KR102644152B1 - Controllable Advanced Decomposition Equipment for Industrial Process-Water Containing Non-biodegradable Organics and In-Organics - Google Patents

Abstract

The present invention includes an ozone dissolution tank (1-1) formed at the front end with an ejector (1-2) that sucks inflow raw water and inflow circulating water of non-decomposable process water to smoothly control G/L; A control panel (4-1) is formed to control the current density of the DC power supply that supplies electrical energy above the band gap to the advanced digester positive and negative electrodes and the advanced digester semiconductor catalyst, and the rate and amount of hydroxyl radicals are generated by controlling the current density. an advanced decomposition tank (2-1) that controls and promotes an advanced decomposition reaction of non-decomposable process water; The gas-liquid separation tank exhaust gas outlet (3-6) is formed to discharge exhaust gases such as CO ₂ and N ₂ , and the incoming circulating water flows into the ozone dissolution tank (1-1) through the ejector (1-2) to produce gaseous ozone. It consists of a gas-liquid separation tank (3-1) that improves the dissolution rate of gaseous ozone by preventing a decrease in the dissolved saturation concentration of ozone, and an ozone dissolution tank (1-1) with an ejector (1-2) and an advanced decomposition tank (2-1). ) and a multi-stage continuous mixed flow reactor (M-CSTR: multiple-continuous stirred tank reactor) consisting of the gas-liquid separation tank (3-1) as a single-continuous stirred tank reactor (S-CSTR: It is a controlled-type advanced decomposition device for non-decomposable process water that decomposes organic and inorganic substances in large-capacity non-decomposable process water by controlling the formation of hydroxyl radicals through G/L control and current density control.
[index word]
Non-degradable process water, advanced decomposition device, ozone dissolution tank, hydroxyl radical formation tank, gas-liquid separation tank, semiconductor catalyst, positive and negative electrodes, ejector

Description

{Controllable Advanced Decomposition Equipment for Industrial Process-Water Containing Non-biodegradable Organics and In-Organics}

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[Technical field to which the invention belongs and prior art in that field]

The Advanced Oxidation Process (AOP) oxidizes and decomposes organic substances by generating hydroxyl radicals (OH) in water, and is the most advanced chemical treatment method. Advanced oxidation methods include Fenton oxidation, semiconductor photocatalyst process (TiO ₂ /UV), and ozone combination process (O ₃ /H ₂ O ₂ , O ₃ /UV). The combination process of ozone and ultraviolet rays (ultraviolet 254nm) generates hydroxyl radicals through a decomposition mechanism as ozone absorbs ultraviolet rays and undergoes photodecomposition, thereby significantly reducing sludge generation and chemical costs. However, if wastewater is highly turbid, it is treated by reducing the intensity of ultraviolet rays. There is a problem of reduced efficiency.

In order to achieve the above object, the present inventor's previous invention (Patent No. 10-0542270), ozone, a semiconductor catalyst, and a hydroxyl radical generator by electrolysis oxidizes and decomposes pollutants in water to reduce sludge generation, reduce chemical costs, and provide an ultraviolet light source. By solving the problem, it can be applied efficiently to wastewater. In the above invention, ozone generated in an ozone generator is converted into hydroxyl radicals using a semiconductor catalyst and an electrode to decompose non-decomposable substances in the fluid. In the above invention, gaseous ozone generated in an ozone generator is dissolved in a hydroxyl radical formation tank and hydroxyl radicals are generated from the dissolved ozone, so it was necessary to configure and design a reaction tank considering the mass transfer rate to generate a high concentration of dissolved ozone. The overall mass transfer rate for dissolved ozone is:

................................... (One)

................................................. (2)

................................................... ( 2)

.................................................................(3)

............................................... (4)

here : Overall mass transfer rate (mg/L/sec)

: 총괄 물질 전달 계수(1/sec)

: Overall mass transfer coefficient (1/sec)

: 포화 용존 농도와 현재 용존 농도와의 차(mg/L)

: Difference between saturated dissolved concentration and current dissolved concentration (mg/L)

a : Specific boundary area of bubbles (cm ² /cm ³ )

d : diameter of bubble (cm)

k _L : Liquid mass transfer coefficient (cm/sec)

N _sh : Sherwood number(-)

D : Molecular diffusion coefficient (cm ² /sec)

L : Reaction tank height (cm)

The microbubble generator and the microbubble generator equipped with it (10-2002-7016888) pressurize incoming water and vertically collide with gaseous ozone to create microbubbles and increase the specific boundary area of the bubbles to increase the overall mass transfer coefficient. . However, the pressure of the inflowing bubbles was high, so they did not dissolve in the water and quickly rose to the water surface, resulting in a low dissolution rate in the water.

Our previous invention (patent 10-1370105) generates dissolved ozone from the ozone generated in the ozone generator in a separate dissolved ozone contact tank, and feeds it to the positive and negative electrodes formed in the hydroxyl radical formation tank and the filled semiconductor photocatalyst in the subsequent step. By controlling the rate-limiting step, which is the first step of the ozone decomposition mechanism, hydroxyl radicals were quickly generated.
The existing invention before the headquarters (patent 10-1370105) is a single continuous mixed flow reactor (S- CSTR: It is formed as a single-continuous stirred tank reactor), and raw water flows into the fluid circulation tank (27) at atmospheric pressure, and the fluid (raw water/circulating water) in the fluid circulation tank is pressurized into a dissolved ozone contact tank (5). It was difficult to control the appropriate G/L (Gas Flow Rate/Liquid Flow Rate) in the dissolved ozone contact tank (5) as it was introduced into the internal circulation pump (25).
Therefore, the highly decomposed process water device of the present invention undergoes changes in properties (particle concentration, organic matter concentration, viscosity, etc.) in a pressurized multi-continuous stirred tank reactor (M-CSTR) when manufacturing a large-capacity device. An ejector (1-2) capable of constantly sucking the non-decomposable process water is formed at the front of the ozone dissolution tank to adjust the suction flow rate (incoming raw water/inflow circulating water) to determine the appropriate G/L (gasous ozone flow rate/liquid flow rate) of the ozone dissolution tank. ) was attempted to improve the ozone dissolution rate by adjusting.

[Technical challenges that the invention seeks to achieve]

The technical tasks to be achieved by the controlled, non-degradable process water advanced decomposition device of the present invention are as follows.

First, the highly decomposed process water device of the present invention is capable of changing properties (particle concentration, organic matter concentration, viscosity, etc.) in a pressurized multi-continuous stirred tank reactor (M-CSTR) when manufacturing a large-capacity device. ) is formed at the front of the ozone dissolution tank by forming an ejector (1-2) that can constantly inhale the non-decomposable process water to adjust the suction flow rate and adjust the appropriate G/L (gasous ozone flow rate/liquid flow rate) of the ozone dissolution tank to increase the ozone dissolution rate. wanted to promote it.

Second, the ozone dissolution tank flat impeller (1-5) formed at the bottom of the ozone dissolution tank of the present invention prevents the formation of a vacuum at the bottom of the impeller due to vortex during high-speed stirring, preventing the release of dissolved ozone into gaseous ozone An attempt was made to increase the dissolution rate of ozone.

The impeller (3) located at the top of the dissolved ozone contact tank (5) of the present inventor's previous invention [10-1370105] generates a vacuum at the bottom of the impeller due to a vortex during high-speed stirring, and dissolved ozone is released as gaseous ozone. and quickly rose to the water surface, reducing the concentration of dissolved ozone.

delete

Third, the advanced digestion tank (2-1) of the present invention has a weir overflow portion (2-6) formed at the top of the interior to pass through the positive and negative electrodes and the semiconductor catalyst, and the highly digested water flows upward. By preventing channeling of the flow toward the outlet, the hydroxyl radicals generated by positive and negative electrodes and semiconductor catalysts and the ozone-dissolved inflow raw water/inflow circulating water are in uniform contact to facilitate high-level decomposition of difficult-to-decomposable process water. I wanted to do it.
In the hydroxyl radical formation tank 17 of the present inventor's previous invention [10-1370105], the hydroxyl radical formation tank fluid outlet 16 is located on one side of the upper outer circumferential surface of the hydroxyl radical formation tank, and the fluid passing through the positive and negative electrodes and the semiconductor photocatalyst is provided. Channeling, which is a phenomenon of tilting toward the outlet of the upward flow, is formed, forming a dead space where the fluid cannot contact the positive and negative electrodes 18 and the semiconductor photocatalyst 19, thereby significantly increasing the amount of hydroxyl radicals produced. has been reduced.

Fourth, the gas-liquid separation tank 3-1 of the present invention is formed with a gas-liquid separation tank exhaust gas outlet 3-6, so that CO ₂ , N _{2 ,} etc. after decomposition of non-decomposable process water in the gas-liquid separation circulating water of the gas-liquid separation tank By discharging exhaust gas to the outside of the gas-liquid separation tank (3-1), it prevents HCO ₃ ^- or CO ₃ ^-2 from dissolving into the ozone dissolution tank (1-1) when CO ₂ circulates through the ejector (1-2). Therefore, the aim was to prevent a decrease in the dissolved saturation concentration of gaseous ozone and assist in improving the dissolution rate of gaseous ozone.
The fluid circulation tank 27 of the present inventor's previous invention [10-1370105] flows and diffuses exhaust gases (CO ₂ , N ₂ , etc.) generated after the decomposition reaction in the hydroxyl radical formation tank into the diffusion stone at the bottom of the fluid circulation tank. Instead of being dissolved and discharged to the outside, it continuously circulates and flows into the dissolved ozone contact tank (5), where CO ₂ accumulates as HCO ₃ ^- or CO ₃ ^-2 is dissolved, reducing the dissolved saturation concentration of gaseous ozone, thereby reducing the dissolution rate of gaseous ozone. was reduced.

[Configuration of the invention]

The present invention includes an ozone dissolution tank (1-1) formed at the front end with an ejector (1-2) that sucks inflow raw water and inflow circulating water of non-decomposable process water to smoothly control G/L; A control panel (4-1) is formed to control the current density of the DC power supply that supplies electrical energy above the band gap to the advanced digester positive and negative electrodes and the advanced digester semiconductor catalyst, and the rate and amount of hydroxyl radicals are generated by controlling the current density. an advanced decomposition tank (2-1) that controls and promotes an advanced decomposition reaction of non-decomposable process water; The gas-liquid separation tank exhaust gas outlet (3-6) is formed to discharge exhaust gases such as CO ₂ and N ₂ , and the incoming circulating water flows into the ozone dissolution tank (1-1) through the ejector (1-2) to produce gaseous ozone. It consists of a gas-liquid separation tank (3-1) that prevents a decrease in the dissolved saturation concentration and assists in increasing the dissolution rate of gaseous ozone, an ozone dissolution tank (1-1) in which an ejector (1-2) is formed, and an advanced decomposition tank (2-). 1) and a multi-stage continuous mixed flow reactor (M-CSTR: multiple-continuous stirred tank reactor) consisting of the gas-liquid separation tank (3-1) as a single-continuous stirred tank reactor (S-CSTR: single-continuous stirred tank reactor) It is a controlled high-level decomposition device for non-decomposable process water that decomposes organic and inorganic substances in large-capacity non-decomposable process water by controlling the formation of hydroxyl radicals through G/L control and current density control.

The configuration and operation of the controlled highly degradable process water decomposition device of the present invention will be described in detail using reference numerals as follows.

Located at the front of the controlled non-decomposable process water advanced decomposition device, gaseous ozone generated in the ozone generator (1-11) and introduced into the lower center is distributed through the ejector inflow raw water inlet (1-2) formed in the ejector (1-2). In order to dissolve in the raw water flowing in through -2), the ozone dissolution tank motor/motor head (1-4) located at the top of the outer circumference is connected to this and formed in the lower center of the interior, the lower part of the impeller due to vortex during high-speed stirring. The ozone dissolution tank flat impeller (1-5), which prevents vacuum formation, quickly horizontally mixes the fine bubbles diffused from the ozone dissolution tank diffusion stone (1-6), and the double inner wall ozone dissolution tank in the lower part of the ozone dissolution tank inner wall ozone dissolution raw water / inflow. The circulating water circulation port (1-8) is configured, and the upward flow of the lower inflow raw water/influent circulating water is formed on the relatively high upper surface through horizontal mixing by a flat impeller, thereby enhancing upper and lower vertical mixing, thereby promoting gas An ozone dissolution tank (1-1) that greatly increases the ozone dissolution rate by increasing the mass transfer rate of ozone into the inflow source water;

It is located connected to the front of the ozone dissolution tank (1-1), and when manufacturing a large-capacity device, the properties change (particle concentration, organic matter concentration, It is formed at the front of the ozone dissolution tank to enable constant inhalation of non-decomposable process water (viscosity, etc.), and the inflow raw water flows in through the ejector inflow raw water inlet (1-2-2) and the ejector inflow circulating water inlet (1-2-1). An ejector (1-2) that assists in controlling the appropriate G/L (gasous ozone flowrate/liquid flowrate) of the ozone dissolving tank by adjusting the suction flow rate L (liquid flowrate = inflow raw water flow rate + inflow circulating water flow rate) of the circulating water;

an ejector inflow circulating water inlet (1-2-1) formed at the front of the ejector, into which the gas-liquid separation tank gas-liquid separation circulating water discharged from the gas-liquid separation tank gas-liquid separation circulating water outlet (3-5) flows in under pressure;

An ejector inflow raw water inlet (which is formed at the lower part of the front end of the ejector and is an inlet where the influent raw water is sucked under negative pressure in the first-stage continuous mixed flow reactor, and the gas-liquid separation treatment water of the gas-liquid separation tank is sucked under negative pressure in the second and third stage continuous mixed flow reactors). 1-2-2) and;

A fine hole is formed inside the ejector (1-2), and the inflow flow rate (inflow circulating water flow rate) and suction flow rate (inflow raw water flow rate) are changed even in the changing inflow properties (particle concentration, organic matter concentration, viscosity, etc.) of the non-degradable process water. ) and an ejector nozzle (1-2-3) formed with an appropriate ejector nozzle diameter to maintain speed (capable of maintaining speed without being clogged by particulate matter);

an ejector mixing pipe (1-2-4) formed inside the ejector (1-2) and at a rear end of the ejector nozzle, where the ejector inflow raw water sprayed from the ejector nozzle and the ejector inflow circulating water are mixed;

An ejector diffuser (1-2-5) formed at the rear end of the ejector mixing pipe (1-2-4), where the ejector inflow circulating water and ejector inflow raw water mixed in the ejector mixing pipe (1-2-4) diffuse. and;

an ejector flange (1-2-6) connected to the outer peripheral surface of the ejector diffuser (1-2-5) and joined to prevent the ejector inflow raw water and ejector inflow circulating water from flowing out to the outside;

It is located connected to the rear end of the ejector diffuser (1-2-5), and the ejector inflow raw water and ejector inflow calculated as the liquid flow rate of appropriate G/L (L: Liquid-flowrate = inflow raw water flow rate + inflow circulating water flow rate). an ozone dissolution tank ejector inflow raw water/inflow circulating water inlet (1-3), which is an inlet through which circulating water is diffused and introduced;

)를 조절하여 오존 용해율 증대를 보조하는 오존 용해조 모터/모터헤드(1-4)와;It is located at the outer top center of the ozone dissolution tank (1-1) and adjusts the rotation speed of the flat impeller to increase the mixing strength (

) and an ozone dissolution tank motor/motor head (1-4) that assists in increasing the ozone dissolution rate by adjusting );

It is connected to the ozone melting tank motor/motor head (1-4) and is located in the center of the lower part of the ozone melting tank, and is formed with a flat blade that prevents the formation of a vacuum at the bottom of the impeller when rotating at high speed to prevent the release of dissolved ozone into gaseous ozone. an ozone dissolving tank flat impeller (1-5) that effectively dissolves gaseous ozone;

Ozone is located at the inner lower center of the ozone dissolution tank (1-1) and increases the overall mass transfer rate of dissolved ozone by increasing the non-boundary area by making the diameter of the gaseous ozone (bubble) introduced from the ozone generator fine. Dissolution tank diffusion stone (1-6);

an ozone dissolution tank gas ozone inlet (1-7) located at the center of the dual structure cabinet of the ozone dissolution tank through which gaseous ozone adjusted to an appropriate gaseous ozone flow rate (G) flows in from the ozone generator (1-11);

It is located at the lower part of the inner wall of the ozone dissolution tank (1-1) and maintains smooth mixing and residence time of the upper and lower sides of gaseous ozone, greatly increasing the ozone dissolution rate by increasing the upper and lower mixing flow. Double inner wall ozone dissolution inflow raw water/inflow Circulating water circuit (1-8);

It is located on one side of the upper outer circumference of the ozone dissolution tank (1-1), and is located at the advanced decomposition tank ozone dissolution inflow raw water/inflow circulating water inlet (2- 2) an ozone dissolution tank discharge ozone circulation outlet (1-9) flowing in through;

The ozone dissolution tank ozone circulation outlet (1-9) is connected to the bottom of the ozone circulation outlet (1-9) by a tee pipe and is located at the ozone dissolution tank ozone dissolution inflow source water/inflow circulation water outlet where a large amount of gaseous ozone is dissolved. 1-10) and;

An ozone generator located on one side outside the ozone dissolution tank (1-1), generates gaseous ozone, and supplies an appropriate gaseous ozone flow rate (G) to the ozone dissolution tank through the ozone dissolution tank gas ozone inlet (1-7). (1-11) and;

an oxygen generator (1-12) located on one side outside the ozone generator (1-11) and generating gaseous oxygen and supplying it to the ozone generator (1-11);

It is located connected to the rear end of the ozone dissolution tank (1-1) and connected to the ozone dissolution tank ozone dissolution inflow raw water/inflow circulating water outlet (1-10), and the advanced decomposition tank positive and negative electrodes (2-3). An advanced decomposition tank semiconductor catalyst (2-4) is formed to control the rate step of the ozone decomposition reaction, directly ionizing dissolved ozone into O ₃ ^- (ozonide), and ionized O ₃ ^- and H ⁺ react to form HO ₃ radicals. After generation, a large amount of oxygen and hydroxyl radicals are generated from HO ₃ radicals, and a weir overflow section (2-6) is formed at the top of the interior to allow advanced decomposition water to pass through the positive and negative electrodes and the semiconductor catalyst. By preventing channeling of the treated water upward toward the outlet, the hydroxyl radicals generated by positive and negative electrodes and semiconductor catalysts and the ozone-dissolved influent raw water/influent circulating water are in uniform contact, resulting in high level of non-decomposable process water. an advanced digestion tank (2-1) that facilitates decomposition and promotes advanced decomposition reactions;

Located in the lower center of the advanced decomposition tank (2-1), ozone dissolution tank ozone dissolution inflow raw water/circulating water discharged from the inflow circulating water outlet (1-10) contains a large amount of ozone dissolved in circulating water/process raw water and ozone dissolution tank exhaust ozone circulation. an advanced decomposition tank ozone-dissolved raw water/inflow circulating water inlet (2-2) through which the gaseous ozone discharged from the outlet (1-9) flows in;

It is formed at regular intervals between the filling parts of the advanced digestion tank semiconductor catalyst (2-4) inside the advanced digestion tank (2-1), and is connected to the external advanced digestion tank positive and negative electrode electrical connector (2-9). Advanced digestion tank positive and negative electrodes (2-3) that are located and transfer electrons to the advanced digestion tank semiconductor catalyst (2-4) by electricity supply from the advanced digestion tank direct current power supply (2-10);

It is filled and located inside the advanced digestion tank (2-1), and electrons generated from electrodes supplied with electricity from the advanced digestion tank direct current power supply are transferred to the water and react with dissolved ozone in the water to produce ozonide (O ₃ ^- ) and an advanced digester semiconductor catalyst (2-4) that promotes the formation of ;

It is located on one side of the upper outer circumference of the advanced digestion tank (2-1) and is in uniform contact with the hydroxyl radicals generated by the advanced digestion tank positive and negative electrodes and the advanced digestion tank semiconductor catalyst and the ozone-dissolved inflow raw water/inflow circulating water. an advanced digester highly digested treated water outlet (2-5), which is an outlet through which the highly digested treated water flows out through the highly digested treated water outflow weir overflow part (2-6) formed to enable this;
an advanced digester highly decomposed water outlet (2-5) through which the recalcitrant process water is highly decomposed and flows out by reacting with hydroxyl radicals rapidly generated by the charged advanced digester semiconductor catalyst (2-4);

It is located at the inner top of the advanced digestion tank (2-1) and prevents channeling toward the outlet of the advanced digestion treated water passing through the advanced digestion tank positive and negative electrodes and the advanced digestion tank semiconductor catalyst. an advanced decomposition tank highly decomposed water outflow weir overflow portion (2-6) formed to enable uniform contact between hydroxyl radicals generated by electrodes and semiconductor catalysts and ozone-dissolved inflow raw water/inflow circulating water;

an advanced digester upper flange (2-7) located at the upper part of the advanced digester (2-1) and formed to prevent fluid from the advanced digester from flowing out;

an advanced digester upper flange bolt hole (2-8) located on the advanced digester upper flange (2-7) and having a hole for fastening the flange to prevent fluid from the advanced digester from flowing out;

An advanced digestion tank positive and negative electrode electrical connector (2-9) located at the outer top of the advanced digestion tank (2-1) and having a connection port through which an electric wire is connected to supply electricity to the positive and negative electrodes.

It is located outside the advanced digestion tank (2-1) and supplies electrical energy greater than the band gap to the advanced digestion tank positive and negative electrodes (2-3) to close the band gap to the advanced digestion tank semiconductor catalyst (2-4). an advanced decomposition direct current power supply (2-10) that activates electrons and holes to supply a current for final hydroxyl radical generation and controls the current density (mA/cm ² );

It is located at the rear of the advanced digestion tank (2-1) and connected to the advanced digestion tank advanced digestion treatment water outlet (2-5), and a gas-liquid separation tank exhaust gas outlet (3-6) is formed, so that the gas-liquid separation tank gas-liquid Exhaust gases such as CO ₂ and N ₂ after decomposition of the non-degradable process water in the separated circulating water are discharged to the outside of the gas-liquid separation tank (3-1), and when CO ₂ circulates in through the ejector (1-2), HCO ₃ ^- B a gas-liquid separation tank (3-1) that prevents CO ₃ ^-2 from dissolving into the ozone dissolution tank (1-1), prevents a decrease in the dissolved saturation concentration of gaseous ozone, and assists in increasing the dissolution rate of gaseous ozone;

It is located on one side of the upper outer circumference of the gas-liquid separation tank (3-1), and the gas-liquid separation tank highly decomposed water inlet (3- 2) and;

It is located at a right angle to the highly decomposed water inlet (3-2) of the gas-liquid separation tank and is treated water from which exhaust gas is discharged. It is an outlet through which gas-liquid separation treated water from the gas-liquid separation tank of the first-stage CSTR flows out. The treated water is sucked and transferred to the ejector raw water inlet of the two-stage CSTR, and the gas-liquid separation tank gas-liquid separation treatment water outlet (3-3) is an outlet;

It is located 180° counterclockwise from the highly decomposed water inlet (3-2) of the gas-liquid separation tank and is connected to the gas-liquid separation tank pump outlet located on one side of the bottom of the gas-liquid separation tank (3-1) through a tee pipe. Some circulating water is transferred to the ejector inlet circulating water inlet (1-2-1), and some circulating water flows into the gas-liquid separation tank gas-liquid separation circulating water inlet (3-4). )and;

It is located at a right angle to the gas-liquid separation circulating water inlet (3-4) of the gas-liquid separation tank in a clockwise direction, and some of the circulating water flows into and out of the gas-liquid separation tank pump and is transferred to the ejector inlet circulating water inlet (1-2-1). Some of the circulating water circulates into the gas-liquid separation tank gas-liquid separation circulating water inlet (3-4), and the gas-liquid separation tank gas-liquid separation circulating water outlet (3-5) is an outlet through which it flows out to the gas-liquid separation tank pump inlet;

It is located at the top center of the gas-liquid separation tank (3-1), and exhaust gases such as CO ₂ and N ₂ after decomposition of non-degradable process water are discharged to the outside of the gas-liquid separation tank (3-1), and the ejector (1-2) A gas liquid formed to prevent dissolution into the ozone dissolution tank (1-1) as HCO ₃ ^- or CO ₃ ^-2 when CO ₂ circulates through and assist in increasing the dissolution rate of gaseous ozone by preventing a decrease in the dissolved saturation concentration of gaseous ozone. Separation tank exhaust gas outlet (3-6);

The gas-liquid separation tank gas-liquid separation circulating water outlet (3-5) is located on one side of the gas-liquid separation tank pump inlet and piping, and the circulating water discharged from the gas-liquid separation tank pump outlet is ejector inflow circulating water inlet (1-2). -1) and a gas-liquid separation tank pump (3-7) that circulates and introduces some of the circulating water into the gas-liquid separation tank gas-liquid separation circulating water inlet (3-4);

)를 조절하여 오존 용해율 증대를 보조하는 오존 용해조 모터/모터헤드(1-4)를 작동하며, 상기 고도 분해조 양· 음 전극(2-3)에 band gap 이상의 전기에너지를 공급하여, 고도 분해조 반도체 촉매(2-4)에 band gap을 형성하여 전자와 정공을 활성화하여 최종 수산화 라디칼 생성의 전류를 공급하고 전류밀도(mA/cm²)를 제어하는 고도 분해조 직류 전원 공급기(2-10)를 작동하고, 상기 기액 분리조 기액 분리 순환수 유출구(3-5)에서 유출된 기액분리 순환수의 수압을 증가시켜 이젝터(1-2)에 형성된 이젝터 유입순환수 유입구(1-2-1)를 통하여 가압의 오존 용해조(1-1) 내부로 유입 가능하게 하는 기액 분리조 펌프(3-7)를 작동하는 전기 조작반인 컨트롤패널(4-1)이 형성되어, 이젝터(1-2)가 형성된 오존 용해조(1-1)와 고도 분해조(2-1) 및 기액 분리조(3-1)를 단일 연속혼합흐름반응기(S-CSTR : single-continuous stirred tank reactor)로 구성하는 다단의 연속혼합흐름반응기(M-CSTR : multiple-continuous stirred tank reactor)를 형성하여, 대용량 난분해성 공정수 중의 유· 무기물질을 G/L 제어와 전류밀도 제어로 수산화 라디칼의 형성을 제어하여 고도분해하는 제어형 난분해성 공정수 고도분해 장치이다.It is located at the lower part of the advanced decomposition tank DC power supply (2-10), and the mixing strength (

) operates the ozone dissolution tank motor/motor head (1-4), which assists in increasing the ozone dissolution rate, and supplies electrical energy above the band gap to the advanced decomposition tank positive and negative electrodes (2-3) to achieve advanced decomposition. An advanced decomposition tank direct current power supply (2-10) that forms a band gap in the crude semiconductor catalyst (2-4) to activate electrons and holes to supply the current for final hydroxyl radical generation and controls the current density (mA/cm ² ). ) is operated, and the water pressure of the gas-liquid separation circulating water discharged from the gas-liquid separation circulating water outlet (3-5) of the gas-liquid separator is increased to form the ejector inflow circulating water inlet (1-2-1) in the ejector (1-2). ), a control panel (4-1) is formed, which is an electric operation panel that operates the gas-liquid separation tank pump (3-7) that allows the pressurized ozone to flow into the dissolving tank (1-1), and the ejector (1-2) A multi-stage ozone dissolution tank (1-1), an advanced decomposition tank (2-1), and a gas-liquid separation tank (3-1) are formed as a single-continuous stirred tank reactor (S-CSTR). By forming a continuous mixed flow reactor (M-CSTR: multiple-continuous stirred tank reactor), organic and inorganic substances in large-capacity non-degradable process water are highly decomposed by controlling the formation of hydroxyl radicals through G/L control and current density control. It is a controlled advanced decomposition device for non-degradable process water.

The treatment flow of influent raw water, which is non-decomposable process water, of the controlled advanced decomposition device for non-degradable process water of the present invention is summarized using reference numerals as follows.

Ejector inflow raw water/inflow circulating water → Ejector inflow raw water inlet (1-2-2)/ejector inlet circulating water inlet (1-2-1) → Ejector nozzle (1-2-3) → Ejector mixing pipe (1-2) -4) → Ejector diffuser (1-2-5) → Ozone dissolution tank ejector inflow raw water/inflow circulating water inlet (1-3) → Ozone dissolution tank (1-1) → Ozone dissolution tank Ozone dissolution inflow raw water/inflow circulating water outlet ( 1-10) → Advanced digestion tank ozone dissolved raw water/circulating water inlet (2-2) → Advanced digestion tank (2-1) → Advanced digestion tank positive/negative electrode (2-3)/Advanced digestion tank semiconductor catalyst (2-4) → Advanced digestion tank highly digested water outflow weir overflow (2-6) → Advanced digester highly digested water outlet (2-5) → Gas-liquid separation tank highly digested water inlet (3-2) → Gas-liquid separation tank (3-1) → Gas-liquid separation tank gas-liquid separation treated water outlet (3-3) / Gas-liquid separation tank gas-liquid separation circulating water outlet (3-5) → Gas-liquid separation tank gas-liquid separation treated water → (2nd stage) Ejector inflow raw water inlet (1-2-2) → (2nd stage) Ejector nozzle (1-2-3) - Same processing flow below (omitted) - → (2nd stage) Gas-liquid separation tank gas-liquid separation treated water → (3rd stage) ) Ejector inlet raw water inlet (1-2-2) → 3-stage ejector nozzle (1-2-3) - Same processing flow below (omitted) - → (3-stage) Gas-liquid separation tank Gas-liquid separation treated water

The controlled advanced decomposition device for non-degradable process water of the present invention uses the ozone dissolution tank (1-1) in which the ejector (1-2) is formed, the advanced decomposition tank (2-1), and the gas-liquid separation tank (3-1) in a single continuous mixed flow. It consists of a reactor (S-CSTR: single-continuous stirred tank reactor) (∵ high-speed mixing in the ozone dissolution tank is quickly transferred to the advanced decomposition tank to form hydroxyl radicals, which react quickly with mu and inorganic substances and are transferred to the gas-liquid separation tank to produce exhaust gas. After discharging the gas-liquid separator pump, circulating water is quickly circulated into the ozone dissolution tank to form a multi-stage continuous mixed flow reactor (M-CSTR: multiple-continuous stirred tank reactor), which produces a large capacity It is a controlled advanced decomposition device for non-degradable process water that highly decomposes organic and inorganic substances in decomposable process water by controlling the formation of hydroxyl radicals through G/L control and current density control. The main components and functions are summarized as follows.
When manufacturing large-capacity devices, ozone is used to allow constant inhalation of non-degradable process water whose properties (particle concentration, organic matter concentration, viscosity, etc.) change in a pressurized multi-continuous stirred tank reactor (M-CSTR). An ejector (1-2) is formed at the front of the dissolution tank to control the suction flow rate of the inflow raw water and inflow circulating water through the ejector inflow raw water inlet (1-2-2) and the ejector inflow circulating water inlet (1-2-1). An ejector (1-2) that controls the appropriate G/L of the ozone dissolution tank;
To dissolve the gaseous ozone generated in the ozone generator (1-11) and flowing into the lower center into the inflowing raw water through the ejector inflowing raw water inlet (1-2-2) formed in the ejector (1-2), The ozone melting tank motor/motor head (1-4) located at the top is connected to this and the ozone melting tank flat impeller (1-5) is formed in the lower center of the interior to prevent vacuum formation at the bottom of the impeller due to vortex during high-speed stirring. The fine bubbles diffused from the ozone dissolution tank diffusion stone (1-6) are quickly mixed horizontally, and the ozone dissolution tank double inner wall ozone dissolution inflow source water/inflow circulation water circulation port (1-8) is formed at the bottom of the inner wall of the ozone dissolution tank, forming a flat impeller. By horizontal mixing, an upward flow of the lower inflow raw water/influent circulating water is formed on the relatively high upper surface, thereby enhancing upper and lower vertical mixing, thereby increasing the mass transfer rate of gaseous ozone into the influent raw water, increasing the ozone dissolution rate. A greatly expanded ozone dissolution tank (1-1);
It is located connected to the ozone dissolution tank ozone dissolution inflow raw water/inflow circulating water outlet (1-10), and the advanced decomposition tank positive and negative electrodes (2-3) and the advanced decomposition tank semiconductor catalyst (2-4) are formed to create ozone. The rate-limiting stage of the decomposition reaction is controlled to generate a large amount of hydroxyl radicals, and a weir overflow section (2-6) is formed at the top of the interior to provide advanced decomposition tank positive and negative electrodes and advanced decomposition tank semiconductors. It prevents channeling of the highly decomposed water flowing upward through the catalyst toward the outlet, making it difficult to decompose through uniform contact between the hydroxyl radicals generated by the positive and negative electrodes and the semiconductor catalyst and the ozone-dissolved inflow water/inflow circulating water. an advanced digestion tank (2-1) that facilitates the advanced digestion of process water and promotes the advanced digestion reaction;

It is located in connection with the advanced digestion tank advanced digestion treatment water outlet (2-5), and a gas-liquid separation tank exhaust gas outlet (3-6) is formed, so that CO after decomposition of the non-decomposable process water in the gas-liquid separation circulating water of the gas-liquid separation tank ₂ , N _2, etc. are discharged to the outside of the gas-liquid separation tank (3-1), and when CO ₂ circulates through the ejector (1-2), it is converted into HCO ₃ ^- or CO ₃ ^-2 into the ozone dissolution tank (1-1). ) and a gas-liquid separation tank (3-1) for preventing a decrease in the dissolved saturation concentration of gaseous ozone and increasing the dissolution rate of gaseous ozone;

)를 조절하여 오존 용해율 증대를 보조하는 오존 용해조 모터/모터헤드(1-4)를 작동하며, 상기 고도 분해조 양· 음 전극(2-3)에 band gap 이상의 전기에너지를 공급하여, 고도 분해조 반도체 촉매(2-4)에 band gap을 형성하여 전자와 정공을 활성화하여 최종 수산화 라디칼 생성의 전류를 공급하고 전류밀도(mA/cm²)를 제어하는 고도 분해조 직류 전원 공급기(2-10)를 작동하고, 상기 기액 분리조 기액분리 순환수 유출구(3-5)에서 유출된 기액분리 순환수의 수압을 증가시켜 이젝터(1-2)에 형성된 이젝터 유입순환수 유입구(1-2-1)를 통하여 가압의 오존 용해조(1-1) 내부로 유입 가능하게 하는 기액 분리조 펌프(3-7)를 작동하는 전기 조작반인 컨트롤패널(4-1)이 형성되어, 이젝터(1-2)가 형성된 오존 용해조(1-1)와 고도 분해조(2-1) 및 기액 분리조(3-1)를 단일 연속혼합흐름반응기(S-CSTR : single- continuons stirred tank reactor)로 구성하는 다단의 연속혼합흐름반응기(M-CSTR : multipie-continuous stirred tank reactor)를 형성하여, 대용량 난분해성 공정수 중의 유· 무기물질을 G/L 제어와 전류밀도 제어로 수산화 라디칼의 형성을 제어하여 고도분해하는 제어형 난분해성 공정수 고도분해 장치이다.The mixing strength (

) operates the ozone dissolution tank motor/motor head (1-4), which assists in increasing the ozone dissolution rate, and supplies electrical energy above the band gap to the advanced decomposition tank positive and negative electrodes (2-3) to achieve advanced decomposition. An advanced decomposition tank direct current power supply (2-10) that forms a band gap in the crude semiconductor catalyst (2-4) to activate electrons and holes to supply the current for final hydroxyl radical generation and controls the current density (mA/cm ² ). ) is operated, and the water pressure of the gas-liquid separation circulating water discharged from the gas-liquid separation circulating water outlet (3-5) of the gas-liquid separation tank is increased to form the ejector inflow circulating water inlet (1-2-1) in the ejector (1-2). ), a control panel (4-1) is formed, which is an electric operation panel that operates the gas-liquid separation tank pump (3-7) that allows the pressurized ozone to flow into the dissolving tank (1-1), and the ejector (1-2) A multi-stage ozone dissolution tank (1-1), an advanced decomposition tank (2-1), and a gas-liquid separation tank (3-1) are formed as a single-continuons stirred tank reactor (S-CSTR). By forming a continuous mixed flow reactor (M-CSTR: multipie-continuous stirred tank reactor), organic and inorganic substances in large-capacity non-degradable process water are highly decomposed by controlling the formation of hydroxyl radicals through G/L control and current density control. It is a controlled advanced decomposition device for non-degradable process water.

The effects of the controlled, non-degradable process water advanced decomposition device of the present invention are as follows.

First, the highly decomposed process water device of the present invention is capable of changing properties (particle concentration, organic matter concentration, viscosity, etc.) in a pressurized multi-continuous stirred tank reactor (M-CSTR) when manufacturing a large-capacity device. ) is formed at the front of the ozone dissolution tank by forming an ejector (1-2) that can constantly inhale the non-decomposable process water to adjust the suction flow rate and adjust the appropriate G/L (gasous ozone flow rate/liquid flow rate) of the ozone dissolution tank to increase the ozone dissolution rate. promoted.

Second, the ozone dissolution tank flat impeller (1-5) formed at the bottom of the ozone dissolution tank of the present invention prevents the formation of a vacuum at the bottom of the impeller due to vortex during high-speed stirring, preventing the release of dissolved ozone into gaseous ozone The dissolution rate of ozone was increased.

Third, the advanced digestion tank (2-1) of the present invention has an advanced digestion tank advanced digestion treatment water discharge weir overflow portion (2-6) formed at the top of the interior, so that the advanced digestion tank positive and negative electrodes and the advanced digestion tank semiconductor catalyst are formed. It prevents channeling of the upward flow of highly decomposed treated water toward the outlet, making it a non-decomposable process through uniform contact between hydroxyl radicals generated by positive and negative electrodes and semiconductor catalysts and ozone-dissolved inflow water/circulating water. High-level decomposition of water was facilitated.

Fourth, the gas-liquid separation tank 3-1 of the present invention is formed with a gas-liquid separation tank exhaust gas outlet 3-6, so that CO ₂ , N _{2 ,} etc. after decomposition of non-decomposable process water in the gas-liquid separation circulating water of the gas-liquid separation tank By discharging exhaust gas to the outside of the gas-liquid separation tank (3-1), it prevents HCO ₃ ^- or CO ₃ ^-2 from dissolving into the ozone dissolution tank (1-1) when CO ₂ circulates through the ejector (1-2). Thus, it prevented a decrease in the dissolved saturation concentration of gaseous ozone and assisted in improving the dissolution rate of gaseous ozone.

Figure 1 is a top view of the entire controlled, highly degradable process water decomposition device.
Figure 2 is a multi-stage top view of a controlled, highly degradable process water advanced decomposition device.
Figure 3 is a single side view of a controlled, non-degradable process water advanced decomposition device.
Figure 4 is a single top view of a controlled, non-degradable process water advanced decomposition device.
Figure 5 is a cross-sectional view of the ozone dissolution tank of the controlled, non-degradable process water advanced decomposition device.
Figure 6 is a top view of a controlled advanced digestion device for non-biodegradable process water.
Figure 7 is a cross-sectional view of a controlled advanced digestion tank for non-biodegradable process water.
Figure 8 is a cross-sectional view of a gas-liquid separation tank in a controlled, non-degradable process water advanced decomposition device.
Figure 9 is a cross-sectional view of the controlled, non-degradable process water advanced decomposition device ejector.

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1-1 Ozone dissolution tank
1-2 ejector
1-2-1 Ejector inlet circulating water inlet
1-2-2 Ejector inlet water inlet
1-2-3 Ejector nozzle
1-2-4 Ejector mixing pipe
1-2-5 Ejector diffuser
1-2-6 Ejector flange
1-3 Ozone dissolution tank ejector inlet raw water/influent circulating water inlet
1-4 Ozone melting tank motor/motorhead
1-5 Ozone Dissolution Tank Flat Impeller
1-6 Ozone dissolution tank diffusion stone
1-7 Ozone dissolution tank gaseous ozone inlet
1-8 Ozone dissolution tank double inner wall ozone dissolution inflow raw water/inflow water circulation port
1-9 Ozone dissolution tank de-ozone circulation outlet
1-10 Ozone dissolution tank Ozone dissolution inflow raw water/inflow circulating water outlet
1-11 Ozone Generator
1-12 Oxygen Generator
2-1 Advanced digestion tank
2-2 Advanced decomposition tank ozone dissolved raw water/influent circulating water inlet
2-3 Advanced digestion tank positive and negative electrodes
2-4 Advanced digester semiconductor catalyst
2-5 Advanced digestion tank Advanced digestion treated water outlet
2-6 Advanced digestion tank Advanced digestion treated water outflow weir overflow section
2-7 High-level digester top flange
2-8 Altitude digestion tank upper flange bolt hole
2-9 Advanced digestion tank positive and negative electrode electrical connector
2-10 High-level digester DC power supply
3-1 Gas-liquid separation tank
3-2 Gas-liquid separation tank highly decomposed water inlet
3-3 Gas-liquid separation tank gas-liquid separation treated water outlet
3-4 Gas-liquid separation tank gas-liquid separation circulating water inlet
3-5 Gas-liquid separation tank gas-liquid separation circulating water outlet
3-6 Gas-liquid separation tank exhaust gas outlet
3-7 Gas-liquid separator pump
4-1 Control panel

Claims (2)

To dissolve the gaseous ozone generated in the ozone generator (1-11) and flowing into the lower center into the inflowing raw water through the ejector inflowing raw water inlet (1-2-2) formed in the ejector (1-2), The ozone melting tank motor/motor head (1-4) located at the top is connected to the ozone melting tank flat impeller (1-5) formed in the lower center of the interior, which prevents the formation of a vacuum at the bottom of the impeller due to vortex during high-speed stirring. The fine bubbles diffused from the ozone dissolution tank diffusion stone (1-6) are quickly mixed horizontally, and the ozone dissolution tank double inner wall ozone dissolution inflow source water/inflow circulation water circulation port (1-8) is formed at the bottom of the inner wall of the ozone dissolution tank, forming a flat impeller. By horizontal mixing, an upward flow of the lower inflow raw water/influent circulating water is formed on the relatively high upper surface, thereby enhancing upper and lower vertical mixing, thereby increasing the mass transfer rate of gaseous ozone into the influent raw water, increasing the ozone dissolution rate. A greatly expanded ozone dissolution tank (1-1);
It is located connected to the ozone dissolution tank ozone dissolution inflow raw water/inflow circulating water outlet (1-10), and the advanced decomposition tank positive and negative electrodes (2-3) and the advanced decomposition tank semiconductor catalyst (2-4) are formed to create ozone. The rate-limiting stage of the decomposition reaction is controlled to generate a large amount of hydroxyl radicals, and a weir overflow section (2-6) is formed at the top of the interior to provide advanced decomposition tank positive and negative electrodes and advanced decomposition tank semiconductors. By preventing channeling toward the outlet of the advanced digestion treated water passing through the catalyst, the hydroxyl radicals generated by the advanced digestion tank positive and negative electrodes and the advanced digestion tank semiconductor catalyst and the ozone-dissolved inflow water/circulating water are separated. an advanced digestion tank (2-1) in which advanced decomposition reaction is promoted by facilitating advanced decomposition of difficult-to-decomposable process water through uniform contact;
It is located in connection with the advanced digestion tank advanced digestion treatment water outlet (2-5), and a gas-liquid separation tank exhaust gas outlet (3-6) is formed, so that CO after decomposition of the non-decomposable process water in the gas-liquid separation circulating water of the gas-liquid separation tank ₂ , N _2, etc. are discharged to the outside of the gas-liquid separation tank (3-1), and when CO ₂ circulates through the ejector (1-2), it is converted into HCO ₃ ^- or CO ₃ ^-2 into the ozone dissolution tank (1-1). ) and a gas-liquid separation tank (3-1) for preventing a decrease in the dissolved saturation concentration of gaseous ozone and increasing the dissolution rate of gaseous ozone;
Operates an ozone dissolution tank motor/motor head (1-4) that assists in increasing the ozone dissolution rate by controlling the rotation speed of the ozone dissolution tank flat impeller (1-5) formed inside the ozone dissolution tank (1-1), and the high-level decomposition By supplying electrical energy above the band gap to the crude positive and negative electrodes (2-3), a band gap is formed in the advanced decomposition tank semiconductor catalyst (2-4) to activate electrons and holes to supply the current for final hydroxyl radical generation. and operates the high-level digestion tank direct current power supply (2-10) that controls the current density (mA/cm ² ), and the water pressure of the gas-liquid separation circulating water flowing out from the gas-liquid separation tank gas-liquid separation circulating water outlet (3-5). A gas-liquid separation tank pump (3-7) is installed to increase the water flow into the pressurized ozone dissolution tank (1-1) through the ejector inflow circulating water inlet (1-2-1) formed in the ejector (1-2). It consists of a control panel (4-1), which is an operating electric operation panel, and consists of an ozone dissolution tank (1-1) with an ejector (1-2), an advanced decomposition tank (2-1), and a gas-liquid separation tank (3-1). By forming a multi-stage continuous mixed flow reactor (M-CSTR: multiple-continuous stirred tank reactor) consisting of a single-continuous stirred tank reactor (S-CSTR: single-continuous stirred tank reactor), large-capacity oil and A controlled, highly degradable process water decomposition device characterized by highly decomposing inorganic substances by controlling the formation of hydroxyl radicals through G/L control and current density control. delete