| JP (1) | JP5819693B2 (en) |
| KR (2) | KR20130033329A (en) |
| CN (1) | CN103116243B (en) |
| TW (1) | TW201329625A (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6168884B2 (en) * | 2013-07-05 | 2017-07-26 | 東京応化工業株式会社 | Negative photosensitive resin composition |
| TWI637936B (en) * | 2013-09-25 | 2018-10-11 | 日商東京應化工業股份有限公司 | Radiation-sensitive composition and pattern manufacturing method |
| TWI516871B (en) * | 2013-10-25 | 2016-01-11 | 臺灣永光化學工業股份有限公司 | Negative-type photoresist composition for thick film and use thereof |
| CN104238269A (en) * | 2014-09-19 | 2014-12-24 | 江苏博砚电子科技有限公司 | Photosensitive resin composition and application thereof |
| JP6481441B2 (en) * | 2015-03-18 | 2019-03-13 | 東洋インキScホールディングス株式会社 | Polymerization accelerator and polymerizable composition using the same |
| TWI553410B (en) * | 2015-10-08 | 2016-10-11 | 新應材股份有限公司 | Composition, infrared permeable filter, manufacturing method thereof and infrared sensor |
| CN105504120B (en) * | 2015-11-30 | 2018-09-21 | 东莞职业技术学院 | Bisphenol fluorene acrylic resin and preparation method thereof, quantum dot-colored photosensitive resin composition and preparation method and application thereof |
| JP2021105711A (en) * | 2019-12-26 | 2021-07-26 | 日鉄ケミカル&マテリアル株式会社 | Photosensitive resin composition for black resist and light-shielding film obtained by curing the same; color filter and touch panel having the light-shielding film; and display having the color filter and touch panel |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001305729A (en) | 2000-04-18 | 2001-11-02 | Daicel Chem Ind Ltd | Water or diluted alkali developing type photocurable resin composition |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69911558T2 (en) * | 1998-07-14 | 2004-06-24 | Brewer Science, Inc. | PHOTO SENSITIVE COMPOSITION FOR BLACK MATRIX AND METHOD FOR PRODUCING THE COMPOSITION |
| US20020009501A1 (en) * | 1998-07-23 | 2002-01-24 | Eric Dupont | Preparation of cartilage extracts using organic solvents |
| JP4084599B2 (en) | 2002-05-13 | 2008-04-30 | 富士フイルム株式会社 | Colored photosensitive resin composition and color filter |
| JP4699053B2 (en) * | 2005-03-10 | 2011-06-08 | 東京応化工業株式会社 | Photosensitive resin composition for color filter and color filter |
| JP2006259461A (en) * | 2005-03-18 | 2006-09-28 | Tokyo Ohka Kogyo Co Ltd | Photosensitive resin composition and color filter |
| JP4675693B2 (en) * | 2005-06-23 | 2011-04-27 | 東京応化工業株式会社 | Photosensitive resin composition |
| JP4745110B2 (en) * | 2006-04-19 | 2011-08-10 | 東京応化工業株式会社 | Photosensitive composition and color filter formed with the photosensitive composition |
| KR20090023152A (en) * | 2007-08-29 | 2009-03-04 | 후지필름 가부시키가이샤 | Method for producing organic pigment nanoparticles, organic pigment nanoparticle powder, pigment dispersion, colored photosensitive resin composition, inkjet ink, photosensitive resin transfer material, and color filter and liquid crystal display device using the same |
| JP5020142B2 (en) * | 2008-03-26 | 2012-09-05 | 凸版印刷株式会社 | Color resist composition and color filter using the composition |
| KR20100037547A (en) * | 2008-10-01 | 2010-04-09 | 도쿄 오카 고교 가부시키가이샤 | Photosensitive resin composition, color filter and liquid crystal display |
| JP5329192B2 (en) * | 2008-11-27 | 2013-10-30 | 東京応化工業株式会社 | Photosensitive resin composition |
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2011
- 2011-09-26 JP JP2011209397A patent/JP5819693B2/en active Active
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- 2012-09-13 TW TW101133472A patent/TW201329625A/en unknown
- 2012-09-19 CN CN201210350124.3A patent/CN103116243B/en active Active
- 2012-09-25 KR KR1020120106542A patent/KR20130033329A/en not_active Ceased
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001305729A (en) | 2000-04-18 | 2001-11-02 | Daicel Chem Ind Ltd | Water or diluted alkali developing type photocurable resin composition |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5819693B2 (en) | 2015-11-24 |
| KR20180064354A (en) | 2018-06-14 |
| CN103116243B (en) | 2018-06-15 |
| JP2013072882A (en) | 2013-04-22 |
| TW201329625A (en) | 2013-07-16 |
| CN103116243A (en) | 2013-05-22 |
| KR20130033329A (en) | 2013-04-03 |
| TWI560518B (en) | 2016-12-01 |
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