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KR910017913A - 금속 인쇄된 세라믹 팩키지의 제조방법 - Google Patents

금속 인쇄된 세라믹 팩키지의 제조방법 Download PDF

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Publication number
KR910017913A
KR910017913A KR1019900004318A KR900004318A KR910017913A KR 910017913 A KR910017913 A KR 910017913A KR 1019900004318 A KR1019900004318 A KR 1019900004318A KR 900004318 A KR900004318 A KR 900004318A KR 910017913 A KR910017913 A KR 910017913A
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KR
South Korea
Prior art keywords
metal
manufacturing
ceramic package
printed
printed ceramic
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Application number
KR1019900004318A
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English (en)
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KR920002589B1 (ko
Inventor
정태영
Original Assignee
한형수
삼성코닝 주식회사
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Publication date
Application filed by 한형수, 삼성코닝 주식회사 filed Critical 한형수
Priority to KR1019900004318A priority Critical patent/KR920002589B1/ko
Priority to US07/553,634 priority patent/US5114642A/en
Priority to JP2224119A priority patent/JPH03283452A/ja
Publication of KR910017913A publication Critical patent/KR910017913A/ko
Application granted granted Critical
Publication of KR920002589B1 publication Critical patent/KR920002589B1/ko
Expired legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/51Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
    • C04B41/5133Metallising, e.g. infiltration of sintered ceramic preforms with molten metal with a composition mainly composed of one or more of the refractory metals
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81Coating or impregnation
    • C04B41/85Coating or impregnation with inorganic materials
    • C04B41/88Metals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
    • H01L21/4814Conductive parts
    • H01L21/4846Leads on or in insulating or insulated substrates, e.g. metallisation
    • H01L21/4867Applying pastes or inks, e.g. screen printing
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2111/00Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
    • C04B2111/00474Uses not provided for elsewhere in C04B2111/00
    • C04B2111/00844Uses not provided for elsewhere in C04B2111/00 for electronic applications

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Powder Metallurgy (AREA)

Abstract

내용 없음

Description

금속 인쇄된 세라믹 팩키지의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도는 세라믹 패키지의 소결온도에 따른 표면저항의 변화를 나타낸 그래프.

Claims (5)

  1. 세라믹 그린시트상에 금속 인쇄하여 세라믹과 동시 소성으로 금속 인쇄된 세라믹 패키지를 제조하는데 있어서, 미세한 금속 분말과 굵은 금속 분말의 혼합 분말을 산소분압 및 이슬점을 조절하면서 예비열처리함으로써 페이스트화하여 인쇄한 후 세라믹과 동시 소성하는 것을 특징으로 하는 금속 인쇄된 세라믹 팩키지의 제조방법.
  2. 제1항에 있어서, 상기 미세한 금속분말의 입경이 0.5~1.5㎛이고 상기 굵은 금속 분말의 입경이 2~5㎛인 것을 특징으로 하는 금속 인쇄 세라믹 팩키지의 제조방법.
  3. 제1항에 있어서, 상기 산소의 분압 조절범위가 10-9~10-50atm인 것을 특징으로 하는 금속 인쇄 세라믹 팩키지의 제조방법.
  4. 제1항에 있어서, 상기 예비열처리 온도범위가 100℃~1400℃인 것을 특징으로 하는 금속 인쇄 세라믹 팩키지의 제조방법.
  5. 제4항에 있어서, 상기 예비열처리 온도가 약 800℃인 것을 특징으로 하는 금속 인쇄 세라믹 팩키지의 제조방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900004318A 1990-03-30 1990-03-30 금속 인쇄된 세라믹 팩키지의 제조방법 Expired KR920002589B1 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1019900004318A KR920002589B1 (ko) 1990-03-30 1990-03-30 금속 인쇄된 세라믹 팩키지의 제조방법
US07/553,634 US5114642A (en) 1990-03-30 1990-07-18 Process for producing a metal-screened ceramic package
JP2224119A JPH03283452A (ja) 1990-03-30 1990-08-24 金属印刷を施したセラミックパッケージの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019900004318A KR920002589B1 (ko) 1990-03-30 1990-03-30 금속 인쇄된 세라믹 팩키지의 제조방법

Publications (2)

Publication Number Publication Date
KR910017913A true KR910017913A (ko) 1991-11-05
KR920002589B1 KR920002589B1 (ko) 1992-03-30

Family

ID=19297507

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900004318A Expired KR920002589B1 (ko) 1990-03-30 1990-03-30 금속 인쇄된 세라믹 팩키지의 제조방법

Country Status (3)

Country Link
US (1) US5114642A (ko)
JP (1) JPH03283452A (ko)
KR (1) KR920002589B1 (ko)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5753972A (en) * 1993-10-08 1998-05-19 Stratedge Corporation Microelectronics package
US5736783A (en) * 1993-10-08 1998-04-07 Stratedge Corporation. High frequency microelectronics package
US5465008A (en) * 1993-10-08 1995-11-07 Stratedge Corporation Ceramic microelectronics package
US5783113A (en) * 1997-03-27 1998-07-21 International Business Machines Corporation Conductive paste for large greensheet screening including high thixotropic agent content
US6117367A (en) * 1998-02-09 2000-09-12 International Business Machines Corporation Pastes for improved substrate dimensional control
US6217821B1 (en) * 1999-06-02 2001-04-17 E. I. Du Pont De Nemours And Company Method of forming distortion-free circuits
US7056468B2 (en) * 2000-06-15 2006-06-06 Paratek Microwave, Inc. Method for producing low-loss tunable ceramic composites with improved breakdown strengths
US6737179B2 (en) 2000-06-16 2004-05-18 Paratek Microwave, Inc. Electronically tunable dielectric composite thick films and methods of making same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3518756A (en) * 1967-08-22 1970-07-07 Ibm Fabrication of multilevel ceramic,microelectronic structures
US4109377A (en) * 1976-02-03 1978-08-29 International Business Machines Corporation Method for preparing a multilayer ceramic
US4234367A (en) * 1979-03-23 1980-11-18 International Business Machines Corporation Method of making multilayered glass-ceramic structures having an internal distribution of copper-based conductors
JPS59995A (ja) * 1982-06-16 1984-01-06 富士通株式会社 銅導体多層構造体の製造方法
US4971738A (en) * 1988-07-18 1990-11-20 International Business Machines Corporation Enhanced removal of carbon from ceramic substrate laminates

Also Published As

Publication number Publication date
KR920002589B1 (ko) 1992-03-30
US5114642A (en) 1992-05-19
JPH03283452A (ja) 1991-12-13

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