KR102861102B1 - Color Filter, Display Device Including the Same, and Fabrication Method Thereof - Google Patents

Abstract

A color filter is disclosed, which includes a glass substrate, a frit formed on the glass substrate, a pattern boundary formed inside the frit on the glass substrate, a black matrix (BM) layer formed inside the pattern boundary on the glass substrate, a first coloring layer formed between the BM layers, and a second coloring layer formed between the pattern boundary and the BM layer.

Description

Color filter, display device including the same, and manufacturing method thereof

The present invention relates to a color filter, a display device including the same, and a method for manufacturing the same.

Organic light-emitting diode (OLED) panels may reflect external light, such as sunlight or lighting, due to the exposure of electrodes, and the reflected external light may reduce visibility and contrast ratio, resulting in poor display quality.

Accordingly, as disclosed in Korean Patent Publication No. 2009-0122138, a circular polarizing plate combining a linear polarizer and a λ/4 phase difference layer can be attached to the viewing side of an OLED panel as an anti-reflection polarizing plate to block external light reflection on the surface and provide a black viewing sensation when the power is off.

However, applying such anti-reflection polarizing plates can cause a decrease in OLED panel brightness. Consequently, interest in color filters as a potential replacement for anti-reflection polarizing plates is growing.

Meanwhile, frit can be used to seal the display panel after it has been manufactured.

Korean Patent Publication No. 2012-0139557 discloses a method for manufacturing a sealant, comprising: "forming a heating layer on a first substrate; forming a frit paste including a frit material and a binder on the heating layer; heating the heating layer by induction heating to remove the binder and fuse the frit material, thereby forming a glass frit; providing the first substrate and the second substrate facing each other with the glass frit therebetween; and irradiating the glass frit with laser light to fuse the glass frit and the second substrate." That is, in order to solve a problem caused by a high firing temperature of the frit, a method of locally heating the heating layer using induction heating is proposed.

However, in order to form the frit using induction heating, an additional process for forming a heating layer must be added, which results in an increase in time and cost. In addition, Korean Patent Publication No. 2012-0139557 also discloses that "the heating layer (113) is formed with frit paste so as to roughly match the pattern of the frit paste (115) formed later," and at this time, the width of the heating layer must be wider than that of the frit due to the precision and alignment error during the formation of the heating layer and frit paste. However, if the width of the heating layer is formed wide, there occurs a disadvantage in that the bezel area of the display panel becomes wider.

Republic of Korea Patent Publication No. 2009-0122138 Republic of Korea Patent Publication No. 2012-0139557

The present invention is intended to solve the problems of the prior art, and its object is to provide a color filter that can be sealed using frit, has a simple process, and has a narrow bezel area.

Another object of the present invention is to provide a color filter that can replace a polarizing plate for OLED by forming a color filter on a glass substrate.

Another object of the present invention is to improve the flatness of the film thickness when manufacturing a sealable color filter using frit.

Another object of the present invention is to provide a display device including the above-described color filter.

Another object of the present invention is to provide a method for manufacturing the color filter described above.

To solve such a problem, one aspect of the present invention provides a color filter including a glass substrate, a frit formed on the glass substrate, a pattern boundary formed inside the frit on the glass substrate, a black matrix (BM) layer formed inside the pattern boundary on the glass substrate, a first coloring layer formed between the BM layers, and a second coloring layer formed between the pattern boundary and the BM layer. Here, the pattern boundary includes a first upper surface inclined from the frit toward the BM layer.

The pattern boundary may further include a second upper surface that is flat from the first upper surface toward the BM layer.

It is preferable that the width and average height of the pattern boundary be greater than the width and average height of the BM layer, respectively.

The cross-section of the frit may be trapezoidal. The angle of the inclined side of the trapezoidal shape with respect to the vertical direction may be from 5 degrees to 30 degrees.

It is desirable that the distance between the frit and the pattern boundary be 200 um to 1500 um.

According to another aspect of the present invention, a color filter is provided, including a glass substrate, a frit formed on the glass substrate, a first pattern boundary formed inside the frit on the glass substrate, a second pattern boundary formed inside the first pattern boundary on the glass substrate, a black matrix (BM) layer formed inside the second pattern boundary on the glass substrate, a first coloring layer formed between the BM layers, and a second coloring layer formed between the second pattern boundary and the BM layer. Here, the first pattern boundary includes a first upper surface inclined from the frit toward the BM layer.

In the color filter according to the present invention, the thickness of the glass substrate may be 0.2 mm to 0.5 mm, and the refractive index of the glass substrate may be 1.4 to 1.8.

The color filter according to the present invention may be used for anti-reflection or as a replacement for a polarizing plate.

According to another aspect of the present invention, a display device is provided including a color filter as described above and a display panel coupled to the color filter.

According to another aspect of the present invention, a method for manufacturing a color filter is provided, including the steps of forming a pattern boundary and a black matrix (BM) layer inside a frit on a glass substrate on which frit is formed, forming a first coloring layer between the BM layers, and forming a second coloring layer between the pattern boundary and the BM layer. Here, the pattern boundary is formed to have a first upper surface inclined from the frit toward the BM layer.

The method for manufacturing a color filter according to the present invention may further include a step of forming a frit on a glass substrate before the step of forming a pattern boundary and a BM layer.

The pattern boundary and BM layer can be formed by a slit coating method.

The first and second coloring layers can be formed by a slit coating method.

The coating speed during slit coating can be 20 mm/s to 80 mm/s.

In the step of forming the pattern boundary and the BM layer and the step of forming the first color layer and the second color layer, the exposure amount may be 80 mj to 120 mj.

According to the present invention, a pattern boundary made of the same material as the black matrix layer is formed between the frit and the pixel area on a glass substrate, thereby allowing a color filter to be sealed through a simplified process, thereby improving the flatness of the film thicknesses of the black matrix layer and the coloring layer and achieving a narrow bezel area. Such a color filter can replace a polarizing plate in an OLED display device by providing increased light efficiency and suppressing external light reflection.

Fig. 1 is a cross-sectional view of a color filter according to a first embodiment of the present invention.
Figure 2 is an enlarged view of part II of Figure 1.
FIG. 3 and FIG. 4 are cross-sectional views showing a portion of a color filter according to the second and third embodiments of the present invention.
Figures 5a to 5d are cross-sectional views of each step of the color filter manufacturing method according to the first embodiment of the present invention.
FIG. 6 is a cross-sectional view of a display device including a color filter according to a first embodiment of the present invention.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings. However, the drawings attached to this specification are merely illustrative examples for illustrating the present invention and are not intended to limit the present invention. Furthermore, for convenience of explanation, some components may be exaggerated, reduced, or omitted in the drawings.

FIG. 1 is a cross-sectional view of a color filter according to a first embodiment of the present invention, and FIG. 2 is an enlarged view of part II of FIG. 1.

Referring to FIG. 1, a color filter according to the first embodiment of the present invention may include a substrate (110), a frit for sealing (120), a black matrix (BM) layer (130), a pattern boundary (135), and a coloring layer (140).

The substrate (110) may be a glass substrate. The thickness of the substrate (110) may be 0.2 mm to 0.5 mm. The refractive index of the substrate (110) is preferably 1.4 to 1.8, which is similar to that of a color filter in terms of light efficiency.

A frit (120) is formed on the substrate (110) to seal the substrate (110) by overlapping it with an opposing substrate (not shown). The material or manufacturing method of the frit (120) and the sealing method using the same are not particularly limited in the present invention, and any technique commonly used in this field can be used.

Now, referring to FIG. 2, the width (f) of the frit (120) may be 300 um to 1500 um. If the width of the frit (120) is narrower than this, when bonding two substrates using the frit later, the bonding area with the opposing substrate is narrow, which increases the possibility of peeling. If the width is wide, the chamfering rate decreases and the bezel area widens. The height of the frit (120) may be 4 um to 10 um, preferably 5 um to 8 um. If the height of the frit (120) is higher than this, the distance from the OLED (not shown) formed on the opposing substrate increases, reducing the viewing angle. If the height of the frit (120) is lower than this, the distance from the OLED becomes too close, which may cause contact with the OLED, thereby increasing the contact pressure.

The angle (α) representing the inclination of the frit (120) may be 5 to 30 degrees. If the inclination is higher than this, that is, if the angle α is large, the processability may be poor during coating, and if it is too low, that is, if the angle α is too small, the area in contact with the opposing substrate during substrate bonding may be narrow, which may result in peeling.

A pattern of a BM layer (130) and a coloring layer (140) is formed on the inside of the frit (120), and a pattern boundary (135) is formed between the frit (120) and the pattern along the edge of the pattern.

The BM layer (130) is a light-blocking layer that defines the pixel area, blocks light from areas other than the pixel area, and prevents color mixing at the boundaries of each coloring layer. Therefore, the BM layer (130) is formed of an opaque material and is patterned to surround the pixel area.

The BM layer (130) is formed of a material containing carbon black and may include a polymer material. The polymer material includes at least one material selected from the group consisting of, for example, polyacrylate, polymethacrylate (e.g., PMMA), polyimide, polyamide, polyvinyl alcohol, polyamic acid, polyolefin (e.g., PE, PP), polystyrene, polynorbornene, phenylmaleimide copolymer, polyazobenzene, polyphenylenephthalamide, polyester (e.g., PET, PBT), polyarylate, cinnamate polymer, coumarin polymer, phthalimidine polymer, chalcone polymer, and aromatic acetylene polymer.

The BM layer (130) may also use an organic material containing a black pigment. When using an organic material, it is advantageous for low reflection.

The film thickness, or height, of the BM layer (130) may be 0.8 um to 1.8 um, preferably 1.0 um to 1.5 um. If the height of the BM layer (130) is higher than this, it may come into contact with the OLED, which may cause defects due to increased contact pressure. If it is formed lower than this, an area where the BM layer (130) pattern is not created may occur during the manufacturing process through coating.

The pattern boundary (135) is formed of the same material as the BM layer (130). In the color filter according to the first embodiment of the present invention illustrated in FIGS. 1 and 2, the pattern boundary (135) is composed of a first portion (A of FIG. 2) having an inclined upper surface and a second portion (B of FIG. 2) having a flat upper surface.

The overall width w of the pattern boundary (135) may be 50 um to 500 um, and among these, the width w1 of the first portion (A in FIG. 2) having an inclined upper surface may be 5 um to 495 um, and the width w2 of the second portion (B in FIG. 2) having a flat upper surface may be 5 um to 495 um. The inclination angle (θ) of the inclined upper surface may be 0 degrees to 2 degrees.

The distance (d) between the pattern boundary (135) and the frit (120) may be 200 um to 1500 um, and preferably 400 um to 1000 um. If the distance (d) is close, damage may occur to the pattern formed inside the frit (120) when sealing with the frit (120) using a laser, and if the distance (d) is long, there is a problem in that the bezel area increases.

Meanwhile, in the present invention, a separate heating layer or the like is not required to form the frit (120), and the frit (120) can be formed directly on the substrate (110), so that a narrower bezel area can be implemented compared to the prior art.

The coloring layer (140) is a layer for implementing colors for a color display, and is typically patterned with red, green, and blue, and is arranged in a pixel area between the BM layers (130). In the color filter according to the first embodiment of the present invention, the coloring layer (140) is formed in the pixel area between the BM layers (130) and the area between the BM layer (130) and the pattern boundary (135). Meanwhile, the coloring layer (140) does not have to include all of the red, green, and blue patterns, or only the red, green, and blue patterns, and depending on the color expression method of the display device, only some of the color patterns may be included, or other color patterns, such as a white pattern, may be further included.

The coloring layer (140) can also be formed of the polymer material described above, and it is preferable to form at least one of the BM layer (130) and the coloring layer (140) with a low-reflection material. In particular, it is preferable to use a material with low reflectivity as the material of the coloring layer (140), and when the color filter according to one embodiment of the present invention is used for preventing external light reflection in an OLED display device, it is preferable that the transmittance for each color be 50% or more at the center wavelength of the OLED light source.

The film thickness, or height, of the coloring layer (140) may be 1.0 um to 2.5 um, preferably 1.2 um to 2.0 um. If the height of the coloring layer (140) is higher than this, it may come into contact with the OLED, which may cause defects due to increased contact pressure. If it is formed lower than this, areas where the coloring layer (140) pattern is not created may occur during the manufacturing process through coating.

Figures 3 and 4 are cross-sectional views showing a portion of a color filter according to the second and third embodiments of the present invention, respectively.

In the color filter according to the second and third embodiments of the present invention, the shape of the pattern boundary portion (335, 435, 437) is different from that of the color filter according to the first embodiment of the present invention.

Referring to FIG. 3, in the color filter according to the second embodiment of the present invention, the entire upper surface of the pattern boundary portion (335) is configured in an inclined shape. Other than the shape of the pattern boundary portion (335), the other configurations are the same as those of the first embodiment of the present invention, and thus a detailed description thereof will be omitted.

Referring to FIG. 4, in a color filter according to a third embodiment of the present invention, the pattern boundary is divided into two parts: a first pattern boundary (435) having an inclined upper surface and a second pattern boundary (437) having a substantially flat upper surface. Other than the shape of the pattern boundary (335), the other configurations are the same as those of the first embodiment of the present invention, and thus a detailed description thereof will be omitted.

In another embodiment of the present invention, the pattern boundary may be divided into two parts, and the upper surfaces of both parts may be configured in an inclined shape.

Now, a method for manufacturing a color filter according to the first embodiment of the present invention will be described.

Figures 5a to 5d are cross-sectional views of each step of the color filter manufacturing method according to the first embodiment of the present invention.

First, as shown in Fig. 5a, a substrate (110) on which a frit (120) is formed is prepared. The substrate (110) may be a glass substrate. The frit (120) is prepared by being formed in advance on the substrate (110), but the material or manufacturing method thereof is not particularly limited in the present invention, and any technique commonly used in this field may be used.

Next, as shown in Fig. 5b, a composition (530) for forming a BM layer and a pattern boundary is applied through a nozzle (500). The arrow indicated by C in the drawing indicates the coating direction. As a coating method, slit coating or the like can be used, and as the composition (530) for forming a BM layer and a pattern boundary, the aforementioned polymer material containing carbon black can be used.

In the process of coating the composition (530) for forming the BM layer and pattern boundary, the coating gap is set to 50 um to 350 um, preferably 100 um to 250 um. If the coating gap is higher than this range, a portion may not be coated depending on the viscosity, and if it is lower than this range, the composition bead may be pushed into the nozzle (500), which may lower the uniformity of the coating and cause damage to the nozzle due to foreign substances.

The coating speed should be between 1 mm/s and 150 mm/s, preferably between 20 mm/s and 80 mm/s. If the coating speed is faster than this range, some areas may not be coated depending on the viscosity. If the speed is lower than this range, process speed delays may be a problem.

Then, the film of the composition (530) for forming the coated BM layer and pattern boundary is patterned to form the BM layer (130) and the pattern boundary (135), as shown in FIG. 5c.

The exposure dose in the process of forming the BM layer (130) and the pattern boundary (135) is set to 30 mj to 200 mj, preferably 80 mj to 120 mj. If the exposure dose is lower than this range, the adhesion is reduced, and if it is higher than this range, the process speed may be delayed.

The dimensions and shape of the formed BM layer (130) and the pattern boundary (135) are as described above with reference to FIGS. 1 and 2.

Now, as shown in Fig. 5d, a coloring layer (140) is formed on the BM layer (130) and the pattern boundary (135).

The coloring layer (140) is formed by applying a composition for forming a coloring layer for color expression to a pixel area defined by the BM layer (130) and the pattern boundary (135), and exposing and developing it in a predetermined pattern. The colors constituting the coloring layer can be arbitrarily selected, and the order of formation for each color can also be arbitrarily selected.

The process of applying, exposing, and developing a composition for forming a colored layer is similar to the process of forming a BM layer (130) and a pattern boundary (135) described with reference to FIGS. 5b and 5c. That is, a method such as slit coating is used to form the layer under the conditions of the coating gap, coating speed, and exposure amount described above.

The film thickness of the formed colored layer (140), i.e., its height, may be 1.0 um to 2.5 um, preferably 1.2 um to 2.0 um, as described above.

By forming a color filter according to the above manufacturing method, the flatness of the film thickness of the black matrix layer and the coloring layer in the color filter according to the embodiment of the present invention can be improved.

Next, a display device including a color filter according to the first embodiment of the present invention will be described.

FIG. 6 is a cross-sectional view of a display device including a color filter according to a first embodiment of the present invention.

As shown in FIG. 6, a display device according to the first embodiment of the present invention may include a color filter (100) according to the first embodiment of the present invention and a display panel (200) joined thereto.

The color filter (100) may be the same as or similar to the color filter according to the first embodiment of the present invention described with reference to FIGS. 1 and 2.

The display panel (200) may have a structure in which an OLED layer (220) is formed on a second substrate (210). However, the structure of the display panel (200) illustrated in FIG. 6 is presented as a simple example, and the present invention does not specifically limit the structure as long as it can be used in a display device.

The display panel (200) is bonded to the color filter (100) through a frit (120) on the color filter (100).

Meanwhile, a display device including a color filter according to the second and third embodiments of the present invention described with reference to FIGS. 3 and 4 can also be configured in a similar manner.

Hereinafter, the present invention will be described in more detail through examples and comparative examples. These examples and comparative examples are intended solely to illustrate the present invention, and it will be apparent to those skilled in the art that the scope of the present invention is not limited thereto.

Examples and Comparative Examples

A substrate simulating a frit was fabricated using an organic film on a glass substrate. The frit was fabricated with a width of 1.1 mm and a height of 6.5 μm.

A composition for forming a BM layer was coated on a mock substrate, and the characteristics of the formed film were measured after pre-heat treatment, exposure, development, and curing. The film width was measured using Mercury8000s (V-Technology), and the height was measured using PSIS5006 (SNU Precision).

The measurement results are expressed by taking the average of the values of a portion located sufficiently far from the frit and not affected by the frit, and comparing the values according to the location from the frit with the average.

Table 1 shows the measurement results according to coating speed, Table 2 shows the measurement results according to exposure dose, and Table 3 shows the measurement results according to frit inclination.

In the measurements in Table 1, the coating gap was 150 μm, the amount of composition applied was 16 cc, the exposure dose was 87 mj, and the inclination (α) of the frit was kept constant at 36 degrees.

Coating speed (mm/s) item average 0mm 0.5mm 1.0mm 1.5mm Example 1 20 width 16.0 +1.2 +0.6 +0.3 +0.2 height 1.14 +0.2 +0.1 0 0 Example 2 50 width 15.9 +1.2 +0.6 +0.2 +0.2 height 1.14 +0.2 +0.1 0 -0.1 Example 3 75 width 16.1 +1.2 +0.6 +0.2 +0.1 height 1.14 +0.2 +0.1 0 0 Comparative Example 1 100 width 16.0 +1.5 +0.7 +0.2 +0.2 height 1.14 +0.2 +0.2 0 0

As shown in Table 1, in Examples 1 to 3 where the coating speed was maintained at 80 mm/s or less, the width and height were maintained within a constant range compared to the average at distances of 0 mm and 0.5 mm from the frit, whereas in Comparative Example 1 where the coating speed was 100 mm/s, it can be seen that the increase in width and height was large at distances of 0 mm and 0.5 mm from the frit. In the measurements in Table 2, the width and height of the film according to the change in exposure amount were compared with the average while maintaining the coating gap of 150 um, the coating speed of 100 mm/s, the application amount of the composition of 16 cc, and the inclination (α) of the frit of 36 degrees constant.

Exposure dose (mj) item average 0mm 0.5mm 1.0mm 1.5mm Example 4 87 width 16 +1.5 +0.7 +0.2 +0.2 height 1.14 +0.2 +0.2 0 0 Example 5 108 width 16 +1.3 +0.6 +0.2 +0.1 height 1.12 +0.2 +0.2 0 +0.1 Comparative Example 2 70 width 16 +1.8 +0.8 +0.2 +0.2 height 1.15 +0.3 +0.2 0 +0.1

As shown in Table 2, in Examples 4 and 5, where exposure was performed at exposure doses of 87 mj and 108 mj, respectively, the width and height were maintained within a constant range compared to the average at distances of 0 mm and 0.5 mm from the frit, whereas in Comparative Example 2, where exposure dose was 70 mj, the increase in width and height was large at distances of 0 mm and 0.5 mm from the frit. In the measurements in Table 3, the width and height of the film according to the change in the inclination (α) of the frit were compared with the average while maintaining a constant coating gap of 150 μm, a coating speed of 100 mm/s, an application amount of the composition of 16 cc, and an exposure dose of 70 mj.

Frit slope
( α, degrees ) item average 0mm 0.5mm 1.0mm 1.5mm Example 6 19 width 16.2 +0.9 +0.4 +0.1 0 height 1.15 +0.1 +0.1 -0.1 +0.1 Example 7 27 width 16 +1.2 +0.6 +0.2 +0.1 height 1.14 +0.2 +0.1 0 0 Comparative Example 3 36 width 16 +1.5 +0.7 +0.2 +0.2 height 1.14 +0.2 +0.2 0 0

As shown in Table 3, in Examples 6 and 7 where the inclination (α) of the frit was formed at 19 degrees and 27 degrees, the width and height were maintained within a constant range compared to the average at distances of 0 mm and 0.5 mm from the frit, whereas in Comparative Example 3 where the inclination (α) of the frit was formed at 36 degrees, the increase in the width and height was large at distances of 0 mm and 0.5 mm from the frit. In summary, the results shown in Tables 1 to 3 above show that the properties of the film formed using the composition for forming a BM layer are affected by the coating speed, exposure dose, and inclination of the frit. In order to confirm the influence of these conditions once again, additional tests were conducted using the composition for forming a colored layer.

Comparative Example 4, which serves as a standard, formed a film using a composition for forming red, green, and blue colored layers without forming a frit, and then measured the transmittance and brightness, respectively. Example 8 applied a coating gap of 150 μm, a coating speed of 50 mm/s, a coating amount of 16 cc of the composition, an exposure amount of 108 mj, and a frit inclination (α) of 19 degrees by synthesizing the results shown in Tables 1 to 3 above. Comparative Example 5 applied a coating gap of 150 μm, a coating speed of 100 mm/s, a coating amount of 16 cc of the composition, an exposure amount of 87 mj, and a frit inclination (α) of 36 degrees.

The width of the formed film was measured using Mercury8000s (V-Technology), and the color, optical density, and transmittance were measured using a spectrophotometer LCF-5100 (Korea Otsuka Electronics). The film thickness and characteristics of the area around the frit and the area not affected by the frit were measured, and the characteristics were compared based on the deviation (Max-Min)/Ave*100/2 (where Max is the maximum value, Min is the minimum value, and Ave is the value of the area not affected by the frit).

color item specification Film thickness deviation -6% -5% -4% -3% -2% -1% 0% 1% 2% 3% 4% 5% 6% Film thickness ±3% 1.88 1.9 1.92 1.94 1.96 1.98 2 2.02 2.04 2.06 2.08 2.1 2.12 enemy Transmittance @630nm 77.8% 77.6% 77.4% 77.2% 77.0% 76.8% 76.6% 76.4% 76.2% 76.0% 75.8% 75.6% 75.4% Brightness ±4.0 10.0 10.0 9.9 9.8 9.8 9.7 9.6 9.6 9.5 9.5 9.4 9.3 9.3 rust Transmittance @520nm 77.0% 76.7% 76.5% 76.3% 76.1% 75.9% 75.7% 75.5% 75.3% 75.0% 74.8% 74.6% 74.4% Brightness ±2.5 39.7 39.4 39.2 38.9 38.7 38.4 38.2 38.0 37.7 37.5 37.3 37.0 36.8 jean Transmittance @445nm 71.8% 71.5% 71.3% 71.0% 70.8% 70.5% 70.3% 70.0% 69.8% 69.5% 69.3% 69.0% 68.8% Brightness ±2.5 10.1 9.9 9.8 9.6 9.5 9.3 9.2 9.1 9.0 8.8 8.7 8.6 8.5

In the case of Comparative Example 4, which serves as a reference, a deviation of ±3% was shown as indicated by the shade in Table 4, in the case of Example 8, a deviation of ±4% was shown as indicated by the bold font in Table 4, and in the case of Comparative Example 5, a deviation of ±6% was shown as indicated by the italic font in Table 4. In addition, a film was formed using a composition for forming a BM layer under the same conditions, and the characteristics were compared.

item specification Film thickness deviation -6% -5% -4% -3% -2% -1% 0% 1% 2% 3% 4% 5% 6% Film thickness ±0.2 1.13 1.14 1.15 1.16 1.18 1.19 1.2 1.21 1.22 1.24 1.25 1.26 1.27 width ±1.5 16.0 16.1 16.1 16.2 16.2 16.3 16.3 16.4 16.4 16.5 16.5 16.6 16.6 optical density >4.0 4.3 4.4 4.4 4.5 4.5 4.5 4.6 4.6 4.7 4.7 4.8 4.8 4.9

Similarly, in the case of a film using a composition for forming a BM layer, Comparative Example 4, which serves as a reference, showed a deviation of ±3% as indicated by the shade in Table 4, Example 8 showed a deviation of ±4% as indicated by the bold font in Table 4, and Comparative Example 5 showed a deviation of ±6% as indicated by the italic font in Table 4. In this way, it can be confirmed that by adjusting the coating speed, exposure amount, and inclination of the frit, it is possible to form a colored layer and BM layer suitable for the specifications.

Preferred embodiments of the present invention have been described above with reference to the drawings. However, the present invention is not limited to the above-described embodiments, and it will be understood that the present invention can be implemented in modified forms without departing from the essential characteristics of the present invention. The above-described embodiments of the present invention can be applied independently or in combination with some or all of their features.

Therefore, the scope of the present invention is determined by the claims rather than the above description, and all differences within the scope equivalent thereto should be construed as being included in the present invention.

100: Color filter 110: Substrate
120: Frit 130: Black matrix layer
135: Pattern boundary 140: Color layer
200: Display panel 210: Second substrate
220: OLED layer

Claims (17)

glass substrate;
Frit formed on the glass substrate;
A pattern boundary formed inside the frit on the glass substrate;
A black matrix (BM) layer formed inside the pattern boundary on the glass substrate;
It includes a first coloring layer formed between the BM layers and a second coloring layer formed between the pattern boundary and the BM layer,
The above pattern boundary includes a first upper surface inclined from the frit toward the BM layer,
The above pattern boundary is an anti-reflection color filter formed in the display area. In the first paragraph,
An anti-reflection color filter wherein the pattern boundary further includes a second upper surface that is flat from the first upper surface toward the BM layer. In the first paragraph,
An anti-reflection color filter in which the width and average height of the above pattern boundary are greater than the width and average height of the BM layer, respectively. In the first paragraph,
The cross section of the above frit is trapezoidal in shape,
An anti-reflection color filter having an angle of 5 to 30 degrees with respect to the horizontal direction of the inclined side of the above trapezoidal shape. In the first paragraph,
An anti-reflection color filter having a distance between the frit and the pattern boundary of 200 um to 1500 um. glass substrate;
Frit formed on the glass substrate;
A first pattern boundary formed inside the frit on the glass substrate;
A second pattern boundary formed inside the first pattern boundary on the glass substrate;
A black matrix (BM) layer formed inside the boundary of the second pattern on the glass substrate;
It includes a first coloring layer formed between the BM layers and a second coloring layer formed between the second pattern boundary and the BM layer,
The first pattern boundary includes a first upper surface inclined from the frit toward the BM layer,
The above first pattern boundary and second pattern boundary are anti-reflection color filters formed in the display area. In any one of claims 1 to 6,
An anti-reflection color filter having a thickness of the above glass substrate of 0.2 mm to 0.5 mm. In any one of claims 1 to 6,
An anti-reflection color filter having a refractive index of 1.4 to 1.8 of the above glass substrate. delete In any one of claims 1 to 6,
The above anti-reflection color filter is an anti-reflection color filter that replaces a polarizing plate. An anti-reflection color filter according to any one of claims 1 to 6; and
A display device comprising a display panel coupled to the above anti-reflection color filter. A step of forming a pattern boundary and a black matrix (BM) layer in a display area inside the frit on a glass substrate on which the frit is formed; and
A step of forming a first colored layer between the BM layers and forming a second colored layer between the pattern boundary and the BM layer is included.
A method for manufacturing an anti-reflection color filter, wherein the pattern boundary is formed to have a first upper surface inclined from the frit toward the BM layer. In paragraph 12,
A method for manufacturing an anti-reflection color filter, further comprising a step of forming the frit on the glass substrate prior to the step of forming the pattern boundary and the BM layer. In Article 12,
A method for manufacturing an anti-reflection color filter in which the above pattern boundary and the BM layer are formed by a slit coating method. In Article 12,
A method for manufacturing an anti-reflection color filter in which the first and second coloring layers are formed by a slit coating method. In Article 14 or 15,
A method for manufacturing an anti-reflection color filter, wherein the coating speed during the above slit coating is 20 mm/s to 80 mm/s. In Article 14 or 15,
A method for manufacturing an anti-reflection color filter, wherein the exposure amount is 80 mJ to 120 mJ in the step of forming the pattern boundary and BM layer and the step of forming the first coloring layer and the second coloring layer.