KR102357431B1 - Apparatus For Analyzing Substrate Contamination And Method Thereof - Google Patents

Abstract

A substrate contamination analysis apparatus according to the present invention is a substrate contamination analysis apparatus that transfers a sample solution scanned from a substrate to be analyzed using a scan nozzle through a flow path from the scan nozzle to the analyzer, and has a space in which the sample solution is to be loaded. sample tube; a switching valve coupled to the sample tube and having at least a rod position at which the sample solution is loaded into the sample tube and an injection position for injecting the loaded sample solution toward the analyzer; It is characterized in that it further comprises; a detection sensor that includes a gas section before and after the sample solution and is installed in the sample tube to distinguish and detect the gas section and the sample solution when loaded in the sample solution.
According to the present invention, since the sample solution can be detected and loaded according to the arrival of the sample tube, accurate loading of the sample solution is possible and loss of the sample solution is prevented, and less sample solution can be used and the sample tube from the scan nozzle It has the effect of being able to move at high speed.

Description

Apparatus For Analyzing Substrate Contamination And Method Thereof

The present invention relates to a substrate contaminant analysis apparatus and a substrate contaminant analysis method capable of analyzing contaminants such as metal atoms in-line.

As a conventional contaminant analysis apparatus for semiconductor wafers, Korean Patent No. 3833264 (notice on May 9, 2003) is known, and the contaminant analysis apparatus automatically analyzes the surface of the wafer in order to analyze the metallic contamination source adsorbed on the wafer surface. A device structure for collecting contaminants by scanning with a

However, in the above-described substrate contaminant analysis device, the operator puts the scanned sample in a sampling cup and takes it to the analyzer for analysis. impediments to rapid analysis.

In addition, in the conventional apparatus and method for analyzing contaminants, there are inconveniences in manufacturing chemical solutions necessary for scanning and etching, contaminant control problems, calibration problems of the analyzer, and a decrease in sensitivity during use, and the problem of having to discard the monitor wafer used for analysis. have.

The recognition of the problems and problems of the prior art is not obvious to those of ordinary skill in the technical field of the present invention, so the inventive step of the present invention in comparison with the prior art should not be judged based on this recognition. make it clear

Republic of Korea Patent No. 383264, 2003. 5. 9. Announcement

It is an object of the present invention to provide an apparatus and method for analyzing substrate contaminants that solve at least one or more of the problems of the prior art,

An object of the present invention is to provide an apparatus and method for analyzing substrate contaminants that do not require manual work by workers, solve contamination and safety problems in the moving process, and enable real-time or rapid analysis.

Another object of the present invention is to provide an apparatus and method for analyzing substrate contamination, which solves the inconvenience of manufacturing a chemical solution, contamination control problem, analyzer calibration problem, and sensitivity degradation problem during use.

Another object of the present invention is to provide a substrate contaminant analysis apparatus and an analysis method capable of recycling a monitor wafer used for analysis.

Another object of the present invention is to provide an apparatus and method for analyzing substrate contaminants that can be automatically analyzed in-line.

The technical problems to be achieved in the present invention are not limited to the technical problems mentioned above, and other technical problems not mentioned will be clearly understood by those of ordinary skill in the art to which the present invention belongs from the description below. will be able

A substrate contamination analysis apparatus according to an aspect of the present invention is a substrate contamination analysis apparatus for transferring a sample solution scanned from a substrate to be analyzed using a scan nozzle through a flow path from the scan nozzle to the analyzer,

a sample tube having a space into which the sample solution is to be loaded; a switching valve coupled to the sample tube and having at least a rod position at which the sample solution is loaded into the sample tube and an injection position for injecting the loaded sample solution toward the analyzer; It is characterized in that it further comprises; a detection sensor that includes a gas section before and after the sample solution and is installed in the sample tube to distinguish and detect the gas section and the sample solution when loaded in the sample solution.

In the above-described substrate contaminant analysis apparatus, the detection sensor is a liquid detection sensor.

In the above-described substrate contaminant analysis apparatus, the liquid detection sensor is an optical sensor or a proximity sensor.

In the above-described apparatus for analyzing substrate contaminants, when the detection sensor senses gas and liquid in the order of the load position, it is determined that the sample solution arrives at the sample tube from the scan nozzle.

In the above-described apparatus for analyzing substrate contaminants, when the detection sensor detects a liquid and a gas in the order of the injection position, it is determined that the sample solution moves toward the analyzer.

A substrate contamination analysis apparatus according to an aspect of the present invention is a substrate contamination analysis apparatus for transferring a sample solution scanned from a substrate to be analyzed using a scan nozzle through a flow path from the scan nozzle to the analyzer,

a sample tube having a space into which the sample solution is to be loaded; a switching valve coupled to the sample tube and having at least a rod position at which the sample solution is loaded into the sample tube and an injection position for injecting the loaded sample solution toward the analyzer; In parallel with injecting into the analyzer, at least the flow path from the scan nozzle to the switching valve is cleaned.

In the above-described substrate contaminant analysis apparatus, comprising: a first metering pump used to load the sample solution into the sample tube and a first pump used for cleaning, the first metering pump and the first pump is connected to the same port of the switching valve, and the first pump has a larger capacity than the first metering pump.

In the above-described substrate contaminant analysis apparatus, a second metering pump that pushes the loaded sample solution toward the analyzer as ultrapure water when it is in the injection position; characterized in that it further comprises.

In the above-described apparatus for analyzing substrate contamination, the sample tube is a sample loop.

In the above-described apparatus for analyzing substrate contamination, the switching valve is a 6-port injection valve.

A substrate contamination analysis method according to an aspect of the present invention is a substrate contamination analysis method executed in a substrate contamination analysis apparatus that transfers a sample solution scanned from a substrate to be analyzed using a scan nozzle through a flow path from the scan nozzle to the analyzer. ,

a first step of loading the scanned sample solution into a sample tube located in the middle of the flow path; and a second step of injecting the sample solution loaded into the sample tube towards the analyzer, including, but not limited to, a gas section before and after the sample solution, and in the first step or the second step, the It is characterized in that the arrival or movement of the sample solution is sensed using a detection sensor installed in the sample tube and detecting the gas section and the sample solution by distinguishing them.

In the above-described substrate contaminant analysis method, the detection sensor is a liquid detection sensor.

In the above-described substrate contaminant analysis method, the liquid detection sensor is an optical sensor or a proximity sensor.

In the above-described substrate contaminant analysis method, in the first step, when the detection sensor detects a gas and a liquid in order, it is determined that the sample solution arrives at the sample tube from the scan nozzle.

In the above-described substrate contaminant analysis method, when the detection sensor does not detect the liquid in the first step, it is determined that the sample solution is lost.

In the above-described substrate contaminant analysis method, in the second step, when the detection sensor detects a liquid and a gas in the order, it is determined that the sample solution moves toward the analyzer.

In the above-described substrate contaminant analysis method, when the detection sensor does not detect a change from liquid to gas in the second step, it is determined that there is an abnormality.

A substrate contamination analysis method according to an aspect of the present invention is a substrate contamination analysis method executed in a substrate contamination analysis apparatus that transfers a sample solution scanned from a substrate to be analyzed using a scan nozzle through a flow path from the scan nozzle to the analyzer. ,

a first step of loading the scanned sample solution into a sample tube located in the middle of the flow path; and a second step of injecting the sample solution loaded into the sample tube toward the analyzer. In parallel with the second step, cleaning including at least a section from the scan nozzle to the front of the sample tube characterized.

In the above-described method for analyzing substrate contamination, the cleaning is performed by inserting the scan nozzle into a cleaning solution container and then sucking it using a pump.

In the above-described method for analyzing substrate contamination, after the cleaning, before the first step is performed again, air or gas is filled in a flow path including at least a section from the scan nozzle to the front of the sample tube.

In the above-described method for analyzing substrate contamination, different pumps are used in the loading and cleaning in the first step, and a pump having a larger suction speed is used in the cleaning.

In the above-described method for analyzing substrate contamination, a second metering pump that pushes the loaded sample solution toward the analyzer as ultrapure water in the second step is used.

In the above-described method for analyzing substrate contamination, the sample tube is a sample loop.

In the above-described substrate contamination analysis method, a switching valve coupled to the sample tube and having at least a rod position at which the sample solution is loaded into the sample tube and an injection position for injecting the loaded sample solution toward the analyzer is used. characterized in that

In the above-described method for analyzing substrate contamination, the switching valve is a 6-port injection valve.

A substrate contamination analysis device according to an aspect of the present invention is a substrate contamination analysis device for transferring a sample solution sucked from a substrate to be analyzed using a nozzle through a flow path from the nozzle to the analyzer,

A standard solution introduction part that is coupled using a T-tube in the middle of the flow path to which the sample solution is transferred and can introduce a standard solution for calibration into the flow path; including, wherein the standard solution introduction part is loaded with the standard solution sample tube with space to be; and a switching valve coupled to the sample tube and having at least a rod position at which the standard solution is loaded into the sample tube and an injection position for injecting the loaded standard solution toward the T-tube.

In the above-described substrate contaminant analysis apparatus, in the load position, the standard solution is drained every predetermined time or before calibration.

In the above-described apparatus for analyzing substrate contaminants, it is characterized in that the loaded standard solution is pushed as ultrapure water using a metering pump at the injection position.

In the above-described apparatus for analyzing substrate contamination, at least when the sample solution is transferred through the T-tube, at least a flow path between the T-tube and the switching valve is filled with the ultrapure water.

In the above-described apparatus for analyzing substrate contamination, the sample tube is a sample loop.

In the above-described apparatus for analyzing substrate contamination, the switching valve is a 6-port injection valve.

A substrate contamination analysis device according to an aspect of the present invention is a substrate contamination analysis device for transferring a sample solution sucked from a substrate to be analyzed using a nozzle through a flow path from the nozzle to the analyzer,

a sample solution introduction unit for loading the sample solution and then injecting the sample solution toward the analyzer; and a standard solution introduction unit coupled to the flow path between the sample solution introduction unit and the analyzer using a T-tube to introduce a standard solution for calibration, wherein the sample solution introduction unit injects the sample solution toward the analyzer It includes an ultrapure water carrier that pushes the sample solution with ultrapure water when doing, and it is characterized in that the ultrapure water carrier portion is commonly used even when diluting the standard solution for calibration.

A substrate contamination analysis device according to an aspect of the present invention is a substrate contamination analysis device that transfers a sample solution sucked from a substrate to be analyzed using a nozzle through a flow path from the nozzle to the analyzer, and after loading the sample solution, the a sample solution inlet for injecting the sample solution toward the analyzer; and a standard solution introduction unit coupled to the flow path between the sample solution introduction unit and the analyzer using a T-tube to introduce a standard solution for calibration; The sample solution introduction unit is characterized in that the standard solution is diluted by introducing a scan solution instead of the sample solution.

In the above-described apparatus for analyzing substrate contamination, the standard solution introduction unit includes: a sample tube having a space in which the standard solution is to be loaded; A first port and a fourth port coupled to the sample tube, a third port coupled to a flow path to which the standard solution is supplied, a second port coupled to a suction pump for sucking the standard solution, a second port coupled to the T-tube 5 port, a switching valve including a sixth port to which ultrapure water for pushing the standard solution is supplied; characterized in that it comprises a.

In the above-described substrate contaminant analysis apparatus, when the standard solution is loaded, connections are made between the first port and the second port, between the third port and the fourth port, and between the fifth port and the sixth port. and, when injecting the standard solution, between the sixth port and the first port, between the second port and the third port, and between the fourth port and the fifth port are connected.

A substrate contamination analysis method according to an aspect of the present invention is a substrate contamination analysis method executed in a substrate contamination analysis apparatus that transfers a sample solution scanned using a scanning solution on a substrate to be analyzed to an analyzer, and analyzes,

The process of calibrating the analyzer includes: a first step of transferring and analyzing at least one standard solution to the analyzer while diluting the standard solution with the ultrapure water in real time; and a second step of transferring the scan solution used for the scan to the analyzer for analysis.

In the above-described substrate contamination analysis method, if the analysis result of the scan solution in the second step is lower than the trace concentration set value, the analysis result of the first step is used to analyze the sample solution as it is.

In the above-described method for analyzing substrate contaminants, the analysis result of the first step is corrected by the analysis result of the second step and is used to analyze the sample solution.

In the above method for analyzing substrate contamination, the first step is performed at a plurality of different dilution concentrations and is used to obtain a calibration curve.

In the above-described method for analyzing substrate contamination, the calibration curve is corrected according to the analysis result of the second step.

In analyzing the sample solution, the concentration of the scan solution according to the analysis result of the second step is subtracted from the concentration of the sample solution.

In the above-described method for analyzing substrate contamination, for real-time dilution in the first step, the ultrapure water and the standard solution are loaded into different sample tubes, respectively, and are simultaneously injected by two different metering pumps and mixed in a T-tube. characterized by being

In the above-described method for analyzing substrate contamination, the dilution ratio of the ultrapure water and the standard solution is determined by the discharge flow rates of the two different metering pumps.

A substrate contamination analysis method according to an aspect of the present invention is a substrate contamination analysis method executed in a substrate contamination analysis apparatus that transfers a sample solution scanned using a scanning solution on a substrate to be analyzed to an analyzer, and analyzes,

A calibration curve is obtained by analysis with the analyzer at a plurality of different dilution concentrations for a standard solution, and a series of the sample solutions are analyzed using the obtained calibration curve, wherein the concentration measured by measuring the standard solution with the analyzer It is characterized in that the sensitivity check step of checking the sensitivity by determining whether the value is within the set range is automatically executed at a set period or at a set time.

In the above-described method for analyzing substrate contaminants, when the concentration value specified in the sensitivity check step is out of a set range, the process of acquiring the calibration curve is performed again.

A substrate contamination analysis method according to an aspect of the present invention is a substrate contamination analysis method executed in a substrate contamination analysis apparatus for transferring a sample solution scanned using a scan nozzle on a substrate to be analyzed to an analyzer, and analyzing it,

In the above-described substrate contamination analysis method, after analyzing the sample solution, the flow path from the scan nozzle to the analyzer is cleaned, then ultrapure water is transferred to the analyzer for measurement, and it is determined whether the measured concentration value is within a set range By doing so, it is characterized in that the self-verification step of verifying the contamination according to the transfer of the sample solution is automatically executed.

In the above-described method for analyzing substrate contamination, the self-verification step is performed when the transferred sample solution has a high concentration greater than or equal to a set concentration value.

In the above-described method for analyzing substrate contamination, an alarm is generated when, as a result of the execution of the self-verification step, a set range is deviated by a predetermined number of times.

A substrate contaminant analysis apparatus according to an aspect of the present invention receives a monitor wafer in a semiconductor manufacturing process, decomposes it in gas phase, and then uses a scan nozzle to scan the monitor wafer through a flow path from the scan nozzle to the analyzer. As a substrate contaminant analysis device that transports and analyzes with the analyzer,

and a recycling unit that processes the monitor wafer with a solution containing at least an acid-based or base-based chemical in order to recycle the monitor wafer on which the scan has been completed.

In the above-described substrate contaminant analysis apparatus, the acid-based chemical is characterized in that it includes hydrofluoric acid and hydrogen peroxide.

In the above-described substrate contaminant analysis apparatus, the base-based chemical is characterized in that it includes ammonium hydroxide and hydrogen peroxide.

In the above-described apparatus for analyzing substrate contamination, the recycling unit may include: an upper nozzle for spraying the solution onto an upper surface of the dummy wafer; and a lower nozzle for spraying the solution onto a lower surface of the dummy wafer.

In the above-described apparatus for analyzing substrate contamination, the recycling unit includes a chamber, and an inner bottom of the chamber is characterized in that it has a structure inclined to one side.

In the method for analyzing substrate contaminants according to an aspect of the present invention, a monitor wafer in a semiconductor manufacturing process is introduced and vapor phase decomposed, and then a sample solution from which the monitor wafer is scanned using a scan nozzle is passed through a flow path from the scan nozzle to the analyzer. As a substrate contamination analysis method carried out in a substrate contamination analysis device that transports and analyzes with the analyzer,

and a recycling treatment step of treating the monitor wafer with a solution containing at least an acid-based or base-based chemical in a chamber in order to recycle the monitor wafer after the scan has been completed.

In the above-described substrate contaminant analysis method, the recycling treatment step,

It is characterized in that it is carried out by spraying the solution on both sides of the monitor wafer.

In an apparatus for analyzing substrate contaminants according to an aspect of the present invention, after receiving a substrate to be analyzed and decomposing it in a gas phase, a sample solution obtained by scanning the substrate to be analyzed using a scan solution is transferred from the scan nozzle to the analyzer through a flow path. A substrate contaminant analysis device for analysis with an analyzer, comprising:

It includes; an automatic scan solution manufacturing unit that prepares the scan solution by automatically mixing ultrapure water and chemicals supplied from the center, and transfers the prepared scan solution to the analyzer through a flow path to verify at least whether the prepared scan solution is contaminated characterized in that

In the apparatus for analyzing the substrate contamination, the automatic scan solution preparation unit includes: a scan solution vessel in which the prepared scan solution is temporarily stored; and a valve and a flow controller respectively positioned between the lines supplying the ultrapure water and the central supply chemical and the scan solution vessel.

In the above-described substrate contamination analysis apparatus, a valve positioned between the lines supplying the centrally supplied chemical and the drain to discharge the centrally supplied chemical at all times or periodically to prevent contamination due to stagnation; further comprising characterized.

In the method for analyzing substrate contaminants according to an aspect of the present invention, a sample solution for scanning the analysis target substrate using a scan solution is transferred through a flow path from the scan nozzle to the analyzer after a substrate to be analyzed is introduced and subjected to vapor phase decomposition. A method for analyzing substrate contamination performed in a substrate contamination analysis device for analysis with an analyzer, comprising:

A first step of automatically mixing ultrapure water and a centrally supplied chemical to prepare the scan solution and storing it in a vessel; and transferring the prepared scan solution from the vessel to the analyzer through a flow path and at least a second step of verifying whether the prepared scan solution is contaminated.

In the above-described substrate contamination analysis method, before performing the first step, a third step of washing the vessel using the same ultrapure water and centrally supplied chemicals for preparing the scan solution and discharging it to the drain; It is characterized in that it further comprises.

In the above-described substrate contamination analysis method, it is characterized in that at least the centrally supplied chemical is constantly discharged or periodically discharged to the drain to prevent contamination due to the stagnation of the centrally supplied chemical.

A substrate contamination analysis apparatus according to an aspect of the present invention sucks a sample solution containing contaminants from a semiconductor substrate using a nozzle, transfers the sample solution through a flow path from the nozzle to the analyzer, and analyzes the substrate contamination by the analyzer As a device,

An etching solution manufacturing unit for automatically preparing an etching solution for global etching or point etching the bulk of the semiconductor substrate; includes, wherein the etching solution manufacturing unit includes:

an etching solution vessel for storing the prepared etching solution; a metering pump for sequentially sucking in two or more chemicals and ultrapure water for preparing the etching solution and then discharging it to the etching solution vessel; from the etching solution vessel to the chamber for the global etching or the nozzle for the point etching It is characterized in that it is supplied through a flow path.

In the above-described apparatus for analyzing substrate contamination, the two or more chemicals are characterized in that they include hydrofluoric acid and nitric acid.

In a substrate contamination analysis method according to an aspect of the present invention, a sample solution containing contaminants is sucked from a semiconductor substrate using a nozzle, the sample solution is transferred from the nozzle to the analyzer through a flow path, and the substrate contamination analysis is performed by the analyzer. A method for analyzing substrate contamination performed in an apparatus comprising:

and an etching solution automatic production process for automatically preparing an etching solution for global etching or point etching of the bulk of the semiconductor substrate, wherein the etching solution automatic production process sequentially includes two or more chemicals and ultrapure water for producing the etching solution After suction, the process of discharging to the etching solution vessel is repeatedly performed, and the prepared etching solution is supplied from the etching solution vessel to the chamber for the global etching or the nozzle for the point etching through a flow path.

In the above-described substrate contaminant analysis method, part or all of the flow path used for the suction and discharge is purged with a non-reactive gas between repetitions of the suction and discharge.

According to an aspect of the present invention, since the sample solution can be detected and loaded according to the arrival of the sample tube, accurate loading of the sample solution is possible and loss of the sample solution is prevented, and less sample solution can be used and the scan nozzle There is an effect that it may move at high speed from the to the sample tube.

According to an aspect of the present invention, there is an effect that the movement of the sample solution can be checked using the detection of the liquid detection sensor even if the sample solution is not introduced into the analyzer.

According to an aspect of the present invention, by simply adding a sensor to the sample tube, there is an effect of confirming the loss process of the sample centering on the sample tube, and improving the reliability of the analysis result by checking the sample loss without frequent confirmation by a person and It has the effect of improving safety.

According to an aspect of the present invention, since the sample solution of the scan nozzle can be loaded into the sample tube at high speed by using the liquid detection sensor when the sample solution is transported, the transport time can be shortened.

According to an aspect of the present invention, even if the concentration of contaminants in the scan solution fluctuates, it is possible to collectively correct the amount, so it is easy to exclude the shaking of the scan solution in calibration.

According to an aspect of the present invention, by introducing a sensitivity check process that can be performed with a simple procedure, there is an effect that it is not necessary to frequently perform a time-consuming calibration process.

According to an aspect of the present invention, by automatically performing a self-validation function, there is an effect of easily excluding the memory effect from the substrate contamination analysis apparatus and method and improving the reliability of the substrate contamination analysis result. have.

According to an aspect of the present invention, since the monitor wafer that has been conventionally discarded can be reused, the cost of the monitor wafer can be significantly reduced.

According to an aspect of the present invention, there is an effect of preventing safety accidents and chemical contamination in an apparatus and method for analyzing substrate contamination and guaranteeing the quality of a prepared scan solution.

According to an aspect of the present invention, in-line monitoring is possible in the substrate manufacturing process, and there is no safety problem and cross contamination problem in chemical handling because it is operated as a Closed Sampling System, and there is an effect that real-time or rapid response is possible.

1 is a plan view showing the overall configuration of a substrate contamination analysis apparatus according to an embodiment of the present invention.
2 is a diagram schematically showing flow paths and valves for supplying and transferring a scan solution, a sample solution, a standard solution, and an etchant, etc. in the substrate contamination analysis apparatus according to an embodiment of the present invention.
3 is a view showing an example in which a sample tube and a liquid detection sensor are installed, FIG. 3(A) is an example in which a liquid detection sensor is installed in a bar-shaped sample tube, and FIG. 3(B) is a loop-shaped sample tube This is an example where a liquid detection sensor is installed in the
4 is a flowchart illustrating a sensitivity check process according to an embodiment of the present invention.
5 is a flowchart illustrating a self-verification process according to an embodiment of the present invention.
6 is a cross-sectional view of a recycling unit according to an embodiment of the present invention.
7 is a schematic diagram illustrating a scan solution manufacturing unit according to an embodiment of the present invention.
8 is a schematic diagram illustrating an etching solution manufacturing unit according to an embodiment of the present invention.

With reference to the accompanying drawings, the embodiments of the present invention will be described in detail so that those of ordinary skill in the art to which the present invention pertains can easily implement them. However, the present invention may be embodied in several different forms and is not limited to the embodiments described herein. And in order to clearly explain the present invention in the drawings, parts irrelevant to the description are omitted, and similar names and reference numerals are used for similar parts throughout the specification.

meaning of terms

In this specification, 'substrate' includes semiconductor wafers, LCD substrates, OLED substrates, and the like, and unless otherwise specified, 'substrate' does not mean only the start state during the manufacturing process, but oxide film, polysilicon layer, metal layer, interlayer film Alternatively, one or more elements and the like may be formed.

In the present specification, 'scan' includes scanning in the depth direction to obtain a Point Depth Profile at a specific point of the substrate, in some cases, along with scanning of all or part of a region of the substrate.

In this specification, unless conflicting with other descriptions, 'scan solution' refers to a solution supplied or supplied to a nozzle to scan a substrate, and 'sample solution' refers to a substrate with a scan solution or a scan solution and point etching solution, etc. It refers to a solution in which contaminants, etc. are collected after scanning.

Overall configuration and operation of the substrate contaminant analysis device

1 is a plan view showing the overall configuration of a substrate contamination analysis apparatus according to an embodiment of the present invention.

The substrate contaminant analysis apparatus of the present invention includes a load port 10 , a robot 20 , an aligner unit 30 , a VPD unit 40 , a scan unit 50 , a recycling unit 60 , and an analyzer 70 . is composed by

The load port 10 is located on one side of the substrate contamination analyzer and provides a passage for introducing the substrate into the substrate contamination analyzer by opening the cassette in which the substrate is accommodated. The robot 20 grips the substrate to automatically transfer the substrate between each component of the substrate contamination analysis apparatus, and specifically, the cassette of the load port 10 , the alignment unit 30 , the VPD unit 40 , and the scan unit The substrate is transferred between 50 and the recycling unit 60 . The aligner unit 30 performs a function of aligning the substrate, and in particular, is used to align the center of the substrate before placing the substrate on the scan stage 51 .

The VPD unit 40 is a unit in which vapor phase decomposition (VPD) is performed on a substrate. It includes an injection hole and the like, and the surface or bulk of the substrate is etched by the gaseous etchant.

The scan unit 50 includes a scan stage 51 and a scan module 52, and the scan stage 51 has a substrate on which the vapor phase decomposition is performed in the VPD unit 40 is seated, and in a state in which the substrate is seated A function of rotating the substrate in the process of scanning the substrate using the scan module 52 is performed. The scan module 52 is provided on one side of the scan stage 51, and a scan nozzle 53 (refer to FIG. 2) that scans the substrate in a state in which the scan solution is immersed in proximity to the substrate and a scan nozzle mounted at one end It includes a scan module arm capable of moving the position of the scan nozzle in, for example, three-axis directions. One or a plurality of scan nozzles and scan modules may be provided. A scan solution is supplied to the scan nozzle of the scan unit 50 through a flow path, and the sample solution obtained by scanning the substrate with the supplied scan solution is transferred to the analyzer 70 through the flow path.

The recycling unit 60 treats the substrate with a solution containing an acid-based or base-based chemical to recycle the scanned substrate, and is provided in the inlet and door for substrate introduction, the process chamber, and the process chamber. It includes a rod plate, a vacuum chuck, and a nozzle for spraying an etching solution, and the specific details will be described later.

The analyzer 70 receives and analyzes the sample solution from the scan nozzle of the scan unit 50 through the flow path, and analyzes the presence or absence of contaminants included in the sample solution, the content of contaminants, or the concentration of contaminants. As the analyzer 70, an Inductively Coupled Plasma Mass Spectrometry (ICP-MS) is preferred.

In addition, the apparatus for analyzing substrate contamination according to an embodiment of the present invention includes automatic preparation of a scan solution and an etching solution, transfer of a sample solution, auto-calibration of an analyzer, sensitivity check, and self-validation. It includes a part for and the like, and this part may be mainly configured on the side or inside the substrate contamination analysis apparatus, which will be described later.

Hereinafter, in relation to the operation of the overall configuration of the substrate contaminant analysis apparatus, a case of scanning and analyzing contaminants on the surface of the substrate will be briefly described.

The robot 20 introduces the substrate to be analyzed from the load port 10 into the process chamber of the VPD unit 40 , and the VPD unit 40 vapor-decomposes the surface of the substrate using an etching gas. Accordingly, the oxide film on the surface of the substrate is combined with the etching gas and discharged in a gaseous state, and impurities such as metal atoms included in the surface and the oxide film remain in a state that can be captured on the surface of the substrate.

Then, the substrate is taken out from the VPD unit 40 using the robot 20 and then seated on the scan stage 51 . The scan solution is transferred from the scan solution vessel 121 (refer to FIG. 2 ) through the flow path to the tip of the scan nozzle, so that droplets of the scan solution are kept between the tip of the scan solution and the surface of the substrate.

And in this state, the substrate is scanned while the rotation of the scan stage 51 and the position control of the scan module arm are performed in parallel, and the scan nozzle moves in a spiral trajectory on the substrate or whenever the substrate completes one rotation. It is also possible to scan the substrate by moving the position of the scan nozzle to move in a plurality of concentric trajectories. When the substrate is scanned using the scan nozzle, the scan solution becomes a sample solution that absorbs contaminants such as metal atoms. After scanning, the scan nozzle sucks the sample solution, and the sample solution flows from the scan nozzle to the analyzer 70 It is transferred through the , and the analyzer 70 such as ICP-MS analyzes the transferred sample solution. The scan solution is, for example, a solution comprising hydrofluoric acid (HF), hydrogen peroxide (H ₂ O ₂ ) and ultrapure water.

The scanned substrate is introduced into the process chamber of the recycling unit 60 from the scan stage 51 by the robot 20, and the substrate is converted into a solution containing acid- or base-based chemicals by the recycling unit 60. By processing, the substrate can be reused, and the robot 20 then withdraws the substrate from the process chamber of the recycling unit 60 and loads it back into the cassette of the load port 10 .

On the other hand, before being drawn into the VPD unit 40 , after being withdrawn from the VPD unit 40 , before transferring to the scan stage 51 , or after being withdrawn from the scan stage 51 before transferring to the recycling unit 60 . , it is possible to align the substrate using the aligner unit 30 .

Hereinafter, detailed features constituting the apparatus for analyzing substrate contamination and the method for analyzing substrate contamination according to an embodiment of the present invention will be described in detail.

Transfer of scan solution and sample solution through flow path and sensor detection

2 is a diagram schematically showing flow paths and valves for supplying and transferring a scan solution, a sample solution, a standard solution, and an etchant, etc. in the substrate contamination analysis apparatus according to an embodiment of the present invention.

The sample tubes 82, 92, and 112 are tubes having a space to be loaded with a small amount of solution, and the sample tube may have various shapes such as a rod shape, a spiral shape, or a loop shape, and the sample tube may be, for example, a sample loop. have.

The metering pumps 85, 86, 95 may be syringe pumps, diaphragm pumps, gear pumps, piston pumps, etc., and a high-precision pump may be preferred, and the pumps 87, 96, 116 may be metering pumps or other pumps. It may be a type of pump or a type of pump with a large capacity may be preferred.

The scan solution of the scan solution vessel 121 or the etching solution of the point etching solution vessel 131 is manufactured and stored through an automatic manufacturing device to be described later. Each solution is delivered to the scan nozzle 53 through a valve system comprising a third pump 116 and a third valve 113 , a fourth valve 114 and a fifth valve 115 .

Looking at the process of transferring the scan solution to the scan nozzles 53 , a valve between the scan solution vessel 121 and the third pump 116 is opened and a predetermined volume is extracted using the third pump 116 . The arrival of the scan solution to the third sample tube 112 at the front end of the third pump 116 is detected by the third liquid detection sensor 111 .

Then, after closing the valve and opening the third valve 113 , a predetermined amount of the scan solution is supplied to the scan nozzle 53 using the third pump 116 . Meanwhile, for point bulk etching, an etching solution may be used together with a scan solution, and the etching solution and the scan solution may be alternately or provided to the scan nozzle 53 in a predetermined order.

Additional pushes can be made during or after pump evacuation, such as with air or gas, to complete quantitative solution delivery. The sample moving distance is usually used in the range of 2~4m, but other things are possible.

Meanwhile, the sample introduction unit 100 is a device for introducing a sample solution, a standard solution, a scan solution, or ultrapure water as a sample to the analyzer 70 , and includes a sample solution introduction unit 80 and a standard solution introduction unit 90 . do.

The switching valves 81 and 91 are two ports coupled to the sample tubes 82 and 92 and have a rod position in which the solution is loaded into the sample tube and an injection position in which the loaded solution is injected, and the rod position and injection by control. Can be switched between positions. The switching valves 81 and 91 may be injection valves or may be formed by combining a plurality of valves and flow paths. Preferably the switching valves 81 and 91 are 6 port injection valves.

The liquid detection sensors 83 , 93 , and 111 are detection sensors for detecting a liquid, and the liquid detection sensor may be an optical sensor capable of detecting the presence or absence of a liquid or a proximity sensor detecting a change in capacitance coupled thereto. In particular, the liquid detection sensors 83, 93, and 111 are installed close to or attached to the sample tubes 82, 92, and 112 to detect liquid in the sample tubes.

3 is a view showing an example in which a sample tube and a liquid detection sensor are installed, FIG. 3(A) is an example in which a liquid detection sensor is installed in a bar-shaped sample tube, and FIG. 3(B) is a loop-shaped sample tube This is an example where a liquid detection sensor is installed in the

The liquid detection sensors 83 , 93 , and 111 may be installed at the center or one side of the sample tubes 82 , 92 , 112 , and two or more liquid detection sensors may be installed.

The sample solution introduction unit 80 selectively introduces a sample solution or a scan solution, and the like, and includes a first switching valve 81 , a first sample tube 82 , a first liquid detection sensor 83 , and a first metering pump 85 . ), a second metering pump 86 , a first valve 88 and a second valve 89 , and the like.

The first sample tube 82 is a tube having a space into which the sample solution scanned by the scan nozzle is loaded, and the first liquid detection sensor 83 is installed therein.

In the first switching valve 81, ports 1 and 4 are coupled to the first sample tube 82, and a load position in which a sample solution from among a sample solution or a scan solution is loaded into the first sample tube 82 and It has at least an injection position for injecting the loaded sample solution towards the analyzer 70 .

When the sample solution is loaded into the first sample tube 82, a gas section is included before and after the sample solution, and the gas may be air or an inert gas, and the first detection sensor 83 is the first sample tube ( 82) to distinguish between the gas section and the sample solution to detect it.

The sample solution introduction part 80 and the standard solution introduction part 90 are installed in the sample tubes 82 and 92 and use the liquid detection sensors 83 and 93 for distinguishing between the gas section and the sample solution to detect the sample solution or the standard solution. It detects the arrival or movement of the back.

When the first liquid detection sensor 83 detects gas and liquid in the order of gas and liquid in the rod position, it is determined that the sample solution arrives at the sample tube 82 from the scan nozzle, and in the injection position, the liquid detection sensor 83 detects liquid and liquid. When the gas sequence is detected, it is determined that the sample solution moves toward the analyzer 70 .

The first metering pump 85 is mainly used for loading the sample solution into the sample tube 81 when the switching valve 81 is in the load position, and the second metering pump 86 is mainly used by the switching valve 81 for injection. It is used to push the loaded sample solution toward the analyzer 70 as ultrapure water when in the position.

Hereinafter, the operation of the sample solution introduction unit 80 will be described in detail.

In a basic state, the first switching valve 81 is in the injection position and always supplies ultrapure water to the analyzer 70 through the first sample tube 82, so as to have a cleaning effect of the first sample tube 82 and the flow path. do. Also, the tube between the scan nozzle 53 and the first switching valve 81 is filled with air or gas, not liquid.

After the scan nozzle 53 finishes scanning, the first valve 88 is opened and the first switching valve 81 sucks the sample by the first metering pump 85 at the rod position, thereby dispensing the scanned sample solution. The first sample tube 82 positioned in the middle of the flow path between the scan nozzle 53 and the analyzer 70 is loaded. The moving distance of the sample solution may be, for example, in the range of 2 to 4 m.

When the sample solution reaches the sample tube, it is sensed using the first liquid detection sensor 83 to switch the first switching valve 81 to the injection position. When the first liquid detection sensor 83 detects gas and liquid in the order, it is determined that the sample solution arrives at the first sample tube 82 from the scan nozzle.

The flow path between the scan nozzle 53 and the sample tube 82 is filled with air or gas, and when the sample solution is moved by a pump operation, the front and rear sides of the sample solution are filled with air or gas. This provides the advantage that only the section of the sample solution can be checked. For example, before the sample solution is introduced into the first sample tube 82 , a gaseous region is present and the liquid detection sensor of the first sample tube 82 indicates an off state. At this time, when the liquid sample solution reaches the first liquid detection sensor 83, the output state of the liquid detection sensor indicates an on state. At this time, the first switching valve 81 is switched to the injection position to convert the sample solution to the first sample. It can be stored inside the tube 82, and stops the first metering pump 85 for suction. Gas is present at both ends of the sample solution, and a plurality of sensors may be added for accurate measurement.

If the first liquid detection sensor 83 does not detect the liquid, the suction process of the sample solution may be repeated a predetermined number of times. If the liquid is not detected even by the process, it is judged that the sample solution on the substrate is lost and an alarm is processed.

According to an embodiment of the present invention, since the sample solution can be detected and loaded according to the arrival of the sample tube, accurate loading of the sample solution is possible and loss of the sample solution is prevented, and less sample solution can be used and scanning There is an effect that it may move from the nozzle to the sample tube at high speed.

Then, the first switching valve 80 is switched from the load position to the injection position, and the sample solution loaded in the first sample tube 82 is injected toward the analyzer. At this time, the sample solution is supplied to the analyzer 70 using the second metering pump 86 connected to the first switching valve 81 , but is supplied at a constant flow rate. The second metering pump 86 is used to push the loaded sample solution toward the analyzer 70 as ultrapure water during injection.

When the first liquid detection sensor 83 detects liquid and gas in the order, it is determined that the sample solution moves toward the analyzer 70 . In addition, when the first liquid detection sensor 83 does not detect the change from liquid to gas, it may be determined that there is an abnormality and an alarm may be issued.

When the sample solution is introduced, both ends of the sample solution are gaseous, so that when the sample solution moves, it is possible to detect that the first liquid detection sensor 83 is changed to an off state - on state - off state, or changed to an on state - off state . The movement of the sample solution is introduced into the analyzer in the order of the sample solution - gas - ultrapure water as the whole moves together while pushing the ultrapure water with the second metering pump 86 .

According to an embodiment of the present invention, even if there is a case where the sample solution cannot be introduced into the analyzer 70 , the movement of the sample solution can be checked using the detection of the first liquid detection sensor 83 . Then, an analysis command is issued to the analyzer 70 and the analysis result is confirmed.

Various processes of sample loss may exist in the process of transferring the sample from the wafer to the analyzer. Sample loss in the scanning process (the sample may leak out of the nozzle and onto the wafer surface due to the characteristics of the wafer, and there may be sample loss due to an abnormality such as a pump while the sample moves to the sample tube, and from the sample tube to the analyzer It may also be lost due to an abnormality in the pump or sample introduction device in the course of movement.

On the other hand, according to an embodiment of the present invention, by simply adding a sensor to the sample tube, there is an effect of confirming the loss process of the sample centering on the sample tube. It has the effect of improving the reliability and safety of the analysis result by checking the sample loss without a human check at any time in the automated equipment.

Parallel injection and cleaning of sample solution

In parallel with injecting the sample solution toward the analyzer 70 at the injection position of the first switching valve 81 , at least the flow path from the scan nozzle 53 to the first switching valve 81 is cleaned.

According to an embodiment of the present invention, a first step of loading the scanned sample solution into the first sample tube 82 located in the middle of the flow path; and a second step of injecting the sample solution loaded into the first sample tube 82 toward the analyzer 70, but in parallel with the second step, at least the scan nozzle 53 to the first sample tube 82 Wash including the section up to the front of

In addition, when the injection of the sample solution is completed, the flow path from the first switching valve 81 to the analyzer 70 is naturally cleaned by the ultrapure water that has been pushed. The path to be cleaned includes a sample movement path from the scan nozzle 53 to the analyzer 70 and the scan nozzle 53 itself.

Cleaning is performed by inserting the scan nozzle 53 into the nozzle cleaning vessel 54 and then sucking it using a pump. Specifically, after putting the scan nozzle 53 into the nozzle cleaning vessel 54 that always overflows and maintains a clean state, the first switching valve 81 and the first pump 87 are used for a predetermined time or repeatedly. Washing is performed by continuously sucking in ultrapure water or a cleaning solution.

At this time, in order to increase the cleaning efficiency and shorten the cleaning time, a chemical solution (HF, HF+H ₂ O ₂ , HNO ₃ , HCl, etc.) can be introduced as a cleaning solution, and the first pump 87 having a large pump capacity is used. it's good

A first metering pump (85) used for loading a sample solution into the first sample tube (82) and a first pump (87) used for cleaning, the first metering pump (85) and the first pump Reference numeral 87 is connected to the same port (port 6) of the first switching valve 81 , and the first pump 87 has a larger capacity than the first metering pump 85 . Different pumps are used for loading and cleaning the sample solution, and the pump with a higher suction speed is used for cleaning.

Cleaning of the scan nozzle 530 is possible only with ultrapure water, and a chemical solution may also be introduced.

In order to shorten the overall process time, cleaning can be performed in parallel during the injection process. In general, the analyzer 70 such as ICP-MS has to introduce the sample at a slow rate, and when the sample is introduced at a fast rate, the waste of the sample is severe, for example, the analyzer 70 has a rate of about 0.1 ml/min. Introduce the sample into If so, the time for injecting the sample solution of the first sample tube 82 to the analyzer 70 is considerable, and an embodiment of the present invention uses this point to first switch from the scan nozzle 53 during the injection time. The flow path to the valve 81 is cleaned.

Assuming that simultaneous cleaning is impossible, according to an embodiment of the present invention, it is possible to shorten the time from several minutes to several tens of seconds, and by using a liquid detection sensor, the sample solution of the scan nozzle 53 is transferred to the sample tube at high speed. Since it can be loaded with , it also has the effect of reducing the transfer time.

Then, after cleaning, the scan nozzle 53 rises to the top of the nozzle cleaning vessel 54 and continues pumping in this state. In this way, the tubes from the scan nozzle 53 to the first switching valve 81 and the first pump 87 are filled with gas, not liquid.

After cleaning, before performing a process such as loading the sample solution into the first sample tube 82 again, air or Fill with gas. After that, the scan nozzle 53 enters the nozzle cleaning vessel 54 again to maintain a standby state.

Auto Calibration

An embodiment of the present invention is a substrate contaminant analysis apparatus that transfers a sample solution sucked from a substrate to be analyzed using a scan nozzle 53 from the scan nozzle 53 to the analyzer 70 through a flow path. In addition to (8), the standard solution introduction part 90 may be further included, and the standard solution introduction part 90 is coupled using a T-tube 94 in the middle of the flow path through which the sample solution is transferred, and the standard solution for calibration in the flow path. can be introduced.

The sample introduction unit 100 according to an embodiment of the present invention includes a sample solution introduction unit 80 for loading a sample solution and then injecting the sample solution toward the analyzer 70 , and between the sample solution introduction unit 80 and the analyzer 70 . It includes a standard solution introduction part 90 that is coupled to the flow path of the T-tube 94 to introduce a standard solution for calibration.

The standard solution inlet 90 includes a second switching valve 91 , a second sample tube 92 , a second liquid detection sensor 93 , a third metering pump 95 and a second pump 96 . The second sample loop 92 has a space to be loaded with the standard solution, and the second switching valve 91 is coupled to the second sample tube 92 and the standard solution is loaded into the second sample tube 92 . A valve having at least a rod position and an injection position for injecting the loaded standard solution toward the T-tube (94). The second switching valve 91 may be a 6 port injection valve.

The second switching valve 91 includes a first port and a fourth port coupled to the second sample tube 92, a third port coupled to the flow path to which the standard solution is supplied, and a second pump that is a suction pump for sucking the standard solution. A second port coupled to (96), a fifth port connected to the T-tube (94), and a sixth port to which ultrapure water for pushing the standard solution is supplied.

And when the second switching valve 91 loads the standard solution, between the first port and the second port, between the third port and the fourth port, and between the fifth port and the sixth port are connected, and the standard solution is injected In this case, a connection is made between the 6th port and the 1st port, between the 2nd port and the 3rd port, and between the 4th port and the 5th port.

According to an embodiment of the present invention, the calibration can be performed automatically while introducing the sample solution into the analyzer 70 by variously adjusting the dilution ratio of the sample solution and the standard solution according to a predetermined ratio using the sample introduction unit 100 .

Normally, the first switching valve 81 is located at the injection position, so that ultrapure water is always introduced into the analyzer 70 through the first sample loop 81, which has the meaning of regular cleaning.

Meanwhile, during calibration, the third metering pump 93 pushes the loaded standard solution with ultrapure water, and then the flow path from the T-tube 94 to the third metering pump 95 is filled with ultrapure water, and after completion of the calibration It will return to the rod position and will remain in that state. Since the second switching valve 91 is normally in the load position (the state of FIG. 2) and the flow path from the T-tube 94 to the third metering pump 95 is filled with ultrapure water, the sample solution introduction part 80, etc. When analyzing the sample solution, the standard solution rides the T-tube 94 and is mixed into the sample solution to enter the analyzer 70 so as not to affect the analysis result.

At least when the sample solution is transferred through the T-tube 94 , at least the flow path between the T-tube 94 and the second switching valve 91 is filled with ultrapure water, so the sample solution by the T-tube 94 is It is possible to rule out the influence from this standard solution.

In the load position of the second switching pump 91, the standard solution can be spilled every predetermined time or before calibration, and in the injection position, the loaded standard solution is pushed by using the third metering pump 95 as ultrapure water. .

According to an embodiment of the present invention, the sample solution introduction unit 90 includes an ultrapure water carrier unit 88 that pushes the sample solution with ultrapure water when the sample solution is injected toward the analyzer 70, but a standard solution for calibration Even when diluting, the ultrapure water carrier part 88 is commonly used.

Hereinafter, a process of auto-calibrating the analyzer 70 using the sample introduction unit 100 in the apparatus for analyzing substrate contamination according to an embodiment of the present invention will be described.

Since the target to be analyzed by the analyzer is a sample solution derived from the scan solution, it may be preferable to dilute the standard solution with the scan solution in calibration to proceed with the calibration.

According to an embodiment of the present invention, a standard solution is analyzed while being diluted with a scan solution. The sample introduction unit 100 according to an embodiment of the present invention includes a sample solution introduction unit 80 for introducing the original sample solution. When calibration is performed on the analyzer as a standard solution, the sample solution introduction unit 80 is Dilute the standard solution by introducing the scan solution instead of the sample solution. When the standard solution is diluted with the scan solution, the scan solution for dilution is supplied from the scan solution vessel 121 while using the configuration of the sample solution introduction part 80 as it is by closing the first valve 88 and opening the second valve 89. direct introduction

On the other hand, the concentration of trace contaminants included in the scan solution may fluctuate during the manufacturing or handling process, and as a method to solve this problem, in another embodiment of the present invention, the standard solution is diluted with ultrapure water instead of diluted with the scan solution. and a method of correction using the measurement results of the scan solution is used.

According to an aspect of the present invention, at least one standard solution is transferred to the analyzer 70 while diluting the standard solution with ultrapure water in real time for analysis, and the scan solution used for scanning is transferred to the analyzer 70 for analysis do.

According to an embodiment of the present invention, ultrapure water analysis → standard solution concentration 1 analysis → standard solution concentration 2 analysis → . . → Analysis of standard solution concentration N → Scan solution analysis, etc. can

First, the first switching valve 81 is placed in the injection position and ultrapure water is introduced into the analyzer 70 , and the ultrapure water is supplied to the analyzer 70 at a predetermined flow rate using the second metering pump 86 , and the analyzer 70 . Analyzes ultrapure water to derive analysis results for ultrapure water.

Then, the second switching valve 91 is placed in the rod position and the standard solution is filled into the second sample tube 92 using the second pump 96 . If necessary, the second sample tube 92 may be filled after cleaning the second sample loop 92 by pumping the standard solution through the second sample loop 92 for a predetermined time or longer.

Then, the second switching valve 91 is switched to the injection position after detecting the arrival of the standard solution by using the second liquid detection sensor 93 or after a certain period of time without using the second liquid detection sensor 93 . Here, the rod position is a connected state that can introduce a standard solution, and the injection position is a connected state that can introduce a standard solution into the analyzer.

Subsequently, the ultrapure water of the first sample loop 82 is introduced into the analyzer 70 using the second metering pump 86 connected to the first injection valve 81 , while at the same time a third metering amount connected to the second switching valve 91 is introduced. The standard solution of the second sample loop 92 is introduced into the analyzer 70 using the pump 95 . Each solution meets and mixes in the middle T-tube 94 . The mixing or dilution ratio is determined by the discharge flow rate of each pump.

According to one embodiment of the present invention, for real-time dilution, ultrapure water and standard solution are loaded into different sample tubes, respectively, and then injected simultaneously by two different metering pumps and mixed in a T-tube 94, ultrapure water and standard solution The dilution ratio of is determined by the discharge flow rates of the two different metering pumps.

And the analyzer 70 proceeds with the analysis and stores the result value for the standard solution concentration 1, and also sequentially measures and analyzes various standard solution concentrations. At this time, the dilution ratio is adjusted by varying the discharge flow rate as described above.

Analyzes on standard solutions are run at a plurality of different dilution concentrations and used to obtain calibration curves. When the analysis of the standard solution for various concentrations is completed, a calibration curve is generated, and the calibration curve represents the relationship between the input and output of the analyzer, or the concentration of the sample introduced and the output value of the analyzer. Here, the 'calibration curve' does not necessarily mean a mathematical curve, but may include a mapping table or mapping function that can determine the correspondence between the input and output of the analyzer, or between the concentration of the introduced sample and the output value of the analyzer. can

In addition, the calibration curve prepared for each element in each sample is usually reliable only when it has excellent linearity. If the linearity judgment standard is set and the standard is not met, all or part of the calibration is performed again, and only when the set value is satisfied, normal processing can be performed.

In addition, the substrate contaminant analysis apparatus analyzes the scan solution using the analyzer 70 . When the scan solution is filled in the first sample tube 82 of the first switching valve 81 , it is removed using the first pump 87 at the rod position of the first switching valve 81 without passing through the scan nozzle 53 . One sample loop 82 is filled, with the first valve 88 closed and the second valve 89 open.

Then, the scan solution is pushed to the analyzer with ultrapure water at a predetermined flow rate using the first metering pump 85 , and the analyzer 70 performs the analysis to derive the analysis result of the scan solution.

As a result of the analysis of the scan solution, if the contaminants such as metal atoms are lower than the trace concentration set value, the analysis result for the standard solution can be applied as it is and can be used to analyze the sample solution later.

In addition, as another method, if the analysis result of the scan solution is lower than the trace concentration set value, it is treated as normal, and the analysis result for the standard solution is corrected by the analysis result for the scan solution so that it can be used to analyze the sample solution . The calibration curve may be corrected according to the analysis result of the scan solution, or the concentration of the scan solution according to the analysis result of the scan solution may be subtracted from the concentration of the sample solution when the sample solution is analyzed. In addition, if the analysis result of the scan solution is higher than the trace concentration set value, it is measured again.

The concentration of trace contaminants contained in the scan solution may fluctuate during the manufacturing or handling process, and accordingly, when diluted with the scan solution, it is not possible to distinguish the error due to the scan solution from the analysis result of the standard solution. According to an example, by solving this problem, even if the concentration of contaminants in the scan solution fluctuates, it is possible to collectively correct the amount, so it is easy to exclude the shaking of the scan solution in calibration.

Sensitivity Check

As described above, the substrate contamination analyzer analyzes the standard solution at a plurality of different dilution concentrations through auto-calibration to obtain a calibration curve and analyzes a series of sample solutions using the obtained calibration curve. .

According to an embodiment of the present invention, a sensitivity check step of automatically measuring a standard solution with the analyzer 70 at a set period or a set time to determine whether the measured concentration value is within a set range and checking the sensitivity is performed.

The sensitivity check step can be simply performed with a small frequency compared to the frequency of auto-calibration. And, if the concentration value specified in the sensitivity check step is out of the set range, the process of acquiring the calibration curve is performed again.

The analyzer 70 slightly changes the analysis sensitivity with time. Accordingly, the sensitivity state is checked to check whether there is an abnormality. This is because, if the sensitivity is changed, the measurement result will be different and the reliability of the analysis result will be lowered.

4 is a flowchart illustrating a sensitivity check process according to an embodiment of the present invention.

First, the standard solution is diluted in a specific ratio or measured with the analyzer 70 as it is (S10), and the output value or the expected concentration value of the analyzer 70 is known in advance. Then, it is determined whether the measured concentration value is within a set range (S12). As a result of the determination, if the concentration value is out of the set range, the auto-calibration process is performed again (S14) to obtain the calibration curve again. If the concentration value does not exceed the set range, the analysis of the sample solution such as the next sample solution is continued ( S16). If the measured concentration value is within the set deviation, it is processed normally and the next sample can be measured. On the other hand, if the error is greater than the set deviation, it is recognized as a change in sensitivity and the calibration process is performed again.

In addition, when out of the set range, the calibration of the analyzer 70 is not immediately performed again, and even after repeating the measurement for the standard solution as many as a predetermined number, if it is out of the set range, the calibration may be performed at that time.

According to an embodiment of the present invention, by introducing a sensitivity check process that can be performed with a simple procedure, there is an effect that it is not necessary to frequently perform a time-consuming calibration process.

Self Validation

If a sample contaminated with a high concentration is analyzed, some of the contaminants may remain in nozzles, flow paths, and analyzers that come into contact with the sample. In general, after analysis of each sample, cleaning of the relevant part is carried out, but in the case of a high concentration contaminated sample, the contamination may not be removed by washing once or a predetermined number of times.

If contamination remains in this way, when the next sample is measured, even if it is a clean sample, it may be determined that there is a contamination component. In this way, the material remaining in the previously measured sample has a memory effect that affects the result of the newly measured sample. As such, the memory effect may cause a problem in the reliability of the sample measurement result. Accordingly, according to an embodiment of the present invention, a self-validation function for checking whether a memory effect is completely removed is automatically performed.

5 is a flowchart illustrating a self-verification process according to an embodiment of the present invention.

The sample solution is transferred to the analyzer for analysis according to a conventional procedure (S20), and the flow path from the scan nozzle to the analyzer is cleaned after analysis whenever there is an analysis (S22), and in this case, automatic cleaning using ultrapure water may be performed.

According to an embodiment of the present invention, as the self-verification process (S40) is added, it is determined whether the transferred sample solution has a high concentration above a set concentration value (S24), and if it is not a high concentration sample, the analysis of the next sample solution proceed to

However, in the case of a high concentration sample, the sample delivery part is chemically cleaned (S26), the ultrapure water is transferred to the analyzer along with cleaning using ultrapure water and analyzed (S28), and it is determined whether the measured concentration value of the ultrapure water is within the set range do (S30). If it is within the set range, it moves on to the analysis of the next sample, but if it is out of the set range, chemical cleaning and ultrapure water analysis are repeated. As a result of executing the self-verification step, an alarm is generated when the set range is out of the set number of times.

Although the self-verification step is to determine whether a high-concentration sample is in the above, self-verification consisting of ultrapure water analysis, etc. may be performed regardless of whether the high-concentration sample is present.

According to an embodiment of the present invention, by automatically performing a self-validation function, it is possible to easily exclude a memory effect from the substrate contamination analysis apparatus and method and to improve the reliability of the substrate contamination analysis result there is

Recycling for monitor wafers

A substrate contaminant analysis device mainly receives a monitor wafer in the semiconductor manufacturing process, decomposes it in gas phase, and then analyzes the monitor wafer with an analyzer using a scan nozzle. Conventional analysis of contaminants on wafers by ICP-MS or the like involves VPD and the like, so it is classified as destructive analysis, and the wafers that have been analyzed are discarded.

However, according to an embodiment of the present invention, in order to recycle the scanned monitor wafer, it is treated with a solution containing an acid-based or base-based chemical using at least the reciting unit 60 . Acid-based chemicals include hydrofluoric acid and hydrogen peroxide, and base-based chemicals include ammonium hydroxide and hydrogen peroxide.

6 is a cross-sectional view of a recycling unit according to an embodiment of the present invention.

The recycling unit 60 includes an upper nozzle 69 (shown in a separated state), an upper nozzle mounting unit 63 , a lower nozzle 64 , a wafer load plate 61 , a wafer vacuum chuck 62 , and an upper nozzle rotation driving unit ( 66), a vacuum chuck driving unit 67 and an inclined unit 65, and the like.

The upper nozzle 69 (shown in a detached state) is mounted on the upper nozzle mounting unit 63 and sprays the above-described solution to the upper surface of the monitor wafer, and the upper nozzle rotation driving unit 66 rotationally drives the upper nozzle. The lower nozzle 64 sprays the above-described solution to the lower surface of the monitor wafer, and may be rotationally driven by the lower nozzle rotation driving unit 68 . The recycling unit 60 may process both sides of the monitor wafer through nozzles provided on the top and bottom.

And the recycling unit 60 includes a chamber, and the inner bottom of the chamber includes an inclined portion 65 having a structure inclined to one side to help drain the solution after treatment.

According to an embodiment of the present invention, in order to recycle the scanned monitor wafer, a recycling process step of treating the monitor wafer with a solution containing at least an acid-based or base-based chemical in a chamber, the recycling process step is the monitor wafer is carried out by spraying the above solution on both sides of the

Looking at the processing process in the recycling unit in detail, after the monitor wafer is introduced into the process chamber and seated on the raised wafer load plate 61, the wafer load plate 61 is lowered and the door is closed. Then, as the upper nozzle moves to the wafer center and sprays the chemical, the wafer is rotated at a low speed and the upper nozzle is also rotated at a limited angle. After the chemical liquid is evenly sprayed by the upper nozzle, the chemical liquid is similarly sprayed to the lower part of the wafer.

The upper and lower portions of the wafer are rinsed using ultrapure water, the wafer is rotated at high speed, and nitrogen gas is sprayed to dry the wafer. After drying, the wafer load plate rises, the door is opened, and then the wafer is taken out.

According to an embodiment of the present invention, since the conventionally discarded monitor wafer can be reused, the cost of the monitor wafer can be greatly reduced.

Automatic chemical solution manufacturing for scanning solution, etc.

In the case of the conventional substrate contaminant analysis apparatus, the chemical solution used in each process was directly prepared by the operator or the manufactured product was purchased and used. Accordingly, there is an inconvenience in that the operator has to periodically replenish or replace the chemical solution.

In addition, there is a problem that may cause a safety accident in the process of manufacturing and replacing the chemical solution, and there is a problem that contamination of some samples occurs during the work process, thereby greatly reducing the reliability of the measurement result. Since the device according to the present invention is a device that analyzes trace levels of contamination, the allowable level of contamination is very low, and there is a very high possibility that the allowable contamination level cannot be satisfied or that the standard concentration cannot be manufactured even by minor carelessness or pollution sources in the working environment. high.

7 is a schematic diagram illustrating a scan solution manufacturing unit according to an embodiment of the present invention.

The scan solution manufacturing unit automatically mixes ultrapure water and centrally supplied chemicals to prepare a scan solution,

The scan solution manufacturing unit is configured to include a scan solution vessel 121 , a plurality of valves 125a to 125i , a plurality of flow controllers 122 to 124 , and a pump 127 . The scan solution vessel 121 (same as 121 in FIG. 2) is a container in which the prepared scan solution is temporarily stored.

The valve and flow controller are between the lines supplying ultrapure water (DIW) and centrally supplied chemicals (Chem1, Chem2) and the scan solution vessel 121, and supply ultrapure water (DIW) and centrally supplied chemicals (Chem1, Chem2). It is located between the lines and the drain 128, between the scan solution vessel 121 and the drain 128, and the like. In particular, the valves 125f, 125g, and 125g are located between the lines supplying the centrally supplied chemical and the drain to discharge or periodically discharge the centrally supplied chemical to prevent contamination due to stagnation of the centrally supplied chemical.

In addition, an embodiment of the present invention has a feature in that the scan solution stored in the scan solution vessel 121 is transferred to the analyzer through a flow path to verify at least whether the prepared scan solution is contaminated.

Hereinafter, the automatic manufacturing and verification process of the scan solution including these points will be described.

The chemical solution may be supplied by a pump or a central supply system, and the volume of the chemical solution is defined using a flow controller (122, 123, 124) or a metering pump (not shown), and a predetermined volume is supplied to the scan solution vessel (121). The chemical liquid supply may proceed sequentially or simultaneously with the chemical liquid to be mixed, and may be introduced by opening a related valve.

First, the scan solution vessel 121 is washed using the same ultrapure water and centrally supplied chemicals for preparing the scan solution, and then discharged to the drain. Specifically, in a state in which the valve 125f is closed and the valve 125c is opened, the ultrapure water is introduced into the scan solution vessel 121 by adjusting the flow rate using the flow rate controller 124, and similarly, the first central supply chemical (HF) ) and the second central supply chemical (H ₂ O ₂ ) are introduced in the same manner after a predetermined time, but the flow rate and valve opening time are adjusted to match the final volume.

After waiting a certain time for chamber cleaning, the valve 125i is opened and the solution of the scan solution vessel 121 is discharged to the drain 128 using the pump 127 or gas pressure. This process may be omitted or repeated. may be

The scan solution is then automatically mixed with ultrapure water and centrally supplied chemicals and stored in a vessel. The manufacturing process of the scan solution is the same as the process of filling the ultrapure water and the centrally supplied chemical for cleaning the vessel described above, however, the concentration and the like may be different.

Then, the scan solution prepared through the flow path is transferred from the scan solution vessel 121 to the analyzer 70 to verify at least whether the prepared scan solution is contaminated. At this time, the valve 89 (FIG. 2), the switching valve 81, and the sample tube 82 are transferred to the analyzer 70 for analysis, and this process may be the same as the process of analyzing the scan solution in the calibration process. have. And if the measured result is more than the set value of trace amount, it is judged to be contaminated and remanufacturing and analysis is repeated as many times as set.

According to an embodiment of the present invention, there is an effect of preventing safety accidents and chemical contamination in an apparatus and method for analyzing substrate contamination and guaranteeing the quality of a prepared scan solution.

In addition, the scan solution manufacturing unit periodically discharges the centrally supplied chemical to the drain to prevent contamination due to the stagnation of the centrally supplied chemical. When the chemical solution is stagnant, contamination is spontaneously induced. In particular, the contamination may be caused by living organisms such as bacteria, but the scan solution manufacturing unit according to an embodiment of the present invention prevents contamination due to the stagnation of the chemical solution in advance.

Exhaust may be connected to the scan solution vessel 121 to facilitate supply of the chemical solution, and the chemical solution present in the scan solution vessel 121 may be removed by the drain 128 using the pump 127 or gas pressurization, and ultrapure water can be cleaned using In addition, by installing the chemical liquid level detection sensors 126a and 126b in the scan solution vessel 121, it is possible to automatically manufacture a new liquid when the liquid is insufficient, or to stop the operation for safety in case of excessive production.

8 is a schematic diagram illustrating an etching solution manufacturing unit according to an embodiment of the present invention.

The etching solution manufacturing unit automatically prepares an etching solution for global or point etching the bulk of the semiconductor substrate, and the etching solution manufacturing unit supplies chemical supply containers 133 and 134, point etchant vessel 131, and bulk etchant vessel. (132), a plurality of valves (136a ~ 136g) and is configured to include a metering pump (135).

The point etchant vessel 131 stores an etchant for point etching a substrate in order to analyze a point depth profile of the substrate, and is an etchant vessel for supplying the etchant to the scan nozzle 53 . The bulk etchant vessel 132 is an etchant vessel that etches from the VPD unit to the bulk of the substrate and stores the etchant for scanning and analyzing the bulk.

The metering pump 135 sequentially sucks in two or more chemicals and ultrapure water for preparing the etching solution, and then discharges it to the etching solution vessel of the point etching solution vessel 131 or the bulk etching solution vessel 132 . And the etching solution is converted into a gaseous state or supplied in a liquid state through a flow path from the etching solution vessels 131 and 132 to a chamber for global etching or a nozzle for point etching, and the chemical used is preferably hydrofluoric acid (HF) and nitric acid (HNO ₃ ).

Hereinafter, an automatic etching solution manufacturing process for preparing an etching solution in the etching solution manufacturing unit according to an embodiment of the present invention will be described.

The manufacturing process is a process of automatically preparing an etching solution for global etching or point etching of the bulk of a semiconductor substrate. The process of sequentially sucking in two or more chemicals and ultrapure water to prepare an etching solution and then discharging it to the etching solution vessel is repeated. The prepared etching solution is supplied from the etching solution vessel to a chamber for global etching or a nozzle for point etching through a flow path.

Open the valve 136c related to the first chemical (HNO ₃ ), suction the first chemical by a predetermined volume with the metering pump 135, close the valve 136c, open the valve 136e connected to the bulk etchant vessel 132, and open The first chemical inhaled is discharged using the metering pump 135. At this time, since only the valve 136e of the bulk etchant vessel 132 is opened, the chemical is supplied to the bulk etchant vessel 132 .

The second chemical and other chemical solutions such as ultrapure water are also supplied and prepared in the same way according to the predetermined dilution ratio, and the chemical solution for point etching can also be prepared in the same way.

Then, part or all of the flow path used for suction and discharge is purged with non-reactive gas between the process of repeating suction and discharge using the metering pump 135 . In order to complete the quantitative supply to the metering pump 135, a non-reactive gas such as N2 may be used to completely remove or supply the chemical solution that may remain in the tube.

In addition, if pressure is applied when supplying the chemical to the etching liquid vessel, an exhaust device can be installed to facilitate the supply, and the chemical liquid present in the etching liquid vessel can be removed through the drain by pressurizing the pump or gas, and can be cleaned using ultrapure water. . Chemical level detection sensors (137a, 137b, 138a, 138b) are installed in the etchant vessel so that when the chemical solution is insufficient, it can be automatically manufactured or the operation can be stopped for safety in case of excessive manufacturing. Chemical level detection sensors 139a and 139b are also provided in the supply containers 133 and 134 to provide an alarm when the chemical level is below a certain level.

In the substrate contaminant analysis apparatus and method according to an embodiment of the present invention, chemical preparation, such as a scan solution and an etchant required for analysis, supply to a scan nozzle, transfer of a sample solution after scanning, etc. can be performed completely automatically, Maintaining and replenishing chemical quality, calibrating the analyzer, maintaining sensitivity, maintaining performance, cleaning flow paths, recycling monitor wafers, etc. can be performed completely automatically in a single device.

In the conventional substrate contaminant analysis apparatus, there were a response delay due to the manual operation of the operator, a safety problem in chemical handling, a cross contamination problem, etc., but according to an embodiment of the present invention, in-line monitoring is possible in the substrate manufacturing process, and Closed Sampling As it is operated as a system, there are no safety problems and cross contamination problems in handling chemicals, and it has the effect of enabling real-time or rapid response.

10: load port 20: robot
30: aligner unit 40: VPD unit
50: scan unit 51: scan stage
52: scan module 53: scan nozzle
60: recycling unit 70: analyzer
80: sample solution introduction part 81: first switching valve
82: first sample tube 83: first liquid detection sensor
90: standard solution introduction part 91: second switching valve
92: second sample tube 93: second liquid detection sensor
94: T tube 100: sample introduction part
121: scan solution vessel 131: point etchant vessel

Claims (46)

A substrate contaminant analysis device for transferring a sample solution sucked from a substrate to be analyzed using a nozzle through a flow path from the nozzle to the analyzer,
A standard solution introduction part that is coupled using a T-tube in the middle of the flow path to which the sample solution is transferred and can introduce a standard solution for calibration into the flow path; including,
The standard solution introduction part,
a sample tube having a space to be loaded with the standard solution; and
A switching valve coupled to the sample tube and having at least a rod position at which the standard solution is loaded into the sample tube and an injection position for injecting the loaded standard solution toward the T-tube; including;
A substrate contaminant analysis device, characterized in that. The method according to claim 1,
In the rod position, the standard solution is spilled at a predetermined time or before calibration,
A substrate contaminant analysis device, characterized in that. The method according to claim 1,
Pushing the loaded standard solution as ultrapure water using a metering pump in the injection position,
A substrate contaminant analysis device, characterized in that. 4. The method according to claim 3,
At least when the sample solution is transferred through the T-tube, at least the flow path between the T-tube and the switching valve is filled with the ultrapure water,
A substrate contaminant analysis device, characterized in that. The method according to claim 1,
wherein the sample tube is a sample loop;
A substrate contaminant analysis device, characterized in that. The method according to claim 1,
wherein the switching valve is a 6 port injection valve;
A substrate contaminant analysis device, characterized in that. A substrate contaminant analysis device for transferring a sample solution sucked from a substrate to be analyzed using a nozzle through a flow path from the nozzle to the analyzer,
a sample solution introduction unit for loading the sample solution and then injecting the sample solution toward the analyzer; and
a standard solution introduction unit coupled to the flow path between the sample solution introduction unit and the analyzer using a T-tube to introduce a standard solution for calibration;
The sample solution introduction unit includes an ultrapure water carrier unit that pushes the sample solution with ultrapure water when the sample solution is injected toward the analyzer,
Even when diluting the standard solution for calibration, the ultrapure water carrier part is commonly used,
A substrate contaminant analysis device, characterized in that. A substrate contaminant analysis device for transferring a sample solution sucked from a substrate to be analyzed using a nozzle through a flow path from the nozzle to the analyzer,
a sample solution introduction unit for loading the sample solution and then injecting the sample solution toward the analyzer; and
a standard solution introduction unit coupled to the flow path between the sample solution introduction unit and the analyzer using a T-tube to introduce a standard solution for calibration;
When performing calibration of the analyzer with the standard solution, the sample solution introduction unit introduces a scan solution instead of the sample solution to dilute the standard solution,
A substrate contaminant analysis device, characterized in that. 9. The method according to claim 7 or 8,
The standard solution introduction part,
a sample tube having a space to be loaded with the standard solution;
A first port and a fourth port coupled to the sample tube, a third port coupled to a flow path to which the standard solution is supplied, a second port coupled to a suction pump for sucking the standard solution, a second port coupled to the T-tube 5 port, a switching valve including a sixth port to which ultrapure water is supplied to push the standard solution; including,
A substrate contaminant analysis device, characterized in that. 10. The method of claim 9,
When loading the standard solution, a connection is made between the first port and the second port, between the third port and the fourth port, and between the fifth port and the sixth port, and when injecting the standard solution a connection between the sixth port and the first port, between the second port and the third port, and between the fourth port and the fifth port,
A substrate contaminant analysis device, characterized in that. A method for analyzing substrate contamination performed in a substrate contamination analysis apparatus for transferring a scanned sample solution to an analyzer using a scanning solution on a substrate to be analyzed, comprising:
The process of calibrating the analyzer is
a first step of transferring the standard solution to the analyzer while diluting the standard solution in real time with ultrapure water with respect to at least one standard solution for analysis;
A second step of transferring the scan solution used for the scan to the analyzer and analyzing it; including,
Substrate contamination analysis method, characterized in that. 12. The method of claim 11,
If the analysis result of the scan solution in the second step is lower than the predetermined concentration set value, the analysis result of the first step is used to analyze the sample solution as it is,
Substrate contamination analysis method, characterized in that. 12. The method of claim 11,
The analysis result of the first step is corrected by the analysis result of the second step and is used to analyze the sample solution,
Substrate contamination analysis method, characterized in that. 14. The method of claim 13,
wherein the first step is performed at a plurality of different dilution concentrations and used to obtain a calibration curve;
Substrate contamination analysis method, characterized in that. 15. The method of claim 14,
Correcting the calibration curve according to the analysis result of the second step,
Substrate contamination analysis method, characterized in that. 15. The method of claim 14,
In analyzing the sample solution, subtracting the concentration of the scan solution according to the analysis result of the second step from the concentration of the sample solution,
Substrate contamination analysis method, characterized in that. 12. The method of claim 11,
For the real-time dilution in the first step,
The ultrapure water and the standard solution are respectively loaded into different sample tubes and then injected simultaneously by two different metering pumps and mixed in a T-tube,
Substrate contamination analysis method, characterized in that. 18. The method of claim 17,
The dilution ratio of the ultrapure water and the standard solution is determined by the discharge flow rates of the two different metering pumps,
Substrate contamination analysis method, characterized in that. A method for analyzing substrate contamination performed in a substrate contamination analysis apparatus for transferring a scanned sample solution to an analyzer using a scanning solution on a substrate to be analyzed, comprising:
A calibration curve is obtained by analyzing with the analyzer at a plurality of different dilution concentrations for a standard solution, and a series of the sample solutions are analyzed using the obtained calibration curve,
Measuring the standard solution with the analyzer to determine whether the measured concentration value is within a set range and automatically performing a sensitivity check step of checking the sensitivity at a set period or at a set time,
Substrate contamination analysis method, characterized in that. 20. The method of claim 19,
If the concentration value specified in the sensitivity check step is out of the set range, performing the process of obtaining the calibration curve again,
Substrate contamination analysis method, characterized in that. delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete

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