KR20100071448A - Imprint apparatus - Google Patents

Abstract

Disclosed is an imprint apparatus capable of easily patterning both sides of a substrate in a double-sided imprint method.

Such an imprint apparatus may include a chamber unit providing a chamber having a predetermined size, a vertical loading unit loading the substrate so that the substrate is positioned in an upright position in the chamber unit, a first stamp for imprinting one surface and the other surface of the substrate on the vertical loading unit; And a double-sided imprint unit configured of a second stamp, and an imprint driver for driving the first stamp and the second stamp to enable an imprint operation.

Description

Imprint apparatus

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an imprint apparatus capable of simply patterning both sides of various substrates in a double-sided imprint method.

In general, an imprint apparatus has a cross-sectional imprint structure in which stamps form a variety of functional patterns on one surface of a substrate while the stamp is operated to be bonded / separated from either side of the substrate.

Briefly describing the structure of such an imprint apparatus, a chamber portion, a stamp disposed inside the chamber portion, a stage disposed below the stamp and loading the substrate in a horizontal state, and bonding / separating the stamp or the stage It includes a drive unit for enabling operation.

That is, the imprint apparatus patterns various functional patterns on one surface of both surfaces of the substrate while pressing one surface (upper surface) of the substrate loaded horizontally on the stage side with a stamp.

However, according to the structure of such an imprint apparatus, for example, a satisfactory imprint operation in which predetermined functional patterns (patterns for light) must be formed on both surfaces of a substrate, such as an LCD light guide panel, is satisfactory. Can't expect workability

That is, since one surface of the light guide plate manufacturing substrate is imprinted and then the other surface is imprinted again, the process is complicated and requires excessive time.

Since the bottom surface of the substrate is loaded in contact with the loading surface of the stage, when imprinting one side of the substrate and then imprinting the opposite surface, the pattern surface formed on one surface of the substrate may easily be damaged while contacting the loading surface of the stage. Can be.

Furthermore, since the imprint apparatus must have a stage of a weight corresponding to the substrate size, the structure is complicated and the manufacturing cost is excessive.

In particular, the structure in which the imprint operation is carried out while the substrate is horizontally loaded has to secure a horizontal space corresponding to the area of the substrate and the stage, making it difficult to realize miniaturization of the device, and occupy an excessive amount of space in the workplace, thereby making space efficient. It can be a factor that greatly lowers the

In addition, when the imprint operation is performed while the substrate is horizontally loaded, sagging phenomenon may easily occur due to its own weight, as well as the substrate, and the imprint operation (for example, adhesion and separation) may proceed abnormally.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems occurring in the prior art,

An object of the present invention is to provide an imprint apparatus which can easily form a predetermined functional pattern, while simultaneously pressing both surfaces of a substrate in an imprint manner.

In order to realize the object of the present invention as described above,

A chamber unit providing a chamber of a predetermined size;

A vertical loading unit loading the substrate in such a state that the substrate is placed in an upright position;

A double-sided imprint unit including a first stamp and a second stamp for imprinting one surface and the other surface of the substrate in the vertical loading unit;

An imprint driver for driving the first stamp and the second stamp to enable an imprint operation;

It provides an imprint apparatus comprising a.

In the present invention, various functional patterns can be conveniently formed on both sides of the substrate at the same time by the double-side imprint method using the first and second stamps of the double-side imprint portion.

In particular, such a double-sided imprint method, for example, in the manufacture of a light guide plate for the backlight of the LCD can be patterned on both sides of the substrate at the same time can greatly shorten the work process, reducing the tack time to further improve the work yield It can be secured.

In addition, the structure in which the substrate is loaded with the vertical loading unit upright can significantly reduce the occupied area in the horizontal direction as compared with the conventional horizontal loading structure, thereby realizing miniaturization of the device and significantly increasing the efficiency of the space in the workplace.

Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

The embodiments of the present invention will be described by those skilled in the art to which the present invention is applicable.

Therefore, since the embodiments of the present invention can be modified in various other forms, the claims of the present invention are not limited to the embodiments described below.

1 is a view schematically showing the overall structure of an imprint apparatus according to an embodiment of the present invention, 2 denotes a chamber part.

The chamber part 2 provides a chamber S for performing an imprint operation, and has an open type structure capable of loading / unloading the substrate G from the outside of the chamber S. It may be made of.

For example, as shown in FIG. 1, each of the first chamber case C1 and the second chamber case C2 having internal spaces S1 and S2 having one surface open, respectively, is composed of the internal spaces S1, The open surface of S2) may be installed on the frame F in a state of facing left / right.

The first chamber case C1 and the second chamber case are set to be coupled to each other in the state facing each other as shown in FIG. 2 by the piston rod of the cylinder C3, or vice versa, on the frame F. do.

According to such a structure, a chamber S that can be opened into two inner spaces S1 and S2 may be formed by the coupling and separating operation of the first chamber case C1 and the second chamber case C2. .

Therefore, when the chamber S is in the open state, the substrate G can be loaded or unloaded from the outside in a conventional manner, and the imprint operation can be performed when the chamber S is in the closed state.

The first chamber case C1 and the second chamber case C2 are not limited to the driving method using the cylinder C3. For example, although not shown in the drawings, the forward / reverse rotation of the transfer screw connected to the motor may be set to enable opening and closing operation by receiving power in a conventional manner.

The chamber part 2 is connected to the vacuum pump P in a tubular body, and is set so that the chamber S can be switched to an atmospheric pressure atmosphere or a vacuum pressure atmosphere when the vacuum pump P is pumped. That is, during the imprint operation, the chamber S is maintained in a vacuum atmosphere.

In addition, a normal seal member R (eg, a rubber ring) may be attached as shown in FIG. 1 along the openings of the first chamber case C1 and the second chamber case C2.

As such, when the seal member R is attached, when the first chamber case C1 and the second chamber case C2 are coupled to each other, the sealing gap may be maintained in a seal state between the coupling gaps thereof. Therefore, it is possible to prevent the phenomenon that the pressure is released through the coupling gap when the chamber (S) is switched to a vacuum atmosphere or atmospheric pressure atmosphere.

The chamber part 2 is not limited to the above structure. For example, although not shown in the drawings, the outer surface may be configured as a single case with an open portion, and the open surface may be configured to be opened and closed by a door in a conventional manner.

The vertical loading part 4 is provided inside the chamber part 2.

The vertical loading part 4 has a structure that can be detachably fixed (loaded) in a state in which the substrate G is upright inside the chamber part 2.

For example, the vertical loading portion 4 is composed of loading holders (H1, H2) to separably hold at least the upper and lower portions of the entire circumference of the substrate (G), as shown in FIG. The chamber (S) may be spaced apart up / down.

The two loading holders H1 and H2 may have fixing grooves J into which the edge portion of the substrate G is fitted, and may extend to correspond to the length of the upper or lower edge side of the substrate G. .

The material of the holder (H1, H2) for the loading is excellent in durability and wear resistance, and may be used in a synthetic resin that can minimize the occurrence of scratches in contact with the substrate (G).

Each of the loading holders H1 and H2 may be set to detachably hold the substrate G by the driving source H3 for loading.

The loading drive source H3 may use a cylinder as shown in FIG. 3, and the upper and lower edge portions of the substrate G facing the substrate G while moving the loading holders H1 and H2 up and down with a piston rod. It can be fixed or released.

The imprint apparatus according to the embodiment of the present invention may further include a rail unit 6.

The rail part 6 is provided to feed / draw the substrate G to / from the chamber part 2 while moving the vertical loading part 4.

That is, the rail unit 6 may include a transport rail L1 and a transport drive source L2 for moving the loading holders H1 and H2 along the transport rail L1. have.

The transport rail (L1) is composed of a pair of two to correspond to the two loading holders (H1, H2) based on Figure 4, extending in the left / right direction inside the chamber (2) It may be arranged to penetrate through.

The conveying rail L1 may use an “LM guide”, and the holders H1 and H2 for loading are fixed in a conventional manner to enable linear conveyance on the LM guide.

In addition, the transfer drive source L2 may use, for example, a transfer screw L2b connected to the shaft of the motor L2a as shown in FIG. 4, and the transfer screw L2b may be used for each of the loading holders. (H1, H2) is set to penetrate one side by screwing.

According to this structure, the respective loading holders H1 and H2 are moved in the left / right direction along the transfer rail L1 in the forward / reverse rotation of the transfer screw L2b as shown in FIG. 4. You can.

The transfer drive source L2 is not limited to the above-described structure, and the transfer holders H1 and H2 are transferred to the transfer holder in a conventional manner using a timing belt (or a chain) driven by a motor. It may be moved along the rail L1 section. Such a driving method can be easily implemented by those skilled in the art, and thus a detailed description thereof will be omitted.

As described above, when the transfer rail L1 and the transfer screw L2b are installed so as to correspond to the chamber part 2, the through gaps of the first and second chamber cases C1 and C2 are formed in the seal member. It can be kept in the seal state by (R).

The rail portion 6 having the above-described structure is fixed to the loading holders H1 and H2 while moving the loading holders H1 and H2 in the left / right directions along the transfer rail L1. The supplied substrate G can be easily supplied / drawn to / from the chamber S side of the chamber portion 2.

That is, based on FIG. 4, the substrate G on which the pattern forming chemical layer G1 is applied is moved to the right side from the left side of the transfer rail L1 to the imprint operation inside the chamber part 2. The substrate G, which is supplied as possible and has completed the imprint operation, may be moved out of the chamber part 2 while moving to the right along the rail L1.

In addition, the imprint apparatus according to the exemplary embodiment of the present invention may further include a double-side coating unit 8 as shown in FIG. 4.

The double-sided coating part 8 is for applying a pattern forming chemical layer G1 to the side of the substrate G so as to enable a double-sided imprint operation of the substrate G. FIG.

The double-sided coating part 8 may be disposed on the left side of the chamber part 2 on the rail part 6 based on FIG. 4, and fixed to the vertical loading part 4 in a standing state. Corresponding to both surfaces of (G), the chemical liquid layer G1 for pattern formation can be applied simultaneously.

That is, the double-sided coating part 8 may be composed of two coating nozzles N1 corresponding to one surface and the other surface of the substrate G as shown in FIG. 5.

Although not shown in the drawing, the coating nozzle N1 has a nozzle structure capable of applying the pattern forming chemical from the chemical storage tank and applying the same to the substrate G in a conventional manner.

In addition, the application nozzle N1 may be set to be movable in the up / down direction along the rail section by the application driving source N3 on the application rail N2 (eg, an LM guide) as shown in FIG. 5. Can be.

That is, the application nozzle N1 is moved up / down along the application rail N2 by receiving power by a normal method when the forward / reverse rotation of the transfer screw N3b connected to the motor N3a is performed. Is enabled.

According to such a structure, before supplying the said board | substrate G to the said chamber part 2 side, pattern formation is formed on both surfaces of the board | substrate G using the said double-sided coating part 8 on the said rail part 6. The chemical liquid layer G1 can be easily formed by a double-sided coating method.

Therefore, by further providing the double-sided coating unit 8 as described above, the automation of the process can be more easily realized when the series of imprint operations are performed, and the tack time can be greatly reduced.

Meanwhile, the imprint apparatus according to the embodiment of the present invention includes a double-sided imprint unit 10.

The double-sided imprint unit 10 is for forming a predetermined functional pattern G2 while pressing the pattern forming chemical layer G1 applied to one surface and the other surface of the substrate G in an imprint manner.

That is, the double-sided imprint unit 10 includes a first stamp M1 and a second stamp M2 disposed to correspond to one surface and the other surface of the substrate G.

The first and second stamps M1 and M2 may have an imprint surface F1 that may distinguish the functional pattern G2 from one surface, and the other surface may have a structure having a back plate F2 attached thereto.

The first and second stamps M1 and M2 may be formed of, for example, a transparent synthetic resin material (eg, POLY DIMETHYLSILOXANE) so that the imprint surface F1 has a flat plate type corresponding to the substrate G size. It can be molded by the method.

The back plate F2 is used to hold the soft first and second stamps M1 and M2 in a flat state, and any one of a transparent glass plate and a quartz plate may be used.

The first stamp M1 and the second stamp M2 are arranged to simultaneously imprint both surfaces of the substrate G inside the chamber 2.

That is, based on FIG. 1, the first stamp M1 is disposed such that the imprint surface F1 faces one surface of the substrate G, and the second stamp M2 is the imprint surface F1. ) May be disposed to correspond to the other surface of the substrate (G).

In particular, the manner in which the first and second stamps M1 and M2 are disposed in the vertical direction is, for example, compared with the conventional method of disposing in the horizontal direction. The phenomenon that the center portion sags downward due to its own weight can be suppressed.

Therefore, the first and second stamps M1 and M2 can be prevented from adhering to the substrate G in an abnormal state (sag state).

In addition, the imprint apparatus according to the embodiment of the present invention includes an imprint driver 12.

The imprint driver 12 is used to drive (transfer) the first and second stamps M1 and M2 in the chamber part 2 to enable a bonding / separating operation.

That is, the imprint driver 12 includes an imprint rail U1 in which the first and second stamps M1 and M2 are movable as shown in FIG. 1, and the imprint rail U1. It may be made to include a drive source (U2) for imprint to move the stamp (M1, M2) along.

The imprint rail U1 may use an “LM guide”, and may be disposed in the chamber part 2 to correspond to upper and lower portions of the first and second stamps M1 and M2, respectively.

The imprint rail U1 is disposed with the substrate G fixed therebetween standing up on the vertical loading part 4 side with reference to FIG. 6, and each loading of the vertical loading part 4. The holders H1 and H2 are fixed to inner surfaces of the first and second chamber cases C1 and C2 so that the holders H1 and H2 may be moved toward one surface and the other surface of the substrate G.

In addition, the first and second stamps M1 and M2 are fixed in a state in which the upper and lower portions are movable to the imprint rail U1 side by separate fixing brackets B1 as shown in FIG. 6. do.

The imprinting drive source U2 may use the cylinder U2a as shown in FIG. 6, and the stamps M1 and M2 along the imprint rail U1 with the pushing or pulling force of the piston rod U2b. ) Is set to move.

For example, the two imprint rails U1 corresponding to each of the stamps M1 and M2 are connected and fixed by a separate connecting bracket B2 as shown in FIG. 6, and one side of the connecting bracket B2 is fixed. And the end of the piston rod (U2b) of the cylinder (U2a) can be connected and fixed.

According to this structure, the substrate as shown in Figure 6 and 7 on the imprint rail (U1) while pushing or pulling the first stamp (M1) and the second stamp (M2) with the piston rod (U2b), respectively. Corresponding to both sides of (G), the two-sided imprint operation (bonding / disengaging) can be driven.

In particular, such a double-sided imprint method can ensure more improved workability when a process of forming a light guide pattern on both sides of a substrate by an imprint method, such as a light guide plate used for a backlight of an LCD, for example. .

The imprint drive source U2 is not limited to the above-described structure (cylinder). For example, although not shown in the drawings, the first stamp M1 and the second stamp M2 may be set to be imprinted in a conventional manner by using a transfer screw connected to a motor shaft.

The imprint apparatus according to the exemplary embodiment of the present invention may further include a curing unit 14 as shown in FIG. 8.

The curing means 14 is composed of a UV lamp (Q), a structure capable of curing the chemical liquid layer (G1) for pattern formation while irradiating the curing light source (Q1, for example ultraviolet rays) toward the substrate (G). Has

That is, the UV lamp Q has a light emitting area corresponding to one surface and the other surface of the substrate G, and based on FIG. 8, the UV lamp Q may be disposed on the left side and the right side with the chamber part 2 therebetween. Can be. In this case, the transparent transparent window Q2 corresponding to the U.V lamp Q is attached to the first and second chamber cases C1 and C2.

According to this structure, the substrate through the curing transparent window (L2) using the UV lamp (Q) in a state where the first and second stamps (M1, M2) are bonded to both sides of the substrate (G). Curing light source Q1 can be irradiated toward one surface and the other surface of (G).

Therefore, the predetermined functional pattern G2 patterned on the pattern forming chemical layer G1 of the substrate G can be easily cured by the U.V curing method.

In addition, the hardening means 14 is not limited to the above structure. For example, as shown in FIG. 9, the U.V lamp Q may move in an up / down direction and may be configured to be curable in a conventional scan method.

Accordingly, the imprint apparatus according to the exemplary embodiment of the present invention may easily form various functional patterns G2 on both sides of the substrate G (eg, a light guide plate manufacturing substrate) by a double-sided imprint method.

That is, as shown in FIG. 4, the substrate G is loaded on the vertical loading portion 4 side at one point (left side) of the transfer rail L1 of the rail portion 6.

Then, using the double-sided coating portion 8 to form a patterned chemical layer (G1) while simultaneously applying the chemical to one surface and the other surface of the substrate (G) as shown in FIG.

When the coating operation is completed as described above, the substrate G is supplied into the chamber S of the chamber part 2 by moving the vertical loading part 4 along the transfer rail L1.

At this time, the chamber part 2 forms the hermetically closed chamber S while the first and second chamber cases C1 and C2 are coupled to each other as shown in FIG. 6, and in a atmospheric pressure atmosphere by a vacuum pump P. Switch to vacuum atmosphere.

In this chamber part 2, both surfaces of the substrate G are imprinted simultaneously using the first and second stamps M1 and M2 of the double-sided imprint part 10.

That is, the first and second stamps M1 and M2 are moved to both one surface and the other surface of the substrate G with the substrate G interposed therebetween, as shown in FIG. 7. Try to join at the same time.

Then, predetermined functional patterns G2 corresponding to the imprint surface F1 of the first and second stamps 4 are applied to the pattern forming chemical layer G1 applied to both surfaces of the substrate G. FIG. Is patterned.

Then, in the state in which the substrate G and the first and second stamps M1 and M2 are bonded as described above, the curing operation is performed using the curing means 14 as shown in FIG. 8 or 9.

That is, the curing light source Q1 is irradiated toward the one surface and the other surface of the substrate G with the U.V lamp Q. Then, the functional patterns G2 patterned on both sides of the substrate G are cured.

As such, when the curing operation is completed, the bonding state of the substrate G and the first and second stamps M1 and M2 is separated, and then the first and second chamber cases C1, The chamber S is opened by separating C2).

In addition, when the chamber S is opened, the vertical loading part 4 is directed toward the right side of the chamber part 2 along the transfer rail L1 of the rail part 6 when referring to FIG. 4. The substrate G may be taken out while moving.

Therefore, the two-sided imprint operation corresponding to both sides of the substrate G can be easily carried out through such processes (application, bonding, curing, separation).

Although not shown in the drawings, the two-sided imprint operation may be continuously performed while sequentially supplying and transferring the substrate G onto the rail portion 6 as described above.

In particular, such a double-sided imprint operation method can not only shorten the process when performing the process of forming the light guide pattern on each side of the light guide plate manufacturing substrate, but also greatly improve the work time by greatly reducing the tack time. Can provide sex.

The imprint apparatus according to the embodiment of the present invention is not limited to a double-sided imprint job. In addition, any one surface of both surfaces of the board | substrate G can also be patterned by a cross-sectional imprint system.

That is, as shown in FIG. 10, the functional pattern G2 may be formed while pressing the pattern forming chemical layer G1 on one surface of the substrate G using only the first stamp M1 or the second stamp. According to this working method, for example, a patterning operation for dividing the etched and non-etched regions on one surface of the substrate G may be easily performed.

1 is a view schematically showing the overall structure of an imprint apparatus according to an embodiment of the present invention.

2 is a view for explaining the detailed structure and operation of the chamber portion of the imprint apparatus according to an embodiment of the present invention.

3 is a view for explaining the detailed structure and operation of the vertical loading unit of the imprint apparatus according to an embodiment of the present invention.

4 is a view for explaining the detailed structure and operation of the rail unit of the imprint apparatus according to an embodiment of the present invention.

5 is a view for explaining the detailed structure and operation of the double-side coating portion of the imprint apparatus according to an embodiment of the present invention.

6 and 7 are views for explaining the detailed structure and operation of the imprint driving unit of the imprint apparatus according to an embodiment of the present invention.

8 is a view for explaining the detailed structure and operation of the curing means of the imprint apparatus according to an embodiment of the present invention.

9 is a view for explaining another structure of the curing means of FIG.

10 is a view for explaining another operation example of the imprint apparatus according to an embodiment of the present invention.

[Description of Symbols for Main Parts of Drawing]

2: chamber portion 4: vertical loading portion 6: rail portion

8: Double-sided application portion 10: Double-sided imprint portion 12: Imprinting drive portion

14: curing means G: substrate

Claims (8)

A chamber unit providing a chamber of a predetermined size; A vertical loading unit loading the substrate in such a state that the substrate is placed in an upright position; A double-sided imprint unit including a first stamp and a second stamp for imprinting one surface and the other surface of the substrate in the vertical loading unit; An imprint driver for driving the first stamp and the second stamp to enable an imprint operation; Imprint apparatus comprising a. The method according to claim 1, The vertical loading unit, A plurality of loading holders provided for loading in a standing state while detachably fixing the edges of the substrate; A loading driving source provided to be driven in a fixed state or a fixed release state while moving the plurality of loading holders; Imprint apparatus comprising a. The method according to claim 2, The plurality of loading holders, An imprint disposed so as to correspond to at least the edge portion facing out of the entire edge portion of the erected substrate, and set to fix the substrate in an upright state or to release the fixed state while being moved back and forth toward the edge portion of the substrate by the loading driving source. Device. The method according to claim 1, The first stamp and the second stamp, And an imprint surface, and spaced apart from each other so as to imprint one surface and the other surface of the substrate from the inside of the chamber to the imprint surface. The method according to claim 1, The imprint drive unit, An imprint rail providing a transfer section through which the first stamp and the second stamp can be moved forward and backward toward one side and the other side of the substrate; An imprint drive source for moving the first stamp and the second stamp along the imprint rail; Imprint apparatus comprising a. The method according to claim 1, The imprint apparatus, Further comprising a rail portion, The rail unit, A transfer rail disposed in a direction penetrating the inside of the chamber part; A transport drive source for moving the vertical loading part along the transport rail; Imprint apparatus comprising a. The method according to claim 6, The drive source for the transfer, And an imprint apparatus set to enable driving / feeding of a substrate to / from the chamber portion while moving the vertical loading portion along the transfer rail. The method according to claim 1, The imprint apparatus, Further comprising hardening means, The curing means, Consists of a U.V lamp, The U.V lamp, Imprint apparatus is set to irradiate the curing light source toward one surface and the other surface of the substrate located inside the chamber portion.

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