KR102539078B1 - Electric heated vest - Google Patents

Abstract

One embodiment of the present invention, for a gas analyzer analyzing, in advance, an analyzing target gas, which is to be provided to a process, may comprise: a target gas supplying unit which comprises supplying pipes matched for each analyzing target gas and supplying valves opening/closing the supplying pipes; a first analyzer analyzing a first characteristic and a second analyzer analyzing a second characteristic; an analysis selection unit which comprises selection pipes providing the analyzing target gas and selection valves opening/closing the selection pipes; an exhaust unit which has gas exhausted from the first analyzer and the second analyzer; bypass valves; a carrier gas supplying unit which is connected to the selection pipes to supply carrier gas which is mixed with the analyzing target gas; a fuzzy gas supplying unit which is connected to the selection pipes to supply fuzzy gas to the first analyzer and the second analyzer; a gas sensor which detects whether the analyzing target gas remains in the selection pipes after the fuzzy; and a control unit which controls the supplying valves, the selection valves and the bypass valves, the carrier gas supplying unit, the fuzzy gas supplying unit, the gas sensor, the first analyzer and the second analyzer. Accordingly, the special gas analyzer can efficiently analyze moisture, particles, and purity.

Description

Special gas analyzer {ELECTRIC HEATED VEST}

The present invention relates to a special gas analyzer, and more particularly, to a special gas analyzer that analyzes moisture, particles, purity, etc. in advance for various gases supplied to a process.

In general, a lot of special gases are required in the manufacturing process of semiconductors, FPDs, and LEDs. In the case of mixed gas, it is reborn into a very large number of types of gas according to the mixing ratio, and the items that account for the largest share among them are high-purity nitrous oxide (N2O), fluorine (F2) mixed gas, high-purity carbon dioxide (CO2), and tetrahydrogenation. It is a gas used in the cleaning, etching, and deposition process of semiconductors and displays, such as germanium (GeH4). For example, a semiconductor device requires a large amount of special gas while going through a pattern process, an etching process, an ion implantation process, etc. on a wafer, which is a substrate. Since these special gases have a close relationship with semiconductor production yield, continuous monitoring and management are required. If the purity required for the special gas or the concentration of the characteristic component exceeds the standard value, it adversely affects the wafer due to photoresist deformation and cloudiness of the optical microscope, causing product defects. Therefore, it is very important to quickly and accurately analyze special gases in advance to improve the quality of wafer production.

Therefore, it is essential to analyze specific components such as moisture, particles, purity, and carbon in advance before special gases such as nitrogen are supplied to the process. If there are many types of gases to be analyzed in advance and there are many items to be inspected or analyzed for a specific gas, it takes a lot of time to perform this and errors are likely to occur if the inspection setting is complicated. In addition, in the process of repeating the process of analyzing a specific gas, purging it, and supplying another gas again, there is a case where a dead zone in which the gas remains occurs, so there is a problem in that more analysis time is required. Accordingly, there is a need for a gas analyzer that performs efficient and accurate analysis.

A technical problem to be achieved by the present invention is to provide a special gas analyzer that efficiently analyzes moisture, particles, purity, etc. in advance for various gases supplied to the process.

The technical problem to be achieved by the present invention is not limited to the above-mentioned technical problem, and other technical problems not mentioned can be clearly understood by those skilled in the art from the description below. There will be.

In order to achieve the above technical problem, an embodiment of the present invention is a gas analysis device for pre-analyzing a target gas to be supplied to a process, supply pipes matched for each target gas to be analyzed, and opening and closing the supply pipes a target gas supply unit including supply valves; a first analyzer receiving the analysis target gas supplied by the gas supplier and analyzing a first characteristic and a second analyzer analyzing a second characteristic; an analysis selection unit including selection pipes for supplying the target gas to the first analyzer and the second analyzer, and selection valves for opening and closing the selection pipes; an exhaust unit through which gas is exhausted from the first analyzer and the second analyzer; bypass valves installed in the selection valves to bypass the selection pipes to the exhaust before supplying the target gas to the first analyzer and the second analyzer; a carrier gas supply unit connected to the selection pipes to supply a carrier gas mixed with the target gas; a purge gas supply unit connected to the selection pipes to supply purge gas to the first analyzer and the second analyzer; a gas sensor that detects whether or not the gas to be analyzed remains in the selected pipes even after purging; and a controller configured to control the supply valves, the selection valves and the bypass valves, the carrier gas supply unit, the purge gas supply unit, the gas sensor, the first analyzer, and the second analyzer. .

In an embodiment of the present invention, the first analyzer analyzes components of the target gas together, the second analyzer analyzes one component of the target gas, and the selection valves are configured to analyze components of the target gas. A regulator and a PT sensor are installed to equalize the pressure, and a pressure gauge and an MFC for measuring the pressure of the exhaust gas may be installed in the exhaust unit.

In an embodiment of the present invention, the bending angle of the bent portion of the selected pipe is less than 45 degrees, so that the gas to be analyzed can be prevented from remaining in the bent portion.

According to an embodiment of the present invention, it is to provide a special gas analyzer that efficiently analyzes moisture, particles, purity, etc. in advance for various gases supplied to a process.

The effects of the present invention are not limited to the above effects, and should be understood to include all effects that can be inferred from the detailed description of the present invention or the configuration of the invention described in the claims.

1 to 3 are photographs of actual products showing a gas analysis device according to an embodiment of the present invention.
4 is a view showing a gas analysis device according to an embodiment of the present invention.
FIG. 5 is a side view of the gas analysis device shown in FIG. 4 .
FIG. 6 is a view showing selection pipes and selection valves shown in FIG. 4 .
FIG. 7 is a block diagram illustrating an operation of the gas analyzer shown in FIG. 4 .

Since the present invention may have various changes and various forms, specific embodiments are illustrated in the drawings and described in detail in the text. However, it should be understood that this is not intended to limit the present invention to the specific disclosed form, and includes all modifications, equivalents, and substitutes included in the spirit and scope of the present invention. Like reference numerals have been used for like elements throughout the description of each figure.

Unless defined otherwise, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which the present invention belongs. Terms such as those defined in commonly used dictionaries should be interpreted as having a meaning consistent with the meaning in the context of the related art, and unless explicitly defined in the present application, they should not be interpreted in an ideal or excessively formal meaning. don't

Hereinafter, with reference to the accompanying drawings, preferred embodiments of the present invention will be described in more detail.

1 to 3 are pictures of actual products showing a gas analysis device 1 according to an embodiment of the present invention. 4 is a diagram showing a gas analyzer 1 according to an embodiment of the present invention. FIG. 5 is a side view of the gas analyzer 1 shown in FIG. 4 . FIG. 6 is a view showing the selection pipes 21 and selection valves 22 shown in FIG. 4 .

The gas analyzer 1 of the present embodiment is a device that pre-inspects a special gas to be supplied to a factory, and can perform various analyzes on a gas to be analyzed with a plurality of analyzers.

The gas analyzer 1 includes a target gas supply unit 10, an analysis selection unit 20, a first analyzer 30, a second analyzer 40, a bypass unit 50, a carrier gas supply unit 60, a vessel It may include a base 80, a purge gas supply unit 70, and a control unit 90.

Referring to FIGS. 1 and 4 , the target gas supply unit 10 may include supply pipes 11 and supply valves 12 . The supply pipes 11 may be matched for each target gas to be analyzed and connected to a supply tank for each gas. For example, each supply pipe 11 corresponding to a special gas such as nitrogen, N2O, NH3, PH3 mixed gas, CH4, SF6, CO, SO2, H2S, and SiH4 as an analysis target gas has supply valves 12 can be installed The supply valve 12 may be, for example, a pneumatic valve. Pneumatic pressure may be supplied from the outside to operate the pneumatic valve.

The first analyzer 30 and the second analyzer 40 may selectively receive the target gas supplied by the target gas supplier 10 . The gas analysis device 1 may include an installation frame 5 . The installation frame 5 may be formed in multiple stages as shown in FIGS. 4 and 5 . The first analyzer 30 is installed at the center end and the second analyzer 40 is installed at the bottom end. Of course, the number of analyzers can be further increased, and the arrangement position of the analyzers can be changed as needed.

The gas to be analyzed may be supplied to only one of the first analyzer 30 and the second analyzer 40 or both. The first analyzer 30 may analyze a first characteristic of the target gas, and the second analyzer 40 may analyze a second characteristic. The first analyzer 30 may be a device that comprehensively analyzes all components of the target gas. The second analyzer 40 may analyze one characteristic of the target gas, for example, moisture, particles, or an element (eg, carbon). Accordingly, for the target gas, analysis of only a specific component by the second analyzer 40 and analysis of properties of various components by the first analyzer 30 may be performed simultaneously or selectively. Such flexible control can be achieved by the gas selector.

The analysis selector 20 includes selection pipes 21 that supply the target gas to be analyzed to the first analyzer 30 and the second analyzer 40, and selection valves 22 that open and close the selection pipes 21. can do. Referring to FIG. 4 , the supply pipes 11 are connected to the selection pipes 21 while extending from the top to the bottom. The selection pipes 21 may extend horizontally. Selection valves 22 are provided in each selection pipe 21 . Therefore, the selector valves 22 are arranged in the vertical direction. When the selection valve 22 is opened, the target gas to be analyzed may flow into the corresponding selection pipe 21 . A regulator and a pressure transmitter (PT) sensor may be installed in the selection valves 22 to equalize the pressure to be analyzed.

The exhaust unit 80 may include exhaust pipes 81 through which gas is exhausted from the first analyzer 30 and the second analyzer 40 . An MFC for controlling pressure gauges and exhaust gas may be installed in the exhaust pipe 81 . That is, by controlling the flow rate of exhaust, the pressure inside the first analyzer 30 and the second analyzer 40 can be kept constant. A bypass unit 50 may be installed in the selection valves 22 . The bypass section includes bypass valves 52 . The bypass valves 52 may bypass the selection pipes 21 to the exhaust unit 80 before supplying the target gas to the first analyzer 30 and the second analyzer 40 if necessary.

The gas analyzer 1 may further include a carrier gas supply unit 60 , a purge gas supply unit 70 , a controller 90 and a gas sensor 7 .

The carrier gas supply unit 60 may be connected to the selection pipes 21 to supply a carrier gas (eg, helium, nitrogen, or argon) mixed with the target gas to be analyzed. The carrier gas may be mixed with the target gas and provided to the first analyzer 30 or the second analyzer 40 . The carrier gas may be supplied at any time while the gas to be analyzed is supplied. The purge gas supply unit 70 may be connected to the selection pipes 21 to supply purge gas to the first analyzer 30 and the second analyzer 40 . A purge gas may be provided to purge the inside of the first analyzer 30 or the second analyzer 40 when the gas to be analyzed is discharged.

The gas sensor 7 may be installed before or after the bypass valves 52 of the selection pipes 21 . A gas sensor may be installed in the exhaust unit 80 . The gas sensor may detect whether the gas to be analyzed remains in the selected pipes 21 even after purging. The bending angle of the bent portion of the selection pipe 21 is smaller than 45 degrees, so the effect of preventing the analysis target gas from remaining in the bent portion can be improved.

The control unit 90 includes supply valves 12, selection valves 22 and bypass valves 52, a carrier gas supply unit 60, a purge gas supply unit 70, a gas sensor 7, and a first analyzer. (30) and the second analyzer (40) can be controlled.

FIG. 7 is a block diagram illustrating the operation of the gas analyzer 1 shown in FIG. 4 .

First, an analysis target gas and a type of analysis may be input to the control unit 90 . Accordingly, the control unit 90 may control the supply valves 12 to open the supply valve 12 corresponding to the input target gas to be analyzed to supply the target gas to the selection pipes 21 . At this time, the carrier gas may be supplied to the selection pipes 21 . Thereafter, a specific selection valve 22 among the selection valves 22 may be opened and the others may be closed by the control unit 90 . Accordingly, the target gas to be analyzed may be supplied to the first analyzer 30 and the second analyzer 40 to which the selection pipes 21 are connected. The first analyzer 30 and the second analyzer 40 may be provided with a plurality of input ports to which the selection pipes 21 are connected. A gas to be analyzed may be supplied through a selection pipe 21 connected to a specific port among the plurality of input ports. Thereafter, analysis of the target gas may be performed in the first analyzer 30 or the second analyzer 40 . After the analysis is completed, gas may be exhausted from the first analyzer 30 and the second analyzer 40 to the exhaust unit 80 . At this time, the pressure in the first analyzer 30 and the second analyzer 40 may be maintained constant while the exhaust amount is controlled by the pressure gauge and the MFC of the exhaust unit 80 . In this exhausting step, the purge gas is supplied from the purge gas supply unit 70 to the selection pipes 21 to exhaust the gas in the first analyzer 30 and the second analyzer 40 . Meanwhile, the selection pipe 21 not involved in the purge process may be bypassed to the exhaust unit 80 by the bypass valve 52 . The control unit 90 may supply a purge gas or a carrier gas to complete the purge when it is detected from the gas sensor whether or not the gas remains after the purge process. Thereafter, the supply valve 12 , the bypass valve 52 , and the selection valve 22 may be controlled to supply the gas to be analyzed next to the first analyzer 30 and the second analyzer 40 .

The above description of the present invention is for illustrative purposes, and those skilled in the art can understand that it can be easily modified into other specific forms without changing the technical spirit or essential features of the present invention. will be. Therefore, the embodiments described above should be understood as illustrative in all respects and not limiting. For example, each component described as a single type may be implemented in a distributed manner, and similarly, components described as distributed may be implemented in a combined form.

The scope of the present invention is indicated by the following claims, and all changes or modifications derived from the meaning and scope of the claims and equivalent concepts should be interpreted as being included in the scope of the present invention.

1: Gas analysis device
10: target gas supply unit
11: supply piping
12: supply valve
20: analysis selection unit
21: Selected piping
22: selection valve
30: first analyzer
40: second analyzer
50: bypass part
52: bypass valve
60: carrier gas supply unit
70: purge gas supply unit
80: exhaust part
81: exhaust pipe
90: control unit

Claims (3)

In the gas analysis device for pre-analyzing the target gas to be analyzed to be provided to the process,
a target gas supply unit including supply pipes matched for each target gas to be analyzed, and supply valves that open and close the supply pipes;
a first analyzer receiving the analysis target gas supplied by the gas supplier and analyzing a first characteristic and a second analyzer analyzing a second characteristic;
an analysis selection unit including selection pipes for supplying the target gas to the first analyzer and the second analyzer, and selection valves for opening and closing the selection pipes;
an exhaust unit through which gas is exhausted from the first analyzer and the second analyzer;
bypass valves installed in the selection valves to bypass the selection pipes to the exhaust before supplying the target gas to the first analyzer and the second analyzer;
a carrier gas supply unit connected to the selection pipes to supply a carrier gas mixed with the target gas;
a purge gas supply unit connected to the selection pipes to supply purge gas to the first analyzer and the second analyzer;
a gas sensor that detects whether or not the gas to be analyzed remains in the selected pipes even after purging; and
A control unit controlling the supply valves, the selection valves and the bypass valves, the carrier gas supply unit, the purge gas supply unit, the gas sensor, the first analyzer and the second analyzer,
The first analyzer comprehensively analyzes the components of the target gas,
The second analyzer analyzes one component of the target gas to be analyzed;
A regulator and a PT sensor are installed in the selection valves to equalize the pressure of the gas to be analyzed,
A pressure gauge and an MFC for measuring the pressure of exhaust gas are installed in the exhaust unit,
The bending angle of the bent part of the selected pipe is smaller than 45 degrees to prevent the gas to be analyzed from remaining in the bent part,
When the control unit exhausts the gas in the first analyzer and the second analyzer by supplying purge gas to the selection pipes from the purge gas supply unit in the exhausting step, the selection pipes not involved in the purge process are bypassed to the exhaust section by the bypass valve. After the control unit detects whether or not the purge process remains from the gas sensor, if it is detected that the exhaust is not sufficient and remains, the control unit supplies a purge gas or a carrier gas to control the complete purge, and then, A gas analyzer characterized in that a gas to be analyzed subsequently is supplied to a first analyzer and a second analyzer by controlling a supply valve, a bypass valve, and a selector valve.
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