KR102708619B1 - Photolithography education apparatus and method for learning photolithography process using the same - Google Patents

Abstract

The embodiment can provide a photolithography education device including: a mask pattern printing device that prints a pattern on a film mask substrate based on pattern information received from a computing device; a laminating device that laminates a base substrate and a photosensitive film and transmits and outputs the base substrate to which the photosensitive film is laminated in a predetermined size; an exposure device that aligns the base substrate to which the photosensitive film is laminated and the film mask substrate to which the pattern is printed and irradiates light thereto to expose the base substrate to which the photosensitive film is laminated; and a developing device that develops the base substrate to which the exposed photosensitive film is laminated to selectively remove an exposed area and a non-exposed area of the base substrate to which the photosensitive film is laminated by the pattern.

Description

Photolithography education apparatus and method for learning photolithography process using the same {Photolithography education apparatus and method for learning photolithography process using the same}

The present invention relates to a photolithography education device and a method for learning a photolithography process using the same.

Photolithography is a process used in semiconductor, display, and circuit design manufacturing processes. It is also called a photo process and is widely used as a method of manufacturing complex circuit patterns using light, similar to photo printing technology.

The photolithography process is applied to manufacturing core components in almost all advanced industries, and thus has a significant impact on the entire industry. In relation to this, the most decisive factor that determines a company's competitive advantage is the competitiveness of the talents that the company possesses, and educational institutions can be seen as the birthplace of such talents. It is a widely known fact that as the role of educational institutions as a source of human resource development and technological innovation is gradually increasing, and as not only advanced countries but also Asian countries are actively promoting reforms to strengthen the competitiveness of educational institutions, the world's first-class companies and research institutes are becoming more concentrated around excellent educational institutions.

Furthermore, due to the development of the Internet environment, semiconductor companies and numerous experts produce various educational contents on semiconductors, displays, etc. and distribute them through various media, so that anyone interested in semiconductor, display, etc. technology can learn about semiconductor technology through various forms of contents. However, all existing educational materials are merely audiovisual educational materials. Furthermore, since semiconductors, displays, etc. are very advanced technologies that require extensive knowledge, it is realistically very difficult to create an environment where they can be practiced.

In this regard, Korean Patent Publication No. 10-2173449 provides a semiconductor equipment education and training device so that the operation control for the plasma module and the wafer transfer module can be learned by selecting a program control method by an automatic control unit. In addition, Korean Patent Publication No. 10-1480796 provides a semiconductor maintenance equipment education and training device using a sub-controller. However, the prior arts do not provide an environment in which one can experience the photolithography process, which is one of the core processes in the semiconductor process, and since they are technologies for educating people with relatively basic knowledge or people who will be deployed to actual work sites, they have limitations from the perspective of education for non-experts without basic knowledge.

Korean Patent Publication No. 10-2173449 Korean Patent Publication No. 10-1480796 Korean Patent Publication No. 10-1981701

The present invention aims to provide a device and method that enable students or non-experts who lack understanding of the photolithography process, which is essential in display processes, semiconductor processes, and printed circuit board manufacturing processes, to effectively learn the photolithography process.

In addition, the present invention seeks to provide a device and method that enable the basic process of photolithography to be practiced while effectively learning the photolithography process by utilizing safe and easy-to-handle materials for educational purposes.

The embodiment can provide a photolithography education device including: a mask pattern printing device that prints a pattern on a film mask substrate based on pattern information received from a computing device; a laminating device that laminates a base substrate and a photosensitive film and transmits and outputs the base substrate to which the photosensitive film is laminated in a predetermined size; an exposure device that aligns the base substrate to which the photosensitive film is laminated and the film mask substrate to which the pattern is printed and irradiates light thereto to expose the base substrate to which the photosensitive film is laminated; and a developing device that develops the base substrate to which the exposed photosensitive film is laminated to selectively remove an exposed area and a non-exposed area of the base substrate to which the photosensitive film is laminated by the pattern.

In another aspect, the film mask substrate may be composed of a transparent material, and the pattern may provide a photolithography teaching device that blocks the passage of irradiated light.

In another aspect, the exposure device may include a main body, a cover part that opens and closes the exposure device by rotating at a predetermined angle about a connection point with the main body, a first frame part that accommodates a base substrate on which the photosensitive film is laminated and can be inserted onto or withdrawn from the main body, a second frame part that accommodates a film mask substrate on which the pattern is printed, a transport part for changing the position of the second frame part, an alignment viewer part for observing the inside of the exposure device and aligning the first and second frame parts, and a light irradiation part that irradiates light for exposure.

In another aspect, the first frame portion may include a photolithography education device including a handle portion, a plate portion connected to the handle portion, an elevation portion for adjusting the height of a region of the plate portion to adjust the height of a base substrate to which the photosensitive film is laminated, and an elevation driving portion for controlling the height of the elevation portion to adjust a distance between the base substrate to which the photosensitive film is laminated and the film mask substrate on which the pattern is printed.

In another aspect, the cover part may be provided with an observation and light irradiation hole formed therein, and the exposure device may be configured to move the alignment viewer part to match the observation and light irradiation hole for observing the inside of the exposure device, or to move the light irradiation part to match the observation and light irradiation hole for irradiating light onto a film mask substrate on which the pattern is printed. The photolithography education device may be provided.

In another aspect, the exposure device may provide a photolithography education device further including a lens unit that moves to match the observation and light irradiation holes so that pattern light passing through the film mask substrate on which the pattern is printed is irradiated on the base substrate on which the photosensitive film is laminated while adjusting the magnification, so that the photosensitive film is positioned between the laminated base substrate and the film mask substrate on which the pattern is printed.

On the other hand. The computing device displays alignment information of the base substrate on which the photosensitive film is laminated and the film mask substrate on which the pattern is printed, and the photographed image observed through the alignment viewer unit based on the preset position information of the elevating unit and the current position information of the second frame unit, changes the position of the film mask substrate on which the pattern is printed based on the reception of an input signal for moving the film mask substrate on which the pattern is printed, and transmits the position information of the film mask substrate on which the pattern is printed to the exposure device so that the exposure device changes the position of the second frame, and displays magnification information of the pattern light irradiated on the base substrate on which the photosensitive film is laminated according to the height of the elevating unit, sets the magnification information of the pattern light based on the input information on the change amount of the line width of the pattern, and generates height information of the elevating unit according to the set magnification information of the pattern light and provides it to the exposure device so that the exposure device controls the height of the elevating unit so that the pattern light is irradiated on the base substrate on which the photosensitive film is laminated and exposed. Can provide.

The embodiment can provide a system that can teach a photolithography process that is essential in a display process, a semiconductor process, and a printed circuit board manufacturing process.

The embodiment can provide a system that can effectively learn from the design of a mask pattern to the development process.

In addition, the embodiment can provide a photolithography educational device suitable for educational purposes and a method for teaching a photolithography process using the same by using a substrate made of inexpensive materials, using a developer with guaranteed stability, and preventing external exposure to ultraviolet rays for exposure.

In addition, the embodiment teaches the photolithography process by utilizing a photosensitive film, thereby omitting the spin process and baking process for applying the photosensitive material, thereby simplifying the system while allowing education of key matters.

In addition, the embodiment allows the user to directly design the pattern of the mask and check the pattern designed by the user as the final result, thereby enhancing the educational effect.

Additionally, the embodiment allows users to directly perform the alignment process of a mask and a base substrate, thereby enhancing understanding of the key alignment process in the photolithography process.

In addition, the embodiment can provide a device and method that can comprehensively study the difference in quality of a result according to the intensity, wavelength, irradiation time, and pattern magnification of light irradiation by allowing application of various exposure conditions.

Figure 1 schematically illustrates a photolithography education system according to an embodiment of the present invention.
FIG. 2a schematically illustrates a photolithography training device according to an embodiment of the present invention.
Figure 2b schematically illustrates laminating a photosensitive film and a base substrate to each other.
Figure 2c schematically illustrates exposure by irradiating light onto a base substrate to which a photosensitive film is laminated through a film mask substrate on which a pattern is printed.
Figure 2d schematically illustrates developing an exposed base substrate.
Figure 2e schematically illustrates the user interface of the design program of the computing device.
Figure 3 schematically illustrates a mask pattern printing device.
Figure 4 schematically illustrates a laminating device.
Figure 5 schematically illustrates part of the interior of a laminating device.
Figure 6 is a perspective view of the exposure device.
Figures 7 and 8 schematically illustrate the exposure device with the cover part open.
Figures 9 to 11 illustrate the first and second frame sections.
Figure 12 is a perspective view of the developing part.
Figure 13 shows the insertion of the first frame into the developing section.
FIG. 14 illustrates a part of an exposure device constituting a photolithography education device according to another embodiment of the present invention.
FIG. 15 illustrates a part of an exposure device constituting a photolithography education device according to another embodiment of the present invention.

The present invention can be modified in various ways and has various embodiments, and thus specific embodiments are illustrated in the drawings and described in detail in the detailed description. The effects and features of the present invention and the methods for achieving them will become clear with reference to the embodiments described in detail below together with the drawings. However, the present invention is not limited to the embodiments disclosed below, but can be implemented in various forms. In the following embodiments, the terms first, second, etc. are not used in a limiting sense, but are used for the purpose of distinguishing one component from another component. In addition, the singular expression includes the plural expression unless the context clearly indicates otherwise. In addition, the terms include or have mean that the features or components described in the specification are present, and do not preclude the possibility that one or more other features or components may be added. In addition, the sizes of the components in the drawings may be exaggerated or reduced for the convenience of explanation. For example, the sizes and thicknesses of each component shown in the drawings are arbitrarily shown for the convenience of explanation, and therefore the present invention is not necessarily limited to what is shown.

Hereinafter, embodiments of the present invention will be described in detail with reference to the attached drawings. When describing with reference to the drawings, identical or corresponding components are given the same drawing reference numerals and redundant descriptions thereof are omitted.

FIG. 1 schematically illustrates a photolithography education system according to an embodiment of the present invention. FIG. 2a schematically illustrates a photolithography education device according to an embodiment of the present invention, FIG. 2b schematically illustrates laminating a photosensitive film and a base substrate, FIG. 2c schematically illustrates exposing a base substrate to which a photosensitive film is laminated by irradiating light through a film mask substrate on which a pattern is printed, and FIG. 2d schematically illustrates developing the exposed base substrate. In addition, FIG. 3 schematically illustrates a mask pattern printing device, FIG. 4 schematically illustrates a laminating device, and FIG. 5 schematically illustrates a part of the inside of a laminating device. In addition, FIG. 6 is a perspective view of an exposure device, FIGS. 7 and 8 schematically illustrate an exposure device in a state where a cover portion is open, and FIGS. 9 to 11 illustrate first and second frame portions. And, Fig. 12 is a perspective view of the developing part, and Fig. 13 shows the first frame part being inserted into the developing part.

Referring to FIGS. 1, 2a, 2b, 2c, 2d and 2e, a photolithography education system (1) according to an embodiment of the present invention may be composed of a photolithography education device (10) and a computing device (20).

The computing device (20) may be a desktop computing device or a wearable device such as a smart phone or tablet computing device. The computing device (20) may be installed with a program (100p) for designing a pattern to be printed on a film mask substrate. A user may design a pattern to be printed on a film mask substrate through various user interfaces provided according to the execution of the design program (100p) of the computing device (20). The computing device (20) may generate generated pattern information and provide it to a mask pattern printing device (200).

A photolithography training device (10) may include a housing (100), a mask pattern printing device (200), a laminating device (300), an exposure device (400), and a developing device (500).

Referring further to FIG. 3, the mask pattern printing device (200) can print a pattern on an input film mask substrate based on pattern information received from a computing device (20). In various embodiments, the mask pattern printing device (200) can print a pattern based on the received pattern information on a center area excluding an edge area of the film mask substrate.

A film mask substrate (200a) is fed into the substrate input unit (210) of the mask pattern printing device (200), and a film mask substrate (200a) with a pattern (pt) printed thereon can be output through the film mask substrate (200a) output unit (220) of the mask pattern printing device (200).

The film mask substrate (200a) has a transparent material. Therefore, the influence of refraction, etc. of the irradiated ultraviolet light is minimized, and the light can still pass through the film mask substrate (200a). In addition, the pattern (pt) printed on the film mask can be a light-shielding pattern made of a material capable of blocking ultraviolet light. Therefore, the irradiated ultraviolet light is blocked from passing through the film mask substrate (200a) by the light-shielding pattern, and can pass through an area where the light-shielding pattern is not formed.

Referring to FIGS. 4 and 5, a laminating device (300) can laminate a photosensitive film (300b) on a base substrate (300a). The laminating device (300) can include a circular base substrate portion (310) around which a base substrate (300a) is wound, and a circular photosensitive film portion (320) around which a photosensitive film portion (300b) is wound. The laminating device (300) can extract the base substrate (300a) and the photosensitive film (300b) from each of the circular base substrate portion (310) and the circular photosensitive film portion (320), attach them to each other, cut them into a predetermined size, and output them.

Since a method of laminating a photosensitive film (300b) on a base substrate (300a) is applied, a spin process or baking process for applying photolithography on the base substrate (300a) can be omitted.

In addition, the base substrate (300a) can be a substrate such as a film or a PCB. That is, the embodiment uses a substrate that is relatively much cheaper than a wafer for educational purposes as the base substrate (300a).

Referring to FIGS. 5 to 11, the exposure device (400) aligns a base substrate (300a) to which a photosensitive film (300b) is laminated and a film mask substrate (200a) to which a pattern is printed, and irradiates them with left-side ultraviolet light to expose the base substrate (300a) to which the photosensitive film (300b) is laminated.

The exposure device (400) may include a main body (410) with an open upper portion, a cover portion (420) connected to one side of the main body (410) and capable of rotating at a predetermined angle around one side of the main body (410) to open and close the upper portion of the main body (410), a transfer portion (430), a first frame portion (440), a second frame portion (450), an alignment viewer portion (460), and a light irradiation portion (470).

The transfer unit (430) may include a first position guide unit (431), a second position guide unit (432), a third position guide unit (433), a first transfer rail (434), a second transfer rail (435), a first coupling unit (436), and a second coupling unit (437).

In various embodiments, the exposure device (400) may include a control unit for controlling the position of at least one of the first to third position guide units (431, 432, 433) and a motor device for providing a driving force for changing the position, and the control unit may control the motor device based on a command signal from the computing device (20) to control the position of at least one of the first to third position guide units (431, 432, 433).

The first position guide part (431) is positioned on the upper surface of the cover part (420) and can move within a predetermined range along the first direction (X-axis direction) that is the horizontal direction of the cover part (420). In some embodiments, a guard line may be provided on the cover part (420) to guide the movement direction of the first position guide part (431). In addition, the second position guide part (432) is positioned on the upper surface of the cover part (420) and can move within a predetermined range along the second direction (Y-axis direction) that is the vertical direction of the cover part (420) and perpendicular to the first direction, and the third position guide part (433) is positioned on the upper surface of the cover part (420), can be maintained parallel to the upper surface of the cover part (420), and can rotate within a predetermined angular range.

The first transport rail (434) may be positioned on the inner side of the cover part (420) and may be composed of a pair of rails (the first-first transport rail (434a) and the first-second transport rail (434b)) installed on each of the inner sides of the cover part (420) along the first direction of the cover part (420).

The second transport rail (435) is positioned on the inner side of the cover part (420) and can be positioned vertically with the first transport rail (434). In addition, the second transport rail (435) can be connected to the first transport rail (434). One side of the second transport rail (435) can be connected to the 1-1 transport rail (434a), and the other side of the second transport rail (435) can be connected to the 1-2 transport rail (434b). The second transport rail (435) can move along the first transport rail (434) in the first direction within a predetermined range.

The first connecting portion (436) can connect one side of the second transport rail (435) and the first position guide portion (431) to each other. Accordingly, as the first position guide portion (431) moves, the second transport rail (435) connected by the first connecting portion (436) can move along the first transport rail (434) in the same direction as the movement direction of the first position guide portion (431) by the movement amount of the first position guide portion (431).

The second coupling part (437) is installed on the second transport rail (435) and can move within a predetermined range along the second transport rail (435).

The second position guide part (432) can be connected to the second coupling part (437). Accordingly, as the second position guide part (432) moves, the second coupling part (437) can move along the second transport rail (435) in the same direction as the movement direction of the second position guide part (432) by the movement amount of the second position guide part (432).

The third position guide part (433) is installed on the second position guide part (432) and can move together with the second position guide part (4320), but is not limited thereto.

The first frame part (440) can be inserted through the opening area on the front of the main body part (410), and the first frame part (440) inserted into the main body part (410) can be withdrawn from the main body part (410).

The first frame portion (440) may include a handle portion (441) and a plate portion (442) connected to the handle portion (441). A user may hold the handle portion (441) and insert the first frame portion (440) onto the main body portion (410) or withdraw the first frame portion (440) inserted into the main body portion (410).

A base substrate (300a) to which a photosensitive film (300b) is laminated can be positioned on the plate portion (442). The plate portion (442) can be configured in a form that can fix the position of the base substrate (300a) to which the photosensitive film (300b) is laminated.

The second frame part (450) can be connected to the second coupling part (437). Therefore, when the second coupling part (437) moves along the second transport rail (435), the second frame part (450) can move. In addition, when the second transport rail (435) moves along the first transport rail (434), the second frame part (450) can also move together. Therefore, the second frame part (450) can move within a predetermined range in the X-axis direction and the Y-axis direction.

The second frame part (450) remains connected to the second coupling part (437) and can rotate downward at a predetermined angle around the connection point with the second coupling part (437).

First, the cover part (420) is opened, and the second frame part (450) is rotated downward so that a film mask substrate (200a) having a pattern printed thereon can be attached to the second frame part (450). An opening area (450h) is formed on the second frame part (450). The film mask substrate (200a) having a pattern printed thereon covers the opening area (450h) and can be attached to the second frame part (450). An additional configuration for fixing the film mask substrate (200a) having a pattern printed thereon can be provided on the second frame part (450). According to various embodiments, a groove facing the inside of the second frame part (450) is formed on a side surface of the second frame part (450), and the film mask substrate (200a) having a pattern printed thereon can be fitted into the groove. The film mask substrate (200a) is fitted onto the groove, and the pattern (pt) of the film mask substrate (200a) may be exposed through the opening area (450h). Then, when the cover portion (420) is closed, the second frame portion (450) is positioned on the upper portion of the first frame portion (440). Accordingly, the film mask substrate (200a) on which the pattern is printed is positioned on the upper portion of the base substrate (300a) on which the photosensitive film (300b) is laminated.

The first frame part (440) may further include a lifting part (443) for raising one area of the plate part (442) and a lifting drive part (444) for raising and lowering the lifting part (443).

The elevator (443) is located on the opening area (450h) of the plate (442) and can be raised or lowered to a predetermined height by the elevator driving unit (444).

Control of the elevator drive unit (444) can be performed based on a command signal input through the first input unit (490) provided in the cover unit (420).

A base substrate (300a) on which a photosensitive film (300b) is laminated can be positioned on the elevating member (443). Then, the elevating member (443) can be raised and inserted into an opening area (450h) on the second frame member (450). Then, the elevating member (443) can be raised until the upper surface of the elevating member (443) and the upper surface of the second frame member (450) form the same plane. As the elevating member (443) is raised, the film mask substrate (200a) on which a pattern is printed can come into contact with the base substrate (300a) on which the photosensitive film (300b) is laminated. Accordingly, the light is prevented from passing through the film mask substrate (200a) on which the pattern is printed due to the diffraction phenomenon of light to the area between the film mask substrate (200a) on which the pattern is printed and the base substrate (300a) on which the photosensitive film (300b) is laminated.

The alignment viewer unit (460) and the light irradiation unit (470) can move together along the hole matching unit (429d) on the cover unit (420). The user can move the alignment viewer unit (460) and the light irradiation unit (470) left and right along the hole matching unit (429d).

An observation and light irradiation hole (428) is formed in the cover part (420). The alignment viewer part (460) and the light irradiation part (470) move along the hole matching part (429d), and either the alignment viewer part (460) or the light irradiation part (470) can be matched with the observation and light irradiation hole (429). The alignment viewer part (460) and the light irradiation part (470) can be moved along the hole matching part (429d) so that the alignment viewer part (460) is matched with the observation and light irradiation hole (429). In addition, the user can observe the inside of the exposure device (400) through the alignment viewer part (460). In various embodiments, the alignment viewer unit (460) may include a lens system to facilitate observation of the interior of the exposure device (400), and may include a lighting device that is controllable via the first input unit (490) and illuminates the interior of the exposure device (400). The lighting device may be a device that outputs light having a wavelength that does not affect photosensitivity.

The user can change the position of the second frame part (450) so that the lifting part (443) is positioned on the opening area (450h) of the second frame part (450) through the alignment viewer part (460). The user can manipulate at least one of the first and second position guide parts (431, 432) to change the position of the second frame part (450).

When the elevating unit (443) is positioned on the opening area (450h) of the second frame portion (450), the elevating unit (443) can be raised by controlling the elevating drive unit (444). As the elevating unit (443) rises, the upper surface of the base substrate (300a) on which the photosensitive film (300b) positioned on the elevating unit (443) is laminated can be attached to the lower surface of the film mask substrate (200a) on which the pattern exposed through the opening area (450h) of the second frame portion (450) is printed.

The user can adjust the positions of the alignment viewer unit (460) and the light irradiation unit (470) on the hole matching unit (429d) so that the light irradiation unit (470) is positioned on the observation and light irradiation hole (429).

After the light irradiation unit (470) is positioned on the observation and light irradiation hole (429), when a light irradiation command signal is input through the first input unit (490), ultraviolet light can be irradiated from the light irradiation unit (470). The exposure device (400) can be configured so that the light output from the light irradiation unit (470) is not visible from the outside.

The left outer ray light from the light irradiation unit (470) is irradiated onto the opening area (450h) of the second frame unit (450). Then, the area of the upper surface of the base substrate (300a) to which the photosensitive film (300b) is laminated, which corresponds to the pattern on the film mask substrate (200a), is not irradiated with ultraviolet rays, and the other areas are irradiated with ultraviolet rays, so that the base substrate (300a) to which the photosensitive film (300b) is laminated can be exposed.

In various embodiments, the intensity and irradiation time of the left ultraviolet light irradiated through the first input unit (490) can be adjusted. Accordingly, the user can proceed with exposure by adjusting the intensity or irradiation time of the ultraviolet light according to the learned content.

Referring to FIGS. 12 and 13, when the exposure of the base substrate (300a) to which the photosensitive film (300b) is laminated is completed, the user can withdraw the first frame portion (440) from the exposure device (400) and insert it into the developing device (500) as shown in FIG. 13. The developing device (500) may include a developer discharge portion (510), a developer discharge control portion (520), and a second input portion (530).

The developer discharge control unit (520) can control discharge of the developer from the developer discharge unit (510) based on a command signal input through the second input unit (530). The developer discharged from the developer discharge unit (510) can develop the base substrate (300a) on which the exposed photosensitive film (300b) is laminated. The developer may be a 2.38% diluted solution of tetramethyl ammounium hydroxide (TMAH) and water, considering stability for educational purposes, but is not limited thereto.

In the case of the positive type of the photosensitive film (300b), the area of the photosensitive film (300b) irradiated with ultraviolet rays is removed, and the area not irradiated with ultraviolet rays remains. In addition, in the case of the negative type of the photosensitive film (300b), the area remaining except for the area of the photosensitive film (300b) irradiated with ultraviolet rays is removed.

After completing the development process, the user can extract the first frame part (440) to obtain the final result of the photolithography process as shown in FIG. 2d.

Users can learn about the correlation between various exposure conditions and quality by referring to the pattern formed on the final result, the quality of the pattern, etc.

FIG. 14 illustrates a part of an exposure device constituting a photolithography education device according to another embodiment of the present invention.

Referring to FIG. 6 and FIG. 14, a lens part (270) may be installed on the lower side of the second coupling part (437) located on the inner side of the cover part (420) of the exposure device (400). The lens part (270) may be composed of a female part (271) connected to the cover part (420) on one side and a lens (272) connected to the other side of the female part (271). The female part (271) may be configured to be connected to a plurality of arms connected to each other so that the lens (272) is located on the same line as the observation and light irradiation hole (429) through the opening area (450h).

The dark part (271) can rotate in response to the rotation of the third position guide part (433) in one direction or the other at a predetermined angle. The position of the lens (272) installed in the dark part (271) can change according to the rotation of the dark part (271). The lens (272) can be positioned so as to be aligned with the observation and light irradiation hole (429) and positioned on the same line therewith, or the position can be changed so as not to be on the same line as the observation and light irradiation hole (429).

When the lens (272) is positioned on the same line as the observation and light irradiation hole (429) in a vertical direction from the ground, the lifting unit (443) can be spaced apart from the lens (272) by a predetermined distance. The lifting height of the lifting unit (443) can be adjusted through the first input unit (490). Then, when light from the light irradiation unit (470) is output, the light passes through the film mask substrate (200a) and is converted into pattern light by the pattern on the film mask substrate (200a), and the pattern light can have the light irradiation area converted while passing through the lens (272).

In some embodiments, the light irradiation area may be reduced as the pattern light passes through the lens (272). Finally, the base substrate (300a) to which the photosensitive film (300b) is laminated may be exposed by the pattern light irradiated onto the base substrate (300a) to which the photosensitive film (300b) is laminated. At this time, the light irradiation area of the pattern light may vary depending on the elevation height of the lifting unit (443). That is, the closer the lifting unit (443) gets to the lens (272), the wider the light irradiation area may become.

When the exposure process is performed while the lens (272) is positioned on the same line as the observation and light irradiation hole (492), the pattern designed by the user can be reduced and exposed on the base substrate (300a) to which the photosensitive film (300b) is laminated. Accordingly, exposure education using various micro-patterns can be performed by adjusting the magnification of the pattern and performing exposure.

FIG. 15 illustrates a part of an exposure device constituting a photolithography education device according to another embodiment of the present invention.

Referring to FIGS. 14 and 15, a plurality of lifting members (443) may be provided on the plate member (442) of the first frame member (440). For example, the first to fourth lifting members (443, 443b, 443c, 443d) may be positioned at a predetermined distance from each other. Each of them may be independently driven to lift or lower.

A base substrate (300a) to which a photosensitive film (300b) is laminated can be attached to each of the plurality of elevators (443).

The user can adjust the position of the second frame part (450) so that one of the plurality of lifting members (443) is positioned on the opening area (450h) of the second frame part (450) by using the first and second position guide members (431, 432). Then, the user can raise the lifting member positioned on the opening area (450h) of the second frame part (450) and then perform exposure. Then, the user can position another lifting member on the opening area (450h) of the second frame part (450) and then adjust the height of the lifting member and the intensity, wavelength, and output time of the output light from the light irradiation member (470) to perform exposure. And, the user can position another elevator on the opening area (450h) of the second frame part (450), position the lens (272) on the same line as the observation and light irradiation hole (492), adjust the height of the elevator part, and then proceed with exposure. In this way, the photosensitive films (300b) positioned on each of the plurality of elevator parts (443) can independently perform exposure under different exposure conditions on each of the laminated base substrates (300a). And, the final development process can be completed. Therefore, the final result according to various exposure conditions can be confirmed. That is, the difference in the quality of the result according to the intensity, wavelength, irradiation time, and magnification of the pattern of the light irradiation can be comprehensively learned.

Referring to FIG. 2e, in various embodiments, the design program (100p) may receive current position information of the second frame portion (450) from the exposure device (400), and display alignment information of the base substrate (300a) on which the photosensitive film (300b) is laminated and the pattern-printed film mask substrate (200a) based on the preset position information of the elevating portion (443) and the current position information of the second frame portion (450). That is, the design program (100p) may display an elevating portion position information image (443i) indicating the elevating portion (443) and a pattern-printed film mask substrate position information image (200ai) indicating the pattern-printed film mask substrate (200a). And, the design program (100p) can display the position information image (443i) of the lift unit and the position information image (200ai) of the film mask substrate printed with the pattern so as to match the current position of the lift unit (443) and the pattern-printed film mask substrate (200a). In various embodiments, when the design program (100p) receives an input signal (a signal input through an external input device such as a touch input or a mouse) related to the movement of the position information image (200ai) of the film mask substrate printed with the pattern, the design program (100p) can move the position information image (200ai) of the film mask substrate printed with the pattern and transmit the position information of the moved position information image (200ai) of the pattern-printed film mask substrate to the exposure device (400). The exposure device (400) can control the positions of the first and second position guide units (431, 432) based on the received position information to change the position of the second frame unit (450).

A user can learn the process of aligning a film mask substrate (200a) with a pattern printed thereon and a base substrate (300a) on which a photosensitive film (300b) is laminated, through a computing device (20).

In various embodiments, the alignment viewer unit (460) of the exposure device (400) may include a photographing device. The exposure device (400) may transmit an image photographed through the alignment viewer unit (460) to a computing device (20). The design program (100p) displays the received photographed image information, thereby allowing the alignment process of the actually printed film mask substrate (200a) and the base substrate (300a) on which the photosensitive film (300b) is laminated to be observed. Therefore, the embodiment enhances the learning effect for the alignment process.

In various embodiments, the exposure device (400) can transmit current height information of the elevator (443) to the computing device (20) while the lens (272) is matched to the observation and light irradiation hole (429).

The computing device (20) can display magnification information of the pattern light output through the lens (272) based on the current height information of the elevating unit (443) when the pattern light is irradiated on the base substrate (300a) to which the photosensitive film (300b) is laminated. In addition, information on the amount of change in the line width of the pattern can be displayed based on the designed pattern information and the magnification information of the pattern light. In various embodiments, the computing device (20) can set the magnification information of the pattern light based on the input amount of change in the line width of the pattern, and generate height information of the elevating unit (443) according to the set magnification information of the pattern light and provide it to the exposure device (400). The exposure device (400) can control the height of the elevating unit (443) based on the received height information of the elevating unit (443) and perform exposure while irradiating the pattern light on the base substrate (300a) to which the photosensitive film (300b) is laminated. Therefore, the embodiment enables learning of the quality of exposure and development, etc. according to changes in the line width of the designed pattern.

The embodiments of the present invention described above may be implemented in the form of program commands that can be executed through various computer components and recorded on a computer-readable recording medium. The computer-readable recording medium may include program commands, data files, data structures, etc., alone or in combination. The program commands recorded on the computer-readable recording medium may be those specially designed and configured for the present invention or those known and available to those skilled in the art of computer software. Examples of the computer-readable recording medium include magnetic media such as hard disks, floppy disks, and magnetic tapes, optical recording media such as CD-ROMs and DVDs, magneto-optical media such as floptical disks, and hardware devices specially configured to store and execute program commands, such as ROMs, RAMs, and flash memories. Examples of the program commands include not only machine language codes generated by a compiler, but also high-level language codes that can be executed by a computer using an interpreter, etc. The hardware devices may be changed into one or more software modules to perform processing according to the present invention, and vice versa.

The specific implementations described in the present invention are only exemplary embodiments and do not limit the scope of the present invention in any way. For the sake of brevity of the specification, descriptions of conventional electronic configurations, control systems, software, and other functional aspects of the systems may be omitted. In addition, the connections or lack of connections of lines between components illustrated in the drawings are merely exemplary of functional connections and/or physical or circuit connections, and may be replaced or represented as various additional functional connections, physical connections, or circuit connections in an actual device. In addition, if there is no specific mention such as “essential,” “important,” etc., it may not be a component absolutely necessary for the application of the present invention.

In addition, although the detailed description of the present invention has been described with reference to preferred embodiments of the present invention, it will be understood by those skilled in the art or having common knowledge in the art that various modifications and changes can be made to the present invention without departing from the spirit and technical scope of the present invention as described in the claims below. Accordingly, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification, but should be determined by the claims.

Claims (7)

A mask pattern printing device for printing a pattern on a film mask substrate based on pattern information received from a computing device;
A laminating device that laminates a base substrate and a photosensitive film and outputs the base substrate to which the photosensitive film is laminated in a predetermined size;
An exposure device that aligns a base substrate to which the photosensitive film is laminated and a film mask substrate to which the pattern is printed and irradiates light thereto to expose the base substrate to which the photosensitive film is laminated; and
A developing device for developing a base substrate to which an exposed photosensitive film is laminated, and selectively removing an exposed area and a non-exposed area of the base substrate to which the photosensitive film is laminated by the pattern;
The above exposure device
Main body,
A cover part that opens and closes the exposure device by rotating at a predetermined angle around the connection point with the main body part;
A first frame part that accommodates a base substrate on which the photosensitive film is laminated and can be inserted into or withdrawn from the main body part;
A second frame portion for storing a film mask substrate having the above pattern printed thereon;
A transfer unit for changing the position of the second frame section,
The inside of the above exposure device is observed, and an alignment viewer unit for aligning the first and second frame parts and a light irradiation unit for irradiating light for exposure are included.
Photolithography training device. In the first paragraph,
The above film mask substrate is composed of a transparent material, and the pattern blocks the passage of the irradiated light.
Photolithography training device. delete In the first paragraph,
The above first frame part
Handle,
A plate portion connected to the above handle portion,
A lifting unit that adjusts the height of a region of the plate section to adjust the height of the base substrate on which the photosensitive film is laminated, and
It includes an elevator driving unit that controls the height of the elevator unit to adjust the distance between the base substrate on which the photosensitive film is laminated and the film mask substrate on which the pattern is printed.
Photolithography training device. In the fourth paragraph,
The above cover part has an observation and light irradiation hole formed,
The above exposure device is configured such that the alignment viewer part moves to match the observation and light irradiation hole for observing the inside of the exposure device, or the light irradiation part moves to match the observation and light irradiation hole for irradiating light to the film mask substrate on which the pattern is printed.
Photolithography training device. In clause 5,
The above exposure device
The photosensitive film is positioned between the laminated base substrate and the film mask substrate on which the pattern is printed, and moves to match the observation and light irradiation holes, so that the pattern light passing through the film mask substrate on which the pattern is printed is irradiated on the base substrate on which the photosensitive film is laminated with the magnification adjusted.
Photolithography training device. In Article 6,
The above computing device
Based on the preset position information of the above-mentioned elevator unit and the current position information of the above-mentioned second frame unit, alignment information of the base substrate on which the photosensitive film is laminated and the film mask substrate on which the pattern is printed, and the photographed image observed through the alignment viewer unit are displayed,
Based on the reception of an input signal for movement of a film mask substrate on which the pattern is printed, the position of the film mask substrate on which the pattern is printed is changed and position information of the film mask substrate on which the pattern is printed is transmitted to the exposure device so that the exposure device changes the position of the second frame.
The magnification information of the pattern light irradiated on the base substrate to which the photosensitive film is laminated is displayed according to the height of the above-mentioned elevator,
Based on the change amount information of the line width of the input pattern, the magnification information of the pattern light is set, and the height information of the lifting unit is generated according to the set magnification information of the pattern light and provided to the exposure device, so that the exposure device controls the height of the lifting unit so that the pattern light is irradiated to the base substrate on which the photosensitive film is laminated and exposed.
Photolithography training device.