KR102595405B1 - Mobile unit apparatus, exposure apparatus, method for manufacturing flat panel display, method for manufacturing device, and method for driving mobile unit - Google Patents

Abstract

The substrate stage device 20 uses the fine motion stage 24, the X coarse motion stage 34, the Y coarse motion stage 32, and a thrust for moving the It includes a voice coil motor 72 Controls the actuator unit ( ₇₀ A control system that controls one actuator is provided.

Description

A moving body device, an exposure device, a method of manufacturing a flat panel display, a method of manufacturing a device, and a method of driving a moving body {MOBILE UNIT APPARATUS, EXPOSURE APPARATUS, METHOD FOR MANUFACTURING FLAT PANEL DISPLAY, METHOD FOR MANUFACTURING DEVICE, AND METHOD FOR DRIVING MOBILE UNIT}

The present invention relates to a moving body apparatus, an exposure apparatus, a method of manufacturing a flat panel display, a device manufacturing method, and a method of driving a moving body, and more specifically, a moving body apparatus for relatively moving a first and a second moving body, and a moving body It relates to a driving method, an exposure apparatus including the moving body device, and a method of manufacturing a flat panel display or device using the exposure apparatus.

Conventionally, in the lithography process for manufacturing electronic devices (micro devices) such as liquid crystal display elements and semiconductor elements (integrated circuits, etc.), a glass plate or wafer (hereinafter referred to as “substrate”) is illuminated with illumination light (energy beam) through a projection optical system (lens). An exposure apparatus is used that transfers a predetermined pattern of a photomask or reticle (hereinafter, collectively referred to as "mask") to the substrate by exposing the photomask or reticle (hereinafter, collectively referred to as "mask").

This type of exposure apparatus is equipped with a coarse motion stage that can move in a horizontal plane with a long stroke and a fine motion stage that holds the substrate, and uses a fine motion actuator such as an electronic motor to achieve coarse motion. It is known that a stage device with a coarse-to-fine motion configuration is provided that provides thrust from the stage to the fine-movement stage and performs high-precision position control of the fine-motion stage (for example, see Patent Document 1).

Here, with the recent increase in the size of substrates, there is a tendency for the fine moving stage to become larger. In line with this, the above-mentioned fine motion actuator is also required to have higher output (larger size) in order to cope with the increase in the size of the fine motion stage that is the object to be driven.

US Patent Application Publication No. 2010/0018950 Specification

According to the first aspect, a first movable body capable of moving in a predetermined direction, a second movable body in which the first movable body is formed to be relatively movable, a second movable body movable in the predetermined direction, a base supporting the second movable body, and a first actuator that applies a thrust to move the second movable body relative to the base in the predetermined direction as a first thrust to the first movable body; and a first actuator that applies the thrust to the first movable body as a second thrust greater than the first thrust. An actuator unit comprising a second actuator provided to a moving body, relatively driving the first and second moving bodies with respect to the base in the predetermined direction, controlling the first and second actuators, and and a control system that controls at least one of the first and second actuators based on a thrust required when moving the second movable body relative to the base.

According to a second aspect, there is provided an exposure apparatus comprising the moving body device according to the first aspect and a pattern forming device for forming a predetermined pattern using an energy beam on an object held on the first moving body of the moving body device. do.

According to a third aspect, a method of manufacturing a flat panel display is provided, including exposing the object using the exposure apparatus according to the second aspect and developing the exposed substrate.

According to a fourth aspect, a device manufacturing method is provided including exposing the object using the exposure apparatus according to the second aspect and developing the exposed object.

According to the fifth aspect, a first mobile body capable of moving in a predetermined direction, the first mobile body being formed to be relatively movable, and a second mobile body capable of moving in the predetermined direction, the second mobile body with respect to the predetermined direction. driving the second moving body relative to a supporting base, applying a thrust to move the second moving body relative to the base in the predetermined direction as a first thrust to the first moving body using a first actuator, and A thrust for relatively moving the second moving body in the predetermined direction with respect to the base is given as a second thrust greater than the first thrust to the first moving body using a second actuator, and the first and second Driving a moving body, including controlling an actuator and controlling at least one of the first and second actuators based on a thrust required when moving the first and second moving bodies relative to the base. A method is provided.

1 is a diagram schematically showing the configuration of a liquid crystal exposure apparatus according to an embodiment.
FIG. 2 is a diagram for explaining the configuration of a first drive system (fine-moving stage drive system) among the substrate drive systems included in the liquid crystal exposure apparatus of FIG. 1.
Fig. 3 is a conceptual diagram of the first drive system.
FIG. 4 is a diagram for explaining the control balance of two actuators of the first drive system.
Fig. 5 is a control block diagram of the first drive system.
Fig. 6 is a block diagram showing the input/output relationship of the main control device included in the liquid crystal exposure apparatus.

Hereinafter, one embodiment will be described using FIGS. 1 to 6.

FIG. 1 schematically shows the configuration of an exposure apparatus (here, a liquid crystal exposure apparatus 10) according to an embodiment. The liquid crystal exposure apparatus 10 is a step-and-scan projection exposure apparatus, so-called scanner, that uses an object (here, a glass substrate P) as an exposure object. The glass substrate (P) (hereinafter simply referred to as “substrate (P)”) is formed into a square (square) shape when viewed from the top, and is used in liquid crystal display devices (flat panel displays) and the like.

The liquid crystal exposure device 10 includes an illumination system 12, a mask stage device 14 holding a mask M on which a circuit pattern, etc. is formed, a projection optical system 16, an apparatus main body 18, and a surface (+ in FIG. 1). It has a moving body device (here, a substrate stage device 20) that moves a substrate P coated with a resist (sensitizer) on the surface facing the Z side relative to the projection optical system 16, and a control system thereof, etc. there is. Hereinafter, the direction in which the mask M and the substrate P are scanned relative to the projection optical system 16 during exposure is referred to as the X-axis direction, and the direction orthogonal to the And the direction perpendicular to the Y axis is referred to as the Z axis direction, and the directions of rotation around the X, Y, and Z axes are described as the θx, θy, and θz directions, respectively. In addition, the description will be made by assuming that the positions in the X-axis, Y-axis, and Z-axis directions are the X position, Y position, and Z position, respectively.

The illumination system 12 is configured in the same manner as the illumination system disclosed in U.S. Patent No. 5,729,331, etc., and directs light emitted from a light source (mercury lamp, laser diode, etc.) not shown into a reflector and diode, respectively, not shown. A plurality of exposure illumination lights (illumination lights) IL are irradiated onto the mask M through a wing mirror, shutter, wavelength selection filter, various lenses, etc. As the illumination light (IL), light such as i-line (wavelength 365 nm), g-line (wavelength 436 nm), and h-line (wavelength 405 nm) (or composite light of the i-line, g-line, and h-line) is used. do.

As the mask M held by the mask stage device 14, a transmissive photomask with a predetermined circuit pattern formed on the lower surface (the surface facing the -Z side in FIG. 1) is used. The mask stage device 14 is a stage device of a so-called fine-moving configuration, the same as that disclosed in International Publication No. 2010/131485, and includes a main stage (fine-moving stage) 14a holding the mask M, and a pair. It is equipped with a sub-stage (coordination stage) 14b. Each substage 14b is driven with a long stroke in the X-axis direction by a linear motor on a corresponding stand 14c. In the mask stage device 14, the main motor is driven from the sub-stage 14b by the linear motor and a plurality of voice coil motors 14d constituting the mask drive system 92 (not shown in Fig. 1, see Fig. 6). Thrust is appropriately provided to stage 14a. The main control device 90 (not shown in FIG. 1, see FIG. 6) controls the main stage 14a (mask M) to the illumination light IL through the mask drive system 92, and a pair of sub-stages ( 14b) is driven in a long stroke in the The position information in the It becomes.

The projection optical system 16 is disposed below the mask stage device 14. The projection optical system 16 is a so-called multi-lens projection optical system having the same configuration as the projection optical system disclosed in U.S. Patent No. 6,552,775, etc., and includes a plurality of telecentric equal magnification systems on both sides to form an upright image. Equipped with a lens module.

In the liquid crystal exposure apparatus 10, when the illumination area on the mask M is illuminated by a plurality of illumination lights IL from the illumination system 12, the illumination light IL that has passed (transmitted) the mask M, Through the projection optical system 16, a projection image (partially erect image) of the circuit pattern of the mask M within the illumination area is formed on the irradiation area (exposure area) of the illumination light conjugate to the illumination area on the substrate P. Then, the mask M moves relative to the illumination area (illumination light IL) in the scanning direction, and the substrate P moves relative to the exposure area (illumination light IL) in the scanning direction, thereby causing the substrate ( Scanning exposure of one shot area on P) is performed, and the pattern formed on the mask M is transferred to the shot area.

The device main body 18 supports the mask stage device 14 and the projection optical system 16, and is installed on the floor F of the clean room through a vibration isolation device 19. The device main body 18 is configured in the same manner as the device main body disclosed in US Patent Application Publication No. 2008/0030702, and includes an upper mount portion 18a, a pair of middle mount portions 18b, and a lower mount portion. We have (18c). The stand 14c of the above-described mask stage device 14 is installed on the floor F in a state physically separated from the device main body 18 so as to be vibrationally insulated from the device main body 18. It is done.

The substrate stage device 20 is a device for positioning the substrate P with respect to the projection optical system 16 (illumination light IL) with high precision, and specifically, positions the substrate P with respect to the illumination light IL. It is driven with a predetermined long stroke along the horizontal plane (X-axis direction and Y-axis direction), and is driven in small directions in six degrees of freedom directions (X-axis, Y-axis, Z-axis, θx, θy and θz directions). . The substrate stage device 20 is a stage device with a so-called coarse copper configuration, configured in the same manner as disclosed in U.S. Patent Application Publication No. 2012/0057140, etc., except for the first drive system 62 (see FIG. 6) described later. As, a fine movement stage 24 for holding the substrate P through a substrate holder 22, a gantry type coarse movement stage 26, a weight support device 28, a base frame 30, and a substrate stage device 20. ) a substrate driving system 60 (not shown in FIG. 1, see FIG. 6) for driving each element constituting the board, and a substrate measurement system 96 (not shown in FIG. 1, see FIG. 6) for measuring the position information of each element. (see Figure 6), etc.

The fine moving stage 24 is formed in a rectangular plate shape (or box shape) when viewed from the top, and a substrate holder 22 is fixed to its upper surface. The substrate holder 22 is formed in a rectangular plate shape (or box-shaped) when viewed from a plane with dimensions in the A substrate (P) is placed on. The dimensions of the upper surface of the substrate holder 22 in the X-axis and Y-axis directions are set to the same extent as those of the substrate P (actually slightly shorter). The substrate P is held on the upper surface of the substrate holder 22 by vacuum suction while placed on the upper surface of the substrate holder 22, so that almost the entire surface (entire surface) is straightened along the upper surface of the substrate holder 22.

The coarse motion stage 26 is provided with a Y coarse motion stage 32 and an X coarse motion stage 34. The Y coarse motion stage 32 is located below the fine motion stage 24 (-Z side) and is disposed on the base frame 30. The Y coarse motion stage 32 has a pair of X beams 36 arranged in parallel at predetermined intervals in the Y axis direction. A pair of The base frame 30 is installed on the floor F in a state physically separated from the device main body 18 so as to be vibrationally insulated from the above-described device main body 18.

The . The While it can move freely in the X-axis direction with respect to the Y coarse motion stage 32, it moves integrally with the Y coarse motion stage 32 in the Y-axis direction.

The self-weight support device 28 is provided with a weight cancellation device 42 that supports the self-weight of the fine moving stage 24 from below, and a Y step guide 44 that supports the weight cancellation device 42 from below. . The weight cancellation device 42 (also called a core pillar, etc.) is inserted into an opening (not shown) formed in the ) are mechanically connected to each other through a plurality of connecting members (not shown), also called flexure devices. The weight cancellation device 42 is pulled by the X coarse motion stage 34 and moves in the X-axis and/or Y-axis directions integrally with the

The weight cancellation device 42 supports the self-weight of the fine movement stage 24 from below in a non-contact manner through a pseudo-spherical bearing device called the leveling device 46. The leveling device 46 supports the fine movement stage 24 so that it can freely swing (tilt operation) with respect to the XY plane. The leveling device 46 is supported in a non-contact state from below by the weight canceling device 42 via an air bearing (not shown). Thereby, the relative movement of the fine movement stage 24 in the X-axis, Y-axis, and θz directions with respect to the weight cancellation device 42 (and the relative movement) is allowed. The structure and function of the weight canceling device 42, the leveling device 46, and the flexure device are disclosed in the specification of US Patent Application Publication No. 2010/0018950, etc., and therefore description is omitted.

The Y step guide 44 is made of a member extending parallel to the X axis and is disposed between a pair of X beams 36 included in the Y coarse motion stage 32. The Y step guide 44 supports the weight cancellation device 42 in a non-contact state through the air bearing 48, and functions as a platform when the weight cancellation device 42 moves in the X-axis direction. The Y step guide 44 is mounted on the lower stand portion 18c via a mechanical linear guide device 50 and is allowed to freely move in the Y-axis direction with respect to the lower stand portion 18c. The Y step guide 44 is mechanically connected to a pair of It moves in the Y-axis direction integrally with the coarse motion stage 32.

The substrate drive system 60 (not shown in FIG. 1, see FIG. 6) is a first drive system 62 for driving the fine movement stage 24 in a direction of 6 degrees of freedom with respect to the projection optical system 16 (illumination light IL). ) (see FIG. 6), a second drive system 64 (see FIG. 6) for driving the Y coarse motion stage 32 with a long stroke in the Y axis direction on the base frame 30, and the It is provided with a third drive system 66 (see FIG. 6) for driving the Y coarse motion stage 32 in a long stroke in the X-axis direction. The type of actuator constituting the second drive system 64 and the third drive system 66 is not particularly limited, but as an example, it is possible to use a linear motor, a ball screw drive device, etc. (in FIG. 1, a linear motor, a ball screw drive device, etc. motor is shown). The detailed configuration of the second and third drive systems 64 and 66 is disclosed as an example in the specification of US Patent Application Publication No. 2010/0018950, etc., and therefore description is omitted.

FIG. 2 shows a top view of the substrate stage device 20 with the substrate holder 22 (see FIG. 1) removed (the Y coarse stage 32, the base frame 30 (each shown in FIG. 1), etc. are also shown. skip). As shown in FIG _. 2 , the first drive system 62 includes _a pair of It has a pair of Y actuator units (70Y ₁ , 70Y ₂ ) to provide thrust in the Y axis direction. A pair _of X actuator units ( ₇₀ A pair _of X actuator units ( ₇₀ Here, “the system including the fine-moving stage 24” means including the fine-moving stage 24 and its integral parts (substrate holder 22, etc., see FIG. 1).

A pair of Y actuator units 70Y ₁ and 70Y ₂ are arranged spaced apart in the X-axis direction on the +Y side of the fine movement stage 24. A pair of Y actuator units 70Y ₁ and 70Y ₂ are arranged symmetrically (left and right symmetry in FIG. 2 ) with respect to the center of gravity position G of the system including the fine movement stage 24. Since _the configuration of each Y actuator unit (70Y ₁ , 70Y ₂ ) is the _same as the The configuration is explained. In Fig. 1, in order to explain the configuration of the coarse motion stage 26, the self-weight support device 28, etc., a pair of X actuator units 70X ₁ and 70X ₂ are not shown for convenience.

The X actuator unit (70X ₁ ) has one set of actuators including a moving magnet type X voice coil motor (72X) and an The X voice coil motor 72 It is mainly used when accelerating the fine moving stage 24 to a predetermined exposure speed. As for the X voice coil motor 72X and the X air actuator 74X included in the X actuator unit ₇₀ The X air actuator 74X is used with a higher output (able to generate a large thrust force) than the In contrast, as the

The stator 76a of the The X air actuator 74X has a bellows made of synthetic rubber, and one end of the bellows in the stretching direction (here, the The other end is mechanically connected to the side of the fine moving stage 24. In this way, the X voice coil motor 72X and the The reaction force acts only on the can do). Details of the X voice coil motor (72X), X air actuator (74X), and their control system will be described later.

The main control device 90 (see FIG. 6) uses a third drive system 66 to move the fine stage 24 from a stationary state (a state in which the speed and acceleration are zero) to a state in which the fine moving stage 24 moves at a predetermined constant speed in the scanning exposure operation. ) (see FIG. 6) to give a thrust (acceleration) in the X-axis direction to the ) Thrust (acceleration) in the X-axis direction is given from the X coarse motion stage 34 to the fine motion stage 24. In addition, after the X coarse motion stage 34 and the fine motion stage 24 reach the desired exposure speed (or just before reaching the exposure speed), the By applying a smaller thrust force to the fine movement stage 24 from the stage 34 through the first drive system 62 than during the acceleration drive control, the fine movement stage 24 is controlled to drive at a constant speed. In addition, during scanning exposure, in parallel with the constant speed movement control, based on the alignment measurement results, etc., the fine movement stage 24 is moved to a horizontal plane with respect to the projection optical system 16 (see FIG. 1) through the first drive system 62. It is driven slightly in one of the three degrees of freedom directions (at least one of the X-axis direction, Y-axis direction, and θz direction). In addition, the main control device 90 moves the Y coarse motion stage 32 through the second drive system 64 (see FIG. 6) during a movement operation (Y step operation) between short areas of the substrate P in the Y-axis direction. , and a thrust in the Y-axis direction is provided to the X coarse motion stage 34, and a thrust in the Y-axis direction is provided from the

In this way, when controlling the drive of the fine stage 24, the main control device 90 (see FIG. 6) includes a total of four actuator units (70X ₁ , 70X ₂ , 70Y) included in the first drive system 62. ₁ , 70Y ₂ ) is appropriately used to appropriately provide thrust in the X-axis direction, Y-axis direction, and θz direction to the fine moving stage 24. At this time, one or both of the 1 set (2 pieces) of actuators (X actuator unit (70X ₁ ), X voice coil motor (72X), and It is used (according to a control algorithm) with a predetermined control balance that is preset based on the conditions when driving the stage 24. This predetermined control balance will be described later.

In addition, the first drive system 62 (see FIG. 6) is for driving the fine motion stage 24 in the Z tilt direction (the Z axis direction and the direction that swings with respect to the XY plane) with respect to the X coarse motion stage 34. It is equipped with a Z tilt drive system 68 (see FIG. 6). As shown in FIG. 1 , the Z tilt drive system 68 includes a plurality of Z voice coil motors 72Z disposed between the fine motion stage 24 and the X coarse motion stage 34. The plurality of Z voice coil motors 72Z are arranged at at least three points that are not on the same straight line. The configuration of the Z tilt drive system 68, including the Z voice coil motor 72Z, is disclosed in the specification of US Patent Application Publication No. 2010/0018950, etc., and therefore description is omitted.

The positional information in the six degrees-of-freedom directions of the fine stage 24 (substrate P) is obtained by the main control device 90 (refer to FIG. 6, respectively) through the substrate measurement system 96. Substrate metrology 96 includes an optical interferometer system including an optical interferometer 54 fixed to device body 18. In addition, in FIG. 1, only the Y interferometer for obtaining the positional information in the Y-axis direction of the fine-moving stage 24 is shown, but in reality, the Y interferometer and the positional information in the X-axis direction of the fine-moving stage 24 are obtained. A plurality of X interferometers for each are arranged. Additionally, a bar mirror 56 corresponding to the optical interferometer 54 is fixed to the fine moving stage 24 (only the Y bar mirror corresponding to the Y interferometer is shown in FIG. 1). In addition, although not shown in FIG. 1, the substrate measuring system 96 also includes a Z tilt measuring system (the structure of which is not particularly limited) for obtaining positional information in the Z tilt direction of the fine movement stage 24. An example of an optical interferometer system and a Z tilt measurement system is disclosed in the specification of US Patent Application Publication No. 2010/0018950, etc., and therefore description is omitted. In addition, the configuration of the measurement system for obtaining the positional information in the horizontal plane of the fine moving stage 24 can be changed as appropriate, and is not limited to the optical interferometer system described above, such as disclosed in International Publication No. 2015/147319. An encoder system or a hybrid measurement system of an optical interferometer system and an encoder system may be used.

Next, the configuration of each actuator constituting the above-described first drive system 62 and its control system will be explained. Here, the _{configuration of} the four _actuator units ( ₇₀ Here, for convenience _of explanation _{, the} four actuator units ( ₇₀ 72), and an air actuator 74.

As shown in FIG. 3 , the actuator unit 70 has a controller 80 . The controller 80 is independently arranged in each of the four actuator units 70X ₁ , 70X ₂ , 70Y ₁ , and 70Y ₂ (see FIG. 2 ). One set of actuators (voice coil motor 72 and air actuator 74) included in one actuator unit 70 is controlled by a common controller 80. Additionally, in FIG. 3, the controller 80 is shown to constitute a part of the actuator unit 70, but the controller 80 is a main control device 90 that comprehensively controls the liquid crystal exposure apparatus 10 (see FIG. 1). ) (see FIG. 6).

The controller 80 controls the drive of the voice coil motor 72 (control of the magnitude and direction of the thrust) by controlling the supply of current to the coils of the stator of the voice coil motor 72. In addition, the controller 80 always monitors the output of the pressure sensor 74a that measures the pressure in the bellows of the air actuator 74, and monitors the pressurized air device 74b including the air actuator 74 and a compressor. Drive control (control of the magnitude and direction of thrust) of the air actuator 74 is performed by controlling the opening and closing of the valve 74c disposed therebetween.

Here, in a state in which air is supplied to the air actuator 74 (generating thrust), the X coarse motion stage 34 and the fine motion stage 24 are mechanically connected due to the rigidity of the air actuator 74 itself. . In this connection state, when the X coarse motion stage 34 moves with a long stroke in the 34) It can be moved to a long stroke with . As described above, the stroke of the air actuator 74 itself is on the order of several millimeters, but in the state where air is supplied to the air actuator 74, the Since 24) is pressed or pulled, the fine movement stage 24 can be moved in a long stroke without supplying current to the voice coil motor 72.

In contrast, in a state in which air is not supplied to the air actuator 74 (not generating thrust), the rigidity of the air actuator 74 itself is substantially negligible, and the fine movement stage 24 is: With respect to the In this unrestrained state, when the X coarse motion stage 34 moves in a long stroke in the The fine motion stage 24 can be moved in a long stroke together with the X coarse motion stage 34. Additionally, in parallel with the movement in this long stroke, the fine movement stage 24 can be slightly driven in the horizontal plane with respect to the X coarse movement stage 34 by the voice coil motor 72. In addition, the above-mentioned “state in which the rigidity of the air actuator 74 can be substantially ignored” refers to the rigidity of the air actuator 74 (bellows) when driving the fine stage 24 with the voice coil motor 72. This means that the resistance (load) of the voice coil motor 74 is not high. In addition, the “state in which thrust is not generated by the air actuator 74” means that air may be supplied to the air actuator 74, and the fine movement stage 24 may move in the XY plane with respect to the X coarse movement stage 34. It just needs to be in a state where there is no mechanical constraint in the direction it follows (it can move freely).

In addition, in the actuator unit 70 of the present embodiment, since the air actuator 74 is mechanically connected to each of the fine motion stage 24 and the X coarse motion stage 34, the fine motion stage 24 and the Between (34), there is always an object that can transmit vibration to each other, including in a state where air is not supplied to the air actuator (74). In contrast, the bellows provided in the air actuator 74 is a bellows-type air spring made of synthetic rubber used in known vibration isolation (vibration isolation) devices (such as the vibration isolation device 19 (see FIG. 1) of the present embodiment) and It has the same vibration suppression function and can attenuate vibration (impede transmission of vibration) between the fine motion stage 24 and the X coarse motion stage 34. In this way, in the air actuator 74, the bellows functions as a damping part, and the fine motion stage 24 and the X coarse motion stage 34 are in a vibrationally pseudo-separated state. Therefore, position control of the fine movement stage 24 using the voice coil motor 72 can be performed with high precision.

In addition, in the substrate stage device 20 of the present embodiment, as described above, when controlling the position of the fine movement stage 24, the two (one set) actuators included in the actuator unit 70, that is, the voice A coil motor 72 and an air actuator 74 are used with a predetermined control balance. Below, the control balance of the two actuators will be described.

FIG. 4 is a conceptual diagram for explaining the control balance of the two actuators of the actuator unit 70 of this embodiment. As shown in FIG. 4, in this embodiment, when controlling the position of the fine movement stage 24, actuators that apply necessary (required) thrust to the fine movement stage 24 are used separately according to frequency. Specifically, among the two actuators, the voice coil motor 72, which is a fine actuator, can control and drive at a higher bandwidth than the air actuator 74, and thus can control the position of the fine movement stage 24 at a high bandwidth. In this case, the voice coil motor 72 is used. Additionally, when controlling the position of the fine moving stage 24 in the low band, an air actuator 74 capable of generating a larger thrust than the voice coil motor 72 is used. Additionally, in the mid-band between the high band and the low band, the air actuator 74 is used. In addition, in this embodiment, as an example, a band of less than 3 Hz as a low band, a band of 3 Hz or more as a mid-band, and a band of 10 to less than 20 Hz and a high band of 10 to 20 Hz or more are assumed, but the frequencies of each band are as follows. It is not limited to this and can be changed appropriately.

In addition, as can be seen from FIG. 4, in the position control of the fine movement stage 24 in the low band using the air actuator 74, a thrust force (Air) is applied to the fine movement stage 24 by feed forward (FF) control. FF Force) is given. In position control of the fine movement stage 24 in the mid-band using the air actuator 74, thrust (Air FB Force) is given to the fine movement stage 24 by feedback (FB) control. In addition, in position control of the fine movement stage 24 in a high bandwidth using the voice coil motor 72, the thrust (Motor Force) of the voice coil motor 72 is applied to the fine movement stage 24. In addition, in the position control of the fine movement stage 24 in the mid-band, the thrust by feedback (FB) control using the air actuator 74 and the thrust of the voice coil motor 72 are applied to the fine movement stage 24. You can do it.

FIG. 5 is a block diagram showing an example of a control circuit of the actuator unit 70 for performing the feed forward control and feedback control. As shown in Fig. 5, a command value based on the target drive position of the substrate P supplied from the controller 80 (see Fig. 3) is controlled by the FF (feed forward) controller 82a and the FB (feedback) controller. It is input to (82b) and is divided into two signals: low frequency and other frequencies. The FF controller 82a outputs the output value calculated based on the low-frequency signal to the air driver 84a for controlling the air actuator 74 (actually the valve 74c). The air actuator 74 provides thrust to the fine movement stage 24 based on the output value. This feed forward control is performed when accelerating the fine movement stage 24 in a stationary state until it reaches the scanning speed, or during the Y step operation of the fine movement stage 24, or when decelerating the fine movement stage 24 (minus acceleration). This is carried out in cases where there is no need to control the position of the fine movement stage 24 with high precision, such as in the case where the position is given.

Additionally, in the position control system of the fine stage 24 (see FIG. 3), the current position information of the fine stage 24 is updated based on the output of the substrate measurement system 96 (see FIG. 3) at predetermined control sampling intervals. Then, the position error signal, which is the difference between the actually measured position of the fine stage 24 and the command value, is fed back to control the position of the fine stage 24 with higher precision. As shown in FIG. 5, a feedback signal (position error signal) is input to the feedback controller 82b. The output (command value) from the feedback controller 82b is divided based on frequency by low-pass filters (LPF _mix 86a and LPF _air 86b). That is, as described above, the output value calculated based on the mid-frequency signal (low band of the position error signal) is input to the air driver 84a, and the output value calculated based on the high frequency signal is input to the voice coil motor. It is input to the motor driver 84b to control (72). The air actuator 74 and the voice coil motor 72 (when the position error is small (high band), only the voice coil motor 72) provide thrust to the fine movement stage 24 based on the above output value. do. This feedback control is implemented when positioning the fine movement stage 24 with high precision, such as during a correction operation of the fine movement stage 24 and during a scanning exposure operation.

In addition, in the substrate stage device 20 (see FIG. 1) of the present embodiment, in addition to the feedback control performed based on the position error signal described above, the acceleration of the fine movement stage 24 is measured by an acceleration sensor 88 (FIG. Acceleration feedback control is implemented to monitor and correct the position error of the fine motion stage 24 based on the vibration of the fine motion stage 24 (see 3). Since this acceleration feedback control is the same as the control implemented in known active vibration isolation (vibration isolation) devices, etc., detailed description is omitted here.

As explained above, in the substrate stage device 20 of the present embodiment, in the feedback control for performing high-precision position control of the fine movement stage 24 (substrate P), an actuator that applies the necessary thrust is adjusted at a frequency. Since it is divided according to the band (two actuators are used separately), compared to the case where feedback control (fine positioning control) is all performed by the voice coil motor 72, the load of the voice coil motor 72 is Because it is light, a lower output (smaller size and lower power consumption) can be used as the voice coil motor 72.

In addition, in this embodiment, as feedforward control, thrust is given to the fine movement stage 24 using only the air actuator 74 capable of generating large thrust, so that the fine movement stage 24 is moved without energizing the voice coil motor 72. (24) It can accelerate and decelerate, so the efficiency is good.

In addition, in the actuator unit 70, two actuators (voice coil motor 72 and air actuator 74) are comprehensively controlled (by one signal input) by one controller 80, so that the control system The composition is simple.

In addition, the configuration of each element constituting the liquid crystal exposure apparatus 10 according to the embodiment described above is not limited to that described above and can be changed as appropriate. As an example, the first drive system 62 of the above embodiment was provided with a total of four actuator units (70X ₁ , 70X ₂ , 70Y ₁ , 70Y ₂ ), but the number of actuator units is not limited to this. . Additionally, the numbers may be different in the X actuator unit that generates thrust in the X-axis direction and the Y actuator unit that generates thrust in the Y-axis direction.

In addition, in the actuator unit 70 of the above embodiment, two actuators (voice coil motor 72 and air actuator 74) are arranged adjacently (separated from each other) at different positions of the fine movement stage 24. However, the arrangement of each actuator is not limited to this, and the voice coil motor 72 and the air actuator 74 may be arranged coaxially. Specifically, by using a normal bellows for the air actuator 74 and inserting the voice coil motor 72 on the inner diameter side of the bellows, the two actuators can be arranged substantially on the same axis.

Additionally, the type of actuator constituting one actuator unit can also be changed as appropriate. That is, in the above embodiment, the voice coil motor 72 driven by electromagnetic force (Lorentz force) is used as the actuator for fine driving, but other types of actuators (fine actuators using piezo elements, etc.) may be used. Similarly, the air actuator 74 is used as an actuator for providing a counter thrust to the fine moving stage 24, but other types of actuators (electronic motors, etc.) may be used. In addition, in a plurality of actuator units, the configuration of the actuators of each actuator unit does not necessarily have to be common, and for example, the X-axis actuator unit and the Y-axis actuator unit may have different configurations.

In addition, each actuator unit of the above embodiment had two sets of actuators (one voice coil motor 72 and one air actuator 74), but the number of actuators constituting each actuator unit was , there may be three or more. In this case, as in the above embodiment, two types of actuators may be used, one or both actuators may be disposed in plural, and the types of three or more actuators may be different from each other.

In addition, in the above embodiment, the actuator unit that generates thrust is disposed in two orthogonal axes (X axis and Y axis) in a two-dimensional plane, but the direction of thrust generated by the actuator unit is not limited to this, and is 1 It may be only in the axial direction, or in three or more degrees of freedom directions. Moreover, in the above embodiment, the actuator unit is arranged on the +X side and +Y side of the fine movement stage 24, but it may be arranged on the -X side and -Y side as well.

In addition, in the above embodiment, the actuator that applies the necessary thrust to the fine movement stage 24 during feedforward control and feedback control is selectively divided into three bands (low band, middle band, and high band). Although this is the configuration used, it is not limited to this, and the actuator may be selectively divided into two bands (low band and high band). Specifically, the feed-forward control accelerates the fine-moving stage 24 using only the low-band air actuator 74, and the feedback control accelerates the fine-moving stage 24 using only the high-band voice coil motor 72. Position control may be performed.

In addition, in the above embodiment, a case has been described where the first drive system 62 for high-precision position control of the fine moving stage 24 holding the substrate P is provided with a plurality of actuator units, but the present invention is not limited to this. , an actuator unit of the same configuration may be disposed in the mask drive system 92 (see FIG. 6) for driving the mask M (see FIG. 1). In the mask stage device 14 of the above embodiment, the mask M moves with a long stroke only in the X-axis direction, so only an actuator unit that generates thrust in the

In addition, the configuration of the substrate stage device 20 of the above embodiment is not limited to that described in the above embodiment, and can be changed as appropriate, and the same substrate drive system 60 as that of the present embodiment is applied to these modified examples. It is possible. That is, the substrate stage device may be a coarse motion stage of the type in which a Y coarse motion stage is disposed on an , thrust is given by each actuator unit from the Y coarse motion stage). Additionally, the substrate stage device does not necessarily need to have the self-weight support device 28. Additionally, the substrate stage device may drive the substrate P in a long stroke only in the scanning direction.

In addition, although it was explained that the control system 80 is independently arranged in each of the four actuator units (70X ₁ , 70X ₂ , 70Y ₁ , 70Y ₂ ) (see FIG. ₂ ), one pair of One control system 80 may be disposed in 70X ₂ ) and one control system 80 may be disposed in a pair of Y actuator units 70Y ₁ and 70Y ₂ . In short, the configuration may be such that the control system 80 is arranged for each driving direction. Additionally, one control system 80 may be arranged for all four actuator units (70X ₁ , 70X ₂ , 70Y ₁ , 70Y ₂ ).

Additionally, the illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193 nm) or KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F ₂ laser light (wavelength 157 nm). In addition, as the illumination light, single-wavelength laser light in the infrared or visible range emitted from a DFB semiconductor laser or fiber laser is amplified by a fiber amplifier doped with erbium (or both erbium and ytterbium), and a nonlinear optical crystal is used as the illumination light. You can also use harmonics whose wavelength has been converted into ultraviolet light. Additionally, a solid-state laser (wavelength: 355 nm, 266 nm), etc. may be used.

In addition, although the case where the projection optical system 16 is a multi-lens projection optical system having a plurality of optical systems has been described, the number of projection optical systems is not limited to this and may be one or more. In addition, the projection optical system is not limited to a multi-lens type projection optical system, and may be a projection optical system using an opener-type large mirror. Additionally, the projection optical system 16 may be an enlargement system or a reduction system.

In addition, the use of the exposure device is not limited to an exposure device for liquid crystals that transfers a liquid crystal display element pattern to a square glass plate, but also includes an exposure device for manufacturing organic EL (Electro-Luminescence) panels, an exposure device for semiconductor manufacturing, and thin films. It can also be widely applied to exposure equipment for manufacturing magnetic heads, micro machines, and DNA chips. In addition, in order to manufacture masks or reticles used in not only micro devices such as semiconductor elements, but also light exposure equipment, EUV exposure equipment, X-ray exposure equipment, and electron beam exposure equipment, circuit patterns are transferred to glass substrates, silicon wafers, etc. It can also be applied to exposure equipment.

Additionally, the object to be exposed is not limited to a glass plate, but may be other objects such as a wafer, ceramic substrate, film member, or mask blank. In addition, when the exposure target is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and a film-like (flexible sheet-like member) is also included. In addition, the exposure apparatus of this embodiment is particularly effective when the exposure target is a substrate having a side length or a diagonal length of 500 mm or more.

Electronic devices such as liquid crystal display elements (or semiconductor elements) include steps for designing the function and performance of the device, steps for manufacturing a mask (or reticle) based on these design steps, and steps for manufacturing a glass substrate (or wafer). , a lithography step for transferring the pattern of the mask (reticle) to a glass substrate using the exposure apparatus and exposure method of each of the above-described embodiments, a development step for developing the exposed glass substrate, and a lithography step for developing the exposed glass substrate, except for the portion where the resist remains. It is manufactured through an etching step to remove exposed members by etching, a resist removal step to remove unnecessary resist after etching, a device assembly step, an inspection step, etc. In this case, in the lithography step, the above-described exposure method is performed using the exposure apparatus of the above embodiment, and a device pattern is formed on the glass substrate, so that a highly integrated device can be manufactured with good productivity.

As described above, the mobile device and the method of driving a mobile device of the present invention are suitable for driving a mobile device. Additionally, the exposure apparatus of the present invention is suitable for forming a pattern on an object. Additionally, the device manufacturing method of the present invention is suitable for the production of micro devices. Additionally, the method for manufacturing a flat panel display of the present invention is suitable for manufacturing a flat panel display.

In addition, the disclosures of all international publications, U.S. patent application publication specifications, U.S. patent specifications, etc. related to the exposure apparatus cited in the above-mentioned embodiments are incorporated into the description of this specification.

10… liquid crystal exposure device
20… substrate stage device
24… fine stage
26… jodong stage
34… X Jodong Stage
70X ₁ … X Actuator unit
72X… X Voice Coil Motor
74X… X Air Actuator
90… main control device
P… Board

Claims (8)

With the base,
A first mobile body capable of moving on the base,
a second mobile body capable of moving on the first mobile body;
a first actuator that provides a first thrust to move the second mobile body on the first mobile body;
A vibration damping unit having one end mounted on the first movable body and the other end mounted on the second movable body, and providing a second thrust greater than the first thrust as a thrust for moving the second movable body on the first movable body. a second actuator;
a third actuator that provides a third thrust or fourth thrust to move the first moving object on the base;
Provided with a control system that controls the first to third actuators,
The first mobile body and the second mobile body are connected to each other through the vibration damping unit,
The control system is,
By imparting the third thrust from the third actuator to the first moving body and further applying the second thrust from the second actuator to the second moving body,
Moving the first and second mobile bodies while limiting the relative movement of the first mobile body and the second mobile body connected to each other through the vibration damping unit,
By imparting the fourth thrust from the third actuator to the first moving body and further applying the first thrust from the first actuator to the second moving body,
A moving body device that enables relative movement of the first moving body and the second moving body connected to each other through the vibration damping unit. With the base,
A first mobile body capable of moving on the base,
a second mobile body capable of moving on the first mobile body;
a first actuator that moves the second mobile body on the first mobile body;
A second actuator including a vibration damping unit, one end of which is mounted on the first movable body and the other end of which is mounted on the second movable body;
Provided with a control system that controls the first and second actuators,
The first mobile body and the second mobile body are connected to each other through the vibration damping unit,
The control system is,
By putting the second actuator in the first state,
Limiting the relative movement of the first mobile body and the second mobile body connected to each other through the vibration damping unit,
Putting the second actuator in the second state,
A moving body device that enables relative movement of the first moving body and the second moving body connected to each other through the vibration damping unit by controlling the first actuator. The method of claim 1 or 2,
A moving body device wherein the first actuator is a linear motor. The method of claim 1 or 2,
The mobile device wherein the second actuator is a pneumatic actuator. The method of claim 1 or 2,
The mobile body device wherein the vibration damping part of the second actuator is stretchable, and the one end in the stretchable direction is mounted on the first moving body, and the other end is mounted on the second moving body. The mobile device according to claim 1 or 2,
An exposure apparatus comprising a pattern forming device that forms a pattern on an object held on the second moving body using an energy beam. According to claim 6,
The object is an exposure device that is a substrate for a flat panel display. exposing the object using the exposure apparatus according to claim 6;
A device manufacturing method comprising developing the exposed object.