KR20100118556A - Liquid crystal display and thin film transistor panel thereof - Google Patents

Abstract

The thin film transistor array panel according to the exemplary embodiment of the present invention is formed on an insulating substrate, a gate line extending in a first direction, a gate line extending in a first direction, and a sustain electrode line extending in a first direction, and formed on an insulating substrate. A data line having an insulated intersection with the gate line and having a bent portion and a portion extending in a second direction, the pixel electrode connected to the thin film transistor and including a cutoff portion separated into a plurality of digestive electrode electrodes, wherein the storage electrode line is cut The storage electrode further includes a storage electrode positioned at the portion and wider than the width of the cutout, and the pixel electrode and the storage electrode include a boundary line curved along the data line.

Description

Liquid crystal display device and its thin-film transistor display panel {LIQUID CRYSTAL DISPLAY AND THIN FILM TRANSISTOR PANEL THEREOF}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device and a thin film transistor display panel thereof, and more particularly, to a liquid crystal display device having a vertical alignment method for dividing a pixel into a plurality of domains to obtain a wide viewing angle, and a thin film transistor display panel thereof.

In general, a liquid crystal display device injects a liquid crystal material between an upper display panel on which a common electrode, a color filter, and the like are formed, and a lower display panel on which a thin film transistor and a pixel electrode are formed. By applying a different potential to form an electric field to change the arrangement of the liquid crystal molecules, and through this to control the light transmittance is a device that represents the image.

However, it is an important disadvantage that the liquid crystal display device has a narrow viewing angle. In order to overcome these disadvantages, various methods for widening the viewing angle have been developed. Among them, liquid crystal molecules are oriented vertically with respect to the upper and lower substrates, and a method of forming a constant incision pattern or protrusion on the pixel electrode and the common electrode opposite thereto is performed. This is becoming potent.

However, in the method of forming the protrusions or the incision pattern, the opening ratio is lowered due to the protrusions or the incision pattern portion. In order to compensate for this, an ultra-high-aperture structure that forms the pixel electrode as wide as possible has been devised. However, since the distance between adjacent pixel electrodes is very close, a lateral field formed between the pixel electrodes is strongly formed. Accordingly, the liquid crystals positioned at the edges of the pixel electrodes are affected by the lateral electric field, and thus the alignment is disturbed, resulting in texture or light leakage, thereby degrading display characteristics.

In general, when the active area of the panel for the liquid crystal display device is larger than the mask size, the active area is divided to perform a step and repeat process in order to form a pattern in the active area. Exposure is necessary. In this case, the actual shot may cause distortion such as shift, rotation, and distortion of the mask, so that the shots are not aligned correctly, and thus the parasitic capacitance difference between each wiring and the pixel electrode between the shots is different. Or a pattern position difference occurs. Since the difference in parasitic capacitance and the difference in pattern position cause differences in electrical characteristics and aperture ratios of the regions, respectively, the difference in screen brightness at the boundary between shots results in a stitch failure.

SUMMARY OF THE INVENTION The present invention has been made in an effort to provide a liquid crystal display device and a thin film transistor display panel thereof that form a stable multiple domain while securing an aperture ratio.

Another object of the present invention is to provide a liquid crystal display device and a thin film transistor display panel thereof capable of minimizing stitch defects.

In order to solve this problem, the present invention provides the following thin film transistor array panel and liquid crystal display device.

The thin film transistor array panel according to the exemplary embodiment of the present invention is formed on an insulating substrate, a gate line extending in a first direction, a gate line extending in a first direction, and a sustain electrode line extending in a first direction, and formed on an insulating substrate. A data line having an insulated intersection with the gate line and having a bent portion and a portion extending in a second direction, the pixel electrode connected to the thin film transistor and including a cutoff portion separated into a plurality of digestive electrode electrodes, wherein the storage electrode line is cut The storage electrode further includes a storage electrode positioned at the portion and wider than the width of the cutout, and the pixel electrode and the storage electrode include a boundary line curved along the data line.

The curved portion of the data line may include a first portion that forms a 45 degree angle with the gate line and a second portion that forms a −45 degree angle with the gate line.

The drain electrode of the thin film transistor may overlap the sustain electrode.

The first and second pixel electrodes may be connected to each other through a connection part.

The color filter further includes a color filter formed on the insulating substrate, wherein the red, green, and blue color filters are formed long along the pixel columns separated by the data lines, and the red, green, and blue colors appear repeatedly. Can be.

The cutout may have a boundary line parallel to the curved portion of the data line.

According to another aspect of the present invention, a liquid crystal display according to the present invention is formed on at least one of a common electrode display panel, a pixel electrode, or a common electrode facing the thin film transistor array panel of claim 1 and including a common electrode. And a liquid crystal layer positioned between the thin film transistor array panel and the common electrode display panel, wherein the domain division means has a curved portion along the curved portion of the data line.

As described above, when the data line is refracted to form a pixel in the shape of a band, a lateral electric field between adjacent pixels acts in a direction to help the formation of the domain so that the domain is stably formed and the sustain electrode line to which the common voltage is applied is formed. The aperture ratio of the pixel may be maximized by placing the overlapping portion of the electrode to strengthen the fringe field. In addition, by dividing the pixel into two subpixels and arranging the subpixels on both sides of the data line, variations in parasitic capacitance between the data line and the pixel electrode may occur even if distortion, such as transition, rotation, or distortion, of the mask occurs during the manufacturing process. Can be minimized to prevent a difference in screen brightness.

1 is a layout view of a liquid crystal display including a thin film transistor array panel according to a first exemplary embodiment of the present invention.
FIG. 2 is a cross-sectional view taken along the line II-II 'of the liquid crystal display of FIG. 1.
3 is a layout view of a liquid crystal display including a thin film transistor array panel according to a second exemplary embodiment of the present invention.
FIG. 4 is a cross-sectional view taken along the line IV-IV 'of the liquid crystal display of FIG. 3.
5 is a layout view of a liquid crystal display including a thin film transistor array panel according to a third exemplary embodiment of the present invention.
6 is a cross-sectional view taken along the line VI-VI 'of the liquid crystal display of FIG. 5.

DETAILED DESCRIPTION Embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art may easily implement the present invention. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein.

In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. Like parts are designated by like reference numerals throughout the specification. When a part of a layer, film, region, plate, etc. is said to be "on" another part, this includes not only the other part being "right over" but also another part in the middle. On the contrary, when a part is "just above" another part, there is no other part in the middle.

Next, a multi-domain liquid crystal display according to an exemplary embodiment of the present invention and a thin film transistor array panel thereof will be described with reference to the drawings.

1 is a layout view of a liquid crystal display including a thin film transistor array panel according to a first exemplary embodiment of the present invention, and FIG. 2 is a cross-sectional view of the liquid crystal display of FIG. 1 taken along the line II-II ′.

In the liquid crystal display according to the first exemplary embodiment of the present invention, the thin film transistor array panel 100, the common electrode panel 200 facing each other, and the long axis of the liquid crystal molecules contained therebetween are injected between the two display panels. It consists of a liquid crystal layer 300 oriented perpendicular to the.

First, a thin film transistor array panel according to a first exemplary embodiment of the present invention will be described in more detail with reference to FIGS. 1 and 2.

The gate line 121 is formed on the insulating substrate 110 in the horizontal direction, and the gate electrode 123 includes the first and second gate electrodes 123a and 123b formed in the form of protrusions on the gate line 121. Is connected. One end portion 125 of the gate line 121 is extended in width for connection with an external circuit.

The storage electrode line 131 and the first and second storage electrodes 133a and 133b are formed on the insulating substrate 110. The storage electrode line 131 extends in the horizontal direction and the first and second storage electrodes 133a and 133b are connected to the storage electrode line 131 in a rhombic or rectangular shape, and each of the first and second gate electrodes 123a, It is arrange | positioned adjacent to 123b).

The gate lines 121, 123a, 123b and 125 and the sustain electrode lines 131, 133a and 133b are formed of a first layer made of Cr or Mo alloy having excellent physicochemical properties, Al or Ag having low resistance, or an alloy thereof. It may be composed of a double layer of the second layer made of, and may be made of a single layer or triple layer or more if necessary.

The gate insulating layer 140 is formed on the gate lines 121, 123a, 123b, and 125 and the storage electrode lines 131, 133a, and 133b.

A semiconductor layer 150 made of a semiconductor such as amorphous silicon is formed on the gate insulating layer 140 of the first and second gate electrodes 123a and 123b. The semiconductor layer 150 includes a channel portion that forms a channel of the thin film transistor, and the channel portion includes a first channel portion disposed on the first gate electrode 123a and a second channel disposed on the second gate electrode 123b. Contains wealth. In this case, the semiconductor layer 150 may include a data line part positioned below the data line 171 to be formed later, which will be described in the second embodiment.

An ohmic contact layer made of a material such as n + hydrogenated amorphous silicon in which silicide or n-type impurities are heavily doped is formed on the semiconductor layer 150. The ohmic contact layer includes a source resistive member 163 and a source resistive member 163 located at the center of the upper portion of the first and second gate electrodes 123a and 123b and the first and second gate electrodes 123a and 123b. 163 and the first and second drain portion resistive members 165a and 165b respectively facing each other.

The data line 171 and the first and second drain electrodes 175a and 175b are formed on the ohmic contacts 163, 165a and 165b and the gate insulating layer 140. The data line 171 extends long and crosses the gate line 121, and has a source electrode 173 connected to the data line 171 and extending to an upper portion of the source resistive member 163. The first and second drain electrodes 175a and 175b are separated from the source electrode 173 and the first and second drain portions opposite to the source electrode 173 with respect to the first and second gate electrodes 123a and 123b. The resistive members 165a and 165b are positioned on the upper side, respectively. One end 179 of the data line 171 is extended in width to connect to an external circuit.

Here, the data line 171 has a portion that is repeatedly curved and a portion that extends vertically with a length of the pixel. At this time, the curved portion of the data line 171 consists of two straight portions, one of the two straight portions forms 45 degrees with respect to the gate line 121, and the other portion is formed on the gate line 121. To -45 degrees. The source electrode 173 is connected to a vertically extending portion of the data line 171, and the portion crosses the gate line 121.

At this time, the ratio of the lengths of the bent portion and the vertically extending portion of the data line 171 is between 1: 1 and 9: 1 (that is, the ratio of the bent portion of the data line 171 is between 50% and 90%). )to be.

Accordingly, the pixel formed by the intersection of the gate line 121 and the data line 171 has a curved band shape, and is divided into two subpixels Pa and Pb around the data line 171.

In addition, the portions of the first and second drain electrodes 175a and 175b which are connected to the first and second pixel electrodes 191a and 192b are widened in a rectangular shape so as to overlap the first and second storage electrodes 133. Doing. As described above, the first and second drain electrodes 175a and 175b overlap the first and second storage electrodes 133a and 133b with only the gate insulating layer 140 interposed therebetween to more effectively form the storage capacitor.

A passivation layer 180 made of an organic insulating layer is formed on the data line 171 and the drain electrode 175. The passivation layer 180 is formed by exposing and developing the photosensitive organic material. If necessary, the passivation layer 180 may be formed by applying a photosensitive organic material and performing a photolithography process, but the forming process is more complicated than forming the passivation layer 180 using the photosensitive organic material.

Meanwhile, an insulating film made of silicon nitride or silicon oxide may be added below the passivation layer 180 to cover the semiconductor 150 that is not covered by the data line 171 and the first and second drain electrodes 175a and 175b. Can be.

In the passivation layer 180, contact holes 185a and 185b exposing the first and second drain electrodes 175a and 175b and contact holes 189 exposing the end portion 179 of which the width of the data line is extended are formed. . In addition, the contact hole 182 exposing the end portion 125 where the width of the gate line is extended is formed through the gate insulating layer 140 together with the passivation layer 180.

At this time, the sidewalls of the contact holes 185a, 185b, 182, and 189 have a gentle inclination between 30 degrees and 85 degrees with respect to the surface of the substrate 110, or have a stepped profile.

In addition, these contact holes (185a, 185b, 182, 189) may be formed in a variety of angles or circular shape, the area is not more than 2mm x 60㎛, preferably 0.5mm x 15㎛ or more.

Meanwhile, the passivation layer 180 may be formed of an inorganic insulating material such as silicon nitride or silicon oxide.

On the passivation layer 180, the first and second pixel electrodes 191a and 191b are connected to the first and second drain electrodes 175a and 175b through the contact holes 185a and 185b and are bent along the shape of the pixel. ) Is formed. In this case, the first and second pixel electrodes 191a and 191b are formed so that their edges overlap with the data line 171 to secure the maximum aperture ratio, and the first and second pixel electrodes 191a and 191b are provided. ) Are connected to each other through a connection unit 192.

In addition, contact protection members 192 and 199 are formed on the passivation layer 180 and are connected to the end portion 125 of the gate line and the end portion 179 of the data line through the contact holes 182 and 189, respectively. The pixel electrodes 191a and 191b and the contact auxiliary members 192 and 199 are made of indium tin oxide (ITO) or indium zinc oxide (IZO).

A common electrode display panel will now be described with reference to FIGS. 1 and 2.

On the lower surface of the upper substrate 210 made of a transparent insulating material such as glass, a black matrix 220 and red, green, and blue color filters 230 are sequentially formed to prevent light leakage. ), An overcoat layer 250 made of an organic material is formed. A common electrode 270 made of a transparent conductive material such as ITO or IZO is formed on the overcoat layer 250, and a protrusion 240 made of an organic material is formed on the common electrode 270.

At this time, the projections 240 act as domain regulating means, and the width thereof is preferably between 5 µm and 10 µm. If the cutout is formed instead of the protrusion 240 in the common electrode 270 to form the fringe field by the domain regulating means, the width of the cutout is preferably 9 μm to 12 μm.

The black matrix 220 may include a linear portion corresponding to the curved portion of the data line 171, a vertically extending portion of the data line 171, and a portion corresponding to the thin film transistor portion.

The red, green, and blue color filters 230 are vertically elongated along the pixel columns partitioned by the black matrix 220, and periodically bent along the shape of the pixels.

The protrusions 240 are also bent to form a shape that bisects the curved subpixels from side to side, and the ends of the protrusions 240 may have various shapes.

In the thin film transistor array panel 100 and the common electrode panel 200 according to the exemplary embodiment of the present invention, the alignment layers 13 and 23 are formed on the surfaces facing each other. In this case, each of the alignment layers 13 and 23 may or may not be a vertical alignment layer that orients the liquid crystal molecules perpendicularly to the substrate surface.

When the liquid crystal layer 300 is formed by combining the thin film transistor array panel 100 and the common electrode panel 200 having the above structure and injecting liquid crystal therebetween, the liquid crystal display according to the first exemplary embodiment of the present invention The panel is made.

The liquid crystal molecules included in the liquid crystal layer 300 have directors with respect to the lower substrate 110 and the upper substrate 210 when no electric field is applied between the pixel electrodes 191a and 191b and the common electrode 270. It is oriented perpendicularly and has negative dielectric anisotropy.

The lower substrate 110 and the upper substrate 210 are aligned such that the first and second pixel electrodes 191a and 191b accurately overlap with the color filter 230. In this way, the liquid crystal molecules 310 of the pixel are vertically oriented with respect to the inclined plane of the protrusion 240 formed by the protrusion 240, and are dividedly oriented into a plurality of domains. At this time, the subpixels are divided into left and right sides by the protrusions 240, and are divided into four types of domains in which the alignment directions of the liquid crystals are different from each other in the upper and lower directions with respect to the bent portion of the subpixel.

Although the color filter 230 is disposed on the common electrode panel 200 in the structure of the liquid crystal display device, the color filter 230 may be disposed on the thin film transistor array panel 100. In this case, the gate insulating layer 140 or the passivation layer 180 may be disposed. It may be formed at the bottom.

The liquid crystal display is formed by disposing elements such as a polarizer, a backlight, and a compensation plate on both sides of the basic panel. In this case, one polarizer is disposed on each side of the base panel, and the transmission axis thereof is disposed so that one of the two is parallel to the gate line 121 and the other is perpendicular to the gate line 121.

When the liquid crystal display device is formed as described above, when an electric field is applied to the liquid crystal, the liquid crystal in each domain is inclined in a direction perpendicular to the long side of the domain. However, since the direction is perpendicular to the data line 171, the liquid crystal is inclined by the lateral electric field formed between two adjacent pixel electrodes 191a and 191b with the data line 171 therebetween. As a match, the lateral electric field assists the liquid crystal alignment of each domain.

Since the liquid crystal display generally uses inversion driving methods such as point inversion driving, thermal inversion driving, and two-point inversion driving, which apply voltages having opposite polarities to pixel electrodes positioned on both sides of the data line 171, the lateral electric field is Almost always occurs and the direction is the direction that helps the liquid crystal alignment of the domain.

In addition, since the transmission axis of the polarizing plate is disposed in a direction perpendicular to or parallel to the gate line 121, the polarizing plate can be manufactured at low cost, and the alignment direction of the liquid crystal is 45 degrees with the transmission axis of the polarizing plate in all domains, thereby obtaining the highest luminance. Can be.

However, since the length of the wiring increases because the data line 171 is bent, the length of the wiring increases by about 20% when the bent portion of the data line 171 occupies 50%. When the length of the data line 171 increases, the resistance and the load of the wiring increase, thereby increasing the signal distortion. However, in the ultra-high opening ratio structure, the width of the data line 171 can be formed sufficiently wide, and since the thick organic protective film 180 is used, the load of the wiring is also small enough so that the signal distortion problem caused by the increase in the length of the data line 171 can be ignored. Can be.

In the liquid crystal display device having such a structure, a method of manufacturing a thin film transistor array panel will be briefly described.

First, a metal layer made of Cr or Mo alloy or the like or a metal layer made of Al or Ag alloy having low resistance is successively laminated by a sputtering method, and then dry or wet etched by the first photolithography process using a mask to form a gate line 121. ) And sustain electrode line 131 are formed.

Next, the gate insulating layer 140, the hydrogenated amorphous silicon layer, and the amorphous silicon layer doped with a high concentration of n-type impurities such as phosphorus (P) are respectively 1,500 kPa to 5,000 kPa, 500 kPa to 2,000 kPa using chemical vapor deposition. , The resistive contact layer and the amorphous silicon layer 150 to which the channel part is connected are formed by successively depositing a thickness of 300 600 to 600 Å and patterning the doped amorphous silicon layer and the amorphous silicon layer in a photolithography process using a mask. do.

Subsequently, a conductor layer such as a first metal layer made of Cr or Mo alloy or the like or a second metal layer made of Al or Ag alloy having low resistance is deposited by a sputtering method to a thickness of 1,500 kPa to 3,000 kPa, and then using a mask. The data line 171 and the first and second drain electrodes 175a and 175b are formed by patterning by a photolithography process.

Subsequently, the ohmic contact layer that is not covered by the data line 171 and the first and second drain electrodes 175a and 17b is etched to form a gap between the source electrode 173 and the first and second drain electrodes 175a and 175b. The semiconductor layer 150 is exposed to form ohmic contacts 163, 165a and 165b that are separated on both sides.

Subsequently, the passivation layer 180 is formed by applying a photosensitive organic insulating material, and the passivation layer 180 is patterned together with the gate insulating layer 140 to form contact holes 185a, 185b, 182, and 189.

Next, as shown in FIGS. 1 and 2, ITO or IZO is deposited to 400 500 to 500 Å thickness and photo-etched to form the first and second pixel electrodes 191a and 191b and the contact auxiliary members 192 and 199. Form.

In the structure of the thin film transistor array panel according to the exemplary embodiment of the present invention, the subpixels Pa and Pb are arranged around the data line 171, so that the mask may be shifted and rotated in the photolithography process using the mask. Even if distortion, such as rotation and distortion, occurs, the first and second pixel electrodes 191a and 191b are positioned on both sides of the data line 171 to compensate for each other. The variation in parasitic capacitance can be minimized, and the difference in screen brightness can be prevented from occurring at the boundary between shots, thereby eliminating stitch defects.

Such a method is a manufacturing method using five masks, but a thin film transistor array panel for a liquid crystal display device according to the present invention can also be manufactured using four masks. In this manufacturing method, the data line 171, the drain electrodes 175a and 175b, and the semiconductor layer are formed by a photolithography process using one photoresist pattern, and the photoresist pattern has a portion corresponding to the channel portion with another data line and drain. It has a thickness lower than that corresponding to the electrode.

3 is a layout view of a liquid crystal display according to a second exemplary embodiment of the present invention, and FIG. 4 is a cross-sectional view of the liquid crystal display of FIG. 4 taken along the line IV-IV ′.

The thin film transistor array panel for a liquid crystal display according to the second exemplary embodiment is manufactured by a four-sheet mask process, and has the following characteristics as compared with the thin film transistor array panel manufactured by a five-sheet mask process.

The contact layers 163, 165a, and 165b are formed under the data line 171 and the first and second drain electrodes 175a and 175b in the substantially same pattern, and the source electrode 173 and the first and second electrodes are formed. The amorphous silicon layer 152 also has substantially the same pattern as the data line and the drain electrode except that the channel portion between the two drain electrodes 175a and 175b is connected.

Meanwhile, in the thin film transistor array panel according to the second exemplary embodiment, the first and second pixel electrodes 191a and 191b are separated from each other.

In the first and second embodiments, the color filter is formed on the common electrode display panel. Alternatively, the color filter may be formed on the thin film transistor substrate. This structure will be described as a third embodiment.

FIG. 5 is a layout view of a liquid crystal display according to a third exemplary embodiment of the present invention, and FIG. 6 is a cross-sectional view of the liquid crystal display of FIG. 5 taken along the line VI-VI ′.

First, the thin film transistor array panel will be described in detail.

Unlike the first and second embodiments, subpixels Pa and Pb are disposed on one side of the data line 171, and the first and second pixel electrodes 191a and 191b of the subpixel are connected to each other. It is connected to one drain electrode 185 through one contact hole 185.

In addition, the storage electrode line 131 formed on the insulating substrate 110 includes not only the storage electrode 133 but also the storage electrode line connection part 134. In this case, the storage electrode line connection part 134 extends along a curved band of the pixel formed by the gate line 121 and the data line 171 crossing each other, and is positioned between the first and second pixel electrodes 191a and 191b. It overlaps with the edge part of these.

Red, green, and blue color filters 230 are formed on the gate insulating layer 140 on which the data line 171 and the drain electrode 175 are formed. The color filters 230 are formed to be vertically elongated along the pixel columns defined by the data lines 171, and are periodically bent along the shape of the pixels. In addition, in the color filter 230, neighboring color filters 230 may partially overlap each other on the data line 171.

A passivation layer 180 made of a photosensitive organic material or an inorganic material such as silicon nitride or silicon oxide is formed on the color filter 230.

Meanwhile, an insulating layer made of silicon nitride may be provided under the color filter 230 to cover the semiconductor layer 150.

In the thin film transistor array panel for the liquid crystal display according to the third exemplary embodiment of the present invention, not only the vertical alignment mode but also the liquid crystal molecules are arranged in parallel to the substrate, and spirally from the lower substrate 110 to the upper substrate 210. It can also be applied to twisted nematic methods that are twisted sequentially. In this case, a cutout formed between the protrusion 240 and the first and second pixel electrodes 191a and 191b is also used as the domain dividing means.

When the electric field is applied to the liquid crystal in the liquid crystal display device as described above, the liquid crystal molecules adjacent to the thin film transistor array panel and positioned at the edge of the subpixel among the liquid crystal molecules in each domain are the first and second pixel electrodes 191a and 191b. Orientation is divided by the fringe field formed at the edge of. In this case, the storage electrode line connecting portion 134 is disposed below the first pixel electrode 191a and the second pixel electrode 191b, and the common voltage applied to the common electrode 270 is applied to the storage electrode line connecting portion 134. The transferred and strengthened fringe fields formed at edges of the first and second pixel electrodes 191a and 191b. In general, the interval between the first pixel electrode 191a and the second pixel electrode 191b, which is the width of the cutout, is preferably 10 μm or more in order to stably control the liquid crystal molecules by using a fringe field. By arranging the storage electrode line connecting portion 134 between the pixel electrode 191a and the second pixel electrode 191b to strengthen the fringe field, the distance between the first pixel electrode 191a and the second pixel electrode 191b is 5 μm. Can be reduced to a degree. Therefore, the aperture ratio of the pixel can be maximized.

Although the above has been described with reference to preferred embodiments of the present invention, those skilled in the art will be able to variously modify and change the present invention without departing from the spirit and scope of the invention as set forth in the claims below. It will be appreciated.

11: alignment film 110: insulating substrate
111: blocking film 121: gate line
131: sustain electrode line 133: sustain electrode
137: sustain electrode region 140: gate insulating film
150: semiconductor layer 152: low concentration doped region
153: source region 154: channel region
155: drain region 161: first contact hole
162: second contact hole 171: data line
173: source electrode 175: drain electrode
190: pixel electrode 601: first interlayer insulating film
602: second interlayer insulating film

Claims (7)

Insulation board,
A gate line formed on the insulating substrate and extending in a first direction,
A storage electrode line formed on the insulating substrate and extending in a first direction,
A data line formed on the insulating substrate and insulated from and intersecting with the gate line and having a curved portion and a portion extending in a second direction;
A pixel electrode connected to the thin film transistor and including a cutoff portion that is separated into a plurality of digestive electrode electrodes
Including,
The storage electrode line may further include a storage electrode positioned in the cutout and wider than the width of the cutout.
The pixel electrode and the sustain electrode have a boundary line bent along the data line.
Thin film transistor array panel comprising. In claim 1,
The curved portion of the data line includes a first portion that is 45 degrees with the gate line and a second portion that is -45 degrees with the gate line. In claim 1,
The thin film transistor array panel of which the drain electrode of the thin film transistor overlaps the sustain electrode. In claim 1,
The first and second pixel electrodes are connected to each other through a connection part. In claim 1,
Further comprising a color filter formed on the insulating substrate,
The color filter is a thin film transistor array panel in which red, green, and blue color filters are formed long along the pixel columns separated by the data lines, and red, green, and blue colors repeatedly appear. In claim 1,
And the cutout portion has a boundary line parallel to the bent portion of the data line. The thin film transistor array panel of claim 1,
A common electrode panel facing the thin film transistor array panel and including a common electrode;
Domain dividing means formed on at least one of the pixel electrode and the common electrode,
A liquid crystal layer disposed between the thin film transistor array panel and the common electrode display panel
Including,
And the domain dividing means has a bent portion along a bent portion of the data line.

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