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KR102403787B1 - 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치 - Google Patents

청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치 Download PDF

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Publication number
KR102403787B1
KR102403787B1 KR1020170041499A KR20170041499A KR102403787B1 KR 102403787 B1 KR102403787 B1 KR 102403787B1 KR 1020170041499 A KR1020170041499 A KR 1020170041499A KR 20170041499 A KR20170041499 A KR 20170041499A KR 102403787 B1 KR102403787 B1 KR 102403787B1
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KR
South Korea
Prior art keywords
formula
blue
photosensitive resin
resin composition
color filter
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Application number
KR1020170041499A
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English (en)
Korean (ko)
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KR20180111082A (ko
Inventor
조성배
김형주
Original Assignee
동우 화인켐 주식회사
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Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to KR1020170041499A priority Critical patent/KR102403787B1/ko
Priority to TW106141183A priority patent/TWI738929B/zh
Priority to CN201780085893.6A priority patent/CN110268324B/zh
Priority to PCT/KR2017/013931 priority patent/WO2018182133A1/fr
Priority to JP2019542616A priority patent/JP6884872B2/ja
Publication of KR20180111082A publication Critical patent/KR20180111082A/ko
Application granted granted Critical
Publication of KR102403787B1 publication Critical patent/KR102403787B1/ko
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
KR1020170041499A 2017-03-31 2017-03-31 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치 Active KR102403787B1 (ko)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020170041499A KR102403787B1 (ko) 2017-03-31 2017-03-31 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
TW106141183A TWI738929B (zh) 2017-03-31 2017-11-27 藍色感光性樹脂組成物、以及利用彼製造之彩色濾光片與影像顯示裝置
CN201780085893.6A CN110268324B (zh) 2017-03-31 2017-11-30 蓝色感光性树脂组合物、利用其制造的滤色器及图像显示装置
PCT/KR2017/013931 WO2018182133A1 (fr) 2017-03-31 2017-11-30 Composition de résine photosensible bleue, filtre coloré fabriqué en l'utilisant, et dispositif d'affichage d'image
JP2019542616A JP6884872B2 (ja) 2017-03-31 2017-11-30 青色感光性樹脂組成物、これを用いて製造されたカラーフィルタおよび画像表示装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020170041499A KR102403787B1 (ko) 2017-03-31 2017-03-31 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치

Publications (2)

Publication Number Publication Date
KR20180111082A KR20180111082A (ko) 2018-10-11
KR102403787B1 true KR102403787B1 (ko) 2022-05-30

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Country Status (5)

Country Link
JP (1) JP6884872B2 (fr)
KR (1) KR102403787B1 (fr)
CN (1) CN110268324B (fr)
TW (1) TWI738929B (fr)
WO (1) WO2018182133A1 (fr)

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CN111183193B (zh) 2017-10-27 2022-12-20 三星Sdi株式会社 包含量子点的组成物、量子点与像素的制造方法以及彩色滤光器
KR102419673B1 (ko) 2019-01-21 2022-07-08 삼성에스디아이 주식회사 양자점, 이를 포함하는 경화성 조성물, 상기 조성물을 이용하여 제조된 경화막, 상기 경화막을 포함하는 컬러필터, 디스플레이 장치 및 상기 경화막의 제조방법
KR102296792B1 (ko) 2019-02-01 2021-08-31 삼성에스디아이 주식회사 무용매형 경화성 조성물, 이를 이용하여 제조된 경화막, 상기 경화막을 포함하는 컬러필터, 디스플레이 장치 및 상기 경화막의 제조방법
JP7435593B2 (ja) * 2019-03-22 2024-02-21 Jsr株式会社 感光性樹脂組成物、レジストパターンの形成方法、およびメッキ造形物の製造方法
KR102360987B1 (ko) 2019-04-24 2022-02-08 삼성에스디아이 주식회사 양자점 함유 경화성 조성물, 이를 이용한 수지막 및 디스플레이 장치
KR102504790B1 (ko) 2019-07-26 2023-02-27 삼성에스디아이 주식회사 양자점, 이를 포함하는 경화성 조성물, 상기 조성물을 이용하여 제조된 경화막, 상기 경화막을 포함하는 컬러필터, 디스플레이 장치
KR102602724B1 (ko) 2019-10-14 2023-11-14 삼성에스디아이 주식회사 양자점, 이를 포함하는 경화성 조성물, 상기 조성물을 이용하여 제조된 경화막 및 상기 경화막을 포함하는 컬러필터
KR102696681B1 (ko) * 2021-08-25 2024-08-19 동우 화인켐 주식회사 감광성 수지 조성물, 이를 이용한 돌출형 패턴 및 화상표시장치

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JP2017032918A (ja) 2015-08-05 2017-02-09 Jsr株式会社 硬化膜形成用組成物、硬化膜、発光表示素子、フィルム及び硬化膜の形成方法
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Also Published As

Publication number Publication date
JP6884872B2 (ja) 2021-06-09
WO2018182133A1 (fr) 2018-10-04
CN110268324B (zh) 2023-05-16
CN110268324A (zh) 2019-09-20
TW201837017A (zh) 2018-10-16
KR20180111082A (ko) 2018-10-11
JP2020506435A (ja) 2020-02-27
TWI738929B (zh) 2021-09-11

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